JPH07136576A - Dip coating method - Google Patents

Dip coating method

Info

Publication number
JPH07136576A
JPH07136576A JP28933093A JP28933093A JPH07136576A JP H07136576 A JPH07136576 A JP H07136576A JP 28933093 A JP28933093 A JP 28933093A JP 28933093 A JP28933093 A JP 28933093A JP H07136576 A JPH07136576 A JP H07136576A
Authority
JP
Japan
Prior art keywords
substrate
cylindrical substrate
coating
coating liquid
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28933093A
Other languages
Japanese (ja)
Other versions
JP3223667B2 (en
Inventor
Takaharu Nakayama
隆治 中山
Yasuyuki Kikuchi
康之 菊池
Eiji Niimi
英次 新見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP28933093A priority Critical patent/JP3223667B2/en
Publication of JPH07136576A publication Critical patent/JPH07136576A/en
Application granted granted Critical
Publication of JP3223667B2 publication Critical patent/JP3223667B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To form a uniform coating film at the time of dipping a cylindrical substrate in a coating soln. to form a coating film on the periphery of the substrate by blowing the vapor of solvent into the space in the substrate immediately before the lower opening of the substrate is dipped into the soln. CONSTITUTION:A cylindrical substrate 2 is dipped in a coating soln. 4 to form a coating film on the periphery of the substrate 2. In this case, the substrate 2 is firstly held by a holder 1 in the stage A and arranged above the soln. 4. The lower opening 5 of the substrate 2 is placed directly above the soln. 4 in the stage B. A gas 3 contg. the vapor of solvent is blown into the space in the substrate 2 from a blowing pipe 7 through a check valve 8 in the stage C. Namely, the solvent vapor of the soln. 4 does not enter into the substrate 2 from the lower opening 5, and bubbles are not produced in dip coating. The substrate 2 is dipped into the soln. 4 in the stage D, and the substrate 2 is pulled up in the stage E.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、円筒状基体の表面に塗
膜を浸漬塗布する方法に関するものであり、例えば電子
写真感光体用円筒状基体の外周面に感光材料を含む塗布
液を浸漬塗布することにより均一な塗膜を形成する方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of dipping a coating film on the surface of a cylindrical substrate, for example, dipping a coating solution containing a photosensitive material on the outer peripheral surface of a cylindrical substrate for an electrophotographic photoreceptor. The present invention relates to a method for forming a uniform coating film by coating.

【0002】[0002]

【従来の技術】従来、円筒状基体の外周面に均一な塗膜
を形成する方法としては浸漬塗布方法が好適であり、電
子写真用感光体ドラムの製造に広く用いられている。こ
うした浸漬塗布方法においては、円筒状基体を塗布液内
に浸漬させた際に、円筒状基体の下端開口部から基体内
部に塗布液が侵入し基体の内周面に塗布液が付着するこ
とを防ぐ必要から、膨張収縮可能なゴム部材等を用いて
基体を把持する把持装置をゴム部材等を収縮させた状態
で基体内部に挿入し、次いでゴム部材等を空気等の圧入
により膨張させ円筒状基体の内壁に圧接、密接させて基
体を把持し、浸漬塗布することが通常行われている。
2. Description of the Related Art Conventionally, a dip coating method is suitable as a method for forming a uniform coating film on the outer peripheral surface of a cylindrical substrate, and it is widely used in the manufacture of electrophotographic photosensitive drums. In such a dip coating method, when the cylindrical substrate is dipped in the coating liquid, the coating liquid enters the substrate through the lower end opening of the cylindrical substrate and adheres to the inner peripheral surface of the substrate. To prevent this, a gripping device that grips the base with a rubber member that can expand and contract is inserted into the base while the rubber member is contracted, and then the rubber member is expanded by press-fitting air or the like into a cylindrical shape. It is customary to hold the substrate in pressure contact with and closely contact it with the inner wall of the substrate, and to apply by dipping.

【0003】このため、把持装置を円筒状基体内に気密
に嵌合して、その下端開口部を除いて、円筒状基体内下
部を気密状態に保持することが行なわれてきている。一
方、塗布液の溶媒としては、比較的低沸点の揮発性の溶
媒が通常用いられており、浸漬塗布中に円筒状基体下端
より円筒状基体内下部の空間に溶媒が蒸発しやがて該下
端より気泡が塗布液中に発生する。そうして、その気泡
が円筒状基体の外周面に形成される塗膜の均一性を損な
う場合があった。
For this reason, it has been practiced to fit the gripping device into the cylindrical base body in an airtight manner and to keep the inner and lower parts of the cylindrical base body in an airtight state except for the lower end opening. On the other hand, as the solvent of the coating liquid, a volatile solvent having a relatively low boiling point is usually used, and during dip coating, the solvent evaporates from the lower end of the cylindrical substrate to the space inside and below the cylindrical substrate, and then from the lower end. Air bubbles are generated in the coating liquid. Then, the air bubbles may impair the uniformity of the coating film formed on the outer peripheral surface of the cylindrical substrate.

【0004】こうした気泡の発生を防ぐために、種々の
方法が提案されている。その代表的なものを上げると、
1つに、浸漬中に円筒状基体内下部の空間の気体の一部
を抜き取ったり、円筒状基体内下部の空間の体積を変化
させる方法が、特開昭58−74170号公報、特開平
2−21960号公報、特開平2−21961号公報、
特開平2−21962号公報等に記載されている。2つ
めに、浸漬前に円筒状基体内下部の空間の気体を塗布液
の溶媒蒸気を含んだ気体に置換しておく方法が、実開昭
63−201672号公報、実開昭63−201673
号公報等に記載されている。3つめに、円筒状基体下端
に蓋をしたり、円筒状基体内下部空間の気体下面の蒸発
面積を小さくする方法が、実開昭63−201674号
公報、特開昭64−47470号公報、特開平2−14
769号公報、特開平2−277577号公報に記載さ
れている。その他、円筒状基体内下部の空間の体積を小
さく規定したもの(特開昭63−315171号公
報)、円筒状基体内下部の空間の気体を浸漬前に予め加
熱したり、浸漬後冷却するもの(特開平2−31853
号公報、特開平1−148359号公報)、塗布液槽内
に突出物体をいれておく方法(特開昭62−24157
7号公報)、円筒状基体内下部の空間と連通した気体流
出用物体を同時に浸漬する方法(特開平5−66583
号公報)等がある。
Various methods have been proposed to prevent the generation of such bubbles. If you raise the representative one,
First, there is a method of extracting a part of the gas in the lower space inside the cylindrical substrate or changing the volume of the lower space inside the cylindrical substrate during dipping, as disclosed in JP-A-58-74170. -21960, JP-A-2-21961,
It is described in JP-A-2-21962. Second, there is a method of replacing the gas in the lower space inside the cylindrical substrate with a gas containing the solvent vapor of the coating solution before dipping, as disclosed in Japanese Utility Model Laid-Open Nos. 63-201672 and 63-201673.
It is described in Japanese Patent Publication No. Third, a method of covering the lower end of the cylindrical substrate or reducing the evaporation area of the gas lower surface of the lower space inside the cylindrical substrate is disclosed in Japanese Utility Model Laid-Open No. 63-201674 and Japanese Patent Laid-Open No. 64-47470. Japanese Patent Laid-Open No. 2-14
No. 769 and Japanese Patent Laid-Open No. 277577/1990. In addition, the volume of the lower space inside the cylindrical substrate is specified to be small (Japanese Patent Laid-Open No. 63-315171), and the gas in the lower space inside the cylindrical substrate is preheated before immersion or cooled after immersion. (JP-A-2-31853
Japanese Patent Laid-Open Publication No. Hei 1-148359), a method of placing a projecting object in the coating liquid tank (Japanese Laid-Open Patent Publication No. 62-24157).
No. 7), a method of simultaneously immersing an object for gas outflow, which communicates with the lower space inside the cylindrical substrate (Japanese Patent Laid-Open No. 5-66583).
Issue gazette) etc.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、こうし
た方法では、次のような欠点があった。1つめの浸漬中
に円筒状基体内下部の空間の気体の一部を抜き取った
り、円筒状基体内下部の空間の体積を変化させる方法
は、円筒状基体内下部の空間の圧力を微妙に制御する
か、その都度、円筒状基体の径、長さ、浸漬時間、雰囲
気の温度、溶媒(比)等の条件を考慮した気体抜き取り
体積を設定する必要があった。
However, such a method has the following drawbacks. The method of extracting part of the gas in the lower space inside the cylindrical substrate or changing the volume of the lower space inside the cylindrical substrate during the first immersion is a delicate control of the pressure in the lower space inside the cylindrical substrate. In each case, it is necessary to set the gas extraction volume in consideration of conditions such as the diameter and length of the cylindrical substrate, the immersion time, the temperature of the atmosphere and the solvent (ratio).

【0006】次ぎに、2つめの、浸漬前に円筒状基体内
下部の空間の気体を塗布液の溶媒蒸気を含んだ気体に置
換しておく方法においても、円筒状基体の下端開口部を
塗布液に浸漬させる前に、塗布液上部の気体を円筒状基
体内下部の空間に吸い込む方法は、浸漬塗布においてよ
く用いられる塗布液の常時オーバーフロー法によって
は、塗布液上部に溶媒蒸気を含んだ気体の滞留があまり
なく効果が少ないこと、また、円筒状基体内下部の空間
内に揮発性成分を保持する方法は、浸漬後においてもこ
の部分より溶媒蒸気の発生があり逆効果であった。
Next, also in the second method in which the gas in the lower space inside the cylindrical substrate is replaced with the gas containing the solvent vapor of the coating liquid before dipping, the lower end opening of the cylindrical substrate is coated. The method of sucking the gas in the upper part of the coating liquid into the space inside and below the cylindrical substrate before dipping in the liquid is a gas containing solvent vapor in the upper part of the coating liquid depending on the constant overflow method of the coating liquid often used in dip coating. However, the method of holding the volatile component in the lower space inside the cylindrical substrate had the adverse effect that solvent vapor was generated from this portion even after the immersion.

【0007】更にその他の方法においても、気泡発生防
止の確実性、派生する塗膜品質問題、装置の複雑さ、操
作性等を考慮すると、いずれも不都合な点を持ってい
た。本発明の目的は、複雑な機構や複雑な条件設定を必
要とせずに、気泡の発生を防止し、円筒状基体の外周面
に均一な塗膜を容易に形成することのできる浸漬塗布方
法を提供することにある。
Further, in other methods as well, in view of certainty of prevention of bubble generation, derived coating quality problems, complexity of equipment, operability, etc., all of them have disadvantages. An object of the present invention is to provide a dip coating method capable of preventing the generation of bubbles and easily forming a uniform coating film on the outer peripheral surface of a cylindrical substrate without requiring a complicated mechanism or complicated condition setting. To provide.

【0008】[0008]

【課題を解決するための手段】本発明は上述の問題を解
決するためになされたものであり、浸漬前に円筒状基体
内下部の空間の気体を塗布液の溶媒蒸気を含んだ気体に
置換しておく1方法であり、その要旨は、円筒状基体を
塗布液に浸漬することにより該円筒状基体の外周面に塗
膜を形成する方法において、該円筒状基体の下端開口部
を該塗布液に浸漬させるまえに、該円筒状基体内下部空
間に塗布液の溶媒蒸気を吹き込むことを特徴とする浸漬
塗布方法に存する。以下本発明につき詳細に説明する。
The present invention has been made to solve the above-mentioned problems, and the gas in the lower space inside the cylindrical substrate is replaced with a gas containing the solvent vapor of the coating solution before immersion. The method is a method of forming a coating film on the outer peripheral surface of the cylindrical substrate by immersing the cylindrical substrate in a coating solution, and the method is to apply the coating to the lower end opening of the cylindrical substrate. A method of immersion coating is characterized in that the solvent vapor of the coating solution is blown into the lower space inside the cylindrical substrate before the immersion in the solution. The present invention will be described in detail below.

【0009】図1は本発明の浸漬塗布方法における工程
の概略を示し、A→B→C→D→Eの工程をたどること
により円筒状基体の外周面に塗膜が形成されることを示
している。図1のAに示すように、円筒状基体2は把持
装置1によって把持され、塗布液4の上の位置に移さ
れ、該把持装置に把持された状態で塗布液4の液面に相
対的に近づく。
FIG. 1 shows an outline of the steps in the dip coating method of the present invention, showing that a coating film is formed on the outer peripheral surface of a cylindrical substrate by following the steps A → B → C → D → E. ing. As shown in A of FIG. 1, the cylindrical substrate 2 is gripped by the gripping device 1, moved to a position above the coating liquid 4, and is held relative to the liquid surface of the coating liquid 4 by the gripping device. Approach.

【0010】図1のBは塗布液4に下端部が浸漬する直
前の円筒状基体2を示しており、円筒状基体の軸は塗布
液の液面に対し垂直あるいはほぼ垂直であることが好ま
しく円筒状基体の下端開口部5は塗布液液面の少し上部
に位置している。図1のCはこの位置において円筒状基
体内下部空間に塗布液の溶媒蒸気を含んだ気体を吹き込
んで、円筒状基体内下部空間は塗布液の溶媒蒸気を含ん
だ気体で満たされることになる。本図の該下部空間は塗
布液の溶媒蒸気雰囲気3になった状態を示している。ま
た吹き込み後は、該吹き込み管7の途中にある逆止弁8
等により該下部空間の気体が該吹き込み管より流れ出る
ことはない。
FIG. 1B shows the cylindrical substrate 2 immediately before its lower end is immersed in the coating liquid 4, and the axis of the cylindrical substrate is preferably perpendicular or nearly perpendicular to the liquid surface of the coating liquid. The lower end opening 5 of the cylindrical substrate is located slightly above the surface of the coating liquid. In FIG. 1C, the gas containing the solvent vapor of the coating liquid is blown into the lower space inside the cylindrical substrate at this position, and the lower space inside the cylindrical substrate is filled with the gas containing the solvent vapor of the coating liquid. . The lower space in the figure shows a state where the solvent vapor atmosphere 3 of the coating liquid is set. After the blowing, the check valve 8 in the middle of the blowing pipe 7
Therefore, the gas in the lower space does not flow out of the blowing pipe.

【0011】こうして、円筒状基体内下部空間の気体の
大部分が塗布液の溶媒蒸気を飽和した気体により置換さ
れることになり、その後の工程において溶媒蒸気が円筒
状基体下端開口部5より基体内下部の空間に侵入するこ
とが抑制され、その結果浸漬塗布中に円筒状基体下端よ
り気泡が塗布液中に発生することが防止でき、円筒状基
体の外周面に均一な塗膜が形成される。
In this way, most of the gas in the lower space inside the cylindrical substrate is replaced by the gas saturated with the solvent vapor of the coating liquid, and in a subsequent step, the solvent vapor is radiated from the lower end opening 5 of the cylindrical substrate. Invasion into the space below the body is suppressed, and as a result, bubbles can be prevented from being generated in the coating liquid from the lower end of the cylindrical substrate during dip coating, and a uniform coating film is formed on the outer peripheral surface of the cylindrical substrate. It

【0012】本発明における、塗布液に円筒状基体の下
端部が浸漬する直前の位置とは、吹き込んだ溶媒蒸気を
含む気体が外気に再置換される量を少なくする為、円筒
状基体の下端開口部と塗布液液面との距離は0より大き
くて3cmより小さい範囲、より好ましくは0より大き
くて1cmより小さい範囲、更に好ましくは0より大き
くて0.5cmより小さい範囲を言う。
In the present invention, the position immediately before the lower end portion of the cylindrical substrate is immersed in the coating liquid means that the amount of the gas containing the solvent vapor blown into the coating liquid is re-replaced with the outside air, so that the lower end of the cylindrical substrate is reduced. The distance between the opening and the surface of the coating liquid is greater than 0 and less than 3 cm, more preferably greater than 0 and less than 1 cm, and further preferably greater than 0 and less than 0.5 cm.

【0013】また、同様にして、吹き込んだ溶媒蒸気を
含む気体が勢い良く基体内下部の空間から出てしまうこ
とがないように、吹き込み管7の該空間側先端には気流
制御部材、例えば衝突板や無塵用不織布や、メッシュ、
スポンジなどの多孔質物質を設置して該気体を該空間内
に拡散するようにすることが好ましい。吹き込む気体の
体積は、円筒状基体内下部空間の体積の1倍より大きい
ことが好ましいが、円筒状基体の長さが小さいとか塗布
速度が大きいとかで、浸漬している時間が短い場合はこ
の限りではなく、さらに少量としても良い。また吹き込
み量は、前記必要最低量よりおおくても品質上なんら問
題なく、吹き込み量精度は低いもので十分である。
Similarly, in order to prevent the gas containing the blown solvent vapor from rushing out of the space in the lower part of the substrate, an air flow control member, for example, a collision, is applied to the end of the blowing pipe 7 on the space side. Non-woven boards and non-woven fabrics for dust, mesh,
It is preferable to install a porous material such as a sponge so as to diffuse the gas into the space. It is preferable that the volume of the gas blown in is larger than one time the volume of the lower space in the cylindrical substrate, but if the length of the cylindrical substrate is short or the coating speed is high, this is the case. The amount is not limited and may be smaller. Further, even if the blowing amount is set below the above-mentioned minimum amount, there is no problem in terms of quality, and it is sufficient that the blowing amount accuracy is low.

【0014】円筒状基体内下部空間に塗布液の溶媒蒸気
を含んだ気体を吹き込む時の、円筒状基体と塗布液の相
対的速度は、前記Aの円筒状基体を液面に相対的に近づ
ける際の速度のままでも良いが、前記範囲内で所定量の
気体を吹き込むには風速が大きくなり過ぎる時は、前記
Aの値よりも下げるか、一時停止することが好ましい。
The relative velocity of the cylindrical substrate and the coating liquid when the gas containing the solvent vapor of the coating liquid is blown into the lower space of the cylindrical substrate makes the cylindrical substrate of A relatively close to the liquid surface. Although the speed may be the same as it is, if the wind speed becomes too high to blow a predetermined amount of gas within the above range, it is preferable to lower the value than the value of A or temporarily stop.

【0015】図1のDは該円筒状基体が塗布液中に浸漬
している状態を示している。円筒状基体と塗布液液面と
の相対速度の値は前記Aにおけるその値と同一でも良い
し違っていても良い。図1のEは円筒状基体が塗布液か
ら引き上げられ、外周塗膜が形成されている状態を示し
ている。浸漬開始時、浸漬中、引き上げ中の円筒状基体
の軸は塗布液の液面に対して垂直であることが好まし
い。
FIG. 1D shows the cylindrical substrate immersed in the coating solution. The value of the relative velocity between the cylindrical substrate and the liquid surface of the coating liquid may be the same as or different from the value in A above. E in FIG. 1 shows a state where the cylindrical substrate is pulled up from the coating liquid and the outer peripheral coating film is formed. It is preferable that the axis of the cylindrical substrate at the start of immersion, during immersion, and during withdrawing is perpendicular to the liquid surface of the coating liquid.

【0016】図2は本発明の浸漬塗布方法における塗布
液の溶媒蒸気を含む気体の発生装置例の概略図を示す。
図1のCで示した吹き込む該気体の発生装置の2つの例
の概略図を示すもので、本発明の目的を達成するならば
ここに示した装置の限りではない。図2のAは、溶媒蒸
気発生タンク9から、溶媒蒸気を含んだ気体をシリンジ
12により吸い取り、円筒状基体内下部空間内に送り込
むための装置例を、図2のBは、溶媒蒸気発生タンク9
に気体を圧入し、発生した溶媒蒸気を含んだ気体をその
圧力を利用して円筒状基体内下部空間内に送り込むため
の装置例を示す。
FIG. 2 is a schematic view of an example of a gas generator including a solvent vapor of a coating liquid in the dip coating method of the present invention.
FIG. 2 is a schematic view of two examples of the device for generating the gas shown in FIG. 1C, and is not limited to the device shown here as long as the object of the present invention is achieved. 2A is an example of an apparatus for sucking a gas containing a solvent vapor from a solvent vapor generation tank 9 by a syringe 12 and sending the gas into the lower space inside the cylindrical substrate, and FIG. 2B is a solvent vapor generation tank. 9
An example of an apparatus for injecting a gas into a cylinder and feeding a gas containing the generated solvent vapor into the lower space inside the cylindrical substrate by utilizing the pressure is shown.

【0017】溶媒蒸気を含む気体の溶媒蒸気濃度は、そ
の飽和温度に近くすることが好ましく溶媒蒸気発生タン
ク内に設けた散気管11はこの為である。溶媒10は塗
布液の溶媒を用いるが、該塗布液が混合溶媒系の場合は
その比率の混合溶媒を用いても良いし、より蒸気の発生
を容易にするためその中の低沸点溶媒を用いても良い。
溶媒蒸気発生タンク内に供給する気体は空気で良いが、
より安全面の配慮が必要な場合には窒素等でも良い。
The concentration of the solvent vapor of the gas containing the solvent vapor is preferably close to its saturation temperature, and this is why the diffuser pipe 11 provided in the solvent vapor generation tank is provided. Although the solvent of the coating liquid is used as the solvent 10, when the coating liquid is a mixed solvent system, a mixed solvent having the ratio may be used, or a low boiling point solvent therein is used to facilitate generation of vapor. May be.
The gas supplied into the solvent vapor generation tank may be air,
Nitrogen or the like may be used if more safety considerations are required.

【0018】本発明における円筒状基体としては、例え
ば電子写真感光体用円筒状基体である場合周知の電子写
真感光体に採用されているものがいずれも使用できる。
具体的には例えばアルミニウム、ステンレス、銅等の金
属ドラム、あるいはこれらの金属箔のラミネート物、蒸
着物が挙げられる。更に、金属粉末、カーボンブラッ
ク、ヨウ化銅、高分子電解質等の導電性物質を適当なバ
インダーとともに塗布して導電処理したプラスチックド
ラム、紙管等が挙げられる。また、金属粉末、カーボン
ブラック、炭素繊維等の導電性物質を含有し、導電性と
なったプラスチックドラムが挙げられる。又これらの円
筒状基体の上に電荷発生層、下引層等を設けたものであ
ってもよい。
As the cylindrical substrate in the present invention, for example, a cylindrical substrate for an electrophotographic photosensitive member which is adopted in a well-known electrophotographic photosensitive member can be used.
Specifically, for example, a metal drum of aluminum, stainless steel, copper or the like, or a laminate or vapor deposition of these metal foils can be used. Furthermore, a metal drum, carbon black, copper iodide, a polymer drum or other conductive substance is applied together with an appropriate binder to conduct a conductive treatment, and a plastic drum, a paper tube and the like can be mentioned. Further, a conductive plastic drum containing a conductive substance such as metal powder, carbon black, or carbon fiber can be used. Further, a charge generation layer, an undercoat layer, etc. may be provided on these cylindrical substrates.

【0019】本発明における塗布液としては、例えば電
子写真感光体用塗布液である場合、電荷輸送材料、電荷
発生材料、染料色素、電子吸引性化合物等の中から選ば
れた1種又は2種以上のものとバインダーを溶媒中に溶
解又は分散した塗布液が用いられる。該塗布液は潤滑
剤、レベリング剤、酸化防止剤等の公知の添加物を含有
していてもよい。
As the coating liquid in the present invention, for example, in the case of a coating liquid for an electrophotographic photoreceptor, one or two kinds selected from charge transport materials, charge generating materials, dye pigments, electron withdrawing compounds and the like. A coating liquid prepared by dissolving or dispersing the above and a binder in a solvent is used. The coating liquid may contain known additives such as a lubricant, a leveling agent and an antioxidant.

【0020】これら電荷輸送材料、電荷発生材料、染料
色素、電子吸引性化合物、バインダー等はいずれも周知
のものが使用できる。バインダーとしては、例えば、ス
チレン、酢酸ビニル、塩化ビニル、アクリル酸エステ
ル、メタクリル酸エステル、ブタジエン等のビニル化合
物の重合体及び共重合体、ポリビニルアセタール、ポリ
カーボネート、ポリエステル、ポリスルホン、ポリフェ
ニレンオキサイド、ポリウレタン、セルロースエステ
ル、セルロースエーテル、フェノキシ樹脂、けい素樹
脂、エポキシ樹脂等の各種ポリマーが挙げられる。
As the charge transport material, charge generating material, dye pigment, electron withdrawing compound, binder and the like, known materials can be used. Examples of the binder include polymers and copolymers of vinyl compounds such as styrene, vinyl acetate, vinyl chloride, acrylic acid ester, methacrylic acid ester, and butadiene, polyvinyl acetal, polycarbonate, polyester, polysulfone, polyphenylene oxide, polyurethane, and cellulose. Examples thereof include various polymers such as esters, cellulose ethers, phenoxy resins, silicon resins and epoxy resins.

【0021】電荷輸送材料としては、例えば2,4,6
−トリニトロフルオレノン、テトラシアノキジメタン、
ジフェノキノン誘導体等の電子吸引性物質、カルバゾー
ル、インドール、イミダゾール、オキサゾール、ピラゾ
ール、オキサジアゾール、ピラゾリン、チアジアゾー
ル、等の複素還化合物、アニリン誘導体、ヒドラゾン化
合物、芳香族アミン誘導体、スチルベン誘導体、或はこ
れらの化合物からなる基を主鎖もしくは側鎖に有する重
合体などの電子供与性物質が挙げられる。
Examples of the charge transport material include 2, 4, 6
-Trinitrofluorenone, tetracyanokidimethane,
Electron withdrawing substances such as diphenoquinone derivatives, carbazole, indole, imidazole, oxazole, pyrazole, oxadiazole, pyrazoline, thiadiazole, and other complex compounds, aniline derivatives, hydrazone compounds, aromatic amine derivatives, stilbene derivatives, or these An electron-donating substance such as a polymer having a group consisting of the above compound in its main chain or side chain can be mentioned.

【0022】光を吸収すると極めて高い効率で電荷キャ
リヤーを発生する電荷発生材料としては例えばセレン、
セレン−テルル合金、セレン−ヒ素合金、硫化カドミウ
ム、アモルファスシリコン等の無機光導電性粒子;フタ
ロシアニン系顔料、ペリノン系顔料、チオインジゴ、キ
ナクリドン、ペリレン系顔料、アントラキノン系顔料、
アゾ系顔料、ビスアゾ系顔料、トリスアゾ系顔料、テト
ラキスアゾ系顔料、シアニン系顔料等の有機光導電性粒
子が挙げられる。染料としては、例えば、トリフェニル
メタン染料、チアジン染料、キノン染料およびシアニン
染料やピリリウム塩、チアピリリウム塩、ベンゾピリリ
ウム塩等が挙げられる。また、電荷移動材料と電荷移動
錯体を形成する電子吸引性化合物としては、例えば、キ
ノン類、アルデヒド類、ケトン類、酸無水物、シアノ化
合物、フタリド類等の電子吸引化合物が挙げられる。
Charge generating materials that generate charge carriers with extremely high efficiency when absorbing light include selenium and the like.
Inorganic photoconductive particles such as selenium-tellurium alloy, selenium-arsenic alloy, cadmium sulfide, and amorphous silicon; phthalocyanine pigment, perinone pigment, thioindigo, quinacridone, perylene pigment, anthraquinone pigment,
Examples thereof include organic photoconductive particles such as azo pigments, bisazo pigments, trisazo pigments, tetrakisazo pigments, and cyanine pigments. Examples of the dye include triphenylmethane dye, thiazine dye, quinone dye, cyanine dye, pyrylium salt, thiapyrylium salt, and benzopyrylium salt. Examples of the electron-withdrawing compound that forms a charge-transfer complex with the charge-transfer material include electron-withdrawing compounds such as quinones, aldehydes, ketones, acid anhydrides, cyano compounds, and phthalides.

【0023】本発明における塗布液中に含まれる溶媒と
しては例えばテトラヒドロフラン、1,4−ジオキサン
等のエーテル類;メチルエチルケトン、シクロヘキサノ
ン等のケトン類;トルエン、キシレン等の芳香族炭化水
素;N,N−ジメチルホルムアミド、アセトニトリル、
N−メチルピロリドン、ジメチルスルホキシド等の非プ
ロトン性極性溶媒;酢酸エチル、蟻酸メチル、メチルセ
ロソルブアセテート等のエステル類;ジクロロエタン、
クロロホルム等の塩素化炭化水素などの溶剤が挙げられ
る。
Examples of the solvent contained in the coating liquid in the present invention include ethers such as tetrahydrofuran and 1,4-dioxane; ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene and xylene; N, N- Dimethylformamide, acetonitrile,
Aprotic polar solvents such as N-methylpyrrolidone and dimethyl sulfoxide; Esters such as ethyl acetate, methyl formate and methyl cellosolve acetate; Dichloroethane,
Examples include solvents such as chlorinated hydrocarbons such as chloroform.

【0024】塗布液中の固形分の含有量は主として形成
すべき層の塗膜の膜厚に応じて決定されるが、積層型の
電荷発生層を形成する場合には固形分濃度10重量%以
下、より好ましくは0.5〜5重量%とするとよい。積
層型の電荷輸送層あるいは電荷発生材料と電荷輸送材料
とを含む単層型の感光層を形成する場合には、より厚膜
の感光層を形成する必要があるので固形分濃度50重量
%以下、より好ましくは10〜40重量%とするとよ
い。
The content of the solid content in the coating liquid is determined mainly according to the thickness of the coating film of the layer to be formed, but in the case of forming a laminated charge generating layer, the solid content concentration is 10% by weight. Below, it is more preferable to set it to 0.5 to 5% by weight. When forming a laminated type charge transport layer or a single layer type photosensitive layer containing a charge generating material and a charge transport material, it is necessary to form a thicker photosensitive layer, so the solid content concentration is 50% by weight or less. , And more preferably 10 to 40% by weight.

【0025】積層型の電荷発生層の塗膜の膜厚は通常
0.05μmから5μm、好ましくは0.1μmから2
μmが好適である。積層型の電荷輸送層の塗膜の膜厚は
通常5μmから80μm、好ましくは10μmから60
μmが好適である。単層型の感光層の塗膜の膜厚は、通
常5μmから8μm、好ましくは10μmから60μm
が好適である。
The film thickness of the coating film of the laminated type charge generation layer is usually 0.05 μm to 5 μm, preferably 0.1 μm to 2
μm is preferred. The thickness of the coating film of the laminated charge transport layer is usually 5 μm to 80 μm, preferably 10 μm to 60 μm.
μm is preferred. The thickness of the coating film of the single-layer type photosensitive layer is usually 5 μm to 8 μm, preferably 10 μm to 60 μm.
Is preferred.

【0026】ポリマー層あるいは導電性の微粉末を分散
したポリマー層を形成する場合には固形分濃度45重量
%以下より好ましくは1〜35重量%とするとよい。ポ
リマー層あるいは導電性の微粉末を分散したポリマー層
の塗膜の膜厚は通常0.1μmから100μm、好まし
くは0.2μmから80μmである。
When forming a polymer layer or a polymer layer in which conductive fine powder is dispersed, the solid content concentration is preferably 45% by weight or less, more preferably 1 to 35% by weight. The thickness of the coating film of the polymer layer or the polymer layer in which conductive fine powder is dispersed is usually 0.1 μm to 100 μm, preferably 0.2 μm to 80 μm.

【0027】[0027]

【実施例】以下、本発明を実施例により更に詳細に説明
するが、本発明はその要旨を越えない限り、以下の実施
例に限定されるものではない。 実施例1 下記処方の電子写真感光体用電荷輸送層塗布液を調整し
た。
EXAMPLES The present invention will be described in more detail with reference to examples below, but the present invention is not limited to the following examples unless it exceeds the gist thereof. Example 1 A charge transport layer coating liquid for an electrophotographic photoreceptor having the following formulation was prepared.

【表1】 固形分 電荷輸送物質(ヒドラゾン化合物) 100部 バインダー(ポリカーボネート樹脂) 100部 固形分濃度 20wt% 溶媒 1,4−ジオキサン/テトラヒドロフラン 4/6(wt比)[Table 1] Solid content Charge transport material (hydrazone compound) 100 parts Binder (polycarbonate resin) 100 parts Solid content concentration 20 wt% Solvent 1,4-dioxane / tetrahydrofuran 4/6 (wt ratio)

【0028】室温、液温25℃のもとで、外径10c
m、長さ98cm、肉厚3mmで下端が開放された、基
体内下部空間の体積が約940cm3 である、電荷発生
層を塗布したアルミニウム製円筒状基体を、常時オーバ
ーフローさせた塗布液槽内の前記塗布液に1m/分の速
度で近づけ、基体下端開口部が塗布液液面上2mmとな
った時点で速度をゼロとし、その状態のまま3秒間保持
させ、その間にテトラヒドロフラン蒸気を含んだ空気約
1450cm3 を基体下部空間内に把持装置に組み込ん
だ管を通じて吹き込んだ。それから、ただちに1m/分
の速度で、塗布する領域すべてを塗布液に浸漬し、25
cm/分の速度で、円筒状基体を引き上げたところ、気
泡の発生はなく良好な塗膜がえられた。
Outside diameter 10c at room temperature and liquid temperature of 25 ° C
m, a length of 98 cm, a thickness of 3 mm, a lower end opened, and a volume of the lower space inside the substrate of about 940 cm 3 , in which a cylindrical aluminum substrate coated with a charge generation layer is constantly overflowed Of the above coating solution at a speed of 1 m / min. When the opening at the lower end of the substrate reached 2 mm above the surface of the coating solution, the speed was set to zero, and the state was maintained for 3 seconds, during which tetrahydrofuran vapor was included. About 1450 cm 3 of air was blown into the lower space of the substrate through a tube incorporated in the gripping device. Immediately, then, at a speed of 1 m / min, immerse the entire coating area in the coating solution and
When the cylindrical substrate was pulled up at a speed of cm / min, no bubbles were generated and a good coating film was obtained.

【0029】なお、テトラヒドロフラン蒸気を含んだ空
気の発生には、約1000cm3 のテトラヒドロフラン
を入れた容積約4880cm3 の加圧タンクにコンプレ
ッサーからの空気を圧入したものを、テトラヒドロフラ
ン蒸気を含んだ空気として放出させて利用した。放出し
た気体の1気圧での体積は加圧タンクに付けた圧力計の
下がる値から計算して求めた。また、吹き込み管の基体
下部空間内の先端には無塵用不織布をあて、吹き込む気
体の拡散をはかった。
[0029] Incidentally, the generation of air containing tetrahydrofuran vapors, what was injected air from the compressor to the pressure tank volume of about 4880cm 3 containing the tetrahydrofuran about 1000 cm 3, as air containing tetrahydrofuran steam It was released and used. The volume of the released gas at 1 atm was calculated and calculated from the value of the pressure gauge attached to the pressure tank. Further, a dust-free non-woven fabric was applied to the tip of the blow-in tube in the space below the substrate to diffuse the blown-in gas.

【0030】比較例1 実施例1において、アルミニウム製円筒状基体の下端開
口部が塗布液液面上2mmとなっても相対速度を1m/
分に保ったまま塗布する領域すべてを塗布液に浸漬し、
テトラヒドロフラン蒸気を含んだ空気の吹き込みは行わ
なかったこと以外は実施例1と同様にして円筒状基体を
引き上げたところ、引き上げの開始直後、及び、引き上
げの途中で円筒状基体下端より気泡が発生し塗布液液面
が乱れたことにより、円筒状基体の外周面に形成された
塗膜に著しいむらを生じ、電子写真用感光体としての用
途に耐えないものであった。
Comparative Example 1 In Example 1, even if the opening at the lower end of the aluminum cylindrical substrate was 2 mm above the liquid surface of the coating liquid, the relative speed was 1 m /
Immerse all the areas to be applied in the coating solution while keeping the
When the cylindrical substrate was pulled up in the same manner as in Example 1 except that the air containing tetrahydrofuran vapor was not blown in, bubbles were generated from the lower end of the cylindrical substrate immediately after the start of the pulling process and during the pulling process. Due to the disturbance of the liquid surface of the coating liquid, the coating film formed on the outer peripheral surface of the cylindrical substrate was markedly uneven, and it could not be used as an electrophotographic photoreceptor.

【0031】比較例2 実施例1において、アルミニウム製円筒状基体の下端開
口部が塗布液液面上2mmとなった時点で速度をゼロと
し、その状態のまま25秒間保持させ、その間に、テト
ラヒドロフラン蒸気を含んだ空気の吹き込みは行わず
に、逆に約800cm3 の塗布液上部の気体を基体下部
空間内に吸い込んだこと以外は実施例1と同様にして円
筒状基体を引き上げたところ、引き上げの途中約2/3
を塗布した時点で円筒状基体下端より気泡が発生し塗布
液液面が乱れたことにより、円筒状基体の外周面に形成
された塗膜に著しいむらを生じ、電子写真用感光体とし
ての用途に耐えないものであった。
Comparative Example 2 In Example 1, the velocity was set to zero at the time when the lower end opening of the aluminum-made cylindrical substrate reached 2 mm above the liquid level of the coating liquid, and the state was maintained for 25 seconds. When the cylindrical substrate was pulled up in the same manner as in Example 1 except that about 800 cm 3 of the gas above the coating liquid was sucked into the space below the substrate without blowing air containing steam, About 2/3
When the coating liquid was applied, air bubbles were generated from the lower end of the cylindrical substrate and the liquid surface of the coating liquid was disturbed, resulting in remarkable unevenness in the coating film formed on the outer peripheral surface of the cylindrical substrate, and its use as an electrophotographic photoreceptor. Was unbearable.

【0032】[0032]

【発明の効果】本発明の方法を用いることにより浸漬塗
布中における気泡の発生が防止され、円筒状基体の表面
にむらのない、均一な塗膜を形成できる。
By using the method of the present invention, generation of bubbles during dip coating is prevented, and a uniform coating film having no unevenness on the surface of the cylindrical substrate can be formed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の浸漬塗布方法における工程の概略図。FIG. 1 is a schematic view of steps in a dip coating method of the present invention.

【図2】本発明の浸漬塗布方法における塗布液の溶媒蒸
気を含む気体の発生装置例の概略図
FIG. 2 is a schematic diagram of an example of a gas generator including a solvent vapor of a coating liquid in the dip coating method of the present invention.

【符号の説明】[Explanation of symbols]

1 把持装置 2 円筒状基体 3 塗布液の溶媒蒸気雰囲気 4 塗布液 5 円筒状基体の下端開口部 6 円筒状基体内下部空間の気体下面 7 溶媒蒸気を含む気体の吹き込み管 8 逆止弁 9 溶媒蒸気発生タンク 10 塗布液の溶媒 11 散気管 12 シリンジ 13 コンプレッサー 14 エアーフィルター 15 制御バルブ 16 圧力計 1 Gripping Device 2 Cylindrical Substrate 3 Solvent Vapor Atmosphere of Coating Liquid 4 Coating Liquid 5 Lower End Opening of Cylindrical Substrate 6 Gas Lower Surface in Lower Space of Cylindrical Substrate 7 Gas Injection Tube with Solvent Vapor 8 Check Valve 9 Solvent Vapor generation tank 10 Solvent for coating liquid 11 Air diffuser 12 Syringe 13 Compressor 14 Air filter 15 Control valve 16 Pressure gauge

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 円筒状基体を塗布液に浸漬することによ
り該円筒状基体の外周面に塗膜を形成する方法におい
て、該円筒状基体の下端開口部を該塗布液に浸漬させる
前に、該円筒状基体内下部空間に塗布液の溶媒蒸気を吹
き込むことを特徴とする浸漬塗布方法。
1. A method of forming a coating film on the outer peripheral surface of a cylindrical substrate by immersing the cylindrical substrate in a coating solution, wherein the lower end opening of the cylindrical substrate is immersed in the coating solution. A dip coating method, characterized in that a solvent vapor of a coating liquid is blown into the lower space inside the cylindrical substrate.
JP28933093A 1993-11-18 1993-11-18 Immersion coating method Expired - Fee Related JP3223667B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28933093A JP3223667B2 (en) 1993-11-18 1993-11-18 Immersion coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28933093A JP3223667B2 (en) 1993-11-18 1993-11-18 Immersion coating method

Publications (2)

Publication Number Publication Date
JPH07136576A true JPH07136576A (en) 1995-05-30
JP3223667B2 JP3223667B2 (en) 2001-10-29

Family

ID=17741803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28933093A Expired - Fee Related JP3223667B2 (en) 1993-11-18 1993-11-18 Immersion coating method

Country Status (1)

Country Link
JP (1) JP3223667B2 (en)

Also Published As

Publication number Publication date
JP3223667B2 (en) 2001-10-29

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