JPH05110216A - Manufacture of double-sided flexible printed circuit board - Google Patents

Manufacture of double-sided flexible printed circuit board

Info

Publication number
JPH05110216A
JPH05110216A JP26568991A JP26568991A JPH05110216A JP H05110216 A JPH05110216 A JP H05110216A JP 26568991 A JP26568991 A JP 26568991A JP 26568991 A JP26568991 A JP 26568991A JP H05110216 A JPH05110216 A JP H05110216A
Authority
JP
Japan
Prior art keywords
printed circuit
flexible printed
circuit board
polyisoimide
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26568991A
Other languages
Japanese (ja)
Other versions
JP2612118B2 (en
Inventor
Takuya Tochimoto
卓哉 栃本
Toshio Nakao
俊夫 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP26568991A priority Critical patent/JP2612118B2/en
Publication of JPH05110216A publication Critical patent/JPH05110216A/en
Application granted granted Critical
Publication of JP2612118B2 publication Critical patent/JP2612118B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To provide a two-layer flexible printed circuit board with no adhesive agent layer by completing imidation by heating and pressing specific polyisoimide film which is formed on a mold material and has an opening as required to a conductive foil or a flexible printed circuit board. CONSTITUTION:Using para-phenylene diamine: 4, 4'-and/or aromatic diamine content whose 3, 4'-diamino diphenyl ether mole ratio is 90:10-50:50, both ends are formed with diamine content and a polyisoimide which is produced by isoimidizing polyamic acid whose both ends are sealed with dicarbone acid anhydrous part and/or its derivative is formed in film-shape on a conductive foil and then heated and pressed together with the conductive foil. As a result, a double-sided flexible printed circuit board with a specified thickness is obtained without lowering resistances to alkali, solvent and heat and also electric characteristics inherent with a double-sided flexible printed circuit board with no adhesive agent.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、特定のポリイソイミド
を用いた、接着剤層を持たない両面フレキシブル印刷回
路用基板の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a double-sided flexible printed circuit board having no adhesive layer using a specific polyisoimide.

【0002】[0002]

【従来の技術】近年、電子・電気工業の発展に伴い、通
信用、民生用機器の実装方式の簡略化、小型化、高信頼
性が要求され、プリント回路基板の使用が望まれてい
る。特に軽量で立体的に実装できるフレキシブルプリン
ト回路板の使用が有利であり、注目されている。
2. Description of the Related Art In recent years, with the development of the electronic and electric industries, simplification, miniaturization and high reliability of mounting methods for communication and consumer equipment have been demanded, and use of printed circuit boards has been desired. In particular, the use of a flexible printed circuit board which is light in weight and can be mounted three-dimensionally is advantageous and attracts attention.

【0003】従来、ポリイミド樹脂を用いた2層フレキ
シブルプリント回路基板を製造するには、銅箔上にポリ
アミック酸のワニスを塗布し、これを乾燥、硬化させる
方法が一般的に用いられている。しかし、このポリアミ
ック酸の溶液は室温では不安定であり、保存には低温を
要し、長期の保存には適していない。さらに、最近では
多層構造を有するフレキシブルプリント回路基板の使用
が強く望まれている。しかしながら、これらのポリアミ
ック酸を両面フレキシブルプリント回路基板に用いた場
合、乾燥条件が穏やかな場合、銅箔同志を貼り合わせた
ときに、イミド化の際に生成する水などにより、銅箔上
に、膨れ、しわなどを生じ、反対に、乾燥条件が強すぎ
ると十分な接着力が得られないという欠点があった。ま
た、熱可塑性のポリイミドを用いた例もいくつか報告さ
れているが、接着力、耐熱性の面でまだ十分とは言えな
い。接着剤層を持たない両面フレキシブル印刷回路用基
板は、電子機器の小型・軽量化が進むにつれ、ますます
用途が拡大している。
Conventionally, in order to manufacture a two-layer flexible printed circuit board using a polyimide resin, a method of applying a varnish of polyamic acid on a copper foil and then drying and curing the varnish is generally used. However, this solution of polyamic acid is unstable at room temperature, requires low temperature for storage, and is not suitable for long-term storage. Furthermore, recently, the use of flexible printed circuit boards having a multilayer structure has been strongly desired. However, when these polyamic acids are used for a double-sided flexible printed circuit board, when the drying conditions are mild, when the copper foils are bonded together, water generated during imidization, etc., on the copper foil, Blisters, wrinkles, and the like occur, and conversely, if the drying conditions are too strong, sufficient adhesive strength cannot be obtained. Also, some examples using thermoplastic polyimide have been reported, but they are still insufficient in terms of adhesive strength and heat resistance. Double-sided flexible printed circuit boards that do not have an adhesive layer have been increasingly used as electronic devices have become smaller and lighter.

【0004】従来用いられているこれらの方法において
は、それぞれに耐熱性、密着力、加工性、耐薬品性に欠
点を有している。先ず、接着剤層を持つ3層フレキシブ
ル印刷回路用基板では、接着剤層の耐熱性が低いため、
支持フィルムにポリイミドを用いても、フレキシブル印
刷回路用基板としての耐熱性は接着剤層の耐熱性によっ
て決定されるという欠点を有している。導体層を蒸着や
スパッタリング法で形成した場合、支持フィルム層と導
体層の密着力が低いという欠点、あるいは樹脂層を厚く
していった場合たとえば直接ポリアミック酸を塗布・乾
燥させ、厚膜を形成させるとイミド化に伴う収縮による
応力が導体層の支持力を上回り、乾燥中に大きなカール
を生じる。一方、導体層にポリアミック酸溶液を直接何
度か繰り返し塗布・乾燥し、さらにイミド化すると工程
中のカールは軽減されるが、導体層に近い部分と導体層
の反対側の部分では熱履歴が異なるためフィルム中のイ
ミド化率及び溶剤残留量に差が生じ、銅箔エッチング後
のフィルムのカール・寸法変化率等が大きくなる。
These conventionally used methods each have drawbacks in heat resistance, adhesion, workability and chemical resistance. First, in a three-layer flexible printed circuit board having an adhesive layer, the adhesive layer has low heat resistance.
Even if polyimide is used for the supporting film, there is a drawback that the heat resistance of the flexible printed circuit board is determined by the heat resistance of the adhesive layer. If the conductor layer is formed by vapor deposition or sputtering, the adhesion between the support film layer and the conductor layer is low, or if the resin layer is thickened, for example, polyamic acid is directly applied and dried to form a thick film. When this is done, the stress due to contraction due to imidization exceeds the supporting force of the conductor layer, and a large curl occurs during drying. On the other hand, if the polyamic acid solution is repeatedly applied and dried directly on the conductor layer, and further imidized, curling during the process is reduced, but heat history is present in the portion near the conductor layer and the portion on the opposite side of the conductor layer. Since they are different, the imidization rate and the residual solvent amount in the film are different, and the curl and dimensional change rate of the film after etching the copper foil are large.

【0005】[0005]

【発明が解決しようとする課題】本発明の目的とすると
ころは、上述の欠点を克服したポリイソイミドを用いて
接着剤層のない両面フレキシブル印刷回路板の本来持っ
ている耐アルカリ性、耐溶剤性、耐熱性、電気特性を低
下させることなく、所定の厚みを有する両面フレキシブ
ル印刷回路用基板を提供するものである。
SUMMARY OF THE INVENTION The object of the present invention is to provide a double-sided flexible printed circuit board having no adhesive layer, which has the inherent alkali resistance, solvent resistance, and It is intended to provide a double-sided flexible printed circuit board having a predetermined thickness without deteriorating heat resistance and electric characteristics.

【0006】[0006]

【課題を解決するための手段】本発明は、3,3',4,4'-ビ
フェニルテトラカルボン酸二無水物(以下BPDAと略
す)とピロメリット酸二無水物(以下PMDAと略す)
とのモル比(BPDA:PMDA)が90:10〜50:50で
ある芳香族カルボン酸二無水物成分と、パラ-フェニレ
ンジアミン(以下 PPDと略す)、4,4'-ジアミノジフ
ェニルエーテル(以下4,4'-DDEと略す)、3,4'-ジア
ミノジフェニルエーテル(以下3,4'-DDEと略す)の
3種の芳香族ジアミンのうち、PPD:4,4'-DDE及
び/又は3,4'-DDEのモル比が90:10〜50:50である
芳香族ジアミン成分とを、該ジアミン成分が両末端を形
成し、該両末端がジカルボン酸無水物及び/又はその誘
導体で封止されたポリアミック酸をイソイミド化したポ
リイソイミドを導体箔上にフィルム状に形成させ、次い
でポリイソイミドフィルム面同士を合わせて又はポリイ
ソイミドフィルム面に導体箔を合わせて加熱・圧着し、
イミド化した両面フレキシブル印刷回路用基板の製造方
法である。
The present invention provides 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (hereinafter abbreviated as BPDA) and pyromellitic dianhydride (hereinafter abbreviated as PMDA).
Aromatic carboxylic acid dianhydride component having a molar ratio (BPDA: PMDA) of 90:10 to 50:50, para-phenylenediamine (hereinafter abbreviated as PPD), 4,4′-diaminodiphenyl ether (hereinafter 4 , 4'-DDE), 3,4'-diaminodiphenyl ether (hereinafter abbreviated as 3,4'-DDE) among three aromatic diamines, PPD: 4,4'-DDE and / or 3, An aromatic diamine component having a molar ratio of 4'-DDE of 90:10 to 50:50, the diamine component forming both ends, and the both ends being sealed with a dicarboxylic acid anhydride and / or a derivative thereof. Polyisimide obtained by isoimid polyamic acid is formed into a film on the conductor foil, and then the conductor foil is heated and pressure-bonded by matching the polyisoimide film surfaces to each other or the polyisoimide film surface.
It is a method for producing an imidized double-sided flexible printed circuit board.

【0007】本発明においては、テトラカルボン酸二無
水物成分またはジアミン成分に対して、少量のその他の
テトラカルボン酸二無水物またはジアミンを添加しても
良い。
In the present invention, a small amount of another tetracarboxylic dianhydride or diamine may be added to the tetracarboxylic dianhydride or diamine component.

【0008】テトラカルボン酸二無水物成分としては、
例えば2,3,3',4'-ビフェニルテトラカルボン酸二無水
物、3,3',4,4'-ベンゾフェノンテトラカルボン酸二無水
物、3,3',4,4'-P-テルフェニルテトラカルボン酸二無水
物、2,3,6,7-ナフタレンテトラカルボン酸二無水物、3,
3',4,4'-ベンゾフェノンテトラカルボン酸二無水物、3,
3',4,4'-P-テルフェニルテトラカルボン酸二無水物、4,
4'-ヘキサフルオロイソプロピリデンビス(フタル酸無
水物)等も併用することが出来る。
As the tetracarboxylic dianhydride component,
For example, 2,3,3 ', 4'-biphenyltetracarboxylic dianhydride, 3,3', 4,4'-benzophenonetetracarboxylic dianhydride, 3,3 ', 4,4'-P-tere Phenyltetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 3,
3 ', 4,4'-benzophenone tetracarboxylic dianhydride, 3,
3 ', 4,4'-P-terphenyltetracarboxylic dianhydride, 4,
4'-hexafluoroisopropylidene bis (phthalic anhydride) etc. can also be used together.

【0009】ジアミン成分としては、例えば4,4'-ジア
ミノジフェニルメタン、3,3'-ジメチルベンジジン、4,
4'-ジアミノ-P-テルフェニル、4,4'-ジアミノ-P-クォー
ターフェニル、2,8-ジアミノジフェニレンオキサイドな
ども併用することができる。
Examples of the diamine component include 4,4'-diaminodiphenylmethane, 3,3'-dimethylbenzidine, 4,
4'-diamino-P-terphenyl, 4,4'-diamino-P-quaterphenyl, 2,8-diaminodiphenylene oxide and the like can also be used together.

【0010】ジカルボン酸無水物としては、無水マレイ
ン酸、無水フタル酸、ナフタリンジカルボン酸無水物な
どが普通には用いられる。
As the dicarboxylic acid anhydride, maleic anhydride, phthalic anhydride, naphthalene dicarboxylic acid anhydride and the like are usually used.

【0011】本発明において、用いられるBPDAとP
MDAのモル比は、90:10〜50:50が好ましく、さらに
好ましくは、80:20〜60:40である。酸成分としてPM
DAを用いた場合、50モル%以上の添加ではフィルムの
接着性は低下する。また10モル%以下では寸法変化率の
値が悪くなる。
BPDA and P used in the present invention
The molar ratio of MDA is preferably 90:10 to 50:50, and more preferably 80:20 to 60:40. PM as an acid component
When DA is used, the addition of 50 mol% or more decreases the adhesiveness of the film. If it is 10 mol% or less, the value of the dimensional change becomes worse.

【0012】一方、芳香族ジアミンとして用いるPPD
と4,4'-DDEまたは3,4'-DDEのモル比は、90:10〜
50:50が好ましく、さらに好ましくは、80:20〜60:40
である。4,4'-DDEまたは3,4'-DDEの添加量が50モ
ル%を超えると耐熱性、寸法安定性が低下する。一方、
10モル%以下では充分な接着力が得られない。
On the other hand, PPD used as an aromatic diamine
And the molar ratio of 4,4'-DDE or 3,4'-DDE is 90: 10-
50:50 is preferable, and more preferably 80:20 to 60:40.
Is. If the amount of 4,4'-DDE or 3,4'-DDE added exceeds 50 mol%, heat resistance and dimensional stability will be reduced. on the other hand,
If it is less than 10 mol%, sufficient adhesive force cannot be obtained.

【0013】テトラカルボン酸二無水物成分、ジアミン
成分、ジカルボン酸無水物成分の反応は、酸二無水物成
分/ジアミン成分/酸無水物成分(モル比)=0.9/1.0
/0.2〜0.99/1.0/0.02で行うのが好ましい。酸二無水
物成分が0.90より低いと重合度が上がらず、硬化後の皮
膜特性が悪い。1.00より大きいと、硬化時にガスを発生
し、平滑な皮膜を得ることが出来ない。
The reaction of the tetracarboxylic dianhydride component, the diamine component and the dicarboxylic acid anhydride component is carried out in the following manner: acid dianhydride component / diamine component / acid anhydride component (molar ratio) = 0.9 / 1.0
/0.2 to 0.99 / 1.0 / 0.02 is preferable. When the acid dianhydride component is lower than 0.90, the degree of polymerization does not increase and the film properties after curing are poor. If it is greater than 1.00, gas is generated during curing, and a smooth film cannot be obtained.

【0014】反応は通常、テトラカルボン酸二無水物ま
たはジアミン類と反応しない有機極性溶媒中で行われ
る。この有機極性溶媒は、反応系に対して不活性であ
り、かつ生成物に対して溶媒であること以外に、反応成
分の少なくとも一方、好ましくは両者に対して良溶媒で
なければならない。この種の溶媒として代表的なもの
は、N,N-ジメチルホルムアミド、N,N-ジメチルアセトア
ミド、ジメチルスルホン、ジメチルスルホキシド、N-メ
チル-2-ピロリドン等があり、これらの溶媒は単独また
は組み合わせて使用される。この他にも溶媒として組み
合わせて用いられるものとしてベンゼン、ジオキサン、
キシレン、トルエン、シクロヘキサン等の非極性溶媒
が、原料の分散媒、反応調節剤あるいは生成物からの揮
散調節剤、皮膜平滑剤等として使用される。
The reaction is usually carried out in an organic polar solvent which does not react with the tetracarboxylic dianhydride or diamines. Besides being inert to the reaction system and being a solvent for the products, this organic polar solvent must be a good solvent for at least one, preferably both, of the reaction components. Typical examples of this type of solvent include N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfone, dimethyl sulfoxide, N-methyl-2-pyrrolidone, etc., and these solvents may be used alone or in combination. used. Other than these, benzene, dioxane,
A non-polar solvent such as xylene, toluene or cyclohexane is used as a dispersion medium of the raw material, a reaction modifier or a volatilization modifier from the product, a film smoothing agent and the like.

【0015】反応は一般的に無水の条件下で行うことが
好ましい。これはテトラカルボン酸二無水物が水により
開環し、不活性化し、反応を停止させる恐れがあるため
である。このため仕込原料中の水分も溶媒中の水分も除
去する必要がある。しかし一方、反応の進行を調節し、
樹脂重合度をコントロールするためにあえて水を添加す
ることも行われる。また反応は不活性ガス雰囲気中で行
われることが好ましい。これはジアミン類の酸化を防止
するためである。不活性ガスとしては一般的に乾燥窒素
ガスが使用される。
The reaction is generally preferably carried out under anhydrous conditions. This is because the tetracarboxylic acid dianhydride may be ring-opened by water and may be inactivated to stop the reaction. Therefore, it is necessary to remove both the water content in the raw material and the water content in the solvent. But on the other hand, it regulates the progress of the reaction,
Water may be added to control the degree of resin polymerization. Further, the reaction is preferably carried out in an inert gas atmosphere. This is to prevent the oxidation of diamines. Dry nitrogen gas is generally used as the inert gas.

【0016】ジカルボン酸無水物は、酸二無水物成分及
びジアミン成分と共に同時に反応系中に添加して反応さ
せてもよいし、酸二無水物成分とジアミン成分とを予め
反応させた後で、添加して反応させてもよい。反応によ
って得られたポリアミック酸は、ジシクロヘキシルカル
ボジイミドなどの触媒でイソイミド化される。
The dicarboxylic acid anhydride may be added to the reaction system together with the acid dianhydride component and the diamine component at the same time for reaction, or after the acid dianhydride component and the diamine component are reacted in advance, You may add and make it react. The polyamic acid obtained by the reaction is isoimidized with a catalyst such as dicyclohexylcarbodiimide.

【0017】導体箔として用いることのできる材料とし
ては、銅、アルミニウム、コンスタンタン、ニッケル等
の金属箔が挙げられる。
Materials that can be used as the conductor foil include metal foils such as copper, aluminum, constantan and nickel.

【0018】本発明において、導体箔上にポリイソイミ
ドフィルムを形成する方法は、導体箔上にロータリーコ
ーター、ナイフコーター、ドクターブレード、フローコ
ーター等の公知の塗布手段で導体箔上端から1〜100μm
の均一な厚さに流延塗布した後、加熱乾燥することによ
り得ることが出来る。次いで、導体箔上のポリイソイミ
ド面を合わせて又は他の導体箔を合わせて圧着し、イミ
ド化して両面フレキシブル印刷回路用基板とする。ま
た、導体箔上に半硬化させたポリイソイミドフィルムを
形成させ、さらに同一組成または異なる組成の他の離型
材上に形成されたポリイソイミドフィルムをイソイミド
フィルム面を合わせて、必要によりこの間にイソイミド
フィルムを所定の枚数挿入し、2枚以上同時に加熱・圧
着し、厚みの厚いポリイソイミドフィルムを形成させる
ことも出来る。
In the present invention, the method for forming the polyisoimide film on the conductor foil is 1-100 μm from the upper end of the conductor foil by a known coating means such as a rotary coater, a knife coater, a doctor blade and a flow coater on the conductor foil.
It can be obtained by casting and coating to a uniform thickness, followed by heating and drying. Then, the polyisoimide surfaces on the conductor foil are combined or other conductor foils are combined and pressure-bonded, and imidized to obtain a double-sided flexible printed circuit board. In addition, a semi-cured polyisoimide film is formed on the conductor foil, and a polyisoimide film formed on another release material having the same composition or a different composition is brought into contact with the isoimide film surface. It is also possible to insert a predetermined number of isoimide films into and heat and press-bond two or more simultaneously to form a thick polyisoimide film.

【0019】即ち、離型材上にポリイソイミド溶液を塗
布し、タックフリー状態になるまで乾燥し、ポリイソイ
ミドフィルムを形成する。その後、ポリイソイミドフィ
ルム面を重ね合わせ、ポリイソイミドフィルム同士を加
熱・圧着し、最初に塗布・乾燥した厚みの整数倍のポリ
イソイミドフィルムを作製する。このとき、必要に応じ
てポリイソイミドの面同士を重ねられるように、離型材
を剥離したポリイソイミドフィルムを所定の枚数間に挿
入してより厚いポリイソイミドフィルムを得ることも出
来る。また圧着後片側の離型材を剥し、同様のことを繰
り返して更に厚いものを得ることも出来る。このとき、
所要の厚みとなるところで上下両側に導体箔の付いたも
のを用いれば、両面フレキシブル印刷回路用基板とする
ことができる。
That is, a polyisoimide solution is applied onto a release material and dried until a tack-free state is obtained to form a polyisoimide film. Then, the surfaces of the polyisoimide films are overlapped with each other, and the polyisoimide films are heated and pressure-bonded to each other to prepare a polyisoimide film having an integral multiple of the thickness which was first applied and dried. At this time, a thicker polyisoimide film can be obtained by inserting a predetermined number of polyisoimide films from which the release material has been peeled off so that the surfaces of the polyisoimides can be overlapped with each other as necessary. It is also possible to obtain a thicker product by peeling off the release material on one side after pressure bonding and repeating the same process. At this time,
A double-sided flexible printed circuit board can be obtained by using conductor foils having upper and lower sides at a required thickness.

【0020】本発明において、ポリイソイミド溶液を乾
燥させ、ポリイソイミドフィルムを形成させる条件とし
ては、100〜180℃、30〜200分が適当である。これより
温度が低く時間が短い場合、両面板とするとき、加熱・
圧着する際、流動性が大きく、フィルム厚のバラツキも
大きくなり、イミド化後の寸法変化が大きくなる。ま
た、残存溶媒による膨れが生じる。反対に、これより温
度が高く時間が長い場合、イソイミドのイミド化が進行
し、加熱・圧着する際、流動性が小さすぎ、導体箔もし
くはフレキシブル印刷回路基板とのピール強度が低下す
る。
In the present invention, suitable conditions for drying the polyisoimide solution to form a polyisoimide film are 100 to 180 ° C. and 30 to 200 minutes. If the temperature is lower than this and the time is short, when using double-sided
When pressure-bonded, the fluidity is large, the variation in the film thickness is large, and the dimensional change after imidization is large. In addition, swelling due to the residual solvent occurs. On the other hand, when the temperature is higher and the time is longer than this, the imidization of the isoimide proceeds, the fluidity is too small at the time of heating and pressure bonding, and the peel strength with the conductor foil or the flexible printed circuit board decreases.

【0021】イソイミド1枚の塗布厚みとしては、イミ
ド化後の厚み50μm以下が適当である。これより厚い場
合は、溶剤の蒸発速度が遅く、生産性が著しく低下す
る。ポリイソイミドフィルムを導体箔に加熱・圧着する
条件としては、プレス形式の場合は200〜380℃、5〜150
kg/cm2、5〜30分、ロール式ラミネータの場合は200〜3
80℃、1〜50kg/cm、0.1〜10m/分の条件が適当であ
る。
As a coating thickness of one sheet of isoimide, a thickness after imidization of 50 μm or less is suitable. When it is thicker than this, the evaporation rate of the solvent is slow and the productivity is remarkably reduced. The conditions for heating and crimping the polyisoimide film on the conductor foil are 200 to 380 ° C and 5 to 150 for the press type.
kg / cm 2 , 5 to 30 minutes, 200 to 3 for roll type laminator
Appropriate conditions are 80 ° C., 1 to 50 kg / cm, 0.1 to 10 m / min.

【0022】さらに、本発明のフィルムは、加熱硬化時
の縮合水の生成がないことから、多層板としても応用が
可能であり、また接着剤層を持たず導体箔とポリイミド
から構成された基板を2層フレキシブル印刷回路基板と
して用いることが出来る。
Furthermore, since the film of the present invention does not generate condensed water during heat curing, it can be applied as a multilayer board, and a substrate composed of a conductor foil and polyimide without an adhesive layer. Can be used as a two-layer flexible printed circuit board.

【0023】[0023]

【作用】本発明は、離型材上に形成された必要により開
孔部を有する特定のポリイソイミドフィルムを用い、導
体箔もしくはフレキシブル印刷回路基板と加熱・圧着
し、イミド化を完結させることにより、容易にかつ安価
に、生産性・収率よく両面フレキシブル印刷回路用基板
を得ることが出来る。
According to the present invention, by using a specific polyisoimide film formed on a release material and optionally having openings, heating and pressure bonding with a conductor foil or a flexible printed circuit board to complete imidization. A double-sided flexible printed circuit board can be obtained easily and inexpensively with good productivity and yield.

【0024】[0024]

【実施例】(実施例1)撹拌機、温度計、還流冷却管を
備えた4ッ口フラスコへ、ジアミン成分として、PPD
86.4g(0.8モル)、3,4'-DDE 40.0g(0.2モル)
を加え、さらにN-メチル-2-ピロリドン(以下NMPと
略す)を3000g加え、ジアミンが溶解するまでよく撹拌
した。ジアミン成分が溶解した後、溶液を15℃以下まで
冷却し、BPDA 223.6g(0.76モル)、PMDA41.4
g(0.19モル)、無水フタル酸 14.8g(0.1モル)を系
内の温度が15℃を越えないように徐々に添加し、添加終
了後、20℃で6時間撹拌を行った。
Example 1 A 4-necked flask equipped with a stirrer, a thermometer, and a reflux condenser was charged with PPD as a diamine component.
86.4g (0.8mol), 3,4'-DDE 40.0g (0.2mol)
Then, 3000 g of N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP) was added, and the mixture was stirred well until the diamine was dissolved. After the diamine component was dissolved, the solution was cooled to 15 ° C or lower, and 223.6 g (0.76 mol) of BPDA, PMDA41.4
g (0.19 mol) and 14.8 g (0.1 mol) of phthalic anhydride were gradually added so that the temperature in the system did not exceed 15 ° C, and after the addition was completed, stirring was carried out at 20 ° C for 6 hours.

【0025】次いで、600gのNMP溶液に溶解した N,
N'-ジシクロヘキシルカルボジイミド 412.6gを8時間
かけてゆっくりと滴下した。滴下終了後、20℃で24時間
撹拌を行った。撹拌終了後、反応混合物を濾過し、ジシ
クロヘキシル尿素を除去した。得られた溶液は、メタノ
ール中に沈澱し、黄色のポリイソイミド粉末を得た。こ
の粉末50gを200gのジメチルホルムアミド(以下DM
Fと略す)に溶解し、ポリイソイミド溶液とした。
Then, N dissolved in 600 g of NMP solution,
412.6 g of N'-dicyclohexylcarbodiimide was slowly added dropwise over 8 hours. After completion of dropping, the mixture was stirred at 20 ° C. for 24 hours. After completion of stirring, the reaction mixture was filtered to remove dicyclohexylurea. The resulting solution was precipitated in methanol to give a yellow polyisoimide powder. 50 g of this powder was added to 200 g of dimethylformamide (hereinafter DM
(Abbreviated as F) to obtain a polyisoimide solution.

【0026】(実施例2)撹拌機、温度計、還流冷却管
を備えた4ッ口フラスコへ、ジアミン成分として、PP
D 75.6g(0.7モル)、4,4'-DDE 60.0g(0.3モ
ル)を加え、さらにNMPを3000g加え、ジアミンが溶
解するまでよく撹拌した。ジアミン成分が溶解した後、
溶液を15℃以下まで冷却し、BPDA 195.6g(0.66モ
ル)、PMDA 63.3g(0.29モル)、無水フタル酸 1
4.8g(0.1モル)を系内の温度が15℃を越えないように
徐々に添加し、添加終了後、20℃で6時間撹拌反応を行
った。
Example 2 A diamine component was added to a 4-necked flask equipped with a stirrer, a thermometer, and a reflux condenser as PP.
D 75.6 g (0.7 mol) and 4,4'-DDE 60.0 g (0.3 mol) were added, and NMP (3000 g) was further added, and the mixture was stirred well until the diamine was dissolved. After the diamine component is dissolved,
The solution was cooled to 15 ° C or lower, and BPDA 195.6g (0.66mol), PMDA 63.3g (0.29mol), phthalic anhydride 1
4.8 g (0.1 mol) was gradually added so that the temperature in the system did not exceed 15 ° C. After completion of the addition, stirring reaction was carried out at 20 ° C. for 6 hours.

【0027】次いで、600gのNMP溶液に溶解した N,
N'-ジシクロヘキシルカルボジイミド 412.6g(2モル)
を8時間かけてゆっくりと滴下した。滴下終了後、20℃
で24時間撹拌を行った。撹拌終了後、反応混合物を濾過
し、ジシクロヘキシル尿素を除去した。得られた溶液
は、メタノール中に沈澱し、黄色のポリイソイミド粉末
を得た。この粉末50gを200gのDMFに溶解し、ポリ
イソイミド溶液とした。
Next, N, dissolved in 600 g of NMP solution,
N'-dicyclohexylcarbodiimide 412.6 g (2 mol)
Was slowly added dropwise over 8 hours. 20 ° C after dropping
The mixture was stirred for 24 hours. After completion of stirring, the reaction mixture was filtered to remove dicyclohexylurea. The resulting solution was precipitated in methanol to give a yellow polyisoimide powder. 50 g of this powder was dissolved in 200 g of DMF to obtain a polyisoimide solution.

【0028】(比較例1)撹拌機、温度計、還流冷却管
を備えた4ッ口フラスコへ、ジアミン成分として、PP
D 86.4g(0.8モル)、3,4'-DDE 40.0g(0.2モ
ル)を加え、さらにNMPを3000g加え、ジアミンが溶
解するまでよく撹拌した。ジアミン成分が溶解した後、
溶液を15℃以下まで冷却し、BPDA 223.6g(0.76モ
ル)、PMDA 41.4g(0.19モル)、無水フタル酸 1
4.8g(0.1モル)を系内の温度が15℃を越えないように
徐々に添加し、添加終了後、20℃で6時間撹拌を行い反
応を終了した。
Comparative Example 1 A 4-necked flask equipped with a stirrer, a thermometer and a reflux condenser was charged with PP as a diamine component.
D 86.4 g (0.8 mol) and 3,4′-DDE 40.0 g (0.2 mol) were added, and NMP (3000 g) was further added, and the mixture was stirred well until the diamine was dissolved. After the diamine component is dissolved,
The solution was cooled to 15 ° C or lower, and 223.6 g (0.76 mol) of BPDA, 41.4 g (0.19 mol) of PMDA, and phthalic anhydride 1
4.8 g (0.1 mol) was gradually added so that the temperature in the system did not exceed 15 ° C, and after the addition was completed, the reaction was completed by stirring at 20 ° C for 6 hours.

【0029】(比較例2)撹拌機、温度計、還流冷却管
を備えた4ッ口フラスコへ、ジアミン成分として、PP
D 108.1g(1.0モル)を加え、NMPを3000g加え、
ジアミンが溶解するまでよく撹拌した。ジアミン成分が
溶解した後、溶液を15℃以下まで冷却し、BPDA 27
9.3g(0.95モル)、無水フタル酸 14.8g(0.1モル)
を系内の温度が15℃を越えないように徐々に添加し、添
加終了後、20℃で6時間撹拌を行った。
Comparative Example 2 A 4-necked flask equipped with a stirrer, a thermometer and a reflux condenser was charged with PP as a diamine component.
D 108.1 g (1.0 mol) was added, NMP was added 3000 g,
Stir well until the diamine has dissolved. After the diamine component has dissolved, the solution is cooled to 15 ° C or lower and BPDA 27
9.3g (0.95mol), phthalic anhydride 14.8g (0.1mol)
Was gradually added so that the temperature in the system did not exceed 15 ° C, and after completion of the addition, stirring was carried out at 20 ° C for 6 hours.

【0030】次いで、600gのNMP溶液に溶解した N,
N'-ジシクロヘキシルカルボジイミド 412.6gを8時間
かけてゆっくりと滴下した。滴下終了後、20℃で24時間
撹拌を行った。撹拌終了後、反応混合物を濾過し、ジシ
クロヘキシル尿素を除去した。得られた溶液は、メタノ
ール中に沈澱し、黄色のポリイソイミド粉末を得た。こ
の粉末50gを200gのDMFに溶解し、ポリイソイミド
溶液とした。
Then, N dissolved in 600 g of NMP solution,
412.6 g of N'-dicyclohexylcarbodiimide was slowly added dropwise over 8 hours. After completion of dropping, the mixture was stirred at 20 ° C. for 24 hours. After completion of stirring, the reaction mixture was filtered to remove dicyclohexylurea. The resulting solution was precipitated in methanol to give a yellow polyisoimide powder. 50 g of this powder was dissolved in 200 g of DMF to obtain a polyisoimide solution.

【0031】(比較例3)撹拌機、温度計、還流冷却管
を備えた4ッ口フラスコへ、ジアミン成分として、PP
D 43.3g(0.4モル)、3,4'-DDE 120.1g(0.6モ
ル)を加え、さらにNMPを3000g加え、ジアミンが溶
解するまでよく撹拌した。ジアミン成分が溶解した後、
溶液を15℃以下まで冷却し、BPDA 111.8g(0.38モ
ル)、PMDA 124.3g(0.57モル)、無水フタル酸 1
4.8g(0.1モル)を系内の温度が15℃を越えないように
徐々に添加し、添加終了後、20℃で6時間撹拌を行っ
た。
COMPARATIVE EXAMPLE 3 A 4-necked flask equipped with a stirrer, a thermometer and a reflux condenser was charged with PP as a diamine component.
D 43.3 g (0.4 mol) and 3,4'-DDE 120.1 g (0.6 mol) were added, and further NMP 3000 g was added, and the mixture was stirred well until the diamine was dissolved. After the diamine component is dissolved,
The solution was cooled to 15 ° C or below, and BPDA 111.8g (0.38mol), PMDA 124.3g (0.57mol), phthalic anhydride 1
4.8 g (0.1 mol) was gradually added so that the temperature in the system did not exceed 15 ° C, and after completion of the addition, stirring was carried out at 20 ° C for 6 hours.

【0032】次いで、600gのNMP溶液に溶解した N,
N'−ジシクロヘキシルカルボジイミド 412.6gを8時間
かけてゆっくりと滴下した。滴下終了後、20℃で24時間
撹拌を行った。撹拌終了後、反応混合物を濾過し、ジシ
クロヘキシル尿素を除去した。得られた溶液は、メタノ
ール中に沈澱し、黄色のポリイソイミド粉末を得た。こ
の粉末50gを200gのDMFに溶解し、ポリイソイミド
溶液とした。
Then, N dissolved in 600 g of NMP solution,
412.6 g of N'-dicyclohexylcarbodiimide was slowly added dropwise over 8 hours. After completion of dropping, the mixture was stirred at 20 ° C. for 24 hours. After completion of stirring, the reaction mixture was filtered to remove dicyclohexylurea. The resulting solution was precipitated in methanol to give a yellow polyisoimide powder. 50 g of this powder was dissolved in 200 g of DMF to obtain a polyisoimide solution.

【0033】以上、実施例1,2、比較例1,2,3で
合成したポリイソイミド溶液を銅箔上に、イミド化後の
厚みが25μmになるようにスピンナーで塗布し、100
℃、1時間、150℃、30分(比較例1については熱イミ
ド化を完結するために350℃、30分加熱)硬化を行い、
片面2層フレキシブル印刷回路用基板を得た。
As described above, the polyisoimide solutions synthesized in Examples 1 and 2 and Comparative Examples 1, 2 and 3 were applied onto a copper foil with a spinner so that the thickness after imidization was 25 μm, and 100
C., 1 hour, 150.degree. C., 30 minutes (for Comparative Example 1, heating at 350.degree. C. for 30 minutes to complete thermal imidization)
A single-sided two-layer flexible printed circuit board was obtained.

【0034】得られた2層フレキシブル印刷回路用基板
を2枚フィルム面を内側にして貼り合わせ、350℃、50k
g、15分、加熱・圧着を行ない、両面フレキシブル印刷
回路用基板を得た。得られた両面フレキシブル印刷回路
用基板のピール強度、半田耐熱性、および寸法変化率の
値を表1に示す。
Two pieces of the obtained two-layer flexible printed circuit board were pasted together with the film side inside, and 350 ° C., 50 k
After heating and pressure bonding for 15 minutes, a double-sided flexible printed circuit board was obtained. Table 1 shows the values of peel strength, solder heat resistance, and dimensional change rate of the obtained double-sided flexible printed circuit board.

【0035】[0035]

【表1】 [Table 1]

【0036】本発明の方法によるものはいずれも優れた
特性を示すが、イソイミド化していない比較例1では、
ピール強度が充分でなく、PMDA、DDEを用いない
比較例2も同様であった。またPMDA、DDEの使用
量が多すぎる比較例3では、寸法変化が大きく、基板と
して不適当であった。
Although all of the products prepared by the method of the present invention have excellent properties, in Comparative Example 1 in which no imidization was carried out,
The peel strength was not sufficient, and the same was true for Comparative Example 2 in which PMDA and DDE were not used. Further, in Comparative Example 3 in which the amount of PMDA or DDE used was too large, the dimensional change was large and it was not suitable as a substrate.

【0037】[0037]

【発明の効果】本発明によれば、接着剤層を有しない両
面フレキシブル印刷回路用基板を得ることができる。さ
らに、特定のポリイソイミドを用いることによりイミド
化完結後も他の特性を損なうことなく、寸法変化率の低
下及びカール発生の低減等の効果も得ることができた。
本発明は、連続シートを用いたフレキシブル印刷回路基
板の連続工程にも容易に適用できるなど、工業的なフレ
キシブル印刷回路用基板の製造方法として好適なもので
ある。
According to the present invention, a double-sided flexible printed circuit board having no adhesive layer can be obtained. Furthermore, by using a specific polyisoimide, it is possible to obtain effects such as a reduction in the dimensional change rate and a reduction in curling without impairing other properties even after the completion of imidization.
INDUSTRIAL APPLICABILITY The present invention can be easily applied to a continuous process of a flexible printed circuit board using a continuous sheet, and is suitable as an industrial method for manufacturing a flexible printed circuit board.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 3,3',4,4'-ビフェニルテトラカルボン酸
二無水物(以下BPDAと略す)とピロメリット酸二無
水物(以下PMDAと略す)とのモル比(BPDA:P
MDA)が90:10〜50:50である芳香族カルボン酸二無
水物成分と、パラ-フェニレンジアミン(以下PPDと
略す)、4,4'-ジアミノジフェニルエーテル(以下4,4'-
DDEと略す)、3,4'-ジアミノジフェニルエーテル
(以下3,4'-DDEと略す)の3種の芳香族ジアミンの
うち、PPD:4,4'-DDE及び/又は3,4'-DDEのモ
ル比が90:10〜50:50である芳香族ジアミン成分とを、
該ジアミン成分が両末端を形成し、該両末端がジカルボ
ン酸無水物及び/又はその誘導体で封止されたポリアミ
ック酸をイソイミド化したポリイソイミドを導体箔上に
フィルム状に形成させ、次いでポリイソイミドフィルム
面同士を合わせて又はポリイソイミドフィルム面に導体
箔を合わせて加熱・圧着し、イミド化した両面フレキシ
ブル印刷回路用基板の製造方法。
1. A molar ratio (BPDA: P) of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (hereinafter abbreviated as BPDA) and pyromellitic dianhydride (hereinafter abbreviated as PMDA).
Aromatic carboxylic dianhydride component having MDA of 90:10 to 50:50, para-phenylenediamine (hereinafter abbreviated as PPD), 4,4'-diaminodiphenyl ether (hereinafter 4,4'-
PDE: 4,4'-DDE and / or 3,4'-DDE among three aromatic diamines of DDE) and 3,4'-diaminodiphenyl ether (abbreviated as 3,4'-DDE below) An aromatic diamine component having a molar ratio of 90:10 to 50:50,
The diamine component forms both ends, and polyisoimide obtained by isoimidating polyamic acid whose both ends are sealed with dicarboxylic acid anhydride and / or its derivative is formed into a film on a conductor foil, and then polyisoimide is formed. A method for producing a double-sided flexible printed circuit board, which is formed by imidizing the film surfaces with each other or with a conductor foil on the polyisoimide film surface, followed by heating and pressure bonding.
JP26568991A 1991-10-15 1991-10-15 Method for manufacturing substrate for double-sided flexible printed circuit Expired - Fee Related JP2612118B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26568991A JP2612118B2 (en) 1991-10-15 1991-10-15 Method for manufacturing substrate for double-sided flexible printed circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26568991A JP2612118B2 (en) 1991-10-15 1991-10-15 Method for manufacturing substrate for double-sided flexible printed circuit

Publications (2)

Publication Number Publication Date
JPH05110216A true JPH05110216A (en) 1993-04-30
JP2612118B2 JP2612118B2 (en) 1997-05-21

Family

ID=17420641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26568991A Expired - Fee Related JP2612118B2 (en) 1991-10-15 1991-10-15 Method for manufacturing substrate for double-sided flexible printed circuit

Country Status (1)

Country Link
JP (1) JP2612118B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1017258A2 (en) * 1998-12-28 2000-07-05 Sony Chemicals Corp. Method for manufacturing double-sided flexible printed board
JP2010053322A (en) * 2008-08-29 2010-03-11 Arisawa Mfg Co Ltd Polyamic acid and non-thermoplastic polyimide resin

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1017258A2 (en) * 1998-12-28 2000-07-05 Sony Chemicals Corp. Method for manufacturing double-sided flexible printed board
EP1017258A3 (en) * 1998-12-28 2002-06-12 Sony Chemicals Corp. Method for manufacturing double-sided flexible printed board
US6705007B1 (en) 1998-12-28 2004-03-16 Sony Chemicals Corp. Method for manufacturing double-sided flexible printed board
US7213334B2 (en) 1998-12-28 2007-05-08 Sony Corporation Method for manufacturing double-sided flexible printed board
JP2010053322A (en) * 2008-08-29 2010-03-11 Arisawa Mfg Co Ltd Polyamic acid and non-thermoplastic polyimide resin

Also Published As

Publication number Publication date
JP2612118B2 (en) 1997-05-21

Similar Documents

Publication Publication Date Title
US20050100719A1 (en) Multilayer substrates having at least two dissimilar polyimide layers, useful for electronics-type applications, and compositions relating thereto
JP5251508B2 (en) Heat-resistant film metal foil laminate and method for producing the same
JPH0231516B2 (en)
KR20010082630A (en) Laminate comprising polyimide and conductor layer, multi-layer wiring board with the use of the same and process for producing the same
WO1992016970A1 (en) Method of manufacturing two-layer tab tape
JP3167421B2 (en) Polyamic acid film
JPH05105755A (en) Polyisoimide and its film
JP2729063B2 (en) Method of manufacturing flexible metal foil laminate
JP2612118B2 (en) Method for manufacturing substrate for double-sided flexible printed circuit
JPH11157026A (en) Laminate and manufacture thereof
EP0270672B1 (en) Flexible copper-clad circuit board
JP3059248B2 (en) Manufacturing method of flexible printed circuit board
JP3805546B2 (en) Manufacturing method of heat-resistant bonding sheet
JP2653582B2 (en) Polyimide film having a polyamic acid layer on the surface having openings and flexible printed circuit board or circuit board using the same
JP2653583B2 (en) Polyimide film having a polyamic acid layer on its surface and substrate for flexible printed circuit using the same
JP3065388B2 (en) Manufacturing method of flexible printed circuit board
JPH04266082A (en) Manufacture of flexible wiring substrate
JP2001139807A (en) Method of manufacturing heat-resistant bonding sheet
JPH066359B2 (en) Printed circuit board
JPH04334088A (en) Manufacture of flexible printed circuit board
JP2954387B2 (en) Two-layer double-sided TAB tape and manufacturing method thereof
JP2672906B2 (en) Polyamic acid film
JP2633999B2 (en) Method for manufacturing two-layer TAB tape
JPH04334087A (en) Manufacture of flexible board for printed circuit
JPH05105777A (en) Polyisoimide film and production of substrate for flexible printed circuit with the same

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees