JPH0510815B2 - - Google Patents

Info

Publication number
JPH0510815B2
JPH0510815B2 JP59143465A JP14346584A JPH0510815B2 JP H0510815 B2 JPH0510815 B2 JP H0510815B2 JP 59143465 A JP59143465 A JP 59143465A JP 14346584 A JP14346584 A JP 14346584A JP H0510815 B2 JPH0510815 B2 JP H0510815B2
Authority
JP
Japan
Prior art keywords
projection
wafer
optical system
exposure apparatus
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59143465A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6122626A (ja
Inventor
Masao Kosugi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59143465A priority Critical patent/JPS6122626A/ja
Priority to US06/753,258 priority patent/US4682037A/en
Publication of JPS6122626A publication Critical patent/JPS6122626A/ja
Publication of JPH0510815B2 publication Critical patent/JPH0510815B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59143465A 1984-07-10 1984-07-10 投影露光装置 Granted JPS6122626A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59143465A JPS6122626A (ja) 1984-07-10 1984-07-10 投影露光装置
US06/753,258 US4682037A (en) 1984-07-10 1985-07-09 Projection exposure apparatus having an alignment light of a wavelength other than that of the exposure light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59143465A JPS6122626A (ja) 1984-07-10 1984-07-10 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6122626A JPS6122626A (ja) 1986-01-31
JPH0510815B2 true JPH0510815B2 (enExample) 1993-02-10

Family

ID=15339335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59143465A Granted JPS6122626A (ja) 1984-07-10 1984-07-10 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6122626A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2707541B2 (ja) * 1986-10-24 1998-01-28 株式会社ニコン 感光基板のアライメント方法
JP4961696B2 (ja) 2005-08-12 2012-06-27 Ｊｆｅスチール株式会社 ２ピース缶の製造方法および２ピースラミネート缶
JP4692147B2 (ja) 2005-08-12 2011-06-01 Ｊｆｅスチール株式会社 ２ピース缶の製造方法および２ピースラミネート缶
JP4692146B2 (ja) 2005-08-12 2011-06-01 Ｊｆｅスチール株式会社 ２ピース缶の製造方法および２ピースラミネート缶

Also Published As

Publication number Publication date
JPS6122626A (ja) 1986-01-31

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