JPH05107730A - Mask material - Google Patents

Abstract

PURPOSE:To form a light shielding coloring layer in a short time and to speedily cope with correction just in, case by forming the light shielding coloring layer by a fusion type thermal transfer system on a transparent base on the side of the peeling layer of a receiving sheet provided with the peeling layer. CONSTITUTION:On the transparent base 1, the light shielding coloring layer 4 is formed on the side of the peeling layer 2 of the receiving sheet 3 provided with at least the peeling layer 2. The light shielding coloring layer 4 cuts off a light beam having wavelength to which a photosensitive material is exposed. When the light shielding coloring layer 4 is formed by the fusion type thermal transfer system, a thermal transfer material which has a heat-fusible layer, containing a light shielding coloring agent, on a base is heated by a heating means such as a thermal head to transfer the light shielding coloring layer onto the receiving sheet, thus forming a mask material. Thus, the light shielding coloring layer 4 is formed on the side of the peeling layer 2 of the receiving sheet 3 and then the light shielding coloring layer 4 which is transferred can be peeled even for correction by the peeling layer 2, thereby speedily performing the correction.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask material capable of blocking light rays having a photosensitizing effect on a light-sensitive material, and is used, for example, as a light-shielding mask material for printing photolithography.

[0002]

2. Description of the Related Art Conventionally used light-shielding mask materials include, for example, those disclosed in Japanese Patent Publication No. 58-46011 and Japanese Patent Publication No. 62-28464. That is, the light-shielding mask material is a light-shielding mask film in which a light-shielding coating layer is formed on a transparent film support such as a polyethylene terephthalate film in a printing photomechanical process. The coating layer of this light-shielding mask film is cut into a predetermined mask pattern with an automatic drawing machine, a cutter, etc., and then unnecessary portions that do not need light-shielding are peeled off by hand to form a light-shielding mask for printing photoengraving. Creating.

[0003]

However, in the method for producing a light-shielding mask for printing photoengraving using the above-mentioned light-shielding mask film, after the light-shielding coating layer formed by coating is cut into a predetermined mask pattern, , The unnecessary portion of the light-shielding coating layer is lifted from the support by using a blade of a cutter or the like, and the coating layer is peeled off. Therefore, the light-shielding coating layer itself needs a certain degree of rigidity and strength. The layer thickness is
There is a defect that the thickness becomes thicker than 20 μm, and baking blur easily occurs in the cut portion.

Further, since the coating film is thick and has a peeling property, there is a drawback that when a unnecessary portion is peeled off, a necessary portion is easily caught and peeled off.

Further, most of the work for peeling off the unnecessary portion of the light-shielding coating film formed as a coating film relies on manual work. For this reason, peeling mistakes occur,
There was a drawback that it took a long time to peel off. Further, there is a drawback that the peeled film is easily reattached to the light-shielding mask film or attached to a fingertip or another film. Further, in a situation where the manpower shortage has become serious in recent years, the peeling work, which relies mostly on the manual work, has become a particularly important problem.

Therefore, for the purpose of solving the above problems, a method of forming a mask using a heat transfer light shielding material is
JP-A-3-121454 and JP-A-3-12145
No. 5, for example. However, in the methods described in these publications, it is impossible to peel off only the transferred light-shielding colored layer in the case where an error or correction occurs in the mask once created, and therefore, it is necessary to recreate the mask. The light-shielding colored layer must be scraped off with a cutter or the support must be cut off.

When the mask is recreated again, extra material cost and mask creation time are required. Further, when the light-shielding colored layer is scraped off with a cutter or the like, the support of the correction portion is damaged, and it becomes unusable as a mask in the printing plate making process. If the correction portion is cut out together with the support, there are disadvantages that the corrected portion is blurred and the exposed image has a blank portion called “sticking mark”.

The present invention has been made in view of the above-mentioned circumstances, and can be formed in a short time, with few mistakes, with little manual labor, and can be quickly responded to any correction. Is intended to provide.

[0009]

In order to solve the above-mentioned problems, the mask material of the invention according to claim 1 is a light-shielding material which is provided on a release layer side of a receiving sheet comprising at least a release layer provided on a transparent support. The characteristic coloring layer is formed by a fusion type thermal transfer method.

In the mask material according to the second aspect of the present invention, a light-shielding colored layer is formed by a sublimation type thermal transfer system on the release layer side of a receiving sheet having at least a release layer provided on a transparent support. Is characterized by.

The mask material according to the third aspect of the present invention is characterized in that a light-shielding colored layer is formed by an inkjet method on the release layer side of a receiving sheet having at least a release layer provided on a transparent support. I am trying.

Further, in the mask material of the present invention, a light-shielding colored layer is formed by an electrophotographic method on the release layer side of a receiving sheet having at least a release layer on a transparent support. It has a feature.

As described above, in the mask material according to the first to fourth aspects of the invention, as shown in the layer structure diagram of the mask material in FIG. 1, at least the peeling layer 2 is provided on the transparent support 1. The light-shielding colored layer 4 is provided on the side of the release layer 2 of the receiving sheet 3.
Is formed.

The transparent support of the receiving sheet is preferably a plastic film having a transmittance of 50% or more at least at 350 nm to 600 nm. Polyethylene terephthalate, polybutylene terephthalate, polyesters such as polyoxybenzoate, polycarbonate, films of vinyl chloride and the like can be used. In particular, a transparent polyethylene terephthalate film with little expansion and contraction is preferable. A preferable film thickness is 25 to 750 μm, and a film thickness of 50 to 250 μm is particularly suitable. The term "transparent" as used herein means that 80% or more, and more preferably 90% or more, of light having a wavelength in the photosensitive wavelength range of a target photosensitive material is transmitted.

The release layer of the receiving sheet is laminated on the above-mentioned transparent support and has a weak adhesiveness with the transparent support and is easily peeled off, or the release layer itself has a weak strength. The layer can undergo cohesive failure during peeling.

Specific examples of forming such a release layer include, for example, vinyl acetate-ethylene copolymer, vinyl chloride-ethylene copolymer, vinyl chloride-vinyl acetate-ethylene copolymer, polyacrylic ester, Polymethacrylic acid ester, polyester, polyurethane, polyethylene, polybutadiene, polyisobutylene, polypropylene, polystyrene-butadiene, polystyrene, polychloroprene, vinylidene chloride-acrylonitrile copolymer, alkoxyalkylated nylon, polytetrafluoroethylene (Teflon), polydimethyl Siloxane (silicon), butyl rubber, natural rubber, hydrogenated polybutadiene, butadiene-styrene copolymer, nitrile rubber, polysulfide (thiol rubber), polyvinylidene chloride, polymethac Ronitoriru, mention may be made of polyacrylonitrile.

It is also possible to use a latex of the above compound. Vinyl acetate-ethylene copolymer latex, vinyl chloride-ethylene copolymer latex, vinyl chloride-vinyl acetate-ethylene copolymer latex, polyacrylic acid ester latex, polymethacrylic acid ester latex, polyester resin latex, polyurethane resin latex It is preferably used.

As a material for forming a layer which is peeled off by cohesive failure, waxes such as carnauba wax, polyethylene wax and paraffin wax are used alone or as a mixture with the above resins.

These compounds include pentane, hexane,
It is coated on a support by dispersing or dissolving it in a solvent such as octane, isooctane, cyclohexane, carbon tetrachloride, xylene, toluene, ethyl acetate, methyl ethyl ketone, methanol, ethanol, water.

The release layer must, of course, be transparent for that purpose. The thickness of the release layer is 0.1 to 50 μm,
The thickness is more preferably 2 to 30 μm, and particularly preferably 20 μm or less in order to prevent burning blurring in the corrected portion after correction. If desired, a transparent image-receiving layer for a light-shielding colored layer may be provided as an upper layer of the peeling layer.

The light-shielding colored layer can shield light rays having a wavelength that sensitizes the light-sensitive material. When used as a mask for printing photoengraving, a mask that absorbs and blocks light having a wavelength in the range of 300 to 500 nm to 1% or less is preferable.

When used as a mask for printing on a color light-sensitive material, it is preferable to absorb and block light having a wavelength in the range of 300 to 800 nm to 0.7% or less.
In this case, it is possible to make the color light-sensitive material have a transmittance in the wavelength range of 550 to 660 nm in the green part, which is generally not spectrally sensitive. When used as a mask for a color light-sensitive material, a mask having a light-shielding property that matches each spectral light-sensitized wavelength range can be used to form a full-color image.

When the light-shielding colored layer is formed by the fusion type thermal transfer method, the heat transfer material having the heat-melting layer containing the light-shielding colorant on the support is heated by a heating means such as a thermal head. Thereby, the light-shielding colored layer is transferred onto the receiving sheet to form a mask material.

As such a light-shielding thermal transfer material, there are JP-A-3-121454, JP-A-2-79850, JP-A-3-72352, and JP-A-3-265.
Examples thereof are listed in Japanese Patent Laid-Open No. 94, etc., but the invention is not limited thereto, and those prepared by including a light-shielding colorant as a colorant in an ink layer of a known fusion type thermal transfer material are known. Can be used.

In the case of the sublimation type thermal transfer system, a thermal transfer material having a colored layer containing a sublimable light-shielding dye on a support is heated by a heating means such as a thermame head to sublimate the dye and transfer it to a receiving sheet. Form the mask material.

In the case of the ink jet system, the light-shielding colored layer is formed on the receiving sheet by spraying the ink containing the light-shielding dye from the nozzle.

In the electrophotographic system, toner particles containing a light-shielding coloring material are used to form an image. The toner may be a granular toner and may be in the form of a liquid developer in which toner particles are dispersed in an insulating solvent.

In the case of the electrophotographic system, the receiving sheet itself having the release layer can be used as the photoreceptor.

General examples of the above-mentioned recording materials and recording methods can be found in "Photographic Industry Separate Volume Imaging Part 3" and "Non-Impact Printing-Technology and Materials-".

[0030]

According to the mask material of the present invention, the light-shielding colored layer is formed on the release layer side of the receiving sheet in which at least the release layer is provided on the transparent support. This peeling layer can peel off only the light-shielding colored layer that has been transferred even in the unlikely event of a correction, so that quick response can be made.

Further, by forming the shape light-shielding colored layer on the release layer side of the receiving sheet by a fusion type heat transfer method, a sublimation type heat transfer method, an ink jet method, or an electrophotographic method, the shape can be shortened in a short time with few mistakes. Mask materials can be created without much manual labor.

[0032]

EXAMPLES Next, the mask material of the present invention will be described more specifically by way of examples, but the present invention is not limited to these examples.

Example 1 [Preparation of Receiving Sheet] A 75 μm thick polyethylene terephthalate film was coated with a release layer coating solution prepared according to the following formulation using a wire bar and dried. The thickness of the release layer after drying was 8 μm.

Sumikaflex 850 (Sumitomo Chemical Co., Ltd.) 20 parts by weight (vinyl chloride-vinyl acetate-ethylene copolymer latex) Water 80 parts by weight [Preparation of melting type thermal transfer light-shielding material] The following composition was mixed. Then, the release agent layer coating liquid was prepared.

90 parts by weight of WAX-V (manufactured by Hoechst; octadecyl alcohol-polyvinyl ether) 10 parts by weight of bondine AX-8060 (ethylene-ethyl acrylate resin-substituted phthalic anhydride) The following compositions were mixed in a sand mill, A molten type light-shielding colored layer coating liquid was prepared.

Varifast Red 3306 55 parts by weight (Orient dye, red dye) Hariestar DS-90 20 parts by weight (Rosin-based tackifier) Spravar AP-30 15 parts by weight (styrene maleic acid resin) Evaflex EV-40Y 5 parts by weight (ethylene-vinyl acetate resin) Desmocol 400 5 parts by weight (urethane resin) A 4.5 μm thick polyethylene terephthalate film (Toray, 5AF531) having a heat-resistant layer on the back surface was coated with a release agent layer coating liquid. Then, the coating was applied using a wire bar so that the dry film thickness was 0.4 μm.

After the release agent layer was dried, the melt-type light-shielding colored layer coating solution was applied using a wire bar so that the dry film thickness was 1.8 μm to prepare a melt-type heat transfer light-shielding material. [Production of Mask Material] A mask pattern was output using a thermal transfer printer CH5514 manufactured by Seiko Denshi. Make a cut in the output mask with a cutter,
When it was peeled off, it could be peeled off easily.

Comparative Example 1 As a receiving sheet, a 75 μm-thick polyethylene teraphthalate film was coated with a coating solution for the image-receiving layer having the following composition using a wire bar so as to have a dry thickness of 0.5 μm.
Dried.

Polyvinyl acetate 20 parts by weight Methyl ethyl ketone 70 parts by weight Ethyl acetate 10 parts by weight Using this receiving sheet and the melting type heat transfer light shielding material used in Example 1, a mask material was prepared in the same manner as in Example 1. did.

Make a notch in the mask with a cutter,
I tried to peel it off, but it did not peel easily and I had to scrape it off with a cutter.

Example 2 [Preparation of Receiving Sheet] A polyethylene terephthalate film having a thickness of 75 μm was coated with a release layer coating solution prepared by the following formulation using a wire bar and dried. The thickness of the release layer after drying was 10 μm.

Movinyl 190E 20 parts by weight (Hoechst Synthetic, vinyl chloride-vinyl acetate-ethylene copolymer latex) Nipol LX855 5 parts by weight (Nippon Zeon, polyacrylate ester latex) water 75 parts by weight An image receiving layer coating solution having the following composition was applied onto the layer using a wire bar and dried. The dry thickness of the image receiving layer was 5 μm.

Vinylite VYHH 25 parts by weight (Union Carbide, vinyl chloride-vinyl acetate copolymer) Methyl ethyl ketone 50 parts by weight Toluene 25 parts by weight [Preparation of sublimation type thermal transfer material] MS Red G 10 parts by weight Phoron Brilliant Yellow S- 6GL 5 parts by weight Polyvinyl chloride resin 5 parts by weight S-Rex BX-1 5 parts by weight (Sekisui Chemical Co., Ltd., polyvinyl butyral) Methyl ethyl ketone 40 parts by weight Toluene 35 parts by weight [Preparation of mask material] Prepared as described above. Using the receiving sheet and the sublimable thermal transfer light-shielding material, a mask material was prepared by heating from the back side of the light-shielding material using a thermal head. When the mask that was output was cut with a cutter and peeled off, it could be peeled off easily.

Comparative Example 2 A mask pattern was prepared in the same manner as in Example 2 by using as the receiving sheet a sheet having a 75 μm thick polyethylene terephthalate film directly provided with the image receiving layer used in Example 2.

Make a cut in this mask with a cutter,
I tried to peel it off, but it did not peel easily, and I had to scrape off the entire image receiving layer with a cutter.

Example 3 [Preparation of Receiving Sheet] A 100 μm thick polyethylene terephthalate film was coated with a release layer coating solution prepared by the following formulation using a wire bar and dried. The thickness of the release layer after drying was 16 μm.

Sumika Flex 850 30 parts by weight (Sumitomo Chemical Co., Ltd., vinyl chloride-vinyl acetate-ethylene copolymer latex) Polyacrylate ester particles (average particle size 0.3 μm) 25 parts by weight Water 42 parts by weight [for inkjet Preparation of Ink] An oil-soluble inkjet ink having the following composition was prepared.

Varifast Red 3306 18 parts by weight (Red dye manufactured by Orient) Diethyl phthalate 25 parts by weight Diethyl adipate 40 parts by weight Dipropylene glycol monomethyl ether 17 parts by weight Electrostatic force pulse application type inkjet head is added to the above-mentioned receiving sheet. Using, a mask pattern was recorded by inkjet recording.

The transmission density of the light-shielding portion of the created mask is
It was 2.05 at 370 nm. When a notch was made on this mask with a cutter and peeled off, it was peeled off on the receiving side and no scratch was left.

Comparative Example 3 A mask was prepared by ink jet recording in the same manner as in Example 3 using a receiving sheet obtained by applying a coating solution for the image receiving layer having the following composition with a wire bar to a dry thickness of 16 μm and drying. ..

Polyacrylonitrile butadiene 30 parts by weight Polyacrylic acid ester particles (average particle size 0.3 μm) 25 parts by weight Water 45 parts by weight The prepared mask could not be peeled off even if a cut was made by a cutter.

Example 4 [Preparation of Receptor Sheet] A 75 μm thick polyethylene terephthalate film was coated with a release layer coating solution prepared according to the following formulation using a wire bar and dried. The thickness of the release layer after drying was 15 μm.

30 parts by weight of Sumikaflex 850 (manufactured by Sumitomo Chemical Co., Ltd., vinyl chloride-vinyl acetate, ethylene copolymer latex) 70 parts by weight of water [Making mask] Using U-Bix3035 dry copying machine manufactured by Konica Corporation A mask was created by copying an original having a mask pattern. The produced mask had sufficient peelability.

Comparative Example 4 A mask was prepared in the same manner as in Example 4 using a commercially available OHP sheet for PPC (KOKUYO VF-1) as the receiving sheet. The created mask could not be peeled off even if it was cut with a cutter.

[0055]

As described above, the mask material of the present invention according to any one of claims 1 to 4 is a receiving sheet comprising a transparent support and at least a releasing layer provided on the releasing layer side of the receiving sheet. Since the light-shielding colored layer is formed on the substrate, only the light-shielding colored layer transferred by the peeling layer can be peeled off even in the unlikely event of a correction, and the correction can be performed promptly.

Further, by forming the shape light-shielding colored layer on the release layer side of the receiving sheet by the fusion type heat transfer method, the sublimation type heat transfer method, the ink jet method or the electrophotographic method, the shape can be shortened in a short time with few mistakes. Mask materials can be created without much manual labor.

[Brief description of drawings]

FIG. 1 is a layer configuration diagram of a mask material.

[Explanation of symbols]

 1 Transparent Support 2 Release Layer 3 Receiving Sheet 4 Light-Shielding Colored Layer

Claims (4)

[Claims] 1. A mask material, characterized in that a light-shielding colored layer is formed by a fusion type thermal transfer system on the release layer side of a receiving sheet having at least a release layer provided on a transparent support. 2. A mask material, characterized in that a light-shielding colored layer is formed by a sublimation type thermal transfer system on the release layer side of a receiving sheet having at least a release layer provided on a transparent support. 3. A mask material, characterized in that a light-shielding colored layer is formed by an inkjet method on the release layer side of a receiving sheet having at least a release layer provided on a transparent support. 4. A mask material, characterized in that a light-shielding colored layer is formed by an electrophotographic method on the release layer side of a receiving sheet having at least a release layer provided on a transparent support.