JPH051074Y2 - - Google Patents

Description

[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a drain drying device for removing and drying water droplets adhering to the surface of a semiconductor material such as a silicon wafer or a glass photomask by centrifugal force.

BRIEF DESCRIPTION OF THE PRIOR ART Draining and drying devices of this type include a rotating rotor and a casing surrounding it, the carrier containing the semiconductor material to be dried being set on a support located in a relatively outer area on the rotor. . , an intake port is provided in the upper lid placed on the casing, and an exhaust port is provided in the peripheral wall of the casing. As the rotor rotates, gas, such as air, is introduced into the main body through the intake port, flows circumferentially within the casing, and is discharged from the exhaust port. Water droplets on the surface of the semiconductor material are blown towards the peripheral wall of the casing by centrifugal force and are dried by the air stream.

(Problem to be solved by the invention) The support part of such a drain dryer is pivoted with a pin, etc., and can be moved from a horizontal position to a vertical position by approximately 90 degrees.
It is configured to be pivoted by degrees so that it is horizontal when the carrier is installed or removed, and vertical due to centrifugal force when the rotor is rotated. and,
In the conventional technology, the removal of the carrier was carried out by a robot that leveled the supporting part and held it in that state.The mechanism was complicated, and the semiconductor material after drying was damaged by the dust generated in the mechanical part of the robot. There was a problem with contamination.

The purpose of the present invention is to solve the above-mentioned problems, and therefore, to provide a draining and drying device that can level the support part with a simple mechanism and prevent it from being contaminated by dirt generated in the mechanism part. It is to provide.

The feature of the present invention is that, in order to achieve the above object, the main shaft of the rotor is made hollow, a rod is passed through it, and an arm attached to the upper end of the rod is brought into contact with a protrusion protruding downward from the support of the carrier. This was done to make it horizontal.

(Example) Next, an example of the present invention will be described with reference to the drawings. The figure shows an embodiment of the present invention, in which 1 is a rotor, 2 is a main shaft that supports the rotor, and the rotor 1 is driven by a motor (not shown) via the main shaft 2. be rotated. Rotor 1
is surrounded by a casing 3, on which a suitable number of supports 4 are provided in a relatively outer area. Exhaust port 5 at an appropriate position on the peripheral wall of the casing
There is. Preferably, guide vanes 7 are placed on the bottom plate 6 of the casing.

A top cover 8 is installed on top of the casing 3, and an intake port 9 is formed in the center of the top cover 8. In the figure, 10 is a sealing material that seals between the upper lid 8 and the upper surface of the casing 3, and 11 is an annular guide provided around the intake port 9.

As clearly shown in FIGS. 2 and 4, the feature of the drain drying device according to the present invention is that a hollow shaft is used as the main shaft 2, and a rod 12 is passed through the hollow shaft.
A suitable number of arms 13 are provided at the upper end of the rod 12, and as the rod 12 rises, each arm 13 comes into contact with a corresponding part of the support section 4. Therefore, the number of arms 13 is the same as the number of supports 4. As shown in FIG. 4, the portion of the support portion 4 that receives the abutment of the arm 13 is a projecting piece that projects downward from the bottom of the support portion 4. Note that "downward" here includes diagonally downward. It should be noted that while the rotor is rotating, each support part 4 is kept in a vertical state by a suitable stopper, and the "bottom" of the support part refers to the lowest part in such a vertical state. Rod 12
A sealing material is attached to an appropriate position of the rod 12 to prevent the gas inside the casing from leaking from the gap between the rod 12 and the main shaft 2. 16 is a bearing that allows the main shaft 2 to rotate freely.

Furthermore, this device includes an actuating device 18 for moving the rod 12 up and down via a suitable member, for example via a pivot lever 17 as shown in FIG.
will be provided. The actuating device 18 is preferably a cylinder device such as an air cylinder or a hydraulic cylinder, but the actuating device 18 may be other devices such as a rack and pinion or a link mechanism.

(Function) While the rotor 1 is rotating, the supports 4 containing the carriers are vertical due to centrifugal force, but when the rotor 1 stops after draining and drying, as shown in Fig. 4. , each support portion 4 changes from a vertical state to an inclined state. In addition, since the support part 4 is in an inclined state when stopped, when the support part is in a vertical state, the pivot pin 4a of the support part is located above and above the center of gravity of the support part 4 when the carrier containing the semiconductor material is installed. It is located on the side near the center of the rotor 1. In that condition, the actuator 18 is activated to pivot the link clockwise in FIG. 4 and raise the rod 12. When the rod 12 rises, the arm 13 at the upper end hits the protrusion 14 of the support part 4, and the support part 4
is pivoted about its pivot pin 4a to make it horizontal as shown by the imaginary line. When a carrier is removed and the next carrier is set with the support part 4 in a horizontal position, the actuating device 18 causes the rod 1 to be
2, the arm 13 leaves the projection 14, tilts the support 4, and the next cycle begins.

(Effect of the invention) Therefore, in the device according to the invention, since each support part 4 is pivoted horizontally by the mechanism provided under each support part 4, the dust generated from the mechanism part is Therefore, the semiconductor material after drying is not contaminated at all. Moreover, the mechanism is simple and operationally favorable.

[Brief explanation of the drawing]

Fig. 1 is a partially cutaway perspective view of a drain dryer according to an example of the present invention, Fig. 2 is an elevation view showing the inside, Fig. 3 is a plan view showing the inside, and Fig. 4 is a book. It is a partial elevational view showing the main part of the invention. In the figure, 1...Rotor, 2...Main shaft, 4...Support part, 12...Rod, 13...Arm, 14...
Projection piece, 18...actuating device.

Claims (1)

[Claims for Utility Model Registration] (1) A semiconductor material to be drained and dried is housed in a plurality of supports provided in a casing in a relatively outer area on a rotor and each supported by a pivot pin. In the drain drying device, the main shaft of the rotor is hollow, and a rod passing through the main shaft;
a suitable number of arms attached to the upper end of the rod and capable of abutting protrusions protruding downward from the bottom of the corresponding support part; Because of the inclination, when the support part is vertical, the pivot pin is located above the center of gravity of the support part when the carrier containing the semiconductor material is installed and closer to the center position of the rotor; An apparatus for draining and drying semiconductor materials, comprising an actuating device for moving the rod up and down. (2) Utility Model Registration The device according to claim 1, wherein the operating device is a cylinder device.