JPH0499972A - Low temperature tester for high speed semiconductor device - Google Patents

Low temperature tester for high speed semiconductor device

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Publication number
JPH0499972A
JPH0499972A JP2218629A JP21862990A JPH0499972A JP H0499972 A JPH0499972 A JP H0499972A JP 2218629 A JP2218629 A JP 2218629A JP 21862990 A JP21862990 A JP 21862990A JP H0499972 A JPH0499972 A JP H0499972A
Authority
JP
Japan
Prior art keywords
container
cable
semiconductor device
test
cooling medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2218629A
Other languages
Japanese (ja)
Inventor
Norio Hidaka
日高 紀雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2218629A priority Critical patent/JPH0499972A/en
Publication of JPH0499972A publication Critical patent/JPH0499972A/en
Pending legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To eliminate contact inferiority or the reflection loss of a signal and to perform a test of good reproducibility by connecting a conversion connector and a cable to the side wall of a container filled with a cooling medium and replacing a semiconductor device in the gaseous atmosphere. of the cooling medium. CONSTITUTION:A semiconductor device 20 is mounted on a substrate 1 and the cable 15 connected to a measuring device is connected to a conversion connector 3. Next, a cooling medium (liquid nitrogen) 8 is sent into a container 5 through a pipe 12 and a liquid level 9 is raised until the device 20 is perfectly immersed in the cooling medium 8 and, when the device 20 is stabilized at predetermined temp. by a heater 6, a high frequency signal is supplied through the cable 15 to perform a predetermined test. By this method, it is unnecessary to connect and detach the connector 3 and the cable 15 at every test and, since the cable 15 is fixed, contact inferiority, the reflection loss of a signal and the fluctuation of the characteristic impedance of the cable 15 are not generated and a characteristic test of good reproducibility can be conducted. Since the device 2 is mounted and detached in the cooling medium gas, the contact inferiority or current leak due to the condensation of steam can be prevented.

Description

【発明の詳細な説明】 〔概 要〕 高速半導体装置を室温から液体窒素温度以下の温度範囲
において試験するための装置に関し高周波信号を伝送す
るためのケーブルの捩じれによる特性インピーダンスの
変動あるいは変換コネクタと前記ケーブルとの接続部が
外力により緩みあるいは変形して生じる接続不良や前記
信号の反射損失等を排除して正確な特性評価を可能とす
ること、ならびに、低温試験中の被測定物を光学的に観
察可能とすることを目的とし。
[Detailed Description of the Invention] [Summary] Regarding a device for testing high-speed semiconductor devices in a temperature range from room temperature to liquid nitrogen temperature or lower, fluctuations in characteristic impedance due to twisting of cables for transmitting high frequency signals or conversion connectors and To enable accurate characteristic evaluation by eliminating poor connection caused by loosening or deformation of the connection part with the cable due to external force, reflection loss of the signal, etc. The purpose is to make it observable.

液化した冷媒が充填される断熱構造の容器(5)と該容
器(5)の側壁に固定された変換コネクタ(3)と該側
壁を貫通して該容器(5)の内部に延在する一端と該変
換コネクタ(3)に接続された他端を有し且つ該容器(
5)内に延在する前記一端は被測定物を装着する基板(
1)に接続されている伝送線路(2)と、前記被測定物
を加熱するために該基板(1)に設けられたヒータ(6
)と、該容器(5)内における前記冷媒の液面の高さを
変化させるために前記冷媒を送入および排出するための
手段とを具備するが、または、上記において、該容器(
5)の上面には内部が真空にされた中空の透明窓(7)
が設けられるように高速半導体装置用低温試験装置を構
成する。
A container (5) with a heat-insulating structure filled with liquefied refrigerant, a conversion connector (3) fixed to a side wall of the container (5), and one end extending into the interior of the container (5) through the side wall. and the other end connected to the conversion connector (3) and the container (
5) The one end extending inside the substrate (
a transmission line (2) connected to the substrate (1), and a heater (6) provided on the substrate (1) to heat the object to be measured.
) and means for introducing and discharging the refrigerant in order to change the level of the refrigerant in the container (5);
5) On the top is a hollow transparent window with a vacuum inside (7)
The low-temperature test equipment for high-speed semiconductor devices is configured so as to be provided with:

〔産業上の利用分野〕[Industrial application field]

本発明は、 20GHz程度の遮断周波数(f、)を有
する高速半導体装置を室温付近から液体窒素温度以下の
温度範囲において試験するための装置に関する。
The present invention relates to an apparatus for testing a high-speed semiconductor device having a cutoff frequency (f,) of about 20 GHz in a temperature range from around room temperature to below liquid nitrogen temperature.

〔従来の技術〕[Conventional technology]

従来の高速半導体装置用低温試験装置の概要を第3図を
参照して説明する。従来の装置は、同図(a)に示すよ
うに、半導体装置20が装着される高周波線路基台24
と、半導体装置20を冷却するための冷媒が充填される
容器25とが分離された構造となっている。図において
符号26は、測定器等の外部回路に接続された高周波ケ
ーブルである。
An overview of a conventional low-temperature test apparatus for high-speed semiconductor devices will be explained with reference to FIG. As shown in FIG. 2(a), the conventional device includes a high-frequency line base 24 on which a semiconductor device 20 is mounted.
It has a structure in which the container 25 and the container 25 filled with a refrigerant for cooling the semiconductor device 20 are separated. In the figure, reference numeral 26 is a high frequency cable connected to an external circuit such as a measuring instrument.

同図(b)は高周波線路基台24の詳細図であって。FIG. 2B is a detailed view of the high frequency line base 24.

高周波線路基台24は、絶縁体から成る基板21と伝送
線路22と変換コネクタ23とから構成される。半導体
装置20は5図示しない固定治具により、その裏面およ
びそのリードを基板21に押さえ付けることによって固
定される。伝送線路22の一端は変換コネクタ23に接
続されており、他端は基板21に設けられている電極(
図示省略)に接続されている。
The high frequency line base 24 is composed of a substrate 21 made of an insulator, a transmission line 22, and a conversion connector 23. The semiconductor device 20 is fixed by pressing its back surface and its leads to the substrate 21 using a fixing jig (not shown). One end of the transmission line 22 is connected to a conversion connector 23, and the other end is connected to an electrode (
(not shown).

高周波線路基台24を冷媒に浸漬し、半導体装置20が
所定温度に達したのち、変換コネクタ23にケーブル2
6を接続する。これにより半導体装置2oと外部回路と
の高周波信号の授受が可能となり、所定の低温特性試験
が行われる。試験が終了すると。
After the high frequency line base 24 is immersed in a refrigerant and the semiconductor device 20 reaches a predetermined temperature, the cable 2 is connected to the conversion connector 23.
Connect 6. This makes it possible to exchange high-frequency signals between the semiconductor device 2o and the external circuit, and a predetermined low-temperature characteristic test is performed. When the exam is finished.

まず変換コネクタ23からケーブル26を取り外し。First, remove the cable 26 from the conversion connector 23.

高周波線路基台24を容器25の外部に取り出す。そし
て、半導体装置20を9例えば窒素ガスを吹き付ける等
によって室温に戻してから、基板21がら取り外す。
The high frequency line base 24 is taken out of the container 25. Then, after returning the semiconductor device 20 to room temperature by, for example, blowing nitrogen gas on it, the semiconductor device 20 is removed from the substrate 21 .

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来の低温試験装置においては、半導体装置20ご
とにケーブル26の接続と取り外しを行う必要があり、
変換コネクタ23とケーブル26との接続部の締め付は
状態が不安定となったり、あるいは。
In the conventional low temperature test equipment described above, it is necessary to connect and disconnect the cable 26 for each semiconductor device 20.
The connection between the conversion connector 23 and the cable 26 may become unstable or tightened.

締め付けが強すぎると接続部に変形を生じる。その結果
、この接続部において、接続不良や高周波信号の反射が
生じ、伝送損失が太き(なる。またケーブル26は、変
換コネクタ23との上記接続および取り外しを繰り返す
際に生じる捩じれにより特性インピーダンスが変動し、
その結果、信号の遅延や歪が生じるために、特性試験結
果の再現性が充分でない問題があった。これらの問題は
、高周波信号において著しくなる。
If the tightening is too strong, the connection will become deformed. As a result, poor connection and reflection of high-frequency signals occur at this connection, resulting in increased transmission loss.In addition, the cable 26 has a characteristic impedance due to twisting that occurs when it is repeatedly connected and disconnected from the conversion connector 23. fluctuate,
As a result, signal delays and distortions occur, resulting in the problem that the reproducibility of characteristic test results is insufficient. These problems become more pronounced with high frequency signals.

また、上記のように高周波線路基台24から半導体装置
20を取り外す際に、高周波線路基台24が大気に曝さ
れる。このときに大気中の水蒸気が高周波線路基台24
各部の表面に凝結する。このようにして生じた水分が、
高周波線路基台24における金属部材の表面を酸化して
接触不良を生じたり、あるいは5次の試験時まで表面に
残留して電流リークの原因となる問題があった。さらに
、装置の構造上、試験中の半導体装置20を顕微鏡等に
より観察することが不可能であった。
Furthermore, when the semiconductor device 20 is removed from the high frequency line base 24 as described above, the high frequency line base 24 is exposed to the atmosphere. At this time, water vapor in the atmosphere is transferred to the high frequency line base 24.
Condenses on the surfaces of various parts. The moisture generated in this way is
There is a problem in that the surface of the metal member in the high-frequency line base 24 is oxidized, resulting in poor contact, or remains on the surface until the fifth test, causing current leakage. Furthermore, due to the structure of the device, it was impossible to observe the semiconductor device 20 under test using a microscope or the like.

本発明は、上記従来の問題点が解決された高速半導体装
置用低温試験装置を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a low-temperature test apparatus for high-speed semiconductor devices in which the above-mentioned conventional problems are solved.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的は、液化した冷媒が充填される断熱構造の容器
(5)と、該容器(5)の側壁に固定された変換コネク
タ(3)と、該側壁を貫通して該容器(5)の内部に延
在する一端と該変換コネクタ(3)に接続された他端を
有し且つ該容器(5)内に延在する前記一端は被測定物
を装着する基板(1)に接続されている伝送線路(2)
と、前記被測定物を加熱するために該基板(1)に設け
られたヒータ(6)と、該容器(5)内における前記冷
媒の液面の高さを変化させるために前記冷媒を送入およ
び排出するための手段とを具備して成ることを特徴とす
る本発明の高速半導体装置用低温試験装置、または、上
記において、該容器(5)の上面には内部が真空にされ
た中空の透明窓(7)が設けられていることを特徴とす
る本発明の高速半導体装置用低温試験装置によって達成
される。
The above purpose is to provide a container (5) with a heat insulating structure filled with liquefied refrigerant, a conversion connector (3) fixed to the side wall of the container (5), and a conversion connector (3) that penetrates the side wall to connect the container (5). It has one end extending inside and the other end connected to the conversion connector (3), and the one end extending inside the container (5) is connected to the substrate (1) on which the object to be measured is mounted. transmission line (2)
a heater (6) provided on the substrate (1) for heating the object to be measured; and a heater (6) for feeding the refrigerant in order to change the height of the liquid level of the refrigerant in the container (5). A low-temperature testing apparatus for high-speed semiconductor devices according to the present invention, characterized in that it is equipped with means for inlet and outlet, or in the above, the upper surface of the container (5) has a hollow space inside which is evacuated. This is achieved by the low-temperature testing apparatus for high-speed semiconductor devices of the present invention, which is characterized in that it is provided with a transparent window (7).

く、凝結水蒸気による接触不良や電流リークを生じるお
それがない。さらに、容器の上部には断熱性の観測窓が
設けられており、かつ、容器内の冷媒の液面の高さを調
節することができるため5試験中の半導体装置を冷媒中
に浸漬しない状態で顕微鏡観察が可能である。
There is no risk of poor contact or current leaks due to condensed water vapor. Furthermore, a heat-insulating observation window is provided at the top of the container, and the height of the refrigerant inside the container can be adjusted, so that the semiconductor device during the 5 tests is not immersed in the refrigerant. microscopic observation is possible.

〔作 用〕[For production]

本発明の高速半導体装置用低温試験装置においては、変
換コネクタおよびケーブルは、冷媒が充填される容器の
側壁に固定されているために、半導体装置ごとに、変換
コネクタとケーブルとの接続および取り外しを要せず、
また、ケーブルは容器外部において捩じれを生じないよ
うに固定してお(ことが可能である。したがって、前記
従来の低温試験装置におけるような接続不良や信号の反
射損失、あるいは、ケーブルの特性インピーダンスの変
動等を生じないため、再現性のよい特性試験が可能とな
る。また、半導体装置の交換時にこれを装着する基板を
大気中に取り出す必要がな〔実施例〕 以下本発明の実施例を図面を参照して説明する。
In the low temperature test equipment for high-speed semiconductor devices of the present invention, since the conversion connector and cable are fixed to the side wall of the container filled with refrigerant, the conversion connector and cable must be connected and disconnected for each semiconductor device. No need,
In addition, it is possible to fix the cable outside the container so that it does not twist. Therefore, it is possible to prevent connection failures and signal reflection losses as in the conventional low-temperature test equipment, or to reduce the characteristic impedance of the cable. Since no fluctuations occur, it is possible to perform characteristic tests with good reproducibility.Furthermore, when replacing a semiconductor device, there is no need to take out the board on which it is mounted into the atmosphere [Example] Examples of the present invention are shown in the drawings below. Explain with reference to.

第1図は本発明の高速半導体装置用低温試験装置の構造
を説明するための模式図であって、同図(a)は断面図
、同図(b)は上面図である。符号5は例えばステンレ
スの二重管から成る円筒形の容器であって、二重管の内
部を真空にすることによって断熱性が付与されている。
FIG. 1 is a schematic diagram for explaining the structure of a low-temperature testing apparatus for high-speed semiconductor devices according to the present invention, in which FIG. 1(a) is a sectional view and FIG. 1(b) is a top view. Reference numeral 5 denotes a cylindrical container made of, for example, a stainless steel double tube, and the inside of the double tube is evacuated to provide heat insulation properties.

容器5の側壁には。on the side wall of container 5.

上記二重管の真空を保持する気密封じ構造を有する貫通
孔が放射状に配置されており、この貫通孔に対応して外
部側壁に複数のSMA型変換コネクタ3が固定されてい
る。各々の変換コネクタ3には。
Through holes having an airtight sealing structure for maintaining the vacuum of the double tube are arranged radially, and a plurality of SMA conversion connectors 3 are fixed to the external side wall in correspondence with the through holes. For each conversion connector 3.

例えばセミリジット同軸型の伝送線路2の一端が接続さ
れている。伝送線路2の他端は容器5の側壁を貫通して
容器5内に延び、被測定物である。
For example, one end of a semi-rigid coaxial transmission line 2 is connected. The other end of the transmission line 2 extends into the container 5 through the side wall of the container 5, and is an object to be measured.

例えば遮断周波数(f、)が20GHz程度の高速の半
導体装置20が装着される1例えばアルミナから成る基
板1に設けられている電極(図示省略)に接続されてい
る。このようにして、複数の伝送線路2によって基板1
を支持することができるが、必要に応じて1例えば容器
5内部の底面に固定された図示しない支持台を設け、こ
れに基板1を固定した構造としてもよい。なお、従来と
同様に、半導体装置20の端子と基板1上の電極とを5
図示しない固定治具によって接続することにより、半導
体装置20と外部回路とが接続される。
For example, it is connected to an electrode (not shown) provided on a substrate 1 made of alumina, for example, on which a high-speed semiconductor device 20 with a cutoff frequency (f,) of about 20 GHz is mounted. In this way, the substrate 1 is
However, if necessary, a structure may be adopted in which a support stand (not shown) fixed to the bottom surface inside the container 5, for example, is provided, and the substrate 1 is fixed to this support stand. Note that, as in the conventional case, the terminals of the semiconductor device 20 and the electrodes on the substrate 1 are
The semiconductor device 20 and the external circuit are connected by using a fixing jig (not shown).

基板1には5例えばニクロム線から成る抵抗加熱体のよ
うなヒータ6が設けられている。ヒータ6は5図示しな
い電力供給線路に接続されている。
The substrate 1 is provided with a heater 6 such as a resistance heating element made of nichrome wire, for example. The heater 6 is connected to a power supply line 5 (not shown).

容器5の底部近傍には、液状の冷媒8の送入・排出する
ためのパイプ12が設けられている。パイプ12は5図
示しない浮き型液体窒素注入容器に接続されており、該
注入容器内の浮きを上下することにより、容器5内の冷
媒8の液面9の高さを調節することができる。
A pipe 12 for introducing and discharging liquid refrigerant 8 is provided near the bottom of the container 5 . The pipe 12 is connected to a floating liquid nitrogen injection container (not shown), and the height of the liquid level 9 of the refrigerant 8 in the container 5 can be adjusted by raising and lowering a float in the injection container.

容器5の上部は5着脱可能な蓋70によって覆われてい
る。第2図の部分拡大図に示すように、蓋70の中央部
近傍には5例えば透明石英から成り内部が真空にされた
中空の透明窓7が取りつけられている。また、蓋70に
は1気化した冷媒8を放出するための通気孔14が設け
られている。なお。
The top of the container 5 is covered by a removable lid 70. As shown in the partially enlarged view of FIG. 2, a hollow transparent window 7 made of, for example, transparent quartz and evacuated inside is attached near the center of the lid 70. Further, the lid 70 is provided with a vent hole 14 for releasing the vaporized refrigerant 8. In addition.

蓋70全体を透明窓7のような中空構造にしてもよい。The entire lid 70 may have a hollow structure like the transparent window 7.

上記本発明の低温試験装置による試験は次のようにして
行う。まず、半導体装置20を基板1に装着し1図示し
ない測定器等に接続されたケーブル15を変換コネクタ
3に接続する。次いで、パイプ12を通じて容器5内に
液体窒素を徐々に送入し半導体装置20が液体窒素中に
完全に浸漬するまで液面9を上昇させる。この間に、容
器5内の空気は、液体窒素が気化した窒素ガスにより、
蓋70の通気孔14を通じて外部に押し出される。した
がって半導体装置20や基板1表面等に水蒸気が凝結す
ることかない。液体窒素中の半導体装置20が所定温度
に安定したならば、ケーブル15を通じて高周波信号を
供給して所定の試験を行う。この間に。
The test using the low temperature test apparatus of the present invention is conducted as follows. First, the semiconductor device 20 is mounted on the substrate 1, and the cable 15 connected to a measuring device (not shown) is connected to the conversion connector 3. Next, liquid nitrogen is gradually introduced into the container 5 through the pipe 12 to raise the liquid level 9 until the semiconductor device 20 is completely immersed in the liquid nitrogen. During this time, the air inside the container 5 is filled with nitrogen gas, which is the vaporized liquid nitrogen.
It is pushed out through the ventilation hole 14 of the lid 70. Therefore, water vapor does not condense on the surface of the semiconductor device 20, the substrate 1, etc. Once the semiconductor device 20 in liquid nitrogen has stabilized at a predetermined temperature, a high frequency signal is supplied through the cable 15 to perform a predetermined test. During this time.

透明窓7を通して半導体装置20を顕微鏡観察すること
ができる。
The semiconductor device 20 can be observed through a microscope through the transparent window 7.

測定が終了したならば、パイプ12を通じて液体窒素を
排出し、半導体装置20が現れるまで液面9を下げる。
When the measurement is completed, the liquid nitrogen is discharged through the pipe 12, and the liquid level 9 is lowered until the semiconductor device 20 appears.

そして、ヒータ6に電力を加えて半導体装置20および
基板1を加熱し、室温まで上昇させる。この間の時間は
、ヒータ6に加える電力を調節することにより5数十秒
程度の短時間で行うことができる。半導体装置20が室
温に達したならば、蓋70を取り外し、基板1から半導
体装置20を次ぎに試験する別の半導体装置と交換する
。この交換は、窒素ガス雰囲気中で行われるため、水蒸
気の凝結が生じない。次いで、容器5上を蓋70で覆い
、再びパイプ12を通じて容器5内に液体窒素を送入し
て試験を行う。
Then, electric power is applied to the heater 6 to heat the semiconductor device 20 and the substrate 1 and raise the temperature to room temperature. This time can be shortened to about 5 and several tens of seconds by adjusting the power applied to the heater 6. When the semiconductor device 20 reaches room temperature, the lid 70 is removed and the semiconductor device 20 is replaced from the substrate 1 with another semiconductor device to be tested next. Since this exchange is performed in a nitrogen gas atmosphere, no water vapor condensation occurs. Next, the container 5 is covered with a lid 70, and liquid nitrogen is again introduced into the container 5 through the pipe 12 to conduct a test.

〔発明の効果〕〔Effect of the invention〕

上記説明から明らかなように5本発明の低温試験装置に
よれば1次のような効果が奏される。
As is clear from the above description, the low temperature testing apparatus of the present invention provides the following effects.

■試験ごとに変換コネクタ3とケーブル15との接続お
よび取り外しが必要でなく、また、ケーブル15を固定
された状態にしておくことが可能である。その結果、従
来の試験装置におけるような接続不良や信号の反射損失
の発生あるいはケーブルの特性インピーダンスの変動等
を生じることがないために、特性試験結果を再現性よく
得ることができる。
(2) It is not necessary to connect and disconnect the conversion connector 3 and the cable 15 for each test, and the cable 15 can be kept in a fixed state. As a result, it is possible to obtain characteristic test results with good reproducibility because there are no connection failures, signal reflection losses, or variations in the characteristic impedance of the cable that occur in conventional test equipment.

■試験装置に対する半導体装置20の装着および脱着は
窒素ガス雰囲気中で行われるため、水蒸気の凝結による
表面酸化や電流リークの発生がないため、正確な特性試
験結果が得られる。
(2) Since the semiconductor device 20 is attached to and detached from the test equipment in a nitrogen gas atmosphere, there is no surface oxidation due to water vapor condensation or current leakage, so accurate characteristic test results can be obtained.

■従来の試験装置におけるように半導体装置20が高周
波線路基台24によって遮られる配置構造ではないため
、透明窓7を通して、半導体装置20を直接に顕微鏡観
察できる。
(2) Since the semiconductor device 20 is not placed in a structure where it is blocked by the high-frequency line base 24 as in conventional test equipment, the semiconductor device 20 can be directly observed with a microscope through the transparent window 7.

■ヒータ6による急速加熱可能としたことにより、半導
体装置20の交換時間が短縮され、試験能率が向上され
る。
(2) By enabling rapid heating by the heater 6, the time required to replace the semiconductor device 20 is shortened and testing efficiency is improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の高速半導体装置用低温試験装置の実施
例説明図 第2図は第1図の部分拡大図。 第3図は従来の低温試験装置の概要構造図である。 図において ■と21は基板、  2と22は伝送線路3と23は変
換コネクタ、  5と25は容器。 6はヒータ、  7は透明窓、  8は冷媒。 9は液面、12はパイプ、14は通気孔。 15と26はケーブル、20は半導体装置。 24は高周波線路基台、70は蓋 である。 町霞加替挾太用 薯2図
FIG. 1 is an explanatory diagram of an embodiment of a low-temperature test apparatus for high-speed semiconductor devices according to the present invention. FIG. 2 is a partially enlarged view of FIG. 1. FIG. 3 is a schematic structural diagram of a conventional low temperature testing device. In the figure, ■ and 21 are boards, 2 and 22 are transmission lines 3 and 23 are conversion connectors, and 5 and 25 are containers. 6 is a heater, 7 is a transparent window, and 8 is a refrigerant. 9 is the liquid level, 12 is the pipe, and 14 is the ventilation hole. 15 and 26 are cables, and 20 is a semiconductor device. 24 is a high frequency line base, and 70 is a lid. Machi Kagae Hasta Yosai illustration 2

Claims (1)

【特許請求の範囲】 1)液化した冷媒が充填される断熱構造の容器(5)と
、 該容器(5)の側壁に固定された変換コネクタ(3)と
、 該側壁を貫通して該容器(5)の内部に延在する一端と
該変換コネクタ(3)に接続された他端を有し且つ該容
器(5)内に延在する前記一端は被測定物を装着する基
板(1)に接続されている伝送線路(2)と、前記被測
定物を加熱するために該基板(1)に設けられたヒータ
(6)と、 該容器(5)内における前記冷媒の液面の高さを変化さ
せるために前記冷媒を送入および排出するための手段 とを具備して成ることを特徴とする高速半導体装置用低
温試験装置。 2)該容器(5)の上面には内部が真空にされた中空の
透明窓(7)が設けられていることを特徴とする請求項
1記載の高速半導体装置用低温試験装置。
[Scope of Claims] 1) A container (5) with a heat-insulating structure filled with liquefied refrigerant; a conversion connector (3) fixed to a side wall of the container (5); (5) has one end extending inside the container (5) and the other end connected to the conversion connector (3), and the one end extending inside the container (5) is a substrate (1) on which an object to be measured is attached. a transmission line (2) connected to a transmission line (2), a heater (6) provided on the substrate (1) for heating the object to be measured, and a height of the liquid level of the refrigerant in the container (5). 1. A low-temperature testing apparatus for high-speed semiconductor devices, comprising means for introducing and discharging the refrigerant in order to change the temperature of the refrigerant. 2) The low-temperature testing apparatus for high-speed semiconductor devices according to claim 1, characterized in that a hollow transparent window (7) whose interior is evacuated is provided on the upper surface of the container (5).
JP2218629A 1990-08-20 1990-08-20 Low temperature tester for high speed semiconductor device Pending JPH0499972A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2218629A JPH0499972A (en) 1990-08-20 1990-08-20 Low temperature tester for high speed semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2218629A JPH0499972A (en) 1990-08-20 1990-08-20 Low temperature tester for high speed semiconductor device

Publications (1)

Publication Number Publication Date
JPH0499972A true JPH0499972A (en) 1992-03-31

Family

ID=16722949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2218629A Pending JPH0499972A (en) 1990-08-20 1990-08-20 Low temperature tester for high speed semiconductor device

Country Status (1)

Country Link
JP (1) JPH0499972A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6505471B1 (en) 2001-11-29 2003-01-14 Nec Corporation Method and apparatus for adjusting device used at low temperature without deterioration thereof
JP2007315986A (en) * 2006-05-29 2007-12-06 Sony Corp Circuit inspection device and circuit inspection method
CN111366838A (en) * 2020-03-16 2020-07-03 华北电力大学 Power device characteristic testing cavity in immersion cooling environment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6505471B1 (en) 2001-11-29 2003-01-14 Nec Corporation Method and apparatus for adjusting device used at low temperature without deterioration thereof
US6615605B2 (en) 2001-11-29 2003-09-09 Nec Corporation Method and apparatus for adjusting device used at low temperature without deterioration thereof
JP2007315986A (en) * 2006-05-29 2007-12-06 Sony Corp Circuit inspection device and circuit inspection method
CN111366838A (en) * 2020-03-16 2020-07-03 华北电力大学 Power device characteristic testing cavity in immersion cooling environment

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