JPH0499528U - - Google Patents

Info

Publication number
JPH0499528U
JPH0499528U JP1991088301U JP8830191U JPH0499528U JP H0499528 U JPH0499528 U JP H0499528U JP 1991088301 U JP1991088301 U JP 1991088301U JP 8830191 U JP8830191 U JP 8830191U JP H0499528 U JPH0499528 U JP H0499528U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1991088301U
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPH0499528U publication Critical patent/JPH0499528U/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1991088301U 1984-11-08 1991-10-28 Pending JPH0499528U (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/669,441 US4700371A (en) 1984-11-08 1984-11-08 Long life x-ray source target

Publications (1)

Publication Number Publication Date
JPH0499528U true JPH0499528U (ja) 1992-08-27

Family

ID=24686334

Family Applications (2)

Application Number Title Priority Date Filing Date
JP60250557A Pending JPS61179047A (ja) 1984-11-08 1985-11-08 Ｘ線供給源の標的
JP1991088301U Pending JPH0499528U (ja) 1984-11-08 1991-10-28

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP60250557A Pending JPS61179047A (ja) 1984-11-08 1985-11-08 Ｘ線供給源の標的

Country Status (4)

Country Link
US (1) US4700371A (ja)
EP (1) EP0181194A3 (ja)
JP (2) JPS61179047A (ja)
CA (1) CA1250056A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06283407A (ja) * 1993-03-26 1994-10-07 Nikon Corp レーザープラズマｘ線源

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4896341A (en) * 1984-11-08 1990-01-23 Hampshire Instruments, Inc. Long life X-ray source target
GB2195070B (en) * 1986-09-11 1991-04-03 Hoya Corp Laser plasma x-ray generator capable of continuously generating x-rays
US4837793A (en) * 1987-08-25 1989-06-06 Hampshire Instruments, Inc. Mass limited target
US4860328A (en) * 1987-08-25 1989-08-22 Hampshire Instruments, Inc. Target positioning for minimum debris
US4872189A (en) * 1987-08-25 1989-10-03 Hampshire Instruments, Inc. Target structure for x-ray lithography system
US5175757A (en) * 1990-08-22 1992-12-29 Sandia Corporation-Org. 250 Apparatus and method to enhance X-ray production in laser produced plasmas
GB9308981D0 (en) * 1993-04-30 1993-06-16 Science And Engineering Resear Laser-excited x-ray source
US5459771A (en) * 1994-04-01 1995-10-17 University Of Central Florida Water laser plasma x-ray point source and apparatus
US5577091A (en) * 1994-04-01 1996-11-19 University Of Central Florida Water laser plasma x-ray point sources
JP2642907B2 (ja) * 1995-06-14 1997-08-20 工業技術院長 Ｘ線露光装置
WO2000060909A1 (fr) * 1999-03-31 2000-10-12 Japan As Represented By Director General Of Agency Of Industrial Science And Technology Source de lumiere laser plasma et procede de production de rayonnement l'utilisant
TW488106B (en) * 1999-08-05 2002-05-21 Shinetsu Chemical Co Hydrogen absorbing alloy and nickel-metal hydride rechargeable battery
US6831963B2 (en) 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
FR2801113B1 (fr) * 1999-11-15 2003-05-09 Commissariat Energie Atomique Procede d'obtention et source de rayonnement extreme ultra violet, application en lithographie
TW508980B (en) * 1999-12-23 2002-11-01 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6320937B1 (en) 2000-04-24 2001-11-20 Takayasu Mochizuki Method and apparatus for continuously generating laser plasma X-rays by the use of a cryogenic target
US8229075B2 (en) * 2005-09-12 2012-07-24 Board Of Regents Of The Nevada System Of Higher Education, On Behalf Of The University Of Nevada, Reno Targets and processes for fabricating same
US7609816B2 (en) * 2006-05-19 2009-10-27 Colorado State University Research Foundation Renewable laser target
WO2009105546A2 (en) 2008-02-19 2009-08-27 Board Of Regents Of The Nevada System Of Higher Education, On Behalf Of The University Of Nevada, Reno Target and process for fabricating same
AU2010216283A1 (en) * 2009-02-20 2011-07-21 Sunpower Corporation Automated solar collector installation design including exceptional condition management and display
WO2010096270A2 (en) 2009-02-20 2010-08-26 Sunpower Corporation Automated solar collector installation design including ability to define heterogeneous design preferences
JP5581504B2 (ja) * 2009-02-20 2014-09-03 サンパワー コーポレイション ソーラーコレクタ設置の設計を自動化する装置
EP2399212A1 (en) 2009-02-20 2011-12-28 SunPower Corporation Automated solar collector installation design including version management
US8344339B2 (en) * 2010-08-30 2013-01-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin rod EUV LPP target system
US9544984B2 (en) * 2013-07-22 2017-01-10 Kla-Tencor Corporation System and method for generation of extreme ultraviolet light
US9918375B2 (en) * 2015-11-16 2018-03-13 Kla-Tencor Corporation Plasma based light source having a target material coated on a cylindrically-symmetric element
US10021773B2 (en) 2015-11-16 2018-07-10 Kla-Tencor Corporation Laser produced plasma light source having a target material coated on a cylindrically-symmetric element

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US4058486A (en) * 1972-12-29 1977-11-15 Battelle Memorial Institute Producing X-rays
US4184078A (en) * 1978-08-15 1980-01-15 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography
US4484339A (en) * 1981-02-09 1984-11-20 Battelle Development Corporation Providing X-rays
EP0063190B1 (en) * 1981-04-21 1985-08-14 LEDLEY, Robert S. Microfocus x-ray tube
JPS57182953A (en) * 1981-05-06 1982-11-11 Esu Retsudorei Robaato Microminiature focus x-ray tube
DE3278737D1 (en) * 1982-04-14 1988-08-11 Battelle Development Corp Providing x-rays
US4516253A (en) * 1983-03-15 1985-05-07 Micronix Partners Lithography system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06283407A (ja) * 1993-03-26 1994-10-07 Nikon Corp レーザープラズマｘ線源

Also Published As

Publication number Publication date
CA1250056A (en) 1989-02-14
EP0181194A3 (en) 1988-04-06
EP0181194A2 (en) 1986-05-14
JPS61179047A (ja) 1986-08-11
US4700371A (en) 1987-10-13

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