JPH0495B2 - - Google Patents

Info

Publication number
JPH0495B2
JPH0495B2 JP58029370A JP2937083A JPH0495B2 JP H0495 B2 JPH0495 B2 JP H0495B2 JP 58029370 A JP58029370 A JP 58029370A JP 2937083 A JP2937083 A JP 2937083A JP H0495 B2 JPH0495 B2 JP H0495B2
Authority
JP
Japan
Prior art keywords
plasma
reaction chamber
tube
shower
tubes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58029370A
Other languages
Japanese (ja)
Other versions
JPS59155440A (en
Inventor
Takaoki Kaneko
Yoshinobu Takahashi
Kenji Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP58029370A priority Critical patent/JPS59155440A/en
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to AU24671/84A priority patent/AU549376B2/en
Priority to ZA841294A priority patent/ZA841294B/en
Priority to EP91115536A priority patent/EP0461683B1/en
Priority to EP84101926A priority patent/EP0120307B1/en
Priority to DE3486317T priority patent/DE3486317T2/en
Priority to DE3486470T priority patent/DE3486470T2/en
Publication of JPS59155440A publication Critical patent/JPS59155440A/en
Priority to AU49495/85A priority patent/AU578757B2/en
Priority to US06/825,941 priority patent/US4678644A/en
Priority to AU82240/87A priority patent/AU603397B2/en
Priority to AU82238/87A priority patent/AU8223887A/en
Priority to AU82239/87A priority patent/AU8223987A/en
Priority to AU82237/87A priority patent/AU8223787A/en
Publication of JPH0495B2 publication Critical patent/JPH0495B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357Generation remote from the workpiece, e.g. down-stream
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894Processes carried out in the presence of a plasma
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/19Details relating to the geometry of the reactor
    • B01J2219/194Details relating to the geometry of the reactor round
    • B01J2219/1941Details relating to the geometry of the reactor round circular or disk-shaped
    • B01J2219/1942Details relating to the geometry of the reactor round circular or disk-shaped spherical
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2023/00Use of polyalkenes or derivatives thereof as moulding material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18Vacuum control means
    • H01J2237/182Obtaining or maintaining desired pressure
    • H01J2237/1825Evacuating means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/336Changing physical properties of treated surfaces

Description

【発明の詳細な説明】 本発明は樹脂、例えばポリプロピレン(PP)、
ポリエチレン(PE)等の表面を改質するために、
これらの樹脂の表面にプラズマ処理を施す装置に
関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides resins such as polypropylene (PP),
To modify the surface of polyethylene (PE), etc.
The present invention relates to an apparatus for subjecting the surfaces of these resins to plasma treatment.

近年、例えば、自動車の部品等は、軽量でかつ
に意匠性に優れる樹脂に移行する傾向にあるが、
比較的安価なPP、PE等のポリオレフイン系樹脂
を例えば車両外板として使用する場合、樹脂表面
と塗膜との密着性が悪く、層間剥離という問題が
発生することが知られている。この問題を解消す
る手段の一つとして、PP、PE等の被塗装物表面
をグロー、コロナ放電あるいはラジオ波、マイク
ロ波放電におけるプラズマ下に曝し、表面を酸化
(極性基の導入)あるいはエツチング(アンカ効
果向上)するプラズマ表面処理技術が知られてい
る。また、プラズマ処理を行う場合、処理効果を
向上(プラズマの寿命を長くする)させるため、
反応室を減圧もしくは真空状態にすることが公知
の技術になつている。この状態を維持するため
に、現在バツチ処理が主流になつている。
In recent years, for example, there has been a trend toward plastics for automobile parts, which are lightweight and have excellent designs.
When relatively inexpensive polyolefin resins such as PP and PE are used for vehicle outer panels, it is known that the adhesion between the resin surface and the coating film is poor, resulting in the problem of delamination. One way to solve this problem is to expose the surface of the object to be coated, such as PP or PE, to plasma such as glow, corona discharge, radio waves, or microwave discharge to oxidize (introduce polar groups) or etch (introduce polar groups) the surface. Plasma surface treatment technology is known to improve the anchoring effect. In addition, when performing plasma treatment, in order to improve the treatment effect (lengthen the plasma life),
It is a known technique to provide a reduced pressure or vacuum in the reaction chamber. In order to maintain this state, batch processing is currently the mainstream.

ところで、近年、耐久性、生産性を要求される
樹脂成形品をプラズマ処理する場合、プラズマ発
生部と反応室とが異なるマイクロ波方式のよるプ
ラズマ処理が多く用いられている。このマイクロ
波方式によるプラズマ処理では、反応室外にある
プラズマ発生部でマイクロ波放電により酸素ガス
等の処理ガスがプラズマ化され、輸送管を通じて
反応室へ輸送される。反応室では石英ガラス等で
構成されたシヤワ管によりプラズマがシヤワ拡散
され被処理物表面を処理する。
Incidentally, in recent years, when plasma-treating resin molded products that require durability and productivity, plasma processing using a microwave method in which a plasma generation part and a reaction chamber are different is often used. In plasma processing using the microwave method, processing gas such as oxygen gas is turned into plasma by microwave discharge in a plasma generating section located outside the reaction chamber, and is transported to the reaction chamber through a transport pipe. In the reaction chamber, plasma is diffused by a shower tube made of quartz glass or the like to treat the surface of the object to be treated.

従来のこの種のマイクロ波プラズマ処理装置
(第6図)を用いて自動車に使用するPPから成る
樹脂部品を4個(W-1〜4)処理したところ、自動
車に使用する樹脂部品は大物でかつ形状が複雑で
あるため、反応室内の被処理物の配置位置により
また同一被処理物の部位により処理性にバラツキ
が生じた(第7図)。特に、遮蔽されかつシヤワ
管からの距離が遠くなるW-1-D、W-2-C
W-3-BD、W-4-ACの部位は他の部位よりも処
理効果が劣り、、また塗膜の密着も満足できるも
のではなかつた。なお、第6図および第8図にお
ける処理条件および被処理物の評価方法は後述の
とおりである。
When four resin parts (W -1 to 4) made of PP used in automobiles were processed using this type of conventional microwave plasma processing equipment (Fig. 6), it was found that the resin parts used in automobiles were large. In addition, since the shape is complicated, the processability varies depending on the placement position of the object to be processed in the reaction chamber or depending on the location of the same object to be processed (FIG. 7). In particular, W -1-D , W -2-C , which are shielded and have a long distance from the shower tube,
The treatment effect was inferior to the other areas in areas W -3-B , D , W -4-A , and C , and the adhesion of the coating film was also not satisfactory. Note that the processing conditions and evaluation method of the processed material in FIGS. 6 and 8 are as described later.

本発明は、上記問題点を解消し、大物でかつ複
雑形状の被処理を同時に多数処理しても処理の均
一性を提供するプラズマ処理装置に関するもので
ある。
The present invention relates to a plasma processing apparatus that solves the above-mentioned problems and provides uniform processing even when processing a large number of large and complex-shaped objects at the same time.

即ち、本発明の目的は、反応室内のプラズマ濃
度分布を均一化することにより、反応室内の複数
の被処理物の位置による処理の差を解消し、かつ
同一被処理物の形状による処理の不均一を解消す
るプラズマ処理装置を提供することにある。
That is, an object of the present invention is to eliminate differences in processing due to the positions of a plurality of objects to be processed in the reaction chamber and to eliminate processing errors due to the shape of the same object by making the plasma concentration distribution within the reaction chamber uniform. An object of the present invention is to provide a plasma processing apparatus that eliminates uniformity.

このような目的を達成するために、本発明で
は、プラズマ反応室内で被処理物の表面にプラズ
マを照射して処理する装置において、プラズマ照
射用の少なくとも1つのい第一のシヤワ管を反応
室内壁に固定して設置すると共に、プラズマ照射
用の少なくとも1つの第二のシヤワ管を反応室内
で任意の位置に移動できるように設けたことを特
徴とするプラズマ処理装置が提案される。
In order to achieve such an object, in the present invention, in an apparatus for treating the surface of a workpiece by irradiating plasma in a plasma reaction chamber, at least one first shower tube for plasma irradiation is provided in the reaction chamber. A plasma processing apparatus is proposed, which is fixedly installed on a wall and at least one second shower tube for plasma irradiation is provided so as to be movable to an arbitrary position within the reaction chamber.

以下、添付図面を参照し本発明の実施例につい
て詳細に説明する。
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

第1図において、1は例えばSUS304等の材質
で構成された反応室でその内部には自動車の部品
である樹脂(PP)の被処理-1〜4が治具又は台車
(図示なし)により載置されている。2はマイク
ロ波発振器(2450MHz)(例えば、東芝電機(株)
製)、3はマイクロ波導波管、4は内部に石英管
(7,8と接続している)を有したプラズマ発生
部、5は酸素ガスボンベ、6はバルブ、7はナイ
ロンチユーブ、8は発生したプラズマを反応室1
内へ送る石英ガラスで構成された輸送管、9,1
0,14,17,20a,20bも同様の輸送
管、11は輸送管8,9間を接続しかつ真空シー
ルするテフロンからなるフロロコネクタ、12,
13,15,16,18,19,34,21,2
5,27も同様のフロロコネクタ、22は第3図
に詳細に示すような石英ガラスで構成されたシヤ
ワ管、23,24を同様のシヤワ管、26はシヤ
ワ管28を反応室1内の任意の位置に設置できる
可撓性のテフロンチユーブ、28は第4図に詳細
に示すような石英ガラスで構成されたシヤワ管、
29は真空ポンプ(図示せず)に接続している排
気口である。35,36,37,38は反応室1
と各シヤワ管を真空シールするためのフランジ
(SUS304)である。
In Fig. 1, reference numeral 1 denotes a reaction chamber made of a material such as SUS304, and inside it, resin (PP) parts to be treated -1 to 4 , which are automobile parts, are placed on a jig or a trolley (not shown). It is placed. 2 is a microwave oscillator (2450MHz) (for example, Toshiba Electric Corporation)
3 is a microwave waveguide, 4 is a plasma generation part with a quartz tube (connected to 7 and 8) inside, 5 is an oxygen gas cylinder, 6 is a valve, 7 is a nylon tube, and 8 is a generator The generated plasma is transferred to reaction chamber 1.
Transport pipe made of quartz glass for transport into the interior, 9,1
0, 14, 17, 20a, and 20b are similar transport pipes; 11 is a fluoro connector made of Teflon that connects and vacuum-seals the transport pipes 8 and 9; 12;
13, 15, 16, 18, 19, 34, 21, 2
5 and 27 are similar fluorocarbon connectors; 22 is a shear tube made of quartz glass as shown in detail in FIG. 3; 23 and 24 are similar shear tubes; 28 is a flexible Teflon tube that can be installed in the position shown in FIG.
29 is an exhaust port connected to a vacuum pump (not shown). 35, 36, 37, 38 are reaction chambers 1
and a flange (SUS304) for vacuum sealing each shower tube.

第1図の実施例において、シヤワ管22,2
3,24は反応室1の内壁に固定して設置されて
いる(シヤワ管23,24はシヤワ管22から約
90°隔てた位置)。なお、第1図には省略してある
が、シヤワ管23,24もシヤワ管22の場合と
同様にマイクロ波発振器2、プラズマ発生部4、
酸素ガスボンベ5等に接続されている。シヤワ管
22,23,24は第3図a,bに示すように円
筒状の石英ガラス管で構成され、円筒状反応室1
の軸線方向と平行に設置されている(第1図)。
シヤワ管22,23,24の反応室1内部に面し
た側には多数の小孔から成るプラズマ噴射口40
が設けてある。これらの噴射口40は反応室1内
に出来るだけ均一にプラズマを照射するように約
60°の角度で千鳥に配置されている。(第3図b)。
In the embodiment of FIG.
3 and 24 are fixedly installed on the inner wall of the reaction chamber 1 (the shower tubes 23 and 24 are approximately
90° apart). Although omitted in FIG. 1, the shower tubes 23 and 24 also have a microwave oscillator 2, a plasma generating section 4,
It is connected to an oxygen gas cylinder 5 or the like. The shower tubes 22, 23, 24 are composed of cylindrical quartz glass tubes as shown in FIGS. 3a and 3b, and the cylindrical reaction chamber 1
(Fig. 1).
A plasma injection port 40 consisting of a large number of small holes is provided on the side of the shower tubes 22, 23, 24 facing the inside of the reaction chamber 1.
is provided. These injection ports 40 are designed to irradiate plasma as uniformly as possible within the reaction chamber 1.
They are arranged in a staggered manner at a 60° angle. (Figure 3b).

一方、シヤワ管28は可撓性のテフロンチユー
ブ26を介して反応室1内の任意の位置に設置で
きるようになつている。第1図の実施例ではシヤ
ワ管28を円筒形反応室1内の中央部に軸線方向
に配置したが、被処理物の数や形状、配置等によ
り任意の位置、角度で設置できることはいうまで
もない。シヤワ管28はシヤワ管22,23,2
4と同様石英ガラス管で構成されているが、第4
図a,bに示すように、中心軸線に関してあらゆ
る放射方向にプラズマを照射できるように例えば
90°の等角度間隔で多数の小孔からなるプラズマ
噴射口41が形成されている。なお、第1図の実
施例ではシヤワ管28のプラズマ輸送管20はフ
ロロコネクタ18から分岐させているが、フロロ
コネクタ12又は15から分岐させてもよく、ま
たシヤワ管28につい専用のプラズマ発生機構を
設けてもよいことはもちろんである。また、第1
図の実施例では、シヤワ管28を反応室1内の中
央に1個設けたが、例え被処理物が軸方向に長く
その長平方向端部のプラズマ処理効果が低い場合
には、第5図の実施例に示すように、フロロコネ
クタ25に可撓性チユーブ26と同様の可撓性の
テフロンチユーブ26a,26bを分岐接続し、
それらの先端に被処理物方向のみに噴射口が開口
した(約60°の角度で)シヤワ管31,33をフ
ロロコネクタ30,32を介して装着し、これら
のシヤワ管31,33により被処理物Wの長平方
向端部にプラズマを照射するようにしてもよい。
On the other hand, the shower tube 28 can be installed at any position within the reaction chamber 1 via a flexible Teflon tube 26. In the embodiment shown in FIG. 1, the shower tube 28 is arranged in the axial direction at the center of the cylindrical reaction chamber 1, but it goes without saying that it can be installed at any position and angle depending on the number, shape, arrangement, etc. of the objects to be treated. . The shower pipe 28 is the shower pipe 22, 23, 2
Like 4, it is made of quartz glass tube, but the 4th
As shown in Figures a and b, for example, plasma can be irradiated in all radial directions with respect to the central axis.
Plasma injection ports 41 consisting of a large number of small holes are formed at equal angular intervals of 90 degrees. In the embodiment shown in FIG. 1, the plasma transport tube 20 of the shower tube 28 is branched from the fluoro connector 18, but it may be branched from the fluoro connector 12 or 15. Of course, it is also possible to provide Also, the first
In the embodiment shown in the figure, one shower tube 28 is provided in the center of the reaction chamber 1, but if the object to be treated is long in the axial direction and the plasma treatment effect at the long end portions is low, As shown in the embodiment, flexible Teflon tubes 26a and 26b similar to the flexible tube 26 are branch-connected to the fluoro connector 25, and
Shower tubes 31 and 33 with injection ports opening only in the direction of the object to be treated (at an angle of about 60 degrees) are attached to their tips via fluoro connectors 30 and 32, and these shower tubes 31 and 33 are used to direct the object to be treated. The plasma may be irradiated onto the ends of the object W in the longitudinal direction.

なお、上述のシヤワか22,23,24および
28,31,33は石英ガラス以外の材質、例え
ばパイレツクスガラス等の励起酸素が失活し難い
もので構成してもよいい。また、可撓性チユーブ
26,26a,26bはシヤワ管と同様励起酸素
が失活しにくくて可撓性があればよく、例えば
SUSのコイルスプリング等で構成してもよい。
The above-mentioned showers 22, 23, 24 and 28, 31, 33 may be made of a material other than quartz glass, such as Pyrex glass, in which excited oxygen is not easily deactivated. Further, the flexible tubes 26, 26a, 26b need only be flexible so that excited oxygen is not easily deactivated like the shower tube, for example.
It may also be composed of a SUS coil spring or the like.

第1図において、排気口29に接続された真空
ポンプ(図示せず)により反応室1内を真空状態
にした後、ボンベ5から酸素ガスを所定量供給し
反応室1内を真空弁(図示せず)にて調整し所定
の真空圧に設定する。その後、発振器2により所
定の出力でマイクロ波を発振させ、導波管3で伝
送し、プラズマ発生部4にてプラズマを発生させ
る。発生したプラズマは輸送管8,9,10、フ
ロロコネクタ11,12,13を介してシヤワ管
22へ供給される。シヤワ管23,24において
も同様に供給されるが、シヤワ管28へはフロロ
コネクタ18で分割されたプラズマが、輸送管2
0a,20b、フロロコネクタ34,21,25
を介して可撓性チユーブ26へ送られ、この可撓
性チユーブ26から供給される。なお、第5図の
実施例では更にフロロコネクタ25から可撓性チ
ユーブ26a,26bにも分割され、フロロコネ
クタ30,32を介してシヤワ管31,33にも
供給される。
In FIG. 1, after the reaction chamber 1 is brought into a vacuum state by a vacuum pump (not shown) connected to the exhaust port 29, a predetermined amount of oxygen gas is supplied from the cylinder 5, and the inside of the reaction chamber 1 is evacuated by a vacuum valve (not shown). (not shown) to set the desired vacuum pressure. Thereafter, the oscillator 2 oscillates microwaves at a predetermined output, the waves are transmitted through the waveguide 3, and the plasma generator 4 generates plasma. The generated plasma is supplied to the shower tube 22 via the transport tubes 8, 9, 10 and the fluoro connectors 11, 12, 13. The plasma is supplied to the shower tubes 23 and 24 in the same way, but the plasma divided by the fluoro connector 18 is supplied to the shower tube 28.
0a, 20b, fluoro connectors 34, 21, 25
via the flexible tube 26 and is supplied from the flexible tube 26. In the embodiment shown in FIG. 5, the fluorocarbon connector 25 is further divided into flexible tubes 26a and 26b, and is also supplied to the shower tubes 31 and 33 via the fluoroconnectors 30 and 32.

シヤワ管22,23,24および28(31,
33)の噴射口40,41からいつせいにプラズ
マが被処理物W-1〜4の表面に向けて照射され、そ
れらの被処理物表面を均一に処理する。所定時間
処理後、酸素ガスの供給、マイクロ波の発振、真
空ポンプによる排気を停止し、反応室1内を大気
に戻す。そして被処理物W-1〜4を反応室1から取
り出し、塗装に供する。
Shower tubes 22, 23, 24 and 28 (31,
33), plasma is irradiated from the injection ports 40, 41 toward the surfaces of the objects W-1 to W-4 to uniformly treat the surfaces of the objects W-1 to W-4 . After the treatment for a predetermined period of time, the supply of oxygen gas, the oscillation of microwaves, and the evacuation by the vacuum pump are stopped, and the inside of the reaction chamber 1 is returned to the atmosphere. The objects to be treated W -1 to W -4 are then taken out from the reaction chamber 1 and subjected to coating.

第2図は第1図のような本発明のプラズマ処理
装置を使用して実際に被処理物W-1〜4(P.P)を処
理したときの測定結果をい示すものである。処理
条件および評価方法は、第6図の如き従来のプラ
ズマ処理装置を用いた場合(第7図)と同様であ
り、以下に示すとおりである。
FIG. 2 shows the measurement results when the objects to be processed W -1 to W -4 (PP) were actually processed using the plasma processing apparatus of the present invention as shown in FIG. The processing conditions and evaluation method are the same as in the case of using the conventional plasma processing apparatus as shown in FIG. 6 (FIG. 7), and are as shown below.

反応室形状:2000mm(径)×2000mm(長) 処理条件: マイクロ波周波数:2450MHz 出 力 :500W 真空圧 :0.5Torn 処理時間 :30秒 処理ガス量 :酸素、5/分 評価方法 :接触角(θ)の測定 脱イオン水を、プラズマ処理後にPP表面
に5μ滴下し、接触角測定器(協和化学製、
CA−A型)で測定した(20℃、50〜60%雰
囲気) 第2図に示す結果から明らかなように、第1図
に示したような本発明のプラズマ処理装置によれ
ば、反内室1内のプラズマ濃度が均一化され、比
較的大物で複雑な形状の被処理物であつても被処
理物の配置位置によりあるいは同一被処理物の形
状、部位によりプラズマ処理のバラツキが解消さ
れた。また、塗装後の塗膜との密着性もすべての
部位において良好であつた。
Reaction chamber shape: 2000mm (diameter) x 2000mm (length) Processing conditions: Microwave frequency: 2450MHz Output: 500W Vacuum pressure: 0.5Torn Processing time: 30 seconds Processing gas amount: Oxygen, 5/min Evaluation method: Contact angle ( Measurement of θ) A 5μ drop of deionized water was placed on the PP surface after plasma treatment, and a contact angle measuring device (manufactured by Kyowa Chemical Co., Ltd.,
As is clear from the results shown in FIG. 2, the plasma processing apparatus of the present invention as shown in FIG. The plasma concentration in chamber 1 is made uniform, and even if the workpiece is relatively large and has a complicated shape, variations in plasma processing due to the placement position of the workpiece or the shape or location of the same workpiece are eliminated. Ta. Furthermore, the adhesion to the paint film after painting was also good in all parts.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明のプラズマ処理装置の概略図、
第2図は本発明のプラズマ処理装置における処理
結果を示す図、第3図a,bは反応室内壁に固定
したシヤワ管の詳細図、第4図a,bは可撓性チ
ユーブに接続したシヤワ管の詳細図、第5図は本
発明のプラズマ処理装置の他の実施例を示す概略
図、第6図は従来のプラズマ処理装置の概略図、
第7図は従来のプラズマ処理装置における処理結
果を示す図である。 1……反応室、22,23,24……固定シヤ
ワ管、28,31,33……移動可能なシヤワ
管、26,26a,26b……可撓性チユーブ、
40,41……プラズマ噴射口。
FIG. 1 is a schematic diagram of the plasma processing apparatus of the present invention,
Figure 2 is a diagram showing the processing results in the plasma processing apparatus of the present invention, Figures 3a and b are detailed views of the shower tube fixed to the wall of the reaction chamber, and Figures 4a and b are views of the shower tube connected to the flexible tube. A detailed view of the shower tube, FIG. 5 is a schematic diagram showing another embodiment of the plasma processing apparatus of the present invention, and FIG. 6 is a schematic diagram of a conventional plasma processing apparatus.
FIG. 7 is a diagram showing processing results in a conventional plasma processing apparatus. 1... Reaction chamber, 22, 23, 24... Fixed shower tube, 28, 31, 33... Movable shower tube, 26, 26a, 26b... Flexible tube,
40, 41...Plasma injection port.

Claims (1)

【特許請求の範囲】 1 プラズマ反応室1内で被処理物の表面にプラ
ズマを照射して処理する装置において、プラズマ
照射用の少なくとも1つの第一のシヤワ管22,
23,24を反応室内壁に固定して設置すると共
に、プラズマ照射用の少なくとも1つの第二のシ
ヤワ管28,31,33を反応室内で任意の位置
に移動できるように設けたことを特徴とするプラ
ズマ処理装置。 2 前記第二のシヤワ管は反応室壁部のプラズマ
導入部25に可撓性チユーブ26,26a,26
bを介して接続されている特許請求の範囲第1項
記載の装置。 3 前記第二のシヤワ管は円筒管で構成され、該
円筒管の中心からあらゆる放射方向にプラズマ照
射するべく全周にわたつて多数のプラズマ噴射口
41を有する特許請求の範囲第1項又は第2項記
載の装置。
[Scope of Claims] 1. In an apparatus for treating a surface of a workpiece by irradiating plasma in a plasma reaction chamber 1, at least one first shower tube 22 for plasma irradiation;
23, 24 are fixedly installed on the walls of the reaction chamber, and at least one second shower tube 28, 31, 33 for plasma irradiation is provided so as to be movable to any position within the reaction chamber. plasma processing equipment. 2 The second shower tube is a flexible tube 26, 26a, 26 attached to the plasma introduction part 25 on the wall of the reaction chamber.
2. The device according to claim 1, wherein the device is connected via b. 3. The second shower tube is constituted by a cylindrical tube, and has a large number of plasma injection ports 41 over the entire circumference to irradiate plasma from the center of the cylindrical tube in all radial directions. The device according to item 2.
JP58029370A 1983-02-25 1983-02-25 Apparatus for plasma treatment Granted JPS59155440A (en)

Priority Applications (13)

Application Number Priority Date Filing Date Title
JP58029370A JPS59155440A (en) 1983-02-25 1983-02-25 Apparatus for plasma treatment
AU24671/84A AU549376B2 (en) 1983-02-25 1984-02-16 Plasma treatment
ZA841294A ZA841294B (en) 1983-02-25 1984-02-22 Apparatus and method for plasma treatment of resin material
EP91115536A EP0461683B1 (en) 1983-02-25 1984-02-23 Method for plasma treatment of resin material
EP84101926A EP0120307B1 (en) 1983-02-25 1984-02-23 Apparatus and method for plasma treatment of resin material
DE3486317T DE3486317T2 (en) 1983-02-25 1984-02-23 Device and method for plasma treatment of synthetic resin.
DE3486470T DE3486470T2 (en) 1983-02-25 1984-02-23 Process for plasma treatment of plastic resin
AU49495/85A AU578757B2 (en) 1983-02-25 1985-11-08 Method for plasma treatment of resin material
US06/825,941 US4678644A (en) 1983-02-25 1986-01-30 Apparatus and method for plasma treatment of resin material
AU82240/87A AU603397B2 (en) 1983-02-25 1987-12-08 Apparatus and method for plasma treatment of resin material
AU82238/87A AU8223887A (en) 1983-02-25 1987-12-08 Apparatus and method for plasma treatment of resin material
AU82239/87A AU8223987A (en) 1983-02-25 1987-12-08 Apparatus and method for plasma treatment of resin material
AU82237/87A AU8223787A (en) 1983-02-25 1987-12-08 Apparatus and method for plasma treatment of resin material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58029370A JPS59155440A (en) 1983-02-25 1983-02-25 Apparatus for plasma treatment

Publications (2)

Publication Number Publication Date
JPS59155440A JPS59155440A (en) 1984-09-04
JPH0495B2 true JPH0495B2 (en) 1992-01-06

Family

ID=12274259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58029370A Granted JPS59155440A (en) 1983-02-25 1983-02-25 Apparatus for plasma treatment

Country Status (3)

Country Link
JP (1) JPS59155440A (en)
AU (1) AU578757B2 (en)
ZA (1) ZA841294B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0348193Y2 (en) * 1985-03-16 1991-10-15
JPS62101634A (en) * 1985-10-30 1987-05-12 Hashimoto Forming Co Ltd Production of molding

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5211175A (en) * 1975-07-18 1977-01-27 Toshiba Corp Activated gas reacting apparatus
JPS5378170A (en) * 1976-12-22 1978-07-11 Toshiba Corp Continuous processor for gas plasma etching
JPS53121469A (en) * 1977-03-31 1978-10-23 Toshiba Corp Gas etching unit

Also Published As

Publication number Publication date
JPS59155440A (en) 1984-09-04
AU4949585A (en) 1986-04-24
ZA841294B (en) 1984-10-31
AU578757B2 (en) 1988-11-03

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