JPH04889Y2 - - Google Patents
Info
- Publication number
- JPH04889Y2 JPH04889Y2 JP12310486U JP12310486U JPH04889Y2 JP H04889 Y2 JPH04889 Y2 JP H04889Y2 JP 12310486 U JP12310486 U JP 12310486U JP 12310486 U JP12310486 U JP 12310486U JP H04889 Y2 JPH04889 Y2 JP H04889Y2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- chemical solution
- storage tank
- chemical
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000126 substance Substances 0.000 claims description 49
- 229920003002 synthetic resin Polymers 0.000 claims description 8
- 239000000057 synthetic resin Substances 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 description 16
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案は、主として高温薬液を循環濾過する装
置に関するものである。[Detailed Description of the Invention] [Industrial Field of Application] The present invention mainly relates to an apparatus for circulating and filtering a high-temperature chemical solution.
半導体製造工程でウエハ処理のために高温の薬
液を用いる場合、通常、フイルタ、ドレインバル
ブ、空気抜きバルブ等の各部品を流通管で連結
し、これら各部品間の薬液流路に絶えず清浄な高
温薬液を供給するために、薬液供給ポンプを用い
て高薬液を循環させている。なお、薬液供給ポン
プを含めた上記各部品は、薬液として硫酸などを
用いるため、薬液に接する部分には例えばテフロ
ンなどの合成樹脂を使用している。
When high-temperature chemicals are used for wafer processing in the semiconductor manufacturing process, components such as filters, drain valves, and air vent valves are usually connected through flow pipes, and clean high-temperature chemicals are constantly supplied to the chemical flow paths between these components. In order to supply this, a high chemical solution is circulated using a chemical solution supply pump. In addition, since the above-mentioned parts including the chemical liquid supply pump use sulfuric acid or the like as the chemical liquid, synthetic resin such as Teflon is used for the parts that come into contact with the chemical liquid.
高温薬液の温度は、場合によつては150℃を必
要とし、このため上記各部品に接する室温との間
に大きな温度差を生じ、上記合成樹脂製の各部品
が熱変形を生じて薬液漏れを発生することがあ
る。ことに薬液循環のための圧力を増した場合に
薬液漏れが発生しやすい。
The temperature of the high-temperature chemical solution may need to be 150℃ in some cases, which creates a large temperature difference between it and the room temperature that comes in contact with each of the above parts, causing thermal deformation of each of the above synthetic resin parts and causing the chemical solution to leak. may occur. In particular, when the pressure for circulating the chemical liquid is increased, chemical liquid leakage is likely to occur.
本考案は、上記の各部品と該部品間を連結する
流路の一部を例えば80℃の純水または乾燥空気中
に保持し、上記部品の内部を循環する高温薬液と
これら部品の周波温度との温度差を低減するとと
もに、薬液漏れの検知器を備えたものである。
The present invention maintains each of the above parts and a part of the flow path connecting the parts in pure water or dry air at 80°C, and the high temperature chemical liquid that circulates inside the parts and the frequency temperature of these parts. In addition to reducing the temperature difference between the
高温薬液循環装置に必要な各部品、すなわち、
薬液供給ポンプ、フイルタ、ドレインバルブ、空
気抜きバルブ等を、第１図に示すように金属、合
成樹脂等で作られた収納槽８内に収納し、上記収
納槽８内に純水または乾燥空気を満たすことによ
つて例えば80℃に保持し、循環する高温薬液の温
度が150℃であつても、上記各部品の薬液に接触
する部分における外壁との温度差は70deg.に保た
れ、熱変形によつて生じる薬液漏れを防止するこ
とができる。なお、上記収納槽８内には薬液漏れ
の検知装置を設けて、薬液漏れが発生した場合に
は警報を発するなどして災害を防止する。
Each part required for high temperature chemical circulation equipment, namely:
A chemical solution supply pump, a filter, a drain valve, an air vent valve, etc. are housed in a storage tank 8 made of metal, synthetic resin, etc., as shown in Fig. 1, and pure water or dry air is supplied into the storage tank 8. For example, even if the temperature of the circulating high-temperature chemical is 150°C, the temperature difference between the parts of the parts that come into contact with the chemical and the outer wall will be maintained at 70 degrees, preventing thermal deformation. It is possible to prevent chemical leakage caused by It should be noted that a chemical liquid leakage detection device is provided in the storage tank 8 to prevent disasters by emitting an alarm when chemical liquid leakage occurs.
つぎに本考案の実施例を図面とともに説明す
る。第１図は本考案による高温薬液循環濾過装置
の一実施例を示す構成図である。第１図におい
て、加熱用ヒータ１を設けた薬液槽２からオーバ
フローした高温薬液は、流通管３を経由して薬液
供給ポンプ４およびフイルタ５，５′を通り、バ
ルブを経てウエハ処理等のために供給されるが、
上記薬液供給ポンプ４やフイルタ５，５′をはじ
め、高温薬液の流路となるドレインバルブ６や空
気抜きバルブ７等を、金属または合成樹脂で製作
された収納槽８内に収納し、上記収納槽８内には
純水または乾燥空気をほぼ満たすことにより、薬
液供給ポンプ４等の部品を構成する合成樹脂の軟
化変形温度以下に保持する。上記のように構成し
たことにより、高温薬液の温度が150℃であつた
としても、上記高温薬液が流通する流路の外側温
度は例えば80℃に保たれているため、流通管３を
含めて上記収納槽８内にある各部品の内外温度差
は70degをこえることがなく、したがつて上記各
部品およびその接合部が熱変形によつて薬液漏れ
を弱じることはない。また薬液漏れの検知器（図
示せず）を上記収納槽８内に備えたため、万一、
高温薬液が各部品の接合部などから漏れた場合に
は、警報等により直ちに装置の運転を停止し、危
険状態を回避することが可能である。薬液漏れの
検知装置としては、例えば純水を用いる場合には
PHの変化を検知し、また乾燥空気を使用する場合
には吸液性の絶縁被覆を施した導体を近接相対さ
せながら各部品表面に設置する方法などを採用す
ることができる。
Next, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a block diagram showing an embodiment of a high-temperature chemical solution circulation filtration device according to the present invention. In FIG. 1, high-temperature chemical liquid that overflows from a chemical liquid tank 2 equipped with a heating heater 1 passes through a flow pipe 3, a chemical liquid supply pump 4, and filters 5, 5', passes through a valve, and is used for wafer processing, etc. is supplied to
The chemical solution supply pump 4, filters 5, 5', drain valve 6, air vent valve 7, etc., which serve as flow paths for high-temperature chemical solutions, are housed in a storage tank 8 made of metal or synthetic resin. By substantially filling the interior of the container 8 with pure water or dry air, the temperature is kept below the softening and deforming temperature of the synthetic resin constituting parts such as the chemical solution supply pump 4 . With the above configuration, even if the temperature of the high-temperature chemical is 150°C, the outside temperature of the flow path through which the high-temperature chemical flows is maintained at, for example, 80°C. The temperature difference between the inside and outside of each component in the storage tank 8 does not exceed 70 degrees, so that the leakage of the chemical solution is not weakened by thermal deformation of the components and their joints. In addition, a chemical leakage detector (not shown) is provided in the storage tank 8, so in case of
If high-temperature chemical liquid leaks from the joints of various parts, it is possible to immediately stop the operation of the device with an alarm, etc., and avoid a dangerous situation. For example, when using pure water as a chemical leak detection device,
If changes in PH are detected and dry air is used, a method can be adopted in which conductors coated with liquid-absorbing insulating coatings are installed on the surface of each component in close proximity to each other.
なお、上記収納槽８は金属または合成樹脂の他
にガラスで製作することも可能であるが、機械的
あるいは熱的衝撃に弱く、また弗酸を取扱うこと
もあるため、実用的とはいえない。 Note that the storage tank 8 can be made of glass in addition to metal or synthetic resin, but this is not practical because it is susceptible to mechanical or thermal shock and may involve handling hydrofluoric acid. .
上記のように本考案による高温薬液循環濾過装
置は、高温薬液を濾過して循環供給する高温薬液
循環濾過装置において、薬液供給ポンプ、フイル
タ、ドレインバルブ、空気抜きバルブ等の各部品
を収納する金属または合成樹脂よりなる収納槽を
設け、上記収納槽内を純水または乾燥空気によつ
て例えば80℃に保持するとともに、上記各部品の
薬液漏れを検知する検知装置を、上記収納槽内に
設置したことにより、高温薬液が流れる流路の各
部品における内外の温度差を低減することができ
るため、上記各部品およびその接合部の熱変形に
起因する薬液漏れを防ぎ、また、万一薬液漏れを
生じた場合には、直ちにこれを検知し災害を未然
に防ぐことができる。
As described above, the high-temperature chemical solution circulation filtration device according to the present invention is a high-temperature chemical solution circulation filtration device that filters and circulates high-temperature chemical solution. A storage tank made of synthetic resin is provided, and the inside of the storage tank is maintained at, for example, 80°C with pure water or dry air, and a detection device for detecting chemical leakage from each of the parts is installed in the storage tank. By doing so, it is possible to reduce the temperature difference between the inside and outside of each part of the flow path through which high-temperature chemical liquid flows, thereby preventing chemical liquid leakage caused by thermal deformation of the above-mentioned parts and their joints, and also preventing chemical liquid leakage in the unlikely event of a chemical liquid leakage. If a disaster occurs, it can be detected immediately and a disaster can be prevented.
図は本考案による高温薬液循環濾過装置の一実
施例を示す構成図である。
４……薬液供給ポンプ、５，５′……フイルタ、
６……ドレインバルブ、７……空気抜きバルブ、
８……収納槽。
The figure is a configuration diagram showing an embodiment of a high-temperature chemical solution circulation filtration device according to the present invention. 4... Chemical solution supply pump, 5, 5'... Filter,
6...Drain valve, 7...Air vent valve,
8...Storage tank.
Claims (1)
濾過装置において、薬液供給ポンプ、フイルタ、
ドレインバルブ、空気抜きバルブ等の各部品を収
納する金属または合成樹脂よりなる収納槽を設
け、上記収納槽内を純水または乾燥空気によつて
80℃に保持するとともに、上記各部品の薬液漏れ
を検知する検知装置を、上記収納槽内に設置した
ことを特徴とする高温薬液循環濾過装置。 A high-temperature chemical solution circulation filtration device that filters and circulates high-temperature chemical solution includes a chemical solution supply pump, a filter,
A storage tank made of metal or synthetic resin is provided to store parts such as drain valves and air vent valves, and the inside of the storage tank is filled with pure water or dry air.
A high-temperature chemical solution circulation filtration device, characterized in that a detection device for maintaining the temperature at 80° C. and detecting chemical solution leakage from each of the above-mentioned parts is installed in the storage tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12310486U JPH04889Y2 (en) | 1986-08-11 | 1986-08-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12310486U JPH04889Y2 (en) | 1986-08-11 | 1986-08-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6332612U JPS6332612U (en) | 1988-03-02 |
| JPH04889Y2 true JPH04889Y2 (en) | 1992-01-13 |
Family
ID=31013900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12310486U Expired JPH04889Y2 (en) | 1986-08-11 | 1986-08-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04889Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005088685A1 (en) * | 2004-03-16 | 2005-09-22 | Hirata Corporation | Treatment liquid feeding system and filter device |
-
1986
- 1986-08-11 JP JP12310486U patent/JPH04889Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6332612U (en) | 1988-03-02 |
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