JPH0483704A - Liquid composition for forming metallic oxide film, its production and production of metallic oxide film - Google Patents
Liquid composition for forming metallic oxide film, its production and production of metallic oxide filmInfo
- Publication number
- JPH0483704A JPH0483704A JP20006990A JP20006990A JPH0483704A JP H0483704 A JPH0483704 A JP H0483704A JP 20006990 A JP20006990 A JP 20006990A JP 20006990 A JP20006990 A JP 20006990A JP H0483704 A JPH0483704 A JP H0483704A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- acid
- oxide film
- hereinafter referred
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 88
- 239000007788 liquid Substances 0.000 title claims description 42
- 229910044991 metal oxide Inorganic materials 0.000 title claims description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- RSWGJHLUYNHPMX-UHFFFAOYSA-N 1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylic acid Chemical compound C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 claims abstract description 40
- 239000002253 acid Substances 0.000 claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 32
- 239000002184 metal Substances 0.000 claims abstract description 32
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 22
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 18
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000003960 organic solvent Substances 0.000 claims abstract description 13
- BTXXTMOWISPQSJ-UHFFFAOYSA-N 4,4,4-trifluorobutan-2-one Chemical compound CC(=O)CC(F)(F)F BTXXTMOWISPQSJ-UHFFFAOYSA-N 0.000 claims abstract description 12
- BQACOLQNOUYJCE-FYZZASKESA-N Abietic acid Natural products CC(C)C1=CC2=CC[C@]3(C)[C@](C)(CCC[C@@]3(C)C(=O)O)[C@H]2CC1 BQACOLQNOUYJCE-FYZZASKESA-N 0.000 claims abstract description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 11
- 150000003839 salts Chemical class 0.000 claims abstract description 10
- MHVJRKBZMUDEEV-APQLOABGSA-N (+)-Pimaric acid Chemical compound [C@H]1([C@](CCC2)(C)C(O)=O)[C@@]2(C)[C@H]2CC[C@](C=C)(C)C=C2CC1 MHVJRKBZMUDEEV-APQLOABGSA-N 0.000 claims abstract description 9
- MHVJRKBZMUDEEV-UHFFFAOYSA-N (-)-ent-pimara-8(14),15-dien-19-oic acid Natural products C1CCC(C(O)=O)(C)C2C1(C)C1CCC(C=C)(C)C=C1CC2 MHVJRKBZMUDEEV-UHFFFAOYSA-N 0.000 claims abstract description 9
- 230000001476 alcoholic effect Effects 0.000 claims abstract description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 7
- 125000001424 substituent group Chemical group 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims description 32
- 150000004706 metal oxides Chemical class 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 23
- 229920005989 resin Polymers 0.000 claims description 23
- 150000007513 acids Chemical class 0.000 claims description 20
- 150000002736 metal compounds Chemical class 0.000 claims description 20
- 235000008331 Pinus X rigitaeda Nutrition 0.000 claims description 11
- 235000011613 Pinus brutia Nutrition 0.000 claims description 11
- 241000018646 Pinus brutia Species 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 230000001590 oxidative effect Effects 0.000 claims description 2
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 abstract description 18
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 abstract description 18
- 238000010438 heat treatment Methods 0.000 abstract description 14
- 238000002156 mixing Methods 0.000 abstract description 12
- 125000004429 atom Chemical group 0.000 abstract description 9
- 150000002902 organometallic compounds Chemical class 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract description 4
- 239000003446 ligand Substances 0.000 abstract description 2
- 229910000765 intermetallic Inorganic materials 0.000 abstract 2
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 239000010408 film Substances 0.000 description 67
- 239000010409 thin film Substances 0.000 description 23
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- WRYLYDPHFGVWKC-UHFFFAOYSA-N 4-terpineol Chemical compound CC(C)C1(O)CCC(C)=CC1 WRYLYDPHFGVWKC-UHFFFAOYSA-N 0.000 description 16
- -1 Tie Substances 0.000 description 16
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 15
- 229940116411 terpineol Drugs 0.000 description 15
- 238000007598 dipping method Methods 0.000 description 14
- 239000011521 glass Substances 0.000 description 11
- 239000012046 mixed solvent Substances 0.000 description 11
- 235000019441 ethanol Nutrition 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 150000004703 alkoxides Chemical class 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 9
- 238000003860 storage Methods 0.000 description 9
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000002131 composite material Substances 0.000 description 7
- 239000000706 filtrate Substances 0.000 description 7
- 238000010304 firing Methods 0.000 description 7
- 239000012456 homogeneous solution Substances 0.000 description 7
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000007928 solubilization Effects 0.000 description 6
- 238000005063 solubilization Methods 0.000 description 6
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 238000007792 addition Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LVRFTAZAXQPQHI-UHFFFAOYSA-N 2-hydroxy-4-methylvaleric acid Chemical compound CC(C)CC(O)C(O)=O LVRFTAZAXQPQHI-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000004310 lactic acid Substances 0.000 description 3
- 235000014655 lactic acid Nutrition 0.000 description 3
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- QYIGOGBGVKONDY-UHFFFAOYSA-N 1-(2-bromo-5-chlorophenyl)-3-methylpyrazole Chemical compound N1=C(C)C=CN1C1=CC(Cl)=CC=C1Br QYIGOGBGVKONDY-UHFFFAOYSA-N 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- BCLSJHWBDUYDTR-UHFFFAOYSA-N 2-(propylamino)ethanol Chemical compound CCCNCCO BCLSJHWBDUYDTR-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 240000004307 Citrus medica Species 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- 150000002169 ethanolamines Chemical class 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 229930014626 natural product Natural products 0.000 description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 2
- 239000004246 zinc acetate Substances 0.000 description 2
- YPGLTKHJEQHKSS-ASZLNGMRSA-N (1r,4ar,4bs,7r,8as,10ar)-1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,7,8,8a,9,10,10a-dodecahydrophenanthrene-1-carboxylic acid Chemical compound [C@H]1([C@](CCC2)(C)C(O)=O)[C@@]2(C)[C@H]2CC[C@@H](C(C)C)C[C@@H]2CC1 YPGLTKHJEQHKSS-ASZLNGMRSA-N 0.000 description 1
- RBNPOMFGQQGHHO-UHFFFAOYSA-N -2,3-Dihydroxypropanoic acid Natural products OCC(O)C(O)=O RBNPOMFGQQGHHO-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- PXVVQEJCUSSVKQ-XWVZOOPGSA-N 2-(2-hydroxyethoxy)ethyl (1r,4ar,4br,10ar)-1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylate Chemical compound C([C@@H]12)CC(C(C)C)=CC1=CC[C@@H]1[C@]2(C)CCC[C@@]1(C)C(=O)OCCOCCO PXVVQEJCUSSVKQ-XWVZOOPGSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- FEWFXBUNENSNBQ-UHFFFAOYSA-N 2-hydroxyacrylic acid Chemical compound OC(=C)C(O)=O FEWFXBUNENSNBQ-UHFFFAOYSA-N 0.000 description 1
- UZZYXZWSOWQPIS-UHFFFAOYSA-N 3-fluoro-5-(trifluoromethyl)benzaldehyde Chemical compound FC1=CC(C=O)=CC(C(F)(F)F)=C1 UZZYXZWSOWQPIS-UHFFFAOYSA-N 0.000 description 1
- WRYLYDPHFGVWKC-SNVBAGLBSA-N 4-Terpineol Natural products CC(C)[C@]1(O)CCC(C)=CC1 WRYLYDPHFGVWKC-SNVBAGLBSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RBNPOMFGQQGHHO-UWTATZPHSA-N D-glyceric acid Chemical compound OC[C@@H](O)C(O)=O RBNPOMFGQQGHHO-UWTATZPHSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 239000001293 FEMA 3089 Substances 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- KGMSWPSAVZAMKR-UHFFFAOYSA-N Me ester-3, 22-Dihydroxy-29-hopanoic acid Natural products C1CCC(C(O)=O)(C)C2C1(C)C1CCC(=C(C)C)C=C1CC2 KGMSWPSAVZAMKR-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- KGMSWPSAVZAMKR-ONCXSQPRSA-N Neoabietic acid Chemical compound [C@H]1([C@](CCC2)(C)C(O)=O)[C@@]2(C)[C@H]2CCC(=C(C)C)C=C2CC1 KGMSWPSAVZAMKR-ONCXSQPRSA-N 0.000 description 1
- 229910004537 TaCl5 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- OVXRPXGVKBHGQO-UHFFFAOYSA-N abietic acid methyl ester Natural products C1CC(C(C)C)=CC2=CCC3C(C(=O)OC)(C)CCCC3(C)C21 OVXRPXGVKBHGQO-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- UMRSVAKGZBVPKD-UHFFFAOYSA-N acetic acid;copper Chemical compound [Cu].CC(O)=O UMRSVAKGZBVPKD-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- OVXRPXGVKBHGQO-UYWIDEMCSA-N methyl (1r,4ar,4br,10ar)-1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylate Chemical compound C1CC(C(C)C)=CC2=CC[C@H]3[C@@](C(=O)OC)(C)CCC[C@]3(C)[C@H]21 OVXRPXGVKBHGQO-UYWIDEMCSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 125000005487 naphthalate group Chemical group 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- UIUJIQZEACWQSV-UHFFFAOYSA-N succinic semialdehyde Chemical compound OC(=O)CCC=O UIUJIQZEACWQSV-UHFFFAOYSA-N 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000002887 superconductor Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は、金属酸化物膜形成用の液状組成物およびその
製造法並びに金属酸化物膜の形成法に関し、詳細には、
単元系の金属酸化物膜から複合系の酸化物膜に亘たる様
々の金属酸化物膜の製造原料となる液状組成物およびそ
の製造法並びにその組成物を用いて金属酸化物膜を形成
する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a liquid composition for forming a metal oxide film, a method for producing the same, and a method for forming a metal oxide film.
A liquid composition that serves as a raw material for manufacturing various metal oxide films ranging from single-component metal oxide films to composite metal oxide films, a method for producing the same, and a method for forming a metal oxide film using the composition. It is related to.
[従来の技術]
金属酸化物系の膜を形成する方法としては、真空下ある
いはアルゴン等の不活性ガス雰囲気下て行なわれるスパ
ッタリング法、蒸着法、イオンビーム法、CVD法の如
く、固体を一旦気化させた後基板上に析出させる方法が
主流となっている。[Prior Art] Methods for forming metal oxide films include sputtering, vapor deposition, ion beam method, and CVD, which are performed under vacuum or in an inert gas atmosphere such as argon. The mainstream method is to vaporize the material and then deposit it on the substrate.
しかしながらこれらの方法は、設備費が高価であるばか
りでなく、複合酸化物を構成する各成分の蒸発速度や析
出速度が異なるため膜成分の調整が困難であり、目標通
りの特性が得られるとは限らない。また複合金属酸化物
の微粉末をスラリー状にしてから基板上に塗布して焼成
するドクターブレード法も知られているが、この方法の
場合は、膜厚が酸化物微粉末の粒径あるいはその凝集体
としての粒子の大きさによって影響を受けるため、均一
で目標通りの膜厚のものが得られ難い。However, these methods not only require high equipment costs, but also make it difficult to adjust the film components because the evaporation rate and precipitation rate of each component that makes up the composite oxide differs, and it is difficult to obtain the desired properties. is not limited. Another known method is the doctor blade method, in which fine composite metal oxide powder is made into a slurry, coated on a substrate, and fired. Since it is affected by the size of particles as aggregates, it is difficult to obtain a uniform film thickness as desired.
これらに対して溶剤可溶性の有機金属化合物を原料とす
る薄膜の製法であれば、2種以上の金属化合物を任意の
比率で複合することができるので目標通りの薄膜が得れ
れ易く、しかも必要によっては単結晶質の薄膜を形成し
得るところから、トランジスタやダイオード等の電子素
子分野にも利用されはじめている。On the other hand, if a thin film manufacturing method uses solvent-soluble organometallic compounds as raw materials, it is possible to combine two or more metal compounds in any ratio, making it easier to obtain the desired thin film, and moreover, as needed. Since it is possible to form single-crystalline thin films, it has begun to be used in the field of electronic devices such as transistors and diodes.
こうした有機金属化合物を用いる薄膜化技術の1つとし
て、金属アルコキシドを用いるゾル−ゲル法があり、こ
の方法によりTie、薄膜、5in2薄膜、ZrO2薄
膜など数種の金属酸化物薄膜を製造する方法が開発され
ている。また有機酸の金属塩を出発原料とし、これを溶
剤で希釈してから基板上に塗布し次いで加熱して酸化物
薄膜を得る熱分解法も知られており、たとえばステアリ
ン酸塩、ナフテン酸塩、オクチル酸塩等を用いてZnO
2薄膜やIn2O3薄膜あるいは5n02薄膜などを得
る方法が提案されている。One of the thin film forming techniques using such organometallic compounds is the sol-gel method using metal alkoxides, and this method can be used to produce several types of metal oxide thin films such as Tie, thin film, 5in2 thin film, and ZrO2 thin film. being developed. Also known is a thermal decomposition method that uses a metal salt of an organic acid as a starting material, dilutes it with a solvent, coats it on a substrate, and then heats it to obtain an oxide thin film. , octylate, etc.
Methods for obtaining a 2 thin film, an In2O3 thin film, a 5n02 thin film, etc. have been proposed.
しかしながら上記の様な有機金属化合物のうち金属アル
コキシドは概して高価であり、しかも金属アルコキシド
の種類によっては最適溶剤の種類や溶解度が違うので、
すべての金属アルコキシドをあらゆる配合組成で組合せ
ることができる訳ではない。However, among the organometallic compounds mentioned above, metal alkoxides are generally expensive, and the type of optimal solvent and solubility differ depending on the type of metal alkoxide.
Not all metal alkoxides can be combined in all formulations.
また例えば5n02膜、I n203膜、pb02膜、
ZrO2膜等の形成原料として使用されるナフテン酸塩
、オクチル酸塩、ステアリン酸塩、カプリル酸塩等の有
機酸塩は比較的安価に人手することができるが、液状物
としての保存安定性が悪い場合が多く、しかも皮膜の平
滑性が悪くなるという問題がある。更に有機金属化合物
の1種である金属錯化合物を金属酸化物薄膜の形成原料
として用いる試みもなされているが、この方法を採用し
た場合は、皮膜の平滑性や基板に対する密着性等が悪い
ため実用性を欠く。一方、最近注目を集めている超電導
性材料としてY−Ba−Cu系およびB i−3r−C
a−Cu系の複合金属酸化物があり、この様な複合酸化
物よりなる薄膜を製造するのに溶剤可溶性の金属有機酸
塩を用いたり、あるいは金属アルコキシドにキレート剤
を加え、有機溶剤に可溶化して利用することも試みられ
ている。即ちこれらの方法は、当該金属元素を含む溶剤
可溶性の有機酸塩や金属アルコキシドを調整し、それら
を適当な組成になる様に混合してから基板上に塗布し、
乾燥した後酸化・熱分解して複合金属酸化物膜を得よう
とするものである。ところがこの方法では、各有機酸塩
や金属アルコキシド等を含む溶液の安定性やそれらを用
いて得られる混合液の安定性が悪く、一部の金属化合物
が析出してくるため、目標通りの組成を有する金属酸化
物膜が得られにくく、得られたとしても皮膜そのものが
脆弱であったり、あるいは基板に対する密着性が悪いと
いりた問題がある。また有機酸塩および金属アルコキシ
ドなどの有機金属化合物は、限られた元素しか市販品と
して入手することができず、また合成すること自体が困
難であるものが多いので、この方法によって製造し得る
複合金属酸化物膜の種類は著しく制限される。Also, for example, 5n02 film, In203 film, pb02 film,
Organic acid salts such as naphthenate, octylate, stearate, and caprylate, which are used as raw materials for forming ZrO2 films, can be produced manually at relatively low cost, but they have poor storage stability as liquid substances. Moreover, there is a problem that the smoothness of the film deteriorates in many cases. Furthermore, attempts have been made to use a metal complex compound, which is a type of organometallic compound, as a raw material for forming metal oxide thin films, but when this method is adopted, the smoothness of the film and the adhesion to the substrate are poor. Lacks practicality. On the other hand, Y-Ba-Cu and B i-3r-C are superconducting materials that have recently attracted attention.
There are a-Cu-based composite metal oxides, and to produce thin films made of such composite oxides, solvent-soluble metal organic acid salts are used, or chelating agents are added to metal alkoxides to produce thin films that are soluble in organic solvents. Attempts have also been made to use it by dissolving it. That is, these methods prepare solvent-soluble organic acid salts and metal alkoxides containing the metal element, mix them to an appropriate composition, and then apply the mixture onto a substrate.
After drying, it is oxidized and thermally decomposed to obtain a composite metal oxide film. However, with this method, the stability of solutions containing organic acid salts, metal alkoxides, etc. and the stability of the mixture obtained using them is poor, and some metal compounds precipitate, making it difficult to achieve the desired composition. It is difficult to obtain a metal oxide film having the following properties, and even if it is obtained, there are problems in that the film itself is fragile or has poor adhesion to the substrate. In addition, organic metal compounds such as organic acid salts and metal alkoxides are commercially available with only a limited number of elements, and many of them are difficult to synthesize. The types of metal oxide films are severely limited.
[発明が解決しようとする課題]
本発明はこの様な事情に着目してなされたものであって
、その目的は、従来技術に指摘される。上記の様な問題
点を解消し、どの様な基板に対しても優れた密着性を示
し且つ膜形成能に優れた、単元系から複合系に亘たる様
々の金属酸化物膜を容易に製造することのできる液状組
成物およびその製法を提供しようとするものである。本
発明の他の目的は、この様な液状組成物を用いて亀裂等
の欠陥のない均質で健全な金属酸化物膜を形成する方法
を提供しようとするものである。[Problems to be Solved by the Invention] The present invention has been made paying attention to such circumstances, and its purpose is pointed out in the prior art. Easily produces various metal oxide films ranging from single element systems to composite systems, which solves the above problems and exhibits excellent adhesion to any substrate and excellent film formation ability. The purpose of the present invention is to provide a liquid composition and a method for producing the same. Another object of the present invention is to provide a method for forming a homogeneous and sound metal oxide film free of defects such as cracks using such a liquid composition.
[課題を解決するための手段]
上記課題を解決することのできた本発明に係る金属酸化
物膜形成用液状組成物の構成は、■無機金属塩および有
機金属化合物よりなる群から選択される1種または2種
以上の金属化合物(以下、Maという)、
■窒素および/または酸素を配位原子として1〜6個有
する有機化合物の1種または2種以上(以下、Lbとい
う)、
■置換基としてアルコール性水酸基を1または2個有す
る1塩基酸の1種または2種以上(以下、Ac仁いう)
、
■松脂、アビエチン酸およびピマール酸よりなる群から
選択される1種または2種以上の樹脂酸(以下、Rdと
いう)、
■有機溶剤(以下、Seという)を
上記Maの金属換算で1グラム原子に対して、Lbおよ
び/またはAcを総和で0.1〜4モル含有すると共に
、組成物全量中に占めるRdの含有量が5〜80重量%
、Seの含有量が5〜80重量%となる様に配合してな
るところに要旨を有するものである。[Means for Solving the Problems] The composition of the liquid composition for forming a metal oxide film according to the present invention that can solve the above problems is as follows: (1) selected from the group consisting of inorganic metal salts and organic metal compounds; species or two or more metal compounds (hereinafter referred to as Ma), ■ one or more organic compounds having 1 to 6 nitrogen and/or oxygen as coordinating atoms (hereinafter referred to as Lb), ■ substituents One or more monobasic acids having one or two alcoholic hydroxyl groups (hereinafter referred to as Ac)
, ■ One or more resin acids selected from the group consisting of pine resin, abietic acid, and pimaric acid (hereinafter referred to as Rd); ■ 1 gram of an organic solvent (hereinafter referred to as Se) in terms of the metal of the above Ma. Contains 0.1 to 4 moles of Lb and/or Ac in total per atom, and the content of Rd in the total composition is 5 to 80% by weight.
The gist is that the content of Se is 5 to 80% by weight.
この液状組成物は、上記Maの金属換算で1グラム原子
に対して、Lbおよび/またはAcが総和で0.1〜4
モル、組成物全量中に占めるRdおよびSeの各含有量
がそれぞれ5〜80重量%となる様に、各成分を同時も
しくは任意の順序で混合すると共に、混合成分としてS
eが含まれる混合時においては、加熱し若しくはアンモ
ニアガスを存在させて溶液化することによって容易に得
ることができ、またこの液状組成物を適当な基板上に塗
布・乾燥した後440℃以上で酸化焼成すると、均質で
優れた物性の金属酸化物膜を得ることができる。In this liquid composition, the total amount of Lb and/or Ac is 0.1 to 4 per 1 gram atom of Ma in terms of metal.
The components are mixed simultaneously or in any order so that the respective contents of Rd and Se in the total amount of the composition are 5 to 80% by weight, and S is added as a mixed component.
When mixing containing e, it can be easily obtained by heating or making a solution in the presence of ammonia gas, and after coating and drying this liquid composition on a suitable substrate, it can be heated at 440°C or higher. When oxidized and fired, a metal oxide film that is homogeneous and has excellent physical properties can be obtained.
[作用]
前述の如く本発明に係る金属酸化物膜形成用組成物は、
無機金属塩および有機金属化合物よりなる群から選ばれ
る金属化合物(Ma)を、窒素および/または酸素を配
位原子として1〜6個有する有機化合物の1種または2
種以上(Lb)、および置換基としてアルコール性水酸
基を1または2個有する1塩基酸の1種または2種以上
(Ac)と組み合わせることのよって有機溶剤(Se)
に可溶化し、且つ更に他の成分として松脂、アビエチン
酸およびピマール酸よりなる群から選択される1種また
は2種以上の樹脂酸類(Rd)を配合することによって
金属含有成分の可溶化を一層促進させると共に溶液の保
存安定性を高め、更には膜形成能および基板への密着性
を高めたところに特徴を有するものである。[Function] As mentioned above, the metal oxide film forming composition according to the present invention has the following effects:
A metal compound (Ma) selected from the group consisting of inorganic metal salts and organic metal compounds, and one or two organic compounds having 1 to 6 nitrogen and/or oxygen coordinating atoms.
(Lb) and one or more monobasic acids having one or two alcoholic hydroxyl groups as a substituent (Ac).
The solubilization of metal-containing components is further enhanced by further blending one or more resin acids (Rd) selected from the group consisting of pine resin, abietic acid, and pimaric acid as other components. It is characterized by the fact that it accelerates the process, improves the storage stability of the solution, and furthermore improves film-forming ability and adhesion to the substrate.
本発明において金属化合物(Ma)としては(イ)金属
のハロゲン化物、硝酸塩、炭素数1〜8を有するカルボ
ン酸あるいはアルコール性水酸基を1または2個有する
炭素数1〜8のモノカルボン酸およびナフテン酸塩等の
シクロペンタン環またはシクロヘキサン環を有する金属
カルホン酸塩などの無機金属塩、
(ロ)窒素および/または酸素を配位原子として1〜6
個有する有機金属化合物、例えばアセチルアセトンで代
表されるβ−ジケトン系化合物;モノメチルアミン、ジ
メチルアミン、ジエチルアミン、トリメチルアミン、ト
リエチルアミン等で代表されるアルキルアミン類;モノ
エタノールアミン、ジェタノールアミン、トリエタノー
ルアミン、N−メチルエタノールアミン、N−メチルジ
ェタノールアミン、N−プロピルエタノールアミンなど
で代表されるエタノールアミン類;アセト酢酸メチル、
アセト酢酸エチル等で代表されるβ−ケトン酸エステル
類、アンモニア、エチレンジアミン、トリエチレンテト
ラミン等に代表されるアミン化合物等を配位子として1
個以上含有する金属錯化合物、
(八)メチル基、エチル基、プロピル基、ブチル基なと
のアルキル基を有する金属アルコキシド類等の有機金属
化合物、
(ニ)松脂、アビエチン酸、ピマール酸などの樹脂酸類
の金属塩
なとが例示される。In the present invention, the metal compound (Ma) includes (a) metal halides, nitrates, carboxylic acids having 1 to 8 carbon atoms, monocarboxylic acids having 1 to 8 carbon atoms having 1 or 2 alcoholic hydroxyl groups, and naphthenes; Inorganic metal salts such as metal carbhonates having a cyclopentane ring or cyclohexane ring such as acid salts, (b) 1 to 6 nitrogen and/or oxygen coordinating atoms;
Organometallic compounds, such as β-diketone compounds represented by acetylacetone; Alkylamines represented by monomethylamine, dimethylamine, diethylamine, trimethylamine, triethylamine, etc.; monoethanolamine, jetanolamine, triethanolamine, Ethanolamines represented by N-methylethanolamine, N-methyljetanolamine, N-propylethanolamine, etc.; Methyl acetoacetate,
β-ketonic acid esters represented by ethyl acetoacetate, etc., amine compounds represented by ammonia, ethylenediamine, triethylenetetramine, etc. are used as ligands.
(8) Organometallic compounds such as metal alkoxides having alkyl groups such as methyl, ethyl, propyl, and butyl groups; (d) Pine resin, abietic acid, pimaric acid, etc. Examples include metal salts of resin acids.
次に窒素および/または酸素を配位原子として1〜6個
有する有機化合物(Lb)としては、アンモニア、エチ
レンジアミン、トリエチレンテトラミンなどのアミン類
:モノメチルアミン、モノメチルアミン、モノエチルア
ミン、ジメチルアミン、ジエチルアミン、トリメチルア
ミン、トリエチルアミンなどのアルキルアミン類;モノ
エタノールアミン、ジェタノールアミン、トリエタノー
ルアミン、N−メチルエタノールアミン、N−メチルジ
ェタノールアミン、N−プロピルエタノールアミンなど
のエタノールアミン類;アセチルアセトンなどのβ−ジ
ケトン化合物:アセト酢酸メチル、アセト酢酸エチルな
どのβ−ジケトン酸二不テル類、エチレングリコール、
ジエチレングリコール、グリセリンなどの多価アルコー
ル類等が例示される。尚配位能を有する原子としては窒
素や酸素のほかP、As% S、Seなどがあるが、本
発明では、焼成することにより消失し易く且つ毒性の無
いものとして窒素と酸素を選択した。Next, as organic compounds (Lb) having 1 to 6 nitrogen and/or oxygen as coordinating atoms, amines such as ammonia, ethylenediamine, triethylenetetramine: monomethylamine, monomethylamine, monoethylamine, dimethylamine, diethylamine Alkylamines such as , trimethylamine, and triethylamine; Ethanolamines such as monoethanolamine, jetanolamine, triethanolamine, N-methylethanolamine, N-methylgetanolamine, and N-propylethanolamine; β such as acetylacetone - Diketone compounds: β-diketonate dimethyls such as methyl acetoacetate and ethyl acetoacetate, ethylene glycol,
Examples include polyhydric alcohols such as diethylene glycol and glycerin. In addition to nitrogen and oxygen, atoms having coordinating ability include P, As% S, Se, etc. In the present invention, nitrogen and oxygen were selected because they are easily eliminated by firing and are non-toxic.
1塩基酸(Ac)としては、置換基としてアルコール性
水酸基を1または2個有する1塩基酸、たとえばグリコ
ール酸、ヒドロアクリル酸、乳酸、グリセリン酸、α−
オキシ酪酸、γ−オキシ酪酸、トリメチロール酢酸、オ
キシトリメチル酢酸、2−ヒドロキシ−2−メチル酢酸
、ロイシン酸等が挙げられる。これらの中でも特に好ま
しいのは、前記金属元素とともに5員環あるいは6員環
を形成し得る1塩基酸、たとえばグリコール酸、ヒドロ
キシアクリル酸、乳酸、α−オキシ酪酸およびβ−オキ
シ酪酸、ロイシン酸などであり、これらを単独で若しく
は有機化合物(Lb)と組合せて使用すると、均一で且
つ1年以上の保存安定性を持った溶液を得ることができ
る。Examples of monobasic acids (Ac) include monobasic acids having one or two alcoholic hydroxyl groups as substituents, such as glycolic acid, hydroacrylic acid, lactic acid, glyceric acid, α-
Examples include oxybutyric acid, γ-oxybutyric acid, trimethyloleacetic acid, oxytrimethylacetic acid, 2-hydroxy-2-methylacetic acid, and leucinic acid. Particularly preferred among these are monobasic acids that can form a 5- or 6-membered ring with the metal element, such as glycolic acid, hydroxyacrylic acid, lactic acid, α-oxybutyric acid, β-oxybutyric acid, and leucinic acid. When these are used alone or in combination with an organic compound (Lb), it is possible to obtain a solution that is uniform and has storage stability for one year or more.
上記の金属化合物(Lb)および1塩基酸(Ac)は、
いずれも金属化合物(Ma)の有機溶剤(Se)への可
溶化を促進すると共に保存安定性を高める作用があり、
これらは単独で使用し得るほか、必要により2種以上を
組合せて使用することができる。The above metal compound (Lb) and monobasic acid (Ac) are
Both have the effect of promoting solubilization of metal compounds (Ma) in organic solvents (Se) and increasing storage stability.
These can be used alone or in combination of two or more types if necessary.
またその使用量は、前記金属化合物(Ma)の金属換算
で1グラム原子当たり(Lb)および/または(Ac)
の総和で0.1〜4モルの範囲、好ましくは0.5〜3
モルの範囲とすべきであり、0.1モル未満では有機溶
剤への可溶化と保存安定性が悪くなり、均一な溶液が得
られない。The amount used is (Lb) and/or (Ac) per gram atom of the metal compound (Ma) in terms of metal.
The total amount is in the range of 0.1 to 4 moles, preferably 0.5 to 3
If the amount is less than 0.1 mol, solubility in organic solvents and storage stability will deteriorate, making it impossible to obtain a homogeneous solution.
一方、4モルを超えると保存安定性がかえって悪くなっ
たり或は膜形成の際の焼成時に発泡し、膜形成能が悪化
する。On the other hand, if the amount exceeds 4 mol, the storage stability may deteriorate or foaming may occur during baking during film formation, resulting in poor film forming ability.
これらの有機化合物(Lb)および1塩基酸(Ac)は
、金属化合物として使用されることのある金属錯化合物
あるいは1塩基酸塩などの中に同様の化合物が含まれる
場合は、それらに相当する量だけ差し引くのがよい。These organic compounds (Lb) and monobasic acids (Ac) correspond to metal complex compounds or monobasic acid salts that may be used as metal compounds, if similar compounds are included in them. It is better to subtract only the quantity.
樹脂酸類(Rd)は、粘度調節剤として作用し且つ膜形
成能を改善する作用を有するものであり、このうち松脂
は天然樹脂の一種であり、ガムロジン、ウッドロジン、
トールロジン等が代表的なものとして挙げられる。松脂
中にはアビエチン酸、ネオアビエチン酸、ジヒドロアビ
エチン酸、テトラヒドロアビエチン酸などが含まれてお
り、その成分組成は松脂の種類あるいは処理法によって
異なるが、本発明ではどの様なものでも使用することが
でき、アビエチン酸やピマール酸などをJEImして使
用することも勿論可能である。さらにアビエチン酸をエ
ステル化したアビエチン酸メチル、アビエチン酸ジエチ
レングリコールなどのロジンエステル順も使用すること
ができるが、全量をロジンエステルで置換すると、液状
組成物を得る際の可溶化が困難になると共に保存安定性
も悪くなるので、併用するにしても樹脂酸類の一部に置
き代えて使用する程度に止めるべきである。Resin acids (Rd) act as viscosity modifiers and improve film-forming ability. Among these, pine resin is a type of natural resin, and includes gum rosin, wood rosin,
Typical examples include tall rosin and the like. Pine resin contains abietic acid, neoabietic acid, dihydroabietic acid, tetrahydroabietic acid, etc., and the component composition varies depending on the type of pine resin or processing method, but any type of resin can be used in the present invention. Of course, it is also possible to use abietic acid, pimaric acid, etc. as JEIm. Furthermore, rosin esters such as methyl abietate and diethylene glycol abietate, which are esterified abietic acid, can also be used, but if the entire amount is replaced with rosin ester, it becomes difficult to solubilize when obtaining a liquid composition and it becomes difficult to preserve the composition. Stability also deteriorates, so even if they are used together, they should be used only to partially replace the resin acids.
尚樹脂酸類(Rd)の中で松脂は天然物として広く市販
されており安価に入手することができるので、最も手軽
な材料といえる。また松脂類の市販品としては天然物の
他に不飽和度の調節等によって改質したもの等が種々あ
るが、本発明ては何れも使用することができる。Among the resin acids (Rd), pine resin is widely available on the market as a natural product and can be obtained at low cost, so it can be said to be the most convenient material. In addition, there are a variety of commercially available pine resins, including natural products as well as those modified by adjusting the degree of unsaturation, and any of them can be used in the present invention.
該樹脂酸類(Rd)の配合量は、最終的に得られる溶液
中の重量%で5〜80重量%の範囲、より好ましくは1
0〜60%の範囲であり、5%未満ては膜形成能が悪く
なる傾向かあり、一方80重量%を超えると保存安定性
が悪くなる。The blending amount of the resin acids (Rd) is in the range of 5 to 80% by weight, more preferably 1% by weight in the finally obtained solution.
The content ranges from 0 to 60%, and if it is less than 5%, the film forming ability tends to deteriorate, while if it exceeds 80% by weight, the storage stability will deteriorate.
有機溶剤(Se)は、上記各成分を可溶化し得るもので
あればどの様な溶剤でもよく、膜形成時の作業性(気化
性、蒸気圧の大小等)や膜形成法の種類などを考慮して
適宜選択すればよく、その具体例としては、メチルアル
コール、エチルアルコールなどのアルコール;メチルエ
ーテル、エチルエーテルなどのエーテル;トルエンなど
の芳香族炭化水素;アセトン、メチルエチルケトンなど
のケトン、テルピネオール:テレビン油、エチレングリ
コール、エチレングリコールモノエチルエーテルなどの
グリコール類などが挙げられ、これらは単独で使用し得
る他2種以上の混合溶剤として使用することもできる。The organic solvent (Se) may be any solvent as long as it can solubilize each of the above components, depending on the workability during film formation (evaporability, vapor pressure, etc.) and the type of film formation method. They may be selected appropriately with consideration, and specific examples include alcohols such as methyl alcohol and ethyl alcohol; ethers such as methyl ether and ethyl ether; aromatic hydrocarbons such as toluene; ketones such as acetone and methyl ethyl ketone; and terpineol: Examples include glycols such as turpentine oil, ethylene glycol, and ethylene glycol monoethyl ether, which can be used alone or as a mixed solvent of two or more.
該有機溶剤(Se)の使用量は、最終的に得られる液状
組成物中に占める重量%で5〜80重量%の範囲、好ま
しくは10〜60重量%の範囲とすべきであり、5重量
%未満では樹脂酸類(Rd)松脂の溶解が不十分となり
、一方80重量%を超えると酸化物換算の溶液濃度が低
くなり過ぎるため実用的でない。The amount of the organic solvent (Se) to be used should be in the range of 5 to 80% by weight, preferably in the range of 10 to 60% by weight in the final liquid composition, and should be in the range of 5 to 80% by weight, preferably 10 to 60% by weight. If it is less than 80% by weight, the dissolution of the resin acid (Rd) pine resin will be insufficient, while if it exceeds 80% by weight, the solution concentration in terms of oxide will be too low, which is not practical.
本発明に係る液状組成物を構成する必須成分は以上の通
りでるが、本発明では、樹脂酸類(Rd) 、金属化合
物(Ma)、有機化合物(Lb)および/または1塩基
酸(Ac)の反応物もしくは混合物とが相互に好影響を
及ぼし合って有機溶剤(Se)に対する可溶化が促進さ
れ、均一で且つ安定な液状組成物を得ることができる。The essential components constituting the liquid composition according to the present invention are as described above, but in the present invention, resin acids (Rd), metal compounds (Ma), organic compounds (Lb), and/or monobasic acids (Ac) The reactants or mixtures have a favorable influence on each other, so that solubilization in the organic solvent (Se) is promoted, and a uniform and stable liquid composition can be obtained.
しかも樹脂酸類(Rd)の存在によフて膜形成性および
基板への密着性も著しく改善され、これを任意の基板上
に塗布して乾燥・焼成を行なうことによフて、均質な金
属酸化物膜を得ることができる。なお有機化合物(Lb
)および/または1塩基酸(Ac)は、金属化合物(M
a)の有機溶剤(Se)への可溶化と溶液状態での保存
安定性を高めるものであるが、これらの配合量が多過ぎ
ると焼成後の酸化物膜中に炭化物が残って膜性能に悪影
響を及ぼすことがあるので、有機化合物(Lb)と1塩
基酸(Ac)の含有量はできるだけ少なくする方がよい
。それゆえ、有機化合物(Lb)および/または1塩基
酸(Ac)の種類を選択するに当たっては、最終溶液の
安定性を加味しつつ、その添加量をできるだけ少なくで
きるものを選択することが望まれる。Moreover, the presence of resin acids (Rd) significantly improves the film formation properties and adhesion to the substrate, and by applying this onto any substrate, drying and firing, it is possible to form a homogeneous metal. An oxide film can be obtained. Note that organic compounds (Lb
) and/or monobasic acid (Ac) is a metal compound (M
This improves the solubilization of a) in the organic solvent (Se) and the storage stability in the solution state, but if the amount of these is too large, carbides will remain in the oxide film after firing, which will affect the film performance. It is better to reduce the contents of the organic compound (Lb) and monobasic acid (Ac) as much as possible since they may have an adverse effect. Therefore, when selecting the type of organic compound (Lb) and/or monobasic acid (Ac), it is desirable to select one that can minimize the amount added while taking into consideration the stability of the final solution. .
本発明組成物を製造する方法としては、(1)Ma、L
bおよび/またはAc、Rd、Seを同時に配合して混
合する方法、
(2)MaとLbおよび/またはAcをSeに加えて混
合した後、これにRdを加えて混合する方法、
(3)MaとRdをSeに加えて混合した後、これにL
bおよび/またはAcを加えて混合する方法、など
が採用されるが、夫々の配合乃至混合段階では系を60
〜90程度に加熱し、あるいはアンモニアガスを吹き込
むことによって可溶化が著しく促進され、短時間の処理
で保存安定性の優れた均一な液状組成物を得ることがで
きる。The method for producing the composition of the present invention includes (1) Ma, L
(2) A method of adding and mixing Ma, Lb and/or Ac to Se, and then adding and mixing Rd thereto; (3) After adding and mixing Ma and Rd to Se, L
A method of adding and mixing B and/or Ac is adopted, but at each blending or mixing step, the system is heated to 60%
Solubilization is significantly promoted by heating to about 90°C or by blowing in ammonia gas, and a uniform liquid composition with excellent storage stability can be obtained in a short period of time.
尚使用する原料の種類によっては、反応工程で塩化アン
モニウムや塩化物イオン、硝酸イオン等が混入し、金属
基板等に対して腐食等の悪影響を及ぼすことがあるので
、この様な場合は、可溶化後、不溶物は濾過等によって
、またイオン性の不純物についてはイオン交換樹脂によ
る処理等によって除去すればよい。Depending on the type of raw materials used, ammonium chloride, chloride ions, nitrate ions, etc. may be mixed in during the reaction process and have an adverse effect such as corrosion on metal substrates. After solubilization, insoluble matter may be removed by filtration or the like, and ionic impurities may be removed by treatment with an ion exchange resin or the like.
かくして得られる金属酸化物膜形成用液状組成物は、空
気中に放置したままの状態でも安定であり、1年以上に
亘って変質や不溶物の生成等が見られない。またこの液
状組成物は、たとえば25℃の粘度で10数センチボイ
ズから約2万センチボイスまでの範囲に亘って任意に調
整可能であり、浸漬法、スピナー法、スクリーン印刷法
など種々の膜形成法に適した粘度のものとすることがで
鎗る。この液状組成物には、必要により塗装性改善のた
めのレベリング剤としてカチオン系、ノニオン系、アニ
オン系等の界面活性剤などを加えたり、あるいは消泡剤
などを添加することも有効である。The thus obtained liquid composition for forming a metal oxide film is stable even when left in the air, and shows no deterioration or formation of insoluble matter for more than one year. In addition, this liquid composition can be arbitrarily adjusted to have a viscosity of, for example, 25° C. over a range of 10-odd centimeters to about 20,000 centimeters, and can be used with various film-forming methods such as dipping, spinner, and screen printing. The viscosity is suitable for use. It is also effective to add to this liquid composition, if necessary, a cationic, nonionic, or anionic surfactant as a leveling agent for improving coating properties, or an antifoaming agent.
この様にして得られる液状組成物を、そのまま、あるい
は場合によっては更に適当な有機溶剤で希釈して、たと
えばシリカ、マグネシア、アルミナ、ジルコニア等の耐
熱性基板やガラスあるいは各種陶磁器、ステンレス、銅
、アルミニウムなどの金属基板などの表面に浸漬法、ス
ピナー法、スクリーン印刷性等任意の方法で塗布し、で
きれば50〜120℃程度で乾燥した後、440℃以上
、このましくは450℃以上の温度で焼成すると、金属
酸化物膜を得ることができる。The liquid composition obtained in this way can be used as it is, or in some cases further diluted with a suitable organic solvent, for use on heat-resistant substrates such as silica, magnesia, alumina, zirconia, glass, various ceramics, stainless steel, copper, etc. It is coated on the surface of a metal substrate such as aluminum by any method such as dipping, spinner, screen printing, etc., preferably dried at about 50 to 120°C, and then heated to a temperature of 440°C or higher, preferably 450°C or higher. By firing with , a metal oxide film can be obtained.
加熱焼成温度が440℃未満では、長時間焼成しても一
部が炭化物として残存する傾向があるので、好ましくは
450℃以上で焼成することが望まれる。If the heating and firing temperature is lower than 440°C, a portion tends to remain as carbide even if fired for a long time, so it is preferable to perform the firing at a temperature of 450°C or higher.
液状組成物中の金属酸化物換算濃度が10重量%を超え
たり、粘度が100センチポイズ以上である様な場合は
、焼成に先立って予備乾燥を行なうことにより、−層平
滑で均一な酸化物膜が得られ易い。該液状組成物中の金
属酸化物換算含有量は0.5〜30重量%、好ましくは
1〜20[[量%がよく、0.5重量%未満では一回塗
りによって形成し得る膜厚が薄過ぎるため、膜厚を厚く
しようとすると重ね塗りを何回も行なわなければならな
いので実用的でない。一方、30重量%を超えると基板
に対する酸化物膜の密着性が低下したり、あるいは膜に
クラック等が入ることがある。If the metal oxide concentration in the liquid composition exceeds 10% by weight or the viscosity exceeds 100 centipoise, pre-drying prior to firing will produce a smooth and uniform oxide film. is easy to obtain. The content in terms of metal oxide in the liquid composition is preferably 0.5 to 30% by weight, preferably 1 to 20%. If it is less than 0.5% by weight, the film thickness that can be formed by one coat will be reduced. Since it is too thin, it is not practical because it would be necessary to recoat it many times to increase the film thickness. On the other hand, if it exceeds 30% by weight, the adhesion of the oxide film to the substrate may decrease or cracks may occur in the film.
本発明によって得られる前記金属酸化物膜形成用液状組
成物の用途としては、紫外線吸収膜、熱線反射膜、超電
導体膜、各種誘電体膜、導電性膜、絶縁性膜など、様々
の膜製造用として利用することが可能である。The liquid composition for forming metal oxide films obtained by the present invention can be used for manufacturing various films such as ultraviolet absorbing films, heat ray reflecting films, superconductor films, various dielectric films, conductive films, and insulating films. It can be used for any purpose.
次に実施例を挙げて本発明の構成および作用効果を具体
的に説明するが、本発明はもとより下記実施例によって
制約を受けるものではない。Next, the configuration and effects of the present invention will be specifically explained with reference to examples, but the present invention is not limited by the following examples.
[実施例コ
以下、実施例を挙げて本発明の構成および作用効果を具
体的に説明するが、本発明はもとより下記の実施例によ
って制約を受けるものではない。[Example] Hereinafter, the configuration and effects of the present invention will be specifically explained using examples, but the present invention is not limited by the following examples.
実施例1
無水五塩化タンタルTaCl5 0.1モル(35,8
g)をエチルアルコール0.5モル (23g)とへキ
サン500m1の混合溶媒に溶解させ、さらに千ノエタ
ノールアミンモル0.05 (3,1g)を加えた後、
アンモニアガスを流速0.2j2 /minで4時間吹
き込むことにより反応を行なった。反応終了後、副生成
物である塩化アンモニウムを濾別し、濾液をロータリー
エバポレーターで60℃の湯浴中、 100mmHgの
減圧下でヘキサン等の揮発成分を留去した。これを、予
めガムロジン100gをテルピネオール450gに溶解
させた溶液に攪拌しつつ添加すると、タンタルを含有す
る金属酸化物膜形成用液状組成物500gが得られた。Example 1 Anhydrous tantalum pentachloride TaCl5 0.1 mol (35,8
g) was dissolved in a mixed solvent of 0.5 mol (23 g) of ethyl alcohol and 500 ml of hexane, and 0.05 mol (3.1 g) of ethanolamine was added.
The reaction was carried out by blowing ammonia gas at a flow rate of 0.2j2/min for 4 hours. After the reaction was completed, ammonium chloride as a by-product was filtered off, and volatile components such as hexane were distilled off from the filtrate using a rotary evaporator in a water bath at 60° C. under reduced pressure of 100 mmHg. When this was added with stirring to a solution in which 100 g of gum rosin had been dissolved in 450 g of terpineol in advance, 500 g of a liquid composition for forming a metal oxide film containing tantalum was obtained.
この組成物の金属酸化物換算の含有量は5.3重量%で
あった。またこの組成物は空気中でも安定であり、1年
以上何等の変質もみられなかった。この組成物の粘度は
25℃で6゜cpsであった。The content of this composition in terms of metal oxide was 5.3% by weight. This composition was also stable in the air, and no deterioration was observed for more than one year. The viscosity of this composition was 6° cps at 25°C.
上記で得た組成物を浸漬法(引き上げ速度10mm/w
in)でガラス基板上に塗布した後、 100℃で30
分間乾燥し、直ちに450℃で1時間加熱焼成したとこ
ろ、少し青味がかった透明な薄膜が得られた。また同様
の薄膜形成をSO5304のステンレス基板上に行なっ
て透明な薄膜を得た後、90度の折曲げ試験を行なった
ところ、亀裂や剥離は起こらなかった。The composition obtained above was soaked using the dipping method (pulling speed 10 mm/w).
in) on a glass substrate, then at 100°C for 30
After drying for a minute and immediately baking at 450° C. for 1 hour, a transparent thin film with a slightly bluish tint was obtained. Further, a similar thin film was formed on an SO5304 stainless steel substrate to obtain a transparent thin film, and then a 90 degree bending test was performed, and no cracking or peeling occurred.
実施例2
ガムロジン25gをテルピネオール100gおよびトル
エン50gの混合溶媒に加熱溶解させ、得られた均一溶
液にアルミニウム −トリ5ec−ブトキシド50gを
攪拌しつつ添加し、さらにアセト酢酸エチル13gを加
え、100℃でさらに15分間加熱した。Example 2 25 g of gum rosin was heated and dissolved in a mixed solvent of 100 g of terpineol and 50 g of toluene, and 50 g of aluminum tri-5ec-butoxide was added to the resulting homogeneous solution with stirring, and then 13 g of ethyl acetoacetate was added, and the mixture was heated at 100°C. Heated for an additional 15 minutes.
得られた均一溶液230gをアルミニウム含有薄膜形成
用液状組成物とした。この組成物におけるアルミニウム
酸化物換算の含有量は4.3重量上であった。また粘度
は25℃で35cpsであり、1年以上安定に保存する
ことができた。230 g of the obtained homogeneous solution was used as a liquid composition for forming an aluminum-containing thin film. The content of aluminum oxide in this composition was 4.3% by weight. Further, the viscosity was 35 cps at 25°C, and it could be stored stably for more than one year.
この組成物を用いて浸漬法(引き上げ速度20mm/m
1n)で石英基板上に塗布した後、100℃で1時間乾
燥した。これを500℃で1時間焼成したところ透明な
薄膜が得られた。この薄膜のX線回折分析を行なったと
ころ、アモルファスであったか、さらに1000℃で1
時間再焼成してから同様にX線回折分析すると、α−A
1203であることが確認された。Using this composition, the dipping method (pulling speed 20 mm/m)
1n) on a quartz substrate, and then dried at 100° C. for 1 hour. When this was baked at 500° C. for 1 hour, a transparent thin film was obtained. When this thin film was analyzed by X-ray diffraction, it was found to be amorphous.
Similar X-ray diffraction analysis after re-baking for a time revealed that α-A
It was confirmed that it was 1203.
比較例1
実施例2においてアセト酢酸エチルを添加しなかった他
は全く同様にしてアルミニウム含有組成物を得、その安
定性を調べたところ、1週間以内に白色の沈殿が生成し
た。Comparative Example 1 An aluminum-containing composition was obtained in exactly the same manner as in Example 2 except that ethyl acetoacetate was not added, and its stability was examined. As a result, a white precipitate was formed within one week.
また実施例2におけるガムロジンの添加量を2.5gに
変更した以外は全く同様にして得たアルミニウム含有組
成物を、同様の条件で浸漬法によりガラス基板上に塗布
し、500℃で1時間焼成したところ、クランクの入っ
た膜が得られた。In addition, an aluminum-containing composition obtained in exactly the same manner as in Example 2 except that the amount of gum rosin added was changed to 2.5 g was applied onto a glass substrate by the dipping method under the same conditions, and baked at 500°C for 1 hour. As a result, a membrane containing a crank was obtained.
実施例3
金属バリウムBaの0.1モル(13,7g)を、モノ
エタノールアミン01モル(6,1g)を溶解させたメ
チルアルコール溶液100gに窒素気流下に徐々に添加
して溶解させた。この溶液を窒素気流下で5C3濾紙を
用いて濾過し、濾液を、予めロジン(播磨化成社製「ハ
リマックT−80J ) 130gをテルピネオール4
5gおよびトルエン33gの混合溶剤に加熱溶解させた
溶液に、攪拌しつつ添加して均一な溶液を得た。添加終
了直後に少量の沈殿が生じる場合は、加熱することによ
って完全溶解させた。Example 3 0.1 mol (13.7 g) of metallic barium Ba was gradually added and dissolved in 100 g of a methyl alcohol solution in which 0.1 mol (6.1 g) of monoethanolamine was dissolved under a nitrogen stream. This solution was filtered using 5C3 filter paper under a nitrogen stream, and the filtrate was mixed with terpineol 4.
It was added to a solution heated and dissolved in a mixed solvent of 5 g and 33 g of toluene while stirring to obtain a homogeneous solution. If a small amount of precipitate formed immediately after the addition was completed, it was completely dissolved by heating.
かくして得ら−れる液状組成物の粘度は25℃で50
cpsであり、酸化物(Bad)換算の濃度は5重量%
であフた。The viscosity of the liquid composition thus obtained is 50 at 25°C.
cps, and the concentration in terms of oxide (Bad) is 5% by weight.
It was dead.
この組成物を用いて浸漬法(引き上げ速度10mm/w
in)で石英基板上に塗布した後、100℃で1時間乾
燥してから500℃で1時間焼成したところ、はぼ透明
な酸化物膜が得られた。Using this composition, the dipping method (pulling speed 10 mm/w)
In) was applied onto a quartz substrate, dried at 100° C. for 1 hour, and then fired at 500° C. for 1 hour, resulting in an almost transparent oxide film.
実施例4
酢酸銅[Cu(C)1sC00)z・H20コ0.1モ
ル(20,0g)をエチルアルコール60m1に懸濁さ
せ、これにジエチルアミン0.2モル(15g)を添加
して溶解させた。未溶解物をNo、5Cの濾紙を用いて
濾別した後、予めアビエチン酸20gをテルピネオール
60gとエチルアルコール30gの混合溶剤に加熱溶解
させた溶液に、攪拌しつつ添加した。添加終了後60〜
70℃の温度で15分間保持し、添加時生じた一部の沈
殿を溶解させて均一な溶液を得た。得られた膜形成用液
状組成物は、酸化物(Cub)換算濃度4.5重量であ
り、粘度は25℃で70 cpsであった。Example 4 0.1 mol (20.0 g) of copper acetate [Cu(C)1sC00)z.H20 was suspended in 60 ml of ethyl alcohol, and 0.2 mol (15 g) of diethylamine was added and dissolved therein. Ta. After filtering off undissolved substances using No. 5C filter paper, 20 g of abietic acid was previously dissolved in a mixed solvent of 60 g of terpineol and 30 g of ethyl alcohol by heating, and the mixture was added with stirring. 60~ after addition
The mixture was maintained at a temperature of 70° C. for 15 minutes to dissolve some of the precipitate generated during the addition to obtain a homogeneous solution. The resulting film-forming liquid composition had an oxide (Cub) equivalent concentration of 4.5 weight and a viscosity of 70 cps at 25°C.
この組成物を用いて、浸漬法(引き上げ速度10 mm
/m1n)でガラス基板上に塗布した後100℃で1時
間乾燥し、その後500℃で1時間焼成したところ、黒
色の均一な膜が得られた。Using this composition, the dipping method (pulling speed 10 mm
/mln) on a glass substrate, dried at 100°C for 1 hour, and then baked at 500°C for 1 hour, to obtain a black uniform film.
実施例5
オクチル酸錫(0,18gSn027g ) 69 g
とエタノールアミン0.6gを、予めロジン(播磨化成
社製「ハリマックT−80」)40gをテルピネオール
120gとトルエン20gの混合溶剤に加熱溶解した溶
液に、攪拌しつつ添加した。かくして得られた組成物は
酸化物(SnO□)換算濃度が5.5重量%であり、粘
度は25℃で40 cpsであった。Example 5 Tin octylate (0.18gSn027g) 69 g
and 0.6 g of ethanolamine were added with stirring to a solution in which 40 g of rosin (Harima Kasei Co., Ltd. "Harimac T-80") was dissolved in a mixed solvent of 120 g of terpineol and 20 g of toluene by heating. The thus obtained composition had an oxide (SnO□) concentration of 5.5% by weight and a viscosity of 40 cps at 25°C.
この組成物を用いて浸漬法(引き上げ速度10mm/m
1n)でガラス基板上に塗布した後、100℃で30分
間乾燥した後500℃で1時間焼成したところ、透明な
膜が得られた。Using this composition, the dipping method (pulling speed 10 mm/m
1n) on a glass substrate, dried at 100°C for 30 minutes, and then baked at 500°C for 1 hour to obtain a transparent film.
比較例2
上記実施例5において、ロジンを添加する代わりにテル
ピネオールをその分だけ余分に添加した以外は全く同様
にして液状組成物を得、該組成物を浸漬法(引き上げ速
度10 mm/m1n)でガラス基板上に塗布し、実施
例5と同じ条件で焼成したところ、ユズ肌状の不均一な
膜が得られた。Comparative Example 2 A liquid composition was obtained in exactly the same manner as in Example 5, except that an extra amount of terpineol was added instead of adding rosin, and the composition was subjected to a dipping method (pulling speed 10 mm/m1n). When it was coated on a glass substrate and baked under the same conditions as in Example 5, a non-uniform film with a citron skin shape was obtained.
実施例6
酢酸亜鉛[Zn(CH3COO)2’2H20] 33
.7g(0,154モル)をエチルアルコール70m1
に懸濁させ、アセト酢酸メチル18gを添加した後アン
モニアガスを液が透明になるまで吹き込んだ。透明液が
得られたら過剰のアンモニアガスを加熱することによっ
て追い出し、予めロジン(播磨化成社製「R−WWJ
)40gをテルピネオール80gおよびイソプロピルア
ルコール30gの混合溶剤に加熱溶解した溶液に、攪拌
しつつ徐々に添加する。その後ホットプレート上で70
〜80℃で15分間加熱して液状組成物を得た。この組
成物は酸化物(2nO)換算濃度5重量%の均一な溶液
であり、粘度は25℃で40 cpsであった。Example 6 Zinc acetate [Zn(CH3COO)2'2H20] 33
.. 7g (0,154 mol) in 70ml of ethyl alcohol
After adding 18 g of methyl acetoacetate, ammonia gas was blown into the solution until it became clear. When a clear liquid is obtained, excess ammonia gas is expelled by heating, and rosin (Harima Kasei Co., Ltd. "R-WWJ"
) was gradually added to a heated solution of 80 g of terpineol and 30 g of isopropyl alcohol in a mixed solvent with stirring. Then 70 on the hot plate
A liquid composition was obtained by heating at ~80°C for 15 minutes. This composition was a homogeneous solution with a concentration of 5% by weight in terms of oxide (2nO), and a viscosity of 40 cps at 25°C.
この組成物を使用し、浸漬法(引き上げ速度20 mm
/m1n)でガラス基板上に塗布し、100℃で10分
間乾燥した後450℃で1時間焼成したところ、透過率
95%以上(400〜750r+m波長)および10%
(350r+m波長)で、X線回折分析では少しブロー
ドではあるがZnOのパターンが確証された。Using this composition, the dipping method (pulling speed 20 mm
/m1n) on a glass substrate, dried at 100°C for 10 minutes, and then baked at 450°C for 1 hour.
(350r+m wavelength), X-ray diffraction analysis confirmed the pattern of ZnO, although it was a little broad.
比較例3
上記実施例6において、ロジンの代わりにテルピネオー
ルをその分だけ多めに加えた以外は同様に操作して液状
組成物を得、実施例6と同様の条件で薄膜形成を行なっ
たところ、透明ではあるがクラックの入った膜となった
。Comparative Example 3 A liquid composition was obtained in the same manner as in Example 6 except that terpineol was added in place of rosin, and a thin film was formed under the same conditions as in Example 6. Although the film was transparent, it had cracks.
実施例7
モノエタノールアミン1.6gを溶解したイソプロピル
アルコール40gに金属バリウムBa7.4g(0,0
54モル)を加えて溶解させ、不溶物を5C3濾紙で濾
過して濾液を得た。この濾液とテロラブドキシチタネー
ト[Tl(OBu)4](含量0.232g・Ti(h
/g) 18.4gおよびトリエタノールアミン1.0
gを、予めロジン(播磨化成社製「ハリマックT−80
J )50gをテルピネオール70gおよびイソプロピ
ルアルコール70gの混合溶剤に加熱溶解した溶液に、
上記の記載順に従って添加した。Example 7 7.4 g of metallic barium Ba (0,0
54 mol) was added and dissolved, and insoluble matter was filtered through 5C3 filter paper to obtain a filtrate. This filtrate and telorhabdoxy titanate [Tl(OBu)4] (content 0.232g・Ti(h)
/g) 18.4g and triethanolamine 1.0
g in advance using rosin (Harima Kasei Co., Ltd. "Harimak T-80").
J) 50g was heated and dissolved in a mixed solvent of 70g of terpineol and 70g of isopropyl alcohol,
Additions were made according to the order listed above.
部生成する沈殿を、70〜80℃で15分間加熱するこ
とによって完全に溶解させて液状組成物を得た。The partially formed precipitate was completely dissolved by heating at 70 to 80° C. for 15 minutes to obtain a liquid composition.
この組成物の粘度は28℃で180 cpsであった。The viscosity of this composition was 180 cps at 28°C.
この液状組成物を用いて浸漬法(引き上げ速度5 mm
/m1n)で石英基板上に塗布し、100℃で15分間
乾燥した後、850℃で3時間焼成したところ、透明な
膜が得られた。この膜のX線回折分析を行なったところ
、BaTiO3の回折チャートが得られた。Using this liquid composition, the immersion method (pulling speed 5 mm)
/m1n) on a quartz substrate, dried at 100°C for 15 minutes, and then baked at 850°C for 3 hours to obtain a transparent film. When this film was subjected to X-ray diffraction analysis, a BaTiO3 diffraction chart was obtained.
実施例8
テトラブトキシチタネート[Ti(OBu)4] (
含量0.2384i027g) 65gとトリエタノー
ルアミン4.0gを、予めガムロジン180gをテルピ
ネオール53gに加熱溶解した溶液に徐々に添加して混
合した。60〜70℃で約15分間加熱して反応を促進
させると、薄膜形成用液状組成物が得られた。この組成
物の粘度は29℃で6100cpsであり、この組成物
を275メツシユで1010X20角のスクリーンを用
いてガラス基板上に塗布した後、100℃で30分間乾
燥し、さらに500℃で焼成したところ、透明で均一な
膜が得られた。Example 8 Tetrabutoxy titanate [Ti(OBu)4] (
65 g (content 0.2384i027 g) and 4.0 g of triethanolamine were gradually added and mixed to a solution in which 180 g of gum rosin had been heated and dissolved in 53 g of terpineol. When the reaction was accelerated by heating at 60 to 70°C for about 15 minutes, a liquid composition for forming a thin film was obtained. The viscosity of this composition was 6100 cps at 29°C, and this composition was coated on a glass substrate using a 1010 x 20 square screen with a 275 mesh, dried at 100°C for 30 minutes, and further baked at 500°C. , a transparent and uniform film was obtained.
実施例9
ガムロジン144gをトルエン80gとテルピネオール
30gおよびエチルアルコール20gの混合溶剤に加熱
溶解し、エチルアセトアセテートアルミニウムージ5e
c−ブチレート 7.2g 、エチルシリケート40
24.0gおよびナフチル酸鉛(30%pb溶液) 2
2.0gを順次添加して溶解させる。ざらにN−メチル
ジェタノールアミン2gを添加し、60〜70℃で20
分間還流した。得られた組成物の酸化物換算濃度は5.
3重量%であり、粘度は25℃で60 cpsであった
。Example 9 144 g of gum rosin was heated and dissolved in a mixed solvent of 80 g of toluene, 30 g of terpineol, and 20 g of ethyl alcohol, and ethyl acetoacetate aluminum di 5e was dissolved.
c-butyrate 7.2g, ethyl silicate 40
24.0g and lead naphthylate (30% pb solution) 2
Add 2.0 g in sequence and dissolve. Add 2g of N-methyljetanolamine to the colander and heat at 60-70℃ for 20 minutes.
Refluxed for minutes. The resulting composition had an oxide concentration of 5.
3% by weight, and the viscosity was 60 cps at 25°C.
この組成物を用いて刷毛により白色タイル上に塗布し1
00℃で10分間乾燥した後、750tで1時間焼成し
たところ、透明で均一な膜が得られた。またこの液状組
成物は6か月以上何等の変化も見られず、同様の膜を形
成することができた。Using this composition, apply it on a white tile with a brush.
After drying at 00° C. for 10 minutes and baking at 750 t for 1 hour, a transparent and uniform film was obtained. Moreover, no change was observed in this liquid composition for more than 6 months, and a similar film could be formed.
実施例10
酸化イツトリウム[Y2O3] 12.5gを塩化アン
モニウム100gと混合した後、電気炉で350’C1
10時間保持した。その後一部を取り出して水に溶解す
ることを確かめた後、エチルアルコール21gおよびn
−ヘキサン600m1の混合溶剤中に懸濁乃至溶解させ
、さらにモノエタノールアミン6.5gを加えてからア
ンモニアガスを0.2j2/minの速度で6時間吹き
込むことにより反応を進行させた。反応終了後沈殿物を
濾別し、濾液をロータリーエバーボレーターを用いて6
0℃、100m[llHg下で溶媒を除去した。残った
液を、予めアビエチン酸60gとピマール酸10gをイ
ソプロピルアルコール60gおよびテルピネオール70
gの混合溶剤に加熱溶解した溶液に攪拌しつつ添加し、
均一な溶液を得た。得られた液状組成物の酸化物(Y2
C13)tJk算の含有量は4.3重量%であり、粘度
は25℃で180 cpsであった。Example 10 After mixing 12.5 g of yttrium oxide [Y2O3] with 100 g of ammonium chloride, the mixture was heated to 350'C1 in an electric furnace.
It was held for 10 hours. After that, a portion was taken out and after confirming that it dissolved in water, 21 g of ethyl alcohol and n
- The mixture was suspended or dissolved in a mixed solvent of 600 ml of hexane, 6.5 g of monoethanolamine was added, and then ammonia gas was blown in at a rate of 0.2j2/min for 6 hours to advance the reaction. After the reaction, the precipitate was filtered off and the filtrate was evaporated using a rotary evaporator.
The solvent was removed under 100 m[11 Hg] at 0°C. The remaining liquid was prepared by adding 60 g of abietic acid and 10 g of pimaric acid to 60 g of isopropyl alcohol and 70 g of terpineol.
Add while stirring to a solution heated and dissolved in a mixed solvent of g,
A homogeneous solution was obtained. Oxide (Y2) of the obtained liquid composition
C13) The content calculated by tJk was 4.3% by weight, and the viscosity was 180 cps at 25°C.
この組成物50gにトルエン30gを加えて均一な溶液
とし、浸漬法 (引き上げ速度10mm/m1n)でガ
ラス基板上に塗布し、100℃で10分間乾燥した後、
550℃で30分間焼成したところ、均一で透明な膜が
得られた。Add 30 g of toluene to 50 g of this composition to make a uniform solution, apply it on a glass substrate by dipping method (pulling speed 10 mm/ml), dry at 100 ° C. for 10 minutes,
When baked at 550° C. for 30 minutes, a uniform and transparent film was obtained.
比較例4
実施例10において、アビエチン酸とピマール酸を加え
なかった他は全く同様にして液状組成物を調製し、これ
を浸漬法(引き上げ速度10mm/m1n)でガラス基
板上に塗布し、100℃で10分間乾燥した後、550
℃で30分間焼成したところ、膜はユズ肌状の不均一な
ものとなった。Comparative Example 4 A liquid composition was prepared in exactly the same manner as in Example 10 except that abietic acid and pimaric acid were not added, and this was applied onto a glass substrate by the dipping method (pulling speed 10 mm/m1n). After drying for 10 minutes at 550 °C
When baked at ℃ for 30 minutes, the film became non-uniform with a citron skin shape.
実施例11
ビスマスBi4.1gを酢酸40m1および30%の過
酸化水素水16m1と共に混合して加熱処理し、白色〜
淡黄色の沈殿物を得た。この沈殿物に酢酸20a+1を
加えて溶解した後、不純物を濾別した。この濾液を水浴
上で濃縮すると、B1□03換算で3.6gを含む酢酸
ビスマスが得られた。この酢酸ビスマスをトリエタノー
ルアミン2.2gおよび乳酸2.1gと共にエチルアル
コール40m1に溶解乃至分散させた後、アンモニアガ
スを0.2 fl 7重量%の速度で1時間吹き込んで
反応を促進させた。反応終了後不純物を濾別し、濾液を
、予めガムロジン30gをテルピネオール100gに加
熱溶解した溶液に加え、さらにテトラブチルチタネート
20gを添加してから60〜70℃で30分間還流した
。Example 11 4.1 g of bismuth Bi was mixed with 40 ml of acetic acid and 16 ml of 30% hydrogen peroxide solution, and heated to give a white to
A pale yellow precipitate was obtained. After adding and dissolving 20a+1 acetic acid to this precipitate, impurities were filtered off. This filtrate was concentrated on a water bath to obtain bismuth acetate containing 3.6 g in terms of B1□03. After this bismuth acetate was dissolved or dispersed in 40 ml of ethyl alcohol together with 2.2 g of triethanolamine and 2.1 g of lactic acid, ammonia gas was blown in at a rate of 0.2 fl 7% by weight for 1 hour to promote the reaction. After the reaction was completed, impurities were filtered off, and the filtrate was added to a solution prepared by heating and dissolving 30 g of gum rosin in 100 g of terpineol, and 20 g of tetrabutyl titanate was added thereto, followed by refluxing at 60 to 70° C. for 30 minutes.
得られた液状組成物の酸化物(Bi2(h)換算濃度は
3.2重量%であり、粘度は25℃で125cpsであ
った。またこの組成物を浸漬法(引き上げ速度10 m
m/m1n)で白色タイル上に塗布した後、そのまま7
50℃で1時間焼成したところ、均質で透明に近い膜か
得られた。The resulting liquid composition had an oxide (Bi2(h) equivalent concentration of 3.2% by weight and a viscosity of 125 cps at 25°C.) This composition was also processed by dipping method (pulling speed 10 m).
m/m1n) on a white tile, then apply it as it is at 7
When baked at 50° C. for 1 hour, a homogeneous and nearly transparent film was obtained.
実施例12
酢酸亜鉛18.4gをエチルアルコール70m1に懸濁
させ、これにロイシン酸13.2gを添加した後、アン
モニアガスを0.2 fl/minの速度で2時間吹き
込んだ。過剰のアンモニアガスを加熱することによって
除いた後、予めロジン(播磨化成社製「ハリマックT−
80J )50gをテルピネオール60gに加熱溶解さ
せた溶液に加えて攪拌した。Example 12 18.4 g of zinc acetate was suspended in 70 ml of ethyl alcohol, 13.2 g of leucinic acid was added thereto, and then ammonia gas was blown in at a rate of 0.2 fl/min for 2 hours. After removing excess ammonia gas by heating, rosin (Harima Kasei Co., Ltd. "Harimac T-
80J) was added to a solution prepared by heating and dissolving 50 g of terpineol in 60 g of terpineol, and the mixture was stirred.
混合時に沈殿が生じる場合は、60〜70℃に加熱して
溶解させた(熱時十分に攪拌しつつ混合すれば、再度加
熱する必要はない)。If a precipitate was generated during mixing, it was heated to 60 to 70° C. to dissolve it (if it is mixed with sufficient stirring when hot, there is no need to heat it again).
かくして得られた液状組成物の粘度は25℃で85cp
sであり、酸化物(ZnO2)換算濃度は4.3重量%
であった。The viscosity of the liquid composition thus obtained was 85 cp at 25°C.
s, and the concentration in terms of oxide (ZnO2) is 4.3% by weight
Met.
この組成物を用いて浸漬法(引き上げ速度10mm/m
1n)で石英基板上に塗布し、100tで10分間乾燥
した後500℃で30分間焼成した。この操作を5回繰
り返したところ、厚さが約0.8μmの透明な酸化物膜
が得られた。Using this composition, the dipping method (pulling speed 10 mm/m
1n) on a quartz substrate, dried at 100t for 10 minutes, and then fired at 500°C for 30 minutes. When this operation was repeated five times, a transparent oxide film with a thickness of about 0.8 μm was obtained.
この膜の可視・紫外領域の吸収スペクトルを測定したと
ころ、400nmより大きい波長領域での透過率は85
%であり、380nm付近より透過率は急激に低下し、
340nm付近の透過率は15%となった。When the absorption spectrum of this film in the visible and ultraviolet regions was measured, the transmittance in the wavelength region larger than 400 nm was 85.
%, and the transmittance decreases rapidly from around 380 nm,
The transmittance near 340 nm was 15%.
[発明の効果コ
本発明は以上の様に構成されており、その効果を要約す
ると次の通りである。[Effects of the Invention] The present invention is constructed as described above, and its effects are summarized as follows.
(1)本発明の液状組成物は、優れた塗装性と造膜性を
有しており、ガラス、金属、陶磁器、セラミックス等様
々の基板に対して均質な膜を形成する。(1) The liquid composition of the present invention has excellent paintability and film-forming properties, and forms homogeneous films on various substrates such as glass, metal, ceramics, and ceramics.
(2)この組成物は均一で且つ非常に安定である上、粘
度調整が極めて容易であり、塗装法の種類に応じて任意
の粘度のものに調整することができる。(2) This composition is uniform and very stable, and its viscosity can be adjusted extremely easily, so that it can be adjusted to any viscosity depending on the type of coating method.
(3)この組成物は、基板に塗布した後440℃以上の
温度で酸化焼成するだけで均質な酸化物膜を形成するの
で、センサー材料、超電導性材料、各種コーティング材
料等として幅広く利用することができる。(3) This composition forms a homogeneous oxide film simply by oxidizing and baking at a temperature of 440°C or higher after being applied to a substrate, so it can be widely used as a sensor material, superconducting material, various coating materials, etc. I can do it.
Claims (3)
選択される1種または2種以上の金属化合物(以下、M
aという)、 (b)窒素および/または酸素を配位原子として1〜6
個有する有機化合物の1種または2種以上(以下、Lb
という)、 (c)置換基としてアルコール性水酸基を1または2個
有する1塩基酸の1種または2種以上 (以下、Acという)、 (d)松脂、アビエチン酸およびピマール酸よりなる群
から選択される1種または2種以上の樹脂酸(以下、R
dという)、 (e)有機溶剤(以下、Seという)を 上記Maの金属換算で1グラム原子に対して、Lbおよ
び/またはAcを総和で0.1〜4モル含有すると共に
、組成物全量中に占めるRdの含有量が5〜80重量%
、Seの含有量が5〜80重量%となる様に配合したも
のであることを特徴とする金属酸化物膜形成用液状組成
物。(1) (a) One or more metal compounds selected from the group consisting of inorganic metal salts and organic metal compounds (hereinafter referred to as M
(referred to as a), (b) 1 to 6 with nitrogen and/or oxygen as coordinating atoms
One or more organic compounds (hereinafter referred to as Lb
(c) one or more monobasic acids having one or two alcoholic hydroxyl groups as substituents (hereinafter referred to as Ac); (d) selected from the group consisting of pine resin, abietic acid and pimaric acid. one or more resin acids (hereinafter referred to as R
d), (e) contains an organic solvent (hereinafter referred to as Se) with a total of 0.1 to 4 moles of Lb and/or Ac per 1 gram atom of Ma in terms of metal, and the total amount of the composition. The content of Rd in it is 5 to 80% by weight.
, a liquid composition for forming a metal oxide film, characterized in that the content of Se is 5 to 80% by weight.
選択される1種または2種以上の金属化合物(以下、M
aという)、 (b)窒素および/または酸素を配位原子として1〜6
個有する有機化合物の1種または2種 以上(以下、Lbという)、 (c)置換基としてアルコール性水酸基を1または2個
有する1塩基酸の1種または2種以上 (以下、Acという)、 (d)松脂、アビエチン酸およびピマール酸よりなる群
から選択される1種または2種以上の樹脂酸(以下、R
dという)、 (e)有機溶剤(以下、Seという)を 上記Maの金属換算で1グラム原子に対して、Lbおよ
び/またはAcが総和で0.1〜4モル、組成物全量中
に占めるRdおよびSeの各含有量がそれぞれ5〜80
重量%となる様に、各成分を同時もしくは任意の順序で
混合すると共に、混合成分としてSeが含まれる混合時
においては、加熱し若しくはアンモニアガスを存在させ
て溶液化することを特徴とする金属酸化物膜形成用液状
組成物の製法。(2) (a) One or more metal compounds selected from the group consisting of inorganic metal salts and organic metal compounds (hereinafter referred to as M
(referred to as a), (b) 1 to 6 with nitrogen and/or oxygen as coordinating atoms
(c) one or more monobasic acids having one or two alcoholic hydroxyl groups as substituents (hereinafter referred to as Ac); (d) One or more resin acids selected from the group consisting of pine resin, abietic acid, and pimaric acid (hereinafter referred to as R
(referred to as d), (e) Organic solvent (hereinafter referred to as Se) to 1 gram atom of the above-mentioned Ma in terms of metal, Lb and/or Ac occupy a total of 0.1 to 4 mol in the total amount of the composition. Each content of Rd and Se is 5 to 80
A metal characterized in that each component is mixed simultaneously or in any order so as to achieve the same weight percentage, and when Se is included as a mixed component, it is heated or ammonia gas is present to turn it into a solution. A method for producing a liquid composition for forming an oxide film.
基板上に塗布し、乾燥した後440℃以上で酸化・焼成
することを特徴とする金属酸化物膜の形成法。(3) A method for forming a metal oxide film, which comprises applying the liquid composition for forming a metal oxide film according to claim (1) onto a substrate, drying it, and then oxidizing and baking it at 440°C or higher.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20006990A JPH0483704A (en) | 1990-07-26 | 1990-07-26 | Liquid composition for forming metallic oxide film, its production and production of metallic oxide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20006990A JPH0483704A (en) | 1990-07-26 | 1990-07-26 | Liquid composition for forming metallic oxide film, its production and production of metallic oxide film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0483704A true JPH0483704A (en) | 1992-03-17 |
Family
ID=16418329
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20006990A Pending JPH0483704A (en) | 1990-07-26 | 1990-07-26 | Liquid composition for forming metallic oxide film, its production and production of metallic oxide film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0483704A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5698131A (en) * | 1995-05-15 | 1997-12-16 | Matsushita Electric Industrial Co., Ltd. | Paste for manufacturing ferrite and ferrite |
-
1990
- 1990-07-26 JP JP20006990A patent/JPH0483704A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5698131A (en) * | 1995-05-15 | 1997-12-16 | Matsushita Electric Industrial Co., Ltd. | Paste for manufacturing ferrite and ferrite |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2881847B2 (en) | Coating composition and method for producing the same | |
US4420500A (en) | Composition and process for preparing transparent conducting film | |
JP3521237B2 (en) | Composition for forming metal oxide film, method for producing the same, and method for forming metal oxide film | |
KR100304408B1 (en) | Coating solutions for use in forming bismuth-based dielectric thin films, and dielectric thin films and memories formed with said coating solution, as well as processes for production thereof | |
JPH10259007A (en) | Coating solution for forming bismuth-based ferroelectric substance thin film and ferroelectric substance thin film and ferroelectric substance memory using the same | |
US5073410A (en) | Thin films of metal phosphates and the method of their formation | |
JPH0346402B2 (en) | ||
CN1208424C (en) | Prepn of luminous tungstate film | |
JPH0483704A (en) | Liquid composition for forming metallic oxide film, its production and production of metallic oxide film | |
JP4635116B1 (en) | Metal salt-containing composition, substrate, and method for producing substrate | |
US6086957A (en) | Method of producing solution-derived metal oxide thin films | |
JP3071843B2 (en) | Liquid composition for forming metal oxide film, method for producing the same, and method for forming oxide film | |
JP2810047B2 (en) | Stable solution for producing superconductor and method for producing superconducting thin film | |
JP2000016812A (en) | Production of metal oxide film | |
US5202175A (en) | Thin films of metal phosphates and the method of their formation | |
JP2000026120A (en) | PRODUCTION OF In2O3-SnO2 PRECURSOR COATING SOLUTION AND PRODUCTION OF THIN In2O3-SnO3 FILM | |
JPH01219004A (en) | Formation of thin oxide superconductor film | |
JP4670026B2 (en) | In2O3-SnO2 precursor coating solution, method for producing the same, and method for producing In2O3-SnO2 thin film | |
JPH11157832A (en) | Coating liquid for forming transparent magnesium oxide coating film | |
JPS62297470A (en) | Paste for forming metal oxide thin film | |
JPH01116082A (en) | Coating solution for transparent thin oxide film | |
JPS6366903B2 (en) | ||
JPH01133961A (en) | Glass deposited with transparent thin oxide film and production thereof | |
JPH09268059A (en) | Production of compound oxide thin film | |
JPS6319713A (en) | Paste-like composition for formation of transparent conductive film and formation method of transparent conductive film |