JPH0478520B2 - - Google Patents

Info

Publication number
JPH0478520B2
JPH0478520B2 JP59066988A JP6698884A JPH0478520B2 JP H0478520 B2 JPH0478520 B2 JP H0478520B2 JP 59066988 A JP59066988 A JP 59066988A JP 6698884 A JP6698884 A JP 6698884A JP H0478520 B2 JPH0478520 B2 JP H0478520B2
Authority
JP
Japan
Prior art keywords
discharge hole
gas discharge
gas
cooling plate
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59066988A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60210857A (ja
Inventor
Mitsuo Nakatani
Ryuichi Ueda
Tetsuo Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59066988A priority Critical patent/JPS60210857A/ja
Publication of JPS60210857A publication Critical patent/JPS60210857A/ja
Publication of JPH0478520B2 publication Critical patent/JPH0478520B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02Constructional details
    • G01J5/06Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
    • G01J5/061Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity by controlling the temperature of the apparatus or parts thereof, e.g. using cooling means or thermostats

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
JP59066988A 1984-04-03 1984-04-03 放射冷却器 Granted JPS60210857A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59066988A JPS60210857A (ja) 1984-04-03 1984-04-03 放射冷却器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59066988A JPS60210857A (ja) 1984-04-03 1984-04-03 放射冷却器

Publications (2)

Publication Number Publication Date
JPS60210857A JPS60210857A (ja) 1985-10-23
JPH0478520B2 true JPH0478520B2 (enrdf_load_stackoverflow) 1992-12-11

Family

ID=13331900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59066988A Granted JPS60210857A (ja) 1984-04-03 1984-04-03 放射冷却器

Country Status (1)

Country Link
JP (1) JPS60210857A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2624020A1 (en) 2012-01-31 2013-08-07 Kabushiki Kaisha Topcon Optical substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2624020A1 (en) 2012-01-31 2013-08-07 Kabushiki Kaisha Topcon Optical substrate

Also Published As

Publication number Publication date
JPS60210857A (ja) 1985-10-23

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