JPH0478520B2 - - Google Patents
Info
- Publication number
- JPH0478520B2 JPH0478520B2 JP59066988A JP6698884A JPH0478520B2 JP H0478520 B2 JPH0478520 B2 JP H0478520B2 JP 59066988 A JP59066988 A JP 59066988A JP 6698884 A JP6698884 A JP 6698884A JP H0478520 B2 JPH0478520 B2 JP H0478520B2
- Authority
- JP
- Japan
- Prior art keywords
- discharge hole
- gas discharge
- gas
- cooling plate
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
- G01J5/061—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity by controlling the temperature of the apparatus or parts thereof, e.g. using cooling means or thermostats
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59066988A JPS60210857A (ja) | 1984-04-03 | 1984-04-03 | 放射冷却器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59066988A JPS60210857A (ja) | 1984-04-03 | 1984-04-03 | 放射冷却器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60210857A JPS60210857A (ja) | 1985-10-23 |
JPH0478520B2 true JPH0478520B2 (enrdf_load_stackoverflow) | 1992-12-11 |
Family
ID=13331900
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59066988A Granted JPS60210857A (ja) | 1984-04-03 | 1984-04-03 | 放射冷却器 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60210857A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2624020A1 (en) | 2012-01-31 | 2013-08-07 | Kabushiki Kaisha Topcon | Optical substrate |
-
1984
- 1984-04-03 JP JP59066988A patent/JPS60210857A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2624020A1 (en) | 2012-01-31 | 2013-08-07 | Kabushiki Kaisha Topcon | Optical substrate |
Also Published As
Publication number | Publication date |
---|---|
JPS60210857A (ja) | 1985-10-23 |
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