JPH0476838A - Production of optical master disk - Google Patents

Production of optical master disk

Info

Publication number
JPH0476838A
JPH0476838A JP2191653A JP19165390A JPH0476838A JP H0476838 A JPH0476838 A JP H0476838A JP 2191653 A JP2191653 A JP 2191653A JP 19165390 A JP19165390 A JP 19165390A JP H0476838 A JPH0476838 A JP H0476838A
Authority
JP
Japan
Prior art keywords
film
layer
guide groove
exposed
grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2191653A
Other languages
Japanese (ja)
Inventor
Masaru Kinugawa
勝 衣川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2191653A priority Critical patent/JPH0476838A/en
Publication of JPH0476838A publication Critical patent/JPH0476838A/en
Pending legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To decrease the fluctuation in the shapes of guide groove forming pats and pit forming parts and to improve the quality of the master disk by respectively regulating the depth of the guide groove forming parts by the thickness of a resist layer and the depth of the pit forming pats by the thickness of a metallic film which can be etched. CONSTITUTION:The photoresist layer 2 is formed on a glass substrate 1 and after the resist layer is exposed with a laser beam down to the depth arriving at the surface of the glass substrate 1, the layer is developed form the grooves 2b, 2c where the surface of the glass substrate 1 is exposed respectively at prescribed interval. The film 3 of the metal which can be etched, for example, chromium, is formed on the surface of the substrate 1 in the base parts of the grooves 2b, 2c and over the entire surface of the layer 2. The metallic film 4 which is not etched is formed over the entire surface of this film 3. The substrate 1 and the layer 2 are peeled. The photoresist layer 5 is formed on the surface of the surface of the film 3 and the central positions between the guide groove forming parts 4b and 4c are exposed and developed to form the grooves 5a exposed with the film 3 in the bottom; thereafter, the layer 5 and the film 3 are etched to form the grooves 3a exposed with the surface of the film 3 in the bottom. The layer 5 is removed and the master disk 6 having the grooves 3a which are the pit forming parts and the guide groove forming parts 4a, 4b is obtd.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は表面に案内溝と、これと高さの異なるビットと
の二重螺旋を備えた光ディスクを得るための原盤を製造
する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a master disc for obtaining an optical disc having a guide groove on the surface and a double helix of bits of different heights.

〔従来の技術〕[Conventional technology]

第2図は従来における光ディスク原盤の製造方法の主要
過程を示す工程図であり、先ず第2図(a)に示す如き
ガラス基板ll上に、第2図fb) 4こ示ず如くフォ
トレジスト層12を積層形成し、第2図(C)に示す如
くフォトレジスト層12の表面から、レーザビーム15
aを用いてガラス基板11の表面に達スる深さと、レー
ザビーム15b、 15cを用いてフォトレジスト層1
2の中間部に達する深さとの2種類の深さに露光し、こ
れを現像して第2図fdlに示す如くガラス基板110
表面が露出する112a及びフォトレジスト層12の厚
さの略中程に達する深さの溝12b12cを形成する。
FIG. 2 is a process diagram showing the main steps of a conventional optical disk master manufacturing method. First, a photoresist layer is formed on a glass substrate 11 as shown in FIG. A laser beam 15 is applied from the surface of the photoresist layer 12 as shown in FIG. 2(C).
a to reach the surface of the glass substrate 11, and laser beams 15b and 15c to reach the depth of the photoresist layer 1.
The glass substrate 110 is exposed to light at two different depths, one reaching the middle part of 2, and the other is developed, as shown in FIG.
A groove 112a whose surface is exposed and a groove 12b12c having a depth reaching approximately the middle of the thickness of the photoresist layer 12 are formed.

次にフォトレジスト層12の上面及び溝12aの底部C
二露出するガラス基板11の表面に、第2図fe)に示
す如く蒸着又はスパッタリングによって所定厚さに二・
ッケル(Ni)膜13を形成し、このニッケル膜13の
全面に第2図(f)に示す如く所定厚さに二、ケルメッ
キを施してメッキ層14を形成した後、ガラス基板11
、フォトレジスト層12をメッキ層14、ニッケル膜1
3から分離して、第2図(glに示す如くビット形成部
13a、案内溝形成部13b、13Cを備え、表面をニ
ッケル膜13にて覆われた原盤1Gを得る。
Next, the top surface of the photoresist layer 12 and the bottom C of the groove 12a
2. On the exposed surface of the glass substrate 11, as shown in FIG.
After forming a Nickel (Ni) film 13 and applying Ni-Kel plating to a predetermined thickness on the entire surface of this nickel film 13 as shown in FIG. 2(f) to form a plating layer 14, a glass substrate 11
, photoresist layer 12, plating layer 14, nickel film 1
3 to obtain a master 1G having a bit forming part 13a, guide groove forming parts 13b and 13C and whose surface is covered with a nickel film 13 as shown in FIG.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところでこのような方法で製造される光ディスク原盤に
おいては案内溝形成部13b、 13cの高さがばらつ
くという問題があった。
However, in the optical disc master manufactured by such a method, there is a problem in that the heights of the guide groove forming portions 13b and 13c vary.

これは第2図(C)に示す工程でレーザビームを用いて
フォトレジスト層12に対する露光を行う際、溝12a
を形成するだめの露光量はガラス基板】1の表面で規制
される結果、その深さはフォトレジスト層12の肉厚で
規定されて一様となるのに対し、溝12b、1.2cは
フォトレジスト層12の肉厚の略中程迄露光させること
により形成するため、フォトレジスト層12の材質のば
らつき、或いはレーザ発振器とフォトレジスト層12と
の間の距離のばらつきによる光強度の変化等に起因して
露光量が変化し、溝12b、 12cの深さが安定しな
いことに依る。
This occurs when the photoresist layer 12 is exposed to light using a laser beam in the process shown in FIG. 2(C).
As a result, the exposure amount for forming the grooves 12b and 1.2c is regulated by the surface of the glass substrate 1, and the depth thereof is determined by the thickness of the photoresist layer 12 and is uniform. Since it is formed by exposing the photoresist layer 12 to approximately the middle of its thickness, variations in the light intensity may occur due to variations in the material of the photoresist layer 12 or variations in the distance between the laser oscillator and the photoresist layer 12. This is due to the fact that the exposure amount changes due to this, and the depths of the grooves 12b and 12c are not stable.

本発明はかかる事情に鑑みなされたものであって、その
目的とするところはビット形成部、案内溝形成部の高さ
のばらつきを防止し得るようにした光ディスク原盤の製
造方法を提供するにある。
The present invention has been made in view of the above circumstances, and its purpose is to provide a method for manufacturing an optical disc master that can prevent variations in the height of the bit forming portion and the guide groove forming portion. .

(課題を解決するための手段) 本発明に係る光ディスク原盤の製造方法は、基板上のレ
ジスト膜に溝を形成し、このレジスト膜上にエツチング
可能な金属薄膜を形成し、更に該金属薄膜を導電膜とし
てエツチングされない金属のメッキ層を形成し、前記基
板及びレジスト膜を除去した後、メッキ層上の工・ッチ
ング可能な金属膜ムこピット形成部を形成する。
(Means for Solving the Problems) A method for manufacturing an optical disk master according to the present invention includes forming grooves in a resist film on a substrate, forming an etchingable metal thin film on the resist film, and further forming the etched metal thin film on the resist film. A plating layer of a metal that cannot be etched is formed as a conductive film, and after removing the substrate and the resist film, a pit-forming portion of the metal film that can be machined and etched is formed on the plating layer.

〔作用〕[Effect]

本発明にあってはこれによって、案内溝形成部の深さは
レジスト層の肉厚によって、またピット形成部の深さは
エツチング可能な金属膜の肉厚によって夫々規制され、
案内溝形成部、ピット形成部の形状のばらつきが低減さ
れる。
In the present invention, the depth of the guide groove forming portion is regulated by the thickness of the resist layer, and the depth of the pit forming portion is regulated by the thickness of the etched metal film.
Variations in the shapes of the guide groove forming portion and the pit forming portion are reduced.

〔実施例〕〔Example〕

以下本発明をその実施例を示す図面に基づき具体的に説
明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below based on drawings showing embodiments thereof.

第1図は本発明に係る光ディスク原盤の製造方法の主要
工程を示す工程図である。先ず第1図TB)に示す如く
、ガラス基板1上に所定厚さにフォトレジスト層2を積
層形成し、このフォトレジスト層2をレーザビームを用
いてガラス基板1の表面に達する深さに露光した後、現
像して第1図(b)に示す如く所定の間隔を隔てて夫々
ガラス基板1の表面が露出する溝部2b、2cをパター
ニングし、溝部2b、 2cの底部に覗くガラス基板1
の表面及びフォトレジスト層2の全面に対し、第1図(
C)に示す如くスパッタリング、又は蒸着法によってエ
ツチング可能な金属、例えばクロム膜3を形成し、更に
このクロム膜3の全面にわたって第1図(dlに示す如
く所定の厚さにエツチングされない金属膜、例えばニッ
ケルのメッキ層4を施す。
FIG. 1 is a process diagram showing the main steps of the method for manufacturing an optical disc master according to the present invention. First, as shown in FIG. 1 (TB), a photoresist layer 2 is laminated to a predetermined thickness on a glass substrate 1, and this photoresist layer 2 is exposed to a depth that reaches the surface of the glass substrate 1 using a laser beam. After that, it is developed and patterned with grooves 2b and 2c exposing the surfaces of the glass substrate 1 at a predetermined interval as shown in FIG.
and the entire surface of the photoresist layer 2 in FIG.
As shown in FIG. 1 (dl), a metal that can be etched, such as a chromium film 3, is formed by sputtering or vapor deposition, and a metal film that is not etched to a predetermined thickness is formed over the entire surface of the chromium film 3, as shown in FIG. For example, a plating layer 4 of nickel is applied.

第1図(elに示す如くガラス基板l及びフォトレジス
ト層2を剥離巳、所定の間隔を隔てて案内溝形成部4b
、4cを備え、表面をクロム膜3で覆われたメッキ層4
を得る。
As shown in FIG.
, 4c, and a plating layer 4 whose surface is covered with a chromium film 3
get.

次に第1図Inに示す如くクロム膜3の表面にポジ型の
フォトレジスト層5を所定厚さに形成し、両案内溝形成
部4b、 4c間の中央と対応する位置に露光、現像を
施して第1図(g)に示す如く底部にクロム膜3が露出
する溝5aをパターニングした後、第1図(h)に示す
如くフォトレジスト層50表面側からCC1,+O□を
用いたドライエツチングを施し、溝底に露出するクロム
膜3をエツチングして底部にメッキ層4の表面が露出す
る溝3aを形成する。
Next, as shown in FIG. 1 In, a positive photoresist layer 5 is formed to a predetermined thickness on the surface of the chromium film 3, and exposed and developed at a position corresponding to the center between the guide groove forming portions 4b and 4c. After patterning a groove 5a exposing the chromium film 3 at the bottom as shown in FIG. 1(g), drying using CC1, +O□ is performed from the surface side of the photoresist layer 50 as shown in FIG. 1(h). Etching is performed to etch the chromium film 3 exposed at the bottom of the groove to form a groove 3a in which the surface of the plating layer 4 is exposed at the bottom.

なおこの間フォトレジスト層5もエツチングされて薄肉
化する。
During this time, the photoresist layer 5 is also etched and becomes thinner.

フォトレジスト層5を除去すれば第1図fi)に示す如
くビット形成部である溝3aと、案内溝形成部4b、 
4cを有する原盤6が作成される。
When the photoresist layer 5 is removed, as shown in FIG.
4c is created.

上述の実施例は原盤6を形成する場合について説明した
が、原盤用の原盤を形成する場合にも適用し得ることは
勿論である。
Although the above-mentioned embodiment has been described with respect to the case where the master disc 6 is formed, it goes without saying that it can also be applied to the case where a master disc for a master disc is formed.

〔発明の効果〕〔Effect of the invention〕

以上の如く本発明方法にあっては案内溝形成部とピ・ッ
ト形成部とを夫々独立に形成するためマスクリング装置
の簡略化が図れる外、案内溝形成部ビット形成部の形成
高さを感光量に依らずに設定し得るため、感光量のばら
つき等によって案内溝形成部、ピット形成部の寸法のば
らつきが大幅に低減され、原盤の品質の向上を図れる優
れた効果を奏するものである。
As described above, in the method of the present invention, since the guide groove forming part and the pit forming part are formed independently, the mask ring device can be simplified, and the formation height of the guide groove forming part and the bit forming part can be reduced. can be set independently of the amount of exposure, so variations in the dimensions of the guide groove forming part and pit forming part due to variations in the amount of exposure, etc. are greatly reduced, and this has the excellent effect of improving the quality of the master disc. be.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明方法による主要工程を示す断面構造図、
第2図は従来方法による主要工程を示す断面構造図であ
る。 1・・・ガラス基板 2・・・フォトレジスト層 3・
・・クロム膜3a・・・溝(ピット形成部)4・・・メ
ッキ層 4b、4c・・・案内溝形成部  5・・・フ
ォトレジスト層 なお、図中、同一符号は同一、又は相当部分を示す。 代理人   大   岩   増  雄第 図
FIG. 1 is a cross-sectional structural diagram showing the main steps according to the method of the present invention;
FIG. 2 is a cross-sectional structural diagram showing the main steps of a conventional method. 1... Glass substrate 2... Photoresist layer 3.
・Chromium film 3a...Groove (pit forming part) 4...Plating layer 4b, 4c...Guiding groove forming part 5...Photoresist layer Note that in the drawings, the same reference numerals indicate the same or equivalent parts. shows. Agent Masuo Oiwa

Claims (1)

【特許請求の範囲】[Claims] (1)表面に案内溝形成部及びこれと高さの異なるピッ
ト形成部を備えた光ディスク用原盤を製造する方法にお
いて、 基板上にレジスト層を形成する工程と、該レジスト層に
溝を形成する工程と、該溝を形成したレジスト層上にエ
ッチング可能な金属薄膜を形成する工程と、該エッチン
グ可能な金属薄膜を導電膜としてこの表面にエッチング
されない金属のメッキ層を形成する工程と、前記基板及
びレジスト層を除去して表面に案内溝形成部を備え、表
面をエッチング可能な金属薄膜で覆われたメッキ層を得
る工程と、エッチング可能な金属薄膜表面にエッチング
によりピット形成部を形成する工程とを有することを特
徴とする光ディスク原盤の製造方法。
(1) A method for manufacturing an optical disc master having a guide groove forming part and a pit forming part having a different height from the guide groove forming part on the surface, which includes the steps of forming a resist layer on a substrate, and forming grooves in the resist layer. a step of forming an etchable metal thin film on the resist layer in which the groove is formed; a step of forming a non-etchable metal plating layer on the surface of the etchable metal thin film as a conductive film; and a step of removing the resist layer to obtain a plated layer having a guide groove forming portion on the surface and having the surface covered with an etchable metal thin film, and a step of forming a pit forming portion by etching on the surface of the etchable metal thin film. A method for manufacturing an optical disc master, comprising:
JP2191653A 1990-07-17 1990-07-17 Production of optical master disk Pending JPH0476838A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2191653A JPH0476838A (en) 1990-07-17 1990-07-17 Production of optical master disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2191653A JPH0476838A (en) 1990-07-17 1990-07-17 Production of optical master disk

Publications (1)

Publication Number Publication Date
JPH0476838A true JPH0476838A (en) 1992-03-11

Family

ID=16278235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2191653A Pending JPH0476838A (en) 1990-07-17 1990-07-17 Production of optical master disk

Country Status (1)

Country Link
JP (1) JPH0476838A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110117502A1 (en) * 2000-10-03 2011-05-19 Panasonic Corporation Method for producing multi-layer optical disk

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110117502A1 (en) * 2000-10-03 2011-05-19 Panasonic Corporation Method for producing multi-layer optical disk

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