JPH0474421U - - Google Patents

Info

Publication number
JPH0474421U
JPH0474421U JP11812890U JP11812890U JPH0474421U JP H0474421 U JPH0474421 U JP H0474421U JP 11812890 U JP11812890 U JP 11812890U JP 11812890 U JP11812890 U JP 11812890U JP H0474421 U JPH0474421 U JP H0474421U
Authority
JP
Japan
Prior art keywords
secondary electrons
ion beam
workpiece
etching apparatus
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11812890U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11812890U priority Critical patent/JPH0474421U/ja
Publication of JPH0474421U publication Critical patent/JPH0474421U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP11812890U 1990-11-09 1990-11-09 Pending JPH0474421U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11812890U JPH0474421U (enrdf_load_stackoverflow) 1990-11-09 1990-11-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11812890U JPH0474421U (enrdf_load_stackoverflow) 1990-11-09 1990-11-09

Publications (1)

Publication Number Publication Date
JPH0474421U true JPH0474421U (enrdf_load_stackoverflow) 1992-06-30

Family

ID=31866037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11812890U Pending JPH0474421U (enrdf_load_stackoverflow) 1990-11-09 1990-11-09

Country Status (1)

Country Link
JP (1) JPH0474421U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017519364A (ja) * 2014-06-30 2017-07-13 東京エレクトロン株式会社 有機化合物ガス環境中でのＣｕ含有層の中性ビームエッチング

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017519364A (ja) * 2014-06-30 2017-07-13 東京エレクトロン株式会社 有機化合物ガス環境中でのＣｕ含有層の中性ビームエッチング

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