JPH0470329B2 - - Google Patents
Info
- Publication number
- JPH0470329B2 JPH0470329B2 JP12864288A JP12864288A JPH0470329B2 JP H0470329 B2 JPH0470329 B2 JP H0470329B2 JP 12864288 A JP12864288 A JP 12864288A JP 12864288 A JP12864288 A JP 12864288A JP H0470329 B2 JPH0470329 B2 JP H0470329B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- epoxy resin
- imide
- resin composition
- aromatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003822 epoxy resin Substances 0.000 claims description 41
- 229920000647 polyepoxide Polymers 0.000 claims description 41
- 150000003949 imides Chemical class 0.000 claims description 24
- 229920005989 resin Polymers 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 23
- -1 Lewis acid compound Chemical class 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 22
- 239000011342 resin composition Substances 0.000 claims description 22
- 239000003795 chemical substances by application Substances 0.000 claims description 14
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 150000001491 aromatic compounds Chemical class 0.000 claims description 8
- 229920003986 novolac Polymers 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 3
- 239000002841 Lewis acid Substances 0.000 claims description 3
- 229930003836 cresol Natural products 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 239000005011 phenolic resin Substances 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 239000011229 interlayer Substances 0.000 description 13
- 125000003277 amino group Chemical group 0.000 description 12
- 230000009477 glass transition Effects 0.000 description 10
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- 150000004984 aromatic diamines Chemical class 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011889 copper foil Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000004744 fabric Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 125000005462 imide group Chemical group 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920003192 poly(bis maleimide) Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- CGSKOGYKWHUSLC-UHFFFAOYSA-N 1-(4-aminophenyl)-1,3,3-trimethyl-2h-inden-5-amine Chemical compound C12=CC=C(N)C=C2C(C)(C)CC1(C)C1=CC=C(N)C=C1 CGSKOGYKWHUSLC-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical group C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- KOGDFDWINXIWHI-OWOJBTEDSA-N 4-[(e)-2-(4-aminophenyl)ethenyl]aniline Chemical compound C1=CC(N)=CC=C1\C=C\C1=CC=C(N)C=C1 KOGDFDWINXIWHI-OWOJBTEDSA-N 0.000 description 1
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
- AJYDKROUZBIMLE-UHFFFAOYSA-N 4-[2-[2-[2-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=CC=C(OC=2C=CC(N)=CC=2)C=1C(C)(C)C1=CC=CC=C1OC1=CC=C(N)C=C1 AJYDKROUZBIMLE-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- CLTKUJYQLVTZSS-UHFFFAOYSA-N 4-[9-(4-aminophenyl)anthracen-1-yl]aniline Chemical compound C1=CC(N)=CC=C1C1=CC=CC2=CC3=CC=CC=C3C(C=3C=CC(N)=CC=3)=C12 CLTKUJYQLVTZSS-UHFFFAOYSA-N 0.000 description 1
- KIFDSGGWDIVQGN-UHFFFAOYSA-N 4-[9-(4-aminophenyl)fluoren-9-yl]aniline Chemical compound C1=CC(N)=CC=C1C1(C=2C=CC(N)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 KIFDSGGWDIVQGN-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GHAZCVNUKKZTLG-UHFFFAOYSA-N N-ethyl-succinimide Natural products CCN1C(=O)CCC1=O GHAZCVNUKKZTLG-UHFFFAOYSA-N 0.000 description 1
- HDFGOPSGAURCEO-UHFFFAOYSA-N N-ethylmaleimide Chemical compound CCN1C(=O)C=CC1=O HDFGOPSGAURCEO-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- DYDNPESBYVVLBO-UHFFFAOYSA-N formanilide Chemical class O=CNC1=CC=CC=C1 DYDNPESBYVVLBO-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- RHMOVUCTGINLRG-UHFFFAOYSA-N phenyl-(2,3,4,5-tetrachlorophenyl)methanediamine Chemical compound C=1C(Cl)=C(Cl)C(Cl)=C(Cl)C=1C(N)(N)C1=CC=CC=C1 RHMOVUCTGINLRG-UHFFFAOYSA-N 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
〔産業上の利用分野〕
この発明は、積層板等に使用される硬化性樹脂
組成物に関する。
〔従来の技術〕
積層板等に使用される樹脂としては、一般に、
エポキシ樹脂やイミド樹脂が多用されている。
そのような積層板の場合、樹脂選択の基準とし
て、積層数が10層以上か以下かということで、イ
ミド樹脂とエポキシ樹脂の使い分けが行われてき
た。ところが、近年、積層板の用途が多様化し、
このような積層数による使い分け等の使用体系で
は、充分に対応できなくなつてきている。
たとえば、エポキシ樹脂においては、高純度
化、速硬化性、スミヤー性、紫外線遮断性等の点
でさらに改良が求められており、他方のイミド樹
脂では、高ガラス転移点Tg、高難燃性、低温硬
化性、低コスト等の追求がなされるようになつて
きた。特に最近では、イミド樹脂とエポキシ樹脂
の中間に位置する性能を有するものが求められて
おり、それに応えるものとして、イミド樹脂プレ
ポリマーをエポキシ樹脂で変性した、エポキシ変
性イミド樹脂プレポリマーが開発された。
〔発明が解決しようとする課題〕
ところが、現在使用されているエポキシ変性イ
ミド樹脂プレポリマーでは、通常、積層板に用い
た場合の層間接着力(密着力)を高めるため、エ
ポキシ樹脂の配合量が多くされているが、そのた
めに、硬化後の樹脂のガラス転移点が低くなつて
しまう、という問題を有している。
したがつて、ガラス転移点が高く、しかも、積
層板に用いた際に充分な層間接着力が得られるよ
うな硬化性樹脂組成物を目指し、発明者らは、ど
のようにすればエポキシ樹脂の配合量を増やすこ
となく層間接着力を高めることができるか、とい
う観点から検討を行つた。その結果、エポキシ樹
脂の配合量を多くする代わりに、イミド樹脂プレ
ポリマーの主たる骨格である主鎖中にイミド基を
複数個有する芳香族化合物であり、かつ、エポキ
シ樹脂と反応するアミノ基を複数個有するものを
用いればよいことを見出した。しかし、単にこの
ような化合物とエポキシ樹脂とを反応させるだけ
では、未反応のアミノ基が数多く残留し、耐熱性
に悪影響を与えることもさらに判明した。
そこで、発明者らは先に、上記問題を解決する
べく、下記の硬化性樹脂組成物を開発した(特願
昭62−148532号明細書等)。同硬化性樹脂組成物
は、分子内にイミド基とアミノ基とを各々複数個
有する芳香族化合物とエポキシ樹脂とを反応させ
てなるものに、硬化剤として少なくとも不飽和イ
ミド化合物が配合されたものであり、ここで上記
芳香族化合物としては、特に限定されていない
が、下記一般式であらわされる化合物()およ
び()
〔式中、Ar1は2価の芳香族基、Ar2は4価の
芳香族基、Ar3は3価の芳香族基をそれぞれあら
わし、p,qは0または正の整数(ただしp+q
>0)をあらわしている。〕
〔式中、Ar4は前記Ar2と同一かまたは異なる
4価の芳香族基、R1,R2は水素原子、ハロゲン
原子またはアルキル基をあらわし、R1,R2のう
ちの少なくとも一方は常にアルキル基である。ま
た、mは正の整数をあらわしている。〕のうちの
少なくとも一方を用いることが推奨されている。
上記発明にかかる硬化性樹脂組成物は、確かに
ガラス転移点が高く、しかも積層板に用いた場合
に充分な層間接着力が得られるとともに、耐熱性
も良好であつて、同発明における所期の目的は達
成されているが、特に層間接着力の向上という点
で、さらなる改良が求められていた。
以上の事情に鑑み、この発明は、ガラス転移点
が高く、耐熱性も良好であるとともに、積層板の
含浸樹脂等として用いた場合、より一層優れた層
間接着力が得られるような硬化性樹脂組成物を提
供することを課題とする。
〔課題を解決するための手段〕
上記課題を解決するため、この発明にかかる樹
脂組成物は、下記一般式()であらわされる芳
香族化合物またはこれと前記一般式()であら
わされる芳香族化合物に対しエポキシ樹脂を反応
させてなるものに、硬化剤として不飽和イミド化
合物を配合してなるものである。
上記不飽和イミド化合物以外の硬化剤を併用し
てもよく、たとえば、ルイス酸化合物を併用する
ことが好ましい。
また、上記エポキシ樹脂は臭素化エポキシ樹脂
を含んでおり、その配合量が、硬化性樹脂組成物
全固形分中の臭素原子含有量に換算して6重量%
以上であることが好ましい。
〔作用〕
この発明では、従来のイミド樹脂プレポリマー
の代わりに、上記分子内にイミド基とアミノ基と
を各々複数個有する芳香族化合物(以下、「イミ
ド基アミノ基含有化合物」と略記する)()が
用いられ、同化合物()の未端アミノ基と反応
してこれを変性するエポキシ樹脂、および同エポ
キシ樹脂の硬化剤としての不飽和イミド化合物が
配合されている。その結果、上記()の末端ア
ミノ基とエポキシ樹脂とは充分に反応し、エポキ
シ樹脂の含有量を増やさなくても(つまり硬化性
樹脂組成物のガラス転移点が低下することなく)、
層間接着性を一層向上させることができ、加え
て、良好な耐熱性も得られる。
〔実施例〕
はじめに、この発明にかかるイミド基アミノ基
含有化合物()について説明する(特開昭62−
29584号公報参照)。
同化合物()におけるAr1およびAr2は、そ
れぞれ独立に、単核あるいは多核の2価の芳香族
基(残基)であり、その芳香環には、低級のアル
キル基、ハロゲン、低級のアルコキシル基、カル
ボキシル基等の置換基が含まれていてもよい。さ
らに具体的には、Ar1およびAr2はいずれも、芳
香族ジアミンの残基である。
同芳香族ジアミンとしては、たとえば、4,
4′−ジアミノジフエニルメタン、3,3′−ジアミ
ノジフエニルメタン、4,4′−ジアミノジフエニ
ルプロパン、4,4′−ジアミノビフエニル、4,
4′−ジアミノスチルベン、4,4′−ジアミノジフ
エニルエーテル、3,4′−ジアミノジフエニルエ
ーテル、4,4′−ジアミノジフエニルスルホン、
3,3′−ジアミノジフエニルスルホン、4,4′−
ジアミノジフエニルスルフイド、3,3′−ジアミ
ノベンゾフエノン、2,4−トルエンジアミン、
2,6−トルエンジアミン、m−フエニレンジア
ミン、p−フエニレンジアミン、ベンジジン、m
−キシリレンジアミン、p−キシリレンジアミ
ン、1,3−ビス(3−アミノフエノキシ)ベン
ゼン、1,4−ビス(4−アミノフエノキシ)ベ
ンゼン、2,2−ビス(4−アミノフエノキシフ
エニル)プロパン、4,4′−ビス(4−アミノフ
エノキシ)ジフエニルスルホン、4,4′−ビス
(3−アミノフエノキシ)ジフエニルスルホン、
および、これら列記化合物のメチル−、エチル
−、クロロ−、メトキシ−、エトキシー、カルボ
キシ−等の各置換基(たとえば、3,3′−ジメチ
ル−4,4′−ジアミノフエニルメタン、3,3′−
ジメチル−4,4′−ジアミノフビエニル、3,
3′−ジクロロ−4,4′−ジアミノジフエニジルプ
ロパン、3,3′−ジクロロ−4,4′−ジアミノジ
フエニルスルホン、テトラクロロジアミノジフエ
ニルメタン、3,3′−ジメトキシ−4,4′−ジア
ミノビフエニル、3,3′−ジカルボキシ−4,
4′−ジアミノジフエニルメタンなど)が挙げられ
る。また、ベンゼン環(単核)以外の縮合多環
(多核)の芳香族基としては、フルオレン、アン
トラセン、インダン等が挙げられ、これらを含む
芳香族ジアミン〔たとえば、9,9−ビス(4−
アミノフエニル)フルオレン、8,9−ビス(4
−アミノフエニル)アントラセン、5−アミノ−
1−(4′−アミノフエニル)−1,3,3−トリメ
チルインダン等〕も、同様に用いることができ
る。
以上の芳香族ジアミンは、単独で、あるいは複
数種を併せて使用され、たとえば、Ar1とAr2が
等しくても、異なつていてもよく、また、Ar1お
よび/またはAr2として、各々複数種が用いられ
ていてもよい。
R1,R2およびnについては、前記のとおりで
ある。
上記イミド基アミノ基含有化合物()は、た
とえば、上記芳香族ジアミンと、下記一般式であ
らわされる酸無水物()
〔式中、R1およびR2は前記と同様。〕との通常
のイミド化反応により合成することができる。ま
た、市販品として、商品名TSM−20(住友化学工
業(株)製)等を用いてもよい。
この発明にかかる硬化性樹脂組成物では、以上
のようなイミド基アミノ基含有化合物()とと
もに、前述のイミド基アミノ基含有化合物()
(特願昭62−148532号明細書等)を併用すること
もできる。
同イミド基アミノ基含有化合物()は、芳香
族テトラカルボン酸およびその誘導体と、モル過
剰の芳香族ジアミン成分とを適当な溶媒中で反応
させることにより得られる。上記芳香族テトラカ
ルボン酸としては、たとえば、ピロメリツト酸、
3,3′,4,4′−ベンゾフエノンテトラカルボン
酸、3,3′,4,4′−ジフエニルエーテルテトラ
カルボン酸、3,3′,4,4′−ビフエニルテトラ
カルボン酸、2,3,6,7−ナフタレンテトラ
カルボン酸、2,2−ビス(3,4−ジカルボキ
シフエニル)プロパン等が、芳香族ジアミン成分
としては、o−アルキル置換アニリン−ホルムア
ルデヒド縮合物(アルキルとしてはC1〜C4、な
かでもエチル基が好ましい)等が、溶媒として
は、N−メチル−2−ピロリドン、N,N−ジメ
チルアセトアミド、N,N−ジメチルホルムアミ
ド等のアミド系溶媒や、m−クレゾール等のフエ
ノール類、ジメチルスルホキシド等が、それぞれ
例示されるが、これらに限定はされない。
上記イミド基アミノ基含有化合物の変性に用い
られるエポキシ樹脂としては、種々のものが考え
られるが、硬化後の樹脂のガラス転移点や、その
他の性能を向上させるためには、ノボラツク型エ
ポキシ樹脂を使用することが好ましい。もちろ
ん、各々の使用目的等に応じて、それ以外のエポ
キシ樹脂を使用することも同様に可能である。た
とえば、臭素化エポキシ樹脂を使用すれば、得ら
れる樹脂の難燃性を向上させることができる。そ
の場合、UL規格のUL94V−0を達成しようとす
れば、組成物全固形分量に対し、6重量%以上の
臭素原子が含有されるような量の臭素化エポキシ
樹脂を配合してやることが適切である。
上記臭素化エポキシ樹脂としては、たとえば、
下記一般式であらわされた臭素化ノボラツク型エ
ポキシ樹脂()、
テトラブロムビスフエノールAのジグリシジル
エーテル化合物()、
およびテトラブロモビスフエノールAから誘導
された臭素化エポキシ樹脂()
〔上記(),()式中、mは正の整数、pは
0または正の整数をあらわす。〕等が、最も好ま
しい例として挙げられるが、これらに限定される
ことはない。以上のエポキシ樹脂は、単独で、あ
るいは複数種を併せて用いられる。
イミド基アミノ基含有化合物とエポキシ樹脂の
配合比は、特に限定はされないが、これまで述べ
てきたように、この発明では、エポキシ樹脂の配
合量が少なくても充分な層間接着力を得ることが
できるため、樹脂のガラス転移点を高める意味か
らも、エポキシ樹脂の配合量は、少なければ少な
いほど好ましい。たとえば、従来のエポキシ変性
イミド樹脂プレポリマーでは、重量比で、
エポキシ樹脂/イミド樹脂≒1.5
程度の配合比になつていることが多かつたが、こ
の発明では、重量比で、
エポキシ樹脂/イミド基アミノ基含有化合物
≦1.0
のようにエポキシ樹脂量を減らしても、従来と同
等もしくはそれ以上の、充分な層間接着力が得ら
れるようになる。
エポキシ樹脂の硬化のための硬化剤として、こ
の発明では、少なくとも不飽和イミド化合物が用
いられる。不飽和イミド化合物の代表的なものと
しては、N−メチルマレイミド、N−エチルマイ
ミド、N−フエニルマレイミドや、下記にあらわ
されたビスマレイミド()
およびその誘導体等が好ましく用いられるが、
これらに限定されることはなく、その他多くの不
飽和イミド化合物を同様に使用できる。これら
は、単独で、あるいは複数種を併せて用いられ
る。
また、上記不飽和イミド化合物以外の硬化剤と
して、ノボラツク型フエノール樹脂および/また
はノボラツク型クレゾール樹脂からなるルイス酸
化合物を併用することもできる。
以上述べてきた、この発明の硬化性樹脂組成物
は、上述のイミド基アミノ基含有化合物、エポキ
シ樹脂および硬化剤の各成分を、単に混合しただ
けでも得ることができるが、混合だけでは、濃度
が高い場合は均一であるように見えるが、希釈す
ると、前2者成分が分離してしまう恐れがある。
したがつて、イミド基アミノ基含有化合物とエポ
キシ樹脂とを、適当な条件下で反応させておくこ
とが好ましい。同反応条件は、特に限定はされ
ず、使用する化合物の種類等に応じた条件を、
個々に設定してやればよい。
つぎに、この発明のさらに詳しい実施例につい
て、比較例と併せて説明する。
−実施例 1−
イミド基アミノ基含有化合物aとして商品名
TSM−20(住友化学工業(株)製、エポキシ樹脂
としてビスフエノールA型エポキシ樹脂(油化シ
エルエポキシ(株)製、シエル化学(株)取扱い
エピコート828)および臭素化エポキシ樹脂(同
上(株)製、同上(株)取扱いDX245)を用い、
35℃で30分間反応させてエポキシ変性を行つた
後、硬化剤として前記ビスマレイミド()を配
合し、硬化性樹脂組成物を得た。上記各成分の配
合量は、第1表に示すとおりである。
上記硬化性樹脂組成物を、ガラス布(日東紡績
(株)製WE−09−F104)に含浸させ、160℃、10
分間乾燥させてプリプレグを得た。
得られたプリプレグを4枚重ね、その上下に銅
箔(日鉱グールド社製JTC−18μ)を配して得ら
れた積層体を、30Kg/cm2、170℃で90分間、加熱
加圧した。その後、常圧下、200℃で120分間のア
フターキユアを行い、厚み0.5mmの両面銅張り積
層板(以下、「積層板」と記す)を得た。
−実施例 2−
硬化剤として、上記ビスマレイミド()とと
もに、ノボラツク型クレゾール樹脂を用いるよう
にする他は、上記実施例1と同様にして硬化性樹
脂組成物を調製し、さらに同様に積層板を作製し
た。
−実施例 3−
イミド基アミノ基含有化合物として、上記化合
物aとともに化合物a(式中、
[Industrial Field of Application] This invention relates to a curable resin composition used for laminated plates and the like. [Prior art] Generally, resins used for laminates, etc.
Epoxy resins and imide resins are often used. In the case of such laminates, the criteria for resin selection has been to use imide resins and epoxy resins depending on whether the number of laminated layers is 10 or more or less. However, in recent years, the uses of laminates have diversified.
Such a system of use based on the number of laminated layers is no longer sufficient. For example, epoxy resins are required to be further improved in terms of high purity, fast curing, smearing properties, UV blocking properties, etc., while imide resins are required to have a high glass transition point Tg, high flame retardancy, The pursuit of low-temperature curability, low cost, etc. has begun. Particularly recently, there has been a demand for products with performance that lies between those of imide resins and epoxy resins, and in response to this demand, epoxy-modified imide resin prepolymers have been developed in which imide resin prepolymers are modified with epoxy resins. . [Problem to be solved by the invention] However, in the currently used epoxy-modified imide resin prepolymers, the amount of epoxy resin blended is usually increased in order to increase the interlayer adhesion (adhesion) when used in laminates. However, there is a problem in that the glass transition point of the resin after curing becomes low. Therefore, with the aim of creating a curable resin composition that has a high glass transition point and also provides sufficient interlayer adhesion when used in laminates, the inventors wondered how to improve the epoxy resin composition. A study was conducted from the viewpoint of whether it was possible to increase the interlayer adhesion strength without increasing the blending amount. As a result, instead of increasing the amount of epoxy resin blended, we developed an aromatic compound that has multiple imide groups in the main chain, which is the main skeleton of the imide resin prepolymer, and multiple amino groups that react with the epoxy resin. I discovered that I could use what I had. However, it has further been found that simply reacting such a compound with an epoxy resin leaves a large number of unreacted amino groups, which adversely affects heat resistance. Therefore, the inventors first developed the following curable resin composition in order to solve the above problem (Japanese Patent Application No. 148532/1984, etc.). The curable resin composition is made by reacting an aromatic compound having a plurality of imide groups and a plurality of amino groups in the molecule with an epoxy resin, and at least an unsaturated imide compound is blended as a curing agent. Here, the aromatic compounds mentioned above are not particularly limited, but include compounds () and () represented by the following general formula. [In the formula, Ar 1 represents a divalent aromatic group, Ar 2 represents a tetravalent aromatic group, Ar 3 represents a trivalent aromatic group, and p and q are 0 or a positive integer (however, p+q
>0). ] [In the formula, Ar 4 is a tetravalent aromatic group that is the same as or different from Ar 2 , R 1 and R 2 represent a hydrogen atom, a halogen atom, or an alkyl group, and at least one of R 1 and R 2 is Always an alkyl group. Moreover, m represents a positive integer. ] It is recommended to use at least one of the following. The curable resin composition according to the above invention certainly has a high glass transition point, and when used in a laminate, it can provide sufficient interlayer adhesion and also has good heat resistance. Although the objective has been achieved, further improvements were required, particularly in terms of improving interlayer adhesion. In view of the above circumstances, the present invention aims to develop a curable resin that has a high glass transition point, good heat resistance, and can provide even better interlayer adhesive strength when used as an impregnating resin for laminates. An object of the present invention is to provide a composition. [Means for Solving the Problems] In order to solve the above problems, the resin composition according to the present invention comprises an aromatic compound represented by the following general formula (), or an aromatic compound represented by this and the above general formula (). It is made by reacting an epoxy resin with an unsaturated imide compound as a curing agent. A curing agent other than the above-mentioned unsaturated imide compound may be used in combination, and for example, it is preferable to use a Lewis acid compound in combination. In addition, the above-mentioned epoxy resin contains a brominated epoxy resin, and the amount thereof is 6% by weight in terms of the bromine atom content in the total solid content of the curable resin composition.
It is preferable that it is above. [Function] In this invention, instead of the conventional imide resin prepolymer, an aromatic compound having a plurality of each of imide groups and amino groups in the molecule (hereinafter abbreviated as "imide group-amino group-containing compound") is used. () is used, and an epoxy resin that reacts with the unterminated amino group of the compound () to modify it, and an unsaturated imide compound as a curing agent for the epoxy resin are blended. As a result, the terminal amino group in () above and the epoxy resin react sufficiently, without increasing the content of the epoxy resin (that is, without lowering the glass transition point of the curable resin composition).
Interlayer adhesion can be further improved, and in addition, good heat resistance can also be obtained. [Example] First, the imide group-amino group-containing compound (
(See Publication No. 29584). Ar 1 and Ar 2 in the same compound () are each independently a mononuclear or polynuclear divalent aromatic group (residue), and the aromatic ring contains a lower alkyl group, halogen, lower alkoxyl group, etc. A substituent such as a group or a carboxyl group may be included. More specifically, Ar 1 and Ar 2 are both residues of aromatic diamines. Examples of aromatic diamines include 4,
4'-diaminodiphenylmethane, 3,3'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl, 4,
4'-diaminostilbene, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone,
3,3'-diaminodiphenylsulfone, 4,4'-
Diaminodiphenyl sulfide, 3,3'-diaminobenzophenone, 2,4-toluenediamine,
2,6-toluenediamine, m-phenylenediamine, p-phenylenediamine, benzidine, m
-xylylenediamine, p-xylylenediamine, 1,3-bis(3-aminophenoxy)benzene, 1,4-bis(4-aminophenoxy)benzene, 2,2-bis(4-aminophenoxyphenyl)propane , 4,4'-bis(4-aminophenoxy)diphenylsulfone, 4,4'-bis(3-aminophenoxy)diphenylsulfone,
and methyl-, ethyl-, chloro-, methoxy-, ethoxy-, carboxy-, etc. substituents of these listed compounds (e.g., 3,3'-dimethyl-4,4'-diaminophenylmethane, 3,3 ′−
Dimethyl-4,4'-diaminofubienyl, 3,
3'-Dichloro-4,4'-diaminodiphenidylpropane, 3,3'-dichloro-4,4'-diaminodiphenylsulfone, tetrachlorodiaminodiphenylmethane, 3,3'-dimethoxy-4,4 '-diaminobiphenyl, 3,3'-dicarboxy-4,
4'-diaminodiphenylmethane, etc.). In addition, examples of condensed polycyclic (polynuclear) aromatic groups other than benzene rings (mononuclear) include fluorene, anthracene, indane, etc., and aromatic diamines containing these [for example, 9,9-bis(4-
aminophenyl)fluorene, 8,9-bis(4
-aminophenyl)anthracene, 5-amino-
1-(4'-aminophenyl)-1,3,3-trimethylindane, etc.] can also be used in the same manner. The above aromatic diamines may be used alone or in combination; for example, Ar 1 and Ar 2 may be equal or different, and Ar 1 and/or Ar 2 may each be used as Multiple types may be used. R 1 , R 2 and n are as described above. The above-mentioned imide group-amino group-containing compound () is, for example, the above-mentioned aromatic diamine and an acid anhydride () represented by the following general formula. [In the formula, R 1 and R 2 are the same as above. ] can be synthesized by a conventional imidization reaction. Further, as a commercially available product, the product name TSM-20 (manufactured by Sumitomo Chemical Co., Ltd.) or the like may be used. In the curable resin composition according to the present invention, in addition to the above-mentioned imide-based amino group-containing compound (), the above-mentioned imide-based amino group-containing compound () is used.
(Japanese Patent Application No. 62-148532, etc.) can also be used in combination. The imido group-amino group-containing compound (2) can be obtained by reacting an aromatic tetracarboxylic acid or its derivative with a molar excess of an aromatic diamine component in a suitable solvent. Examples of the aromatic tetracarboxylic acids include pyromellitic acid,
3,3',4,4'-benzophenonetetracarboxylic acid, 3,3',4,4'-diphenyl ether tetracarboxylic acid, 3,3',4,4'-biphenyltetracarboxylic acid, 2,3,6,7-naphthalenetetracarboxylic acid, 2,2-bis(3,4-dicarboxyphenyl)propane, etc. are used as aromatic diamine components, o-alkyl substituted aniline-formaldehyde condensate (alkyl Examples of the solvent include amide solvents such as N-methyl-2-pyrrolidone, N , N-dimethylacetamide, and N,N-dimethylformamide; Examples include phenols such as m-cresol, dimethyl sulfoxide, etc., but are not limited thereto. Various epoxy resins can be used to modify the imide-based amino group-containing compound, but in order to improve the glass transition point and other properties of the resin after curing, novolac-type epoxy resins are recommended. It is preferable to use Of course, it is also possible to use other epoxy resins depending on the purpose of use. For example, using a brominated epoxy resin can improve the flame retardancy of the resulting resin. In that case, in order to achieve the UL standard UL94V-0, it is appropriate to blend the brominated epoxy resin in an amount that will contain 6% by weight or more of bromine atoms based on the total solid content of the composition. be. Examples of the above-mentioned brominated epoxy resin include:
Brominated novolak type epoxy resin () represented by the following general formula, diglycidyl ether compound of tetrabromo bisphenol A (), and brominated epoxy resin derived from tetrabromobisphenol A () [In the above formulas () and (), m represents a positive integer, and p represents 0 or a positive integer. ] etc. are mentioned as the most preferable examples, but the invention is not limited thereto. The above epoxy resins may be used alone or in combination. The blending ratio of the imide-based amino group-containing compound and the epoxy resin is not particularly limited, but as described above, in the present invention, it is possible to obtain sufficient interlayer adhesion even with a small blended amount of the epoxy resin. Therefore, from the viewpoint of increasing the glass transition point of the resin, the amount of the epoxy resin blended is preferably as small as possible. For example, in conventional epoxy-modified imide resin prepolymers, the weight ratio of epoxy resin/imide resin was often about 1.5, but in this invention, the weight ratio of epoxy resin/imide resin was approximately 1.5. Even if the amount of epoxy resin is reduced such that the amino group-containing compound is ≦1.0, sufficient interlayer adhesion strength can be obtained that is equal to or greater than that of the conventional method. In the present invention, at least an unsaturated imide compound is used as a curing agent for curing the epoxy resin. Typical unsaturated imide compounds include N-methylmaleimide, N-ethylmaleimide, N-phenylmaleimide, and the bismaleimide () shown below. and its derivatives are preferably used, but
Without being limited to these, many other unsaturated imide compounds can be used as well. These may be used alone or in combination. Further, as a curing agent other than the above-mentioned unsaturated imide compound, a Lewis acid compound consisting of a novolak type phenol resin and/or a novolak type cresol resin can also be used in combination. The curable resin composition of the present invention as described above can be obtained by simply mixing the imide group-amino group-containing compound, the epoxy resin, and the curing agent. When it is high, it appears to be uniform, but when diluted, there is a risk that the former two components will separate.
Therefore, it is preferable to react the imide group-amino group-containing compound and the epoxy resin under appropriate conditions. The reaction conditions are not particularly limited, and can be adjusted depending on the type of compound used, etc.
You can set them individually. Next, more detailed examples of the present invention will be described together with comparative examples. - Example 1 - Trade name as imido group amino group-containing compound a
TSM-20 (manufactured by Sumitomo Chemical Co., Ltd., bisphenol A type epoxy resin (manufactured by Yuka Ciel Epoxy Co., Ltd., handled by Ciel Chemical Co., Ltd., Epicote 828) and brominated epoxy resin (same as above) Using DX245 manufactured by Co., Ltd.,
After performing epoxy modification by reacting at 35° C. for 30 minutes, the bismaleimide () was added as a curing agent to obtain a curable resin composition. The blending amounts of each of the above components are as shown in Table 1. A glass cloth (WE-09-F104 manufactured by Nitto Boseki Co., Ltd.) was impregnated with the above curable resin composition and heated at 160°C for 10 minutes.
The prepreg was obtained by drying for a minute. Four sheets of the obtained prepreg were stacked and copper foil (JTC-18μ manufactured by Nikko Gould Co., Ltd.) was placed on top and bottom of the resulting laminate, which was heated and pressed at 30 kg/cm 2 at 170° C. for 90 minutes. Thereafter, after-curing was performed at 200° C. for 120 minutes under normal pressure to obtain a double-sided copper-clad laminate (hereinafter referred to as “laminate”) with a thickness of 0.5 mm. -Example 2- A curable resin composition was prepared in the same manner as in Example 1 above, except that a novolac type cresol resin was used as a curing agent together with the above bismaleimide (), and a laminate was prepared in the same manner. was created. - Example 3 - Compound a (in the formula,
【式】R1=R2=H,m=1)を併
用するようにする他は、上記実施例1と同様にし
て硬化性樹脂組成物を調製し、さらに積層板を作
製した。
−比較例 1−
イミド基アミノ基含有化合物の代わりに、N,
N′−ジフエニルメタンビスマレイミドと4,4′−
ジアミノジフエニルメタン(DDM)とを反応さ
せて得られるKinel型ポリイミドを用い、硬化剤
として、不飽和イミド化合物の代わりにアミン系
硬化剤(DDM)を用いるようにする他は、上記
実施例1と同様にして硬化性樹脂組成物を調製
し、以下も同様に積層板を作製した。
−比較例 2−
イミド基アミノ基含有化合物として、上記化合
物aの代わりに化合物a(式中、
A curable resin composition was prepared in the same manner as in Example 1 above, except that R 1 =R 2 =H, m=1) was used in combination, and a laminate was also produced. -Comparative Example 1- Instead of the imide group-amino group-containing compound, N,
N′-diphenylmethane bismaleimide and 4,4′-
Example 1 above except that Kinel type polyimide obtained by reacting with diaminodiphenylmethane (DDM) was used and an amine curing agent (DDM) was used instead of the unsaturated imide compound as the curing agent. A curable resin composition was prepared in the same manner as above, and laminates were produced in the same manner. - Comparative Example 2 - Compound a (in the formula,
【式】【formula】
【式】p=q=1)を用いるよう
にする他は、上記実施例1と同様にして硬化性樹
脂組成物を調製し、以下も同様に積層板を作製し
た。
−比較例 3−
イミド基アミノ基含有化合物として、上記実施
例4と同様の化合物aを用いるようにする他
は、上記実施例1と同様にして硬化性樹脂組成物
を調製し、以下同様に積層板を作製した。
−比較例 4−
硬化剤として、不飽和イミド化合物の代わりに
DDMを用いるようにする他は、上記実施例1と
同様にして硬化性樹脂組成物を調製し、以下同様
に積層板を作製した。
以上の実施例および比較例の積層板について、
以下の各試験を行つて、その性能を評価した。
★ ガラス転移点
積層板表面の銅箔をエツチングにより除去した
後、動的粘弾性測定装置を用いて測定した。
★ 層間接着強度
ガラス布の繊維方向に対して直角に、幅4〜8
mmの短冊形に積層板を切断した。得られたサンプ
ル中のガラス布の、第1層目と第2層目の層間接
着強度を、シヨツパー式引張試験機を用いて測定
した。
★ 銅箔引き剥がし強度
上記層間接着強度速度と同様のサンプルを作製
し、表面の銅箔と、その直下のガラス布第1層と
の間の引き剥がし強度を、シヨツパー式引張試験
機を用いて測定した。
★ ハンダ耐熱性
積層板を縦横25±1mmに切り取つて試験片と
し、それを溶液ハンダ浴(300℃)上に浮かせた。
20秒後に、銅箔面および積層板のフクレの有無を
観察した。
以上の結果を、同じく第1表に示す。A curable resin composition was prepared in the same manner as in Example 1 above, except that p=q=1) was used, and laminates were produced in the same manner. - Comparative Example 3 - A curable resin composition was prepared in the same manner as in Example 1 above, except that the same compound a as in Example 4 was used as the imide group-amino group-containing compound, and the same procedure was followed. A laminate was produced. - Comparative Example 4 - Instead of unsaturated imide compound as curing agent
A curable resin composition was prepared in the same manner as in Example 1, except that DDM was used, and a laminate was produced in the same manner. Regarding the laminates of the above examples and comparative examples,
The following tests were conducted to evaluate the performance. *Glass transition point After removing the copper foil on the surface of the laminate by etching, it was measured using a dynamic viscoelasticity measuring device. ★ Interlayer adhesion strength Width 4 to 8 perpendicular to the fiber direction of glass cloth
The laminate was cut into strips of mm. The interlayer adhesion strength between the first layer and the second layer of the glass cloth in the obtained sample was measured using a Schottper type tensile tester. ★ Copper foil peel strength A sample similar to the above interlayer adhesion strength rate was prepared, and the peel strength between the copper foil on the surface and the first layer of glass cloth immediately below it was measured using a Schottsper type tensile tester. It was measured. ★Solder heat resistance The laminate was cut into 25±1 mm length and width test pieces, which were floated on a solution solder bath (300°C).
After 20 seconds, the presence or absence of blisters on the copper foil surface and the laminate was observed. The above results are also shown in Table 1.
【表】【table】
この発明にかかる硬化性樹脂組成物は、ガラス
転移点が高く、耐熱性も良好で、しかも、積層板
に用いた場合には、より一層優れた層間接着力が
得られるため、これまでにない優れた積層板材料
等として期待できる。
The curable resin composition according to the present invention has a high glass transition point and good heat resistance, and when used in a laminate, it provides even better interlayer adhesion, which is unprecedented. It can be expected to be an excellent laminate material.
Claims (1)
物またはこれと下記一般式()であらわされる
芳香族化合物に対しエポキシ樹脂を反応させてな
るものに、硬化剤として不飽和イミド化合物を配
合してなる硬化性樹脂組成物。 〔式中、Ar1およびAr2は各々2価の芳香族基、
R1は水素原子あるいは炭素数1〜10のアルキル
基、R2は水素原子、炭素数1〜20のアルキル基、
アルコキシル基あるいは水酸基をそれぞれあらわ
し、nは0〜80の整数をあらわしている。〕 〔式中、Ar4は4価の芳香族基、R1,R2は水素
原子、ハロゲン原子またはアルキル基をあらわ
し、R1,R2のうちの少なくとも一方は常にアル
キル基である。また、mは正の整数をあらわして
いる。〕 2 硬化剤として、ノボラツク型フエノール樹脂
および/またはノボラツク型クレゾール樹脂から
なるルイス酸化合物をも含んでいる請求項1記載
の硬化性樹脂組成物。 3 エポキシ樹脂が臭素化エポキシ樹脂を含んで
おり、その配合量が、全固形分中の臭素原子含有
量に換算して6重量%以上である請求項1または
2記載の硬化性樹脂組成物。[Claims] 1. An aromatic compound represented by the following general formula () or a product obtained by reacting an epoxy resin with an aromatic compound represented by the following general formula (), and an unsaturated imide as a curing agent. A curable resin composition containing a compound. [In the formula, Ar 1 and Ar 2 are each a divalent aromatic group,
R 1 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, R 2 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms,
Each represents an alkoxyl group or a hydroxyl group, and n represents an integer from 0 to 80. ] [In the formula, Ar 4 represents a tetravalent aromatic group, R 1 and R 2 represent a hydrogen atom, a halogen atom, or an alkyl group, and at least one of R 1 and R 2 is always an alkyl group. Moreover, m represents a positive integer. 2. The curable resin composition according to claim 1, which also contains a Lewis acid compound consisting of a novolak type phenol resin and/or a novolak type cresol resin as a curing agent. 3. The curable resin composition according to claim 1 or 2, wherein the epoxy resin contains a brominated epoxy resin, and the amount thereof is 6% by weight or more in terms of bromine atom content in the total solid content.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12864288A JPH01299817A (en) | 1988-05-26 | 1988-05-26 | Curable resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12864288A JPH01299817A (en) | 1988-05-26 | 1988-05-26 | Curable resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01299817A JPH01299817A (en) | 1989-12-04 |
JPH0470329B2 true JPH0470329B2 (en) | 1992-11-10 |
Family
ID=14989869
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12864288A Granted JPH01299817A (en) | 1988-05-26 | 1988-05-26 | Curable resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01299817A (en) |
-
1988
- 1988-05-26 JP JP12864288A patent/JPH01299817A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH01299817A (en) | 1989-12-04 |
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