JPH0469809B2 - - Google Patents

Info

Publication number
JPH0469809B2
JPH0469809B2 JP61087185A JP8718586A JPH0469809B2 JP H0469809 B2 JPH0469809 B2 JP H0469809B2 JP 61087185 A JP61087185 A JP 61087185A JP 8718586 A JP8718586 A JP 8718586A JP H0469809 B2 JPH0469809 B2 JP H0469809B2
Authority
JP
Japan
Prior art keywords
cluster
compound semiconductor
crucibles
ionization
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61087185A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62244122A (ja
Inventor
Hiromoto Ito
Yasuki Kuze
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8718586A priority Critical patent/JPS62244122A/ja
Publication of JPS62244122A publication Critical patent/JPS62244122A/ja
Publication of JPH0469809B2 publication Critical patent/JPH0469809B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP8718586A 1986-04-17 1986-04-17 化合物半導体薄膜の製造装置 Granted JPS62244122A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8718586A JPS62244122A (ja) 1986-04-17 1986-04-17 化合物半導体薄膜の製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8718586A JPS62244122A (ja) 1986-04-17 1986-04-17 化合物半導体薄膜の製造装置

Publications (2)

Publication Number Publication Date
JPS62244122A JPS62244122A (ja) 1987-10-24
JPH0469809B2 true JPH0469809B2 (en, 2012) 1992-11-09

Family

ID=13907927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8718586A Granted JPS62244122A (ja) 1986-04-17 1986-04-17 化合物半導体薄膜の製造装置

Country Status (1)

Country Link
JP (1) JPS62244122A (en, 2012)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0748669Y2 (ja) * 1989-08-28 1995-11-08 日新電機株式会社 分子線セル
JPH03245523A (ja) * 1990-02-22 1991-11-01 Mitsubishi Electric Corp 量子井戸構造の製造方法
JP5614810B2 (ja) * 2011-04-25 2014-10-29 日本電信電話株式会社 注入方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4898775A (en, 2012) * 1972-03-28 1973-12-14
JPS5211786A (en) * 1975-07-18 1977-01-28 Futaba Corp Method of manufacturing p-m junction type solar battery
JPS5462776A (en) * 1977-10-27 1979-05-21 Nec Corp Production of compound semiconductor thin films
JPS5625772A (en) * 1979-08-09 1981-03-12 Mieko Kiyozawa Toy for training wearing of cloth for infant

Also Published As

Publication number Publication date
JPS62244122A (ja) 1987-10-24

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