JPH0465525B2 - - Google Patents

Info

Publication number
JPH0465525B2
JPH0465525B2 JP58106173A JP10617383A JPH0465525B2 JP H0465525 B2 JPH0465525 B2 JP H0465525B2 JP 58106173 A JP58106173 A JP 58106173A JP 10617383 A JP10617383 A JP 10617383A JP H0465525 B2 JPH0465525 B2 JP H0465525B2
Authority
JP
Japan
Prior art keywords
resist
temperature
cooling
substrate
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58106173A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59231814A (ja
Inventor
Kei Kirita
Yoshihide Kato
Toshiaki Shinozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58106173A priority Critical patent/JPS59231814A/ja
Publication of JPS59231814A publication Critical patent/JPS59231814A/ja
Publication of JPH0465525B2 publication Critical patent/JPH0465525B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58106173A 1983-06-14 1983-06-14 レジストパタ−ン形成方法及びレジスト処理装置 Granted JPS59231814A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58106173A JPS59231814A (ja) 1983-06-14 1983-06-14 レジストパタ−ン形成方法及びレジスト処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58106173A JPS59231814A (ja) 1983-06-14 1983-06-14 レジストパタ−ン形成方法及びレジスト処理装置

Publications (2)

Publication Number Publication Date
JPS59231814A JPS59231814A (ja) 1984-12-26
JPH0465525B2 true JPH0465525B2 (show.php) 1992-10-20

Family

ID=14426856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58106173A Granted JPS59231814A (ja) 1983-06-14 1983-06-14 レジストパタ−ン形成方法及びレジスト処理装置

Country Status (1)

Country Link
JP (1) JPS59231814A (show.php)

Also Published As

Publication number Publication date
JPS59231814A (ja) 1984-12-26

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