JPH0465150A - Stripping apparatus for protective film of semiconductor device - Google Patents
Stripping apparatus for protective film of semiconductor deviceInfo
- Publication number
- JPH0465150A JPH0465150A JP2178149A JP17814990A JPH0465150A JP H0465150 A JPH0465150 A JP H0465150A JP 2178149 A JP2178149 A JP 2178149A JP 17814990 A JP17814990 A JP 17814990A JP H0465150 A JPH0465150 A JP H0465150A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- protective film
- guide
- support member
- adhesive tape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 52
- 230000001681 protective effect Effects 0.000 title claims abstract description 20
- 230000001154 acute effect Effects 0.000 claims abstract description 3
- 235000012431 wafers Nutrition 0.000 claims description 45
- 239000002390 adhesive tape Substances 0.000 claims description 16
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 16
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- SGTNSNPWRIOYBX-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-{[2-(3,4-dimethoxyphenyl)ethyl](methyl)amino}-2-(propan-2-yl)pentanenitrile Chemical compound C1=C(OC)C(OC)=CC=C1CCN(C)CCCC(C#N)(C(C)C)C1=CC=C(OC)C(OC)=C1 SGTNSNPWRIOYBX-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は一般には半導体デバイス製作ラインに係るもの
であり、具体的には半導体ウェハーからその保護膜を剥
離するための装置に係るものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates generally to semiconductor device manufacturing lines, and specifically to an apparatus for stripping a protective film from a semiconductor wafer.
従来の技術
半導体ウェハー(0,2乃至0.25ミリ厚)はそのま
までは脆いので取り扱いの際に損壊しないように半導体
ウェハーの一面にビニール等の保護膜を付着させ、他面
には台紙を付着させている。半導体ウェハーを加工する
には先ず保護膜を剥離する必要がある。ビニール保護膜
を人が指先で半導体ウェハーから引き剥がすのでは時間
と手間がかかり、その上半導体デバイスラインの完全自
動化も妨げる。そこで本発明者は第2図に示すような半
導体ウェハーの保護膜剥離装置を提案した。この半導体
ウニバーの保護膜剥離装置は、一面に保護膜9を付着し
た半導体ウェハー8を一方向に連続して給送する半導体
ウェハー給送装置と、半導体ウェハーの給送路に沿って
接着テープを配置する上流側の案内ピン4、案内ローラ
5と下流側の案内ローラ6と、給送されてくる半導体ウ
ェハーの前記の一面に接着テープの接着面を句けて接着
テープを前記の給送路に沿って半導体ウェハーの給送方
向と同じ方向に給送する接着テープ駆動手段、すなわち
接着テープロール1を取りつけた被動ローラ2と、接着
テープロールを巻き取る駆動ローラ3と、上流側の案内
ローラ5の下に配置され、半導体ウェハーの前記の一面
を前記の接着テープの接着面に押圧する支持部材10と
を備えている。半導体ウェハー給送装置は半導体ウェハ
ーの幅よりも狭い間隔で配置され、半導体ウェハーの送
り方向に駆動される二本のロープを含み、このロープは
支持部材10の両側に沿って延びている。下流側で緊張
ローラ7を配置して、接着テープを緊張させている。Conventional technology Semiconductor wafers (0.2 to 0.25 mm thick) are fragile as they are, so to prevent damage during handling, a protective film such as vinyl is attached to one side of the semiconductor wafer, and a mount is attached to the other side. I'm letting you do it. To process a semiconductor wafer, it is first necessary to peel off the protective film. Peeling the vinyl protective film off the semiconductor wafer with one's fingertips is time-consuming and labor-intensive, and also prevents the full automation of semiconductor device lines. Therefore, the present inventor proposed a protective film stripping apparatus for semiconductor wafers as shown in FIG. Semiconductor Univer's protective film peeling device consists of a semiconductor wafer feeding device that continuously feeds a semiconductor wafer 8 with a protective film 9 attached to one side in one direction, and an adhesive tape that is attached along the semiconductor wafer feeding path. The upstream guide pins 4 and guide rollers 5 and the downstream guide rollers 6 to be arranged and the adhesive surface of the adhesive tape are separated from the one surface of the semiconductor wafer being fed, and the adhesive tape is applied to the feeding path. An adhesive tape driving means for feeding the semiconductor wafer in the same direction as the semiconductor wafer feeding direction, namely, a driven roller 2 to which an adhesive tape roll 1 is attached, a driving roller 3 for winding up the adhesive tape roll, and an upstream guide roller. 5, and a support member 10 that presses the one surface of the semiconductor wafer against the adhesive surface of the adhesive tape. The semiconductor wafer feeding device includes two ropes arranged at a spacing narrower than the width of the semiconductor wafer and driven in the direction of feeding the semiconductor wafer, the ropes extending along both sides of the support member 10. A tensioning roller 7 is arranged downstream to tension the adhesive tape.
動作について説明する。上流側から送られて来た半導体
ウェハー8は支持部材10と案内ローラ5との間に入っ
て保護膜9を接着テープの接着面に押しつけ、保護膜9
をテープの接着面に接着する。接着テープは下方側の案
内ローラ6で給送方向を転じ、そのとき半導体ウェハー
8から保護膜9を引き剥がす。The operation will be explained. The semiconductor wafer 8 sent from the upstream side enters between the support member 10 and the guide roller 5 and presses the protective film 9 against the adhesive surface of the adhesive tape.
Adhere to the adhesive side of the tape. The feeding direction of the adhesive tape is changed by the guide roller 6 on the lower side, and the protective film 9 is peeled off from the semiconductor wafer 8 at this time.
発明が解決しようとする問題点
この自動剥離装置は半導体ウェハー8から保護膜9を完
全に引き剥がすが、保護膜9が半導体ウェハーから離れ
ていく案内ローラ6の下流側の縁で半導体ウェハーを割
ってしまうことがある。又、支持部材10の上にロープ
がのってしまうことがあり、そのため半導体ウェハーの
膜をテープの接着面に完全に押圧できず、下流での引き
剥がし動作に支障を来すことがあった。Problems to be Solved by the Invention This automatic peeling device completely peels off the protective film 9 from the semiconductor wafer 8, but the protective film 9 breaks the semiconductor wafer at the downstream edge of the guide roller 6 where it separates from the semiconductor wafer. Sometimes it happens. In addition, the rope may sometimes rest on the support member 10, making it impossible to completely press the film of the semiconductor wafer against the adhesive surface of the tape, which may impede downstream peeling operations. .
本発明の目的は半導体ウェハーを割るという可能性を全
く排除して、半導体ウェハーからその保護膜を自動的に
剥離する装置を提供することである。この目的は本発明
に従って、下流側の案内ローラの代わりに、半導体ウェ
ハーの前記の一面に接する平面とこの平面に対し鋭角を
なして延びる面とを有する案内部材11を設ける。It is an object of the present invention to provide an apparatus for automatically stripping a semiconductor wafer of its protective film, completely eliminating the possibility of breaking the semiconductor wafer. This purpose is achieved according to the invention by providing, in place of the downstream guide roller, a guide member 11 which has a plane tangent to said one side of the semiconductor wafer and a plane extending at an acute angle to this plane.
作用
従来の案内ローラの場合は保護膜9が半導体ウェハーか
ら離れていく処で案内ローラ6は半導体ウェハーとロー
ラの母線の一線と接触して強い力が半導体ウェハーに働
き、それを割ってしまう。In the case of the conventional guide roller, when the protective film 9 separates from the semiconductor wafer, the guide roller 6 comes into contact with the line between the semiconductor wafer and the roller generatrix, and a strong force acts on the semiconductor wafer, breaking it.
本発明では下流側の案内ローラの代わりに、断面が三角
形の案内部材を使用し、この部材の広い底面を半導体ウ
ェハーに接するように配置して強い力が半導体ウェハー
に働かないようにして、半導体ウェハーを割ってしまう
という事態を完全に排除したのである。In the present invention, instead of the downstream guide roller, a guide member with a triangular cross section is used, and the wide bottom of this member is placed in contact with the semiconductor wafer to prevent strong force from acting on the semiconductor wafer. This completely eliminates the possibility of breaking the wafer.
また、支持部材10の上にロープがのってしまうという
事態はロープを支持部材から離してその下に配置すると
いうことによって完全に回避できる。Furthermore, the situation where the rope rests on the support member 10 can be completely avoided by separating the rope from the support member and placing it below it.
実施例 以下に第1図を参照して本発明の詳細な説明する。Example The present invention will be described in detail below with reference to FIG.
第2図と同じ部分については第1図でも同じ参照番号を
付し、その説明を省略する。第2図の従来装置との相違
点は支持部材10の下にこれから離して設けた案内ロー
ラ12と、下流側の案内部材11である。The same parts as in FIG. 2 are given the same reference numerals in FIG. 1, and their explanations will be omitted. The difference from the conventional device shown in FIG. 2 is a guide roller 12 provided below the support member 10 and separated therefrom, and a guide member 11 on the downstream side.
この案内部材は断面が三角形の三角柱体であり、この三
角柱体の広い底面を半導体ウェハーに接するように配置
して保護膜9を引き剥がすときに半導体ウェハーに働く
力がその面に渡って分散するようにして、強い力が半導
体ウェハーにかからないようにし、半導体ウェハーを割
ってしまうということがないようにする。This guide member is a triangular prism with a triangular cross section, and the wide bottom surface of this triangular prism is arranged so as to be in contact with the semiconductor wafer, so that the force acting on the semiconductor wafer when peeling off the protective film 9 is dispersed over that surface. In this way, strong force is not applied to the semiconductor wafer, and the semiconductor wafer is prevented from being broken.
また、案内ローラ12によってロープを支持部材から離
し、支持部材10の上にロープがのってしまうというこ
とがないようにしている。Further, the guide roller 12 separates the rope from the support member to prevent the rope from resting on the support member 10.
第1図は本発明の実施例を示す略図である。
第2図は従来の半導体薄膜剥離装!を示す略図である。
図中、1は接着テープローノベ 2は被動ローラ、3は
駆動ローラ、4は案内ビン、5と6は案内ローラ、7は
緊張ローラ、8は単導体ウェハー 9は保護膜、10は
支持部材、11は案内部材そして12は案内ローラであ
る。FIG. 1 is a schematic diagram showing an embodiment of the invention. Figure 2 shows a conventional semiconductor thin film stripping system! FIG. In the figure, 1 is an adhesive tape row novel, 2 is a driven roller, 3 is a driving roller, 4 is a guide bottle, 5 and 6 are guide rollers, 7 is a tension roller, 8 is a single conductor wafer, 9 is a protective film, 10 is a support member, 11 is a guide member and 12 is a guide roller.
Claims (1)
連続して給送する半導体ウェハー給送装置、 半導体ウェハーの給送路に沿って接着テープを配置する
上流側の案内手段と下流側の案内手段、 給送されて来る半導体ウェハーの前記の一面に接着テー
プの接着面を向けて接着テープを前記の給送路に沿って
半導体ウェハーの給送方向と同じ方向に給送する接着テ
ープ駆動手段、及び 前記の上流側の案内手段に、もしくは上流側の案内手段
と下流側の案内手段との間に配置され、半導体ウェハー
の前記の一面を前記の接着テープの接着面に押圧する支
持部材 を備え、前記の下流側の案内手段は、半導体ウェハーの
前記の一面に接する平面とこの平面に対し鋭角をなして
延びる面とを有する案内部材であることを特徴とする半
導体ウェハーの保護膜剥離装置。 2、半導体ウェハー給送装置は、二本の平行にのびる線
状体とこれらの線状体を一方向に送る駆動手段と、線状
体の案内ロールとを含み、案内ロールは支持部材の下に
配置されて、支持部材から離して線状体を案内するよう
にした請求項1に記載の半導体ウェハーの保護膜剥離装
置。[Claims] 1. A semiconductor wafer feeding device that continuously feeds semiconductor wafers with a protective film attached to one side in one direction; A guiding means and a downstream guiding means, the adhesive tape is directed along the feeding path in the same direction as the feeding direction of the semiconductor wafer, with the adhesive surface of the adhesive tape facing the one side of the semiconductor wafer being fed. An adhesive tape driving means for feeding and disposed at the upstream guiding means or between the upstream guiding means and the downstream guiding means, the driving means for driving the adhesive tape to adhere the one side of the semiconductor wafer to the adhesive tape. The downstream guide means is characterized in that it includes a support member that presses against the surface, and the downstream guide means is a guide member that has a plane that is in contact with the one surface of the semiconductor wafer and a surface that extends at an acute angle with respect to the plane. Protective film stripping equipment for semiconductor wafers. 2. The semiconductor wafer feeding device includes two linear bodies extending in parallel, a driving means for feeding these linear bodies in one direction, and a guide roll for the linear bodies, and the guide roll is placed under the support member. 2. The device for removing a protective film on a semiconductor wafer according to claim 1, wherein the device is arranged to guide the linear body away from the support member.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17814990A JPH0770584B2 (en) | 1990-07-05 | 1990-07-05 | Protective film peeling device for semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17814990A JPH0770584B2 (en) | 1990-07-05 | 1990-07-05 | Protective film peeling device for semiconductor wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0465150A true JPH0465150A (en) | 1992-03-02 |
JPH0770584B2 JPH0770584B2 (en) | 1995-07-31 |
Family
ID=16043496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17814990A Expired - Lifetime JPH0770584B2 (en) | 1990-07-05 | 1990-07-05 | Protective film peeling device for semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0770584B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010044604A (en) * | 2001-03-09 | 2001-06-05 | 한효용 | cover-film detaching apparatus |
JP2010028063A (en) * | 2008-07-24 | 2010-02-04 | Lintec Corp | Sheet peeling device and method |
JP2010029857A (en) * | 2009-09-28 | 2010-02-12 | San-Ei Faucet Mfg Co Ltd | Sprinkler nozzle |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6393641U (en) * | 1986-12-05 | 1988-06-17 | ||
JPH01125947A (en) * | 1987-11-11 | 1989-05-18 | Ryoji Wakabayashi | Protective film exfoliating device for semiconductor wafer |
-
1990
- 1990-07-05 JP JP17814990A patent/JPH0770584B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6393641U (en) * | 1986-12-05 | 1988-06-17 | ||
JPH01125947A (en) * | 1987-11-11 | 1989-05-18 | Ryoji Wakabayashi | Protective film exfoliating device for semiconductor wafer |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010044604A (en) * | 2001-03-09 | 2001-06-05 | 한효용 | cover-film detaching apparatus |
JP2010028063A (en) * | 2008-07-24 | 2010-02-04 | Lintec Corp | Sheet peeling device and method |
JP2010029857A (en) * | 2009-09-28 | 2010-02-12 | San-Ei Faucet Mfg Co Ltd | Sprinkler nozzle |
Also Published As
Publication number | Publication date |
---|---|
JPH0770584B2 (en) | 1995-07-31 |
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