JPH0461330B2 - - Google Patents
Info
- Publication number
- JPH0461330B2 JPH0461330B2 JP61138555A JP13855586A JPH0461330B2 JP H0461330 B2 JPH0461330 B2 JP H0461330B2 JP 61138555 A JP61138555 A JP 61138555A JP 13855586 A JP13855586 A JP 13855586A JP H0461330 B2 JPH0461330 B2 JP H0461330B2
- Authority
- JP
- Japan
- Prior art keywords
- integrator
- light
- excimer
- light source
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 12
- 230000005855 radiation Effects 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61138555A JPS62294202A (ja) | 1986-06-13 | 1986-06-13 | インテグレ−タ−およびそれを用いた露光装置 |
US07/061,266 US4841341A (en) | 1986-06-13 | 1987-06-12 | Integrator for an exposure apparatus or the like |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61138555A JPS62294202A (ja) | 1986-06-13 | 1986-06-13 | インテグレ−タ−およびそれを用いた露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62294202A JPS62294202A (ja) | 1987-12-21 |
JPH0461330B2 true JPH0461330B2 (enrdf_load_stackoverflow) | 1992-09-30 |
Family
ID=15224880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61138555A Granted JPS62294202A (ja) | 1986-06-13 | 1986-06-13 | インテグレ−タ−およびそれを用いた露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62294202A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3627355B2 (ja) * | 1996-02-22 | 2005-03-09 | ソニー株式会社 | スキャン式露光装置 |
DE102011008192A1 (de) * | 2011-01-10 | 2012-07-12 | Limo Patentverwaltung Gmbh & Co. Kg | Vorrichtung zur Umwandlung von Laserstrahlung in Laserstahlung mit einem M-Profil |
CN104136163B (zh) * | 2012-02-10 | 2016-02-03 | Limo专利管理有限及两合公司 | 用于对工件的表面进行激光加工或者用于对工件外侧面或内侧面上的涂层进行后处理的设备 |
-
1986
- 1986-06-13 JP JP61138555A patent/JPS62294202A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62294202A (ja) | 1987-12-21 |
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