JPH0460557U - - Google Patents

Info

Publication number
JPH0460557U
JPH0460557U JP10342690U JP10342690U JPH0460557U JP H0460557 U JPH0460557 U JP H0460557U JP 10342690 U JP10342690 U JP 10342690U JP 10342690 U JP10342690 U JP 10342690U JP H0460557 U JPH0460557 U JP H0460557U
Authority
JP
Japan
Prior art keywords
valve
ring
cooling
cooling passage
provided along
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10342690U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10342690U priority Critical patent/JPH0460557U/ja
Publication of JPH0460557U publication Critical patent/JPH0460557U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】
第１図は本考案に係るゲートバルブの１例を示
す正面図、第２図は同前側断面図、第３図は横型
ＣＶＤ装置の概略説明図、第４図は従来のゲート
バルブの概略正面図、第５図は同前概略側断面図
である。 ２０は弁箱、２３は弁棒、２７は弁体、２８は
Ｏリング、２９は冷却路、３９は冷却水路を示す
。

Claims (1)

    【実用新案登録請求の範囲】
  1. 弁体を収納する弁箱の弁孔の周囲にＯリングを
    設けると共にＯリングに沿つて冷却流路を設け、
    弁体のＯリング接触面に沿つて冷却路を設け、前
    記冷却流路及び該冷却路に冷却媒体を流通させる
    様構成したことを特徴とする高温室用ゲートバル
    ブ。
JP10342690U 1990-10-01 1990-10-01 Pending JPH0460557U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10342690U JPH0460557U (ja) 1990-10-01 1990-10-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10342690U JPH0460557U (ja) 1990-10-01 1990-10-01

Publications (1)

Publication Number Publication Date
JPH0460557U true JPH0460557U (ja) 1992-05-25

Family

ID=31848295

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10342690U Pending JPH0460557U (ja) 1990-10-01 1990-10-01

Country Status (1)

Country Link
JP (1) JPH0460557U (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003535290A (ja) * 2000-05-30 2003-11-25 ポール・ワース・ソシエテ・アノニム 材料充填または排出ロックのための気密遮断弁
JP2012233564A (ja) * 2011-04-19 2012-11-29 Smc Corp ゲートバルブ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6431975A (en) * 1987-07-27 1989-02-02 Matsushita Electronics Corp Reduced-pressure cvd device
JPH02143526A (ja) * 1988-11-25 1990-06-01 Fujitsu Ltd 半導体装置の成長膜形成炉
JPH0320188A (ja) * 1989-06-16 1991-01-29 Hitachi Ltd ゲートバルブ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6431975A (en) * 1987-07-27 1989-02-02 Matsushita Electronics Corp Reduced-pressure cvd device
JPH02143526A (ja) * 1988-11-25 1990-06-01 Fujitsu Ltd 半導体装置の成長膜形成炉
JPH0320188A (ja) * 1989-06-16 1991-01-29 Hitachi Ltd ゲートバルブ

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003535290A (ja) * 2000-05-30 2003-11-25 ポール・ワース・ソシエテ・アノニム 材料充填または排出ロックのための気密遮断弁
JP2012233564A (ja) * 2011-04-19 2012-11-29 Smc Corp ゲートバルブ

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