JPH0460552U - - Google Patents

Info

Publication number
JPH0460552U
JPH0460552U JP10240890U JP10240890U JPH0460552U JP H0460552 U JPH0460552 U JP H0460552U JP 10240890 U JP10240890 U JP 10240890U JP 10240890 U JP10240890 U JP 10240890U JP H0460552 U JPH0460552 U JP H0460552U
Authority
JP
Japan
Prior art keywords
holder
forming apparatus
film forming
vacuum film
recess
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10240890U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10240890U priority Critical patent/JPH0460552U/ja
Publication of JPH0460552U publication Critical patent/JPH0460552U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP10240890U 1990-09-28 1990-09-28 Pending JPH0460552U (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10240890U JPH0460552U (zh) 1990-09-28 1990-09-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10240890U JPH0460552U (zh) 1990-09-28 1990-09-28

Publications (1)

Publication Number Publication Date
JPH0460552U true JPH0460552U (zh) 1992-05-25

Family

ID=31846639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10240890U Pending JPH0460552U (zh) 1990-09-28 1990-09-28

Country Status (1)

Country Link
JP (1) JPH0460552U (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002508587A (ja) * 1998-03-26 2002-03-19 アプライド マテリアルズ インコーポレイテッド 高温多層合金ヒータアッセンブリ及び関連する方法
JP2009144224A (ja) * 2007-12-17 2009-07-02 Kochi Prefecture Sangyo Shinko Center 成膜装置及び成膜方法
JP2009155689A (ja) * 2007-12-26 2009-07-16 Kochi Prefecture Sangyo Shinko Center 成膜装置及び成膜方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002508587A (ja) * 1998-03-26 2002-03-19 アプライド マテリアルズ インコーポレイテッド 高温多層合金ヒータアッセンブリ及び関連する方法
JP4723086B2 (ja) * 1998-03-26 2011-07-13 アプライド マテリアルズ インコーポレイテッド 高温多層合金ヒータアッセンブリ及び関連する方法
JP2009144224A (ja) * 2007-12-17 2009-07-02 Kochi Prefecture Sangyo Shinko Center 成膜装置及び成膜方法
JP4533925B2 (ja) * 2007-12-17 2010-09-01 財団法人高知県産業振興センター 成膜装置及び成膜方法
JP2009155689A (ja) * 2007-12-26 2009-07-16 Kochi Prefecture Sangyo Shinko Center 成膜装置及び成膜方法
JP4533926B2 (ja) * 2007-12-26 2010-09-01 財団法人高知県産業振興センター 成膜装置及び成膜方法
US8307782B2 (en) 2007-12-26 2012-11-13 Kochi Industrial Promotion Center Deposition apparatus and deposition method

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