JPH0460552U - - Google Patents
Info
- Publication number
- JPH0460552U JPH0460552U JP10240890U JP10240890U JPH0460552U JP H0460552 U JPH0460552 U JP H0460552U JP 10240890 U JP10240890 U JP 10240890U JP 10240890 U JP10240890 U JP 10240890U JP H0460552 U JPH0460552 U JP H0460552U
- Authority
- JP
- Japan
- Prior art keywords
- holder
- forming apparatus
- film forming
- vacuum film
- recess
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002791 soaking Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10240890U JPH0460552U (me) | 1990-09-28 | 1990-09-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10240890U JPH0460552U (me) | 1990-09-28 | 1990-09-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0460552U true JPH0460552U (me) | 1992-05-25 |
Family
ID=31846639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10240890U Pending JPH0460552U (me) | 1990-09-28 | 1990-09-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0460552U (me) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002508587A (ja) * | 1998-03-26 | 2002-03-19 | アプライド マテリアルズ インコーポレイテッド | 高温多層合金ヒータアッセンブリ及び関連する方法 |
| JP2009144224A (ja) * | 2007-12-17 | 2009-07-02 | Kochi Prefecture Sangyo Shinko Center | 成膜装置及び成膜方法 |
| JP2009155689A (ja) * | 2007-12-26 | 2009-07-16 | Kochi Prefecture Sangyo Shinko Center | 成膜装置及び成膜方法 |
-
1990
- 1990-09-28 JP JP10240890U patent/JPH0460552U/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002508587A (ja) * | 1998-03-26 | 2002-03-19 | アプライド マテリアルズ インコーポレイテッド | 高温多層合金ヒータアッセンブリ及び関連する方法 |
| JP4723086B2 (ja) * | 1998-03-26 | 2011-07-13 | アプライド マテリアルズ インコーポレイテッド | 高温多層合金ヒータアッセンブリ及び関連する方法 |
| JP2009144224A (ja) * | 2007-12-17 | 2009-07-02 | Kochi Prefecture Sangyo Shinko Center | 成膜装置及び成膜方法 |
| JP4533925B2 (ja) * | 2007-12-17 | 2010-09-01 | 財団法人高知県産業振興センター | 成膜装置及び成膜方法 |
| JP2009155689A (ja) * | 2007-12-26 | 2009-07-16 | Kochi Prefecture Sangyo Shinko Center | 成膜装置及び成膜方法 |
| JP4533926B2 (ja) * | 2007-12-26 | 2010-09-01 | 財団法人高知県産業振興センター | 成膜装置及び成膜方法 |
| US8307782B2 (en) | 2007-12-26 | 2012-11-13 | Kochi Industrial Promotion Center | Deposition apparatus and deposition method |