JPH0457474B2 - - Google Patents

Info

Publication number
JPH0457474B2
JPH0457474B2 JP58178099A JP17809983A JPH0457474B2 JP H0457474 B2 JPH0457474 B2 JP H0457474B2 JP 58178099 A JP58178099 A JP 58178099A JP 17809983 A JP17809983 A JP 17809983A JP H0457474 B2 JPH0457474 B2 JP H0457474B2
Authority
JP
Japan
Prior art keywords
wafer
holding
rod
fulcrum
arm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58178099A
Other languages
Japanese (ja)
Other versions
JPS6072240A (en
Inventor
Hideo Nagashima
Tadao Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP17809983A priority Critical patent/JPS6072240A/en
Publication of JPS6072240A publication Critical patent/JPS6072240A/en
Publication of JPH0457474B2 publication Critical patent/JPH0457474B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Description

【発明の詳細な説明】 本発明は半導体のウエーハを保持するためのウ
エーハ保持具に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a wafer holder for holding a semiconductor wafer.

半導体ウエーハはエピタキシヤル成長等の工程
においてその半導体特性を損なわないように純度
維持を極めて慎重に行なつている。このため、ウ
エーハを載置するサセプターや、熱処理する炉体
や、洗滌するための水等の全てについて、高純度
品を使用している。また各工程間においてはピン
セツト等のウエーハ保持具を使用してウエーハを
つまんで運搬しているが、汚染防止のために、ウ
エーハに接触する部分をテフロン、石英ガラス、
炭化珪素、金属シリコン等で保護しているものが
使用されている。
The purity of semiconductor wafers is extremely carefully maintained during processes such as epitaxial growth so as not to impair their semiconductor properties. For this reason, high-purity products are used for all of the susceptor on which the wafer is placed, the furnace body for heat treatment, and the water for cleaning. Furthermore, between each process, wafer holders such as tweezers are used to pinch and transport the wafers, but to prevent contamination, the parts that come into contact with the wafers are covered with Teflon, quartz glass, etc.
Those protected with silicon carbide, metal silicon, etc. are used.

しかしながら、いずれのウエーハ保持具であつ
ても、接触部分は、ウエーハの表面の平面部にお
いて行なわれており、接触部分の面積が大きい。
However, in any of the wafer holders, the contact portion is made on a flat surface of the wafer, and the area of the contact portion is large.

また、ウエーハのエピタキシヤル成長面に接触
させないように、ウエーハの裏面に吸着するよう
な構造のウエーハ保持具を使用することもある
が、そのようなウエーハ保持具でも、サセプター
等から取上げることが困難であり、汚染され易
く、またキズがつき易い。
In addition, a wafer holder that is structured to stick to the back side of the wafer is sometimes used to prevent it from coming into contact with the epitaxial growth surface of the wafer, but even with such a wafer holder, it is difficult to pick it up from a susceptor, etc. It is easily contaminated and scratched.

したがつて、後の工程ではウエーハ保持具の使
用によるウエーハの汚染やキズが原因となる不良
が多く、歩留りが悪かつた。
Therefore, in the subsequent steps, there were many defects caused by contamination or scratches on the wafer due to the use of the wafer holder, resulting in poor yield.

本発明は上記欠点を解消するためになされたも
のであり、ウエーハの取扱いが容易でかつウエー
ハの表面と裏面の両方の平面部に何ら悪影響を及
ぼさないウエーハ保持具を提供することを目的と
しているものである。
The present invention has been made in order to eliminate the above-mentioned drawbacks, and an object of the present invention is to provide a wafer holder that allows easy handling of wafers and does not have any adverse effect on the flat surfaces of both the front and back surfaces of the wafer. It is something.

この目的を達成するために、本発明は、上下動
可能なロツドの周囲に支点を介して尾端を枢支さ
れた複数本の保持アームを備え、前記保持アーム
にはウエーハ保持状態の時に先端が水平位置より
も下向きになるように内向きにカギ形に形成され
たウエーハ保持部を有し、前記ウエーハ保持部を
3箇所以上でウエーハに当接せしめてウエーハを
保持する構成にし、前記ロツドと相対移動可能に
同軸に設けられたガイド又はシリンダの周囲に支
点を介して作動アームの尾端が枢支されており、
少なくとも1本の前記保持アームはその中間で支
点を介して前記作動アームの先端に枢支され、該
保持アームの作動アームの先端に枢支された支点
から下の部分は外向きに屈曲されていることを特
徴とするウエーハ保持具を要旨としている。
To achieve this object, the present invention includes a plurality of holding arms whose tail ends are pivotally supported via a fulcrum around a vertically movable rod. The rod has a wafer holding part formed inward in a key shape so that the rod faces downward from the horizontal position, and the wafer holding part is configured to hold the wafer by making contact with the wafer at three or more places, and the rod The tail end of the actuating arm is pivotally supported via a fulcrum around a guide or cylinder provided coaxially so as to be movable relative to the actuating arm,
The at least one holding arm is pivoted to the distal end of the actuating arm via a fulcrum in the middle thereof, and a portion of the holding arm below the fulcrum pivoted to the distal end of the actuating arm is bent outward. The gist is a wafer holder that is characterized by:

以下、図面を参照して、本発明の実施例を説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

まず、第1図の実施例を説明すれば、符号1は
ウエーハ保持具の下方部を示している。3本の保
持アーム3a,3b,3c、はその先端にウエー
ハ保持部9a,9b,9cをそれぞれ有する。ウ
エーハ保持部9a,9b,9cはウエーハWの周
縁部のみに接触し、ウエーハの平面部には何ら影
響を与えないようにし、先端が水平方向より下向
きになるように内向きにカギ形に形成されてお
り、ウエーハWの周縁部のみを3箇所で保持する
ものである。ウエーハ保持部9a,9b,9c
は、保持アーム3a,3b,3cの端部において
上記ウエーハ保持部先端の内向きカギ形部の向き
と逆方向にすなわち外向きに屈曲支持されてい
る。また、ウエーハ保持部9a,9b,9cは保
持アーム3a,3b,3cの本体と一体に構成し
てもよいし、別体に構成してもよいが、図示例で
は一体構造となつている。
First, the embodiment shown in FIG. 1 will be described. Reference numeral 1 indicates the lower part of the wafer holder. The three holding arms 3a, 3b, and 3c have wafer holding parts 9a, 9b, and 9c at their tips, respectively. The wafer holding parts 9a, 9b, and 9c contact only the peripheral edge of the wafer W, do not affect the flat surface of the wafer, and are formed inward in a hook shape so that the tips point downward from the horizontal direction. Only the peripheral edge of the wafer W is held at three locations. Wafer holding parts 9a, 9b, 9c
are bent and supported at the ends of the holding arms 3a, 3b, and 3c in a direction opposite to the direction of the inward hook-shaped portion at the tip of the wafer holding portion, that is, outward. Further, the wafer holding parts 9a, 9b, 9c may be constructed integrally with the main bodies of the holding arms 3a, 3b, 3c, or may be constructed separately, but in the illustrated example, they have an integral structure.

保持アーム3a,3b,3cの途中にはそれぞ
れ支点5a,5b,5cを介して作動アーム4
a,4b,4cの一端が枢支してある。作動アー
ム4a,4b,4cの他端はガイド2に支点7
a,7b、(3つのうち1つは図示せず)を介し
て枢支されている。
An operating arm 4 is connected in the middle of the holding arms 3a, 3b, 3c via fulcrums 5a, 5b, 5c, respectively.
One ends of a, 4b, and 4c are pivotally supported. The other ends of the operating arms 4a, 4b, 4c are attached to the guide 2 at a fulcrum 7.
a, 7b, (one of the three not shown).

ロツド8はガイド2の中を通つていて、相対移
動可能となつている。ロツド8の下端8aには3
本の保持アーム3a,3b,3cの尾端が支点6
a,6b(3つのうち1つは図示せず)を介して
枢支してある。図示してないが、ロツド8の上端
はエアシリンダ等の駆動手段に連結してある。
The rod 8 passes through the guide 2 and is relatively movable. 3 at the lower end 8a of the rod 8.
The tail end of the book holding arms 3a, 3b, 3c is the fulcrum 6
a, 6b (one of the three is not shown). Although not shown, the upper end of the rod 8 is connected to a driving means such as an air cylinder.

ウエーハ保持具1の材質はウエーハWを汚染し
ないように、また洗滌液に犯されないように、ま
た高温で機械的・化学的に安定させるように、石
英ガラス、炭化珪素、窒化珪素、金属シリコン、
高純度で緻密な窒化珪素でコーテイングされた石
英ガラス、さらにその上をテフロンでコーテイン
グされたもの、テフロンでコーテイングされた石
英ガラス、テフロンコーテイングされた金属高純
度アルミナ磁器(例えば東芝セラミツクス社製品
TPA)等が好ましいが、高価になるので、ウエ
ーハW及び洗滌液に触れるウエーハ保持部9
(a,b,c)だけをこのような材質にしてもよ
い。
The material of the wafer holder 1 is quartz glass, silicon carbide, silicon nitride, metallic silicon, etc. so as not to contaminate the wafer W, prevent it from being attacked by cleaning liquid, and be mechanically and chemically stable at high temperatures.
Quartz glass coated with high-purity and dense silicon nitride, silica glass coated with Teflon, metal high-purity alumina porcelain coated with Teflon (e.g. products made by Toshiba Ceramics)
TPA) etc. are preferable, but since they are expensive, the wafer holding part 9 that comes into contact with the wafer W and cleaning solution
Only (a, b, c) may be made of such a material.

ガイド2を固定し、そのガイド2に沿つてロツ
ド8を図において上下方向に移動させるようにな
つている。10は戻りバネを示す。
The guide 2 is fixed, and the rod 8 is moved along the guide 2 in the vertical direction in the figure. 10 indicates a return spring.

エアシリンダ等の駆動手段によりガイド2に沿
つてロツド8を矢印A又はBの方向に摺動させる
と、各支点5,6,7及び作動アーム4を介して
3本の保持アーム3(a,b,c)が第2図に示
すように同じ度合で開いたり閉じたりして動く。
When the rod 8 is slid in the direction of arrow A or B along the guide 2 by a driving means such as an air cylinder, the three holding arms 3 (a, b and c) open and close at the same degree as shown in Figure 2.

ウエーハWをつまむ場合は、ロツド8を矢印B
の方向に摺動させ、保持アーム3(a,b,c)
をウエーハWの径より大きく開かせる。ついでロ
ツド8を矢印Aの方向に徐々に摺動させて、保持
アーム3(a,b,c)をつぼめながら、ウエー
ハ保持部9(a,b,c)をウエーハWの周縁部
に接触させて、第3図に示すようにウエーハ保持
部9(a,b,c)のカギ形の部分でウエーハの
上下平面部に接触しないように保持し、ウエーハ
Wを定位置(図示せず)に移動させる。
When pinching wafer W, move rod 8 to arrow B
Slide the holding arm 3 (a, b, c) in the direction of
is opened larger than the diameter of the wafer W. Next, the rod 8 is gradually slid in the direction of the arrow A, and the wafer holding part 9 (a, b, c) is brought into contact with the peripheral edge of the wafer W while the holding arm 3 (a, b, c) is collapsed. Then, as shown in FIG. 3, hold the wafer W in a fixed position (not shown) by holding the wafer W with the key-shaped parts of the wafer holder 9 (a, b, c) so as not to touch the upper and lower flat parts of the wafer. move it.

第4図は別の実施例を示す。この実施例にあつ
ては、ロツド8が固定してあり、そのロツド8に
沿つてガイド2が上下方向に移動できるようにな
つている。図示していないが、ガイド2はエアシ
リンダ等の駆動手段により移動されるようになつ
ている。
FIG. 4 shows another embodiment. In this embodiment, the rod 8 is fixed, and the guide 2 can move vertically along the rod 8. Although not shown, the guide 2 is adapted to be moved by a driving means such as an air cylinder.

また、3本のうち1本を例にとつて説明すれ
ば、保持アーム3の先端には連結部材11により
ウエーハ保持部9が固定されている。このウエー
ハ保持部9は図からも明らかなようにこれ自体湾
曲した構造を有しており、実質上、保持アーム3
の作動アーム4の先端に枢支された支点から下の
部分が外向きに屈曲された構成を成している。
Further, to explain one of the three arms as an example, a wafer holding part 9 is fixed to the tip of the holding arm 3 by a connecting member 11. As is clear from the figure, this wafer holding section 9 itself has a curved structure, and substantially the holding arm 3
The lower portion of the actuating arm 4 is bent outward from a fulcrum pivotally supported at the tip thereof.

ウエーハ保持部9は第5図に示すようにウエー
ハWを保持する先端部がカギ形になつている。
As shown in FIG. 5, the wafer holding section 9 has a key-shaped tip for holding the wafer W.

図においては3本の保持アームを有するものに
ついて説明をしたが、アームの数は2本でもある
いは4本以上でもよい。3本の場合が3箇所支持
で安定して保持できるため好ましい。又、保持ア
ームのウエーハ保持部を二股に分けることによつ
て例えば保持アームが2本でも3箇所または4箇
所支持することができる。なお、本発明において
保持アームは必ずしもすべてシヤフトに枢支され
る必要はなく、例えば3本の保持アームのうち1
本はロツドに固定したものでもまつたく同様にウ
エーハを保持することができる。また、ガイド2
をシリンダとして使用し、ロツド8をピストンロ
ツドとして使用することもできる。
In the drawings, the explanation has been given of a device having three holding arms, but the number of arms may be two or four or more. The case of three is preferable because it can be stably held by supporting at three locations. Furthermore, by dividing the wafer holding portion of the holding arm into two, for example, even with two holding arms, the wafer can be supported at three or four locations. Note that in the present invention, all of the holding arms do not necessarily have to be pivotally supported by the shaft; for example, one of the three holding arms
A book fixed to a rod can also hold a wafer in the same way. Also, guide 2
It is also possible to use the rod 8 as a cylinder and the rod 8 as a piston rod.

本発明のウエーハ保持具は以上述べたようにウ
エーハの周縁部を少なくとも3箇所で接触して保
持する構造になつているので、ウエーハを汚染し
にくく、その表面にキズもつきにくい。さらにウ
エーハの移動中も安定しており、落ちることがな
い。とくに、保持アームのウエーハ保持部をカギ
形に構成すると、ウエーハとの接触部がウエーハ
端面の角あるいは面取り部の角と微小接触するこ
とになり、ウエーハに対する影響が極端に少なく
なる。
As described above, the wafer holder of the present invention has a structure in which the peripheral edge of the wafer is held in contact with at least three points, so that the wafer is less likely to be contaminated and its surface is less likely to be scratched. Furthermore, the wafer is stable during movement and will not fall. In particular, if the wafer holding portion of the holding arm is configured in a hook shape, the contact portion with the wafer will make minute contact with the corner of the wafer end face or the corner of the chamfered portion, and the influence on the wafer will be extremely reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明によるウエーハ保持具の一例を
示す概略正面図、第2図は第1図に示したウエー
ハ保持具の保持アームの動きを示す説明図、第3
図Aは第1図に示したウエーハ保持具の保持アー
ムのウエーハ保持部とウエーハとの接触状態を示
す図、第3図Bは第3図AのB−B線に沿つた断
面図、第3図Cは第3図AのC−C線に沿つた断
面図、第4図は本発明によるウエーハ保持具の他
の例を示す部分断面図、第5図は第4図に示した
ウエーハ保持具の保持アームのウエーハ保持部と
ウエーハとの接触関係を示す図である。 1……ウエーハ保持具、2……ガイド、3……
保持アーム、4……作動アーム、5……支点、6
……支点、7……支点、8……ロツド、9……ウ
エーハ保持部。
FIG. 1 is a schematic front view showing an example of a wafer holder according to the present invention, FIG. 2 is an explanatory view showing the movement of the holding arm of the wafer holder shown in FIG. 1, and FIG.
Figure A is a diagram showing the state of contact between the wafer holding part of the holding arm of the wafer holder shown in Figure 1 and the wafer, Figure 3B is a sectional view taken along line BB in Figure 3A, 3C is a sectional view taken along line C-C in FIG. 3A, FIG. 4 is a partial sectional view showing another example of the wafer holder according to the present invention, and FIG. 5 is a sectional view of the wafer shown in FIG. 4. FIG. 6 is a diagram showing a contact relationship between a wafer holding part of a holding arm of a holder and a wafer. 1... Wafer holder, 2... Guide, 3...
Holding arm, 4... Operating arm, 5... Fulcrum, 6
... fulcrum, 7... fulcrum, 8... rod, 9... wafer holding section.

Claims (1)

【特許請求の範囲】[Claims] 1 上下動可能なロツドの周囲に支点を介して尾
端を枢支された複数本の保持アームを備え、前記
保持アームにはウエーハ保持状態の時に先端が水
平位置よりも下向きになるように内向きにカギ形
に形成されたウエーハ保持部を有し、前記ウエー
ハ保持部を3箇所以上でウエーハに当接せしめて
ウエーハを保持する構成にし、前記ロツドと相対
移動可能に同軸に設けられたガイド又はシリンダ
の周囲に支点を介して作動アームの尾端が枢支さ
れており、少なくとも1本の前記保持アームはそ
の中間で支点を介して前記作動アームの先端に枢
支され、該保持アームの作動アームの先端に枢支
された支点から下の部分は外向きに屈曲されてい
ることを特徴とするウエーハ保持具。
1. A plurality of holding arms are provided around a vertically movable rod, the tail end of which is pivotally supported via a fulcrum, and the holding arm has an inner end so that the tip is directed downward from the horizontal position when the wafer is being held. The guide has a wafer holding part formed in a key shape in the direction of the rod, and is configured to hold the wafer by bringing the wafer holding part into contact with the wafer at three or more places, and is provided coaxially with the rod so as to be movable relative to the rod. Alternatively, the tail end of the actuating arm is pivotally supported around the cylinder via a fulcrum, and at least one of the holding arms is pivoted to the tip of the actuating arm via the fulcrum in the middle thereof, and the holding arm is A wafer holder characterized in that a portion below a fulcrum pivotally supported at the tip of an operating arm is bent outward.
JP17809983A 1983-09-28 1983-09-28 Wafer holder Granted JPS6072240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17809983A JPS6072240A (en) 1983-09-28 1983-09-28 Wafer holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17809983A JPS6072240A (en) 1983-09-28 1983-09-28 Wafer holder

Publications (2)

Publication Number Publication Date
JPS6072240A JPS6072240A (en) 1985-04-24
JPH0457474B2 true JPH0457474B2 (en) 1992-09-11

Family

ID=16042620

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17809983A Granted JPS6072240A (en) 1983-09-28 1983-09-28 Wafer holder

Country Status (1)

Country Link
JP (1) JPS6072240A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100958100B1 (en) 2008-05-27 2010-05-17 영진전문대학 산학협력단 Multi jig of multi point
CN103600954B (en) 2013-10-11 2015-10-07 京东方科技集团股份有限公司 A kind of mask plate handling fixture
JP2021039964A (en) * 2019-08-30 2021-03-11 株式会社ディスコ Wafer pincette

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4924852U (en) * 1972-06-10 1974-03-02

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5540208Y2 (en) * 1975-01-14 1980-09-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4924852U (en) * 1972-06-10 1974-03-02

Also Published As

Publication number Publication date
JPS6072240A (en) 1985-04-24

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