JPH0454577B2 - - Google Patents
Info
- Publication number
- JPH0454577B2 JPH0454577B2 JP59267749A JP26774984A JPH0454577B2 JP H0454577 B2 JPH0454577 B2 JP H0454577B2 JP 59267749 A JP59267749 A JP 59267749A JP 26774984 A JP26774984 A JP 26774984A JP H0454577 B2 JPH0454577 B2 JP H0454577B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- copper
- plate
- clad laminate
- metal core
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003822 epoxy resin Substances 0.000 claims description 72
- 229920000647 polyepoxide Polymers 0.000 claims description 72
- 229910052751 metal Inorganic materials 0.000 claims description 42
- 239000002184 metal Substances 0.000 claims description 42
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 27
- 229910052782 aluminium Inorganic materials 0.000 claims description 27
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 27
- 239000011889 copper foil Substances 0.000 claims description 16
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 13
- 238000005498 polishing Methods 0.000 claims description 13
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 239000010949 copper Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000004744 fabric Substances 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical group CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims description 5
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 4
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 claims description 2
- 229910000976 Electrical steel Inorganic materials 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 claims description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 claims description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 claims 1
- MZWXWSVCNSPBLH-UHFFFAOYSA-N 3-(3-aminopropyl-methoxy-methylsilyl)oxypropan-1-amine Chemical compound NCCC[Si](C)(OC)OCCCN MZWXWSVCNSPBLH-UHFFFAOYSA-N 0.000 claims 1
- 229910000831 Steel Inorganic materials 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- 239000010959 steel Substances 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 238000011282 treatment Methods 0.000 description 27
- 238000010521 absorption reaction Methods 0.000 description 19
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 239000000853 adhesive Substances 0.000 description 12
- 230000001070 adhesive effect Effects 0.000 description 12
- 238000005476 soldering Methods 0.000 description 12
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 11
- 238000009835 boiling Methods 0.000 description 9
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000007667 floating Methods 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 6
- 230000005856 abnormality Effects 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- 239000002966 varnish Substances 0.000 description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- -1 1,2- epoxyethyl Chemical group 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000001879 copper Chemical class 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NZHNJOJQMPJLFA-UHFFFAOYSA-N 2-[3,5-bis(oxiran-2-yl)phenyl]oxirane Chemical compound C1OC1C1=CC(C2OC2)=CC(C2OC2)=C1 NZHNJOJQMPJLFA-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- QHQNYHZHLAAHRW-UHFFFAOYSA-N 2-trimethoxysilylethanamine Chemical compound CO[Si](OC)(OC)CCN QHQNYHZHLAAHRW-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- ZFIVKAOQEXOYFY-UHFFFAOYSA-N Diepoxybutane Chemical compound C1OC1C1OC1 ZFIVKAOQEXOYFY-UHFFFAOYSA-N 0.000 description 1
- 229910001335 Galvanized steel Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- KVRAGBDTQYNMNO-UHFFFAOYSA-N bis[2,4-bis(oxiran-2-ylmethoxy)phenyl]methanone Chemical compound C=1C=C(OCC2OC2)C=C(OCC2OC2)C=1C(=O)C(C(=C1)OCC2OC2)=CC=C1OCC1CO1 KVRAGBDTQYNMNO-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000008397 galvanized steel Substances 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
- H05K1/056—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an organic insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
Description
〔産業上の利用分野〕
本発明は、プリント配線板、ハイブリツドIC
基板、LSI実装用基板に用いられる 放熱性の良
好な金属コアエポキシ樹脂銅張積層板に関するも
のである。
〔従来の技術〕
従来、アルミニウム板、アルマイト板、銅板等
の金属コアの上にエポキシ樹脂、ガラス布基材エ
ポキシ樹脂プリプレグ、ポリイミド樹脂、ガラス
布基材ポリイミド樹脂プリプレグ、両面接着剤付
ポリイミドフイルム等の絶縁樹脂層を介して銅箔
を接着させることにより金属コア銅張積層板が製
造されている。
金属コアと絶縁層の接着力を向上させるため、
種々の検討がなされている。例えば、電電公社電
気通信研究所研究実用化報告Vol.18No.12(1969)
にはアルミニウム板を機械的研摩後、クロム酸系
処理を施すことにより、アルミニウム表面と絶縁
樹脂層との接着力を高めることが記載されてい
る。又実公昭45−25826においてはアルミニウム
板をアルマイト処理する方法が提案され、特公昭
55−12754においてはアルミニウム板をアルカリ
でエツチングあるいは銅板を酢酸系処理する方法
が提案され、特公昭56−17227においては金属板
を機械的粗化する方法が提案されている。
〔本発明が解決しようとする問題点〕
これらの金属コアエポキシ樹脂銅張積層板に
は、種々の処理を施した後の耐熱特性が要求され
ている。例えば、吸湿処理後の半田耐熱性等であ
る。前述の金属板の処理のみでは、常態での金属
板とエポキシ樹脂との接着力は良好であるが、苛
酷な吸湿処理後の半田耐熱性試験では、金属とエ
ポキシ樹脂との間に剥離を生じる場合がある。
本発明者らは絶縁層としてエポキシ樹脂層を用
いた場合、吸湿処理後の半田耐熱性試験におい
て、金属板とエポキシ樹脂との間に剥離が生じな
い様に、接着力を向上させることを目的とし、金
属板の表面処理を種々検討し、本発明にいたつ
た。
〔問題点を解決するための手段〕
本発明の金属コアエポキシ樹脂銅張積層板の製
造方法は金属板を機械的に研摩した後、アミノ系
シランカツプリング剤溶液を塗布し、溶剤を乾燥
処理後、その処理面の上にエポキシ樹脂層を介し
て銅箔を重ね、加熱加圧硬化することを特徴とす
るものである。
次に本発明について更に具体的に説明する。
本発明において使用する金属板としては、アル
ミニウム板、アルマイト板、銅板、ケイ素鋼板、
亜鉛鋼板、鉄ニツケル42アロイ板、アンバー板又
はこれらの金属板同志を貼り合わせたクラツド板
等があり、放熱性、易加工性の点で優れているア
ルミニウム板が好ましい。
金属板を機械的に研摩する方法としては、研摩
紙、研摩布等によるサンデイング、ブラシ研摩、
ボール研摩、サンドプラスト、液体ホーニング、
シヨツトブラスト等の方法がある。
この様な方法で金属板の接着表面を機械的に粗
化した後、残つている研摩剤粉、金属粉を充分に
洗浄する。
本発明において使用するアミノ系シランカツプ
リング剤としてはγ−アミノプロピルトリエトキ
シシラン、γ−アミノプロピルトリメトキシシラ
ン、N−β(アミノエチル)γ−アミノプロピル
トリメトキシシラン、N−β(アミノエチル)γ
−アミノプロピルメチルジメトキシシラン、p−
アミノフエニルトリメトキシシラン、N−フエニ
ル−γ−アミノプロピルトリメトキシシラン等が
ある。好ましくは、γ−アミノプロピルトリエト
キシシランである。
これらのアミノ系シランカツプリング剤を、そ
の濃度が0.01から5.0重量%、好ましくは0.1から
1.0重量%になる様に、水、メタノール、エタノ
ール、トルエン、キシレン等の単独、あるいは混
合溶剤中に溶かし、その溶液を前述の研摩された
金属板に塗布する。塗布法としてはスプレーによ
る塗布、浸漬による塗布等が用いられる。その
後、溶剤を加熱乾燥除去する。この時の温度は50
℃から250℃の範囲が好ましく、更に好ましくは
80℃から200℃である。又、減圧にすることによ
り、常温あるいは常温に近い温度で溶剤を乾燥す
ることも可能である。
本発明に用いられるエポキシ樹脂は1分子あた
り平均で2個以上のエポキシ基を有していればよ
く、特に制限はないが、例えば、ビスフエノール
Aのジグリシジルエーテル型エポキシ樹脂、ブタ
ジエンジエポキシサイド、4,4′−ジ(1,2−
エポキシエチル)ジフエニルエーテル、4,4′−
ジ(エポキシエチル)ジフエニル、レゾルシンの
ジグリシジルエーテル、フロログリシンのジグリ
シジルエーテル、p−アミノフエノールのトリグ
リシジルエーテル、1,3,5−トリ(1,2−
エポキシエチル)ベンゼン、2,2′,4,4′−テ
トラグリシドキシベンゾフエノン、テトラグリシ
ドキシテトラフエニルエタン、フエノールノボラ
ツクのポリグリシジルエーテル、トリメチロール
プロパンのトリグリシジルエーテル、クレゾール
ノボラツクのポリグリシジルエーテル、グリセリ
ンのトリグリシジルエーテル、ハロゲン化ビスフ
エノールAのジグリシジルエーテル型エポキシ樹
脂、ハロゲン化フエノールノボラツクのポリグリ
シジルエーテル、トリグリシジルイソシアヌレー
ト、ビニルシクロヘキセンジオキサイド、3,4
−エポキシシクロヘキシルメチル−3,4−エポ
キシシクロヘキサンカルボキシレート等の脂環式
エポキシ樹脂、ヒダントインエポキシ樹脂等があ
る。
これらのエポキシ樹脂は、通常、硬化剤、硬化
促進剤等を配合したエポキシ樹脂組成物の形で用
いられ、溶剤に溶かしても無溶剤形で使用しても
よい。硬化剤としては、アミン系硬化剤、酸無水
物系硬化剤、フエノール系硬化剤、ポリアミド樹
脂硬化剤、イミダゾール系硬化剤等が用いられ、
特にジシアンジアミドが好ましい。
本発明におけるエポキシ樹脂層としては、基材
にエポキシ樹脂ワニスを含浸させ、溶剤を乾燥除
去したプリプレグを用いてもよく、あるいは、エ
ポキシ樹脂組成物に充填剤等を添加したものを用
いてもよく、あるいは基材、充填剤を含まないの
でエポキシ樹脂組成物のみを用いてもよい。基材
としては、ガラスクロス、ガラスペーパー、紙、
石英繊維クロス、芳香族ポリアミド繊維クロス等
が使用可能である。
又、充填剤としてはベリリア、窒化ホウ素、マ
グネシア、アルミナ、シリカ等の粉末を使用する
ことが可能である。
本発明に使用する銅箔は、一般的には電解銅箔
であるが、圧延銅箔を使用することも可能であ
る。
エポキシ樹脂層がプリプレグの場合は、アミノ
系シランカツプリング剤処理された金属板の片面
あるいは両面にプリプレグを必要枚数重ね、更に
その外側に銅箔を重ね、加熱加圧硬化することに
より、金属コアエポキシ樹脂銅張積層板が得られ
る。
エポキシ樹脂層がエポキシ樹脂組成物単独、あ
るいは充填剤入りのエポキシ樹脂組成物の場合
は、これらのワニスを、銅箔を接着面に、あるい
はアミノ系シランカツプリング剤処理された金属
板の接着面に、あるいはその両方に塗布し、その
後乾燥し、それらを重ね合わせて加熱加圧硬化す
ることにより金属コアエポキシ樹脂銅張積層板が
得られる。
本発明により得られた金属コアエポキシ樹脂銅
張積層板は、常態での金属板とエポキシ樹脂との
接着力のみならず、吸湿処理後の半田耐熱性に優
れている。
以下本発明について実施例をもつて詳細に説明
する。但し、本発明は以下の実施例に限定される
ものではない。
〔実施例〕
実施例 1
本実施例はエポキシ樹脂層にエポキシ樹脂プリ
プレグを用いたアルミコア片面銅張積層板に関す
るものである。
厚さ1.0mmのアルミニウム板の接着面側を、
1200番の研摩紙を用いて、縦方向と横方向に研摩
した後、充分水洗した。このアルミニウム板を、
γ−アミノプロピルトリエトキシシランの0.3%
水溶液に1分間浸漬後、120℃で30分間乾燥を行
なつた。
油化シエル社製ビスフエノールA型エポキシ樹
脂、商品名エピコート1001(軟化点70℃エポキシ
当量490g/eq.)100重量部をメチルエチルケト
ン24重量部に均一に溶解させた溶液に、ジシアン
ジアミド3.0重量部をエチレングリコールモノメ
チルエーテル45重量部に溶解させた溶液を加え、
更に硬化促進剤としてベンジルジメチルアミンを
0.2重量部添加し、樹脂分60重量%のエポキシ樹
脂ワニスAを作製した。このエポキシ樹脂ワニス
Aを日東紡製ガラスクロスG−7010−BZ−2(厚
さ0.1mm)に含浸させた後、塗工温度160℃、塗工
速度3m/minで溶剤除去するため乾燥塗工を行
ない、樹脂分45重量%のプリプレグを得た。
このプレプレグ2枚を、前述の研摩後アミノシ
ランカツプリング剤処理したアルミニウム板の上
に重ね、更にその上に、古河サーキツトフオイル
社製電解銅箔(TAI処理、厚さ35μm)を重ね、
40Kgf/cm2の圧力で170℃2時間加熱加圧硬化し、
アルミニウムコアエポキシ樹脂銅張積層板を得
た。
この積層板の特性の測定結果を表1に示すが、
常態及び吸湿処理後(煮沸1時間)の260℃半田
耐熱性試験で5分フロート後も異常はなく、又、
アルミニウム板と樹脂の接着性に優れ、銅箔引き
はがし強さの値が高かつた。
図面は本発明の製造方法による金属コアエポキ
シ樹脂片面銅張積層板の断面図で1は銅箔、2は
エポキシ樹脂層、3は研摩後アミノ系シランカツ
プリング剤処理した金属板処理面、4は金属板で
ある。
実施例 2
本実施例はエポキシ樹脂層にエポキシ樹脂組織
物を単独使用したアルミニウムコア片面銅張積層
板に関するものである。
実施例1で作製したエポキシ樹脂ワニスAを電
解銅箔(TAI処理、厚さ35μm)の粗化処理面上
にアプリケータを用いて塗布し、160℃10分間乾
燥した。乾燥後の樹脂厚は50μmであつた。
このエポキシ樹脂付銅箔を、実施例1と同様に
研摩後、アミノシランカツプリング剤処理したア
ルミニウム板の上で重ね、40Kgf/cm2の圧力で、
170℃2時間加熱加圧硬化を行ない、アルミニウ
ムコアエポキシ樹脂片面銅張積層板を得た。
この積層板の特性の測定結果を表1に示すが、
常態及び吸湿処理後(煮沸1時間)の260℃半田
耐熱性試験で5分フロート後も異常はなく、又、
アルミニウム板と樹脂の接着性に優れ、銅箔引き
はがし強さの値が高かつた。
比較例 1
アルミニウム板を無処理のまま使用する以外は
実施例1と同様にしてアルミニウムコアエポキシ
樹脂銅張積層板を作製した。特性を表1に示す
が、常態及び吸湿処理後(煮沸1時間)の半田耐
性熱試験においていずれも1分フロート後アルミ
ニウム板とエポキシ樹脂との界面で剥離が生じて
いた。
比較例 2
アルミニウム板に研摩処理のみ行なつて(シラ
ンカツプリング剤処理は行なわないで)使用する
以外は実施例1と同様にしてアルミニウムコアエ
ポキシ樹脂銅張積層板を作製した。特性を表1に
示すが、常態の半田耐熱性試験では3分フロート
後アルミニウム板とエポキシ樹脂の界面で剥離が
生じ、吸湿処理後(煮沸1時間)の半田耐熱性試
験においては1分フロート後、アルミニウム板と
エポキシ樹脂との界面で剥離が生じていた。
比較例 3
アルミニウム板に研摩処理は行なわないで、シ
ランカツプリング剤処理のみ行なつて、使用する
以外は実施例1と同様にしてアルミニウムコアエ
ポキシ樹脂銅張積層板を作製した。特性を表1に
示すが、常態及び吸湿処理後(煮沸1時間)の半
田耐熱性試験において、いずれも1分フロート
後、アルミニウム板とエポキシ樹脂の界面で剥離
が生じていた。
実施例 3
実施例1で作製したアルミニウムコアエポキシ
樹脂銅張積層板のアルミニウムの部分を、その厚
さが70μmになるまで削り取つた。そしてアルミ
ニウムとエポキシ樹脂との接着強度を測定するた
め、JIS−C−6481に準拠してアルミニウム箔の
引きはがし強さを測定した結果2.2Kgf/cmの値
であり、非常に高い接着強度であつた。
比較例 4
厚さ1.0mmの銅板の接着面側を、硫酸銅浴で電
解粗化し、さらにその表面をγ−アミノプロピル
トリエトキシシランの0.3%水溶液に1分間浸漬
後、120℃で30分間乾燥した。この銅板を用いて
実施例1と同様にして銅コアエポキシ樹脂銅張積
層板を作製した。その特性を測定した結果、常態
の5分間フロート後異常なかつたが、吸湿処理
(煮沸1時間)の半田耐熱性試験では、1分フロ
ート後銅板とエポキシ樹脂との界面で剥離が生じ
ていた。また、この銅コアエポキシ樹脂銅張積層
板を用いて、実施例3と同様にして銅板を厚さ
70μmになるまで削り取つた。そして、この銅の
引きはがし強さを測定した結果、1.4Kgf/cmの
値であり、接着強度は実施例3に比べ低い値であ
つた。
実施例 4
実施例2において作製したアルミニウムコアエ
ポキシ樹脂銅張積層板を用い、吸湿処理後の特性
を測定した。結果を表2に示すが、120℃のプレ
ツシヤークツカテスト(PCT)4時間処理後で
も、アルミニウムコアとエポキシ樹脂の間に剥離
は生じていなかつた。又、上記試験片を吸湿処理
後(煮沸5分及び30分後)300℃の半田耐熱性試
験で1分フロート後も異常はなく、吸湿後の半田
耐熱性に優れていた。
比較例 5〜14
アルミニウム板の接着面側に、表2に示した各
種表面処理を施した。このアルミニウム板を用
い、実施例2と同様にしてアルミニウムコアエポ
キシ樹脂銅張積層板を作製した。これら積層板の
吸湿処理後の特性を表2に示す。通常の表面処理
(比較例5〜11)では、プレツシヤークツカテス
トだけでは異常のない表面処理もあるが、煮沸吸
湿処理後の半田耐熱性が著しく劣つていた。ま
た、シランカツプリング剤がアミノ系以外のエポ
キシ系、ビニル系、メタクリル系のシランカツプ
リング剤を用いた場合(比較例12〜14)も、やは
り煮沸吸湿処理後の半田耐熱性に劣つていた。
以上説明した様に、従来知られている金属板の
表面処理法では、吸湿処理後の半田フロート処理
において、金属板とエポキシ樹脂の間に剥離が生
じてしまうのに対し、本発明の機械的研磨後アミ
ノ系シランカツプリング剤で処理することによ
り、吸湿処理後の半田耐熱性が顕著に改善され
る。
[Industrial Application Field] The present invention is applicable to printed wiring boards, hybrid ICs,
The present invention relates to metal core epoxy resin copper-clad laminates with good heat dissipation properties used for circuit boards and LSI mounting boards. [Prior art] Conventionally, epoxy resin, glass cloth-based epoxy resin prepreg, polyimide resin, glass cloth-based polyimide resin prepreg, polyimide film with double-sided adhesive, etc. have been applied on a metal core such as an aluminum plate, anodized aluminum plate, or copper plate. A metal core copper clad laminate is manufactured by bonding copper foil through an insulating resin layer. To improve the adhesion between the metal core and the insulation layer,
Various studies have been made. For example, Research and Practical Application Report Vol. 18 No. 12 (1969)
describes that the adhesion between the aluminum surface and the insulating resin layer can be increased by mechanically polishing the aluminum plate and then subjecting it to a chromic acid treatment. In addition, in 1982-25826, a method of alumite treatment of aluminum plates was proposed;
55-12754 proposes a method of etching an aluminum plate with an alkali or treating a copper plate with an acetic acid system, and Japanese Patent Publication No. 56-17227 proposes a method of mechanically roughening a metal plate. [Problems to be Solved by the Invention] These metal core epoxy resin copper-clad laminates are required to have heat resistance properties after being subjected to various treatments. For example, solder heat resistance after moisture absorption treatment, etc. When the metal plate is treated as described above, the adhesion between the metal plate and the epoxy resin is good under normal conditions, but in the solder heat resistance test after the severe moisture absorption treatment, separation occurs between the metal and the epoxy resin. There are cases. The purpose of the present inventors is to improve the adhesive strength so that when an epoxy resin layer is used as an insulating layer, no peeling occurs between the metal plate and the epoxy resin in a soldering heat resistance test after moisture absorption treatment. Therefore, various surface treatments for metal plates were investigated, and the present invention was arrived at. [Means for solving the problem] The method for producing a metal core epoxy resin copper-clad laminate of the present invention includes mechanically polishing a metal plate, applying an amino-based silane coupling agent solution, and drying the solvent. After that, a copper foil is placed on the treated surface with an epoxy resin layer interposed therebetween and cured under heat and pressure. Next, the present invention will be explained in more detail. Metal plates used in the present invention include aluminum plates, alumite plates, copper plates, silicon steel plates,
Examples include galvanized steel plates, iron-nickel 42 alloy plates, amber plates, and clad plates made by bonding these metal plates together. Aluminum plates are preferred because of their excellent heat dissipation and ease of workability. Methods for mechanically polishing metal plates include sanding with abrasive paper, polishing cloth, etc., brush polishing,
ball polishing, sandplast, liquid honing,
There are methods such as shot blasting. After the adhesive surface of the metal plate is mechanically roughened by such a method, the remaining abrasive powder and metal powder are thoroughly washed away. The amino-based silane coupling agents used in the present invention include γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, N-β(aminoethyl)γ-aminopropyltrimethoxysilane, and N-β(aminoethyltrimethoxysilane). )γ
-aminopropylmethyldimethoxysilane, p-
Examples include aminophenyltrimethoxysilane and N-phenyl-γ-aminopropyltrimethoxysilane. Preferred is γ-aminopropyltriethoxysilane. These amino-based silane coupling agents have a concentration of 0.01 to 5.0% by weight, preferably 0.1 to 5.0% by weight.
It is dissolved in a single or mixed solvent such as water, methanol, ethanol, toluene, xylene, etc. to a concentration of 1.0% by weight, and the solution is applied to the polished metal plate described above. As a coating method, spray coating, dipping coating, etc. are used. Thereafter, the solvent is removed by heating and drying. The temperature at this time is 50
The temperature range is preferably from ℃ to 250℃, more preferably
The temperature ranges from 80℃ to 200℃. Further, by applying reduced pressure, it is also possible to dry the solvent at room temperature or a temperature close to room temperature. The epoxy resin used in the present invention is not particularly limited as long as it has two or more epoxy groups on average per molecule, but examples include diglycidyl ether type epoxy resin of bisphenol A, butadiene diepoxide , 4,4′-di(1,2-
epoxyethyl) diphenyl ether, 4,4'-
Di(epoxyethyl) diphenyl, diglycidyl ether of resorcinol, diglycidyl ether of phloroglycin, triglycidyl ether of p-aminophenol, 1,3,5-tri(1,2-
epoxyethyl)benzene, 2,2',4,4'-tetraglycidoxybenzophenone, tetraglycidoxytetraphenylethane, polyglycidyl ether of phenol novolak, triglycidyl ether of trimethylolpropane, cresol novolak Polyglycidyl ether of glycerin, triglycidyl ether of glycerin, diglycidyl ether type epoxy resin of halogenated bisphenol A, polyglycidyl ether of halogenated phenol novolak, triglycidyl isocyanurate, vinyl cyclohexene dioxide, 3,4
-Alicyclic epoxy resins such as -epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, hydantoin epoxy resins, and the like. These epoxy resins are usually used in the form of an epoxy resin composition containing a curing agent, curing accelerator, etc., and may be used either dissolved in a solvent or in a solvent-free form. As the curing agent, an amine curing agent, an acid anhydride curing agent, a phenol curing agent, a polyamide resin curing agent, an imidazole curing agent, etc. are used.
Particularly preferred is dicyandiamide. As the epoxy resin layer in the present invention, a prepreg obtained by impregnating a base material with an epoxy resin varnish and drying the solvent may be used, or an epoxy resin composition containing a filler or the like may be used. Alternatively, only the epoxy resin composition may be used since it does not contain a base material or filler. Base materials include glass cloth, glass paper, paper,
Quartz fiber cloth, aromatic polyamide fiber cloth, etc. can be used. Further, as the filler, it is possible to use powders such as beryllia, boron nitride, magnesia, alumina, and silica. The copper foil used in the present invention is generally an electrolytic copper foil, but it is also possible to use a rolled copper foil. When the epoxy resin layer is prepreg, the required number of prepregs are layered on one or both sides of a metal plate treated with an amino-based silane coupling agent, and then copper foil is layered on the outside, and the metal core is cured by heating and pressure. An epoxy resin copper-clad laminate is obtained. If the epoxy resin layer is an epoxy resin composition alone or an epoxy resin composition containing a filler, apply these varnishes to the adhesive surface of copper foil or the adhesive surface of a metal plate treated with an amino-based silane coupling agent. A metal core epoxy resin copper-clad laminate can be obtained by applying the resin to one or both of them, then drying them, overlapping them, and curing them under heat and pressure. The metal core epoxy resin copper-clad laminate obtained by the present invention has excellent adhesive strength between the metal plate and the epoxy resin under normal conditions as well as solder heat resistance after moisture absorption treatment. The present invention will be described in detail below using examples. However, the present invention is not limited to the following examples. [Examples] Example 1 This example relates to an aluminum core single-sided copper-clad laminate using an epoxy resin prepreg for the epoxy resin layer. The adhesive side of the 1.0mm thick aluminum plate,
After sanding in the vertical and horizontal directions using 1200-grit abrasive paper, it was thoroughly washed with water. This aluminum plate
0.3% of γ-aminopropyltriethoxysilane
After being immersed in the aqueous solution for 1 minute, it was dried at 120°C for 30 minutes. 3.0 parts by weight of dicyandiamide was added to a solution in which 100 parts by weight of bisphenol A type epoxy resin manufactured by Yuka Ciel Co., Ltd., trade name Epicote 1001 (softening point: 70°C, epoxy equivalent: 490 g/eq.) was uniformly dissolved in 24 parts by weight of methyl ethyl ketone. Add a solution dissolved in 45 parts by weight of ethylene glycol monomethyl ether,
Furthermore, benzyldimethylamine is added as a curing accelerator.
Epoxy resin varnish A with a resin content of 60% by weight was prepared by adding 0.2 parts by weight. After impregnating Nittobo glass cloth G-7010-BZ-2 (thickness 0.1 mm) with this epoxy resin varnish A, dry coating was applied at a coating temperature of 160°C and a coating speed of 3 m/min to remove the solvent. A prepreg with a resin content of 45% by weight was obtained. These two prepregs were stacked on the aluminum plate treated with the aminosilane coupling agent after polishing, and on top of that, an electrolytic copper foil (TAI treated, 35 μm thick) manufactured by Furukawa Circuits Oil Co., Ltd. was stacked.
Heat and pressure harden at 170℃ for 2 hours at a pressure of 40Kgf/ cm2 ,
An aluminum core epoxy resin copper-clad laminate was obtained. Table 1 shows the measurement results of the properties of this laminate.
In the 260℃ soldering heat resistance test under normal conditions and after moisture absorption treatment (boiling for 1 hour), there was no abnormality after floating for 5 minutes.
It has excellent adhesion between the aluminum plate and the resin, and has a high copper foil peel strength value. The drawing is a cross-sectional view of a metal core epoxy resin single-sided copper-clad laminate manufactured by the manufacturing method of the present invention, in which 1 is a copper foil, 2 is an epoxy resin layer, 3 is a treated surface of a metal plate treated with an amino-based silane coupling agent after polishing, and 4 is a metal plate. Example 2 This example relates to an aluminum core single-sided copper-clad laminate in which an epoxy resin structure is used alone in the epoxy resin layer. Epoxy resin varnish A prepared in Example 1 was applied onto the roughened surface of electrolytic copper foil (TAI treated, thickness 35 μm) using an applicator and dried at 160° C. for 10 minutes. The resin thickness after drying was 50 μm. After polishing this epoxy resin-coated copper foil in the same manner as in Example 1, it was stacked on an aluminum plate treated with an aminosilane coupling agent, and then heated at a pressure of 40 kgf/cm 2 .
Heat and pressure curing was performed at 170° C. for 2 hours to obtain an aluminum core epoxy resin single-sided copper-clad laminate. Table 1 shows the measurement results of the properties of this laminate.
In the 260℃ soldering heat resistance test under normal conditions and after moisture absorption treatment (boiling for 1 hour), there was no abnormality after floating for 5 minutes.
It has excellent adhesion between the aluminum plate and the resin, and has a high copper foil peel strength value. Comparative Example 1 An aluminum core epoxy resin copper-clad laminate was produced in the same manner as in Example 1 except that the aluminum plate was used without treatment. The properties are shown in Table 1, and in both the solder resistance heat test under normal conditions and after moisture absorption treatment (boiling for 1 hour), peeling occurred at the interface between the aluminum plate and the epoxy resin after floating for 1 minute. Comparative Example 2 An aluminum core epoxy resin copper-clad laminate was produced in the same manner as in Example 1, except that the aluminum plate was only subjected to polishing treatment (without silane coupling agent treatment). The characteristics are shown in Table 1. In the normal soldering heat resistance test, peeling occurred at the interface between the aluminum plate and the epoxy resin after 3 minutes of floating, and in the soldering heat resistance test after moisture absorption treatment (1 hour of boiling), after 1 minute of floating. , peeling occurred at the interface between the aluminum plate and the epoxy resin. Comparative Example 3 An aluminum core epoxy resin copper-clad laminate was produced in the same manner as in Example 1, except that the aluminum plate was not subjected to polishing treatment but only treated with a silane coupling agent. The properties are shown in Table 1, and in the solder heat resistance tests under normal conditions and after moisture absorption treatment (boiling for 1 hour), peeling occurred at the interface between the aluminum plate and the epoxy resin after floating for 1 minute. Example 3 The aluminum portion of the aluminum core epoxy resin copper-clad laminate produced in Example 1 was shaved off to a thickness of 70 μm. In order to measure the adhesive strength between aluminum and epoxy resin, we measured the peeling strength of aluminum foil in accordance with JIS-C-6481 and found a value of 2.2 kgf/cm, which is an extremely high adhesive strength. Ta. Comparative Example 4 The adhesive side of a 1.0 mm thick copper plate was electrolytically roughened in a copper sulfate bath, and the surface was further immersed in a 0.3% aqueous solution of γ-aminopropyltriethoxysilane for 1 minute, and then dried at 120°C for 30 minutes. did. Using this copper plate, a copper core epoxy resin copper-clad laminate was produced in the same manner as in Example 1. As a result of measuring its characteristics, there was no abnormality after a normal 5-minute float, but in a soldering heat resistance test with moisture absorption treatment (boiling for 1 hour), peeling occurred at the interface between the copper plate and the epoxy resin after a 1-minute float. In addition, using this copper core epoxy resin copper clad laminate, the thickness of the copper plate was increased in the same manner as in Example 3.
I scraped it off until it was 70μm. As a result of measuring the peel strength of this copper, the value was 1.4 Kgf/cm, which was a lower value than the adhesive strength of Example 3. Example 4 Using the aluminum core epoxy resin copper-clad laminate produced in Example 2, the characteristics after moisture absorption treatment were measured. The results are shown in Table 2, and even after 4 hours of pressure test (PCT) treatment at 120°C, no peeling occurred between the aluminum core and the epoxy resin. Furthermore, after moisture absorption treatment (after 5 and 30 minutes of boiling), the above test piece was subjected to a soldering heat resistance test at 300°C, with no abnormalities observed even after floating for 1 minute, and the soldering heat resistance after moisture absorption was excellent. Comparative Examples 5 to 14 Various surface treatments shown in Table 2 were applied to the adhesive side of the aluminum plate. Using this aluminum plate, an aluminum core epoxy resin copper-clad laminate was produced in the same manner as in Example 2. Table 2 shows the properties of these laminates after moisture absorption treatment. In the conventional surface treatments (Comparative Examples 5 to 11), although some surface treatments showed no abnormality in the pressure test alone, the soldering heat resistance after the boiling moisture absorption treatment was significantly inferior. In addition, when epoxy-based, vinyl-based, or methacrylic-based silane coupling agents other than amino-based silane coupling agents are used (Comparative Examples 12 to 14), the soldering heat resistance after boiling moisture absorption treatment is still inferior. Ta. As explained above, in conventional surface treatment methods for metal plates, peeling occurs between the metal plate and the epoxy resin during the solder float treatment after moisture absorption treatment, whereas the mechanical treatment method of the present invention By treating with an amino-based silane coupling agent after polishing, the soldering heat resistance after moisture absorption treatment is significantly improved.
【表】【table】
【表】【table】
【表】【table】
以上、説明してきた様に、本発明の製造方法に
よると、常態及び吸湿処理後の半田耐熱性に優
れ、金属板とエポキシ樹脂との接着性に優れ、銅
箔引きはがし強さの値が高い金属コアエポキシ樹
脂銅張積層板が製造でき、その工業的価値は大で
ある。
As explained above, according to the manufacturing method of the present invention, it has excellent soldering heat resistance under normal conditions and after moisture absorption treatment, excellent adhesion between metal plates and epoxy resin, and high copper foil peel strength. Metal core epoxy resin copper-clad laminates can be produced, and their industrial value is great.
図面は本発明の製造方法による金属コアエポキ
シ樹脂片面銅張積層板の断面図である。
符号の説明、1……銅箔、2……エポキシ樹脂
層、3……金属板処理面、4……金属板。
The drawing is a sectional view of a metal core epoxy resin single-sided copper-clad laminate manufactured by the manufacturing method of the present invention. Explanation of symbols: 1...Copper foil, 2...Epoxy resin layer, 3...Metal plate treated surface, 4...Metal plate.
Claims (1)
ンカツプリング剤溶液を塗布し、溶剤を乾燥処理
後、その処理面の上にエポキシ樹脂層を介して銅
箔を重ね、加熱加圧硬化することを特徴とする金
属コアエポキシ樹脂銅張積層板の製造方法。 2 アミノ系シランカツプリング剤が、γ−アミ
ノプロピルトリエトキシシラン、γ−アミノプロ
ピルトリメトキシシラン、N−β(アミノエチル)
γ−アミノプロピルトリメトキシシラン、N−β
(アミノエチル)γ−アミノプロピルメチルジメ
トキシシラン、p−アミノフエニルトリメトキシ
シラン、N−フエニル−γ−アミノプロピルトリ
メトキシシラン、又はこれらの混合物であること
を特徴とする特許請求の範囲第1項に記載された
金属コアエポキシ樹脂銅張積層板の製造方法。 3 エポキシ樹脂が、ガラス布基材エポキシ樹脂
プリプレグであることを特徴とする特許請求の範
囲第1項に記載された金属コアエポキシ樹脂銅張
積層板の製造方法。 4 エポキシ樹脂層がエポキシ樹脂のみであるこ
とを特徴とする特許請求の範囲第1項に記載され
た金属コアエポキシ樹脂銅張積層板の製造方法。 5 金属板が、アルミニウム板、アルマイト板、
銅板、ケイ素鋼板、亜鉛鋼板、鉄−ニツケル42ア
ロイ板、アンバー板、又はこれらのクラツド板で
あることを特徴とする特許請求の範囲第1項に記
載された金属コアエポキシ樹脂銅張積層板の製造
方法。[Claims] 1. After mechanically polishing a metal plate, an amino-based silane coupling agent solution is applied, and after the solvent is dried, a copper foil is placed on the treated surface with an epoxy resin layer interposed therebetween. A method for producing a metal core epoxy resin copper-clad laminate, characterized by curing under heat and pressure. 2 The amino-based silane coupling agent is γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, N-β (aminoethyl)
γ-aminopropyltrimethoxysilane, N-β
(Aminoethyl)γ-aminopropylmethyldimethoxysilane, p-aminophenyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, or a mixture thereof, Claim 1 A method for manufacturing a metal core epoxy resin copper-clad laminate described in Section 1. 3. The method for manufacturing a metal core epoxy resin copper-clad laminate according to claim 1, wherein the epoxy resin is a glass cloth base epoxy resin prepreg. 4. The method for manufacturing a metal core epoxy resin copper-clad laminate according to claim 1, wherein the epoxy resin layer is made of only epoxy resin. 5 The metal plate is an aluminum plate, an alumite plate,
The metal core epoxy resin copper-clad laminate described in claim 1, which is a copper plate, a silicon steel plate, a zinc steel plate, an iron-nickel 42 alloy plate, an amber plate, or a clad plate thereof. Production method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59267749A JPS61144339A (en) | 1984-12-19 | 1984-12-19 | Manufacture of metallic core epoxy-resin copper lined laminated board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59267749A JPS61144339A (en) | 1984-12-19 | 1984-12-19 | Manufacture of metallic core epoxy-resin copper lined laminated board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61144339A JPS61144339A (en) | 1986-07-02 |
JPH0454577B2 true JPH0454577B2 (en) | 1992-08-31 |
Family
ID=17449039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59267749A Granted JPS61144339A (en) | 1984-12-19 | 1984-12-19 | Manufacture of metallic core epoxy-resin copper lined laminated board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61144339A (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63147636A (en) * | 1986-12-11 | 1988-06-20 | 日立化成工業株式会社 | Manufacture of silicon steel-plate base copper-clad laminated plate |
JP2734345B2 (en) * | 1993-08-24 | 1998-03-30 | 新神戸電機株式会社 | Method for producing glass fiber nonwoven fabric for laminate and method for producing laminate |
EP2489504B1 (en) | 2009-10-16 | 2016-02-17 | Aisin Seiki Kabushiki Kaisha | Composite molded article |
US9333454B2 (en) | 2011-01-21 | 2016-05-10 | International Business Machines Corporation | Silicone-based chemical filter and silicone-based chemical bath for removing sulfur contaminants |
US8900491B2 (en) | 2011-05-06 | 2014-12-02 | International Business Machines Corporation | Flame retardant filler |
US9186641B2 (en) | 2011-08-05 | 2015-11-17 | International Business Machines Corporation | Microcapsules adapted to rupture in a magnetic field to enable easy removal of one substrate from another for enhanced reworkability |
US8741804B2 (en) | 2011-10-28 | 2014-06-03 | International Business Machines Corporation | Microcapsules adapted to rupture in a magnetic field |
US9716055B2 (en) | 2012-06-13 | 2017-07-25 | International Business Machines Corporation | Thermal interface material (TIM) with thermally conductive integrated release layer |
EP4039447A4 (en) * | 2019-10-02 | 2023-11-22 | Toyobo Co., Ltd. | Apparatus for manufacturing laminate and method for manufacturing laminate |
KR102428824B1 (en) * | 2019-12-11 | 2022-08-02 | 주식회사 포스코 | Metal-plastic composite material and method for manufacturing the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5884488A (en) * | 1981-11-13 | 1983-05-20 | 日本電解株式会社 | Copper-coated laminated board for printed circuit |
JPS5896660A (en) * | 1981-12-03 | 1983-06-08 | Mitsubishi Chem Ind Ltd | Powder coating compound composition of epoxy resin for insulating metal core circuit base |
-
1984
- 1984-12-19 JP JP59267749A patent/JPS61144339A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5884488A (en) * | 1981-11-13 | 1983-05-20 | 日本電解株式会社 | Copper-coated laminated board for printed circuit |
JPS5896660A (en) * | 1981-12-03 | 1983-06-08 | Mitsubishi Chem Ind Ltd | Powder coating compound composition of epoxy resin for insulating metal core circuit base |
Also Published As
Publication number | Publication date |
---|---|
JPS61144339A (en) | 1986-07-02 |
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