JPH0453268B2 - - Google Patents
Info
- Publication number
- JPH0453268B2 JPH0453268B2 JP17134984A JP17134984A JPH0453268B2 JP H0453268 B2 JPH0453268 B2 JP H0453268B2 JP 17134984 A JP17134984 A JP 17134984A JP 17134984 A JP17134984 A JP 17134984A JP H0453268 B2 JPH0453268 B2 JP H0453268B2
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- semiconductor wafer
- resistance
- measurement
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 16
- 238000009499 grossing Methods 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 53
- 238000005259 measurement Methods 0.000 description 20
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000000691 measurement method Methods 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Measurement Of Resistance Or Impedance (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17134984A JPS6148767A (ja) | 1984-08-17 | 1984-08-17 | 半導体ウエハの抵抗測定方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17134984A JPS6148767A (ja) | 1984-08-17 | 1984-08-17 | 半導体ウエハの抵抗測定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6148767A JPS6148767A (ja) | 1986-03-10 |
| JPH0453268B2 true JPH0453268B2 (cs) | 1992-08-26 |
Family
ID=15921556
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17134984A Granted JPS6148767A (ja) | 1984-08-17 | 1984-08-17 | 半導体ウエハの抵抗測定方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6148767A (cs) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5585734A (en) * | 1990-07-09 | 1996-12-17 | Interuniversitair Micro Elektronica Centrum Vzw | Method for determining the resistance and carrier profile of a semiconductor element using a scanning proximity microscope |
| US5723981A (en) * | 1994-08-29 | 1998-03-03 | Imec Vzw | Method for measuring the electrical potential in a semiconductor element |
-
1984
- 1984-08-17 JP JP17134984A patent/JPS6148767A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6148767A (ja) | 1986-03-10 |
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