JPH0451406A - Electric conductive paste - Google Patents

Electric conductive paste

Info

Publication number
JPH0451406A
JPH0451406A JP15929590A JP15929590A JPH0451406A JP H0451406 A JPH0451406 A JP H0451406A JP 15929590 A JP15929590 A JP 15929590A JP 15929590 A JP15929590 A JP 15929590A JP H0451406 A JPH0451406 A JP H0451406A
Authority
JP
Japan
Prior art keywords
resin
electric conductive
epoxy resin
poly
liquid epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15929590A
Other languages
Japanese (ja)
Inventor
Tatsuya Onishi
龍也 大西
Teru Okunoyama
奥野山 輝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP15929590A priority Critical patent/JPH0451406A/en
Publication of JPH0451406A publication Critical patent/JPH0451406A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L24/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L2224/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives

Abstract

PURPOSE:To obtain excellent adhesive property, to eliminate generation of voids and to enhance productivity as well as long term reliability because of low temperature high speed cure by adopting modified resin composed of poly-p- hydroxystyrene resin and low viscous liquid epoxy resin, an imidazole catalyst and electric conductive powder as essential components. CONSTITUTION:Modified resin composed of poly-p-hydroxystyrene resin and low viscous liquid epoxy resin, an imidazole catalyst and electric conductive powder are the essential components of this electric conductive paste. These components are blended and kneaded homogeneously by means of triple rolls and the like for production. Several seconds to scores of hours after this conduc tive paste is applied to a specified position by means of a dispenser, screen printing, pin transfer method and the like, various kinds of semiconductive pellets are placed thereon and the paste is heated for curing on a heater block for scores of seconds to several minutes at comparatively low degrees such as 100-200 deg.C to be used. Several minutes of curing at 150-200 deg.C in an oven is also employed.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、接着性に優れるとともに、高速接着可能で生
産性の向上とコストダウンに寄与する導電性ペーストに
関する。 特に、本発明の導電性ペーストは半導体素子
のダイボンデインクなどに適する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Field of Application) The present invention relates to a conductive paste that has excellent adhesive properties, can be bonded at high speed, and contributes to improved productivity and cost reduction. In particular, the conductive paste of the present invention is suitable for die bonding ink for semiconductor devices.

(従来の技術) 金属薄板(リードフレーム)上の所定部分にIC,LS
I等の半導体素子を接続する工程は、素子の長期信頼性
に影響を与える重要な工程の1つである。 従来からこ
の接続方法として、素子のシリコン面をリードフレーム
上の金メツキ面に加熱圧着するというAu−3i共晶法
が主流であった。 しかし近年、樹脂封止型半導体装置
ではAu−3i共晶法から、半田を使用する方法、導電
性ペース)〜を使用する方法等に急速に移行しつつある
(Prior art) IC and LS are placed on a predetermined portion of a thin metal plate (lead frame).
The process of connecting semiconductor elements such as I is one of the important processes that affects the long-term reliability of the element. Conventionally, the mainstream connection method has been the Au-3i eutectic method, in which the silicon surface of the element is heat-pressed to the gold-plated surface of the lead frame. However, in recent years, in resin-sealed semiconductor devices, there has been a rapid shift from the Au-3i eutectic method to methods using solder, conductive paste, etc.

(発明が解決しようとする課題) しかし、半田を使用する方法は、一部に実用化されてい
るが半田や半田ボールが飛散して電極等に付着し、腐食
断線の原因となることが指摘されている。 一方、導電
性ベース1〜を使用する方法では、通常、銀粉末を配合
したエポキシ樹脂が用いられ、約10年程前から実用化
されてきたか、信頼性の面でA11−s*の共晶合金に
比較して満足ずべきものが得られなかった。 導電性ペ
ーストを使用する場合は、半田法に比べて耐熱性に(罷
れる等の長所を有しているものの、その反面ボイドの発
生や耐湿性、耐加水分解性に劣り、アルミニウム電極の
腐食を促進し、@線不良の原因となることが多く、素子
の信頼性がAIJ−8i共晶法に比べて劣っていた。 
また、導電性ペーストを使用する場合、半田法やAu−
5r共晶法に比べてその接合時間も長時間を必要とし、
オーブンによる熱硬化であるなめ生産ラインからはずし
てオーブンに投入するというバッチ方式となり生産性に
劣るという欠点かあった。
(Problem to be solved by the invention) However, although some methods using solder have been put into practical use, it has been pointed out that solder and solder balls scatter and adhere to electrodes, etc., causing corrosion and disconnection. has been done. On the other hand, in the method using conductive base 1~, an epoxy resin mixed with silver powder is usually used, and it has been put into practical use for about 10 years, or the eutectic resin of A11-s* is It was not possible to obtain satisfactory results compared to alloys. When using a conductive paste, it has the advantage of being heat resistant (prevents wrinkles, etc.) compared to the soldering method, but on the other hand, it is prone to void generation, poor moisture resistance, hydrolysis resistance, and corrosion of aluminum electrodes. This often causes defects in the @ line, and the reliability of the device was inferior to that of the AIJ-8i eutectic method.
In addition, when using conductive paste, soldering method or Au-
Compared to the 5R eutectic method, the bonding time is longer,
It was a batch method in which the licking was removed from the heat curing production line and put into the oven, which resulted in poor productivity.

本発明は、上記の欠点を解消するなめになされたもので
、組立てインラインにおけるし−ドブロック上の硬化で
も、接着性に優れ、ボイドの発生もなく、低温高速硬化
による生産性が高く、CDに寄与し、かつ一般特性をも
保持した、長期信頼性の高い導電性ペーストを提供しよ
うとするものである。
The present invention has been made to eliminate the above-mentioned drawbacks, and has excellent adhesion and no void generation even when curing on a bed block in an assembly in-line, high productivity due to low temperature and high speed curing, and CD The purpose is to provide a highly reliable conductive paste for a long period of time, which contributes to the above-mentioned problems and also maintains general characteristics.

[発明の構成] (課題を解決するための手段) 本発明者らは、上記の目的を達成しようと鋭意研究を重
ねた結果、後述する組成物とすることによって、上記の
目的を達成てきることを見いたし、本発明を完成したも
のである。
[Structure of the Invention] (Means for Solving the Problem) As a result of intensive research aimed at achieving the above object, the present inventors have achieved the above object by creating the composition described below. This has led to the completion of the present invention.

すなわち、本発明は、 (A)(a)ポリ −p−ヒドロキシスチレン樹脂及び
<b)低粘度液状エポキシ樹脂からなる変性樹脂、 (B)イミダゾール系触媒および (C)導電性粉末 を必須成分としてなることを特徴とする導電性ペースト
である。
That is, the present invention comprises (A) a modified resin consisting of (a) a poly-p-hydroxystyrene resin and <b) a low-viscosity liquid epoxy resin, (B) an imidazole-based catalyst, and (C) a conductive powder as essential components. This is a conductive paste that is characterized by:

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

本発明に用いる(A)変性樹脂としては、(a )ポリ
 −p−ヒドロキシスチレン樹脂、(b)低粘度液状エ
ポキシ樹脂を溶解又は加熱反応せしめてなる変性樹脂で
ある。 ここで使用する(a )ポリp−ヒドロキシス
チレン樹脂としては、次式で示されるものである。
The modified resin (A) used in the present invention is a modified resin obtained by dissolving or heat-reacting (a) a poly-p-hydroxystyrene resin and (b) a low-viscosity liquid epoxy resin. The poly p-hydroxystyrene resin (a) used here is represented by the following formula.

(但し、式中nは25〜90の整数を表す)このような
樹脂として、例えばマルカリン力−M(丸首石油化学社
製、商品名)等かあり、これらは分子量3000〜80
00で水酸基当量は約120のものである。 変性樹脂
の他の成分である(b)低粘度液状エポキシ樹脂として
は、例えばβ(3,4−エポキシシクロヘキシル)エチ
ルトリメトキシシラン、γ−クリシトキシプロビルトリ
メトキシシラン、γ−グリシドキシプロピルメチルジェ
トキシシラン等のシラン系モノマーおよびビスフェノー
ル型低粘度液状エポキシ樹脂、脂環式低粘度液状エポキ
シ樹脂、グリシジルエーテル型エポキシ樹脂、グリシジ
ルエステル型エポキシ樹脂等が挙げられ、これらは単独
もしくは2種以上混合して使用する。  (a )ポリ
 −ρ−ヒドロキシスチレン樹脂と(b)低粘度液状エ
ポキシ樹脂との配合割合は、重量比で5:95〜40:
60の範囲であることが望ましい6 ポリ −p−ヒド
ロキシスチレン樹脂の配合量か5重量%未溝では十分な
硬化速度、機械的強度が得られず、また40重量%を超
えると機械的強度か低下し好ましくない。
(However, in the formula, n represents an integer of 25 to 90.) Examples of such resins include Marukalinyoku-M (manufactured by Marukubi Petrochemical Co., Ltd., trade name), which have a molecular weight of 3000 to 80.
00 and the hydroxyl equivalent is about 120. Examples of the low viscosity liquid epoxy resin (b) which is another component of the modified resin include β(3,4-epoxycyclohexyl)ethyltrimethoxysilane, γ-crisitoxypropyltrimethoxysilane, γ-glycidoxypropyl Examples include silane monomers such as methyljetoxysilane, bisphenol type low viscosity liquid epoxy resin, alicyclic low viscosity liquid epoxy resin, glycidyl ether type epoxy resin, glycidyl ester type epoxy resin, etc., and these can be used alone or in combination of two or more. Mix and use. The blending ratio of (a) poly-ρ-hydroxystyrene resin and (b) low-viscosity liquid epoxy resin is 5:95 to 40:
It is desirable that the content is in the range of 60.6 If the blending amount of poly-p-hydroxystyrene resin is 5% by weight, sufficient curing speed and mechanical strength will not be obtained, and if it exceeds 40% by weight, the mechanical strength will be poor. This is not desirable.

本発明に用いる(B)イミダゾール系触媒としでは例え
ば2MZ、2E4MZ、C,、Z、C,、Z。
Examples of the imidazole catalyst (B) used in the present invention include 2MZ, 2E4MZ, C,, Z, C,, Z.

2PZ、2P4MZ、2M1−CN、2E4MZCN、
C,、Z−CN、I B2MZ、2MZ−CNS、  
 2P4BH2,2MA、   2MA−OK   (
四国化成工業社製、商品名)等が挙げられ、これらは単
独又は2種以上混合して使用することができる。 イミ
ダゾール系触媒の配合割合は、(b)低粘度液状エポキ
シ樹脂に対して0.1〜8重量%配合することができる
。 配合量が0.1重量%では触媒効果が低く、また8
重量%を超えるとボットライフ等の経時変化をまねきや
すく好ましくない。 ポリ −p−ヒドロキシスチレン
樹脂と低粘度液状エポキシ樹脂とを溶解または加熱反応
せしめてなる変性樹脂をつくる際、溶剤に溶解させて使
用すれば作業性を高めることができる。 ここに使用さ
れる溶剤類としてはジオキサン、ヘキサノン、ベンセン
、トルエン、ツルベンI〜ナフサ、工業用カッリン、酢
酸セロソルブ、エチルセロソルブ、ブチルセロソルブ、
ブチルセロソルブアセテ−1〜、ブチルカルピトールア
セテ−1〜、ジメチルポルムアミド、ジメチルアセトア
ミド、N−メチルピロリドン等が挙げられ、これらは単
独又は2種以上混合して使用することができる。
2PZ, 2P4MZ, 2M1-CN, 2E4MZCN,
C,,Z-CN,I B2MZ,2MZ-CNS,
2P4BH2, 2MA, 2MA-OK (
(manufactured by Shikoku Kasei Kogyo Co., Ltd., trade name), etc., and these can be used alone or in a mixture of two or more. The blending ratio of the imidazole catalyst can be 0.1 to 8% by weight based on (b) the low viscosity liquid epoxy resin. When the blending amount is 0.1% by weight, the catalytic effect is low;
If it exceeds % by weight, it is undesirable because it tends to cause changes in bot life etc. over time. When producing a modified resin by dissolving or heating a poly-p-hydroxystyrene resin and a low-viscosity liquid epoxy resin, workability can be improved by dissolving it in a solvent. Solvents used here include dioxane, hexanone, benzene, toluene, turben I to naphtha, industrial kalin, acetic cellosolve, ethyl cellosolve, butyl cellosolve,
Examples include butyl cellosolve acetate-1~, butyl carpitol acetate-1~, dimethylpolamide, dimethylacetamide, N-methylpyrrolidone, etc., and these can be used alone or in a mixture of two or more.

本発明に用いる(C)導電性粉末としては、銀粉末、銅
粉末、ニッケル粉末等の金属粉末か挙げられ、これらは
単独もしくは2種以上混合して使用することができる6
 また導電性粉末であれば制限はなく、表面に金属メツ
キ層を有するものでもよい。 さらに導電性粉末の形状
についても特に制限はない。 これらの導電性粉末の中
でも球状のものが好んで用いられ、粒径が50μm以下
のものが好ましい。 その理由は粒径か50μ印を超え
ると導電性が不安定となり好ましくないからである。 
また、バインダーとなる変性樹脂と導電性粉末との配合
割合は、重量比で30ニア0〜10:90の範囲内であ
ることが望ましい。 導電性粉末か70重量部未満であ
ると、満足な導電性が得られず、また、90重量部を超
えると作業性や密着性か低下し好ましくない。 従って
前記の範囲内に限定するのがよい。
The conductive powder (C) used in the present invention includes metal powders such as silver powder, copper powder, and nickel powder, and these can be used alone or in a mixture of two or more.
Further, there is no restriction as long as it is a conductive powder, and it may have a metal plating layer on its surface. Furthermore, there are no particular restrictions on the shape of the conductive powder. Among these conductive powders, spherical ones are preferably used, and those with a particle size of 50 μm or less are preferred. The reason for this is that if the particle size exceeds the 50 μ mark, the conductivity becomes unstable, which is not preferable.
Further, the blending ratio of the modified resin serving as the binder and the conductive powder is preferably within the range of 30:0 to 10:90 by weight. If the amount of the conductive powder is less than 70 parts by weight, satisfactory conductivity cannot be obtained, and if it exceeds 90 parts by weight, workability and adhesion will deteriorate, which is not preferable. Therefore, it is preferable to limit it within the above range.

本発明の導電性ペーストは、上述した各成分、すなわち
、ポリ −p−しドロキシスチレン樹脂と低粘度液状エ
ポキシ樹脂からなる変性樹脂、イミダゾール系触媒およ
び導電性粉末を必須成分とするか、本発明の目的に反し
ない限度において、また必要に応じて、他の成分例えば
カップリング剤、消泡剤、分散剤等を添加配合すること
ができる。
The conductive paste of the present invention has the above-mentioned components as essential components, that is, a modified resin consisting of a poly-p-droxystyrene resin and a low-viscosity liquid epoxy resin, an imidazole-based catalyst, and a conductive powder. Other components such as a coupling agent, an antifoaming agent, a dispersing agent, etc. may be added and blended as necessary within the limits not contrary to the purpose of the invention.

本発明の導電性ペースI・は、これらの各成分を配合し
、3本ロール等により均一に混練して容易に製造するこ
とかできる。 そして、この導電性ペーストを所定の場
所にデイスペンサー、スクリーン印刷、ピン転写法等に
よって塗布した後、数秒から数十時間後、各種半導体ペ
レットを載せ、100〜200℃といった比較的低温で
数十秒から数分間ヒーターブロック」二で加熱硬化させ
て使用する。 また、オーブンで150〜200℃、数
分間硬化させて使用することもできる。
The conductive paste I of the present invention can be easily produced by blending these components and uniformly kneading them using a three roll or the like. After applying this conductive paste to a predetermined location using a dispenser, screen printing, pin transfer method, etc., after several seconds to several tens of hours, various semiconductor pellets are placed on it and heated at a relatively low temperature of 100 to 200°C for several tens of seconds. Use by heating and curing with a heater block for a few seconds to several minutes. It can also be used after being cured in an oven at 150 to 200°C for several minutes.

(作用) 本発明の導電性ペーストは、低粘度液状エポキシ樹脂を
ポリ −p−ヒドロキシスチレン樹脂で変性した樹脂を
特定量使用することによって、硬化速度を高め、かつ十
分な接着強度など強度を得るようにし、併せて従来の一
般特性も保持させたものである。
(Function) The conductive paste of the present invention increases the curing speed and obtains strength such as sufficient adhesive strength by using a specific amount of a low-viscosity liquid epoxy resin modified with poly-p-hydroxystyrene resin. In addition, the conventional general characteristics are also maintained.

(実施例) 次に、本発明を実施例によって具体的に説明するが、本
発明はこれらの実施例によって限定されるものではない
。 実施例および比較例においてr部」とは特に説明の
ない限り「重量部」を意味する。
(Examples) Next, the present invention will be specifically explained by examples, but the present invention is not limited by these examples. In Examples and Comparative Examples, "r parts" means "parts by weight" unless otherwise specified.

実施例 1− 低粘度液状エポキシ樹脂のYL980 (油化シェルエ
ポキシ社製、商品名) 15.8部とポリ −〇−しド
ロキシスチレン樹脂のマルカリン力−M(丸首石油化学
社製、商品名)10部とを、ブチルセロソルブアセテー
ト15部で100°C11時間溶解反応させ、粘稠な褐
色の変性樹脂を得た。 この変性樹脂20部に、イミダ
ゾール系触媒の2部4MZ <四国化成工業社製、商品
名)0.2部および銀粉末77部を混合し、さらに3本
ロールで混練して導電性ペーストを製造した。
Example 1 - 15.8 parts of YL980 (manufactured by Yuka Shell Epoxy Co., Ltd., trade name), a low viscosity liquid epoxy resin, and Marcarin Power-M (manufactured by Marukubi Petrochemical Co., Ltd., trade name) of poly-[droxystyrene] resin. ) was dissolved and reacted with 15 parts of butyl cellosolve acetate at 100°C for 11 hours to obtain a viscous brown modified resin. To 20 parts of this modified resin, 2 parts of imidazole catalyst 0.2 parts of 4MZ (manufactured by Shikoku Kasei Kogyo Co., Ltd., trade name) and 77 parts of silver powder were mixed, and the mixture was further kneaded with three rolls to produce a conductive paste. did.

実施例 2 低粘度液状エポキシ樹脂のエピコート828(油化シェ
ルエポキシ社製、商品名)17部とポリp−ヒドロキシ
スチレン樹脂のマルカリン力−M(前出)10部とを、
ブチルカルピトールアセテ−1〜18部で100°C,
1時間溶解反応させ、粘稠な褐色の変性樹脂を得た。 
この変性樹脂20部に、イミダゾール系触媒のC17Z
 (四国化成工業社製、商品名)0.4部および銀粉末
78部を混合し、さらに3本ロールで混練して導電性ペ
ース1〜を製造した。
Example 2 17 parts of Epikote 828 (manufactured by Yuka Shell Epoxy Co., Ltd., trade name), a low viscosity liquid epoxy resin, and 10 parts of Marcarin Power-M (mentioned above), a poly p-hydroxystyrene resin,
Butylcarpitol acetate-1 to 18 parts at 100°C,
A dissolution reaction was carried out for 1 hour to obtain a viscous brown modified resin.
C17Z, an imidazole catalyst, was added to 20 parts of this modified resin.
(manufactured by Shikoku Kasei Kogyo Co., Ltd., trade name) and 78 parts of silver powder were mixed and further kneaded with three rolls to produce conductive pastes 1 to 1.

実施例 3 低粘度液状エポキシ樹脂のYL980(前出)20部と
ポリ −p−ヒドロキシスチレン樹脂のマルカリンカー
M(前出)15部とを、ジエチレングリコールジエチル
エーテル19部で60°C,1時間溶解反応させ、粘稠
な褐色の変性樹脂を得な。 この樹脂18部に、イミダ
ゾール系触媒の2 E 4. M Z −CN(四国化
成工業社製、商品名)0.3部および銀粉末82部を混
合し、さらに3本ロールで混練して導電性ペーストを製
造した。
Example 3 20 parts of YL980 (mentioned above), a low viscosity liquid epoxy resin, and 15 parts of Marukalinker M (mentioned above), a poly-p-hydroxystyrene resin, were dissolved in 19 parts of diethylene glycol diethyl ether at 60°C for 1 hour. React to obtain a viscous brown modified resin. Add 2E of imidazole catalyst to 18 parts of this resin 4. 0.3 parts of M Z -CN (manufactured by Shikoku Kasei Kogyo Co., Ltd., trade name) and 82 parts of silver powder were mixed and further kneaded with three rolls to produce a conductive paste.

比較例 市販のエポキシ樹脂ベースの速硬化型半導体用導電性ペ
ース1〜を入手した。
Comparative Example Commercially available epoxy resin-based fast-curing conductive pastes for semiconductors 1-1 were obtained.

実施例1−〜3および比較例の導電性ペーストを用いて
半導体チップとリードフレームに塗布接着させ、ヒート
ブロックを用いて200℃で50秒間加熱硬化させ、半
導体チップとリードフレームを接合した。 これらにつ
いて接着性、ボイドの有無、導電性の試験を行った。 
その結果を第1表に示したが、いずれも本発明の顕著な
効果が確認された。
The conductive pastes of Examples 1 to 3 and Comparative Example were applied and adhered to the semiconductor chip and the lead frame, and the semiconductor chip and the lead frame were bonded by heating and curing at 200° C. for 50 seconds using a heat block. These were tested for adhesion, presence of voids, and conductivity.
The results are shown in Table 1, and in all cases the remarkable effects of the present invention were confirmed.

なお、接着性の試験は、銀メツキを施したり一ドフレー
ム(銅系)上に2.0 x2.01111nのシリコン
チップを接合し、25°C,200°Cにおける接着強
度をプッシュプルゲージを用いて測定した。 ボイドの
有無は、シリコンチップをリードフレーム上から剥かし
てチップの裏面のボイドの発生状況を目視した。 また
、導電性は体積抵抗率計で測定した。
In addition, the adhesion test was performed by bonding a 2.0 x 2.01111n silicon chip onto a frame (copper-based) or by silver plating, and measuring the adhesion strength at 25°C and 200°C using a push-pull gauge. It was measured using The presence or absence of voids was determined by peeling off the silicon chip from the lead frame and visually observing the occurrence of voids on the back surface of the chip. Further, conductivity was measured using a volume resistivity meter.

第1表 (単位) *1 :○印・・・ボイドのヂA捲し、×印・・・ボイ
ドの発生有り「発明の効果」 以1−の説明および第1表から明らかなように、本発明
の導電性ペーストは、接着性に優れ、低温高速硬化にお
いてもボイドの発生がなく強固に接合し、特に熱時の接
着強度に優れたものである。
Table 1 (Units) *1: ○ mark: void is rolled over, × mark: void occurs "Effect of the invention" As is clear from the explanation in 1- and Table 1, The conductive paste of the present invention has excellent adhesive properties, and even when cured at low temperature and high speed, it can be firmly bonded without generating voids, and has particularly excellent adhesive strength when heated.

また低温高速硬化ができるため生産性が高く、CDにも
寄与し、かつ長期信頼性の高い半導体装置等を製造する
ことができる。
Further, since it can be cured at low temperature and at high speed, productivity is high, it contributes to CD, and it is possible to manufacture semiconductor devices and the like with high long-term reliability.

Claims (1)

【特許請求の範囲】 1 (A)(a)ポリ−p−ヒドロキシスチレン樹脂及
び(b)低粘度液状エポキシ樹脂からなる変性樹脂、 (B)イミダゾール系触媒および (C)導電性粉末を必須成分としてなることを特徴とす
る導電性ペースト。
[Scope of Claims] 1 (A) Modified resin consisting of (a) poly-p-hydroxystyrene resin and (b) low-viscosity liquid epoxy resin, (B) imidazole-based catalyst, and (C) conductive powder as essential components. A conductive paste characterized by the following characteristics:
JP15929590A 1990-06-18 1990-06-18 Electric conductive paste Pending JPH0451406A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15929590A JPH0451406A (en) 1990-06-18 1990-06-18 Electric conductive paste

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15929590A JPH0451406A (en) 1990-06-18 1990-06-18 Electric conductive paste

Publications (1)

Publication Number Publication Date
JPH0451406A true JPH0451406A (en) 1992-02-19

Family

ID=15690674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15929590A Pending JPH0451406A (en) 1990-06-18 1990-06-18 Electric conductive paste

Country Status (1)

Country Link
JP (1) JPH0451406A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999009101A1 (en) * 1997-08-19 1999-02-25 Minnesota Mining And Manufacturing Company Conductive epoxy resin compositions, anisotropically conductive adhesive films and electrical connecting methods

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999009101A1 (en) * 1997-08-19 1999-02-25 Minnesota Mining And Manufacturing Company Conductive epoxy resin compositions, anisotropically conductive adhesive films and electrical connecting methods
CN1105749C (en) * 1997-08-19 2003-04-16 美国3M公司 Conductive epoxy resin compositions anisotropically conductive adhesive films and electrical connecting methods

Similar Documents

Publication Publication Date Title
EP1944346B1 (en) Anisotropic conductive adhesive
JP5151902B2 (en) Anisotropic conductive film
JPH0790237A (en) Circuit-connecting material and connection of circuit using the connecting material
JPH08315885A (en) Circuit connecting material
JP2983816B2 (en) Conductive resin paste
JP2500826B2 (en) Anisotropic conductive film
JP4867805B2 (en) Adhesive for electrode connection
JPH09263683A (en) Electroconductive epoxy resin composition
JPH07173448A (en) Anisotropically conductive film
JPH0451406A (en) Electric conductive paste
JP2018131569A (en) Resin composition comprising conductive particles
JP3046081B2 (en) Anisotropic conductive film
JPH02288019A (en) Anisotropic conductive film
JP2720343B2 (en) Conductive paste
JP2005317491A (en) Conductive paste and electronic component mounting substrate using it
JP3681907B2 (en) Conductive adhesive and electronic component mounting method using the same
JPH05171073A (en) Conductive paste
JPH10340624A (en) Conductive resin paste and semiconductor device manufactured by using this
JP2005071817A (en) Anisotropic conductive film
JP2944363B2 (en) Semiconductor device using low-stress adhesive resin composition
JP3085714B2 (en) Anisotropic conductive film
JPH0495310A (en) Anisotropic conductive film
JPS63193972A (en) Electrically conductive paste
JPH11140417A (en) Electroconductive adhesive agent
JP3589569B2 (en) Conductive paste