JPH0449774Y2 - - Google Patents

Info

Publication number
JPH0449774Y2
JPH0449774Y2 JP1986066852U JP6685286U JPH0449774Y2 JP H0449774 Y2 JPH0449774 Y2 JP H0449774Y2 JP 1986066852 U JP1986066852 U JP 1986066852U JP 6685286 U JP6685286 U JP 6685286U JP H0449774 Y2 JPH0449774 Y2 JP H0449774Y2
Authority
JP
Japan
Prior art keywords
work
filter
filters
shielding
clean room
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1986066852U
Other languages
Japanese (ja)
Other versions
JPS62178405U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP1986066852U priority Critical patent/JPH0449774Y2/ja
Publication of JPS62178405U publication Critical patent/JPS62178405U/ja
Application granted granted Critical
Publication of JPH0449774Y2 publication Critical patent/JPH0449774Y2/ja
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 〔考案の利用分野〕 本考案は照明装置に係り、特に半導体製造工場
等のクリーンルームに適した照明装置に関する。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a lighting device, and particularly to a lighting device suitable for a clean room such as a semiconductor manufacturing factory.

〔考案の背景〕[Background of the idea]

半導体製造は無塵環境を必要とするため、その
製造は通常クリーンルーム内で行われる。一般
に、クリーンルームは、天井面に取付けられた複
数のHEPA(高性能)フイルタを通して清浄エア
をクリーンルーム室内に吹き出し、又室内のエア
を床面から吸い込んで再び天井面のHEPAフイ
ルタを通すエア循環方式を採用している。
Semiconductor manufacturing requires a dust-free environment, so the manufacturing is usually performed in a clean room. Generally, clean rooms use an air circulation system in which clean air is blown into the clean room through multiple HEPA (high performance) filters installed on the ceiling, and air inside the room is sucked in from the floor and passed through HEPA filters on the ceiling again. We are hiring.

又、半導体製造工程に於いて、ICの回路パタ
ーンはステツパー(縮小投影型露光装置)を用い
て写真技術を利用してウエハー上に焼付けられ
る。即ち、シリコンウエハーに感光樹脂を塗り、
その上から光を当てて回路パターンを焼付ける露
光工程が必要となる。このためクリーンルーム
で、照明に蛍光灯を使用すると、蛍光灯等から発
生する紫外線によつて半導体製造の露光作業に重
大な悪影響を与える。この為従来、クリーンルー
ムでは、紫外線を発生しない黄色灯が用いられて
いる。しかしながら、このような黄色灯を用いた
場合には、露光作業以外の作業時には黄色灯から
の光は弱く作業上好ましくない。更にクリーンル
ーム内に吹き付けられる清浄エアの気流等によつ
て、蛍光灯カバーの表面には静電気が発生し易
く、蛍光灯の発熱作用によつて温められた蛍光灯
カバーは帯電し易くなつている。蛍光灯カバーが
帯電すると、カバーに塵埃が付着し易く照度低下
を招く虞れがある。
Furthermore, in the semiconductor manufacturing process, IC circuit patterns are printed onto a wafer using photographic technology using a stepper (reduction projection type exposure device). That is, coating a silicon wafer with photosensitive resin,
An exposure process is required in which the circuit pattern is printed by shining light onto it. For this reason, when fluorescent lamps are used for illumination in a clean room, the ultraviolet rays emitted from the fluorescent lamps have a serious adverse effect on exposure work in semiconductor manufacturing. For this reason, yellow lights, which do not emit ultraviolet light, have traditionally been used in clean rooms. However, when such a yellow lamp is used, the light from the yellow lamp is weak during work other than exposure work and is not favorable for work. Furthermore, static electricity is likely to be generated on the surface of the fluorescent lamp cover due to the flow of clean air blown into the clean room, and the fluorescent lamp cover, which is heated by the heat generation effect of the fluorescent lamp, is easily charged with electricity. When the fluorescent lamp cover becomes electrically charged, dust tends to adhere to the cover, which may lead to a decrease in illuminance.

〔考案の目的〕[Purpose of invention]

本考案はこのような事情に鑑みてなされたもの
で、クリーンルーム内での作業に適した照明が出
来る照明装置を提案することを目的としている。
The present invention was made in view of the above circumstances, and the purpose is to propose a lighting device that can provide illumination suitable for work in a clean room.

〔考案の概要〕[Summary of the idea]

本考案はこのような事情に鑑みてなされたもの
で、高性能エアフイルタを通過した清浄エアを室
内の作業域に供給し、作業域でシリコンウエハー
に回路パターンを焼付ける露光作業と、露光作業
以外の半導体製造作業を行うクリーンルームに於
いて、清浄エアが吹出すクリーンルームの天井に
蛍光灯から成る照明灯が設けられ、一対の導電性
のフイルタが照明灯カバーの内外面に設けられる
と共にフイルタはアース接地され、この内外面の
フイルタに透明部と紫外線をカツトする遮蔽部と
が帯状に交互に位置を互いにずらして形成し、露
光作業の場合には一対のフイルタの透明部と遮蔽
部とを互いに位置をずらして遮蔽部で紫外線をカ
ツトし、露光作業以外の作業の場合には照明灯カ
バーの外面のフイルタは外すことを特徴とする。
The present invention was developed in view of these circumstances, and it supplies clean air that has passed through a high-performance air filter to an indoor work area, which is used for exposure work in which circuit patterns are printed on silicon wafers, and for non-exposure work. In a clean room where semiconductor manufacturing work is carried out, a lighting lamp consisting of a fluorescent lamp is installed on the ceiling of the clean room from which clean air is blown out, and a pair of conductive filters are installed on the inside and outside surfaces of the lighting lamp cover, and the filter is grounded. A transparent part and a shielding part for cutting ultraviolet rays are formed in a band shape on the filter on the inner and outer surfaces of the grounded filter, with their positions alternately shifted from each other.In the case of exposure work, the transparent part and the shielding part of a pair of filters are connected It is characterized by shifting its position to block ultraviolet rays with a shielding part, and removing the filter on the outer surface of the illumination light cover when performing work other than exposure work.

〔実施例〕〔Example〕

以下添付図面に従つて本考案に係る照明装置の
好ましい実施例を詳説する。第1図は本考案に係
る照明装置が設けられたクリーンルームの断面図
である。第1図に示すようにクリーンルーム10
の天井室12は、右側面に導入口14が設けら
れ、循環エアはこの導入口14を通つて天井室1
2に供給される。又、天井室12には、複数の
HEPAフイルタ16……が配置され、天井室1
2のエアは、HEPAフイルタ16を通つて室内
20に送られる。又、隣接するHEPAフイルタ
16,16間には、梁22が設けられ、室内20
を照明する照明装置24が梁22の下面に取付け
られる。室内20には各種半導体製造機器26が
配置される。
Preferred embodiments of the lighting device according to the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 is a sectional view of a clean room equipped with a lighting device according to the present invention. Clean room 10 as shown in Figure 1
The ceiling chamber 12 is provided with an inlet 14 on the right side, and circulating air passes through this inlet 14 into the ceiling chamber 1.
2. In addition, in the ceiling chamber 12, there are a plurality of
A HEPA filter 16... is placed in the ceiling room 1.
The air of No. 2 is sent to the room 20 through the HEPA filter 16. Also, a beam 22 is provided between the adjacent HEPA filters 16, 16, and the indoor 20
A lighting device 24 is attached to the lower surface of the beam 22. Various types of semiconductor manufacturing equipment 26 are arranged in the room 20 .

一方、基礎床28には複数の支柱30,30…
…が立設され、これ等の支柱30によつて床面用
グレーチング32が敷設され、室内20のエア
は、このグレーチング32を通つて床下チヤンバ
34に吸い込まれる。チヤンバ34の右側面には
吸気口36が設けられ、吸気口36は吸気ダクト
38を介して空気調和機40に外気導入ダクト4
2と共に接続され、この空気調和機40でミキシ
ングされた空調空気は送風機44により、送気ダ
クト46を介して天井室12に再び供給される。
On the other hand, the foundation floor 28 has a plurality of pillars 30, 30...
... are erected, a floor grating 32 is laid by these supports 30, and air from the room 20 is sucked into the underfloor chamber 34 through the grating 32. An intake port 36 is provided on the right side of the chamber 34, and the intake port 36 is connected to the outside air introduction duct 4 to the air conditioner 40 via an intake duct 38.
The conditioned air mixed by this air conditioner 40 is again supplied to the ceiling room 12 via an air supply duct 46 by a blower 44.

第2図は本考案に係る照明装置に用いられる照
明灯カバーの分解斜視図である。カバー50は断
面がU字状に形成され、図示しない直管型の蛍光
灯に被せられる。又、カバー50にはボルト孔5
2が形成され、カバー50はボルト孔52に挿通
されるボルトの締結によつて照明装置24の図示
しない基台に取付けられるようになつている。カ
バー50の内面50A及び外面50Bには夫々紫
外線を遮蔽する遮蔽フイルタ54,56が被着さ
れる。遮蔽フイルタ56は可撓性のシートで形成
され、帯状の紫外線カツト部58と透明部60と
が交互に形成される。フイルタ54,56は、ア
クリル材から成り、表面に透光性のある酸化スズ
の粉末を含む導電性塗料による塗装が施されてい
る。紫外線カツト部58は450nm以下の光波長を
遮蔽する塗料が塗布されて形成され、遮蔽塗料が
塗布されない部分は透明部60として形成され
る。内側遮蔽フイルタ54の透明部60は外側遮
蔽フイルタ56の紫外線カツト部58に対向して
位置するように取付けられる。このようにして配
置された構造が第3図に示されている。外側の遮
蔽フイルタ56の上端部には4つのL字状の係止
部62が形成され、遮蔽フイルタ56は係止部6
2をカバー50の上面の周縁に掛けることによつ
て取り付けられる。又遮蔽フイルタ54,56の
取り付け時に於いて内側遮蔽フイルタ54の紫外
線カツト部58は外側遮蔽フイルタ56の透明部
60と対向し、内側遮蔽フイルタ54の透明部6
0は外側遮蔽フイルタ56の紫外線カツト部58
に対向して位置するように取り付けられる。遮蔽
フイルタ54,56は、共に図示しない基台に設
けられるアースに接地される。
FIG. 2 is an exploded perspective view of a lighting lamp cover used in the lighting device according to the present invention. The cover 50 has a U-shaped cross section and is placed over a straight tube type fluorescent lamp (not shown). Further, the cover 50 has bolt holes 5.
2 is formed, and the cover 50 is attached to a base (not shown) of the lighting device 24 by fastening bolts inserted through bolt holes 52. On the inner surface 50A and outer surface 50B of the cover 50, shielding filters 54 and 56 are respectively attached to shield ultraviolet rays. The shielding filter 56 is formed of a flexible sheet, and has strip-shaped ultraviolet cut portions 58 and transparent portions 60 formed alternately. The filters 54 and 56 are made of acrylic material, and their surfaces are coated with a conductive paint containing translucent tin oxide powder. The ultraviolet cut portion 58 is formed by applying a paint that blocks light wavelengths of 450 nm or less, and the portion to which the shielding paint is not applied is formed as a transparent portion 60. The transparent portion 60 of the inner shielding filter 54 is mounted so as to be located opposite the ultraviolet cut portion 58 of the outer shielding filter 56. A structure thus arranged is shown in FIG. Four L-shaped locking parts 62 are formed at the upper end of the outer shielding filter 56.
2 on the periphery of the upper surface of the cover 50. When the shielding filters 54 and 56 are attached, the ultraviolet cut portion 58 of the inner shielding filter 54 faces the transparent portion 60 of the outer shielding filter 56, and the transparent portion 60 of the inner shielding filter 54 faces the transparent portion 60 of the outer shielding filter 56.
0 is the ultraviolet cut portion 58 of the outer shielding filter 56
It is installed so that it is located opposite to the The shielding filters 54 and 56 are both grounded to a ground provided on a base (not shown).

前記の如く構成された本考案に係る照明装置に
よれば、照明装置24のカバー内には内側遮蔽フ
イルタ54が被着されており、半導体製造の露光
作業時には外側遮蔽フイルタ56が照明装置24
のカバー50の外側に取り付けられる。遮蔽フイ
ルタ56の取り付けによつて照明装置24の光源
は遮蔽フイルタ54及び56の紫外線カツト部5
8によつて紫外線が完全に遮蔽される。これによ
り室内20は紫外線が遮蔽された照明がなされる
こととなり、半導体製造の露光作業に悪影響を与
えることがない。又紫外線カツトを行う半導体製
造の露光作業をしない場合には、遮蔽フイルタ5
6が照明灯カバー50から外され照明装置24の
光源は遮蔽フイルタ54の透明部分60から室内
を照射することとなり、容易に明るく作業環境に
おいてクリーンルーム内での作業をすることが出
来る。又遮蔽フイルタ54及び56は導電性を有
している為循環エアの吹き付けにより静電気を生
じても帯電することなく塵埃等が付着する虞がな
い。
According to the illumination device according to the present invention configured as described above, the inner shielding filter 54 is attached to the inside of the cover of the illumination device 24, and the outer shielding filter 56 is attached to the illumination device 24 during exposure work for semiconductor manufacturing.
It is attached to the outside of the cover 50 of. By attaching the shielding filter 56, the light source of the illumination device 24 is connected to the ultraviolet cut portion 5 of the shielding filters 54 and 56.
8 completely blocks ultraviolet rays. As a result, the room 20 is illuminated with ultraviolet rays blocked, so that exposure work in semiconductor manufacturing will not be adversely affected. In addition, when not performing exposure work for semiconductor manufacturing that requires ultraviolet rays, the shielding filter 5 is used.
6 is removed from the illumination light cover 50, and the light source of the illumination device 24 illuminates the room from the transparent portion 60 of the shielding filter 54, making it easy to work in a clean room in a bright work environment. Further, since the shielding filters 54 and 56 are conductive, even if static electricity is generated by blowing circulating air, they will not be charged and there is no possibility of dust etc. adhering to them.

〔考案の効果〕[Effect of idea]

以上説明した様に本考案に係わる照明装置によ
れば、一対の導電性のフイルタが照明灯カバーの
内外面に設けられると共に、この内外面のフイル
タに透明部と遮蔽部と帯状に交互に位置を互いに
ずらして形成したので、紫外線を有効に遮蔽でき
ると共に、外面のフイルタを取外すことにより室
内を充分に照射することが出来る。また、フイル
タは導電性でアース接地されているので、静電気
をおびた塵あいが付着するのを防止することが出
来る。
As explained above, according to the lighting device according to the present invention, a pair of conductive filters are provided on the inner and outer surfaces of the illumination light cover, and a transparent part and a shielding part are arranged alternately in a strip shape on the filters on the inner and outer surfaces. Since they are staggered from each other, they can effectively block ultraviolet rays, and by removing the outer filter, the interior of the room can be sufficiently irradiated. Furthermore, since the filter is conductive and grounded, it is possible to prevent dust particles charged with static electricity from adhering to the filter.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案に係わる照明装置が用いられる
クリーンルームの説明図、第2図は本考案に係わ
る照明装置の照明灯カバー及び遮蔽フイルタの斜
視図、第3図は照明灯カバーに遮蔽フイルタを取
りつけた時の断面図である。 10……クリーンルーム、20……クリーンル
ーム室内、26……半導体製造機器台、50……
照明灯カバー、54,56……遮蔽フイルタ、5
8……紫外線カツト部、60……透明部。
Fig. 1 is an explanatory diagram of a clean room in which the lighting device according to the present invention is used, Fig. 2 is a perspective view of the illumination light cover and shielding filter of the illumination device according to the present invention, and Fig. 3 is a diagram showing the shielding filter on the illumination light cover. It is a sectional view when it is attached. 10...Clean room, 20...Clean room interior, 26...Semiconductor manufacturing equipment stand, 50...
Illumination light cover, 54, 56...Shielding filter, 5
8... Ultraviolet cut section, 60... Transparent section.

Claims (1)

【実用新案登録請求の範囲】 高性能エアフイルタを通過した清浄エアを室内
の作業域に供給し、作業域でシリコンウエハーに
回路パターンを焼付ける露光作業と、露光作業以
外の半導体製造作業を行うクリーンルームに於い
て、 清浄エアが吹出すクリーンルームの天井に蛍光
灯から成る照明灯が設けられ、 一対の導電性のフイルタが照明灯カバーの内外
面に設けられると共にフイルタはアース接地さ
れ、この内外面のフイルタに透明部と紫外線をカ
ツトする遮蔽部とが帯状に交互に位置を互いにず
らして形成し、露光作業の場合には一対のフイル
タの透明部と遮蔽部とを互いに位置をずらして遮
蔽部で紫外線をカツトし、露光作業以外の作業の
場合には照明灯カバーの外面のフイルタは外すこ
とを特徴とする照明装置。
[Scope of Utility Model Registration Request] A clean room in which clean air that has passed through a high-performance air filter is supplied to an indoor work area, where exposure work for printing circuit patterns on silicon wafers and semiconductor manufacturing work other than exposure work are performed. In this case, a lighting lamp consisting of a fluorescent lamp is installed on the ceiling of a clean room from which clean air is blown out, and a pair of conductive filters are installed on the inner and outer surfaces of the lighting lamp cover, and the filters are grounded. The filter is formed with a transparent part and a shielding part that blocks ultraviolet rays, which are alternately shifted in position in a band-like manner, and in the case of exposure work, the transparent part and the shielding part of a pair of filters are formed in the shielding part by shifting their positions with respect to each other. A lighting device that blocks ultraviolet rays and is characterized in that a filter on the outer surface of a lighting lamp cover can be removed when performing work other than exposure work.
JP1986066852U 1986-05-01 1986-05-01 Expired JPH0449774Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986066852U JPH0449774Y2 (en) 1986-05-01 1986-05-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986066852U JPH0449774Y2 (en) 1986-05-01 1986-05-01

Publications (2)

Publication Number Publication Date
JPS62178405U JPS62178405U (en) 1987-11-12
JPH0449774Y2 true JPH0449774Y2 (en) 1992-11-24

Family

ID=30905227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986066852U Expired JPH0449774Y2 (en) 1986-05-01 1986-05-01

Country Status (1)

Country Link
JP (1) JPH0449774Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6248369B2 (en) * 2013-12-20 2017-12-20 東芝ライテック株式会社 Interior lighting device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60241602A (en) * 1984-05-16 1985-11-30 キヤノン株式会社 Lighting apparatus
JPS6136907B2 (en) * 1984-04-02 1986-08-21 Chikanosuke Oki

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5512319Y2 (en) * 1974-02-26 1980-03-17
JPS5575903U (en) * 1978-11-20 1980-05-26
JPS6136907U (en) * 1984-08-09 1986-03-07 松下電工株式会社 lighting equipment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6136907B2 (en) * 1984-04-02 1986-08-21 Chikanosuke Oki
JPS60241602A (en) * 1984-05-16 1985-11-30 キヤノン株式会社 Lighting apparatus

Also Published As

Publication number Publication date
JPS62178405U (en) 1987-11-12

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