JPH0510570B2 - - Google Patents
Info
- Publication number
- JPH0510570B2 JPH0510570B2 JP61131185A JP13118586A JPH0510570B2 JP H0510570 B2 JPH0510570 B2 JP H0510570B2 JP 61131185 A JP61131185 A JP 61131185A JP 13118586 A JP13118586 A JP 13118586A JP H0510570 B2 JPH0510570 B2 JP H0510570B2
- Authority
- JP
- Japan
- Prior art keywords
- vibration
- foundation
- air
- proof
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 238000002955 isolation Methods 0.000 description 3
- 238000009423 ventilation Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は防振基礎用ステージに係り、特に半導
体製造工場等のクリーンルームに備えられる防振
基礎構造上に取付けられる防振基礎用ステージに
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a vibration-proof foundation stage, and more particularly to a vibration-proof foundation stage mounted on a vibration-proof foundation structure provided in a clean room such as a semiconductor manufacturing factory.
半導体製造は無塵環境を必要とするため、その
製造は通常クリーンルーム内で行われる。一般
に、クリーンルームは、天井面に取付けられた複
数のHEPA（高性能）フイルタを通して清浄エア
をクリーンルーム室内に吹き出し、又室内のエア
を通気構造を有するグレーチング床面から吸い込
んで再び天井面のHEPAフイルタを通すエア循
環方式が採用され、清浄エアが室内に於いてダウ
ンフローされる。
Semiconductor manufacturing requires a dust-free environment, so the manufacturing is usually performed in a clean room. Generally, in a clean room, clean air is blown into the clean room through multiple HEPA (high performance) filters installed on the ceiling, and the air inside the room is sucked in through the grating floor, which has a ventilation structure, and then passed through the HEPA filters on the ceiling again. An air circulation system is adopted to allow clean air to flow down into the room.
又クリーンルーム等においては各種の半導体製
造装置が設置され、この半導体製造装置の中には
高微細化によるLSIプロセスにおけるアライナ、
EB及びステツパー等のように極端に振動を嫌う
装置がある。従つてこのような振動を嫌う半導体
製造装置は、防振基礎構造上に設置する必要があ
る。又、このような防振基礎構造の施設面積は、
一般に装置類の載置面積より広くして種々の装置
類に適用できるようにしている。 In addition, various semiconductor manufacturing equipment is installed in clean rooms, etc., and some of these semiconductor manufacturing equipment include aligners,
There are devices such as EB and Steppers that are extremely sensitive to vibration. Therefore, semiconductor manufacturing equipment that dislikes such vibrations needs to be installed on a vibration-proof basic structure. In addition, the facility area of such a vibration-proof foundation structure is
Generally, the mounting area is larger than the mounting area of the devices so that it can be applied to various devices.
しかしながら、作業者は防振基礎上の装置類に
近接して作業をすることがあり、防振基礎上に足
を踏み入れることがある。作業者が防振基礎上に
乗ると、装置類は振動し悪影響を受ける。又、防
振基礎を設置した床面部分は、通気構造のグレー
チングを施すことができない。このため、層流化
された清浄エアの気流が防振基礎の上方及び、そ
の周辺で乱れ、エアの滞留域となる不具合があ
る。 However, workers sometimes work in close proximity to equipment on the anti-vibration foundation and sometimes step on the anti-vibration foundation. When a worker stands on the anti-vibration foundation, the equipment vibrates and is adversely affected. Furthermore, it is not possible to apply grating for ventilation to the floor area where the vibration-proof foundation is installed. For this reason, there is a problem in that the laminar flow of clean air is disturbed above and around the vibration isolation foundation, resulting in an air stagnation area.
本発明はこのような事情に鑑みて成されたもの
で、防振基礎の機能を維持しながら、防振基礎上
の装置類に近接して作業ができ、防振基礎の上方
のエアの流れを乱さない防振基礎用ステージを提
供することを目的としている。
The present invention was developed in view of these circumstances, and allows work to be carried out in close proximity to equipment on the vibration-proof foundation while maintaining the function of the vibration-proof foundation, and improves air flow above the vibration-proof foundation. The purpose is to provide a vibration-proof foundation stage that does not disturb the vibration.
本発明は前記目的を達成するために、床下チヤ
ンバを形成し、天井面から吹き出されたエアをグ
レーチング床を介して床下チヤンバ内に吸気し、
エアのダウンフローが行われるクリーンルームの
基礎床に前記グレーチング床と分離して立設され
た防振基礎上に設置される防振基礎用ステージで
あつて、この防振基礎用ステージは前記防振基礎
を跨いで前記グレーチング床に支持され、内部を
中空状に形成すると共に上面に室内と中空部とを
連通する複数の透孔を形成し、中空部に連結され
る吸気フアンを設けて室内エアを透孔及び中空部
を介して床下チヤンバに吸気するようにしたこと
を特徴とする。
In order to achieve the above object, the present invention forms an underfloor chamber, sucks air blown from the ceiling surface into the underfloor chamber through the grating floor,
A stage for a vibration-proof foundation is installed on a vibration-proof foundation that is erected separately from the grating floor on the foundation floor of a clean room where air downflow is performed, and this stage for vibration-proof foundation It is supported by the grating floor across the foundation, has a hollow interior, and has a plurality of through holes in its upper surface that communicate the room and the hollow, and an intake fan connected to the hollow to supply indoor air. The air is drawn into the underfloor chamber through the through hole and the hollow part.
以下添付図面に従つて本発明に係る防振基礎用
ステージの好ましい実施例を詳説する。第１図は
本発明に係る防振基礎用ステージが設けられたク
リーンルームの断面図である。第１図に示すよう
にクリーンルーム１０の天井室１２は、右側面に
導入口１４が設けられ、循環エアはこの導入口１
４を通つて天井室１２に供給される。又、天井室
１２には、複数のHEPAフイルタ１６…が配置
され、天井室１２のエアは、HEPAフイルタ１
６を通つて室内２０に送られる。
Preferred embodiments of the vibration-proof foundation stage according to the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 is a sectional view of a clean room equipped with a vibration-proof foundation stage according to the present invention. As shown in FIG. 1, the ceiling chamber 12 of the clean room 10 is provided with an inlet 14 on the right side, and the circulating air is supplied through this inlet 14.
4 to the ceiling chamber 12. In addition, a plurality of HEPA filters 16 are arranged in the ceiling chamber 12, and the air in the ceiling chamber 12 is filtered through the HEPA filters 16.
6 into the room 20.
又、基礎床２８には複数の支柱３０，３０…が
立設され、これ等の支柱３０によつて床面用グレ
ーチング３２が敷設され、室内２０のエアは、こ
のグレーチング３２を通つて床下シヤンバ３４に
吸い込まれる。チヤンバ３４の右側面には吸気口
３６が設けられ、吸気口３６は吸気ダクト３８を
介して空気調和機４０に外気導入ダクト４２と共
に接続され、この空気調和機４０でミキシングさ
れた空調空気は送風機４４により、送気ダクト４
６を介して天井室１２に再び供給される。 Further, a plurality of columns 30, 30... are erected on the foundation floor 28, and a floor grating 32 is laid by these columns 30, and the air in the room 20 passes through the grating 32 to the underfloor chamber. It gets sucked into 34. An intake port 36 is provided on the right side of the chamber 34, and the intake port 36 is connected to an air conditioner 40 together with an outside air introduction duct 42 via an intake duct 38, and the conditioned air mixed in the air conditioner 40 is sent to a blower. 44, the air supply duct 4
6 to the ceiling chamber 12 again.
チヤンバ３４には防振基礎５０が設けられ、防
振基礎５０上にはステツパー装置５２が設けられ
る。このステツパー装置５２は、露光装置の１種
であつて、プロジエクシヨン・アライナーと同様
に紫外線を使い、ガラス基板上に拡大して描かれ
た回路パターンを縮小して焼きつける装置であ
り、このため振動を極力回避することが必要であ
る。第２図及び第３図に示すように防振基礎５０
はコンクリート基礎床２８の一部が高台に形成さ
れ、内部が中空に形成される。基礎５０の上面は
ステツパー装置５２が載置され、ステツパー装置
５２より面積の大きい矩形状に形成される。又、
防振基礎用ステージ５４は防振基礎５０上を跨
ぎ、第３図に示すように防振基礎５０の周縁のグ
レーチング床３２上の４ケ所に支持され、ステツ
パー装置５２の周囲に設けられる。防振基礎用ス
テージ５４の内部は中空に形成され、中空部５６
は防振基礎用ステージ５４の上面に形成された複
数の透孔５８…を介して室内２０と連通される。
床下チヤンバ３４の防振基礎５０の側壁には吸気
フアン６０が設けられ、吸気フアン６０は連結管
６２を介して防振基礎用ステージ５４の中空部５
６に連結される。 A vibration-proof foundation 50 is provided in the chamber 34, and a stepper device 52 is provided on the vibration-proof foundation 50. This stepper device 52 is a type of exposure device that uses ultraviolet rays, similar to a projection aligner, to reduce and print a circuit pattern that has been enlarged and drawn on a glass substrate. It is necessary to avoid vibration as much as possible. Anti-vibration foundation 50 as shown in Figures 2 and 3
A part of the concrete foundation floor 28 is formed on a high ground, and the inside is formed hollow. A stepper device 52 is placed on the upper surface of the foundation 50, and is formed into a rectangular shape having a larger area than the stepper device 52. or,
The vibration-proofing foundation stage 54 straddles the vibration-proofing foundation 50, is supported at four locations on the grating floor 32 at the periphery of the vibration-proofing foundation 50, as shown in FIG. 3, and is provided around the stepper device 52. The inside of the vibration-proof foundation stage 54 is formed hollow, and the hollow part 56
are communicated with the room 20 through a plurality of through holes 58 formed in the upper surface of the vibration-proof foundation stage 54.
An intake fan 60 is provided on the side wall of the vibration isolation foundation 50 of the underfloor chamber 34, and the intake fan 60 is connected to the hollow part 5 of the vibration isolation foundation stage 54 via a connecting pipe 62.
6.
前記の如く構成された本発明に係る防振基礎用
ステージによれば、天井室１２の高性能フイルタ
１６を通つて清浄エアが室内に２０に吹き出され
る。清浄エアは下降流となつて床面のグレーチン
グ３２を通り、床下チヤンバ３４内に吸い込まれ
る。これにより室内２０は清浄エアの一定のダウ
ンフローが生じる。この場合に於いて、防振基礎
５０の上方のエアは、防振基礎用ステージ５４の
透孔５８から中空部５６を通つて、吸気フアン６
０により床下チヤンバ３４内に吸い込まれる。こ
れにより室内２０の層流化された清浄エアの気流
は従来のように防振基礎５０の上方及びその周辺
で乱れる虞が少なく、ステツパー装置５２の設置
部分を除いて略一定のダウンフローが得られ、エ
アの滞留域を生じる虞が少なくなる。 According to the vibration-proof foundation stage according to the present invention configured as described above, clean air is blown into the room through the high-performance filter 16 in the ceiling room 12 . The clean air becomes a downward flow, passes through the grating 32 on the floor surface, and is sucked into the underfloor chamber 34. This creates a constant downflow of clean air in the room 20. In this case, the air above the vibration-proof foundation 50 passes through the hollow part 56 from the through hole 58 of the vibration-proof foundation stage 54 to the intake fan 6.
0, it is sucked into the underfloor chamber 34. As a result, the laminar flow of clean air in the room 20 is less likely to be disturbed above and around the anti-vibration foundation 50 unlike in the conventional case, and a substantially constant downflow can be achieved except for the area where the stepper device 52 is installed. This reduces the risk of air stagnation.
又、作業者は防振基礎用ステージ５４上に乗つ
て容易にステツパー装置５２に近付くことがで
き、防振基礎５０に振動を与えることなく作業が
できる。 Further, the operator can easily approach the stepper device 52 by riding on the vibration-isolating foundation stage 54, and can work without imparting vibration to the vibration-isolating foundation 50.
以上説明したように本発明に係る防振基礎用ス
テージによれば、防振基礎用ステージは防振基礎
上を跨いで床に支持され、内部を中空状に形成す
ると共に上面に室内と中空部とを連通する複数の
透孔を形成し、中空部に連結される吸気フアンを
設けて室内エアを透孔及び中空部を介して床下チ
ヤンバに吸気したので、防振基礎の機能を維持し
ながら、防振基礎上の装置類に近接して作業がで
き、防振基礎の上方のエアが滞留して乱れること
がない。
As explained above, according to the vibration-proof foundation stage according to the present invention, the vibration-proof foundation stage is supported on the floor across the vibration-proof foundation, has a hollow interior, and has a chamber and a hollow section on the top surface. By forming multiple through-holes that communicate with the ground, and providing an intake fan connected to the hollow part, indoor air is taken into the underfloor chamber through the through-holes and the hollow part, while maintaining the function of the vibration-proof foundation. , work can be done close to equipment on the vibration-proof foundation, and the air above the vibration-proof foundation will not be stagnant and disturbed.
第１図は本発明に係る防振基礎用ステージが設
けられたクリーンルームの断面図、第２図は本発
明に係る防振基礎用ステージの断面図、第３図は
本発明に係る防振基礎用ステージの上面図であ
る。
１０……クリーンルーム、１６……HEPAフ
イルタ、２０……クリーンルーム室内、５０……
防振基礎、５２……ステツパー装置、５４……防
振基礎用ステージ、５６……中空部、５８……透
孔、６０……吸気フアン、６２……連結管。
FIG. 1 is a cross-sectional view of a clean room equipped with a stage for vibration-proof foundation according to the present invention, FIG. 2 is a cross-sectional view of the stage for vibration-proof foundation according to the present invention, and FIG. 3 is a cross-sectional view of a vibration-proof foundation according to the present invention. FIG. 10...Clean room, 16...HEPA filter, 20...Clean room interior, 50...
Anti-vibration foundation, 52... Stepper device, 54... Stage for anti-vibration foundation, 56... Hollow part, 58... Through hole, 60... Intake fan, 62... Connecting pipe.
Claims (1)
れたエアをグレーチング床を介して床下チヤンバ
内に吸気し、エアのダウンフローが行われるクリ
ーンルームの基礎床に前記グレーチング床と分離
して立設された防振基礎上に設置される防振基礎
用ステージであつて、この防振基礎用ステージは
前記防振基礎を跨いで前記グレーチング床に支持
され、内部を中空状に形成すると共に上面にクリ
ーンルーム室内と中空部とを連通する複数の透孔
を形成し、中空部に連結される吸気フアンを設け
てクリーンルーム室内のエアを透孔及び中空部を
介して床下チヤンバに吸気するようにしたことを
特徴する防振基礎用ステージ。1 An underfloor chamber is formed, and the air blown from the ceiling is sucked into the underfloor chamber via the grating floor, and the air downflow is performed.It is installed on the foundation floor of the clean room, separated from the grating floor. A vibration-proof foundation stage installed on a vibration-proof foundation, which is supported by the grating floor across the vibration-proof foundation, has a hollow interior, and has a clean room interior on the top surface A plurality of through holes are formed to communicate with the hollow part, and an intake fan connected to the hollow part is provided so that air inside the clean room is sucked into the underfloor chamber through the through holes and the hollow part. Anti-vibration foundation stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61131185A JPS62288431A (en) | 1986-06-06 | 1986-06-06 | Stage for aseismatic foundation structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61131185A JPS62288431A (en) | 1986-06-06 | 1986-06-06 | Stage for aseismatic foundation structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62288431A JPS62288431A (en) | 1987-12-15 |
| JPH0510570B2 true JPH0510570B2 (en) | 1993-02-10 |
Family
ID=15052000
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61131185A Granted JPS62288431A (en) | 1986-06-06 | 1986-06-06 | Stage for aseismatic foundation structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62288431A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI232089B (en) * | 2001-10-29 | 2005-05-11 | Advanced System Co Ltd | Quake-absorbing device and installation method therefor |
-
1986
- 1986-06-06 JP JP61131185A patent/JPS62288431A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62288431A (en) | 1987-12-15 |
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