JPH0448541U - - Google Patents

Info

Publication number
JPH0448541U
JPH0448541U JP8945490U JP8945490U JPH0448541U JP H0448541 U JPH0448541 U JP H0448541U JP 8945490 U JP8945490 U JP 8945490U JP 8945490 U JP8945490 U JP 8945490U JP H0448541 U JPH0448541 U JP H0448541U
Authority
JP
Japan
Prior art keywords
substrate
substrate stage
material layer
photosensitive material
vacuum suction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8945490U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8945490U priority Critical patent/JPH0448541U/ja
Publication of JPH0448541U publication Critical patent/JPH0448541U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図および第２図は本考案の一実施例を示す
基板ステージの平面図およびその一部分の拡大断
面図、第３図および第４図は従来の基板ステージ
の平面図およびその一部分の拡大断面図である。 １０……基板支持台、１１……基台、１２……
基板支持プレート、１３……吸気室、１４……吸
気孔、１６……真空吸着孔、Ａ……基板、ａ……
感光材層。 1 and 2 are a plan view and an enlarged sectional view of a part of a substrate stage showing an embodiment of the present invention, and FIGS. 3 and 4 are a plan view and an enlarged sectional view of a part thereof of a conventional substrate stage. It is a diagram. 10...Substrate support stand, 11...Base, 12...
Substrate support plate, 13...Intake chamber, 14...Intake hole, 16...Vacuum suction hole, A...Substrate, a...
Photosensitive material layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板上の感光材層を露光処理する露光装置の基
板ステージにおいて、前記基板を載置する基板支
持台の上面に、微細径の真空吸着孔を多数個点在
状態に設けたことを特徴とする露光装置の基板ス
テージ。 In a substrate stage of an exposure apparatus that exposes a photosensitive material layer on a substrate, a large number of fine-diameter vacuum suction holes are provided in a scattered manner on the upper surface of a substrate support table on which the substrate is placed. Exposure equipment substrate stage.
JP8945490U 1990-08-29 1990-08-29 Pending JPH0448541U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8945490U JPH0448541U (en) 1990-08-29 1990-08-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8945490U JPH0448541U (en) 1990-08-29 1990-08-29

Publications (1)

Publication Number Publication Date
JPH0448541U true JPH0448541U (en) 1992-04-24

Family

ID=31823443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8945490U Pending JPH0448541U (en) 1990-08-29 1990-08-29

Country Status (1)

Country Link
JP (1) JPH0448541U (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913004B1 (en) * 1970-01-13 1974-03-28
JPS56109354A (en) * 1980-02-01 1981-08-29 Yamatoya Shokai:Kk Photosensitive plate equipping device of composer
JPH01291255A (en) * 1988-05-18 1989-11-22 Ono Sokki Co Ltd Method and device for negative film and photosensitive member contacting for exposing machine

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913004B1 (en) * 1970-01-13 1974-03-28
JPS56109354A (en) * 1980-02-01 1981-08-29 Yamatoya Shokai:Kk Photosensitive plate equipping device of composer
JPH01291255A (en) * 1988-05-18 1989-11-22 Ono Sokki Co Ltd Method and device for negative film and photosensitive member contacting for exposing machine

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