JPH044740U - - Google Patents

Info

Publication number
JPH044740U
JPH044740U JP4614790U JP4614790U JPH044740U JP H044740 U JPH044740 U JP H044740U JP 4614790 U JP4614790 U JP 4614790U JP 4614790 U JP4614790 U JP 4614790U JP H044740 U JPH044740 U JP H044740U
Authority
JP
Japan
Prior art keywords
dry etching
chamber
barrel
type dry
etching device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4614790U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4614790U priority Critical patent/JPH044740U/ja
Publication of JPH044740U publication Critical patent/JPH044740U/ja
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図a,bはこの考案の一実施例のバレル型
ドライエツチング装置のチヤンバ構造の側面図お
よび断面図である。第2図a,bは従来のバレル
型ドライエツチング装置のチヤンバ構造の側面図
と断面図である。 1……チヤンバ、2……ウエーハ、3……ボー
ト、4……ガス導入口、5……ガス排気口。
1A and 1B are a side view and a sectional view of a chamber structure of a barrel type dry etching apparatus according to an embodiment of the present invention. FIGS. 2a and 2b are a side view and a sectional view of the chamber structure of a conventional barrel type dry etching apparatus. 1...Chamber, 2...Wafer, 3...Boat, 4...Gas inlet, 5...Gas exhaust port.

Claims (1)

【実用新案登録請求の範囲】 筒形形状のチヤンバー内を真空にし、ガスを流
し、高周波をかけてプラズマを形成してドライエ
ツチング処理するバレル型ドライエツチング装置
において、 上記チヤンバのガス吹出し口および排気口をチ
ヤンバの中心軸に対して放射状に多数配置したこ
とを特徴とするバレル型ドライエツチング装置。
[Scope of Claim for Utility Model Registration] In a barrel-type dry etching device that performs dry etching by creating a vacuum inside a cylindrical chamber, flowing gas, and applying high frequency to form plasma, the gas outlet and exhaust of the chamber are A barrel type dry etching device characterized by a plurality of ports arranged radially around the central axis of the chamber.
JP4614790U 1990-04-26 1990-04-26 Pending JPH044740U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4614790U JPH044740U (en) 1990-04-26 1990-04-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4614790U JPH044740U (en) 1990-04-26 1990-04-26

Publications (1)

Publication Number Publication Date
JPH044740U true JPH044740U (en) 1992-01-16

Family

ID=31560970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4614790U Pending JPH044740U (en) 1990-04-26 1990-04-26

Country Status (1)

Country Link
JP (1) JPH044740U (en)

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