JPH0446347U - - Google Patents
Info
- Publication number
- JPH0446347U JPH0446347U JP8874090U JP8874090U JPH0446347U JP H0446347 U JPH0446347 U JP H0446347U JP 8874090 U JP8874090 U JP 8874090U JP 8874090 U JP8874090 U JP 8874090U JP H0446347 U JPH0446347 U JP H0446347U
- Authority
- JP
- Japan
- Prior art keywords
- sample chamber
- chamber
- preliminary
- exhaust system
- gate valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8874090U JPH0446347U (cs) | 1990-08-24 | 1990-08-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8874090U JPH0446347U (cs) | 1990-08-24 | 1990-08-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0446347U true JPH0446347U (cs) | 1992-04-20 |
Family
ID=31822228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8874090U Pending JPH0446347U (cs) | 1990-08-24 | 1990-08-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0446347U (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003016990A (ja) * | 2001-06-28 | 2003-01-17 | Seiko Instruments Inc | 誘導結合プラズマ質量分析装置 |
| JP2010177004A (ja) * | 2009-01-29 | 2010-08-12 | Hitachi High-Technologies Corp | 真空排気装置、及び真空排気装置を備えた荷電粒子線装置 |
| JP2011154922A (ja) * | 2010-01-28 | 2011-08-11 | Hitachi High-Technologies Corp | 予備排気用真空装置及び荷電粒子線装置 |
-
1990
- 1990-08-24 JP JP8874090U patent/JPH0446347U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003016990A (ja) * | 2001-06-28 | 2003-01-17 | Seiko Instruments Inc | 誘導結合プラズマ質量分析装置 |
| JP2010177004A (ja) * | 2009-01-29 | 2010-08-12 | Hitachi High-Technologies Corp | 真空排気装置、及び真空排気装置を備えた荷電粒子線装置 |
| JP2011154922A (ja) * | 2010-01-28 | 2011-08-11 | Hitachi High-Technologies Corp | 予備排気用真空装置及び荷電粒子線装置 |
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