JPH0445564A - Semiconductor package - Google Patents
Semiconductor packageInfo
- Publication number
- JPH0445564A JPH0445564A JP2152803A JP15280390A JPH0445564A JP H0445564 A JPH0445564 A JP H0445564A JP 2152803 A JP2152803 A JP 2152803A JP 15280390 A JP15280390 A JP 15280390A JP H0445564 A JPH0445564 A JP H0445564A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- semiconductor chip
- heat transfer
- adhesive
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 63
- 239000000853 adhesive Substances 0.000 claims description 37
- 230000001070 adhesive effect Effects 0.000 claims description 37
- 238000009792 diffusion process Methods 0.000 claims description 31
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000004020 conductor Substances 0.000 abstract 9
- 239000011230 binding agent Substances 0.000 abstract 6
- 239000012466 permeate Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体チップを熱拡散板に搭載する技術、特に
、発熱量が大きく且つ熱拡散板に搭載されると共に同一
平面上に搭載されるベースの高さより低い半導体装置を
接合するために用いて効果のある技術に関するものであ
る。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a technology for mounting a semiconductor chip on a heat diffusion plate, particularly a semiconductor chip that generates a large amount of heat and is mounted on a heat diffusion plate and on the same plane. The present invention relates to a technique that can be effectively used to bond semiconductor devices whose height is lower than that of the base.
例えば、半導体装置の1つに、放熱板として機能する熱
拡散板に半導体チップを搭載し、さらに半導体チップを
中心部に露出させた状態で熱拡散板上にピンを立設した
ベースを搭載したパッケージ構造を用いたものがある。For example, one type of semiconductor device has a semiconductor chip mounted on a heat diffusion plate that functions as a heat sink, and a base with pins set up on the heat diffusion plate with the semiconductor chip exposed in the center. Some use a package structure.
ところで、本発明者は、半導体チップの熱拡散板へ接合
する際の温度膨張に起因する諸問題について検討した。By the way, the present inventor has studied various problems caused by temperature expansion when bonding a semiconductor chip to a thermal diffusion plate.
以下は、本発明者によって検討された技術であり、その
概要は次の通りである。The following are the techniques studied by the present inventor, and the outline thereof is as follows.
すなわち、半導体チップの実装密度が高くなると発熱量
が多くなり、何らかの放熱対策が必要になる。このため
、熱拡散板を用いて半導体チップの放熱を行っているが
、熱拡散板と半導体チップとでは熱膨張係数が異なるた
めに、はんだ接続を行うことはできない。That is, as the packaging density of semiconductor chips increases, the amount of heat generated increases, and some kind of heat dissipation measure is required. For this reason, a thermal diffusion plate is used to radiate heat from the semiconductor chip, but since the thermal expansion plate and the semiconductor chip have different coefficients of thermal expansion, solder connection cannot be performed.
そこで、シリコーンゴムなどの柔軟な接着剤を用いて接
合を行っている。これにより、熱拡散板と半導体チップ
の熱膨張係数が異なる場合でも、接合部が剥離したりす
るのを防止することができる。Therefore, bonding is performed using a flexible adhesive such as silicone rubber. Thereby, even if the thermal expansion plate and the semiconductor chip have different coefficients of thermal expansion, it is possible to prevent the bonded portion from peeling off.
この場合、接着剤の層の厚みを厚くすれば熱膨張によっ
て生じる応力を吸収しやすくなるが、逆に熱抵抗が大き
くなって熱拡散が悪くなる。すなわち、一方を良くしよ
うとすれば他方が悪くなる関係にあり、熱膨張と熱抵抗
のかね合いて接着剤の層の厚みを決定する必要がある。In this case, increasing the thickness of the adhesive layer makes it easier to absorb stress caused by thermal expansion, but conversely increases thermal resistance and impairs thermal diffusion. That is, if one is tried to improve, the other becomes worse, and it is necessary to determine the thickness of the adhesive layer by balancing thermal expansion and thermal resistance.
また、熱拡散板に搭載されるベースと半導体チップの各
々の高さ(厚み)が異なる場合(例えば、半導体チップ
が薄く、ベースが厚い場合)、両者間に段差ができてボ
ンディングワイヤが長くなり、短絡や接触を生じる原因
になることから、半導体チップの搭載部分に凸部を設け
て高さを調整している。Also, if the height (thickness) of the base and the semiconductor chip mounted on the heat diffusion plate are different (for example, if the semiconductor chip is thin and the base is thick), a step will be created between them, and the bonding wire will become longer. Since this can cause short circuits or contacts, a protrusion is provided in the mounting area of the semiconductor chip to adjust the height.
ところが、前記の如く接着剤を用いて接合を行う半導体
装萱のパッケージ構造においては、熱拡散板と半導体チ
ップの接合面が共に平坦であるため、この接合面に塗布
した接着剤が厚くなる傾向にある。薄くするために、接
合時に半導体チップに荷重を付与することも行われてい
るが、荷重をかけ過ぎると半導体チップを破損するなど
の事故を招く恐れがあり、適当な厚みを確保することが
難しいという問題のあることが本発明者によって見い出
された。However, in the package structure of a semiconductor device in which bonding is performed using an adhesive as described above, the bonding surface between the heat diffusion plate and the semiconductor chip is both flat, so the adhesive applied to this bonding surface tends to become thick. It is in. In order to make the semiconductor chips thinner, loads are sometimes applied to the semiconductor chips during bonding, but applying too much load can lead to accidents such as damage to the semiconductor chips, making it difficult to ensure an appropriate thickness. The present inventor discovered that there is a problem.
そこで、本発明の目的は、半導体チップの高さ調整と同
時に、十分な熱伝導性及び応力緩和を接着剤を接合に用
いながら達成することのできる技術を提供することにあ
る。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a technique that can adjust the height of a semiconductor chip and at the same time achieve sufficient thermal conductivity and stress relaxation while using an adhesive for bonding.
本発明の前記目的と新規な特徴は、本明細書の記述及び
添付図面から明らかになるであろう。The above objects and novel features of the present invention will become apparent from the description of this specification and the accompanying drawings.
本願において開示される発明のうち、代表的なものの概
要を簡単に説明すれば、以下の通りである。A brief overview of typical inventions disclosed in this application is as follows.
すなわち、ベースが搭載される熱拡散板に一樹脂接着剤
を用いて前記ベースより高さの低い半導体チップが接合
される半導体パッケージであって、前記熱拡散板の前記
半導体チップの搭載領域に前記樹脂接着剤の逃げ部を有
すると共に前記半導体チップを前記ベースに高さ合わせ
する機能を備えた高熱伝導性の伝熱体を配設するように
している。That is, a semiconductor package in which a semiconductor chip having a height lower than that of the base is bonded to a heat diffusion plate on which a base is mounted using a resin adhesive, and the semiconductor chip is attached to a mounting area of the semiconductor chip of the heat diffusion plate using a resin adhesive. A highly thermally conductive heat transfer body having a resin adhesive relief part and a function of adjusting the height of the semiconductor chip to the base is disposed.
上記した手段によれば、熱伝導性に優れ、かつ接着剤逃
げ部を有する伝熱体を熱拡散板と半導体チップの間に配
設し、接合時の接着剤の余剰分を接着剤逃げ部に逃がす
ことにより、接合部には必要最小限の接着剤のみが残さ
れ、接合接着層の厚みを薄くすることができる。したが
って、熱伝導を阻害することがないと共に、熱膨張・に
対する応力吸収及び高さ合わせを達成することができる
。According to the above-mentioned means, a heat transfer body having excellent thermal conductivity and an adhesive relief part is disposed between the heat diffusion plate and the semiconductor chip, and the excess amount of adhesive during bonding is transferred to the adhesive relief part. By allowing the adhesive to escape, only the minimum necessary amount of adhesive remains at the joint, and the thickness of the joint adhesive layer can be reduced. Therefore, heat conduction is not inhibited, and stress absorption against thermal expansion and height adjustment can be achieved.
〔実施例1〕
第1図は本発明による半導体パッケージの一実施例を示
す断面図である。[Embodiment 1] FIG. 1 is a sectional view showing an embodiment of a semiconductor package according to the present invention.
銅などの熱伝導性に優れる金属材料による角板状の熱拡
散板1の中央部には、半導体チップ2が配設され、この
半導体チップ2を囲撓するようにしてベース3(外形が
熱拡散板1に一致し、中央部に半導体チップ2のサイズ
相当の開口が設けられている)が配設される。A semiconductor chip 2 is disposed in the center of a rectangular heat diffusion plate 1 made of a metal material with excellent thermal conductivity such as copper. An opening corresponding to the size of the semiconductor chip 2 is provided in the center of the diffusion plate 1.
この内、ベース3は熱拡散板1に接合材を介して直接に
接合されるが、半導体チップ2は球状伝熱体4 (立方
体)を介して接合される。Among these, the base 3 is directly bonded to the heat diffusion plate 1 via a bonding material, but the semiconductor chip 2 is bonded via a spherical heat transfer body 4 (cube).
すなわち、小径(例えば、0.7〜0.8 uφ)の同
一径で同一材料(金属または高熱伝導性セラミック)の
多数個の球状伝熱体4を熱拡散板1上のチップ搭載領域
に配設し、この球状伝熱体4上に半導体チップ2を接合
するようにしている。That is, a large number of spherical heat transfer bodies 4 having the same diameter and small diameter (for example, 0.7 to 0.8 uφ) and made of the same material (metal or highly thermally conductive ceramic) are arranged in the chip mounting area on the heat diffusion plate 1. The semiconductor chip 2 is bonded onto the spherical heat transfer body 4.
9J1図の実施例を組み立てるに際しては、まず、熱拡
散板1にベース3を接合する。ついで、ベース3の開口
内にシリコーンゴム、銀ベースト(銀粉とエポキシ樹脂
を混合したもの)などによる柔軟な特性の接着剤5を塗
布する。この接着剤塗布面に球状伝熱体4を均一に敷き
つめ、球状伝熱体4に浮きが生じないように押圧する。When assembling the embodiment shown in FIG. 9J1, first, the base 3 is joined to the heat diffusion plate 1. Next, a flexible adhesive 5 such as silicone rubber or silver base (a mixture of silver powder and epoxy resin) is applied inside the opening of the base 3. The spherical heat transfer bodies 4 are spread uniformly on this adhesive-applied surface and pressed so that the spherical heat transfer bodies 4 do not float.
この場合、熱拡散板1に塗った接着剤5の量は、球状伝
熱体40半分より上側にはみ出ない程度にする。In this case, the amount of adhesive 5 applied to the heat diffusion plate 1 is set to such an extent that it does not protrude above half of the spherical heat transfer body 40.
球状伝熱体4が熱拡散板1に固着されたのち、球状伝熱
体4の表面に接着剤5を再度塗布し、ついで半導体チッ
プ2を球状伝熱体4上に載置し、この状態のまま半導体
チップ2を圧下しながら接着剤5を乾燥させる。このの
ち、ベース3に形成されている電極パターンと半導体チ
ップ2上に形成されている電極パターンとをボンディン
グワイヤ6で接続する。After the spherical heat transfer body 4 is fixed to the heat diffusion plate 1, the adhesive 5 is applied again to the surface of the spherical heat transfer body 4, and then the semiconductor chip 2 is placed on the spherical heat transfer body 4. The adhesive 5 is dried while the semiconductor chip 2 is pressed down. Thereafter, the electrode pattern formed on the base 3 and the electrode pattern formed on the semiconductor chip 2 are connected with bonding wires 6.
以上の構成によれば、球状伝熱体4を熱拡散板1に接合
する時には、球状伝熱体4間の下側の隙間に接着剤5が
浸透し、球状伝熱体4は浮き上がりを生じることなく点
接触状態で熱拡散板1に接合している。さらに、球状伝
熱体4と半導体チップ2の接合に際しては、球状伝熱体
4間の上側の隙間に接着剤5が浸透する。これにより、
半導体チップ2は浮き上がりを生じることなく、球状伝
熱体4に対し点接触状態で接合される。According to the above configuration, when bonding the spherical heat transfer bodies 4 to the heat diffusion plate 1, the adhesive 5 penetrates into the lower gap between the spherical heat transfer bodies 4, and the spherical heat transfer bodies 4 are lifted up. It is joined to the heat diffusion plate 1 in a point contact state without any contact. Furthermore, when bonding the spherical heat transfer bodies 4 and the semiconductor chip 2, the adhesive 5 penetrates into the upper gap between the spherical heat transfer bodies 4. This results in
The semiconductor chip 2 is bonded to the spherical heat transfer body 4 in point contact without lifting.
このように、接着剤5の余剰分は球状伝熱体4間の隙間
に浸透し、熱拡散板1及び半導体チップ2の接合部には
必要最小限の接着剤5のみが残り、接合部の接着剤5の
厚みを極めて薄くすることができる。したがって、接合
部の熱抵抗を小さくでき、半導体チップ2で発生した熱
を速やかに熱拡散板1へ逃がすことができる。一方、球
状伝熱体4は、その配列方向く水平方向)に対しては接
着剤5によって束縛されているのみであるため、接着剤
5の伸縮に応じて移動が可能であり、熱膨張に伴う応力
を吸収することができる。In this way, the surplus of the adhesive 5 penetrates into the gap between the spherical heat transfer bodies 4, and only the necessary minimum amount of adhesive 5 remains at the joint between the heat diffusion plate 1 and the semiconductor chip 2, and the The thickness of the adhesive 5 can be made extremely thin. Therefore, the thermal resistance of the joint can be reduced, and the heat generated in the semiconductor chip 2 can be quickly released to the heat diffusion plate 1. On the other hand, since the spherical heat transfer bodies 4 are only bound by the adhesive 5 in the direction in which they are arranged (horizontal direction), they can move according to the expansion and contraction of the adhesive 5, and can be moved due to thermal expansion. The accompanying stress can be absorbed.
なお、球状伝熱体4は直円形のほか、多面体、半円形、
あるいは複数の刺状突起が表面から突出した球体であっ
てもよい。The spherical heat transfer body 4 may be rectangular, polyhedral, semicircular, or
Alternatively, it may be a spherical body with a plurality of thorn-like protrusions protruding from the surface.
〔実施例2〕
第2図は本発明の第2実施例を示す斜視図である。なお
、9J2図においては、第1図と同一であるものには同
一引用数字を用いたので、以下においては重複する説明
を省略する。[Embodiment 2] FIG. 2 is a perspective view showing a second embodiment of the present invention. In addition, in FIG. 9J2, the same reference numerals are used for the same parts as in FIG. 1, so duplicate explanations will be omitted below.
本実施例は、前記実施例の球状伝熱体4に代えて複数の
円筒状伝熱体7(柱状体)を平行に並べて配設するよう
にしたものである。In this embodiment, a plurality of cylindrical heat transfer bodies 7 (columnar bodies) are arranged in parallel in place of the spherical heat transfer bodies 4 of the previous embodiments.
この実施例では、接着剤5の逃げ部分が少なくなるもの
の、熱拡散板1及び半導体チップ2の各々に対して線接
触になるため、熱伝導度を向上させることができる。こ
の場合、円筒状伝熱体7の長さ方向に対しては、接着剤
5の伸縮が拘束されるため、半導体チップ2に加わる応
力は増加する。In this embodiment, although the escape portion of the adhesive 5 is reduced, it is in line contact with each of the heat diffusion plate 1 and the semiconductor chip 2, so that thermal conductivity can be improved. In this case, the expansion and contraction of the adhesive 5 is restricted in the longitudinal direction of the cylindrical heat transfer body 7, so that the stress applied to the semiconductor chip 2 increases.
なお、この実施例の組み立て工程は前記実施例と同一で
あるので説明を省略する。The assembly process of this embodiment is the same as that of the previous embodiment, so the explanation will be omitted.
なお、円筒状伝熱体7は、円筒形のほか円柱形を用いる
ことも可能である。Note that the cylindrical heat transfer body 7 may have a cylindrical shape as well as a cylindrical shape.
〔実施例3〕
第3図は本発明の第3実施例の主要部を示す断面図であ
る。[Embodiment 3] FIG. 3 is a sectional view showing the main part of a third embodiment of the present invention.
本実施例は、前記各実施例が小部品を並べて伝熱体を構
成していたのに対し、板状体に接着剤逃げ部を形成した
ところに特徴がある。すなわち、銅板などによる伝熱体
8にプレス加工などを用いて複数の円板状の突起9を形
成し、この突起9間に生じる隙間を接着剤逃げ部として
用いるものである。The present embodiment is characterized in that, unlike the previous embodiments in which the heat transfer body was constructed by arranging small parts, an adhesive escape portion was formed in the plate-shaped body. That is, a plurality of disc-shaped protrusions 9 are formed on a heat transfer body 8 made of a copper plate or the like using press working or the like, and the gaps created between the protrusions 9 are used as adhesive escape parts.
組み立てに際しては、ベース3を熱拡散板1に搭載した
後、ベース3の開口内に接着剤5を塗布し、ついで伝熱
体8をセットして接合する。こののち、伝熱体80表面
に接着剤を塗布し、半導体チップ2を接合することによ
り組み立てが完成する。During assembly, after the base 3 is mounted on the heat diffusion plate 1, adhesive 5 is applied inside the opening of the base 3, and then the heat transfer body 8 is set and bonded. Thereafter, an adhesive is applied to the surface of the heat transfer body 80 and the semiconductor chip 2 is bonded to complete the assembly.
〔実施例3〕
第4図は本発明の第4実施例の主要部を示す断面図であ
る。[Embodiment 3] FIG. 4 is a sectional view showing the main part of a fourth embodiment of the present invention.
本実施例は、第3図の実施例が伝熱体8に突起9を設け
ていたのに対し、複数の溝10を平行に設けたところに
特徴がある。This embodiment is characterized in that a plurality of grooves 10 are provided in parallel, whereas the embodiment shown in FIG. 3 has protrusions 9 on the heat transfer body 8.
本実施例は第2図の実施例に似た特性を有し、接着剤の
逃げ部分が少なくなるものの、熱拡散板1及び半導体チ
ップ2の各々に対して帯状の接触になるため、第2図の
実施例より更に熱伝導度を向上させることができる。な
お、溝10の長さ方向に対しては、接着剤5の伸縮が拘
束されるため、半導体チップ2に加わる応力は増加する
傾向がある。This embodiment has characteristics similar to the embodiment shown in FIG. 2, and although there are fewer adhesive escaping areas, the second embodiment has strip-like contact with each of the heat diffusion plate 1 and the semiconductor chip 2. Thermal conductivity can be further improved than the embodiment shown in the figure. Note that since expansion and contraction of the adhesive 5 is restricted in the longitudinal direction of the groove 10, the stress applied to the semiconductor chip 2 tends to increase.
なお、この実施例の組み立て工程は前記実施例と同一で
あるので説明を省略する。The assembly process of this embodiment is the same as that of the previous embodiment, so the explanation will be omitted.
以上、本発明者によってなされた発明を実施例に基づき
具体的に説明したが、本発明は前記実施例に限定される
ものではなく、その要旨を逸脱しない範囲で種々変更可
能であることは言うまでもない。Above, the invention made by the present inventor has been specifically explained based on Examples, but it goes without saying that the present invention is not limited to the Examples and can be modified in various ways without departing from the gist thereof. stomach.
例えば、第3図の実施例では突起9を円形にするものと
したが、四角形、多角形、十字形などとしてもよい。For example, in the embodiment shown in FIG. 3, the protrusion 9 is circular, but it may also be rectangular, polygonal, cross-shaped, etc.
また、第4図の実施例では溝10を一方向に平行に設け
るものとしたが、縦横に交差するようにすることもでき
る。このようにすれば、応力緩和を縦、横のいずれの方
向に対しても行うことができる。Further, in the embodiment shown in FIG. 4, the grooves 10 are provided parallel to each other in one direction, but they may also be provided to intersect vertically and horizontally. In this way, stress relaxation can be performed in both the vertical and horizontal directions.
本願において開示される発明のうち、代表的なものによ
って得られる効果を簡単に説明すれば、下記の通りであ
る。Among the inventions disclosed in this application, the effects obtained by typical ones are as follows.
すなわち、ベースが搭載される熱拡散板に樹脂接着剤を
用いて前記ベースより高さの低い半導体チップが接合さ
れる半導体パッケージであって、前記熱拡散板の前記半
導体チップの搭載領域に前記樹脂接着剤の逃げ部を有す
ると共に前記半導体チップを前記ベースに高さ合わせす
る機能を備えた高熱伝導性の伝熱体を配設するようにし
たので、熱伝導を阻害することがないと共に、熱膨張に
対する応力吸収及び高さ合わせを達成することができる
。That is, a semiconductor package in which a semiconductor chip having a height lower than the base is bonded to a heat diffusion plate on which a base is mounted using a resin adhesive, and the resin is bonded to a mounting area of the semiconductor chip of the heat diffusion plate using a resin adhesive. Since a highly thermally conductive heat transfer body is provided which has an adhesive relief part and has a function of aligning the height of the semiconductor chip with the base, it does not impede heat conduction and also prevents heat transfer. Stress absorption and height alignment against expansion can be achieved.
第1図は本発明による半導体パッケージの一実施例を示
す断面図、
第2図は本発明の第2実施例の主要部を示す斜視図、
第3図は本発明のjlK3実施例の主要部を示す断面図
、
第4図は本発明の14実施例の主要部を示す断面図であ
る。
1・・・熱拡散板、2・・・半導体チップ、3・・・ベ
ース、4・・・球状伝熱体、5・・−・接着剤、6・・
・ボンディングワイヤ、7・・・円筒状伝熱体、8・・
・伝熱体、9・・・突起、lO・・・溝。
代理人 弁理士 小 川 勝
第
を
図
第
図
1:円間状伝熱体FIG. 1 is a sectional view showing one embodiment of a semiconductor package according to the present invention, FIG. 2 is a perspective view showing the main parts of the second embodiment of the invention, and FIG. 3 is a main part of the jlK3 embodiment of the invention. FIG. 4 is a sectional view showing the main parts of 14th embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Heat diffusion plate, 2... Semiconductor chip, 3... Base, 4... Spherical heat transfer body, 5... Adhesive, 6...
・Bonding wire, 7... Cylindrical heat transfer body, 8...
- Heat transfer body, 9... protrusion, lO... groove. Representative Patent Attorney Katsuhiro Ogawa Figure 1: Circular heat transfer body
Claims (1)
前記ベースより高さの低い半導体チップが接合される半
導体パッケージであって、前記熱拡散板の前記半導体チ
ップの搭載領域に前記樹脂接着剤の逃げ部を有すると共
に前記半導体チップを前記ベースに高さ合わせする機能
を備えた高熱伝導性の伝熱体を配設することを特徴とす
る半導体パッケージ。 2、前記伝熱体は、柱状体または小径の立方体を敷きつ
めたものであることを特徴とする請求項1記載の半導体
パッケージ。 3、前記伝熱体は、高熱伝導性の板状体の両面に突起ま
たは溝を設けたものであることを特徴とする請求項1記
載の半導体パッケージ。 4、前記伝熱体は、金属または高熱伝導性セラミックで
あることを特徴とする請求項1記載の半導体パッケージ
。[Scope of Claims] 1. A semiconductor package in which a semiconductor chip having a height lower than that of the base is bonded to a heat diffusion plate on which a base is mounted using a resin adhesive, wherein the semiconductor chip of the heat diffusion plate is A semiconductor package characterized in that a highly thermally conductive heat transfer body having a relief part for the resin adhesive and having a function of aligning the height of the semiconductor chip with the base is disposed in a mounting area of the semiconductor package. 2. The semiconductor package according to claim 1, wherein the heat transfer body is a columnar body or a small-diameter cube laid out. 3. The semiconductor package according to claim 1, wherein the heat transfer body is a highly thermally conductive plate-like body with protrusions or grooves provided on both sides. 4. The semiconductor package according to claim 1, wherein the heat transfer body is a metal or a highly thermally conductive ceramic.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2152803A JPH0445564A (en) | 1990-06-13 | 1990-06-13 | Semiconductor package |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2152803A JPH0445564A (en) | 1990-06-13 | 1990-06-13 | Semiconductor package |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0445564A true JPH0445564A (en) | 1992-02-14 |
Family
ID=15548500
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2152803A Pending JPH0445564A (en) | 1990-06-13 | 1990-06-13 | Semiconductor package |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0445564A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07300608A (en) * | 1992-11-19 | 1995-11-14 | Kct Technol Gmbh | Blowing mathod for oxidizing gas into molten metal |
-
1990
- 1990-06-13 JP JP2152803A patent/JPH0445564A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07300608A (en) * | 1992-11-19 | 1995-11-14 | Kct Technol Gmbh | Blowing mathod for oxidizing gas into molten metal |
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