JPH0440802B2 - - Google Patents

Info

Publication number
JPH0440802B2
JPH0440802B2 JP60129464A JP12946485A JPH0440802B2 JP H0440802 B2 JPH0440802 B2 JP H0440802B2 JP 60129464 A JP60129464 A JP 60129464A JP 12946485 A JP12946485 A JP 12946485A JP H0440802 B2 JPH0440802 B2 JP H0440802B2
Authority
JP
Japan
Prior art keywords
powder
copper
acid
weight
organic compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60129464A
Other languages
Japanese (ja)
Other versions
JPS61288308A (en
Inventor
Shigeru Sekya
Koshiro Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP12946485A priority Critical patent/JPS61288308A/en
Publication of JPS61288308A publication Critical patent/JPS61288308A/en
Publication of JPH0440802B2 publication Critical patent/JPH0440802B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 本発明はセラミツク基板との接着力に優れた導
電被膜を形成するための厚膜導体組成物の改善に
関する。 〔従来の技術〕 厚膜導体組成物は、銀、金、白金、パラジウム
等の貴金属の単体、これらの合金のうちの少なく
とも一つの粉末65〜93重量%と、ガラス粉末及
び/又は酸化ビスマス粉末0.5〜5重量%を、有
機酸ビヒクル6.5〜30重量%と共に混練したペー
スト状の組成物で、セラミツク基板上にスクリー
ン印刷等の手段を塗布し、750〜950℃の温度で焼
成すれば、上記貴金属及び/又は合金粉末はガラ
ス及び/又は酸化ビスマスを介して基板上に固着
され、導電被膜を形成するようになつており、半
導体素子を接合するための被膜形成用に、又、電
気回路や抵抗体の電極用等によく用いられてい
る。このような導電被膜のセラミツク基板との接
着力は重要な特性であり、この接着力はCuO、
Cu2Oを少量添加することにより改善される。と
ころがCuO、Cu2Oを添加した厚膜導体組成物に
より導電被膜を形成すると、該被膜表面に微小な
黒色斑点が現われることがある。この斑点は分析
の結果、酸化銅であることが判明し、添加した
CuO、Cu2O粉末が均一に分散されていないため
ではないかと考えられるが、このような斑点の存
在は外観上好ましくないばかりでなく、半田の付
着を妨げ、半導体単子の接合の障害となるので、
斑点を形成する恐れが無い組成物が望まれてい
た。 〔発明が解決しようとする問題点〕 本発明の目的は、上記従来の欠点を解消し、導
電被膜に酸化銅の斑点を生じる恐れのない厚膜導
体組成物を提供することにある。 〔問題点を解決するための手段〕 この目的を達成するため本発明の組成物は、
CuO、Cu2O粉末を用いる代わりに銅有機化合物
を用い、該塩をCuO換算で0.2〜5重量%含有せ
しめた点に特徴がある。 本発明に用いることができる銅有機化合物とし
て、ステアリン酸、オレイン酸、酪酸、蟻酸、乳
酸、ラウリン酸、サルチル酸、クエン酸、シユウ
酸、酒石酸、ナフテン酸、オクチル酸、安息香
酸、アセチルアセトン等の銅塩が挙げられる。こ
れらの銅有機化合物は通常固体であり、適当な有
機溶媒に溶解して添加する。 通常の厚膜組成物には有機質ビヒクルとして、
エチルセルロースをターピネオール、ブチルカル
ビトールアセテート等の溶媒に溶解したものが用
いられるが、この溶媒に溶解される銅有機化合物
は固体のまゝ添加しても良い。この溶媒に溶解し
ない銅有機化合物の溶解にはエタノール、メタノ
ール等のアルコール類、ピリジン、エーテル、ベ
ンゼン等を用いるとよい。蒸発し易い溶媒を用い
ると、大気中で組成物を製造する際に該溶媒が蒸
発して銅有機化合物が析出するが、析出粒子が微
細になるので何ら差支えはない。 本発明において銅有機化合物はCuO換算で0.2
〜5重量%含有せしめる必要がある。0.2重量%
未満では焼成膜と基板との接着力が充分でなく、
又、5重量%を超えると焼成膜の半田の濡れ性が
低下したり、半導体素子の接合性が低下したりす
るからである。 このような銅有機化合物を含有する厚膜導体組
成物をセラミツク基板に塗布し、乾燥後750〜950
℃で焼成すると銅有機化合物は分解して酸化銅と
なるが、前記乾燥により銅有機化合物が乾燥膜中
に均一に分散析出される結果、視認し得る大きさ
の斑点を形成することは無い。又、この酸化銅が
均一に分散された状態で生成する結果、焼成膜と
セラミツク基板との間に介在する酸化銅の分布も
又均一となり、強度のバラツキを小さくする効果
もある。 〔実施例〕 平均粒径2μmの粒状金粉、平均粒径3μmの銀粉
及び平均粒径0.1μmのパラジウム粉を用い、平均
粒径3.4μmの硼硅酸沿ガラス(Pbo60、B2O310、
SiO230各重量%)粉末と、酸化銅源とターピネ
オールにエチルセルロースを12重量%含有せしめ
た有機酸ビヒクルとを3本ロールミルで混練して
ペースト状とし、該ペーストを2.5cm角のAl2O3
板上に10mm角のパターンでスクリーン印刷し、
125℃で10分間乾燥後、金ペーストは900℃、銀−
パラジウム及び銀ペーストは850℃で焼成し、焼
成膜の外観、特性を評価した。金被膜は外観と、
Siチツプとの接合性、銀−パラジウム及び銀被膜
は外観と、半田濡れ性を評価した。Siチツプとの
接合性、半田濡れ性は次のような試験に依つた。 (i) Siチツプとの接合性 ダイボンダーを用いて上記金被膜上に1.5mm
角のSiチツプを接合した後、該Siチツプの剥離
強度を測定した。この強度が5Kg以上を〇、2
Kg以下を×、中間を△とした。 (ii) 半田濡れ性 230℃の半田溶上にAl2O3基板を浮べ、被膜
上にフラツクスを滴下し、直径4mm、高さ2.85
mmの60Sn/40Pb半田ペレツトを乗せて半田を
10秒間熔融し、冷却後半田の広がりの大きさを
測定した。直径6mm以上を〇、5mm以下を×と
し、中間を△とした。 又、外観の評価は、酸化銅源無添加のものを
標準試料として比較の基準とし、変色、色ムラ
のあるものは△、斑点が視認されるものを×、
標準試料と同等と認められるものを〇とした。 ペースト組成及び焼成膜の評価結果と第1表に
まとめて示す。
[Industrial Field of Application] The present invention relates to an improvement in a thick film conductor composition for forming a conductive film with excellent adhesive strength to a ceramic substrate. [Prior Art] A thick film conductor composition includes 65 to 93% by weight of a powder of at least one of noble metals such as silver, gold, platinum, and palladium, and alloys thereof, and glass powder and/or bismuth oxide powder. A paste composition prepared by kneading 0.5 to 5% by weight with 6.5 to 30% by weight of an organic acid vehicle is applied onto a ceramic substrate by means such as screen printing, and baked at a temperature of 750 to 950°C. Precious metal and/or alloy powder is fixed onto a substrate via glass and/or bismuth oxide to form a conductive film, and is used for forming a film for bonding semiconductor elements, and for electrical circuits and It is often used for electrodes of resistors, etc. The adhesive strength of such a conductive film to the ceramic substrate is an important property, and this adhesive strength is
This can be improved by adding a small amount of Cu 2 O. However, when a conductive film is formed using a thick film conductor composition containing CuO or Cu 2 O, minute black spots may appear on the surface of the film. As a result of analysis, this speck was found to be copper oxide, and it was added.
It is thought that this is because the CuO and Cu 2 O powders are not uniformly dispersed, but the presence of such spots not only has an unfavorable appearance, but also impedes solder adhesion and impedes the bonding of semiconductor single molecules. So,
A composition without the risk of spotting was desired. [Problems to be Solved by the Invention] An object of the present invention is to eliminate the above-mentioned conventional drawbacks and to provide a thick film conductor composition that does not cause copper oxide spots on the conductive film. [Means for solving the problem] In order to achieve this object, the composition of the present invention has the following features:
It is characterized in that a copper organic compound is used instead of CuO or Cu 2 O powder, and the salt is contained in an amount of 0.2 to 5% by weight in terms of CuO. Copper organic compounds that can be used in the present invention include stearic acid, oleic acid, butyric acid, formic acid, lactic acid, lauric acid, salicylic acid, citric acid, oxalic acid, tartaric acid, naphthenic acid, octylic acid, benzoic acid, acetylacetone, etc. Examples include copper salts. These copper organic compounds are usually solid, and are added after being dissolved in a suitable organic solvent. Typical thick film compositions include organic vehicles such as
Ethyl cellulose dissolved in a solvent such as terpineol or butyl carbitol acetate is used, but the copper organic compound dissolved in this solvent may be added in a solid state. Alcohols such as ethanol and methanol, pyridine, ether, benzene, etc. may be used to dissolve organic copper compounds that do not dissolve in this solvent. If a solvent that easily evaporates is used, the solvent will evaporate and the copper organic compound will be precipitated when the composition is produced in the atmosphere, but there is no problem since the precipitated particles will be fine. In the present invention, the copper organic compound is 0.2 in terms of CuO.
It is necessary to contain up to 5% by weight. 0.2% by weight
If it is less than that, the adhesion between the fired film and the substrate will not be sufficient.
Moreover, if the content exceeds 5% by weight, the solder wettability of the fired film will decrease, and the bonding properties of semiconductor elements will decrease. A thick film conductor composition containing such a copper organic compound is applied to a ceramic substrate, and after drying,
When fired at 0.degree. C., the copper organic compound decomposes into copper oxide, but as a result of the drying, the copper organic compound is uniformly dispersed and precipitated in the dried film, so that no visible spots are formed. Furthermore, as the copper oxide is produced in a uniformly dispersed state, the distribution of the copper oxide interposed between the fired film and the ceramic substrate is also uniform, which has the effect of reducing variations in strength. [Example] Using granular gold powder with an average particle size of 2 μm, silver powder with an average particle size of 3 μm, and palladium powder with an average particle size of 0.1 μm, borosilicate glass powder with an average particle size of 3.4 μm (Pbo60, B 2 O 3 10,
SiO 2 (30% by weight each) powder and an organic acid vehicle containing 12% by weight of ethyl cellulose in a copper oxide source and terpineol were kneaded in a three-roll mill to form a paste, and the paste was mixed into a 2.5 cm square Al 2 O 3Screen print a 10mm square pattern on the board,
After drying at 125°C for 10 minutes, the gold paste was heated to 900°C, silver-
The palladium and silver pastes were fired at 850°C, and the appearance and characteristics of the fired films were evaluated. The gold coating improves the appearance and
Bondability with Si chips, appearance of silver-palladium and silver coatings, and solder wettability were evaluated. Bondability with Si chips and solder wettability were determined by the following tests. (i) Bondability with Si chip Using a die bonder, attach a 1.5mm
After the corner Si chips were bonded, the peel strength of the Si chips was measured. This strength is 5Kg or more 〇, 2
Kg or less was marked ×, and the middle one was marked △. (ii) Solder wettability Floating the Al 2 O 3 substrate on the solder melt at 230℃, dropping flux onto the film, diameter 4 mm, height 2.85
Place a 60Sn/40Pb solder pellet of mm and solder.
After melting for 10 seconds and cooling, the size of the spread of the solder was measured. A diameter of 6 mm or more is marked as ○, a diameter of 5 mm or less is marked as ×, and a diameter in between is marked as △. In addition, for the evaluation of the appearance, a standard sample with no copper oxide source added was used as a standard for comparison, and those with discoloration or uneven color were rated △, and those with visible spots were rated ×,
Those that are recognized to be equivalent to the standard sample are marked as 〇. The paste composition and evaluation results of the fired film are summarized in Table 1.

【表】【table】

【表】 第1表からCuOに代えて銅有機化合物の添加に
より外観、Siチツプ接合性、半田濡れ性が改善さ
れること、添加量が多過ぎると外観、半田濡れ性
が低下するので好ましくないことが判る。 〔発明の効果〕 本発明によれば、Siチツプ接合、半田付けに有
害な酸化銅の斑点が形成されず、セラミツク基板
との接着力の優れた導電被膜を形成することがで
きる。
[Table] Table 1 shows that adding a copper organic compound instead of CuO improves the appearance, Si chip bondability, and solder wettability; adding too much is not preferable because the appearance and solder wettability deteriorate. I understand that. [Effects of the Invention] According to the present invention, spots of copper oxide harmful to Si chip bonding and soldering are not formed, and a conductive film with excellent adhesive strength to a ceramic substrate can be formed.

Claims (1)

【特許請求の範囲】[Claims] 1 銀、金、白金、パラジウム等の貴金属の単
体、これらの合金のうち少なくとも一つの粉末
と、ガラス粉末及び/又は酸化ビスマス粉末を、
有機質ビヒクルと共に混練した厚膜導体組成物に
おいて、銅有機化合物をCuO換算で0.2〜5重量
%含有することを特徴とする厚膜導体組成物。
1. Elemental precious metals such as silver, gold, platinum, palladium, powder of at least one of their alloys, and glass powder and/or bismuth oxide powder,
1. A thick film conductor composition kneaded with an organic vehicle, which contains a copper organic compound in an amount of 0.2 to 5% by weight in terms of CuO.
JP12946485A 1985-06-13 1985-06-13 Thick film conductor composition Granted JPS61288308A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12946485A JPS61288308A (en) 1985-06-13 1985-06-13 Thick film conductor composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12946485A JPS61288308A (en) 1985-06-13 1985-06-13 Thick film conductor composition

Publications (2)

Publication Number Publication Date
JPS61288308A JPS61288308A (en) 1986-12-18
JPH0440802B2 true JPH0440802B2 (en) 1992-07-06

Family

ID=15010138

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12946485A Granted JPS61288308A (en) 1985-06-13 1985-06-13 Thick film conductor composition

Country Status (1)

Country Link
JP (1) JPS61288308A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8383011B2 (en) * 2008-01-30 2013-02-26 Basf Se Conductive inks with metallo-organic modifiers

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3293501A (en) * 1964-11-24 1966-12-20 Sprague Electric Co Ceramic with metal film via binder of copper oxide containing glass
JPS4916893A (en) * 1972-04-20 1974-02-14
JPS5546294A (en) * 1978-09-22 1980-03-31 Du Pont Gold conductor composition
JPS6166305A (en) * 1984-09-07 1986-04-05 田中マツセイ株式会社 Conductor composition
JPS61245406A (en) * 1985-04-24 1986-10-31 昭和電工株式会社 Conducting paste

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3293501A (en) * 1964-11-24 1966-12-20 Sprague Electric Co Ceramic with metal film via binder of copper oxide containing glass
JPS4916893A (en) * 1972-04-20 1974-02-14
JPS5546294A (en) * 1978-09-22 1980-03-31 Du Pont Gold conductor composition
JPS6166305A (en) * 1984-09-07 1986-04-05 田中マツセイ株式会社 Conductor composition
JPS61245406A (en) * 1985-04-24 1986-10-31 昭和電工株式会社 Conducting paste

Also Published As

Publication number Publication date
JPS61288308A (en) 1986-12-18

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