JPH0439601B2 - - Google Patents
Info
- Publication number
- JPH0439601B2 JPH0439601B2 JP58094016A JP9401683A JPH0439601B2 JP H0439601 B2 JPH0439601 B2 JP H0439601B2 JP 58094016 A JP58094016 A JP 58094016A JP 9401683 A JP9401683 A JP 9401683A JP H0439601 B2 JPH0439601 B2 JP H0439601B2
- Authority
- JP
- Japan
- Prior art keywords
- gap
- mask
- pattern
- opaque
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005259 measurement Methods 0.000 claims description 51
- 239000000758 substrate Substances 0.000 claims description 13
- 238000001514 detection method Methods 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 238000005286 illumination Methods 0.000 claims description 9
- 238000010586 diagram Methods 0.000 description 17
- 239000011295 pitch Substances 0.000 description 15
- 230000007246 mechanism Effects 0.000 description 13
- 238000000034 method Methods 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Transform (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58094016A JPS59220605A (ja) | 1983-05-30 | 1983-05-30 | プロキシミテイ露光装置における間隙制御装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58094016A JPS59220605A (ja) | 1983-05-30 | 1983-05-30 | プロキシミテイ露光装置における間隙制御装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59220605A JPS59220605A (ja) | 1984-12-12 |
| JPH0439601B2 true JPH0439601B2 (enrdf_load_stackoverflow) | 1992-06-30 |
Family
ID=14098700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58094016A Granted JPS59220605A (ja) | 1983-05-30 | 1983-05-30 | プロキシミテイ露光装置における間隙制御装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59220605A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0820209B2 (ja) * | 1992-06-05 | 1996-03-04 | スタンレー電気株式会社 | 光学的測定装置 |
-
1983
- 1983-05-30 JP JP58094016A patent/JPS59220605A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59220605A (ja) | 1984-12-12 |
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