JPS59220605A - プロキシミテイ露光装置における間隙制御装置 - Google Patents

プロキシミテイ露光装置における間隙制御装置

Info

Publication number
JPS59220605A
JPS59220605A JP58094016A JP9401683A JPS59220605A JP S59220605 A JPS59220605 A JP S59220605A JP 58094016 A JP58094016 A JP 58094016A JP 9401683 A JP9401683 A JP 9401683A JP S59220605 A JPS59220605 A JP S59220605A
Authority
JP
Japan
Prior art keywords
gap
wafer
mask
pattern
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58094016A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0439601B2 (enrdf_load_stackoverflow
Inventor
Yukio Kenbo
行雄 見坊
Tomohiro Kuji
久邇　朝宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58094016A priority Critical patent/JPS59220605A/ja
Publication of JPS59220605A publication Critical patent/JPS59220605A/ja
Publication of JPH0439601B2 publication Critical patent/JPH0439601B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Transform (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58094016A 1983-05-30 1983-05-30 プロキシミテイ露光装置における間隙制御装置 Granted JPS59220605A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58094016A JPS59220605A (ja) 1983-05-30 1983-05-30 プロキシミテイ露光装置における間隙制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58094016A JPS59220605A (ja) 1983-05-30 1983-05-30 プロキシミテイ露光装置における間隙制御装置

Publications (2)

Publication Number Publication Date
JPS59220605A true JPS59220605A (ja) 1984-12-12
JPH0439601B2 JPH0439601B2 (enrdf_load_stackoverflow) 1992-06-30

Family

ID=14098700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58094016A Granted JPS59220605A (ja) 1983-05-30 1983-05-30 プロキシミテイ露光装置における間隙制御装置

Country Status (1)

Country Link
JP (1) JPS59220605A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658713A (ja) * 1992-06-05 1994-03-04 Stanley Electric Co Ltd 光学的測定装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658713A (ja) * 1992-06-05 1994-03-04 Stanley Electric Co Ltd 光学的測定装置

Also Published As

Publication number Publication date
JPH0439601B2 (enrdf_load_stackoverflow) 1992-06-30

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