JPH0435867U - - Google Patents
Info
- Publication number
- JPH0435867U JPH0435867U JP7792190U JP7792190U JPH0435867U JP H0435867 U JPH0435867 U JP H0435867U JP 7792190 U JP7792190 U JP 7792190U JP 7792190 U JP7792190 U JP 7792190U JP H0435867 U JPH0435867 U JP H0435867U
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- sides
- substrate
- polishing
- abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 8
- 238000005498 polishing Methods 0.000 claims description 6
- 238000010586 diagram Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7792190U JPH0435867U (OSRAM) | 1990-07-23 | 1990-07-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7792190U JPH0435867U (OSRAM) | 1990-07-23 | 1990-07-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0435867U true JPH0435867U (OSRAM) | 1992-03-25 |
Family
ID=31620741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7792190U Pending JPH0435867U (OSRAM) | 1990-07-23 | 1990-07-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0435867U (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004082890A1 (ja) * | 2003-03-20 | 2004-09-30 | Shin-Etsu Handotai Co. Ltd. | ウエーハ保持用キャリア並びにそれを用いた両面研磨装置及びウエーハの両面研磨方法 |
| JP2016022542A (ja) * | 2014-07-17 | 2016-02-08 | 信越半導体株式会社 | ウェーハ保持用キャリア並びにそれを用いたウェーハの両面研磨方法及びウェーハ保持用キャリアの評価方法並びに設計方法 |
-
1990
- 1990-07-23 JP JP7792190U patent/JPH0435867U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004082890A1 (ja) * | 2003-03-20 | 2004-09-30 | Shin-Etsu Handotai Co. Ltd. | ウエーハ保持用キャリア並びにそれを用いた両面研磨装置及びウエーハの両面研磨方法 |
| JP2016022542A (ja) * | 2014-07-17 | 2016-02-08 | 信越半導体株式会社 | ウェーハ保持用キャリア並びにそれを用いたウェーハの両面研磨方法及びウェーハ保持用キャリアの評価方法並びに設計方法 |
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