JPH04353407A - Mold for plastics - Google Patents

Mold for plastics

Info

Publication number
JPH04353407A
JPH04353407A JP12793691A JP12793691A JPH04353407A JP H04353407 A JPH04353407 A JP H04353407A JP 12793691 A JP12793691 A JP 12793691A JP 12793691 A JP12793691 A JP 12793691A JP H04353407 A JPH04353407 A JP H04353407A
Authority
JP
Japan
Prior art keywords
mold
fluorine
chemical formula
weight
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP12793691A
Other languages
Japanese (ja)
Inventor
Toshiyuki Kanno
敏之 管野
Junichi Iwabuchi
岩渕 順一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP12793691A priority Critical patent/JPH04353407A/en
Publication of JPH04353407A publication Critical patent/JPH04353407A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a thin film which has excellent uniformity, wettability, adhesion strength, mold release property, durability, nonadhesiveness on plastics, productivity, etc. CONSTITUTION:A mold for forming plastics is provided, wherein a mold-release thin film containing fluorine, which has, as principal component, a mixture of monomers, oligomers and polymer compounds having radical polymerization fluorine compounds and (meta)acryloyl groups, as end groups, and which is formed by radiation polymerization, is formed over the surface of a cavity of the mold.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、電気・電子部品、光学
部品等における高分子物質の成型の際に用いられるプラ
スチック成形型に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plastic mold used for molding polymeric materials for electrical/electronic parts, optical parts, etc.

【0002】0002

【従来の技術】近年、軽量化,精度化及び生産性等を向
上する上でプラスチックの成型技術はめざましく、特に
オプトエレクトロニクス分野におけるプラスチック成形
技術への要求は多大である。
BACKGROUND OF THE INVENTION In recent years, plastic molding technology has made remarkable progress in reducing weight, increasing precision, and improving productivity, and there is particularly great demand for plastic molding technology in the field of optoelectronics.

【0003】その一つとして、成型加工時における離型
剤の開発が進められている。離型剤の利用方法としては
、成型する高分子物質内への内添法、あるいはスタンパ
−又は金型本体等へ離型剤をコ−ティングする方法とが
ある。離型剤としては、シリコ−ンオイル,鉱物油,パ
ラフィンワックス脂肪酸エステル等の誘導体,グリコ−
ル,タルク,マイカ等が使用されている。また、近年で
は、パ−フルオロアルキル基含有リン酸エステル又はそ
の塩とシリコンオイルとの混合物(特公昭53−232
70号,特公昭53−23271号)、特公昭57−4
8035等、パ−フルオロアルキル基含有ポリエ−テル
化合物とシリコンオイル物との混合物(特公昭59−3
2513号)を始め、シリコ−ンオイル系(特開昭63
−153510 号,特開昭62−59672号,特開
昭62−59672号)、フッ素化合物(特開昭61−
35910号,特開昭62−21512号,特開昭62
−25914号、特開平1−157808号,特開昭6
3−104804 号,特開平1−291908号,特
開平2−125708号,特開平2−141210号)
が主流となっている。更に、上記離型剤は他の高分子物
質と混合して溶媒系で希釈し、ディピング法,エアレス
・スプレ−法,静電スプレ−塗装法及びエアゾ−ルスプ
レ−法等によって金型表面に形成したり、スパッタリン
グ法等ドライ法で金型表面に被覆形成する方法(特開平
1−166914号)する方法も提案されている。
[0003] As one of these efforts, the development of mold release agents during molding processing is progressing. Methods for using the mold release agent include adding it internally into the polymer material to be molded, or coating the stamper or mold body with the mold release agent. As a mold release agent, silicone oil, mineral oil, derivatives such as paraffin wax fatty acid ester, glycol
talc, mica, etc. are used. In addition, in recent years, mixtures of perfluoroalkyl group-containing phosphoric esters or their salts and silicone oil (Japanese Patent Publication No. 53-232
70, Special Publication No. 53-23271), Special Publication No. 57-4
8035, etc., a mixture of a perfluoroalkyl group-containing polyether compound and a silicone oil (Japanese Patent Publication No. 59-3
No. 2513), silicone oil type (JP-A No. 63
-153510, JP-A No. 62-59672, JP-A No. 62-59672), fluorine compounds (JP-A No. 61-Sho.
No. 35910, JP-A-62-21512, JP-A-62
-25914, JP-A-1-157808, JP-A-6
3-104804, JP 1-291908, JP 2-125708, JP 2-141210)
has become the mainstream. Furthermore, the above mold release agent is mixed with other polymeric substances, diluted with a solvent system, and formed on the mold surface by dipping, airless spraying, electrostatic spraying, aerosol spraying, etc. Alternatively, a method has been proposed in which a coating is formed on the mold surface by a dry method such as a sputtering method (Japanese Patent Application Laid-Open No. 166914/1999).

【0004】0004

【発明が解決しようとする課題】しかしながら、従来の
プラスチック成形型は、次に述べる問題点があった。 (1) 金型本体に対する離型剤の密着性が悪く、離型
効果が初期はあるが、徐々に低下するため、数回したら
その都度塗布しなければならない。
[Problems to be Solved by the Invention] However, conventional plastic molds have the following problems. (1) The adhesion of the mold release agent to the mold body is poor, and although the mold release effect is initially effective, it gradually decreases, so it must be applied each time after several times.

【0005】(2) 離型剤を金型本体にコ−ティング
する際、ハジキ,タレ等が発生しやすい。しかるに、今
後オプトエレクトニクス等において形状が複雑で高度な
精度成型を要求される傾向にある。また、プラスチック
レンズをはじめ、光メモリ用基板等における光学的性及
び精度成形においては、金型等への密着性,離型繰り返
し性,成型温度に対する耐久性,成型高分子物質の性質
(光学的性質等)等においていまだ十分な離型コ−ティ
ング剤が現状上では見当たらない。
(2) When coating a mold body with a mold release agent, cissing, sagging, etc. are likely to occur. However, in the future, optoelectronics and the like will require complex shapes and highly precise molding. In addition, regarding the optical properties and precision molding of plastic lenses, optical memory substrates, etc., we also consider adhesion to molds, repeatability of mold release, durability against molding temperatures, properties of molded polymer materials (optical properties), etc. etc.), etc., there is currently no sufficient release coating agent available.

【0006】本発明は上記事情に鑑みてなされたもので
、ラジカル重合性フッ素系化合物と末端基(メタ)アク
ロイル基を有したモノマ−,オリゴマ−及びポリマ−化
合物の混合物を主成分とし、かつ放射線重合法により形
成されるフッ素含有離型薄膜を金型のキャビティ表面に
設けることにより、被覆表面の均一性・ぬれ性、密着性
、離型性、耐久性、合成樹脂との非貼付き性、生産性等
に優れ、かつ転写による成形物への悪影響を回避しえる
プラスチック成形型を提供することを目的とする。
The present invention has been made in view of the above circumstances, and consists mainly of a mixture of a radically polymerizable fluorine-based compound and a monomer, oligomer, or polymer compound having a terminal (meth)acroyl group, and By providing a fluorine-containing mold release thin film formed by radiation polymerization on the mold cavity surface, coating surface uniformity, wettability, adhesion, mold releasability, durability, and non-sticking property with synthetic resins are achieved. It is an object of the present invention to provide a plastic mold that has excellent productivity and can avoid adverse effects on molded products due to transfer.

【0007】[0007]

【課題を解決するための手段】本発明は、金型のキャビ
ティ表面に、ラジカル重合性フッ素系化合物と末端基(
メタ)アクロイル基を有したモノマ−,オリゴマ−及び
ポリマ−化合物の混合物を主成分とし、かつ放射線重合
法により形成されるフッ素含有離型薄膜を設けたことを
具備することを特徴とするプラスチック成形型である。
[Means for Solving the Problems] The present invention provides a radically polymerizable fluorine-based compound and a terminal group (
Plastic molding, characterized in that the main component is a mixture of monomers, oligomers and polymer compounds having meta)acroyl groups, and is provided with a fluorine-containing mold release thin film formed by radiation polymerization. It is a type.

【0008】本発明において、ラジカル重合性フッ素系
化合物としては、下記[化1],[化2],[化3],
[化4],[化5],[化6],[化7],[化8],
[化9],[化10]等が挙げられる。
In the present invention, the radically polymerizable fluorine compounds include the following [Chemical formula 1], [Chemical formula 2], [Chemical formula 3],
[Chem. 4], [C. 5], [C. 6], [C. 7], [C. 8],
Examples include [Chemical Formula 9] and [Chemical Formula 10].

【0009】[0009]

【化1】[Chemical formula 1]

【0010】0010

【化2】[Case 2]

【0011】[0011]

【化3】[Chemical formula 3]

【0012】0012

【化4】[C4]

【0013】[0013]

【化5】[C5]

【0014】[0014]

【化6】[C6]

【0015】[0015]

【化7】[C7]

【0016】[0016]

【化8】[Chemical formula 8]

【0017】[0017]

【化9】[Chemical formula 9]

【0018】[0018]

【化10】[Chemical formula 10]

【0019】また、上記ラジカル重合性フッ素系化合物
として、公知合成法マクロモノマ−即ち分子鎖の片末端
に重合性の官能基を持つオリゴマ−を少なくても一つの
原料成分として製造されたものでフッ素系マクロモノマ
−が挙げられる。フルオロアルキル基のアルキル基が4
〜20のものが好ましく、例えば下記[化11]が挙げ
られる。
The above-mentioned radically polymerizable fluorine-based compound is produced using a known synthesis method using a macromonomer, that is, an oligomer having a polymerizable functional group at one end of the molecular chain, as at least one raw material component. Examples include macromonomers. The alkyl group of the fluoroalkyl group is 4
-20 is preferable, and the following [chemical formula 11] is mentioned, for example.

【0020】[0020]

【化11】[Chemical formula 11]

【0021】更に、上記フッ素系マクロモノマ−につい
て述べると、上記フルオロモノマ−をチオグリコ−ル酸
共存下にラジカル重合して分子量1000〜10000
 の片末端カルボン酸プレポリマ−を得、メタクリル酸
グリシ−ジルとの反応により(メタ)アクリル酸エステ
ル基を有するフッ素系マクロモノマ−及びグラフトポリ
マ−が得られる。
Furthermore, regarding the above fluorine-based macromonomer, the above fluoromonomer is radically polymerized in the coexistence of thioglycolic acid to obtain a molecular weight of 1,000 to 10,000.
A one-terminated carboxylic acid prepolymer is obtained, and a fluorine-based macromonomer and a graft polymer having a (meth)acrylic acid ester group are obtained by reaction with glycidyl methacrylate.

【0022】本発明では、マクロモノマ−法で得られた
含有フッ素マクロモノマ−及びその誘導体が次に述べる
(メタ)アクロイル基放射重合型モノマ−、オリゴマ−
及びポリマ−との相溶性が良好であった。放射製重合型
(メタ)アクロイル基モノマ−,オリゴマ−,及びポリ
マ−とは、単官能型,多官能型があり、例えば下記に述
べるものが挙げられる。 (1) エポキシアクリレ−ト系;例えば下記[化12
]が挙げられる。
In the present invention, the fluorine-containing macromonomer and its derivatives obtained by the macromonomer method are used as the following (meth)acroyl group radiation polymerizable monomers and oligomers.
and had good compatibility with the polymer. Radiation polymerizable (meth)acroyl group monomers, oligomers, and polymers include monofunctional and polyfunctional types, such as those described below. (1) Epoxy acrylate system; for example, the following [Chemical formula 12
].

【0023】[0023]

【化12】 (2) ウレタンアクリレ−ト系;例えば下記[化13
],[化14]が挙げられる。
[Chemical 12] (2) Urethane acrylate system; for example, the following [Chemical 13
], [Chemical formula 14].

【0024】[0024]

【化13】[Chemical formula 13]

【0025】[0025]

【化14】 (3) ポリエヌテルアクリレ−ト;例えば下記[化1
5]が挙げられる。
[Chemical 14] (3) Polyester acrylate; For example, the following [Chemical 1
5].

【0026】[0026]

【化15】[Chemical formula 15]

【0027】(4) ポリエ−テルアクリレ−ト,(5
) ビニル/アクリレ−ト,(6) ポリエン/チホ−
ル,(7) ポリブタジエン系等、及びフッ素化エポキ
シアクリレ−ト(Proceeding of  Ra
diation  Curing ASIA,1LI,
p69 ,1869)等多数のオリゴマ−をはじめ、ビ
ドロキシエチルアクレ−ト,アリルアクリレ−ト等の単
官能モノマ−、ネオペンチルグルコ−ルジアクリレ−ト
,テトラエチレングリコ−ルジアクリレ−ト等の2多官
能モノマ−、ペンタエリスリト−ルトリアクリレ−ト及
びトリメチルロ−ルプロパントリアクレ−トの3官能モ
ノマ−、及びジペンタエリスリト−ルヘキサアクリレ−
トの6官能モノマ−等多種のモノマ−,オリゴマ−が挙
げられる。
(4) Polyether acrylate, (5
) vinyl/acrylate, (6) polyene/thipho
(7) Polybutadiene, etc., and fluorinated epoxy acrylate (Proceeding of Ra
diation Curing ASIA, 1LI,
p69, 1869), monofunctional monomers such as bidroxyethyl acrylate and allyl acrylate, and dipolyfunctional monomers such as neopentyl glycol diacrylate and tetraethylene glycol diacrylate. -, trifunctional monomers of pentaerythritol triacrylate and trimethylolpropane triacrylate, and dipentaerythritol hexaacrylate
Various types of monomers and oligomers can be mentioned, such as a hexafunctional monomer.

【0028】本発明において、フッ素含有離型薄膜をプ
ラスチック成形用スタンパ−あるいは金型表面に形成す
る方法としては、スプレ−法、静電塗装法、ディピ−ク
法、ハケ刷り法及びスピンナ−法等が挙げられる。図1
はスピンコ−ト機の概略図を示すもので、1は回転テ−
ブル2を支持する回転軸、3は前記回転テ−ブル2の上
面に例えば両面テ−プにより接着されたワ−ク、4はカ
バ−、5は滴下ロ−トを示す。
In the present invention, methods for forming a fluorine-containing mold release thin film on the surface of a stamper or mold for plastic molding include a spray method, an electrostatic coating method, a deep coating method, a brushing method, and a spinner method. etc. Figure 1
1 shows a schematic diagram of a spin coating machine, and 1 shows a rotating table.
3 is a workpiece adhered to the upper surface of the rotary table 2 with double-sided tape, 4 is a cover, and 5 is a dropping funnel.

【0029】前記フッ素含有離型薄膜は、放射線重合法
例えば電子線重合あるいは紫外線重合法(UV法)によ
り架橋反応型膜を形成する。なお、紫外線重合法を用い
る場合は、ラジカル重合性フッ素系化合物と末端基(メ
タ)アクロイル基を有したモノマ−,オリゴマ−及びポ
リマ−化合物の混合物に紫外線開始剤を用いる必要があ
る。また、更によりレベリング性を向上させるために、
例えば下記[化16]の添加剤を加えてもよい。
The fluorine-containing release thin film is formed into a crosslinking reaction type film by radiation polymerization, such as electron beam polymerization or ultraviolet polymerization (UV method). In addition, when using the ultraviolet polymerization method, it is necessary to use an ultraviolet initiator in the mixture of the radically polymerizable fluorine-based compound and the monomer, oligomer, and polymer compound having a terminal (meth)acroyl group. In addition, in order to further improve leveling performance,
For example, the following additive [Chemical formula 16] may be added.

【0030】[0030]

【化16】 なお、上記添加剤の代わりにフッ素レベリング剤等の一
般の添加剤を加えてもよい。
embedded image In place of the above additives, general additives such as a fluorine leveling agent may be added.

【0031】[0031]

【作用】本発明によれば、被覆表面の均一性・ぬれ性、
密着性、離型性、耐久性、合成樹脂との非貼付き性、生
産性等に優れ、かつ転写による成形物への悪影響を回避
しえるプラスチック成形型が得られる。
[Operation] According to the present invention, the uniformity and wettability of the coating surface,
A plastic mold can be obtained that has excellent adhesion, releasability, durability, non-stick properties with synthetic resin, productivity, etc., and can avoid adverse effects on molded products due to transfer.

【0032】[0032]

【実施例】以下、本発明の実施例について製造方法を併
記して説明する。 (実施例1)
[Examples] Examples of the present invention will be described below along with manufacturing methods. (Example 1)

【0033】まず、カメラのスクリ−ン成形用のフレネ
ルレンズのピッチが0.05mmのCrメッキをしたフ
レネル入れ子面上に、下記組成の離型コ−ティング液を
スピンナ−法で回転数1200ppmの振切り速度で膜
厚約400オングストロ−ム(40nm)形成させ、オ
−ク製作所紫外線照射(集光型160W/cm2 )を
2灯を30m/minの条件で走査して膜を架橋反応さ
せた。   イソシアマル酸誘導体とポリイソシアネ−ト化合物
との反応物(大日インキ社製、商品名;ユニティック1
8−845M)                  
      …46重量部  トリメチロ−ルプロパン
トリアクリレ−ト                 
 …20重量部  ネオペンチルグリコ−ルジアクリレ
−ト                    …10
重量部  光重合開始剤(インガ−キュア651 /2
−クロルチオキサントン/ベンゾイソブチルエ−テル=
6/3/2)                   
               …6重量部  パ−フ
ルオロアルキルアクリレ−ト(下記[化17])   
     …13重量部  リン酸誘導体(商品名;カ
ヤマ−PM2 、日本化薬株式会社製)…4重量部
First, on the Cr-plated Fresnel nesting surface of a Fresnel lens for camera screen molding with a pitch of 0.05 mm, a release coating liquid having the following composition was applied using a spinner method at a rotation speed of 1200 ppm. A film with a thickness of approximately 400 angstroms (40 nm) was formed at a shaking speed, and the film was subjected to a crosslinking reaction by scanning two OAK Seisakusho ultraviolet irradiation lamps (concentrated type 160 W/cm2) at a speed of 30 m/min. . Reaction product of isocyanalic acid derivative and polyisocyanate compound (manufactured by Dainichi Ink Co., Ltd., product name: Unitic 1
8-845M)
...46 parts by weight trimethylolpropane triacrylate
...20 parts by weight Neopentyl glycol diacrylate ...10
Parts by weight Photopolymerization initiator (Ingarcure 651/2
-Chlorthioxanthone/benzoisobutyl ether=
6/3/2)
...6 parts by weight perfluoroalkyl acrylate (Chemical formula 17 below)
...13 parts by weight Phosphoric acid derivative (trade name: Kayama-PM2, manufactured by Nippon Kayaku Co., Ltd.)...4 parts by weight

【0
034】   レベリング剤(下記[化18])        
                         
0.5重量部上記コ−ティング組成物をフロン系溶剤S
−12/酢酸エチル/IPA(混合比=4:4:2)の
混合溶剤で固定分3%で上記スピンコ−ト法で塗布し高
圧水銀灯で架橋反応させた。
0
034 Leveling agent (below [Chemical formula 18])

0.5 parts by weight of the above coating composition was mixed with fluorocarbon solvent S.
A mixed solvent of -12/ethyl acetate/IPA (mixing ratio = 4:4:2) was applied with a fixed content of 3% by the spin coating method described above, and a crosslinking reaction was carried out using a high-pressure mercury lamp.

【0035】[0035]

【化17】[Chemical formula 17]

【0036】[0036]

【化18】[Chemical formula 18]

【0037】上記のようにして得られるプラスチック金
型は、金型表面に、上記組成物を塗布して得られるフッ
素含有離型薄膜を形成した構成になっている。こうした
金型によれば、次のような効果を有する。 (1) 均一な膜が形成され、酢酸レジンによるプレネ
ルレンズ形状の転写性が良好である。 (2) 金型への密着性が良好である。 (3) 上記(1) ,(2) によりショット成形回
数が非常に良好である。 (4) 離型性が良好である。 (実施例2)
The plastic mold obtained as described above has a structure in which a fluorine-containing mold release thin film obtained by applying the above composition is formed on the surface of the mold. Such a mold has the following effects. (1) A uniform film is formed, and the transferability of the prenel lens shape by the acetic acid resin is good. (2) Good adhesion to the mold. (3) Due to the above (1) and (2), the number of shot molding times is very good. (4) Good mold releasability. (Example 2)

【0038】まず、下記[化19]を200重量部,ベ
ンゾトリフルオライド200重量部を滴下ロ−トに仕込
み、もう一方のロ−トに3−メルカプトプロピオン酸7
.1重量部,アゾビスイソブチロニトリル4重量部及び
ベンゾトリフルオライド100重量部の混合液を入れた
。次に、N2 中で70℃,約4時間反応させてフルオ
ロアクリレ−トの重合添加率約96%とし、つづいて反
応液を昇温し2時間還流した後冷却して溶液温度を90
℃に保った。更に、ここへハイドロキノンモノメチルエ
−テル0.1重量部,グリシジルメタクリレ−ト13.
95重量部,テトラブチルアンモニウムブロマイド2.
5gを添加した。この後、N2 ガスから空気を吹き込
みに切り換えて90℃,6時間反応させ、この反応液を
10倍量以上のメタトルに投入して沈殿させ、減圧乾燥
によりフッ素系マクロモノマ−を得た。
First, 200 parts by weight of the following [Chemical formula 19] and 200 parts by weight of benzotrifluoride were charged into a dropping funnel, and 3-mercaptopropionic acid 7 was added to the other funnel.
.. A mixed solution of 1 part by weight, 4 parts by weight of azobisisobutyronitrile, and 100 parts by weight of benzotrifluoride was added. Next, a reaction was carried out at 70°C for about 4 hours in N2 to achieve a polymerization addition rate of fluoroacrylate of about 96%.The reaction solution was then heated to reflux for 2 hours, and then cooled to bring the solution temperature to 90%.
It was kept at ℃. Furthermore, 0.1 parts by weight of hydroquinone monomethyl ether and 13 parts by weight of glycidyl methacrylate were added thereto.
95 parts by weight, tetrabutylammonium bromide 2.
5g was added. Thereafter, the reaction was carried out at 90° C. for 6 hours by switching from N2 gas to air blowing, and the reaction solution was poured into 10 times the amount of methanol or more to precipitate, and a fluorine-based macromonomer was obtained by drying under reduced pressure.

【0039】[0039]

【化19】 上記フッ素系マクロモノマ−            
                    …60重量
部ジペンタエリスリト−ルヘキサアクリレ−ト    
              …10重量部オリゴエス
テルアクリレ−ト(商品名;アロニックス−7200 
X、東亜合成化学工業株式会社製)         
                         
          …10重量部ネオペンチルグリコ
−ルジアクリレ−ト                
      …10重量部日本化学株式会社製の商品名
;カヤマ−PM2                 
…  5重量部光重合開始剤(実施例1と同様)   
                         
…  5重量部
[Chemical formula 19] The above fluorine-based macromonomer
...60 parts by weight dipentaerythritol hexaacrylate
...10 parts by weight oligoester acrylate (product name: Aronix-7200
X, manufactured by Toagosei Chemical Industry Co., Ltd.)

...10 parts by weight neopentyl glycol diacrylate
...10 parts by weight Product name: Kayama-PM2 manufactured by Nippon Kagaku Co., Ltd.
... 5 parts by weight photopolymerization initiator (same as Example 1)

... 5 parts by weight

【0040】上記コ−ティング組成物を
酢酸エチル/トルエン/IPA(混合比率=6:3:2
)で固定分2%で、1.6μmピッチ,5インチ用光デ
ィスクのスタンパ−上に回転数1500rpmでスピン
コ−ト法で表面に離型膜を形成した。この後、実施例1
と同様、高圧水銀灯を用いて硬化させた。また、光重合
開始剤を除いてEB硬化法により架橋反応させても良好
な膜を得ることができた。
The above coating composition was mixed with ethyl acetate/toluene/IPA (mixing ratio = 6:3:2).
), a release film was formed on the surface of a 1.6 μm pitch, 5-inch optical disk stamper by spin coating at a rotation speed of 1500 rpm. After this, Example 1
Similarly, it was cured using a high-pressure mercury lamp. Further, even when the photopolymerization initiator was omitted and the crosslinking reaction was carried out by the EB curing method, a good film could be obtained.

【0041】上記スタンパ−を用い、アクリルレジン又
はポリカ−ボレジンを用いて成形したところ、実施例1
と同様、成形性,耐久性,密着性,離型性及び光特性的
に優れていた。
[0041] When the above stamper was used to mold acrylic resin or polycarbonate resin, Example 1 was obtained.
Similarly, it was excellent in moldability, durability, adhesion, mold releasability, and optical properties.

【0042】[0042]

【発明の効果】以上詳述した如く本発明によれば、ラジ
カル重合性フッ素系化合物と末端基(メタ)アクロクル
基を有したモノマ−,オリゴマ−及びポリマ−化合物の
混合物を主成分とし、かつ放射線重合法により形成され
るフッ素含有離型薄膜をスタンパ−あるいは金型表面に
設けることにより、被覆表面の均一性・ぬれ性、密着性
、離型性、耐久性、合成樹脂との非貼付き性、生産性等
に優れ、かつ転写による成形物への悪影響を回避しえる
プラスチック成形型を提供できる。
Effects of the Invention As detailed above, according to the present invention, the main component is a mixture of a radically polymerizable fluorine compound and a monomer, oligomer, or polymer compound having a terminal (meth)acrylic group, and By providing a fluorine-containing mold release thin film formed by radiation polymerization on the stamper or mold surface, the coated surface can be improved in uniformity, wettability, adhesion, mold releasability, durability, and non-sticking with synthetic resin. It is possible to provide a plastic mold that has excellent performance, productivity, etc., and can avoid adverse effects on molded products due to transfer.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明に係る金型本体にフッ素含有離型薄膜を
形成する際に用いられるスピンコ−ト機の説明図。
FIG. 1 is an explanatory diagram of a spin coating machine used when forming a fluorine-containing mold release thin film on a mold body according to the present invention.

【符号の説明】[Explanation of symbols]

1…回転軸、2…回転テ−ブル、3…ワ−ク、4…カバ
−。
1... Rotating shaft, 2... Rotating table, 3... Work, 4... Cover.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  金型のキャビティ表面に、ラジカル重
合性フッ素系化合物と末端基(メタ)アクロイル基を有
したモノマ−,オリゴマ−及びポリマ−化合物の混合物
を主成分とし、かつ放射線重合法により形成されるフッ
素含有離型薄膜を設けたことを具備することを特徴とす
るプラスチック成形型。
Claim 1: The surface of the mold cavity is coated with a radically polymerizable fluorine-based compound and a mixture of monomers, oligomers, and polymer compounds having terminal (meth)acroyl groups as the main components, and is produced by radiation polymerization. A plastic mold comprising a fluorine-containing mold release thin film.
【請求項2】  前記ラジカル重合性フッ素系化合物は
、マクロモノマ−法により得られるラジカル重合性フッ
素系化合物である請求項1記載のプラスチック成形型。
2. The plastic mold according to claim 1, wherein the radically polymerizable fluorine compound is a radically polymerizable fluorine compound obtained by a macromonomer method.
JP12793691A 1991-05-30 1991-05-30 Mold for plastics Withdrawn JPH04353407A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12793691A JPH04353407A (en) 1991-05-30 1991-05-30 Mold for plastics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12793691A JPH04353407A (en) 1991-05-30 1991-05-30 Mold for plastics

Publications (1)

Publication Number Publication Date
JPH04353407A true JPH04353407A (en) 1992-12-08

Family

ID=14972302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12793691A Withdrawn JPH04353407A (en) 1991-05-30 1991-05-30 Mold for plastics

Country Status (1)

Country Link
JP (1) JPH04353407A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002283354A (en) * 2001-03-27 2002-10-03 Daikin Ind Ltd Mold for imprint processing and method for manufacturing the same
WO2012018043A1 (en) * 2010-08-06 2012-02-09 綜研化学株式会社 Resin mold for nanoimprinting

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002283354A (en) * 2001-03-27 2002-10-03 Daikin Ind Ltd Mold for imprint processing and method for manufacturing the same
JP4524943B2 (en) * 2001-03-27 2010-08-18 ダイキン工業株式会社 Method for forming pattern of semiconductor element and method for manufacturing mold for imprint processing
WO2012018043A1 (en) * 2010-08-06 2012-02-09 綜研化学株式会社 Resin mold for nanoimprinting
CN103052492A (en) * 2010-08-06 2013-04-17 综研化学株式会社 Resin mold for nanoimprinting
JP5292621B2 (en) * 2010-08-06 2013-09-18 綜研化学株式会社 Resin mold for nanoimprint
US9393737B2 (en) 2010-08-06 2016-07-19 Soken Chemical & Engineering Co., Ltd. Resin mold for nanoimprinting

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