JPH043486A - Dielectric substrate for semiconductor device - Google Patents
Dielectric substrate for semiconductor deviceInfo
- Publication number
- JPH043486A JPH043486A JP10382490A JP10382490A JPH043486A JP H043486 A JPH043486 A JP H043486A JP 10382490 A JP10382490 A JP 10382490A JP 10382490 A JP10382490 A JP 10382490A JP H043486 A JPH043486 A JP H043486A
- Authority
- JP
- Japan
- Prior art keywords
- grooves
- dielectric substrate
- bubbles
- heat sink
- metallized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- 239000000758 substrate Substances 0.000 title claims abstract description 20
- 239000003990 capacitor Substances 0.000 claims description 2
- 229910000679 solder Inorganic materials 0.000 abstract description 3
- 230000003449 preventive effect Effects 0.000 abstract 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- IHWJXGQYRBHUIF-UHFFFAOYSA-N [Ag].[Pt] Chemical compound [Ag].[Pt] IHWJXGQYRBHUIF-UHFFFAOYSA-N 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
Landscapes
- Structure Of Printed Boards (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体装置用誘電体基板に関し、特にICやト
ランジスタなどの半導体素子を搭載し、かつ、放熱板に
実装される誘電体基板に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a dielectric substrate for semiconductor devices, and particularly to a dielectric substrate on which semiconductor elements such as ICs and transistors are mounted and mounted on a heat sink.
従来、この種の半導体装置用誘電体基板は、第3図(a
)、 (b)に示す構造となっていた。すなわち、セラ
ミック等の誘電体基板本体1の表、裏面は、金、銀、パ
ラジウム、銀−白金などでメタライズされ、特に第3図
(a)に示す裏面は、接地面に使用される為、全面メタ
ライズ6が施され、スルーホール3を通して、第3図(
b)に示す表面の接地パターンと接続されている。なお
表面側には、半導体素子、コンデンサ、抵抗、インダク
タ等の回路素子が搭載され、増幅回路、スイッチング回
路等の回路を構成するためのメタライズパターン2が形
成され、裏面のメタライズ6は、半田、金・すす等のろ
う材を用い放熱板に固着される。しかして、表面に搭載
した半導体素子10を動作させた時に発生する熱は、基
板を通して放熱板へ放散される。Conventionally, this type of dielectric substrate for semiconductor devices is shown in FIG.
) and (b). That is, the front and back surfaces of the dielectric substrate body 1 made of ceramic or the like are metalized with gold, silver, palladium, silver-platinum, etc., and in particular, the back surface shown in FIG. 3(a) is used as a ground plane. The entire surface is metallized 6, and through the through hole 3, as shown in Fig. 3 (
It is connected to the ground pattern on the surface shown in b). Note that on the front side, circuit elements such as semiconductor elements, capacitors, resistors, and inductors are mounted, and a metallized pattern 2 for configuring circuits such as an amplifier circuit and a switching circuit is formed, and the metallized pattern 6 on the back side is formed using solder, It is fixed to the heat sink using a brazing material such as gold or soot. Thus, the heat generated when the semiconductor element 10 mounted on the surface is operated is radiated to the heat sink through the substrate.
この従来の誘電体基板は、裏面が全面メタライズされて
いる為、基板を放熱板に固着する際、基板と放熱板の間
に気泡が入り込む。この気泡が半導体素子搭載部の直下
にある場合、半導体素子を動作させた際に発生する熱が
十分に放熱板に伝わらなくなり、熱抵抗の増大をまねき
、強いては半導体素子が熱暴走するという問題があった
。Since the back surface of this conventional dielectric substrate is entirely metallized, air bubbles enter between the substrate and the heat sink when the substrate is fixed to the heat sink. If these bubbles are located directly under the semiconductor element mounting area, the heat generated when the semiconductor element is operated will not be sufficiently transferred to the heat sink, leading to an increase in thermal resistance, which may lead to thermal runaway of the semiconductor element. was there.
上記課題に対し本発明の半導体装置用誘電体基板は、放
熱板に固着するための基板裏面のメタライズ層を、一方
向だけまたは縦横二方向の溝により複数の小領域に分離
した各面一杯に形成し、放熱板に固着するときに気泡が
入り込まないようにしている。In order to solve the above problems, the dielectric substrate for semiconductor devices of the present invention has a metallized layer on the back surface of the substrate for fixing to a heat sink, which is divided into a plurality of small areas by grooves in one direction or in two directions, and is divided into a plurality of small areas. This prevents air bubbles from entering when forming and fixing to the heat sink.
つぎに本発明を実施例により説明する。 Next, the present invention will be explained by examples.
第1図(a)、 (b)はそれぞれ本発明の一実施例の
裏面および表面の平面図である。第1図(b)において
、表面メタライズパターン2上に、半導体素子10等の
回路素子が搭載され、スルーホール3を通して裏面メタ
ライズ層4に電気的に接続される。第1図(a)の裏面
メタライズ層4は、縦方向の3本の平行溝7により四つ
の短冊状の小領域に分離されている。この基板を放熱板
に半田等を用いて固着する際に、入り込もうとする気泡
は溝7の部分で逃がされるので、気泡が残らなくなる。FIGS. 1(a) and 1(b) are plan views of the back and front surfaces of an embodiment of the present invention, respectively. In FIG. 1(b), a circuit element such as a semiconductor element 10 is mounted on the front metallized pattern 2, and is electrically connected to the back metallized layer 4 through a through hole 3. The back metallized layer 4 in FIG. 1(a) is separated into four small strip-shaped regions by three parallel grooves 7 in the vertical direction. When this substrate is fixed to a heat dissipation plate using solder or the like, any air bubbles that try to enter are allowed to escape through the grooves 7, so that no air bubbles remain.
なお、溝7は、半導体素子ICIの搭載部の下部に配置
しない様設計する。Note that the groove 7 is designed so as not to be placed below the mounting portion of the semiconductor element ICI.
第2図は本発明の第2実施例の裏面を示す平面図である
。第2図において、裏面には縦横両方向に溝8が設けら
れ、この溝8により四つの小領域に分離されており、こ
の小領域面一面にメタライズ層5が形成されている。本
例は第1図の実施例に比べ、溝は複雑であるが、その分
気泡混入防止効果はよい。FIG. 2 is a plan view showing the back side of a second embodiment of the present invention. In FIG. 2, grooves 8 are provided in both vertical and horizontal directions on the back surface, and the grooves 8 separate the semiconductor device into four small regions, and a metallized layer 5 is formed over the surface of each of the small regions. Although the grooves in this example are more complex than those in the example shown in FIG. 1, the effect of preventing air bubbles from entering is correspondingly better.
以上説明したように本発明は、誘電体基板裏面に気泡逃
がし用の溝を形成しているので、従来半導体素子搭載部
下部にたまたま入り込む1〜25−程度の気泡(半導体
素子は0.25−程度の大きさ)をなくすことができ、
従って、気泡による半導体素子の熱抵抗の劣化及び熱暴
走を回避することがてきる効果がある。As explained above, in the present invention, a groove for air bubble release is formed on the back surface of the dielectric substrate. degree) can be eliminated,
Therefore, it is possible to avoid deterioration of the thermal resistance of the semiconductor element and thermal runaway due to air bubbles.
第1図は本発明の一実施例で、第1図(a)はその裏面
、(b)は表面を示す平面図、第2図は本発明の他の実
施例の裏面を示す平面図、第3図(a)。
(b)はそれぞれ従来の誘電体基板の裏面および表面を
示す平面図である。
1・・・・・・基板本体、2・・・・・・表面メタライ
ズパターン、3・・・・・・スルーホール、4.5.6
・・・・・・裏面メタライズ層、7,8・・・・・・溝
、10・・・・・・半導体素子。
代理人 弁理士 内 原 晋
茅 3 回FIG. 1 shows one embodiment of the present invention, FIG. 1(a) is a plan view showing the back surface thereof, FIG. 1(b) is a plan view showing the front surface, and FIG. 2 is a plan view showing the back surface of another embodiment of the present invention. Figure 3(a). (b) is a plan view showing the back surface and front surface of a conventional dielectric substrate, respectively. 1... Board body, 2... Surface metallized pattern, 3... Through hole, 4.5.6
...Back surface metallized layer, 7, 8... Groove, 10... Semiconductor element. Agent: Patent Attorney Shinkyo Uchihara 3 times
Claims (1)
抵抗やコンデンサなどの受動回路素子などを搭載するた
めのメタライズパターンを有し、裏面側にスルーホール
を通して前記表面側の接地パターンに接続されたメタラ
イズ層とを有する半導体装置用誘電体基板において、前
記裏面のメタライズ層は、一方向または縦横二方向の溝
により複数の領域に分離された各面一杯に形成されてい
ることを特徴とする半導体装置用誘電体基板。The front side has a metallized pattern for mounting semiconductor elements such as transistors and ICs, passive circuit elements such as resistors and capacitors, etc., and the back side has a metallized layer connected to the ground pattern on the front side through through holes. A dielectric substrate for a semiconductor device having a dielectric substrate for a semiconductor device, wherein the metallized layer on the back surface is formed entirely on each surface separated into a plurality of regions by grooves in one direction or two directions vertically and horizontally. body substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10382490A JPH043486A (en) | 1990-04-19 | 1990-04-19 | Dielectric substrate for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10382490A JPH043486A (en) | 1990-04-19 | 1990-04-19 | Dielectric substrate for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH043486A true JPH043486A (en) | 1992-01-08 |
Family
ID=14364164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10382490A Pending JPH043486A (en) | 1990-04-19 | 1990-04-19 | Dielectric substrate for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH043486A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5739659A (en) * | 1994-06-06 | 1998-04-14 | Nsk Ltd. | Position detecting apparatus and method therefor |
-
1990
- 1990-04-19 JP JP10382490A patent/JPH043486A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5739659A (en) * | 1994-06-06 | 1998-04-14 | Nsk Ltd. | Position detecting apparatus and method therefor |
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