JPH04346354A - Dip coating method for electrophotographic photoconductor - Google Patents
Dip coating method for electrophotographic photoconductorInfo
- Publication number
- JPH04346354A JPH04346354A JP11872491A JP11872491A JPH04346354A JP H04346354 A JPH04346354 A JP H04346354A JP 11872491 A JP11872491 A JP 11872491A JP 11872491 A JP11872491 A JP 11872491A JP H04346354 A JPH04346354 A JP H04346354A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- cylindrical substrate
- coating liquid
- buffer disk
- dip coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003618 dip coating Methods 0.000 title claims description 20
- 238000000576 coating method Methods 0.000 claims abstract description 89
- 239000011248 coating agent Substances 0.000 claims abstract description 88
- 239000007788 liquid Substances 0.000 claims abstract description 44
- 239000000758 substrate Substances 0.000 claims description 25
- 108091008695 photoreceptors Proteins 0.000 claims description 24
- 239000000049 pigment Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 230000005484 gravity Effects 0.000 claims description 7
- 239000006185 dispersion Substances 0.000 claims description 6
- 239000002612 dispersion medium Substances 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 5
- 230000007547 defect Effects 0.000 abstract description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- -1 azo compound Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
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- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
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- 238000011156 evaluation Methods 0.000 description 3
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- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
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- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004420 Iupilon Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- LZBCVRCTAYKYHR-UHFFFAOYSA-N acetic acid;chloroethene Chemical compound ClC=C.CC(O)=O LZBCVRCTAYKYHR-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- 229940102253 isopropanolamine Drugs 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- SJHHDDDGXWOYOE-UHFFFAOYSA-N oxytitamium phthalocyanine Chemical compound [Ti+2]=O.C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 SJHHDDDGXWOYOE-UHFFFAOYSA-N 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- WMOVHXAZOJBABW-UHFFFAOYSA-N tert-butyl acetate Chemical compound CC(=O)OC(C)(C)C WMOVHXAZOJBABW-UHFFFAOYSA-N 0.000 description 1
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- 125000005259 triarylamine group Chemical group 0.000 description 1
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Landscapes
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は電子写真感光体の製造方
法に関し、特に光導電性層の塗布方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an electrophotographic photoreceptor, and more particularly to a method for coating a photoconductive layer.
【0002】0002
【従来の技術】電子写真感光体のごとく円筒状の基体上
に感光層等の薄膜を有するものを製造するには必要な化
学組成物を溶液とし、基体上に塗布乾燥する方法が広く
行われている。[Prior Art] In order to manufacture a thin film such as a photosensitive layer on a cylindrical substrate such as an electrophotographic photoreceptor, a method is widely used in which the necessary chemical composition is made into a solution, coated on the substrate and dried. ing.
【0003】この場合、基体円筒部の全面にむらのない
均一な厚みの層を形成することが重要である。In this case, it is important to form a layer of uniform thickness over the entire surface of the cylindrical portion of the base.
【0004】こうした層を形成し得る塗布方法として、
特開昭59−139967号に塗布液流入開口の上方に
円板または円錐体を配置して塗布液の流れを均一にする
方法が開示されているが、近年のレーザビームプリンタ
用感光体ドラムにはその均一性はなお不充分であり、塗
布むらによる画像欠陥が検知される。[0004] As a coating method that can form such a layer,
JP-A-59-139967 discloses a method of disposing a disk or a cone above the coating liquid inflow opening to make the flow of the coating liquid uniform; however, in recent years photosensitive drums for laser beam printers have However, the uniformity is still insufficient, and image defects due to uneven coating are detected.
【0005】又、特開昭60−146240号、同63
−104059号及び特開平3−20747号には浸漬
塗布槽内に撹拌部材を設け塗布むらを防止することが示
されている。しかしいずれも塗布槽内の塗布液をオーバ
フローさせるかあるいは液面を一定にさせつつ塗布する
方法に比べて塗布液の塵等による汚染に対して重大な弱
点を有する。[0005] Also, JP-A-60-146240 and JP-A-63
No. 104059 and Japanese Unexamined Patent Publication No. 3-20747 disclose that a stirring member is provided in the dip coating tank to prevent uneven coating. However, both methods have a serious weakness in terms of contamination of the coating liquid by dust, etc., compared to methods in which the coating liquid in the coating tank overflows or is applied while keeping the liquid level constant.
【0006】[0006]
【発明の目的】本発明の第一の目的は、塗布むらに基づ
く画像欠陥を抑止することにある。特にレーザビームプ
リンタ用の感光体として反転現像を行った場合、僅かの
塗布むらでさえも検知されるのでこれら欠陥を抑止する
ことにある。OBJECTS OF THE INVENTION The first object of the present invention is to suppress image defects caused by uneven coating. In particular, when reversal development is performed as a photoreceptor for a laser beam printer, even slight coating unevenness can be detected, so the purpose is to suppress these defects.
【0007】第二の目的は、繰返し使用した場合の画像
欠陥を抑止することにある。初期に於ては見出されなか
った塗布むらも多数回複写後には出現するからである。[0007] The second purpose is to prevent image defects when used repeatedly. This is because coating unevenness that was not found in the initial stage appears after many copies have been made.
【0008】第三の目的は、高温高湿下あるいは低温下
での使用に於ても画像欠陥の発生しない感光体を提供す
ることにある。A third object is to provide a photoreceptor that does not cause image defects even when used under high temperature, high humidity or low temperature conditions.
【0009】第四の目的は、チタニルフタロシアニンの
ような顔料分散液を塗布した感光体等の高感度感光体に
対して画像欠陥のない感光体を提供することにある。A fourth object is to provide a highly sensitive photoreceptor, such as a photoreceptor coated with a pigment dispersion such as titanyl phthalocyanine, which is free from image defects.
【0010】0010
【発明の構成】前記本発明の目的は;電子写真感光体の
製造に円筒状基体を用い、オーバフロー或は塗布持去り
減量を補給して塗布槽の塗布液面位を一定に保って円筒
状基体を引上げ塗布する浸漬塗布において、25℃にお
ける粘度30cp以下の塗布液を用い、塗布槽底部の塗
布液流入開口部と円筒状基体端との間に、塗布液流を整
流する整流板及び/又は塗布液流の円筒状基体端面への
直接の突当りを緩和する緩衝円板を設けることを特徴と
する電子写真感光体の浸漬塗布法によって達成される。[Structure of the Invention] The object of the present invention is to use a cylindrical substrate in the production of an electrophotographic photoreceptor, replenish overflow or coating loss and keep the level of the coating liquid in the coating tank constant. In dip coating in which the substrate is pulled up and coated, a coating liquid with a viscosity of 30 cp or less at 25° C. is used, and a rectifying plate and/or rectifying plate is provided between the coating liquid inflow opening at the bottom of the coating tank and the end of the cylindrical substrate to rectify the coating liquid flow. Alternatively, this can be achieved by a dip coating method for an electrophotographic photoreceptor, which is characterized by providing a buffer disk to reduce the direct impact of the coating liquid flow on the end surface of the cylindrical substrate.
【0011】尚本発明の態様においては、前記整流板は
単独使用或は緩衝円板との併用のいづれにおいても整流
板の開口率は10〜80%が好ましい。更に整流板、緩
衝円板併用の場合、円筒状基体、整流板及び緩衝円板夫
々の直径を夫々D,d1及びd2とするとき、d1≧D
、かつ1.2D≧d2≧0.8Dとすることが好ましい
。In the aspect of the present invention, the aperture ratio of the current plate is preferably 10 to 80%, whether the current plate is used alone or in combination with a buffer disk. Furthermore, when a current plate and a buffer disk are used together, when the diameters of the cylindrical base, the current plate, and the buffer disk are respectively D, d1, and d2, d1≧D.
, and preferably 1.2D≧d2≧0.8D.
【0012】更に本発明において、使用する塗布液が顔
料分散液である場合は、粘度30cp(25℃)以下で
あると同時に溶媒(分散媒)と顔料の比重差が0.4g
/cc以上に調整される。Furthermore, in the present invention, when the coating liquid used is a pigment dispersion, the viscosity is 30 cp (25° C.) or less and the difference in specific gravity between the solvent (dispersion medium) and the pigment is 0.4 g.
/cc or more.
【0013】整流板あるいは整流板緩衝円板の組合せを
使用することにより塗布性が著しく改良されるのは円筒
状基体(ドラム)表面近傍の塗布液流が均一化されるこ
とによる。The use of a current plate or a combination of a current plate and a buffer disk significantly improves coating properties because the flow of the coating liquid near the surface of the cylindrical substrate (drum) is made uniform.
【0014】又、塗布液粘度が30cp(25℃)以下
、特に20cp(25℃)以下であると顕著な効果があ
る。更に電荷発生層(CGL)液のような分散系の場合
、分散媒と顔料の比重差が0.4g/cc好ましくは0
.5g/cc以上あれば効果が著しい。[0014] Further, a remarkable effect is obtained when the viscosity of the coating liquid is 30 cp (25°C) or less, particularly 20 cp (25°C) or less. Furthermore, in the case of a dispersion system such as a charge generating layer (CGL) liquid, the difference in specific gravity between the dispersion medium and the pigment is 0.4 g/cc, preferably 0.
.. If it is 5 g/cc or more, the effect is significant.
【0015】塗布液の粘度を上げたり、顔料と分散媒の
比重差を小さくすれば整流板なしでも比較的塗布性が良
いが塗布スピードをおそくせねばならなかったり、塗布
性が不安定であったりして、電子写真性能上或は生産技
術上満足すべき状態には到らない。[0015] If the viscosity of the coating solution is increased or the difference in specific gravity between the pigment and the dispersion medium is reduced, the coating properties are relatively good even without a current plate, but the coating speed must be slowed down and the coating properties are unstable. Therefore, a state that is satisfactory in terms of electrophotographic performance or production technology cannot be reached.
【0016】第1図に本発明に用いる整流板の形状例(
A)〜(H)、更に各符号の下にその開口率(開口部面
積/全面積)を示した。FIG. 1 shows an example of the shape of the current plate used in the present invention (
A) to (H), and the aperture ratio (opening area/total area) is shown below each symbol.
【0017】また、第2図に本発明のオーバフローを用
いる浸漬塗布法の態様例(a)〜(f)の側面図を示し
た。Further, FIG. 2 shows side views of embodiments (a) to (f) of the dip coating method using overflow according to the present invention.
【0018】図において1は塗布槽、2は整流板、3は
緩衝円板、4は円筒状基体、5はオーバフロー縁、6は
塗布液流入開口部である。In the figure, 1 is a coating tank, 2 is a rectifying plate, 3 is a buffer disk, 4 is a cylindrical base, 5 is an overflow edge, and 6 is a coating liquid inflow opening.
【0019】塗布液は流入開口部から流入し、整流板及
び/又は緩衝円板によって制御され、円筒状基体4と塗
布槽内壁間を流入し、オーバフロー縁5から溢出る。円
筒状基体は一定速度で矢印方向に引上げられる。The coating liquid flows in from the inflow opening, is controlled by a rectifying plate and/or a buffer disk, flows between the cylindrical substrate 4 and the inner wall of the coating tank, and overflows from the overflow edge 5. The cylindrical base body is pulled up in the direction of the arrow at a constant speed.
【0020】本発明において用いられる整流板,緩衝円
板の材質は、通常のケトン、アルコール、ハロゲン化炭
化水素、芳香族系溶剤に不活性な材質であれば何でもよ
い。例えばテフロン等のプラスチック、熱硬化樹脂、或
はアルミニウム、ステンレス、鉄、ニッケル、真鍮等が
挙げられる。The current plate and buffer disk used in the present invention may be made of any material as long as it is inert to ordinary ketones, alcohols, halogenated hydrocarbons, and aromatic solvents. Examples include plastics such as Teflon, thermosetting resins, aluminum, stainless steel, iron, nickel, brass, and the like.
【0021】緩衝円板は基体円筒と同軸に設けることが
好ましく、かつ実質的に塗布液流線が円板を貫通しなけ
ればよい。[0021] The buffer disk is preferably provided coaxially with the base cylinder, and it is sufficient that the flow line of the coating liquid does not substantially penetrate through the disk.
【0022】塗布槽に円筒状基体(ドラム)を浸漬した
時の両者壁間液の流速はドラムの径、塗布槽の大きさ、
供給液量によって異なってくるが、0.1〜15cm/
secの範囲内にある。好ましくは0.2〜10cm/
secである。When the cylindrical substrate (drum) is immersed in the coating tank, the flow rate of the liquid between the two walls depends on the diameter of the drum, the size of the coating tank,
Although it varies depending on the amount of liquid supplied, 0.1 to 15 cm/
It is within the range of sec. Preferably 0.2-10cm/
sec.
【0023】本発明において塗布液の粘度及び顔料と分
散媒の比重差は、溶剤とバインダの調合比によって調整
される。In the present invention, the viscosity of the coating liquid and the difference in specific gravity between the pigment and the dispersion medium are adjusted by the mixing ratio of the solvent and the binder.
【0024】有機光導電性体を形成する塗布液の溶剤と
してはブチルアミン、ジエチルアミン、エチレンジアミ
ン、イソプロパノールアミン、トリエタノールアミン、
トリエチレンジアミン、N,N−ジメチルホルムアミド
、アセトン、メチルエチルケトン、シクロヘキサノン、
ベンゼン、トルエン、キシレン、クロロホルム、1,2
−ジクロルエタン、ジクロルメタン、テトラヒドロフラ
ン、ジオキサン、メタノール、エタノール、イソプロパ
ノール、酢酸エチル、酢酸ブチル、ジメチルスルホキシ
ド、メチルセロソルブ、エチルセロソルブ、メチルセロ
ソルブ、アセテート等が挙げられる。[0024] Examples of the solvent for the coating solution for forming the organic photoconductive material include butylamine, diethylamine, ethylenediamine, isopropanolamine, triethanolamine,
Triethylenediamine, N,N-dimethylformamide, acetone, methyl ethyl ketone, cyclohexanone,
Benzene, toluene, xylene, chloroform, 1,2
- Dichloroethane, dichloromethane, tetrahydrofuran, dioxane, methanol, ethanol, isopropanol, ethyl acetate, butyl acetate, dimethyl sulfoxide, methyl cellosolve, ethyl cellosolve, methyl cellosolve, acetate, and the like.
【0025】また、光導電性物質としてはアゾ化合物、
キノン化合物、フタロシアニン化合物、トリアゾール化
合物、オキサジアゾール化合物、イミダゾール化合物、
ピラゾリン化合物、トリアリールアルカン化合物、フェ
ニレンジアミン化合物、ヒドラゾン化合物、アミノ置換
カルコン化合物、トリアリールアミン化合物、カルバゾ
ール化合物、スチルベン化合物等の電荷発生能、電荷輸
送能を有する素材が挙げられる。[0025] Further, as the photoconductive substance, an azo compound,
Quinone compounds, phthalocyanine compounds, triazole compounds, oxadiazole compounds, imidazole compounds,
Examples include materials having charge generation ability and charge transport ability, such as pyrazoline compounds, triarylalkane compounds, phenylenediamine compounds, hydrazone compounds, amino-substituted chalcone compounds, triarylamine compounds, carbazole compounds, and stilbene compounds.
【0026】またバインダとしては通常使用される樹脂
類、例えばポリカーボネート、ポリエステル、メタクリ
ル樹脂、アクリル樹脂、ポリ塩化ビニル、ポリ塩化ビニ
リデン、ポリスチレン、ポリビニルアセテート、ポリビ
ニルブチラール、スチレン共重合体、塩化ビニル−酢酸
ビニル共重合体等が挙げられる。As binders, commonly used resins such as polycarbonate, polyester, methacrylic resin, acrylic resin, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyvinyl acetate, polyvinyl butyral, styrene copolymer, vinyl chloride-acetic acid can be used. Examples include vinyl copolymers.
【0027】更に通常使用される各種添加剤は有用に活
用することができる。Furthermore, various commonly used additives can be usefully utilized.
【0028】本発明の基体はアルミニウム等自由に選択
された材料によって作成することができ、その成型方法
もインパクト加工、絞り加工の外、引抜加工による円管
の一方を別部材で閉塞する等任意の方法を選ぶことがで
きる。The base body of the present invention can be made of a freely selected material such as aluminum, and its molding method can be arbitrary, such as impact processing, drawing processing, or drawing processing, such as closing one side of the circular tube with another member. You can choose the method.
【0029】本発明の基体に塗布される電子写真の光導
電性層の成分、層構成等は特に限定されるものではなく
、各種の光導電性物質とバインダとの分散液、溶液、或
いは光導電性層の基体に対する付着を強化する下引液等
各種の塗布液を任意に塗布することができ、その例とし
ては有機光導電体感光層を形成するための、下引液、電
荷発生層塗布液、電荷輸送層塗布液等が挙げられる。The components and layer structure of the electrophotographic photoconductive layer applied to the substrate of the present invention are not particularly limited, and may be a dispersion or solution of various photoconductive substances and a binder, or a photoconductive layer. Various coating liquids such as a subbing liquid that strengthen the adhesion of the conductive layer to the substrate can be optionally applied. Examples include a subbing liquid and a charge generation layer for forming an organic photoconductor photosensitive layer. Examples include a coating liquid, a charge transport layer coating liquid, and the like.
【0030】[0030]
【実施例】つぎに実施例により本発明を具体的に説明す
る。[Examples] Next, the present invention will be specifically explained with reference to Examples.
【0031】実施例1
電荷発生層(CGL)として、Cu−Kα特性X線(波
長1.54Å)に対するブラッグ角2θの主要ピークが
少なくとも9.6±0.2°及び27.2±0.2°に
あるオキシチタニルフタロシアニン顔料3部、バインダ
樹脂としてシリコーン樹脂「KR−5240;15%キ
シレン/ブタノール溶液」(信越化学社製)を10部、
分散媒として酢酸−t−ブチルを加え、全固形成分3%
W/Vとなるように調合し、サンドミルにて4時間分散
して、CGL液を調製した。この時の粘度は25℃で1
5cpであった。又、顔料と溶媒の比重差は0.5g/
ccであった。Example 1 As a charge generation layer (CGL), the main peaks of the Bragg angle 2θ with respect to Cu-Kα characteristic X-rays (wavelength 1.54 Å) are at least 9.6±0.2° and 27.2±0. 3 parts of oxytitanyl phthalocyanine pigment at 2°, 10 parts of silicone resin "KR-5240; 15% xylene/butanol solution" (manufactured by Shin-Etsu Chemical Co., Ltd.) as a binder resin,
Add t-butyl acetate as a dispersion medium, and the total solid content is 3%.
The mixture was mixed in a W/V ratio and dispersed in a sand mill for 4 hours to prepare a CGL solution. The viscosity at this time is 1 at 25°C.
It was 5 cp. Also, the difference in specific gravity between the pigment and the solvent is 0.5g/
It was cc.
【0032】このCGL液を第1表の如く整流板の形状
、緩衝円板の大きさ、位置を変えた直系200mmの塗
布槽中に入れ100mmφアルミニウム製シリンダを浸
漬し、付量2.7mg/dm2になるように塗布した。
比較例はドラムNo.1及び2である。塗布したドラム
を明光下で観察し、塗布性を評価した。[0032] This CGL liquid was placed in a 200 mm diameter coating tank in which the shape of the rectifier plate, the size and position of the buffer disk were changed as shown in Table 1, and a 100 mmφ aluminum cylinder was immersed in it, and the applied amount was 2.7 mg/ It was applied so that it was dm2. The comparative example is drum No. 1 and 2. The coated drum was observed under bright light to evaluate the coatability.
【0033】(評価表示) 塗布むらが著しい:×× 多少ある:× 僅かに認められる:△ 合格水準(実用に支障なし):○ 全然ない:◎(Evaluation display) Significant uneven coating: XX Somewhat: × Slightly recognized: △ Passing level (no problem in practical use):○ Not at all: ◎
【0034】[0034]
【表1】[Table 1]
【0035】第1表から読取られるように緩衝円板の大
きさ90〜110mmφ及び整流板を用いることにより
塗布むらは消去できることがわかる。As can be read from Table 1, it can be seen that coating unevenness can be eliminated by using a buffer disk size of 90 to 110 mmφ and a rectifying plate.
【0036】整流板がないと塗布むらがでる。更に緩衝
円板を用いることにより塗布性が一ランクアップするこ
とがわかる。又、緩衝円板の大きさも80〜120mm
φであれば良い。[0036] Without the rectifying plate, uneven coating will occur. Furthermore, it can be seen that the use of a buffer disk improves the applicability by one level. Also, the size of the buffer disk is 80 to 120 mm.
It is sufficient if it is φ.
【0037】実施例2
共重合ポリアミド「ラッカマイド5003」(大日本イ
ンキ社製)3部をメタノール/ブタノール=90/10
(体積比、混合溶剤100部に溶解させ、下引層(UC
L)液を作成した。この時の粘度は25℃で20cpで
あった。このUCL液を第2表の如く整流板の形状、緩
衝円板の大きさ、位置を変えた直径200mmφの塗布
槽中に入れ、100mmφアルミニウム製シリンダを浸
漬し、付着5mg/dm2になるよう塗布した。さらに
比較例として上記混合溶剤100部の代りに70部を使
用し25℃の粘度が60cpの液をつくり同様に塗布し
、ドラムNo.21〜23を作成した。比較例はドラム
No.1,2及び21〜23である。さらにこの上に実
施例1のドラムNo.7と塗布液も塗布条件も全く同じ
ようにして重層し、CGLまでを形成した。Example 2 3 parts of copolymerized polyamide "Laccamide 5003" (manufactured by Dainippon Ink Co., Ltd.) was mixed with methanol/butanol = 90/10.
(Volume ratio, dissolved in 100 parts of mixed solvent, undercoat layer (UC)
L) Solution was prepared. The viscosity at this time was 20 cp at 25°C. This UCL liquid was placed in a coating tank with a diameter of 200 mmφ, in which the shape of the rectifying plate, the size and position of the buffer disk were changed as shown in Table 2, a 100 mmφ aluminum cylinder was immersed, and the coating was applied so that the adhesion was 5 mg/dm2. did. Further, as a comparative example, 70 parts of the above mixed solvent was used instead of 100 parts to prepare a liquid having a viscosity of 60 cp at 25°C, and applied in the same manner. 21 to 23 were created. The comparative example is drum No. 1, 2 and 21-23. Furthermore, drum No. of Example 1 is added on top of this. 7 and the same coating solution and coating conditions were used to form layers up to CGL.
【0038】塗布したドラムを明光下で観察し、塗布性
を評価した。その結果を第2表に示した。The coated drum was observed under bright light to evaluate the coatability. The results are shown in Table 2.
【0039】[0039]
【表2】[Table 2]
【0040】実施例3
実施例2のドラムNo.7と全く同じようにして、UC
L液を13本のドラムに同一膜厚に塗布し、更にこの上
に実施例1のNo.1〜No.13までCGL塗布液を
同一膜厚にて塗布した。Example 3 Drum No. 2 of Example 2. In exactly the same way as 7, UC
Liquid L was applied to 13 drums to the same thickness, and No. 1 of Example 1 was applied on top of this to the same thickness. 1~No. CGL coating liquid was applied up to No. 13 at the same film thickness.
【0041】更にこの上に下記構造式の電荷輸送物質C
TM120gとポリカーボネート樹脂(三菱瓦斯化学工
業製ユーピロンZ−200,165gを1,2−ジクロ
ルエタン1000mlへ溶解させて作った電荷輸送層(
CTL)塗布液中に上記CGLまで塗布したドラムを各
々浸漬し、膜厚20μmになるように塗布し、第3表に
列記した試料を作成した。Further, on top of this, a charge transport substance C having the following structural formula is added.
A charge transport layer made by dissolving 120 g of TM and 165 g of polycarbonate resin (Iupilon Z-200 manufactured by Mitsubishi Gas Chemical Industries, Ltd.) in 1000 ml of 1,2-dichloroethane (
CTL) The drums coated up to the above CGL were immersed in the coating solution and coated to a film thickness of 20 μm to prepare the samples listed in Table 3.
【0042】塗布後90℃、1時間ほど乾燥させ、実写
に供した。After coating, it was dried at 90° C. for about 1 hour and then used for actual copying.
【0043】特性評価は次のように行った。Characteristic evaluation was carried out as follows.
【0044】[0044]
【化1】[Chemical formula 1]
【0045】[0045]
【表3】[Table 3]
【0046】〔特性評価〕実施例及び比較例の各感光体
のそれぞれを「LP−3010」(コニカ社製)改造機
(半導体レーザ光源搭載)に搭載し、VHが−600±
10〔V〕になるようにグリッド電圧を調節し、0.7
mWの照射時の露光面の電位をVLとし、現像バイアス
−500〔V〕で反転現像を行い、画像むらを目視評価
した。[Characteristics Evaluation] Each of the photoreceptors of Examples and Comparative Examples was mounted on a modified "LP-3010" (manufactured by Konica) machine (equipped with a semiconductor laser light source), and the VH was -600±.
Adjust the grid voltage so that it becomes 10 [V], and 0.7
The potential of the exposed surface upon irradiation with mW was set to VL, and reversal development was performed at a developing bias of -500 [V], and image unevenness was visually evaluated.
【0047】又、5000回のプリントを行い、500
0回のプリント後のVH,VLをVH5000,VL5
000とした。[0047] Also, after printing 5000 times, 500
VH and VL after 0 prints are VH5000 and VL5
It was set as 000.
【0048】そして、初期からのVH,VLの変位量を
それぞれ△VH5000,△VL5000とした。[0048] The displacement amounts of VH and VL from the initial stage were set as △VH5000 and △VL5000, respectively.
【0049】従って、△VH5000=(VH5000
+600),△VL5000=(VL5000−VL)
である。Therefore, △VH5000=(VH5000
+600), △VL5000=(VL5000-VL)
It is.
【0050】更に5000回後の画像むらを評価した。 結果を第3表に示す。Furthermore, image unevenness after 5000 times was evaluated. The results are shown in Table 3.
【0051】本発明によると5000回後の画像むらが
なく、又VH,VLの変動も少ない。According to the present invention, there is no image unevenness after 5000 times, and there is little variation in VH and VL.
【0052】次に、DC−8010(コニカ社製)用の
ドラムサイズで前述した実施例と同様の各感光体を作成
した。
そして、これらの各感光体についてDC−8010で第
4表に示す各現像条件で画像出しを行ったところ、各現
像条件について、比較例を除いていずれの感光体を用い
た場合も、画像むらのない良好な画像が得られた。[0052] Next, photoreceptors similar to those in the above-mentioned example were prepared with a drum size for DC-8010 (manufactured by Konica). When images were produced on each of these photoreceptors using DC-8010 under each development condition shown in Table 4, no image unevenness was observed under each development condition when any of the photoreceptors was used except for the comparative example. A good image with no blemishes was obtained.
【0053】現像は、いわゆる2成分非接触ジャンピン
グ現像を行った。Development was carried out by so-called two-component non-contact jumping development.
【0054】[0054]
【表4】[Table 4]
【0055】現像条件
平均粒径0.1μmのマグネタイト粉末70wt%、バ
インダ樹脂としてポリエステル樹脂30wt%を配合、
混練し、破砕造粒して後粒径20〜30μmに分級して
キャリヤとした。このキャリヤの比重は約3.5以下で
あった。このキャリヤに、U−Bix1800(コニカ
社製)複写機用トナー(ポリエステル樹脂にカーボンを
含有させたトナー)をトナー濃度が20wt%になるよ
うに配合し、次の条件下で複写を行った。Development conditions: 70 wt% magnetite powder with an average particle size of 0.1 μm, 30 wt% polyester resin as a binder resin,
The mixture was kneaded, crushed and granulated, and then classified to a particle size of 20 to 30 μm to obtain a carrier. The specific gravity of this carrier was about 3.5 or less. A toner for a copying machine (a toner made of polyester resin containing carbon) of U-Bix 1800 (manufactured by Konica) was blended into this carrier so that the toner concentration was 20 wt %, and copying was performed under the following conditions.
【0056】像担持体の周速を60mm/sec、像担
持体と現像スリーブとの間隙を0.3mm、現像剤層厚
を0.05mm、現像スリーブの直径を24mm、その
回転数を200rpmとした。The circumferential speed of the image carrier is 60 mm/sec, the gap between the image carrier and the developing sleeve is 0.3 mm, the thickness of the developer layer is 0.05 mm, the diameter of the developing sleeve is 24 mm, and the rotation speed is 200 rpm. did.
【0057】[0057]
【発明の効果】本発明を適用することによって、浸漬塗
布法によって製造される電子写真感光体の塗布むら、特
に微細な塗布むら、反復使用によって剥れ出る潜在塗布
むら及び苛酷な条件下の使用で発生する画像欠陥が防止
できる。[Effects of the Invention] By applying the present invention, coating unevenness of electrophotographic photoreceptors manufactured by dip coating method, especially fine coating unevenness, latent coating unevenness that peels off due to repeated use, and use under harsh conditions can be prevented. Image defects that occur can be prevented.
【図1】第1図は本発明に用いる整流板の形状例の平面
図である。FIG. 1 is a plan view of an example of the shape of a current plate used in the present invention.
【図2】第2図は本発明のオーバフローを用いる浸漬塗
布法の能様例の側面図である。FIG. 2 is a side view of an example of the operation of the overflow dip coating method of the present invention.
Claims (7)
用い、オーバフロー或は塗布持去り減量を補給して塗布
槽の塗布液面位を一定に保って円筒状基体を引上げ塗布
する浸漬塗布において、25℃における粘度30cp以
下の塗布液を用い、塗布槽底部の塗布液流入開口部と円
筒状基体端との間に整流板を設けたことを特徴とする電
子写真感光体の浸漬塗布法。Claim 1: Dip coating in which a cylindrical substrate is used in the manufacture of electrophotographic photoreceptors, and the cylindrical substrate is pulled up and coated while keeping the level of the coating liquid in the coating tank constant by replenishing overflow or coating loss. A dip coating method for an electrophotographic photoreceptor, characterized in that a coating solution having a viscosity of 30 cp or less at 25° C. is used and a current plate is provided between the coating solution inflow opening at the bottom of the coating tank and the end of the cylindrical substrate. .
ある請求項1に記載の電子写真感光体の浸漬塗布法。2. The dip coating method for an electrophotographic photoreceptor according to claim 1, wherein the aperture ratio of the rectifying plate is 10 to 80%.
用い、オーバフロー或は塗布持去り減量を補給して塗布
槽の塗布液面位を一定に保って円筒状基体を引上げ塗布
する浸漬塗布において、25℃における粘度30cp以
下の塗布液を用い、塗布槽底部の塗布液流入開口部と円
筒状基体端との間に、塗布液流の円筒状基体端面への直
接の突当りを軟らげる緩衝円板を設けることを特徴とす
る電子写真感光体の浸漬塗布法。3. Dip coating in which a cylindrical substrate is used for manufacturing an electrophotographic photoreceptor, and the cylindrical substrate is pulled up and coated while keeping the level of the coating liquid in the coating tank constant by replenishing overflow or coating loss. , a coating solution with a viscosity of 30 cp or less at 25° C. is used, and a coating solution is placed between the coating solution inflow opening at the bottom of the coating tank and the end of the cylindrical substrate to soften the direct contact of the coating solution flow with the end surface of the cylindrical substrate. 1. A dip coating method for an electrophotographic photoreceptor, which comprises providing a buffer disk.
用い、オーバフロー或は塗布持去り減量を補給して塗布
槽の塗布液面位を一定に保って円筒状基体を引上げ塗布
する浸漬塗布において、25℃における粘度30cp以
下の塗布液を用い、塗布槽底部の塗布液流入開口部と円
筒状基体端との間に、整流板を設けかつ塗布液流の円筒
状基体端面への直接の突当りを軟らげる緩衝円板を整流
板の上もしくは下に設けることを特徴とする電子写真感
光体の浸漬塗布法。4. Dip coating in which a cylindrical substrate is used in the production of electrophotographic photoreceptors, and the cylindrical substrate is pulled up and coated while keeping the level of the coating liquid in the coating tank constant by replenishing overflow or coating loss. In this method, a coating liquid with a viscosity of 30 cp or less at 25°C is used, and a current plate is provided between the coating liquid inflow opening at the bottom of the coating tank and the end of the cylindrical substrate, and the flow of the coating liquid is directly directed to the end surface of the cylindrical substrate. A dip coating method for an electrophotographic photoreceptor, characterized in that a buffer disk for softening the abutment is provided above or below a rectifying plate.
浸漬塗布法において、整流板の開口率が10〜80%で
ある請求項4に記載の電子写真感光体の浸漬塗布法。5. The dip coating method for an electrophotographic photoreceptor according to claim 4, wherein the current plate has an aperture ratio of 10 to 80% in the dip coating method in which the current plate and the buffer disk are provided together.
浸漬塗布法において、円筒状基体、整流板及び緩衝円板
夫々の直径を夫々D,d1及びd2とするとき、d1≧
D、かつ1.2D≧d2≧0.8Dである請求項4もし
くは5に記載の電子写真感光体の浸漬塗布法。6. In the dip coating method in which the current plate and the buffer disk are provided together, when the diameters of the cylindrical substrate, the current plate, and the buffer disk are respectively D, d1, and d2, d1≧
D, and 1.2D≧d2≧0.8D, the dip coating method for an electrophotographic photoreceptor according to claim 4 or 5.
用い、オーバフロー或は塗布持去り減量を補給して塗布
槽の塗布液面位を一定に保って円筒状基体を引上げ塗布
する浸漬塗布において、使用する塗布液が25℃におけ
る粘度30cp以下であり、かつ顔料分散液であり、該
分散液の溶媒(分散媒)と顔料の比重差が0.4g/c
c以上であることを特徴とする電子写真感光体の浸漬塗
布法。7. Dip coating in which a cylindrical substrate is used in the manufacture of an electrophotographic photoreceptor, and the cylindrical substrate is pulled up and coated while keeping the level of the coating liquid in the coating tank constant by replenishing overflow or coating loss. The coating liquid used has a viscosity of 30 cp or less at 25° C., is a pigment dispersion, and the difference in specific gravity between the solvent (dispersion medium) and pigment of the dispersion is 0.4 g/c.
A dip coating method for an electrophotographic photoreceptor, characterized in that the coating temperature is at least c.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11872491A JPH04346354A (en) | 1991-05-23 | 1991-05-23 | Dip coating method for electrophotographic photoconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11872491A JPH04346354A (en) | 1991-05-23 | 1991-05-23 | Dip coating method for electrophotographic photoconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04346354A true JPH04346354A (en) | 1992-12-02 |
Family
ID=14743516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11872491A Pending JPH04346354A (en) | 1991-05-23 | 1991-05-23 | Dip coating method for electrophotographic photoconductor |
Country Status (1)
Country | Link |
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JP (1) | JPH04346354A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0792697A1 (en) * | 1996-03-01 | 1997-09-03 | Xerox Corporation | Dip coating apparatus having a single coating vessel |
JP2003076089A (en) * | 2001-08-31 | 2003-03-14 | Bridgestone Corp | Method for manufacturing roller for image forming device, dip coating device and roller for image forming device |
JP2007127922A (en) * | 2005-11-07 | 2007-05-24 | Ricoh Co Ltd | Electrophotographic photoreceptor manufacturing device and manufacturing method |
WO2023186673A1 (en) * | 2022-03-29 | 2023-10-05 | Carl Zeiss Vision International Gmbh | Lacquer basin, method for dip coating an ophthalmic lens, coating device and ophthalmic lens |
-
1991
- 1991-05-23 JP JP11872491A patent/JPH04346354A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0792697A1 (en) * | 1996-03-01 | 1997-09-03 | Xerox Corporation | Dip coating apparatus having a single coating vessel |
US5725667A (en) * | 1996-03-01 | 1998-03-10 | Xerox Corporation | Dip coating apparatus having a single coating vessel |
JP2003076089A (en) * | 2001-08-31 | 2003-03-14 | Bridgestone Corp | Method for manufacturing roller for image forming device, dip coating device and roller for image forming device |
JP2007127922A (en) * | 2005-11-07 | 2007-05-24 | Ricoh Co Ltd | Electrophotographic photoreceptor manufacturing device and manufacturing method |
JP4568674B2 (en) * | 2005-11-07 | 2010-10-27 | 株式会社リコー | Electrophotographic photoreceptor manufacturing apparatus and manufacturing method |
WO2023186673A1 (en) * | 2022-03-29 | 2023-10-05 | Carl Zeiss Vision International Gmbh | Lacquer basin, method for dip coating an ophthalmic lens, coating device and ophthalmic lens |
CN117836069A (en) * | 2022-03-29 | 2024-04-05 | 卡尔蔡司光学国际有限公司 | Paint tray, method for dip coating an ophthalmic lens, coating device and ophthalmic lens |
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