JPH04340504A - Gaseous argon laser mirror - Google Patents
Gaseous argon laser mirrorInfo
- Publication number
- JPH04340504A JPH04340504A JP11202291A JP11202291A JPH04340504A JP H04340504 A JPH04340504 A JP H04340504A JP 11202291 A JP11202291 A JP 11202291A JP 11202291 A JP11202291 A JP 11202291A JP H04340504 A JPH04340504 A JP H04340504A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- layer
- layer consisting
- index material
- laser mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 title claims description 28
- 229910052786 argon Inorganic materials 0.000 title claims description 14
- 239000000463 material Substances 0.000 claims abstract description 38
- 230000010355 oscillation Effects 0.000 claims abstract description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract 2
- 239000007789 gas Substances 0.000 claims description 9
- 239000010408 film Substances 0.000 claims 4
- 230000005540 biological transmission Effects 0.000 claims 1
- 239000012788 optical film Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052681 coesite Inorganic materials 0.000 abstract description 6
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 6
- 239000000377 silicon dioxide Substances 0.000 abstract description 6
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 6
- 229910052682 stishovite Inorganic materials 0.000 abstract description 6
- 229910052905 tridymite Inorganic materials 0.000 abstract description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052593 corundum Inorganic materials 0.000 abstract description 5
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 4
- 239000005304 optical glass Substances 0.000 abstract description 2
- 238000003475 lamination Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Optical Filters (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、アルゴンガスレーザミ
ラーに関し、特に単一の発振波長を取り出すために使用
する狭い波長帯域を有するアルゴンガスレーザミラーに
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an argon gas laser mirror, and more particularly to an argon gas laser mirror having a narrow wavelength band used to extract a single oscillation wavelength.
【０００２】0002
【従来の技術】従来のこの種レーザミラーは、たとえば
特開昭６０−２１８６０１号公報に示されているような
多層膜ミラーがある。このミラーはガラス板上に光学的
膜厚が３λ／４の中間屈折率物質と（Ａｌ２ Ｏ３ ）
と低屈折率物質（ＳｉＯ２ ）を交互に３３層以上蒸着
によって積層したものであり、そのレーザミラーの膜の
断面模式図は図５のようになっている。2. Description of the Related Art Conventional laser mirrors of this type include, for example, a multilayer mirror as disclosed in Japanese Patent Laid-Open No. 60-218601. This mirror is made of a medium refractive index material (Al2O3) with an optical thickness of 3λ/4 on a glass plate.
33 or more layers of a low refractive index material (SiO2) and a low refractive index material (SiO2) are alternately stacked by vapor deposition, and a schematic cross-sectional view of the film of the laser mirror is shown in FIG.
【０００３】また、別の例としては、特開平１−２８６
４７６号公報に示されているもので、透過率設定部と平
坦化部とから成る構成としたもので、そのレーザミラー
の膜の断面模式図を図６に示した。[0003] Another example is Japanese Patent Laid-Open No. 1-286
This laser mirror is disclosed in Japanese Patent No. 476 and has a structure consisting of a transmittance setting section and a flattening section, and a schematic cross-sectional view of the film of the laser mirror is shown in FIG.
【０００４】0004
【発明が解決しようとする課題】以上示した従来の膜構
成によるレーザミラーは、いずれの構成においても初期
においては設計波長の透過率又は反射率を満足すること
は可能である。しかしながら前者の場合、中間屈折率物
質（Ａｌ３ Ｏ３ ）と低屈折率物質（ＳｉＯ２ ）で
あるために積層数が多く膜厚も厚くなり、製造工数の増
大とストレスの増大に伴ない膜のクラックやダメージを
発生しやすいと云う問題があった。[Problems to be Solved by the Invention] In any of the laser mirrors having the conventional film configurations shown above, it is possible to satisfy the transmittance or reflectance of the design wavelength in the initial stage. However, in the case of the former, since the material is an intermediate refractive index material (Al3O3) and a low refractive index material (SiO2), the number of laminated layers is large and the film thickness is thick, resulting in cracks in the film due to increased manufacturing man-hours and increased stress. There was a problem in that it was easy to cause damage.
【０００５】また後者の場合においては、前者以上に積
層数が多く膜厚が厚くなるため製造工数やストレスが増
大し、レーザ装置の製造工程におけるフリットシールの
際にクラックを生じるばかりでなく最外層（空気側）に
ＴｉＯ２ を用いているために、真空加熱処理の時にＴ
ｉＯ２ 膜の変質によって、ＴｉＯ（２−Ｘ） 膜に変
化し、吸収増等のロスの原因となり、レーザ出力の低下
をまねくと云う問題点があった。In the latter case, the number of laminated layers is larger than the former, and the film thickness is thicker, which increases the number of manufacturing steps and stress, which not only causes cracks during frit sealing in the manufacturing process of the laser device, but also damages the outermost layer. Since TiO2 is used on the air side, T
There was a problem in that the iO2 film changed into a TiO(2-X) film due to deterioration, causing losses such as increased absorption, and resulting in a decrease in laser output.
【０００６】[0006]
【課題を解決するための手段】本発明のレーザミラーは
、高屈折率物質と、低屈折率物質と中間屈折率物質の少
なくとも３つ以上の物質から形成される多層膜の構成と
し、発振に必要な波長の透過率又は反射率と発振を阻止
したい波長の透過率を有するようにしかつ、積層数及び
ストレスを少なくしたものである。[Means for Solving the Problems] The laser mirror of the present invention has a multilayer film structure formed from at least three materials: a high refractive index material, a low refractive index material, and an intermediate refractive index material, and It has a transmittance or reflectance for a necessary wavelength and a transmittance for a wavelength whose oscillation is desired to be prevented, and the number of laminated layers and stress are reduced.
【０００７】[0007]
【作用】一般のアルゴンガスレーザには、大出力を取り
出す水冷アルゴンガスレーザと、小・中出力を取り出す
内部ミラー形の空冷アルゴンレーザとがある。発明者ら
の実験結果によれば水冷アルゴンレーザ（放電電流３０
Ａ）の場合の４８８ｎｍの透過率は４．５〜５．５％、
空冷アルゴンレーザ（放電電流８Ａ）の場合４８８ｎｍ
の透過率は２〜３％が最適透過率であると云う結果であ
った。更に空冷アルゴンレーザの場合発振させたい波長
を４８８ｎｍとし、その透過率を２〜３％、４９６．５
ｎｍの透過率９〜１３％に設定し、放電電流８Ａとした
場合の出力は平均２２ｍＷであった。除々に放電電流を
上昇させ、１２Ａとした時の出力は波長４８８ｎｍで平
均３６ｍＷであった。放電電流を１２Ａまで上昇させて
も、波長４９６．５ｎｍ（透過率９〜１３％）の発振は
完全に阻止されることが明らかとなった。[Operation] General argon gas lasers include water-cooled argon gas lasers that output high output, and internal mirror-type air-cooled argon lasers that output small to medium output. According to the inventors' experimental results, water-cooled argon laser (discharge current 30
In case A), the transmittance at 488 nm is 4.5 to 5.5%,
488nm for air-cooled argon laser (discharge current 8A)
The results showed that the optimum transmittance was 2 to 3%. Furthermore, in the case of an air-cooled argon laser, the wavelength to be oscillated is 488 nm, and the transmittance is 2 to 3%, 496.5 nm.
When the transmittance in nm was set to 9 to 13% and the discharge current was 8 A, the average output was 22 mW. When the discharge current was gradually increased to 12 A, the average output was 36 mW at a wavelength of 488 nm. It has become clear that even if the discharge current is increased to 12 A, oscillation at a wavelength of 496.5 nm (transmittance 9 to 13%) is completely blocked.
【０００８】[0008]
【実施例】次に本発明について図面を参照して説明する
。図１は本発明の第１の実施例のレーザミラーの分光透
過率特性を示す図であり、図２は第１の実施例の膜構成
の断面模式図である。光学ガラス板１（ＢＫ−７，屈折
率１．５２）上に第１層として高屈折率物質（ＴｉＯ２
７λ／４，屈折率２．３５）、第２層として低屈折率
物質（ＳｉＯ２ ３λ／４，屈折率１．４４）、第３層
として高屈折率物質（ＺｒＤ２ １１λ／４，屈折率２
．０５）、第４層は第２層と同じ、第５層として中間屈
折率物質（Ａｌ２ Ｏ３ λ／，、屈折率１．６７）、
第６層は第２層と同じ第７層は第５層と同じ…順次積層
し、最外層（空気側）は中間屈折率（Ａｌ２ Ｏ３λ／
４屈折率１．６７）とした合計２５層の構成からなって
いる。なお、λ（基準波長）はいずれの膜も４８８ｎｍ
に設定してある。 図１から明らかなように、この構
成による透過率は、４８８ｎｍでは２．０７％、４７６
．５ｎｍは２０％以上、４９６．５ｎｍでは１０％以上
であることがわかる。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be explained with reference to the drawings. FIG. 1 is a diagram showing the spectral transmittance characteristics of a laser mirror according to the first embodiment of the present invention, and FIG. 2 is a schematic cross-sectional view of the film structure of the first embodiment. A high refractive index material (TiO2
7λ/4, refractive index 2.35), a low refractive index material (SiO2 3λ/4, refractive index 1.44) as the second layer, and a high refractive index material (ZrD2 11λ/4, refractive index 2) as the third layer.
．． 05), the fourth layer is the same as the second layer, the fifth layer is an intermediate refractive index material (Al2O3 λ/, refractive index 1.67),
The 6th layer is the same as the 2nd layer. The 7th layer is the same as the 5th layer... They are laminated in order, and the outermost layer (air side) has an intermediate refractive index (Al2O3λ/
It consists of a total of 25 layers with a refractive index of 1.67). In addition, λ (reference wavelength) is 488 nm for both films.
It is set to . As is clear from Figure 1, the transmittance with this configuration is 2.07% at 488 nm, 476 nm.
．． It can be seen that 5 nm is 20% or more, and 496.5 nm is 10% or more.
【０００９】図３は、本発明の第２の実施例のレーザミ
ラーの分光透過率特性を示す図であり、図４は、第２の
実施例の膜構成の断面模式図である。第１の実施例同様
、λはいずれの膜も４８８ｎｍに設定し、光学ガラス板
はＢＫ−７である。ガラス側から第１層として高屈折率
物質（ＴｉＯ２ ７λ／４，屈折率２．３５）、第２層
として低屈折率物質（ＳｉＯ２ ３λ／４，屈折率１．
４４）、第３層として中間屈折率物質（Ａｌ２ Ｏ３
３λ／４，屈折率１．６７）、第４層は第２層と同じ、
第５層は第３層と同じ、…順次積層し合計２７層の構成
である。図３から明らかなように、透過率は４８８ｎｍ
で２．３％、４７６．５ｎｍでは２０％以上、４９６．
５ｎｍでは１０％以上であることがわかる。FIG. 3 is a diagram showing the spectral transmittance characteristics of a laser mirror according to a second embodiment of the present invention, and FIG. 4 is a schematic cross-sectional view of the film structure of the second embodiment. As in the first example, λ was set to 488 nm for both films, and the optical glass plate was BK-7. From the glass side, the first layer is a high refractive index material (TiO2 7λ/4, refractive index 2.35), and the second layer is a low refractive index material (SiO2 3λ/4, refractive index 1.
44), intermediate refractive index material (Al2O3
3λ/4, refractive index 1.67), the fourth layer is the same as the second layer,
The fifth layer is the same as the third layer, and has a structure of 27 layers in total, which are sequentially laminated. As is clear from Figure 3, the transmittance is 488 nm.
2.3% at 476.5 nm, more than 20% at 496.5 nm.
It can be seen that at 5 nm, it is 10% or more.
【００１０】以上説明した２つの実施例は空冷アルゴン
ガスレーザを対象としたものであるが、本発明の構成は
、他のレーザ装置においても同様に応用できることは云
うまでもない。Although the two embodiments described above are directed to air-cooled argon gas lasers, it goes without saying that the structure of the present invention can be similarly applied to other laser devices.
【００１１】[0011]
【発明の効果】以上説明したように、本発明のレーザミ
ラーは高屈折率物質，中間屈折率物質，低屈折率物質の
少なくとも三つ以上の物質から形成された多層膜の膜構
成とすることで発振に必要な波長の透過率の制御と発振
を阻止したい波長の透過率の制御が出来、多層膜の積層
数を少なく出来るだけでなく、全膜厚を薄くすることに
よって、膜のストレスを軽減させレーザ装置の製造工程
でうける加熱処理の時のクラックやダメージ等の発生を
防止出来る。[Effects of the Invention] As explained above, the laser mirror of the present invention has a multilayer film structure made of at least three materials: a high refractive index material, an intermediate refractive index material, and a low refractive index material. It is possible to control the transmittance of the wavelength necessary for oscillation and the transmittance of the wavelength you want to prevent oscillation, which not only reduces the number of layers in the multilayer film, but also reduces stress on the film by reducing the total film thickness. This can prevent the occurrence of cracks, damage, etc. during heat treatment during the manufacturing process of laser devices.
【００１２】さらには、ミラー膜構成の最外層には安定
な膜とするため真空加熱処理による膜の変質並びに出力
低下を防止できるという効果を有する。さらに製造工数
の短縮に伴なう経済性，膜物質の選択や組合せ応用など
容易になる等その効果が大きい。Furthermore, since the outermost layer of the mirror film structure is a stable film, it has the effect of preventing film deterioration and output reduction due to vacuum heat treatment. Furthermore, it has great effects, such as economical efficiency due to the reduction in manufacturing man-hours, and ease of selecting membrane materials and applying combinations.
【図１】本発明の第１の実施例のレーザミラーの分光透
過率特性を示す図である。FIG. 1 is a diagram showing spectral transmittance characteristics of a laser mirror according to a first embodiment of the present invention.
【図２】本発明の第１の実施例の膜の断面模式図である
。FIG. 2 is a schematic cross-sectional view of a membrane of the first embodiment of the present invention.
【図３】本発明の第２の実施例のレーザミラーの分光透
過率特性を示す図である。FIG. 3 is a diagram showing spectral transmittance characteristics of a laser mirror according to a second embodiment of the present invention.
【図４】本発明の第２の実施例の膜の断面模式図である
。FIG. 4 is a schematic cross-sectional view of a membrane according to a second embodiment of the present invention.
【図５】従来のレーザミラーの断面模式図である。FIG. 5 is a schematic cross-sectional view of a conventional laser mirror.
【図６】従来の他のレーザミラーの断面模式図である。FIG. 6 is a schematic cross-sectional view of another conventional laser mirror.
１ ガラス板 1 Glass plate
Claims (2)
ンガスレーザの発振させたい波長においては必要なだけ
の反射率を有し、同時に発振する不必要な発振波長につ
いては発振を阻止するのに必要な透過率を有するアルゴ
ンガスレーザミラーにおいて、該ミラーを構成する膜が
、１．３〜１．５の低屈折率物質から成る膜と、１．５
１〜１．９の中屈折率物質から成る膜と、１．９１〜２
．３の高屈折率物質から成る膜から形成される多層膜の
構造を有し、且つ、複数の発振波長の中の発振させたい
波長λに対し、λ／４の整数倍の光学的膜厚を有する高
屈折率物質からなる膜を少なくとも一層以上基板側に形
成したことを特徴とするアルゴンガスレーザミラー。Claim 1: An argon gas laser that has multiple oscillation wavelengths at the same time has the necessary reflectance at the desired wavelength to oscillate, and has the necessary transmission to prevent oscillation at unnecessary oscillation wavelengths that oscillate at the same time. In an argon gas laser mirror having a refractive index of
A film made of a medium refractive index material of 1 to 1.9, and 1.91 to 2
．． It has a multilayer film structure formed from a film made of a high refractive index material of No. 3, and has an optical film thickness that is an integer multiple of λ/4 for the wavelength λ that is desired to oscillate among multiple oscillation wavelengths. 1. An argon gas laser mirror characterized in that at least one layer of a film made of a high refractive index material is formed on a substrate side.
ｒＯ２ を用いる請求項１記載のアルゴンガスレーザミ
ラー。Claim 2: TiO2 or Z as a high refractive index substance
The argon gas laser mirror according to claim 1, using rO2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03112022A JP3084784B2 (en) | 1991-05-17 | 1991-05-17 | Argon gas laser mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03112022A JP3084784B2 (en) | 1991-05-17 | 1991-05-17 | Argon gas laser mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04340504A true JPH04340504A (en) | 1992-11-26 |
| JP3084784B2 JP3084784B2 (en) | 2000-09-04 |
Family
ID=14576030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03112022A Expired - Fee Related JP3084784B2 (en) | 1991-05-17 | 1991-05-17 | Argon gas laser mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3084784B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07198935A (en) * | 1993-12-28 | 1995-08-01 | Koshin Kogaku:Kk | Selecting method of temperature coefficient for wavelength shift of multilayer film filter and multilayer film filter having almost zero temperature coefficient of wavelength shift |
| US8174757B2 (en) | 2002-01-04 | 2012-05-08 | The Furukawa Electric Co., Ltd. | Wavelength determining apparatus, method and program for thin film thickness monitoring light |
-
1991
- 1991-05-17 JP JP03112022A patent/JP3084784B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07198935A (en) * | 1993-12-28 | 1995-08-01 | Koshin Kogaku:Kk | Selecting method of temperature coefficient for wavelength shift of multilayer film filter and multilayer film filter having almost zero temperature coefficient of wavelength shift |
| US8174757B2 (en) | 2002-01-04 | 2012-05-08 | The Furukawa Electric Co., Ltd. | Wavelength determining apparatus, method and program for thin film thickness monitoring light |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3084784B2 (en) | 2000-09-04 |
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