JPH04335913A - Heat treatment and chemical treatment device - Google Patents

Abstract

PURPOSE:To keep a pressure loss low and reduce a frequency of cleaning and replacing an air discharging pipe and the like by a method wherein non-reacted chemical substances in the discharged gas out of a main body of a reaction furnace are thermally decomposed and then removed. CONSTITUTION:Gas containing some chemical substances is fed into a main body 3 of a reaction furnace storing processed material and the processed material is applied with a predetermined thermal processing and a chemical processing under a process control system. A mechanism 10 for processing the non-reacted chemical substances is placed in the midway part of an air discharging pipe out of the main body of the reaction furnace. This processing mechanism is comprised of an outer combustion mechanism 14 for forcedly and thermally decomposing non-reacted gas containing some chemical substances after being processed at the main body of the reaction furnace and a dust collecting filter mechanism 12.

Description

[Detailed description of the invention]

0001

[Industrial Application Field] The present invention performs an oxidation reaction on unreacted chemical substances contained in the gas after heat treatment and chemical treatment, thereby completely reacting the chemical substances in the gas, and exhausting the reactants. The present invention relates to heat treatment and chemical treatment equipment used in semiconductor manufacturing equipment, etc., which is equipped with a heat treatment mechanism for removing gas from inside.

0002

2. Description of the Related Art FIG. 3 is a system diagram showing a conventional heat treatment and chemical treatment equipment used in semiconductor manufacturing equipment, etc., which performs predetermined heat treatment and chemical treatment by introducing a gas containing a chemical substance. 1 is a gas containing a chemical substance for treating the object to be treated, 2 is a gas inlet that can be introduced into the furnace for treating the object with this chemical substance, and 3
Reference numeral 4 indicates a reactor main body containing the material to be treated, 4 a gas outlet installed in the reactor main body 3, 6 a vacuum pump connected to the gas outlet 4 via an exhaust pipe 5, and 7 a vacuum pump 6.
8 is an abatement device that removes harmful chemicals from the exhaust gas, which is connected to the abatement device 7 via an exhaust pipe 5; 8 is an abatement device-passing gas discharge port connected to the abatement device 7; 9 is a gas abatement device-passing gas outlet connected to the abatement device 7; This is exhaust gas (gas) discharged from the exhaust port 8 after processing. In such an apparatus, a gas 1 containing a predetermined chemical substance enters a reactor main body 3 through a gas inlet 2, undergoes predetermined heat treatment and chemical treatment, and is exhausted by a vacuum pump 6 to remove unreacted gas. The chemical substances are sent to the abatement device 7 while adhering to the inside of the piping 5 from around the gas outlet 4 to the abatement device 7 or mixed into the oil of the vacuum pump 6 . Furthermore, the exhaust gas 9 that has been treated while passing through the abatement device 7 is exhausted from the abatement device passing gas outlet 8 .

0003

[Problems to be Solved by the Invention] By the way, the high-temperature exhaust gas 9 discharged by the vapor phase growth method, etc. contains unreacted chemical substances, so it is necessary to These chemical substances adhere to the pipes 5, clog the pipes 5, obstruct valve operation, or contaminate the oil in the vacuum pump 6 provided in the middle of the pipes 5. Therefore, before such high-temperature gas is introduced into the pipe 5 or the valve, it is necessary to remove unreacted chemical substances from the gas in advance. Conventionally, heat treatment and chemical processing equipment that uses gas containing chemical substances of this type has a mechanism that spontaneously removes or reduces the amount of unreacted chemical substances discharged from the reactor body 3 of the equipment. Since the system is not equipped with a system, there is a problem in that pressure loss before and after the system increases due to unreacted substances deposited on the precipitator or mixed into the oil. For this reason, it is necessary to remove and clean the exhaust pipe 5, valves, etc., and to change the oil of the vacuum pump 6. If a chemical substance with low reaction efficiency is used, this cleaning,
Problems such as increased frequency of replacement were unavoidable. The present invention has been made to solve these problems, and is aimed at eliminating unreacted chemical substances that are a source of contamination in the exhaust pipes, valves, vacuum pumps, etc. from the vicinity of the gas outlet of the reactor main body to the abatement device. By incorporating a mechanism to chemically remove or reduce the amount of , it is possible to obtain high removal efficiency, keep pressure loss low in this device, and further reduce the frequency of cleaning and replacement of component parts. Its purpose is to provide heat treatment and chemical treatment equipment.

0004

[Means for Solving the Problems] In the heat treatment and chemical treatment apparatus according to the present invention, a gas containing a chemical substance such as TEOS is introduced, and unreacted gas discharged from the reactor for heat treatment and chemical treatment is introduced. Completely burns chemicals,
oxidize, remove or reduce the amount of unreacted chemical substances, and maintain low pressure loss in exhaust piping, valves, vacuum pumps, etc. from the vicinity of the gas outlet of the reactor main body to the abatement equipment.
This is designed to reduce the frequency of cleaning, replacing, etc. of these parts.

[0005]

[Operation] According to the present invention, a gas containing chemical substances such as TEOS is discharged as a gas containing unreacted chemical substances by performing prescribed processing in the reactor main body. Unreacted chemicals mixed in the gas are
The unreacted chemical substance processing mechanism has an external combustion mechanism and a dust collection mechanism.
It is oxidized into a powdered oxide, and this oxide is collected and recovered by the dust collecting mechanism.

[0006]

[Embodiment] FIGS. 1 and 2 show an embodiment of a heat treatment and chemical processing apparatus used in semiconductor manufacturing equipment, etc. according to the present invention, and in these figures, parts that are the same as or corresponding to those in FIG. 3 described above are shown. are given the same numbers and their explanations will be omitted. Now, according to the present invention, an unreacted chemical substance processing mechanism includes an external combustion mechanism 14 and a dust collection filter mechanism 15 in the exhaust pipe 5 for connecting the gas outlet 4 of the reactor main body 3 and the vacuum pump 7. 10 are interposed therebetween. External combustion mechanism 14 in this unreacted chemical substance processing mechanism 10
The structure of the dust collecting filter mechanism 15 is as shown in FIG. To explain this in detail, the external combustion mechanism 14 has a mechanism that is heated by the heating element 13 and a mechanism that supplies oxygen at a controlled flow rate from the oxygen introduction pipe 12, and has a gas discharge port in the reactor main body 3. It is connected near 4. Further, the dust collection filter mechanism 15 is provided connected to the downstream side of the external combustion mechanism 14 . Here, the external combustion mechanism 14 and the dust collection filter mechanism 15 are connected and held to the gas outlet 4 and the connecting exhaust pipe 5 of the vacuum pump 7 by airtight joint flanges 11, 11. It can be removed from the connection piping 5. Further, the external combustion mechanism 14 and the dust collection filter mechanism 15 also have a connection structure using the flange 11, and have a structure that maintains airtightness as a whole and is removable.

[0007] In the above-described configuration, the gas containing unreacted chemical substances discharged from the gas outlet 4 passes through the external combustion mechanism 14 and the dust collection filter mechanism 15 and is led to the vacuum pump 7. At this time, unreacted chemical substances adhere to the inside of the pipe 5, but this is caused by the external combustion mechanism 14.
The oxidation reaction takes place quickly, and unreacted chemical substances become powdered. Then, by passing through the dust collection filter mechanism 15, this powdery substance is removed by the filter and sequentially falls downward, and is collected in the casing of the unreacted chemical substance processing mechanism 10 and can be recovered. . Note that the filter of the dust collection filter mechanism 15 can be removed from inside the housing of the external combustion mechanism 14 and the processing mechanism 10 described above.

It should be noted that the present invention is not limited to the structure of the above-described embodiment, and it goes without saying that the structure of each part of the device can be modified or changed as appropriate, and various modifications may be considered. For example, in FIG. 2, a case has been described in which oxygen with a set flow rate is introduced into the external combustion mechanism 14, but even if both oxygen and hydrogen gases are introduced into the external combustion mechanism 14 through two introduction pipes, no Of course, reactive chemicals can be reacted. Furthermore, it goes without saying that even if ozone is introduced through the introduction pipe 12, unreacted chemical substances can be similarly treated. It is also clear that a direct-fired heater may be used in place of the heat generating element in the heat generating section.

[0009]

[Effects of the Invention] As explained above, the present invention has a mechanism for efficiently removing unreacted chemical substances that contaminate exhaust piping, valves, and vacuum pump oil from exhaust gas. Although it has an unreacted chemical substance processing mechanism with an external combustion device with high removal efficiency and a filter mechanism for dust collection, it is possible to maintain low pressure loss before and after the external combustion device, and the exhaust piping, valves, and vacuum after the external combustion device can be kept low. This has various excellent effects such as reducing the frequency of cleaning and replacing pumps and the like.

[Brief explanation of drawings]

FIG. 1 is a schematic configuration diagram showing an embodiment of a heat treatment and chemical treatment apparatus according to the present invention.

FIG. 2 is a configuration diagram showing details of the unreacted chemical substance processing mechanism in FIG. 1;

FIG. 3 is a schematic configuration diagram of a conventional heat treatment and chemical treatment apparatus.

[Explanation of symbols]

1 Gas containing chemical substances for treating the object to be treated 2 Gas inlet 3 Reactor main body 4 Gas outlet 5 Exhaust pipe 6 Vacuum pump 7 Harm removal device 10 Unreacted chemical substance processing device 12 Introductory pipe 13 Heating element 14 External combustion mechanism 15 Dust collection filter mechanism

Claims (1)

[Claims] [Claim 1] A reactor main body in which a workpiece is housed;
In a heat treatment and chemical treatment apparatus equipped with a processing control system that performs predetermined heat treatment and chemical treatment on the object to be treated by introducing a gas containing a chemical substance into the reactor main body, the processing in the reactor main body is performed. A heat treatment and chemical treatment apparatus characterized by being provided with an external combustion mechanism for forcibly thermally decomposing unreacted gas containing chemical substances.