TWI669151B - Method and device for decompressing and harming exhaust gas - Google Patents

Method and device for decompressing and harming exhaust gas Download PDF

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TWI669151B
TWI669151B TW107112996A TW107112996A TWI669151B TW I669151 B TWI669151 B TW I669151B TW 107112996 A TW107112996 A TW 107112996A TW 107112996 A TW107112996 A TW 107112996A TW I669151 B TWI669151 B TW I669151B
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exhaust gas
vacuum pump
exhaust
reaction
decompression
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TW201938250A (en
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柳澤道彥
吉田哲久
塚田勉
今村志
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日商康肯環保設備有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/38Removing components of undefined structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof

Abstract

本發明是為了提供一種排氣之除害方法及其裝置,能使稀釋用的氮氣之使用極小化而具有優異的能量之利用效率。   亦即,本發明的排氣之減壓除害方法及其裝置,其特徵在於,是將透過真空泵而由產生源供給的排氣,保持減壓狀態並藉由電熱加熱器加熱而進行分解及/或反應處理。The present invention is to provide a method and a device for eliminating exhaust gas, which can minimize the use of nitrogen for dilution and have excellent energy utilization efficiency. That is, the decompression and detoxification method of exhaust gas and the device thereof according to the present invention are characterized in that the exhaust gas supplied from a generation source through a vacuum pump is maintained in a decompressed state and is decomposed by being heated by an electric heater and And / or reaction treatment.

Description

排氣之減壓除害方法及其裝置Method and device for decompressing and harming exhaust gas

本發明主要是關於適用於電子產業之製造程序所排出之可燃性氣體、有毒氣體、溫室氣體等的有害氣體的處理之排氣之除害方法及其裝置。The present invention relates to a method and a device for removing exhaust gas, which are suitable for the treatment of harmful gases such as flammable gases, toxic gases, and greenhouse gases emitted by manufacturing processes in the electronics industry.

在製造半導體、液晶等的電子產業,是使用氮化矽膜CVD、氧化矽膜CVD、TEOS氧化膜CVD、高介電常數膜CVD、低介電常數膜CVD及金屬膜CVD等之各種CVD程序。其中,例如為了形成矽系薄膜,主要採用使用了具有爆炸性、毒性之矽烷系氣體之CVD法。在該CVD法所使用之包含上述矽烷系氣體的程序氣體,當在CVD程序被使用後,是成為排氣而藉由下述專利文獻1所記載般的除害裝置實施無害化,以往,在該除害裝置的前方,為了將排氣中的矽烷系氣體稀釋到爆炸極界以下而投入大量的稀釋用氮氣。在此,在典型的氮化矽膜CVD,是使用SiH 4/NH 3/N 2O=1slm/10slm/10slm(slm:standard liter per minute,將1atm、0℃下之每1分鐘的流量用升表示的單位),因為SiH 4的爆炸範圍為1.3%~100%,從CVD程序排出之這樣的氣體,必須立刻用稀釋用氮氣稀釋成約76倍左右。只要進行該稀釋,就能利用習知的燃燒方式、大氣壓電漿方式的熱分解裝置安全且確實地進行除害處理。 In the electronics industry for manufacturing semiconductors and liquid crystals, various CVD procedures are used, such as silicon nitride film CVD, silicon oxide film CVD, TEOS oxide film CVD, high dielectric constant film CVD, low dielectric constant film CVD, and metal film CVD. . Among them, in order to form a silicon-based thin film, a CVD method using an explosive and toxic silane-based gas is mainly used. The process gas containing the above-mentioned silane-based gas used in the CVD method is exhausted after being used in the CVD process, and is harmless by a detoxification device as described in Patent Document 1 below. In front of this detoxification device, a large amount of nitrogen for dilution is injected in order to dilute the silane-based gas in the exhaust gas below the explosive electrode boundary. Here, in a typical silicon nitride film CVD, SiH 4 / NH 3 / N 2 O = 1slm / 10slm / 10slm (slm: standard liter per minute) is used, and the flow rate per minute at 1 atm and 0 ° C is used. Units expressed in liters), since the explosion range of SiH 4 is 1.3% to 100%, such a gas exhausted from the CVD process must be immediately diluted to about 76 times by dilution with nitrogen. As long as the dilution is performed, the detoxification treatment can be performed safely and reliably using a thermal decomposition device using a conventional combustion method or an atmospheric piezoelectric slurry method.

專利文獻1:日本特開平11-333247號公報Patent Document 1: Japanese Patent Application Laid-Open No. 11-333247

發明所欲解決之問題Problems to be solved by the invention

然而,在上述的習知技術存在以下的問題。亦即,如上述般為了將包含用氮氣稀釋後的矽烷系氣體之排氣全體加熱到分解溫度所需的能量,必須為僅將包含稀釋前的矽烷系氣體之排氣加熱的情況之約76倍的能量。亦即,以往之必須用氮氣進行稀釋的除害程序,不僅隨著使用多量的氮氣而造成成本增加,且與排氣的除害沒有直接關係之氮氣也必須加熱,因此能量效率低,還導致電力或燃料等的成本增加。However, the conventional technique described above has the following problems. That is, as described above, in order to heat the entire exhaust gas containing the silane-based gas diluted with nitrogen to the decomposition temperature, it must be about 76 times of the case where only the exhaust gas containing the silane-based gas before dilution is heated. Times the energy. That is, in the past, the detoxification program that had to be diluted with nitrogen gas not only increased the cost with the use of a large amount of nitrogen, but also had to be heated with nitrogen that was not directly related to the exhaustion of the exhaust gas. Therefore, the energy efficiency was low and it also caused The cost of electricity or fuel increases.

有鑑於此,本發明的主要目的是為了提供一種排氣之除害方法及其裝置,可不減損安全性而使稀釋用氮氣的使用極小化,而具有優異的能量利用效率。 解決問題之技術手段In view of this, the main purpose of the present invention is to provide an exhaust gas detoxification method and a device thereof, which can minimize the use of nitrogen for dilution without compromising safety, and have excellent energy utilization efficiency. Technical means to solve problems

為了達成上述目的,本發明所採用的對策,是將排氣的除害在減壓下進行。亦即,本發明中的第1發明是一種排氣之減壓除害方法,其特徵在於,將透過真空泵14而由排氣產生源12所供給的排氣E,保持減壓狀態並藉由電熱加熱器17加熱而進行分解及/或反應處理。In order to achieve the above-mentioned object, the countermeasure adopted in the present invention is to reduce the exhaust gas under reduced pressure. That is, the first invention of the present invention is a method for decompressing and harming exhaust gas, which is characterized in that the exhaust gas E supplied from the exhaust gas generating source 12 through the vacuum pump 14 is maintained in a reduced pressure state by The electric heater 17 is heated to perform decomposition and / or reaction treatment.

該第1發明例如發揮以下的作用。將透過真空泵14而由排氣產生源12所供給的排氣E,保持減壓狀態並藉由電熱加熱器17加熱而進行分解、反應處理,因此反應所產生的熱變稀薄,不致發生急劇的溫度上昇、爆炸反應,稀釋用氮氣變得不需要或是極少量就足夠了。此外,因為如此般利用氮氣的稀釋變得不需要或極少量就足夠了,從電熱加熱器17所供給的熱能量幾乎全部都能直接利用於排氣E的分解、反應。此外,因為從排氣E的產生源到處理部都是在減壓下,縱使是排氣E中包含對人體有毒的氣體的情況,仍不會有在藉由電熱加熱器17進行加熱分解及/或反應處理之前使該排氣E往系統外漏出的疑慮。The first invention has the following effects, for example. The exhaust gas E supplied from the exhaust gas generating source 12 through the vacuum pump 14 is maintained in a decompressed state and heated by an electric heater 17 to perform decomposition and reaction treatment. Therefore, the heat generated by the reaction becomes thinner, and no sharp Temperature rises, explosive reactions, nitrogen dilution is no longer necessary or very small. In addition, since the dilution with nitrogen gas is unnecessary or sufficient in this way, almost all of the heat energy supplied from the electric heater 17 can be directly used for the decomposition and reaction of the exhaust gas E. In addition, since the generation source of the exhaust gas E to the processing section are under reduced pressure, even if the exhaust gas E contains a gas that is toxic to the human body, it will not be heated and decomposed by the electric heater 17 and And / or the doubt that the exhaust gas E is leaked out of the system before the treatment.

在此,在前述第1發明中較佳為,前述減壓狀態是在1Torr以上且700Torr以下的範圍內,更佳為15 Torr以上且685Torr以下的範圍內,特佳為100±50Torr的範圍內。當減壓狀態為未達1Torr的情況,為了實現高度真空環境必須採用高價且大規模的裝置,相反的,當減壓狀態為超過700Torr的情況,因為與大氣壓的差異變小,必須將排氣E用多量的氮氣進行稀釋。Here, in the first invention, it is preferable that the decompressed state is in a range of 1 Torr or more and 700 Torr or less, more preferably in a range of 15 Torr or more and 685 Torr or less, and particularly preferably in a range of 100 ± 50 Torr. . When the decompression state is less than 1 Torr, a high-priced and large-scale device must be used in order to achieve a high vacuum environment. On the contrary, when the decompression state is more than 700 Torr, because the difference from atmospheric pressure becomes smaller, the exhaust must be exhausted. E was diluted with a large amount of nitrogen.

本發明中的第2發明是用於實施上述排氣之減壓除害方法的裝置,例如圖1及圖2所示般,排氣之減壓除害裝置10是如以下般構成。排氣之減壓除害裝置10係具有反應筒16,該反應筒16是將透過真空泵14而由排氣產生源12所供給的排氣E,在形成於其內部之排氣處理空間26藉由電熱加熱器17加熱而進行分解及/或反應處理。在該反應筒16的排氣出口40側連接著後段真空泵18,該後段真空泵18是將從上述真空泵14的排放口到上述反應筒16的內部全都進行減壓。The second invention of the present invention is a device for implementing the above-mentioned decompression and detoxification method of exhaust gas. For example, as shown in FIGS. 1 and 2, the decompression and detoxification device 10 for exhaust gas is configured as follows. The decompression and detoxification device 10 for exhaust gas has a reaction cylinder 16 which receives the exhaust gas E supplied from the exhaust gas generation source 12 through the vacuum pump 14 in an exhaust gas treatment space 26 formed in the reaction cylinder 16. It is heated by the electric heater 17 to perform decomposition and / or reaction treatment. A rear-stage vacuum pump 18 is connected to the exhaust outlet 40 side of the reaction cylinder 16. The rear-stage vacuum pump 18 is configured to reduce the pressure from the discharge port of the vacuum pump 14 to the inside of the reaction cylinder 16.

在該第2發明中較佳為設置分解暨反應輔助劑供給手段20,該分解暨反應輔助劑供給手段20是對前述反應筒16的內部供給作為分解暨反應輔助劑之選自由水分、空氣、O 2、H 2及碳氫化合物氣體所構成群中之至少1種。在此情況,縱使在排氣E中多量地含有主體為SiH 4、NF 3等之可燃性物質或有害物質的情況,藉由加入上述的分解暨反應輔助劑,能夠將該等物質輕易地分解成穩定的狀態、或進行反應而使其無害化。 In the second invention, it is preferable to provide a decomposition and reaction aid supply means 20, which is supplied to the inside of the reaction cylinder 16 and is selected from the group consisting of moisture, air, and At least one of the group consisting of O 2 , H 2 and a hydrocarbon gas. In this case, even if the exhaust gas E contains a large amount of flammable substances or harmful substances, such as SiH 4 and NF 3 , by adding the above-mentioned decomposition and reaction aids, these substances can be easily decomposed. A stable state or a reaction is performed to render it harmless.

此外,在第2發明中較佳為,上述反應筒16係成為具有外管21和內管23之雙層管構造,在上述外管21和上述內管23之間形成預熱區25,該預熱區25,是讓被導入上述反應筒16內而往前述排氣處理空間26供給之處理前的排氣E和在上述排氣處理空間26藉由加熱而被分解暨反應處理後之處理完畢的排氣E之間進行熱交換。在此情況,在處於也能稱為準真空之減壓環境下之反應筒16的內部,可將往排氣處理空間26供給的排氣E預熱,能夠將藉由電熱加熱器17所生成的熱能量毫無浪費地利用於排氣E的分解暨反應處理。Further, in the second invention, it is preferable that the reaction tube 16 has a double-tube structure having an outer tube 21 and an inner tube 23, and a preheating zone 25 is formed between the outer tube 21 and the inner tube 23. The preheating zone 25 is a process for allowing the exhaust gas E before the treatment which is introduced into the reaction cylinder 16 and supplied to the exhaust treatment space 26 and the exhaust treatment space 26 which is decomposed and reacted by heating. The exhaust gas E is exchanged with heat. In this case, the exhaust gas E supplied to the exhaust treatment space 26 can be preheated inside the reaction cylinder 16 under a reduced-pressure environment which can also be referred to as a quasi-vacuum, and can be generated by the electric heater 17 The thermal energy is used for the decomposition and reaction treatment of exhaust gas E without waste.

再者,在前述第2發明中較佳為,前述後段真空泵18為水封泵。後段真空泵18,除了將從真空泵14的排放口到上述反應筒16的內部全都進行減壓以外,還是用於將在反應筒16內被除害處理後的排氣進行吸入、吐出者。在此,水封泵(水封式真空泵)是指,在殼體內加入適當量的水封液而讓葉輪旋轉的構造之泵,係利用由被離心力按壓於殼體內壁之水封液和葉輪所包圍的空間之變化而進行吸入、吐出作用的真空泵。因此,在反應筒16內被除害處理後的排氣E,在通過水封泵的內部時會和水封液接觸。如此一來,藉由除害處理而伴生之排氣E中的水溶性成分,會溶解於水封液而從排氣E中除去。因此,可省略濕式洗滌器(wet scrubber)等的排氣水洗裝置。 發明效果Moreover, in the said 2nd invention, it is preferable that the said back stage vacuum pump 18 is a water seal pump. The rear-stage vacuum pump 18 is used to suck in and discharge the exhaust gas that has been detoxified in the reaction cylinder 16 in addition to reducing the pressure from the discharge port of the vacuum pump 14 to the inside of the reaction cylinder 16. Here, the water-sealed pump (water-sealed vacuum pump) refers to a pump having a structure in which an appropriate amount of water-sealing liquid is added to the casing to rotate the impeller, and the water-sealing liquid and the impeller are pressed against the inner wall of the casing by centrifugal force A vacuum pump that performs suction and discharge by changing the enclosed space. Therefore, the exhaust gas E that has been subjected to the detoxification treatment in the reaction cylinder 16 comes into contact with the water-sealing liquid when passing through the inside of the water-sealing pump. In this way, the water-soluble components in the exhaust gas E accompanied by the detoxification treatment are dissolved in the water-sealing liquid and removed from the exhaust gas E. Therefore, an exhaust water washing device such as a wet scrubber can be omitted. Invention effect

依據本發明,能夠提供一種排氣之除害方法及其裝置,可不減損安全性而使稀釋用氮氣的使用極小化,而具有優異的能量利用效率。According to the present invention, it is possible to provide a method and a device for eliminating exhaust gas, which can minimize the use of nitrogen for dilution without detracting from safety, and has excellent energy utilization efficiency.

以下,針對本發明的一實施形態,參照圖1及圖2做說明。圖1係顯示本發明的一實施形態的排氣之減壓除害裝置10的概要圖。如圖1所示般,本實施形態的排氣之減壓除害裝置10,係用於將從CVD裝置等的排出源12透過真空泵14而供給之排氣E進行除害的裝置,且具有反應筒16及後段真空泵18。在此,在圖1的實施形態,作為排氣的產生源12是顯示氮化矽膜CVD裝置的例子。在典型的氮化矽膜CVD裝置,作為程序氣體是使用SiH 4/NH 3/N 2O =1slm/10slm/10slm,作為清洗氣體(cleaning gas)是使用NF 3/Ar=15slm/10slm,作為清洗反應的生成物之SiF 4可視為被排出約10slm左右。使用完畢後的該等氣體以排氣E的形式透過真空泵14往減壓除害裝置10供給。在像氮化矽膜CVD那樣的半導體元件的製造程序,作為真空泵14主要是使用乾式泵。因此,供應給該真空泵14的N 2(氮氣),是為了該泵14的軸封所供給的沖洗(purge)N 2Hereinafter, an embodiment of the present invention will be described with reference to FIGS. 1 and 2. FIG. 1 is a schematic diagram showing an exhaust gas pressure reduction and detoxification device 10 according to an embodiment of the present invention. As shown in FIG. 1, the decompression and detoxification device 10 for exhaust gas according to the present embodiment is a device for detoxifying exhaust gas E supplied from a discharge source 12 such as a CVD device through a vacuum pump 14 and has The reaction cylinder 16 and the rear vacuum pump 18. Here, in the embodiment of FIG. 1, the exhaust gas generation source 12 is an example showing a silicon nitride film CVD apparatus. In a typical silicon nitride film CVD device, SiH 4 / NH 3 / N 2 O = 1slm / 10slm / 10slm is used as a program gas, and NF 3 / Ar = 15slm / 10slm is used as a cleaning gas. It can be considered that SiF 4 which is a product of the washing reaction is discharged about 10 slm. After use, these gases are supplied to the decompression and detoxification device 10 through the vacuum pump 14 in the form of exhaust gas E. In the manufacturing process of a semiconductor element such as a silicon nitride film CVD, a dry pump is mainly used as the vacuum pump 14. Therefore, N 2 (nitrogen) supplied to the vacuum pump 14 is to purge N 2 supplied to the shaft seal of the pump 14.

反應筒16係具有外管21及內管23而構成雙層管(參照圖2),外管21是由赫史特合金(HASTELLOY,註冊商標)等的耐蝕性優異的金屬材料等所形成,成為其軸朝向上下方向地豎設之圓筒狀;內管23同樣是由赫史特合金(HASTELLOY,註冊商標)等的耐蝕性優異的金屬材料等所形成,且在上述外管21內配設成與該外管21成為同心圓狀。在此,在外管21之外周壁下端部設有:透過配管36而連通於真空泵14的排放口(delivery,吐出口)之排氣入口38。此外,由外管21和內管23包夾的空間,其下端部呈密閉,且上端部是讓內管23與反應筒16之頂板16a隔著距離,藉此與形成於內管23的內部之排氣處理空間26連通。因此,從排氣入口38導入由外管21和內管23所包夾的空間之排氣E,在該空間上昇的期間,會與於排氣處理空間26內被加熱分解處理後之高溫的處理完畢的排氣E之間進行熱交換而被預熱。亦即,由該外管21和內管23所包夾的空間成為預熱區25。The reaction tube 16 is composed of a double tube (refer to FIG. 2) having an outer tube 21 and an inner tube 23. The outer tube 21 is formed of a metal material having excellent corrosion resistance such as HASTELLOY (registered trademark). It has a cylindrical shape with its shaft facing up and down. The inner tube 23 is also formed of a metal material with excellent corrosion resistance such as HASTELLOY (registered trademark), and is arranged in the outer tube 21. It is formed in a concentric shape with the outer tube 21. Here, an exhaust inlet 38 is provided at the lower end portion of the outer peripheral wall of the outer pipe 21 and communicates with a discharge port (delivery port) of the vacuum pump 14 through a pipe 36. In addition, in the space enclosed by the outer tube 21 and the inner tube 23, the lower end portion is closed, and the upper end portion separates the inner tube 23 from the top plate 16a of the reaction tube 16, thereby forming a space with the inner tube 23 The exhaust processing space 26 communicates. Therefore, the exhaust gas E introduced into the space enclosed by the outer tube 21 and the inner tube 23 from the exhaust inlet 38 will be at a high temperature after the space is heated up and decomposed in the exhaust treatment space 26 while the space rises. The processed exhaust gas E is preheated by heat exchange. That is, the space enclosed by the outer tube 21 and the inner tube 23 becomes the preheating zone 25.

該反應筒16豎設於架台27,且內管23的下端部往下方延伸,在反應筒16的前端開設有:與後段真空泵18之吸取口(suction,吸入口)直接連結之排氣出口40。圖2中的符號29a表示測定埠,其係用於安裝測定反應筒16內部的真空度之真空計(未圖示)等的計器;符號29b表示供氣噴嘴,其係按照必要而朝向反應筒16內部加入反應空氣、稀釋空氣等。此外,在讓反應筒16上部之預熱區25和排氣處理空間26連通的部分之附近安裝有噴嘴42(參照圖2A),其係按照必要而將分解暨反應輔助劑供給手段20所供給之水分等的分解暨反應輔助劑導入排氣處理空間26內。而且,在反應筒16之頂板16a的中央部穿設有加熱器插入孔16b,透過該加熱器插入孔16b來設置反應筒16內的電熱加熱器17。The reaction cylinder 16 is erected on the stand 27, and the lower end portion of the inner tube 23 extends downward. The front end of the reaction cylinder 16 is provided with an exhaust outlet 40 directly connected to the suction (suction) of the vacuum pump 18 at the rear section. . Reference numeral 29a in FIG. 2 indicates a measurement port, which is a meter for installing a vacuum gauge (not shown) for measuring the degree of vacuum inside the reaction cylinder 16; and 29b, an air supply nozzle, which faces the reaction cylinder as necessary Internally, reaction air and dilution air are added. In addition, a nozzle 42 (see FIG. 2A) is installed near a portion that communicates the preheating zone 25 and the exhaust treatment space 26 on the upper portion of the reaction cylinder 16 with the decomposition and reaction auxiliary agent supply means 20 as necessary. Decomposition and reaction aids such as water and the like are introduced into the exhaust treatment space 26. In addition, a heater insertion hole 16 b is formed in the center of the top plate 16 a of the reaction cylinder 16, and an electric heating heater 17 in the reaction cylinder 16 is provided through the heater insertion hole 16 b.

電熱加熱器17,係用於將排氣處理空間26內加熱到排氣E(特別是除害對象成分)之熱分解溫度以上(具體而言為600℃~1300℃左右)的既定溫度而讓排氣E進行加熱分解,且具有發熱體17a及保護管17b。發熱體17a,是藉由電氣而以排氣E之熱分解溫度以上的溫度進行發熱,其是成為電熱加熱器17的發熱源,例如可列舉:由碳化矽構成之實心或中空的棒狀物,將鎳鉻合金線、鐵鉻鋁線(Kanthal wire)等的金屬線在其長度方向中心部C對折而讓該金屬線彼此大致並行之後,進一步呈螺旋狀捲繞而成之物等。而且,該發熱體17a的外周是由保護管17b保護。保護管17b,是由氧化鋁(Al 2O 3)、氧化矽(SiO 2)及氮化矽(Si 3N 4)等的陶瓷、或赫史特合金(註冊商標)等的耐蝕性優異的金屬材料等所構成,係在其內部收容發熱體17a而保護發熱體之有底筒狀的容器體。 The electric heater 17 is used to heat the exhaust treatment space 26 to a predetermined temperature above the thermal decomposition temperature of the exhaust gas E (especially the components to be harmed) (specifically, about 600 ° C to 1300 ° C). The exhaust gas E is thermally decomposed, and includes a heating element 17a and a protective tube 17b. The heating element 17a generates electricity at a temperature equal to or higher than the thermal decomposition temperature of the exhaust gas E by electricity. The heating element 17a becomes a heating source of the electric heating heater 17, and examples thereof include solid or hollow rods made of silicon carbide. A metal wire such as a nickel-chromium alloy wire, a Kanthal wire, etc., which is folded in half at the center C in the longitudinal direction so that the metal wires are substantially parallel to each other, and is further wound in a spiral shape. The outer periphery of the heating element 17a is protected by a protection tube 17b. The protective tube 17b is made of ceramics such as alumina (Al 2 O 3 ), silicon oxide (SiO 2 ), and silicon nitride (Si 3 N 4 ), or has excellent corrosion resistance. A bottomed cylindrical container body made of a metal material or the like, which houses the heating element 17a and protects the heating element.

後段真空泵18,係用於將從真空泵14之排放口到反應筒16的內部全都減壓到既定的真空度,且將在反應筒16進行除害處理後的排氣E吸引並排出。在本實施形態,作為該後段真空泵18是使用水封泵。因此,在後段真空泵18之排放口側裝設有:用於讓從該後段真空泵18以混合狀態排出之處理完畢的排氣E和水封液分離之氣液分離聚結器(coalescer)等的分離器62(參照圖1)。The rear-stage vacuum pump 18 is used to reduce the pressure from the discharge port of the vacuum pump 14 to the inside of the reaction cylinder 16 to a predetermined vacuum degree, and to suck and exhaust the exhaust gas E after the decontamination treatment of the reaction cylinder 16. In this embodiment, a water-sealed pump is used as the rear-stage vacuum pump 18. Therefore, a gas-liquid separation coalescer (coalescer) for separating the treated exhaust gas E discharged from the rear-stage vacuum pump 18 in a mixed state and a water-seal liquid is installed on the discharge port side of the rear-stage vacuum pump 18 The separator 62 (refer to FIG. 1).

在此,由後段真空泵18所造成之從真空泵14的排放口到反應筒16的內部之排氣流通區域的減壓狀態,較佳為1Torr以上且700Torr以下的範圍內,更佳為15Torr以上且685Torr以下的範圍內,特佳為100±50Torr的範圍內。當減壓狀態為未達1Torr的情況,為了實現高度真空環境必須採用高價且大規模的裝置,相反的,當減壓狀態為超過700Torr的情況,因為與大氣壓的差異變小,必須將排氣E用與大氣壓下相同程度之多量的氮氣進行稀釋。Here, the depressurized state from the exhaust port of the vacuum pump 14 to the exhaust gas flow area inside the reaction cylinder 16 caused by the rear-stage vacuum pump 18 is preferably in a range of 1 Torr or more and 700 Torr or less, more preferably 15 Torr or more and In the range below 685 Torr, it is particularly preferably in the range of 100 ± 50 Torr. When the decompression state is less than 1 Torr, a high-priced and large-scale device must be used in order to achieve a high vacuum environment. On the contrary, when the decompression state is more than 700 Torr, because the difference from atmospheric pressure becomes smaller, the exhaust must be exhausted. E was diluted with the same amount of nitrogen as at atmospheric pressure.

在本實施形態的排氣之減壓除害裝置10,雖未圖示出,當然具備有:為了使電熱加熱器17、後段真空泵18等進行動作所必要之各種檢測機器、控制機器及電源等。Although not shown in the exhaust gas decompression and detoxification device 10 of this embodiment, it is of course provided with various detection equipment, control equipment, power supply, and the like necessary for operating the electric heater 17, the vacuum pump 18 at the rear, and the like. .

接下來說明,使用了如以上般構成的排氣之減壓除害裝置10的排氣E之減壓除害方法,從排氣產生源12排出的排氣E是透過真空泵14往反應筒16供給。在此,藉由讓後段真空泵18作動,使排氣E保持於既定的減壓狀態並從反應筒16內的預熱區25往排氣處理空間26導入,在該排氣處理空間26藉由電熱加熱器17所產生的熱進行分解暨反應處理。Next, the decompression and detoxification method of the exhaust gas E using the exhaust decompression and detoxification device 10 configured as described above will be described. The exhaust gas E discharged from the exhaust generation source 12 is passed through the vacuum pump 14 to the reaction cylinder 16. supply. Here, by operating the vacuum pump 18 at the rear stage, the exhaust gas E is maintained at a predetermined reduced pressure state, and the exhaust gas E is introduced into the exhaust gas treatment space 26 from the preheating zone 25 in the reaction cylinder 16. The heat generated by the electric heating heater 17 is decomposed and reacted.

依據本實施形態的排氣之減壓除害方法,將排氣E保持減壓狀態,使電熱加熱器17加熱而進行分解暨反應所產生的熱變稀薄,不致發生急劇的溫度上昇、爆炸反應就能進行除害處理,因此稀釋用氮氣變得不需要或是極少量就足夠了。此外,因為如此般利用氮氣的稀釋變得不需要或極少量就足夠了,從電熱加熱器17所供給的熱能量幾乎全部都能直接利用於排氣E的分解暨反應。因此,這2個作用相輔,能夠使排氣E之除害裝置成為非常緊湊的構造。再者,因為從排氣E的產生源到處理部都是在減壓下,縱使是排氣E中包含對人體有毒的氣體的情況,仍不會有在藉由電熱加熱器17進行加熱分解暨反應處理之前使該排氣E往系統外漏出的疑慮。According to the decompression and detoxification method of the exhaust gas of this embodiment, the exhaust gas E is maintained in a reduced pressure state, and the heat generated by the decomposition and reaction of the electric heating heater 17 is thinned, so that a rapid temperature rise and an explosion reaction do not occur. It is possible to carry out the detoxification treatment, so nitrogen for dilution becomes unnecessary or a very small amount is sufficient. In addition, since such dilution with nitrogen is unnecessary or sufficient, almost all of the heat energy supplied from the electric heater 17 can be directly used for the decomposition and reaction of the exhaust gas E. Therefore, these two functions complement each other, and it is possible to make the exhaust device for exhaust E into a very compact structure. Furthermore, since the source of the exhaust gas E to the processing unit are under reduced pressure, even if the exhaust gas E contains a gas that is toxic to the human body, it will not be thermally decomposed by the electric heater 17 Concerns about the leakage of the exhaust gas E to the outside of the system before the reaction.

上述實施形態可如以下般變更。作為前述反應筒16,雖是顯示具有外管21及內管23而設有預熱區25之雙層管構造者,但當不須將排氣E預熱的情況等,該反應筒16可構成為將預熱區25省略之單管(單層管)構造者。The above embodiment can be modified as follows. Although the reaction tube 16 is a double-layer tube structure having an outer tube 21 and an inner tube 23 and a preheating zone 25, the reaction tube 16 may be used when the exhaust gas E is not required to be preheated. The structure is a single tube (single-layer tube) structure in which the preheating zone 25 is omitted.

作為從前述分解暨反應輔助劑供給手段20所供給的分解暨反應輔助劑雖舉出水分,當例如排氣E中含有多量的像NF 3那樣的PFCs(全氟化合物),作為分解暨反應生成物是生成多量HF的情況,較佳為添加作為中和劑(分解暨反應輔助劑)之KOH水溶液、NaOH水溶液等的鹼性水溶液。此外,進行氧化處理的情況也包含:添加空氣、氧氣的情況,或是加入還原性的H 2、CH 4等之碳氫化合物系氣體的情況。 Although the decomposition and reaction aid supplied from the aforementioned decomposition and reaction aid supply means 20 includes water, for example, when exhaust gas E contains a large amount of PFCs (perfluoro compounds) such as NF 3 , it is generated as decomposition and reaction When a large amount of HF is generated, it is preferable to add an alkaline aqueous solution such as a KOH aqueous solution or a NaOH aqueous solution as a neutralizing agent (decomposition and reaction aid). In addition, the case where the oxidation treatment is performed includes a case where air or oxygen is added, or a case where a reducing gas such as H 2 or CH 4 is added.

雖顯示作為前述後段真空泵18是使用水封泵的情況,但當排氣E除害處理後之分解生成物不須實施水洗的情況,可取代該水封泵而使用乾式泵等。Although the case where a water-sealed pump is used as the rear-stage vacuum pump 18 is shown, when the decomposed product after the exhaust gas E detoxification treatment does not need to be washed, a dry-type pump may be used instead of the water-sealed pump.

雖是顯示將前述真空泵14和反應筒16的排氣入口38用配管36連結的情況,但將該真空泵14的排放口和排氣入口38直接連結亦可。此外,雖是顯示將反應筒16的排氣出口40和後段真空泵18的吸取口直接連結的情況,但將反應筒16的排氣出口40和後段真空泵18透過配管來連接亦可。Although the case where the exhaust pump 38 of the vacuum pump 14 and the reaction cylinder 16 are connected by a pipe 36 is shown, the exhaust port of the vacuum pump 14 and the exhaust inlet 38 may be directly connected. In addition, although the case where the exhaust outlet 40 of the reaction cylinder 16 and the suction port of the rear vacuum pump 18 are directly connected is shown, the exhaust outlet 40 of the reaction cylinder 16 and the rear vacuum pump 18 may be connected through a pipe.

10‧‧‧排氣之減壓除害裝置10‧‧‧Vacuum decompression device

12‧‧‧排氣產生源12‧‧‧ exhaust gas generation source

14‧‧‧真空泵14‧‧‧Vacuum pump

16‧‧‧反應筒16‧‧‧Reactor

17‧‧‧電熱加熱器17‧‧‧ Electric heater

18‧‧‧後段真空泵18‧‧‧ rear vacuum pump

20‧‧‧分解暨反應輔助劑供給手段20‧‧‧ Decomposition and reaction aid supply means

21‧‧‧外管21‧‧‧ Outer tube

23‧‧‧內管23‧‧‧Inner tube

25‧‧‧預熱區25‧‧‧ warm-up zone

26‧‧‧排氣處理空間26‧‧‧Exhaust treatment space

E‧‧‧排氣E‧‧‧Exhaust

圖1係顯示本發明的一實施形態的排氣之減壓除害裝置的概要圖。   圖2A係顯示本發明的排氣之減壓除害裝置之反應筒的一例之前視局部剖面圖,圖2B係圖2A之A-A線剖面圖。FIG. 1 is a schematic diagram showing a decompression and detoxification device for exhaust gas according to an embodiment of the present invention. FIG. 2A is a partial front sectional view showing an example of a reaction cylinder of the decompression and detoxification device for exhaust gas of the present invention, and FIG. 2B is a sectional view taken along the line A-A of FIG. 2A.

Claims (7)

一種排氣之減壓除害方法,其特徵在於,係將透過真空泵而由排氣產生源供給的排氣,保持減壓狀態並藉由電熱加熱器加熱而進行分解處理。A decompression and detoxification method for exhaust gas, characterized in that the exhaust gas supplied from an exhaust gas generation source through a vacuum pump is maintained in a reduced pressure state and is decomposed by being heated by an electric heater. 如請求項1所述之排氣之減壓除害方法,其中,前述減壓狀態是在1Torr以上且700Torr以下的範圍內。The decompression and detoxification method of exhaust gas according to claim 1, wherein the decompression state is in a range of 1 Torr or more and 700 Torr or less. 一種排氣之減壓除害裝置,其特徵在於,係具備反應筒(16)及後段真空泵(18),前述反應筒(16),係將透過真空泵(14)而由排氣產生源(12)供給的排氣(E),在形成於其內部之排氣處理空間(26)藉由電熱加熱器(17)加熱而進行分解處理,前述後段真空泵(18),係連接於前述反應筒(16)的排氣出口側,且將從前述真空泵(14)的排放口到前述反應筒(16)的內部全都進行減壓。A decompression and detoxification device for exhaust gas, characterized in that it includes a reaction cylinder (16) and a rear vacuum pump (18). The reaction cylinder (16) passes through the vacuum pump (14) and is generated from an exhaust gas source (12). The exhaust gas (E) supplied is decomposed in an exhaust treatment space (26) formed in the interior by heating by an electric heater (17). The aforementioned vacuum pump (18) is connected to the reaction cylinder ( 16), the pressure is reduced from the exhaust port of the vacuum pump (14) to the inside of the reaction cylinder (16). 如請求項3所述之排氣之減壓除害裝置,其中,在前述反應筒(16)的內部設置分解暨反應輔助劑供給手段(20),前述分解暨反應輔助劑供給手段(20),係對前述反應筒(16)的內部供給作為分解暨反應輔助劑之選自由水分、空氣、O2、H2及碳氫化合物氣體所構成群中之至少1種。The decompression and detoxification device for exhaust gas according to claim 3, wherein a decomposition and reaction aid supply means (20) and a decomposition and reaction aid supply means (20) are provided inside the reaction cylinder (16). It is at least one selected from the group consisting of moisture, air, O 2 , H 2 and hydrocarbon gas as a decomposition and reaction aid supplied to the inside of the reaction cylinder (16). 如請求項3或4所述之排氣之減壓除害裝置,其中,前述反應筒(16)成為具有外管(21)及內管(23)之雙層管構造,在前述外管(21)和前述內管(23)之間形成有預熱區(25),前述預熱區(25),係讓被導入前述反應筒(16)內而往前述排氣處理空間(26)供給之處理前的排氣(E)和在前述排氣處理空間(26)藉由加熱而被分解處理後之處理完畢的排氣(E)之間進行熱交換。The exhaust pressure reduction and harm reduction device according to claim 3 or 4, wherein the reaction tube (16) has a double-layered tube structure including an outer tube (21) and an inner tube (23), and the outer tube (16) A preheating zone (25) is formed between the 21) and the inner pipe (23). The preheating zone (25) is introduced into the reaction cylinder (16) and supplied to the exhaust treatment space (26). Heat exchange is performed between the exhaust gas (E) before the treatment and the processed exhaust gas (E) after the exhaust treatment space (26) is decomposed by heating. 如請求項3或4所述之排氣之減壓除害裝置,其中,前述後段真空泵(18)為水封泵。The exhaust pressure reducing and harm removing device according to claim 3 or 4, wherein the aforementioned vacuum pump (18) at the rear stage is a water-sealed pump. 如請求項5所述之排氣之減壓除害裝置,其中,前述後段真空泵(18)為水封泵。The decompression and detoxification device for exhaust gas according to claim 5, wherein the vacuum pump (18) at the rear stage is a water-sealed pump.
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