JPH04326715A - Manufacture of metallized film capacitor - Google Patents

Manufacture of metallized film capacitor

Info

Publication number
JPH04326715A
JPH04326715A JP9663891A JP9663891A JPH04326715A JP H04326715 A JPH04326715 A JP H04326715A JP 9663891 A JP9663891 A JP 9663891A JP 9663891 A JP9663891 A JP 9663891A JP H04326715 A JPH04326715 A JP H04326715A
Authority
JP
Japan
Prior art keywords
face
electrode
metallized film
film
dielectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9663891A
Other languages
Japanese (ja)
Other versions
JP2658614B2 (en
Inventor
Hisaaki Tachihara
久明 立原
Kenji Kuwata
桑田 健治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9663891A priority Critical patent/JP2658614B2/en
Publication of JPH04326715A publication Critical patent/JPH04326715A/en
Application granted granted Critical
Publication of JP2658614B2 publication Critical patent/JP2658614B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To provide a method wherein a metallized film capacitor which is small-sized and provided with the good connection of an electrode to an edge electrode is manufactured with good mass-productivity. CONSTITUTION:A wide metallized film is wound on a flat board-shaped bobbin 5; parts A near both end parts in the lengthwise direction of the film are heat- pressed and brought into close contact by a first pressure; the whole face of the bobbin is heat-pressed by a second pressure which is weaker than the first pressure; gaps are formed between layers of the film at an electrode extraction edge to which a chemical selective removal operation is exerted. When many gaps exist, protruding and recessed parts are formed on the film by the chemical selective removal operation. As a result, an electrode and an edge electrode can be connected satisfactorily.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は金属化フィルムコンデン
サの製造方法に関する。
FIELD OF THE INVENTION This invention relates to a method of manufacturing metallized film capacitors.

【0002】0002

【従来の技術】近年、電子部品に対して小形化,軽量化
,高性能化,低価格化が要望されており、金属化フィル
ムコンデンサについても小形化,高性能化のための開発
が盛んに行われている。
[Background Art] In recent years, there has been a demand for electronic components to be smaller, lighter, higher performance, and lower in price, and metallized film capacitors have also been actively developed to be smaller and higher in performance. It is being done.

【0003】金属化フィルムコンデンサの小形化,高性
能化の要望に対して、我々は特開平1−248607号
公報において、誘電体の電極引き出し端面を化学的に選
択的に除去して、電極と端面電極との良好な電気的接触
と、端面電極の十分な付着強度を得ることができる製造
方法を提案した。
[0003] In response to the demand for smaller size and higher performance of metallized film capacitors, in Japanese Patent Application Laid-Open No. 1-248607, we chemically and selectively remove the electrode lead-out end face of the dielectric material to form electrodes and We proposed a manufacturing method that can obtain good electrical contact with the end electrode and sufficient adhesion strength of the end electrode.

【0004】電極と端面電極との良好な電気的接触と、
端面電極の十分な付着強度を得るには特開平1−248
607号公報に示されているように、誘電体の電極引き
出し端面で、隣合う誘電体層を前記端面中90%以上、
かつ0.2mmを越えない範囲でラップさせて凹凸を形
成する必要がある。しかしながら、特開平1−2486
07号公報に示されている製造方法には、誘電体の電極
引き出し端面を、化学的に選択的除去する方法は記述さ
れているが、化学的に選択的除去した後の誘電体層の凹
凸状態が、隣合う誘電体層を電極引き出し端面中90%
以上、かつ0.2mmを越えない範囲でラップするよう
に形成する方法について具体的に記述されていない。
Good electrical contact between the electrode and the end electrode;
In order to obtain sufficient adhesion strength of the end electrode, Japanese Patent Application Laid-Open No. 1-248
As shown in Japanese Patent Application No. 607, at the end face of the dielectric where the electrode is drawn out, the adjacent dielectric layer is 90% or more of the end face.
Moreover, it is necessary to form unevenness by lapping within a range not exceeding 0.2 mm. However, JP-A-1-2486
The manufacturing method shown in Publication No. 07 describes a method of chemically selectively removing the electrode extension end face of the dielectric, but the unevenness of the dielectric layer after chemically selectively removing it is described. The condition is that the adjacent dielectric layer is 90% of the electrode extension end face.
As mentioned above, there is no specific description of a method for forming the film so as to wrap it within a range not exceeding 0.2 mm.

【0005】従来の製造方法では図12(a)に示すよ
うに、有機材料からなる誘電体フィルム(以下フィルム
を略す)1aに真空蒸着により形成したアルミニウム電
極2を形成した金属化フィルム1を巻回してフィルム1
aと電極2を交互に多重に重ね合わせた積層型の金属化
フィルムの母材を切断スリットして端面のそろった金属
化フィルムのコンデンサ要素39を形成していた。Aは
その両端部近傍、Bはその両端部近傍以外の部分を示す
。図12(b)に示すように、コンデンサ要素39の端
面のフィルム層間には、両端部近傍A,両端部近傍以外
の部分Bとも部分的に間隙が存在していない。図13(
a),(b)において、33はコンデンサ要素39の化
学的な選択的除去を受ける前の状態を示す電極引き出し
端面、35はコンデンサ要素39の化学的な選択的除去
を受けた状態を示す電極引き出し端面、3は電極2が形
成されていない非金属化部を示す。
In the conventional manufacturing method, as shown in FIG. 12(a), a metallized film 1 on which aluminum electrodes 2 formed by vacuum deposition are formed is wrapped around a dielectric film (hereinafter simply referred to as "film") 1a made of an organic material. Turn film 1
A metallized film capacitor element 39 with uniform end surfaces was formed by cutting and slitting a base material of a laminated metallized film in which electrodes 2 and electrodes 2 were alternately stacked in multiple layers. A indicates the vicinity of both ends, and B indicates a portion other than the vicinity of both ends. As shown in FIG. 12(b), there is no gap between the film layers on the end face of the capacitor element 39 in both the vicinity A of both ends and the portion B other than the vicinity of both ends. Figure 13 (
In a) and (b), reference numeral 33 indicates an electrode lead-out end face in a state before the capacitor element 39 is selectively removed chemically, and 35 indicates an electrode in a state in which the capacitor element 39 is subjected to selective chemical removal. The drawing end face 3 indicates a non-metalized part on which the electrode 2 is not formed.

【0006】[0006]

【発明が解決しようとする課題】しかしながらコンデン
サ要素39の電極引き出し端面33を有機材料と反応性
のある部分を少なくとも含むガスに接触させて、フィル
ム1aの電極引き出し端面33を化学的に選択的除去し
ただけでは電極引き出し端面33には凹凸が形成されに
くいという課題があった。
However, the electrode end surface 33 of the film 1a is chemically and selectively removed by bringing the electrode end surface 33 of the capacitor element 39 into contact with a gas containing at least a portion reactive with an organic material. There is a problem in that it is difficult to form irregularities on the electrode extension end face 33 if only this is done.

【0007】化学的な選択的除去によって電極引き出し
端面33に凹凸を前述のように形成するには、フィルム
同志が完全に密着していないこと、すなわち図示してい
ないが、フィルム層間に部分的に間隙が存在する必要が
ある。なぜならば、化学的な選択的除去の工程で、反応
種は露出している有機材料にのみ反応して化学的に選択
的除去するから、図12(b)に示すようにフィルム層
間に部分的に間隙が存在しない場合は、図13(a)に
示すようにフィルム端面31しか露出していないのでフ
ィルム端面31だけが除去されて、化学的な選択的除去
の工程後でも図13(b)に示すように凹凸状態が有効
に形成されずフィルム端面31がほぼそろったままであ
る。
In order to form the unevenness on the electrode lead-out end face 33 by chemical selective removal as described above, it is necessary that the films are not completely in close contact with each other, that is, there is a partial gap between the film layers (not shown). A gap must exist. This is because, in the chemical selective removal process, reactive species react only with exposed organic materials and are chemically selectively removed. If there is no gap, only the film end face 31 is exposed as shown in FIG. 13(a), so only the film end face 31 is removed, and even after the chemical selective removal process, the film end face 31 is exposed as shown in FIG. 13(b). As shown in FIG. 2, the unevenness is not effectively formed and the film end face 31 remains almost even.

【0008】しかしながら、フィルム層間に部分的に間
隙が存在するような状態を形成するにはフィルム密着状
態を弱くする必要があり、そのような状態ではフィルム
がばらけてしまい、フィルム積層体を電極引き出し端面
部分で分割して、個別のコンデンサ要素39に分割する
際に機械によるハンドリングができないという課題があ
った。
However, in order to form a state in which gaps exist partially between the film layers, it is necessary to weaken the film adhesion, and in such a state, the film will come apart, and the film laminate will not be connected to the electrode. There was a problem in that mechanical handling was not possible when dividing the capacitor element 39 at the drawer end face portion into individual capacitor elements 39.

【0009】本発明は上記従来の製造方法における課題
を解決するもので、電極と端面電極との良好な電気的接
触と、端面電極の十分な付着強度を得ることができる電
極引き出し端面の凹凸を形成し、かつフィルム同志がば
らけず、機械によるハンドリングができる金属化フィル
ムコンデンサの製造方法を提供することを目的とする。
[0009] The present invention solves the above-mentioned problems in the conventional manufacturing method, and it is possible to obtain good electrical contact between the electrode and the end electrode and sufficient adhesion strength of the end electrode. It is an object of the present invention to provide a method for manufacturing a metallized film capacitor that can be formed, the films do not come apart, and can be handled by a machine.

【0010】0010

【課題を解決するための手段】上記課題を解決するため
に、本発明の金属化フィルムコンデンサの製造方法は、
巻き取った金属化フィルムの積層体の、金属化フィルム
長手方向のボビン両端部近傍を第一の圧力条件でヒート
プレスして前記金属化フィルムを密着させる工程と、そ
の後、前記積層体全面を第一の圧力条件より弱い第二の
圧力条件でヒートプレスする工程とを有し、かつ前記積
層体を電極引き出し端面で分割して、個別のコンデンサ
要素に分割する工程と、分割した前記コンデンサ要素の
前記電極引き出し端面を、前記金属化フィルムを構成す
る有機材料と反応性のある成分を少なくとも含むガスに
接触させて、誘電体フィルムの前記電極引き出し端面を
化学的に選択的除去した後に、前記電極引き出し端面に
端面電極を形成する工程とを有するものである。
[Means for Solving the Problems] In order to solve the above problems, the method for manufacturing a metallized film capacitor of the present invention includes the following steps:
A step of heat pressing the wound metallized film laminate near both ends of the bobbin in the longitudinal direction of the metallized film under a first pressure condition to bring the metallized film into close contact; a step of heat pressing under a second pressure condition that is weaker than the first pressure condition; and a step of dividing the laminate at the electrode lead-out end face into individual capacitor elements; After chemically selectively removing the electrode extension end face of the dielectric film by bringing the electrode extension end face into contact with a gas containing at least a component reactive with the organic material constituting the metallized film, the electrode extension end face is chemically and selectively removed. The method includes a step of forming an end surface electrode on the lead-out end surface.

【0011】[0011]

【作用】この構成により本発明の金属化フィルムコンデ
ンサの製造方法は、積層体の金属化フィルム長手方向の
ボビン両端部近傍は、第一の圧力条件によるヒートプレ
スによってフィルム同志が密着しているので、前記積層
体を電極引き出し端面で分割して、個別のコンデンサ要
素に分割する際にばらけることなく、機械によるハンド
リングができる強度をもつことができることとなる。
[Function] According to the method for manufacturing a metallized film capacitor of the present invention, with this configuration, the films are brought into close contact with each other in the vicinity of both ends of the bobbin in the longitudinal direction of the metallized film of the laminate by heat pressing under the first pressure condition. By dividing the laminate at the electrode lead-out end face, the laminate can be strong enough to be handled mechanically without coming apart when divided into individual capacitor elements.

【0012】さらに、ボビン両端部近傍以外は第一の圧
力条件より弱い第二の圧力条件のみでヒートプレスされ
るのでフィルム層間に部分的に間隙が存在し、したがっ
て化学的に選択的除去の際に、前記フィルム層間の間隙
にも反応種が侵入できるので、フィルム表面の一部にも
化学的な選択的除去が施され、前記間隙の分布にしたが
って、前記電極引き出し端面に、隣合う誘電体層を電極
引き出し端面中90%以上、かつ0.2mmを越えない
範囲でラップするように凹凸が形成される。したがって
電極と端面電極との良好な電気的接触と、前記端面電極
の十分な付着強度を得ることができることとなる。
Furthermore, since the areas other than the vicinity of both ends of the bobbin are heat-pressed only under the second pressure condition, which is weaker than the first pressure condition, gaps exist partially between the film layers, and therefore, during selective chemical removal. In addition, since the reactive species can also invade the gaps between the film layers, a part of the film surface is also chemically selectively removed, and the adjacent dielectric material is removed from the electrode lead-out end face according to the distribution of the gaps. The unevenness is formed so as to wrap the layer over 90% or more of the electrode lead-out end face and within a range not exceeding 0.2 mm. Therefore, it is possible to obtain good electrical contact between the electrode and the end electrode and sufficient adhesion strength of the end electrode.

【0013】[0013]

【実施例】以下、本発明の一実施例の金属化フィルムコ
ンデンサの製造方法について、図面にもとづいて説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A method of manufacturing a metallized film capacitor according to an embodiment of the present invention will be described below with reference to the drawings.

【0014】図1,2において、1はポリーフェニレン
サルファイドフィルム(誘電体フィルム)1aの片面に
アルミニウムを真空蒸着したアルミニウム蒸着膜による
電極2を形成した金属化フィルム、3は非金属化部(以
下、マージンと称す)である。金属化フィルム1は図3
に示すように平板板のボビン5に巻き取った後、図4(
a)に示すように金属化フィルム1の長さ方向のボビン
端部(図1(a)中Aで示す)のみがプレスできるプレ
ス板6を用いて、第一のプレス条件でヒートプレスして
密着する。その後、図4(b)に示すようにボビン全面
を覆うプレス板7を用いて、第一のプレス条件より弱い
圧力の第二のプレス条件にてヒートプレスして、第一の
プレス条件でヒートプレスした部分以外の金属化フィル
ム1を弱く密着する。ヒートプレスの後、図5に示すよ
うに、平板状のボビン5から金属化フィルム1の積層体
8を分離し、図6に示すように、カミソリ刃17を用い
て各コンデンサ要素の電極引き出し端面に当たる位置で
分割する。
In FIGS. 1 and 2, 1 is a metallized film in which an electrode 2 is formed by vacuum-depositing aluminum on one side of a polyphenylene sulfide film (dielectric film) 1a, and 3 is a non-metalized part (hereinafter referred to as , margin). Metallized film 1 is shown in Figure 3.
After winding it onto the flat bobbin 5 as shown in FIG.
As shown in a), the metallized film 1 is heat-pressed under the first pressing condition using a press plate 6 that can press only the bobbin end in the length direction (indicated by A in FIG. 1(a)). In close contact. Thereafter, as shown in FIG. 4(b), using a press plate 7 that covers the entire surface of the bobbin, the bobbin is heat pressed under a second press condition with a pressure lower than the first press condition, and then heated under the first press condition. The metallized film 1 other than the pressed portion is weakly adhered. After heat pressing, as shown in FIG. 5, the laminate 8 of the metallized film 1 is separated from the flat bobbin 5, and as shown in FIG. Divide at the corresponding position.

【0015】図1(a),(b)および(c)において
、コンデンサ要素9の長さ方向の末端部近傍は図1(a
)のAに相当し、コンデンサ要素9の両末端部のみがプ
レスされるプレス板6を用いて、第一のプレス条件にて
ヒートプレスされているため、図1(b)に示すように
、金属化フィルム1同志が完全に面で密着しており、金
属化フィルム1の間に間隙10はない。しかし両末端部
近傍以外の部分(図1(a)中Bで示す)は弱い圧力の
第二のプレス条件だけでヒートプレスされているため図
1(c)に示すように、金属化フィルム1同志は完全に
密着しておらず、金属化フィルム1は部分的に点接触状
態になっており各金属化フィルム1の間に部分的に間隙
10が形成されている。
In FIGS. 1(a), (b) and (c), the vicinity of the longitudinal end of the capacitor element 9 is shown in FIG. 1(a).
), and is heat pressed under the first pressing conditions using the press plate 6 that presses only both ends of the capacitor element 9, as shown in FIG. 1(b). The metallized films 1 are completely in close contact with each other on the surface, and there is no gap 10 between the metallized films 1. However, since the portions other than the vicinity of both ends (indicated by B in FIG. 1(a)) are heat-pressed only under the second pressing condition of weak pressure, as shown in FIG. 1(c), the metallized film 1 The metallized films 1 are not in complete contact with each other, and the metallized films 1 are partially in point contact, and gaps 10 are partially formed between each metallized film 1.

【0016】また分割されたコンデンサ要素9は両末端
部近傍Aで金属化フィルム1が完全に面で密着している
ために、両末端部近傍以外の部分Bのフィルムの密着力
が弱くてもフィルムがばらけることがなく、機械による
移載等のハンドリングが可能な強度を有している。
Furthermore, since the divided capacitor element 9 has the metallized film 1 in perfect contact with each other in the area A near both ends, even if the adhesion of the film in the area B other than the area near both ends is weak, The film does not come apart and is strong enough to be handled by mechanical transfer.

【0017】分割されたコンデンサ要素9を図7に示す
ように、鉄製の枠11にスペーサ18を間に挟みながら
電極引き出し端面13のみが露出するように組む。この
ときコンデンサ要素9の末端部近傍Aの大きさを鉄製の
枠11の厚さCより小さくすることによって、末端部近
傍Aは枠11の中に隠されて露出せず、コンデンサ要素
9の両末端部近傍以外の部分Bの電極引き出し端面13
のみが露出される。
As shown in FIG. 7, the divided capacitor element 9 is assembled in an iron frame 11 with a spacer 18 in between so that only the electrode extension end face 13 is exposed. At this time, by making the size of the vicinity A of the end part of the capacitor element 9 smaller than the thickness C of the iron frame 11, the vicinity A of the end part is hidden within the frame 11 and is not exposed, and both sides of the capacitor element 9 are Electrode extraction end surface 13 of portion B other than near the end portion
only is exposed.

【0018】コンデンサ要素9の両末端部近傍以外の部
分Bの電極引き出し端面13を、図9に示す酸素プラズ
マ処理装置により酸素ガスプラズマに接触させて、フィ
ルムの電極引き出し端面13を化学的に選択的除去して
、金属化フィルム1の電極2を露出させるとともに、電
極引き出し端面13の各誘電体フィルム1a端面が凹凸
をなすように形成する。図9において、21aは酸素ガ
ス20の吹出し口(図示していない)を有する上部放電
電極、21bは枠11にスペーサ18とともに組立てら
れたコンデンサ要素9を載置する下部放電電極、19は
一対の放電電極21a,21b間に印加する高周波電圧
を発生する高周波電源、20aは酸素ボンベ、22は一
対の放電電極21a,21bを収容する酸素プラズマ処
理装置の真空容器、23は下部放電電極21bを冷却す
る冷却水である。この酸素ガスプラズマ処理により、コ
ンデンサ要素9の両末端部近傍以外の部分Bでは、前述
のようにフィルムは部分的に点接触状態になっており、
各フィルムの間に部分的に間隙10が形成されているた
め、酸素ガスプラズマから引き出され、フィルムを構成
する有機材料と反応性のある反応種(主に酸素ラジカル
である)が間隙10にも侵入して、フィルムの表面から
も化学的な選択的除去を行うので、間隙10の散在のし
たかによって図2(a)に示す各誘電体フィルム1aの
電極引き出し端面13が図2(b)に示すような凹凸に
加工される。
The electrode end surface 13 of the portion B other than the vicinity of both ends of the capacitor element 9 is brought into contact with oxygen gas plasma using the oxygen plasma treatment apparatus shown in FIG. 9 to chemically select the electrode end surface 13 of the film. The electrode 2 of the metallized film 1 is exposed by removing the target, and the end face of each dielectric film 1a on the electrode extension end face 13 is formed to have an uneven surface. In FIG. 9, 21a is an upper discharge electrode having an outlet (not shown) for oxygen gas 20, 21b is a lower discharge electrode on which capacitor element 9 assembled with spacer 18 is placed on frame 11, and 19 is a pair of A high-frequency power supply that generates a high-frequency voltage applied between the discharge electrodes 21a and 21b, 20a an oxygen cylinder, 22 a vacuum vessel of an oxygen plasma processing apparatus that accommodates the pair of discharge electrodes 21a and 21b, and 23 cooling the lower discharge electrode 21b. This is cooling water. As a result of this oxygen gas plasma treatment, the film is partially in a point contact state as described above in the portion B other than the vicinity of both ends of the capacitor element 9.
Since a gap 10 is partially formed between each film, reactive species (mainly oxygen radicals) that are extracted from the oxygen gas plasma and are reactive with the organic material constituting the film are also present in the gap 10. Since the film is penetrated and selectively removed chemically from the surface of the film as well, depending on how the gaps 10 are scattered, the electrode extension end face 13 of each dielectric film 1a shown in FIG. It is processed into irregularities as shown in the figure.

【0019】図2(b)の凹凸が形成された電極引き出
し端面15に、図10に示すように金属溶射ガン24に
より亜鉛を金属溶射することによって端面電極4を形成
する。金属溶射された亜鉛粒子は電極引き出し端面15
に凹凸が形成されているので端面電極4は電極2と良好
な電気的接触と、十分な付着強度を得ることができる。
As shown in FIG. 10, the end surface electrode 4 is formed on the electrode extension end surface 15 on which the unevenness shown in FIG. 2(b) is formed by metal spraying zinc using a metal spray gun 24. The metal-sprayed zinc particles are attached to the electrode lead-out end face 15.
Since the unevenness is formed on the end face electrode 4, it is possible to obtain good electrical contact with the electrode 2 and sufficient adhesion strength.

【0020】本実施例では、図1に示すように、厚さ2
μmのポリーフェニレンサルファイドフィルム(透電体
フィルム1a)の片面にアルミニウムを500Åの厚み
で真空蒸着して電極2とした金属化フィルム1を用い、
多数本のマージン3をYAGレーザー光16の照射によ
りマージン幅0.1mmに、かつ平板状のボビン5の一
回転毎に、YAGレーザー光16の照射位置をフィルム
幅方向に第一の位置と第二の位置に切り替えることによ
って、コンデンサの電極2が対向するように形成して、
平板板のボビン5に1000回転分巻き取った。なお平
板板のボビン5の金属化フィルム1の長さ方向の長さは
300mmである。
In this embodiment, as shown in FIG.
Using a metallized film 1, which was made into an electrode 2 by vacuum-depositing aluminum to a thickness of 500 Å on one side of a μm polyphenylene sulfide film (conductor film 1a),
A large number of margins 3 are irradiated with the YAG laser beam 16 to have a margin width of 0.1 mm, and each time the flat bobbin 5 rotates, the irradiation position of the YAG laser beam 16 is changed from the first position to the first position in the film width direction. By switching to the second position, the electrodes 2 of the capacitor are formed to face each other,
It was wound around a flat bobbin 5 for 1000 revolutions. Note that the length in the longitudinal direction of the metallized film 1 of the flat bobbin 5 is 300 mm.

【0021】その後、フィルム長さ方向のボビン両端部
から10mmを、第一のヒートプレス条件として圧力3
0kg/cm2,温度160℃,時間30分でプレスし
た後、ボビン全面を第二のヒートプレス条件として圧力
10kg/cm2,温度160℃,時間10分でプレス
した。
[0021] Thereafter, 10 mm from both ends of the bobbin in the length direction of the film were heated to a pressure of 3 as the first heat press condition.
After pressing at 0 kg/cm 2 , temperature 160° C., and time 30 minutes, the entire surface of the bobbin was pressed under second heat press conditions at pressure 10 kg/cm 2 , temperature 160° C., and time 10 minutes.

【0022】以下、前述したとおり平板状のボビン5か
ら積層体8を分離し、各コンデンサ要素9に分割し、枠
幅Cが15mmの鉄製の枠11に0.1mm厚さのアル
ミニウム製スペーサ18を間に挟んで組んだ。
Hereinafter, as described above, the laminated body 8 is separated from the flat bobbin 5, divided into each capacitor element 9, and an aluminum spacer 18 with a thickness of 0.1 mm is placed on an iron frame 11 with a frame width C of 15 mm. It was assembled with .

【0023】その後、枠11に組んだ積層体8の電極引
き出し端面13に、酸素プラズマ処理装置により化学的
に選択的除去を施し、電極引き出し端面15とした。な
お、酸素プラズマ処理装置による処理条件は酸素流量6
0SCCM,圧力1.0Torr,高周波電力400W
とした。
Thereafter, the electrode extension end face 13 of the stacked body 8 assembled in the frame 11 was chemically and selectively removed using an oxygen plasma treatment apparatus to form an electrode extension end face 15. Note that the processing conditions for the oxygen plasma processing device are an oxygen flow rate of 6
0SCCM, pressure 1.0 Torr, high frequency power 400W
And so.

【0024】酸素プラズマ処理後、枠11に組んだまま
電極引き出し端面15に亜鉛を金属溶射することによっ
て端面電極4を形成し、枠11から取り出して積層型金
属化フィルムコンデサを得た。
After the oxygen plasma treatment, end electrodes 4 were formed by metal spraying zinc on the electrode extension end faces 15 while assembled in the frame 11, and then taken out from the frame 11 to obtain a laminated metallized film capacitor.

【0025】このようにして得られた本実施例の金属化
フィルムコンデンサ(以下コンデンサと言う)と、比較
例1として第一のヒートプレス条件を実施例と同じ30
kg/cm2とし、第二のヒートプレス条件を圧力5k
g/cm2から30kg/cm2にした場合のコンデン
サを充放電試験に供したときの結果を図11に示す。な
お図11は横軸に充放電回数を示し、縦軸に1kHzの
誘電正接を示した。充放電試験条件は、電圧は直流50
V、充電抵抗と放電抵抗はそれぞれ1kΩ、バックコン
デンサは供試コンデンサと同じ容量のコンデンサとした
The thus obtained metallized film capacitor of this example (hereinafter referred to as capacitor) and Comparative Example 1 were heated under the same first heat press conditions as in the example.
kg/cm2, and the second heat press condition was a pressure of 5k.
FIG. 11 shows the results when the capacitor was subjected to a charge/discharge test when the load was increased from g/cm2 to 30 kg/cm2. In addition, in FIG. 11, the horizontal axis shows the number of charging and discharging cycles, and the vertical axis shows the dielectric loss tangent at 1 kHz. The charge/discharge test conditions are: voltage is 50 d.c.
The charging and discharging resistances were each 1 kΩ, and the back capacitor had the same capacity as the test capacitor.

【0026】図11に示すように、第二のヒートプレス
条件を圧力20kg/cm2以上とすると充放電試験に
おいて誘電正接の劣化が著しいことがわかる。第二のヒ
ートプレス条件を圧力20kg/cm2以上にしたとき
のコンデンサの末端部近傍以外の部分Bの断面を観察す
ると、電極引き出し端面15に凹凸が有効な形成されて
おらず、電極2と端面電極4との良好な電気的接触と、
端面電極4の十分な付着強度を得られていないことがわ
かった。
As shown in FIG. 11, it can be seen that when the second heat press condition is a pressure of 20 kg/cm 2 or more, the dielectric loss tangent deteriorates significantly in the charge/discharge test. When observing the cross section of the part B other than the vicinity of the end of the capacitor when the second heat press condition was set to a pressure of 20 kg/cm2 or more, it was found that no effective unevenness was formed on the electrode lead-out end face 15, and that the electrode 2 and the end face were not effectively formed. good electrical contact with the electrode 4;
It was found that sufficient adhesion strength of the end electrode 4 was not obtained.

【0027】また比較例2として、第一のヒートプレス
条件によるボビン両端部近傍Aのヒートプレスを行わず
に、第二のヒートプレスのみを施し、その他は実施例と
同様にしてコンデンサを作成した。なおヒートプレスの
圧力条件を5kg/cm2から30kg/cm2に変え
て作成した。
In addition, as Comparative Example 2, a capacitor was produced in the same manner as in the example except that only the second heat press was applied without heat pressing near both ends of the bobbin A under the first heat press conditions. . The pressure conditions of the heat press were changed from 5 kg/cm2 to 30 kg/cm2.

【0028】比較例2では、圧力19kg/cm2以下
ではヒートプレス後に各コンデンサ要素9に分割する際
に、フィルムがばらけてしまい枠に組むことができず、
コンデンサを作成することができなかった。また比較例
1と同様にヒートプレス条件を圧力20kg/cm2以
上とすると、充放電試験において誘電正接の劣化が著し
いことがわかった。
In Comparative Example 2, if the pressure was lower than 19 kg/cm 2 , the film would come apart when it was divided into each capacitor element 9 after heat pressing, and it could not be assembled into a frame.
It was not possible to create a capacitor. Further, as in Comparative Example 1, when the heat press condition was set to a pressure of 20 kg/cm2 or more, it was found that the dielectric loss tangent deteriorated significantly in the charge/discharge test.

【0029】この結果比較例2ではヒートプレスの圧力
条件が19kg/cm2から20kg/cm2の間の狭
い範囲でしか作成することができないので、フィルムの
膜厚や表面粗さが変動した場合にはフィルムがばらけて
しまい、枠に組むことができなかったり、あるいはフィ
ルム層間の間隙がないために、電極2と端面電極4との
良好な電気的接触と、端面電極4の十分な付着強度を得
られなかったりする危険がある。
As a result, in Comparative Example 2, the heat press can only be produced within a narrow range of pressure conditions between 19 kg/cm2 and 20 kg/cm2, so if the film thickness or surface roughness changes, If the film comes apart and cannot be assembled into a frame, or if there is no gap between the film layers, it is difficult to ensure good electrical contact between the electrode 2 and the end electrode 4 and sufficient adhesion strength of the end electrode 4. There is a risk that you may not get it.

【0030】本実施例のコンデンサは、電極2と端面電
極4との良好な電気的接触と、端面電極4の十分な付着
強度に関係する第二のヒートプレス条件が、比較例2に
比べて、本実施例のように5kg/cm2から19kg
/cm2までの広い範囲で許容されるので、フィルムの
膜厚や表面粗さの変動を受けにくいことがいえる。
In the capacitor of this example, the second heat press conditions related to good electrical contact between the electrode 2 and the end electrode 4 and sufficient adhesion strength of the end electrode 4 are different from those of Comparative Example 2. , from 5 kg/cm2 to 19 kg as in this example.
Since it is permissible in a wide range up to /cm2, it can be said that it is less susceptible to variations in film thickness and surface roughness.

【0031】また本実施例のコンデンサは、第一のヒー
トプレス条件によってコンデンサ要素9の両末端部近傍
Aが完全に面で密着しているために、第二のヒートプレ
ス条件による末端部近傍以外の部分Bの密着力が、弱く
てもフィルムがばらけることがなく、機械による移載等
のハンドリングが可能な強度を有している。
In addition, in the capacitor of this embodiment, since the areas near both ends A of the capacitor element 9 are completely in close contact with each other on the surface under the first heat press condition, the areas A near both ends A of the capacitor element 9 are completely in contact with each other. Even if the adhesion of portion B is weak, the film will not come apart and has enough strength to be handled by mechanical transfer.

【0032】なお、本実施例では誘電体フィルム材料と
してポリーフェニレンサルファイドを用いたが、誘電体
フィルム材料はこれに限るものではなく、通常コンデン
サ用として用いられる、例えばポリーエチレンテレフタ
レート,ポリープロピレンなどの有機材料からなる誘電
体フィルムを用いることができる。また誘電体フィルム
の厚みも本実施例に限るものではない。
Although polyphenylene sulfide was used as the dielectric film material in this example, the dielectric film material is not limited to this, and may include polyethylene terephthalate, polypropylene, etc., which are commonly used for capacitors. A dielectric film made of organic material can be used. Further, the thickness of the dielectric film is not limited to this example.

【0033】また電極材料もアルミニウムに限るもので
なく、通常コンデンサ用として用いられる亜鉛なども用
いることができ、電極形成方法も真空蒸着だけでなく、
通常金属化フィルムコンデンサ用として用いられるスパ
ッタリング,イオンプレーティングなどの工法で形成す
ることができる。さらにマージンの形成方法も本実施例
に示したレーザーによる方法に限るものではなく、通常
コンデンサ用の誘電体フィルムに電極を形成する際に用
いられるオイルやテープを用いて蒸着中にマージンを形
成する方法も用いることができる。
Furthermore, the electrode material is not limited to aluminum, and zinc, which is commonly used for capacitors, can also be used, and the electrode forming method is not limited to vacuum evaporation.
It can be formed using methods such as sputtering and ion plating that are normally used for metallized film capacitors. Furthermore, the method for forming the margin is not limited to the laser method shown in this example, but the margin can also be formed during vapor deposition using oil or tape, which is normally used when forming electrodes on dielectric films for capacitors. Methods can also be used.

【0034】巻き取るコンデンサの構成として、本実施
例では片面金属化フィルムの場合を示したが、本発明は
これに限るものではなく、両面金属化フィルムと非金属
化フィルムを合わせて巻き取る構成や、金属化フィルム
の少なくとも片面に誘電体層を形成した複合フィルムに
よる構成など、通常コンデンサ用として用いられる構成
であれば本発明の効果を得ることができる。
[0034] As for the configuration of the capacitor to be wound, in this example, a single-sided metallized film is shown, but the present invention is not limited to this, and a configuration in which a double-sided metalized film and a non-metalized film are wound together is also possible. The effects of the present invention can be obtained with any structure commonly used for capacitors, such as a structure made of a composite film in which a dielectric layer is formed on at least one side of a metallized film.

【0035】また積層体の分割方法もカミソリ刃に限る
ものではなく、鋸刃、あるいは押し切り刃などをなどを
用いることができる。
Furthermore, the method for dividing the laminate is not limited to a razor blade, and a saw blade, a push-cut blade, or the like may be used.

【0036】また、誘電体フィルムの電極引き出し端面
の化学的な選択的除去の条件も本実施例にかぎるもので
はなく、例えばCF4,SF6,N2Oなどを酸素プラ
ズマに添加して、化学的な選択的除去の速度を早めるこ
とができる。さらに化学的な選択的除去の方法も本実施
例にかぎるものではない。化学的な選択的除去の方法と
して例えば、オゾンガスを用いて行うことも可能であり
、さらにオゾンガスを用いる場合には、紫外線を照射し
たり、N2Oなどのガスを添加して化学的な選択的除去
の速度を早めることができる。
Furthermore, the conditions for chemically selectively removing the electrode extension end face of the dielectric film are not limited to those in this example; for example, CF4, SF6, N2O, etc. may be added to oxygen plasma to perform chemically selective removal The speed of target removal can be increased. Furthermore, the method of selective chemical removal is not limited to this embodiment. For example, ozone gas can be used as a chemical selective removal method, and when ozone gas is used, chemical selective removal can be performed by irradiating ultraviolet rays or adding a gas such as N2O. speed can be increased.

【0037】[0037]

【発明の効果】以上の実施例の説明で明らかなように本
発明の金属化フィルムコンデンサの製造方法によれば、
分割されたコンデンサ要素が、機械による移載等のハン
ドリングが可能な強度を有しながら、かつコンデンサ要
素の電極引き出し端面に、広いプレス条件範囲で誘電体
の凹凸を安定して形成できるので、フィルムの膜厚や表
面粗さの変動を受けにくく、特性の優れた小形の金属化
フィルムコンデンサを量産生良く生産することができる
[Effects of the Invention] As is clear from the description of the above embodiments, according to the method of manufacturing a metallized film capacitor of the present invention,
The divided capacitor elements have the strength to be handled by mechanical transfer, etc., and the dielectric unevenness can be stably formed on the electrode lead-out end face of the capacitor element under a wide range of pressing conditions. This makes it possible to mass produce small metalized film capacitors with excellent characteristics that are less susceptible to variations in film thickness and surface roughness.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】(a)本発明の一実施例の金属化フィルムコン
デンサの製造方法における分割されたコンデンサ要素の
外観を示す斜視図 (b)は(a)におけるコンデンサ要素の末端部近傍A
の端面の拡大図 (c)は(a)におけるコンデンサ要素の末端部近傍以
外の部分Bの電極引き出し端面の拡大図
FIG. 1 (a) is a perspective view showing the external appearance of a divided capacitor element in a method for manufacturing a metallized film capacitor according to an embodiment of the present invention;
(c) is an enlarged view of the end surface of the electrode extension of the portion B other than the vicinity of the end of the capacitor element in (a).

【図2】(a)
は同コンデンサ要素の電極引き出し端面が化学的な選択
的除去を受ける前の状態を示す断面図(b)は同フィル
ム層間に間隙のあるコンデンサ要素の電極引き出し端面
が化学的な選択的除去を受けた状態を示す断面図
[Figure 2] (a)
(b) is a cross-sectional view showing the state before the electrode end face of the same capacitor element undergoes selective chemical removal. Cross-sectional view showing the state

【図3】同レーザーマージン形成工程、および巻き取り
工程の概要を示す斜視図
[Figure 3] A perspective view showing an overview of the laser margin forming process and winding process

【図4】(a)は同第1の条件でのヒートプレス工程の
概要を示す断面図 (b)は同第2の条件でのヒートプレス工程の概要を示
す断面図
[Fig. 4] (a) is a cross-sectional view showing an overview of the heat press process under the first condition; (b) is a cross-sectional view showing an overview of the heat press process under the second condition.

【図5】同平板状ボビンから金属化フィルム積層体を分
離する工程の概要を示す斜視図
[Fig. 5] A perspective view showing an overview of the process of separating the metallized film laminate from the flat bobbin.

【図6】同金属化フィルム積層体から各コンデンサ要素
を分割する工程の概要を示す斜視図
[Fig. 6] A perspective view showing an overview of the process of dividing each capacitor element from the same metallized film laminate.

【図7】同枠にコンデンサ要素を組み込む工程の概要を
示す斜視図
[Figure 7] A perspective view showing an overview of the process of assembling a capacitor element into the same frame.

【図8】同コンデンサ要素を組み込んだ枠の概要を示す
斜視図
[Fig. 8] A perspective view showing an outline of a frame incorporating the capacitor element.

【図9】同化学的な選択的除去工程に用いる酸素ガスプ
ラズマ処理装置の概要を示す断面図
[Fig. 9] A cross-sectional view showing an outline of an oxygen gas plasma treatment apparatus used in the same chemical selective removal process.

【図10】同金属溶射工程の概要を示す斜視図[Figure 10] A perspective view showing an overview of the metal spraying process

【図11
】本発明の一実施例および比較例の金属化フィルムコン
デンサの製造方法における金属化フィルムコンデンサを
充放電試験に供した結果を示すグラフ
[Figure 11
] A graph showing the results of subjecting metallized film capacitors to a charge/discharge test in the manufacturing method of metallized film capacitors according to an example of the present invention and a comparative example.

【図12】従来の
金属化フィルムコンデンサの製造方法における(a)は
分割されたコンデンサ要素の外観を示す斜視図、(b)
は分割されたコンデンサ要素の電極引き出し端面の拡大
FIG. 12: (a) is a perspective view showing the external appearance of a divided capacitor element in a conventional method for manufacturing a metallized film capacitor; (b)
is an enlarged view of the electrode extraction end face of the divided capacitor element.

【図13】(a)は同コンデンサ要素の電極端面の化学
的な選択的除去を受ける前の状態を示す断面図(b)は
同コンデンサ要素の電極端面の化学的な選択除去を受け
た状態を示す断面図
FIG. 13 (a) is a cross-sectional view showing the state before chemical selective removal of the electrode end surface of the same capacitor element; FIG. Cross-sectional view showing

【符号の説明】 1    金属化フィルム 1a  誘電体フィルム 2    電極 3    非金属化部(マージン) A    両端部近傍 B    両端部近傍以外の部分 4    端面電極 5    平板状のボビン 8    積層体 9    コンデンサ要素 10  間隙 13,15  電極引き出し端面[Explanation of symbols] 1 Metallized film 1a Dielectric film 2 Electrode 3 Non-metalized part (margin) A Near both ends B Parts other than near both ends 4 End electrode 5 Flat bobbin 8 Laminated body 9 Capacitor element 10 Gap 13, 15 Electrode extraction end surface

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】  複数本の非金属化部を有し、有機材料
を誘電体フィルムとする広幅の金属化フィルムを平板状
のボビンに巻き取る工程と、巻き取った前記金属化フィ
ルムの積層体の金属化フィルム長手方向の前記平板状の
ボビン両端部近傍を、第一の圧力条件でヒートプレスし
て前記金属化フィルムを密着させる工程と、その後前記
積層体全面を前記第一の圧力条件より弱い第二の圧力条
件でヒートプレスする工程と、前記積層体を電極引き出
し端面で分割して、個別のコンデンサ要素に分割する工
程と、分割した前記コンデンサ要素の前記電極引き出し
端面を、前記金属化フィルムを構成する前記有機材料と
反応性のある成分を少なくとも含むガスに接触させて、
前記誘電体フィルムの前記電極引き出し端面を化学的に
選択的除去した後に、前記電極引き出し端面に端面電極
を形成する工程とを有する金属化フィルムコンデンサの
製造方法。
1. A step of winding a wide metallized film having a plurality of non-metalized parts and using an organic material as a dielectric film onto a flat bobbin, and a laminate of the wound metallized film. heat-pressing the vicinity of both ends of the flat bobbin in the longitudinal direction of the metallized film under a first pressure condition to bring the metallized film into close contact with each other, and then pressing the entire surface of the laminate under the first pressure condition. a step of heat pressing under a second weak pressure condition; a step of dividing the laminate at the electrode extension end face into individual capacitor elements; and a step of heat pressing the electrode extension end face of the divided capacitor element with the metallization. Contact with a gas containing at least a component reactive with the organic material constituting the film,
A method for manufacturing a metallized film capacitor, comprising the step of selectively chemically removing the electrode extension end face of the dielectric film, and then forming an end face electrode on the electrode extension end face.
【請求項2】  誘電体の電極引き出し端面を、少なく
とも酸素を含むプラズマで化学的に選択的除去する請求
項1記載の金属化フィルムコンデンサの製造方法。
2. The method of manufacturing a metallized film capacitor according to claim 1, wherein the electrode extension end face of the dielectric is selectively removed chemically using plasma containing at least oxygen.
【請求項3】  誘電体の電極引き出し端面を、酸素を
含むガスにCF4,SF6、およびN2Oのうち少なく
とも一種を添加したプラズマで化学的に選択的除去する
請求項1記載の金属化フィルムコンデンサの製造方法。
3. The metallized film capacitor according to claim 1, wherein the electrode extension end face of the dielectric is chemically and selectively removed using plasma containing an oxygen-containing gas added with at least one of CF4, SF6, and N2O. Production method.
【請求項4】  誘電体の電極引き出し端面を、少なく
とも酸素を含むプラズマから引き出したラジカルで化学
的に選択的除去する請求項1記載の金属化フィルムコン
デンサの製造方法。
4. The method for manufacturing a metallized film capacitor according to claim 1, wherein the electrode extension end face of the dielectric is chemically and selectively removed using radicals extracted from plasma containing at least oxygen.
【請求項5】  誘電体の電極引き出し端面を、少なく
ともオゾンを含むガスで化学的に選択的除去する請求項
1記載の金属化フィルムコンデンサの製造方法。
5. The method of manufacturing a metallized film capacitor according to claim 1, wherein the electrode extension end face of the dielectric is selectively removed chemically with a gas containing at least ozone.
【請求項6】  誘電体の電極引き出し端面を、少なく
ともオゾンを含むガスにN2Oを添加したガスで化学的
に選択的除去する請求項1記載の金属化フィルムコンデ
ンサの製造方法。
6. The method of manufacturing a metallized film capacitor according to claim 1, wherein the electrode extension end face of the dielectric is chemically and selectively removed with a gas containing at least ozone and N2O added thereto.
【請求項7】  誘電体の電極引き出し端面を、化学的
に選択的除去する際に、紫外線を照射する請求項5また
は6記載の金属化フィルムコンデンサの製造方法。
7. The method for manufacturing a metallized film capacitor according to claim 5, wherein the electrode extension end face of the dielectric material is irradiated with ultraviolet rays when selectively removing the electrode end face.
JP9663891A 1991-04-26 1991-04-26 Manufacturing method of metallized film capacitor Expired - Fee Related JP2658614B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9663891A JP2658614B2 (en) 1991-04-26 1991-04-26 Manufacturing method of metallized film capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9663891A JP2658614B2 (en) 1991-04-26 1991-04-26 Manufacturing method of metallized film capacitor

Publications (2)

Publication Number Publication Date
JPH04326715A true JPH04326715A (en) 1992-11-16
JP2658614B2 JP2658614B2 (en) 1997-09-30

Family

ID=14170374

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9663891A Expired - Fee Related JP2658614B2 (en) 1991-04-26 1991-04-26 Manufacturing method of metallized film capacitor

Country Status (1)

Country Link
JP (1) JP2658614B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003188046A (en) * 2001-12-19 2003-07-04 Shizuki Electric Co Inc Metallized film capacitor
JP2007088247A (en) * 2005-09-22 2007-04-05 Matsushita Electric Ind Co Ltd Resin partitioning plate, and manufacturing method of film capacitor using same resin partitioning plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003188046A (en) * 2001-12-19 2003-07-04 Shizuki Electric Co Inc Metallized film capacitor
JP2007088247A (en) * 2005-09-22 2007-04-05 Matsushita Electric Ind Co Ltd Resin partitioning plate, and manufacturing method of film capacitor using same resin partitioning plate
JP4577170B2 (en) * 2005-09-22 2010-11-10 パナソニック株式会社 Resin partition plate and method of manufacturing film capacitor using resin partition plate

Also Published As

Publication number Publication date
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