JPH04324104A - Magnetic core for magnetic head - Google Patents
Magnetic core for magnetic headInfo
- Publication number
- JPH04324104A JPH04324104A JP11908491A JP11908491A JPH04324104A JP H04324104 A JPH04324104 A JP H04324104A JP 11908491 A JP11908491 A JP 11908491A JP 11908491 A JP11908491 A JP 11908491A JP H04324104 A JPH04324104 A JP H04324104A
- Authority
- JP
- Japan
- Prior art keywords
- film
- glass
- soft magnetic
- magnetic
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010408 film Substances 0.000 claims abstract description 82
- 239000011521 glass Substances 0.000 claims abstract description 43
- 239000000919 ceramic Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 150000004767 nitrides Chemical class 0.000 claims abstract description 12
- 239000010409 thin film Substances 0.000 claims abstract description 5
- 239000002184 metal Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 15
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 229910005435 FeTaN Inorganic materials 0.000 description 4
- 229910000702 sendust Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、磁気ヘッド、特に磁気
ヘッド用の磁気コアに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head, and more particularly to a magnetic core for a magnetic head.
【0002】0002
【従来の技術】従来の磁気ヘッド用磁気コアには、図3
の断面図に示すように、金属軟磁性膜31をセラミック
やガラスの支持体32によって挟んだ構造の磁気コアに
おいて、セラミックやガラスの基板に軟磁性膜を形成し
た後、軟磁性膜表面に接合ガラス33を成膜し、この接
合ガラスによって基板と膜を隔てて反対側の支持体32
を接合した構造体が使用されている。[Prior Art] A conventional magnetic core for a magnetic head has a structure shown in FIG.
As shown in the cross-sectional view, in a magnetic core having a structure in which a metal soft magnetic film 31 is sandwiched between ceramic or glass supports 32, a soft magnetic film is formed on a ceramic or glass substrate, and then bonded to the surface of the soft magnetic film. A glass 33 is formed into a film, and the support 32 on the opposite side is separated from the substrate by this bonded glass.
A structure in which the two are joined together is used.
【0003】0003
【発明が解決しようとする課題】金属軟磁性膜と支持体
との接合強度を高くすることは磁気ヘッドの歩留り,信
頼性を向上させるために重要である。特に、金属と、セ
ラミックやガラスとを接合用のガラスを介して接合する
場合、金属面と接合ガラスとの濡れ性が、セラミックや
ガラスと接合ガラスとの濡れ性に較べて劣る場合が多く
、金属面と接合ガラス面での接合強度が十分でない場合
が多かった。結果として、加工中の剥がれの原因となり
、歩留りの低下,信頼性の低下を招いていた。[Problems to be Solved by the Invention] Increasing the bonding strength between the metal soft magnetic film and the support is important for improving the yield and reliability of magnetic heads. In particular, when bonding metal and ceramic or glass via bonding glass, the wettability between the metal surface and the bonded glass is often inferior to the wettability between the ceramic or glass and the bonded glass. In many cases, the bonding strength between the metal surface and the bonded glass surface was insufficient. As a result, this caused peeling during processing, leading to a decrease in yield and reliability.
【0004】本発明は、このような問題点を解決した磁
気ヘッド用磁気コアを提供することにある。An object of the present invention is to provide a magnetic core for a magnetic head that solves these problems.
【0005】[0005]
【課題を解決するための手段】金属軟磁性膜とセラミッ
ク基板、或はガラス基板とからなる軟磁性膜構造体にお
いて、金属軟磁性膜の基板に対し反対側の面に酸化物、
或は、窒化物、或は、炭化物の薄膜を成膜した軟磁性膜
構造体を形成する。この酸化物、或は窒化物、或は炭化
物を構成する元素の酸化物生成能、窒化物生成能、炭化
物生成能は、金属軟磁性膜を構成する元素のそれらより
も高い必要がある。なぜならば、酸化物、或は窒化物、
或は炭化物を構成する元素の酸化物生成能、窒化物生成
能、炭化物生成能が、金属軟磁性膜を構成する元素のそ
れらよりも高いことによって、高温にさらされても、金
属軟磁性膜中に酸化物,窒化物,炭化物の酸素,窒素,
炭素が取り込まれず、軟磁気特性を劣化させないからで
ある。[Means for Solving the Problem] In a soft magnetic film structure consisting of a metal soft magnetic film and a ceramic substrate or a glass substrate, an oxide,
Alternatively, a soft magnetic film structure is formed by forming a thin film of nitride or carbide. The oxide-forming ability, nitride-forming ability, and carbide-forming ability of the elements constituting the oxide, nitride, or carbide must be higher than those of the elements constituting the metal soft magnetic film. Because oxide or nitride,
Alternatively, the oxide-forming ability, nitride-forming ability, and carbide-forming ability of the elements constituting the carbide are higher than those of the elements constituting the metal soft magnetic film. Among them are oxides, nitrides, and carbides of oxygen, nitrogen,
This is because carbon is not incorporated and the soft magnetic properties are not deteriorated.
【0006】以上の軟磁性膜構造体の表面に、接合用の
ガラスを成膜した場合、ガラスと酸化物膜,窒化物膜、
炭化物膜との濡れ性の方が、金属軟磁性膜とガラスとの
濡れ性に較べて大きいため、他のセラミックやガラスと
のガラス接合強度を高めることができる。When glass for bonding is formed on the surface of the above soft magnetic film structure, the glass and oxide film, nitride film,
Since the wettability with the carbide film is greater than the wettability between the metal soft magnetic film and glass, the bonding strength of the glass with other ceramics or glass can be increased.
【0007】よって、この構造体によって磁気ヘッドを
作製するならば、従来に較べて歩留り,信頼性を向上さ
せることができる。[0007] Therefore, if a magnetic head is manufactured using this structure, the yield and reliability can be improved compared to the conventional method.
【0008】[0008]
実施例1
図1に示すように、基板11としてMnO,NiOから
成るセラミック板を用い、FeTaN膜(軟磁性膜)1
2を形成し、その上にAl2 O3ターゲットを用いた
アルミナスパッタ膜13を0.1μm成膜した試料(図
1(a))と、成膜しない試料(図1(b))とを作製
した。Example 1 As shown in FIG. 1, a ceramic plate made of MnO and NiO was used as the substrate 11, and a FeTaN film (soft magnetic film) 1
2 and a 0.1 μm thick alumina sputtered film 13 using an Al2O3 target was formed thereon (Fig. 1(a)), and a sample without such film (Fig. 1(b)) were prepared. .
【0009】これらの試料の表面に接合用のガラス膜を
成膜した。一方、FeTaN膜12の形成されていない
別のMnO,NiOから成るセラミック板にも接合ガラ
ス膜を成膜し、前記試料(図1(a),(b))と接合
ガラス面どうしを1kgで圧着しながら、550℃の加
熱により接合した。試料数は10とした。接合強度評価
結果(平均のセン断力)を表1に示す。A glass film for bonding was formed on the surfaces of these samples. On the other hand, a bonding glass film was formed on another ceramic plate made of MnO and NiO on which the FeTaN film 12 was not formed, and the bonding glass surface was bonded to the sample (FIGS. 1(a) and 1(b)) with a weight of 1 kg. Bonding was performed by heating at 550° C. while pressing. The number of samples was 10. Table 1 shows the joint strength evaluation results (average shear force).
【0010】0010
【表1】[Table 1]
【0011】表1から分かるようにアルミナ膜13を設
けることによって接合強度が向上した。As can be seen from Table 1, the bonding strength was improved by providing the alumina film 13.
【0012】上記アルミナ膜を成膜した構造体と、アル
ミナ膜を成膜しなかった構造体それぞれで、図2(a)
、及び、図2(b)に示す構造の磁気ヘッドを作製した
。図2(a)は斜視図、図2(b)は上面図であり、軟
磁性膜22がセラミックの支持体21によって挟まれて
いる。なお、図2(b)に示すように、一方の支持体2
1はアルミナ膜23の面に接合ガラス24により溶着さ
れている。FIG. 2(a) shows the structure in which the alumina film is formed and the structure in which the alumina film is not formed.
, and a magnetic head having the structure shown in FIG. 2(b) was manufactured. 2(a) is a perspective view, and FIG. 2(b) is a top view, in which a soft magnetic film 22 is sandwiched between ceramic supports 21. Note that, as shown in FIG. 2(b), one of the supports 2
1 is welded to the surface of the alumina film 23 with a bonding glass 24 .
【0013】この磁気ヘッドにおいて、FeTaN膜厚
は5μm、ギャップ幅は0.3μmであった。良好なガ
ラス接合の得られた歩留りは、アルミナ膜を成膜しなか
った場合が30%であったのに較べ、成膜した場合には
70%へと増大した。
実施例2
図1に示すように、基板11としてCaO,TiO2
,NiOからなるセラミック板を用い、センダスト膜(
軟磁性膜)12を成膜し、その上にアルミナ膜13を0
.1μm成膜した試料(図1(a))と、成膜しない試
料(図1(b))とを作製した。これらの試料の表面に
接合用のガラス膜を成膜した。一方、センダストの成膜
されていない別のCaO,TiO2 ,NiOからなる
セラミック板にも接合ガラス膜を成膜し、前記試料(図
1(a),(b))と接合ガラス面どうしを1kgで圧
着しながら、680℃の加熱により接合した。試料数は
10とした。接合強度評価結果(平均のセン断力)を表
2に示す。In this magnetic head, the FeTaN film thickness was 5 μm and the gap width was 0.3 μm. The yield of good glass bonding was 30% when no alumina film was formed, but increased to 70% when an alumina film was formed. Example 2 As shown in FIG. 1, the substrate 11 is made of CaO, TiO2.
, Sendust film (
A soft magnetic film 12 is formed, and an alumina film 13 is formed on it.
.. A sample with a film formed to a thickness of 1 μm (FIG. 1(a)) and a sample without a film (FIG. 1(b)) were prepared. A glass film for bonding was formed on the surfaces of these samples. On the other hand, a bonding glass film was also formed on another ceramic plate made of CaO, TiO2, and NiO on which the sendust film was not formed, and the bonding glass surface was bonded to the sample (Fig. 1(a), (b)) by 1 kg. They were bonded by heating at 680° C. while being pressed together. The number of samples was 10. Table 2 shows the joint strength evaluation results (average shear force).
【0014】[0014]
【表2】[Table 2]
【0015】表2から分かるようにアルミナ膜13を設
けることによって接合強度が向上した。As can be seen from Table 2, the bonding strength was improved by providing the alumina film 13.
【0016】上記アルミナ膜を成膜した構造体と、アル
ミナ膜を成膜しなかった構造体それぞれで、図2(a)
、及び、図2(b)に示す実施例1と同様の構造の磁気
ヘッドを作製した。センダスト膜厚は5μm、ギャップ
幅は0.3μmであった。良好なガラス接合の得られた
歩留りは、アルミナ膜を成膜しなかった場合が70%で
あったのに較べ、成膜した場合には95%へと増大した
。FIG. 2(a) shows the structure in which the alumina film is formed and the structure in which the alumina film is not formed.
, and a magnetic head having a structure similar to that of Example 1 shown in FIG. 2(b) was manufactured. The sendust film thickness was 5 μm, and the gap width was 0.3 μm. The yield of good glass bonding increased from 70% when no alumina film was formed to 95% when an alumina film was formed.
【0017】以上の各実施例の他にも、アルミナ膜に代
えて、CaO膜,MgO膜,TiO2 膜,V2 O3
膜,SiO2 膜,MnO膜,Cr2 O3 膜,Z
nO膜などを用いても、また、酸化物膜に代えて、窒化
物膜,炭化物膜を用いても、酸化物,窒化物,炭化物の
複合膜を用いても同様である。磁性膜として、Ta以外
のFeMN(M=Ti,Zr,Nb,Mo,Hf,Ta
)系膜や、FeSiAl膜にTi,Cr,Ruなどの添
加元素が有る場合も同様に、磁性膜を構成する元素より
も酸化物、或は、窒化物、或は、炭化物の生成能の高い
元素の酸化物、或は、窒化物、或は、炭化物の膜を磁性
膜表面に形成することによって、軟磁性膜の磁気特性を
劣化させずに接合強度を高めることができる。In addition to the above embodiments, in place of the alumina film, CaO film, MgO film, TiO2 film, V2 O3
film, SiO2 film, MnO film, Cr2O3 film, Z
The same effect can be obtained even if an nO film or the like is used, a nitride film or a carbide film is used in place of the oxide film, or a composite film of oxide, nitride, and carbide is used. As a magnetic film, FeMN other than Ta (M=Ti, Zr, Nb, Mo, Hf, Ta
) system film or FeSiAl film has additive elements such as Ti, Cr, Ru, etc., the ability to form oxides, nitrides, or carbides is higher than that of the elements constituting the magnetic film. By forming a film of element oxide, nitride, or carbide on the surface of the magnetic film, the bonding strength can be increased without deteriorating the magnetic properties of the soft magnetic film.
【0018】[0018]
【発明の効果】本発明により、図2(a)に示す構造の
磁気ヘッドにおいて、軟磁性膜とセラミック、または、
ガラスによる支持体とのガラス接合強度が向上したこと
により、歩留りを向上させることができた。According to the present invention, in the magnetic head having the structure shown in FIG. 2(a), a soft magnetic film and a ceramic or
By improving the glass bonding strength with the glass support, it was possible to improve the yield.
【0019】即ち、図1(a)の構造体の表面に、接合
用のガラスを成膜した場合、ガラスと酸化物膜,窒化物
膜,炭化物膜との濡れ性が、金属軟磁性膜とガラスとの
濡れ性に較べて大きいため、他のセラミックやガラスと
のガラス接合強度を高めることができた。よって、本構
造体によって図2(a)に示すような磁気ヘッドを作製
した場合、従来に較べて歩留り,信頼性を向上させるこ
とができた。That is, when a bonding glass film is formed on the surface of the structure shown in FIG. Because the wettability with glass is greater than that with glass, it was possible to increase the glass bonding strength with other ceramics and glass. Therefore, when a magnetic head as shown in FIG. 2(a) was manufactured using this structure, the yield and reliability could be improved compared to the conventional method.
【図1】(a)は本発明による構造体の断面図、(b)
は従来の構造体の断面図である。FIG. 1 (a) is a cross-sectional view of a structure according to the present invention, (b)
is a cross-sectional view of a conventional structure.
【図2】本発明による構造体を用いた磁気ヘッドを示す
図である。FIG. 2 is a diagram showing a magnetic head using a structure according to the present invention.
【図3】従来の磁気ヘッドの上面図である。FIG. 3 is a top view of a conventional magnetic head.
11 基板 12,22 軟磁性膜 13,23 FeTaN膜 21 軟磁性膜 24 接合ガラス 11 Board 12, 22 Soft magnetic film 13,23 FeTaN film 21 Soft magnetic film 24 Bonded glass
Claims (3)
ス基板に積層し、前記金属軟磁性膜の基板に対し反対側
の面に酸化物、或は、窒化物、或は、炭化物の薄膜が形
成された軟磁性膜構造体を有し、この構造体の酸化物、
或は窒化物、或は炭化物の薄膜の表面に接合用のガラス
膜を形成し、この接合用ガラス膜によってセラミック板
、或はガラス板を溶着接合することにより軟磁性膜をセ
ラミック板、或はガラス板と前記基板とにより挟んだ構
造体より成ることを特徴とする磁気ヘッド用磁気コア。1. A metal soft magnetic film is laminated on a ceramic substrate or a glass substrate, and a thin film of oxide, nitride, or carbide is formed on the surface of the metal soft magnetic film opposite to the substrate. It has a soft magnetic film structure in which an oxide of this structure is formed,
Alternatively, a glass film for bonding is formed on the surface of a thin film of nitride or carbide, and a ceramic plate or a glass plate is welded and bonded using this glass film for bonding, thereby forming a soft magnetic film into a ceramic plate or a glass plate. A magnetic core for a magnetic head, comprising a structure sandwiched between a glass plate and the substrate.
とを特徴とする請求項1記載の磁気ヘッド用磁気コア。2. The magnetic core for a magnetic head according to claim 1, wherein the soft magnetic film contains Fe, Si, and Al.
i,Nb,Zr,Mo,Hf,Taの群から選択される
少なくとも1種類の元素であり、Nは窒素であることを
特徴とする請求項1記載の磁気ヘッド用磁気コア。3. The soft magnetic film is made of FeMN, and M is T.
2. The magnetic core for a magnetic head according to claim 1, wherein the core is at least one element selected from the group consisting of i, Nb, Zr, Mo, Hf, and Ta, and N is nitrogen.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11908491A JPH04324104A (en) | 1991-04-24 | 1991-04-24 | Magnetic core for magnetic head |
EP92107074A EP0510699B1 (en) | 1991-04-24 | 1992-04-24 | Magnetic structure |
DE69203029T DE69203029T2 (en) | 1991-04-24 | 1992-04-24 | Magnetic structure. |
US08/155,185 US5572391A (en) | 1991-04-24 | 1993-11-22 | Magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11908491A JPH04324104A (en) | 1991-04-24 | 1991-04-24 | Magnetic core for magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04324104A true JPH04324104A (en) | 1992-11-13 |
Family
ID=14752494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11908491A Pending JPH04324104A (en) | 1991-04-24 | 1991-04-24 | Magnetic core for magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04324104A (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60201509A (en) * | 1984-03-23 | 1985-10-12 | Matsushita Electric Ind Co Ltd | Manufacture of magnetic head |
JPS62222416A (en) * | 1986-03-24 | 1987-09-30 | Sharp Corp | Member for thin film magnetic film |
JPS62267910A (en) * | 1986-05-16 | 1987-11-20 | Canon Electronics Inc | Magnetic head |
JPS63299219A (en) * | 1987-05-29 | 1988-12-06 | Sony Corp | Magnetically soft thin film |
JPS647305A (en) * | 1987-03-31 | 1989-01-11 | Sankyo Seiki Seisakusho Kk | Magnetic head |
-
1991
- 1991-04-24 JP JP11908491A patent/JPH04324104A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60201509A (en) * | 1984-03-23 | 1985-10-12 | Matsushita Electric Ind Co Ltd | Manufacture of magnetic head |
JPS62222416A (en) * | 1986-03-24 | 1987-09-30 | Sharp Corp | Member for thin film magnetic film |
JPS62267910A (en) * | 1986-05-16 | 1987-11-20 | Canon Electronics Inc | Magnetic head |
JPS647305A (en) * | 1987-03-31 | 1989-01-11 | Sankyo Seiki Seisakusho Kk | Magnetic head |
JPS63299219A (en) * | 1987-05-29 | 1988-12-06 | Sony Corp | Magnetically soft thin film |
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