JPH0431753A - Foreign-matter inspecting apparatus - Google Patents

Foreign-matter inspecting apparatus

Info

Publication number
JPH0431753A
JPH0431753A JP13809590A JP13809590A JPH0431753A JP H0431753 A JPH0431753 A JP H0431753A JP 13809590 A JP13809590 A JP 13809590A JP 13809590 A JP13809590 A JP 13809590A JP H0431753 A JPH0431753 A JP H0431753A
Authority
JP
Japan
Prior art keywords
light
base material
detection
foreign matter
scattered light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13809590A
Other languages
Japanese (ja)
Inventor
Yutaka Yagi
裕 八木
Fumio Kikuma
菊間 史男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP13809590A priority Critical patent/JPH0431753A/en
Publication of JPH0431753A publication Critical patent/JPH0431753A/en
Pending legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To suppress the effect of the scattered light caused by the surface roughness of a material under inspection to a minimum and to detect the scattered light from a foreign matter readily by specifying the emitting direction of detecting light on the surface of the material under inspection and the detecting direction of the scattered light. CONSTITUTION:A light emitting means 3 is arranged so that the light is emitted in the direction in parallel with the rolling direction of a base material 1. A slant angle theta of detecting light from the light emitting means 3 with respect to the base material 1 is usually selected at 5 - 25 degrees so as to increase the scattered light from a foreign matter. A detecting means 8 for detecting the scattered light from a detecting position is provided so that the optical axis is inclined to the side where the means 3 is arranged with respect to the base material 1. The slant angle alpha is set at 60 degrees or less. The scattered light (noise) caused by the irregularities on a material under inspection itself is suppressed to a minimum by specifying the angle of the optical axis, and the scattered light caused by the foreign matter can be positively detected.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、シャドウマスク、リードフレーム、螢光表示
管用電極などの製造に使用される金属基板、或いはその
金属基板にレジストコーティング層を形成してなる基材
等の表面の異物、欠陥等(以下単に異物と総称する)の
有無を検査する異物検査装置に関する。
[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to metal substrates used for manufacturing shadow masks, lead frames, electrodes for fluorescent display tubes, etc., or to forming a resist coating layer on the metal substrate. The present invention relates to a foreign matter inspection device for inspecting the presence or absence of foreign matter, defects, etc. (hereinafter simply referred to simply as foreign matter) on the surface of a base material, etc.

〔従来の技術〕[Conventional technology]

シャドウマスク、リードフレーム、螢光表示管用電極な
どの製造に適用されているフォトファブリケーシジン工
程には、金属基板に対する前処理及び脱脂工程、レジス
トコーティング工程、製版工程、エツチング、剥離及び
洗浄工程等があり、これらの各工程は自動化(インライ
ン化)されている。しかしながら、各工程のモニター及
び外観検査などの自動化は行われていないが、これらに
対してのニーズは大きいものがある。特にレジストコー
テイング後の外観検査の自動化の要望には根強いものが
ある。これは、レジストコーティングにおいて欠陥が発
生すると良品率に対する影響が大きいからである。
The photofabrication process used to manufacture shadow masks, lead frames, electrodes for fluorescent display tubes, etc. includes pretreatment and degreasing processes for metal substrates, resist coating processes, plate making processes, etching, peeling and cleaning processes, etc. Each of these steps is automated (inlined). However, although automation of monitoring of each process and visual inspection has not been carried out, there is a great need for these. In particular, there is a strong desire to automate visual inspection after resist coating. This is because when a defect occurs in the resist coating, it has a large effect on the yield rate.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかしながら、現在のところ、レジストコーテイング後
の基材の自動異物検査装置として実用運用できる装置は
開発されていない。これは、フォトファブリケーション
に用いる材料表面の特性によって、異物検出が困難なた
めである。
However, at present, no device has been developed that can be practically used as an automatic foreign matter inspection device for substrates after resist coating. This is because it is difficult to detect foreign matter due to the characteristics of the surface of the material used for photofabrication.

一般に平面上に付着した異物の検出には、被検査面に対
してレーザ光等の光ビームを照射し、異物による散乱光
を検出する方法が知られている(例えば、特開昭60−
67845号公報参照)。従って、レジストコーテイン
グ後の基材表面の異物検出にもこの技術を適用すること
が考えられる。しかしながら、フォトファブリケーショ
ンに用いる材料の多くは、金属材料を圧延したもの(金
属基板)であり9表面にかなり大きいあらさ(ガラス基
板やシリコン基板に比較して)があるため、この表面に
レーザ光を照射すると1表面の凹凸も乱反射し、その散
乱光がノイズとなって異物からの散乱光を隠してしまい
、異物検出ができない。
In general, there is a known method for detecting foreign matter attached to a flat surface, in which the surface to be inspected is irradiated with a light beam such as a laser beam, and the light scattered by the foreign matter is detected (for example, JP-A No.
(See Publication No. 67845). Therefore, it is conceivable to apply this technique to the detection of foreign substances on the surface of a substrate after resist coating. However, many of the materials used in photofabrication are rolled metal materials (metal substrates) and have a fairly large surface roughness (compared to glass substrates or silicon substrates). When irradiated with , the irregularities on one surface also cause diffuse reflection, and the scattered light becomes noise and hides the scattered light from the foreign object, making it impossible to detect the foreign object.

また、その金属基板に対してレジストをコーティングす
ると、レジスト表面は平坦となる。しかしながらフォト
ファブリケーションに用いられるレジストは。
Further, when the metal substrate is coated with a resist, the resist surface becomes flat. However, the resists used in photofabrication.

通常カゼイン、PVAなどの水溶性コロイドに重クロム
酸塩を添加したものであり、これらのレジストはほぼ透
明で、異物検出のために照射された光に対しても透明で
あるので、金属材料表面のあらさにより乱反射してしま
い、やはり異物の検出を困難なものにしている。
Usually, dichromate is added to a water-soluble colloid such as casein or PVA, and these resists are almost transparent, and are transparent even to the light irradiated to detect foreign substances, so they can be used to detect the surface of metal materials. The roughness of the surface causes diffuse reflection, making it difficult to detect foreign objects.

本発明はかかる問題点に鑑みてなされたもので1表面が
粗い金属基板、或いはその金属基板上に透明なレジスト
コーティング層を設けてなる基材等の被検査材に対して
も表面の異物を検出することの可能な異物検査装置を提
供することを目的とする。
The present invention has been made in view of the above problems. 1) It is possible to prevent foreign matter on the surface of a material to be inspected, such as a metal substrate with a rough surface or a substrate formed by providing a transparent resist coating layer on the metal substrate. The object of the present invention is to provide a foreign substance inspection device that can detect foreign substances.

〔課題を解決するための手段〕[Means to solve the problem]

本発明者等は上記目的を達成すべく鋭意検討の結果。 The present inventors have made extensive studies to achieve the above objective.

被検査材表面への検出光の照射方向及び散乱光の検出方
向を特定することにより、被検査材の表面あらさによる
散乱光の影響を極力抑え、異物による散乱光を容易に検
出することが可能となることを見出し1本発明を完成し
た。
By specifying the direction of irradiation of the detection light on the surface of the material to be inspected and the direction of detection of the scattered light, it is possible to minimize the influence of scattered light due to surface roughness of the material to be inspected, and easily detect light scattered by foreign objects. The present invention was completed based on the discovery that the following was true.

すなわち2本発明は、検出光を被検査材の検出位置に、
該被検査材表面に対して傾斜した方向から照射する照射
手段と、前記検出位置からの散乱光を検出する検出手段
とを備え、この検出手段の光軸が被検査材表面に対して
前記照射手段を配置した側に傾斜していることを特徴と
する異物検査装置を要旨とする。
In other words, in the present invention, the detection light is directed to the detection position of the material to be inspected,
It includes an irradiation means that irradiates from a direction oblique to the surface of the material to be inspected, and a detection means that detects scattered light from the detection position, and the optical axis of the detection means is arranged so that the optical axis of the detection means irradiates the surface of the material to be inspected. The gist of the present invention is a foreign matter inspection device characterized by being inclined toward the side on which the means is disposed.

ここで、前記照射手段により照射する検出光としては、
ハロゲンランプ等から照射するインコヒーレントな光を
用いることが好ましい。
Here, the detection light irradiated by the irradiation means is as follows:
It is preferable to use incoherent light emitted from a halogen lamp or the like.

また、被検査材が、ンヤドウマスク用に使用する圧延さ
れた金属基板又はその上にレジストコーティング層を有
する基材の場合には、検出光を被検査材に対してその圧
延方向と平行な方向から且つ被検査材に対して5〜25
度に傾斜した方向から照射することが好ましい。
In addition, if the material to be inspected is a rolled metal substrate used for a mask or a base material with a resist coating layer thereon, the detection light is directed toward the material to be inspected in a direction parallel to the rolling direction. and 5 to 25 for the inspected material.
It is preferable to irradiate from an oblique direction.

〔実施例〕〔Example〕

以下9図面に示す実施例を参照して本発明を更に詳細に
説明する。
The present invention will be described in further detail below with reference to embodiments shown in nine drawings.

第1図は本発明をレジストコーテイング後のシャドウマ
スク用基材の異物検出に適用した実施例を示す概略側面
図、第2図はその要部の概略平面図である。第1図、第
2図において、1は被検査材である基材であり2巻取I
Aの形態でセントされ、その巻取IAから繰り出される
ようになっている。この基材1は、第3図に示すように
、金属材料を圧延して作った金属基板1a表面にレジス
トコーティング層1bを形成したものであり、金属基板
1aの表面には圧延による微小な凹凸が形成されている
FIG. 1 is a schematic side view showing an embodiment in which the present invention is applied to foreign matter detection in a shadow mask base material after resist coating, and FIG. 2 is a schematic plan view of the main parts thereof. In Figures 1 and 2, 1 is the base material that is the material to be inspected, and 2 is the roll I.
It is sent in the form of A and is unwound from the winder IA. As shown in FIG. 3, this base material 1 has a resist coating layer 1b formed on the surface of a metal substrate 1a made by rolling a metal material, and the surface of the metal substrate 1a has minute irregularities caused by rolling. is formed.

第1図、第2図において、2は、基材1をその長手方向
に即ち矢印A方向に搬送する搬送ローラである。
In FIGS. 1 and 2, reference numeral 2 denotes a conveyance roller that conveys the base material 1 in its longitudinal direction, that is, in the direction of arrow A.

なお、基材1の長手方向(矢印A方向)は当然、その基
材1を構成する金属基板1aの圧延方向に一致している
Note that the longitudinal direction of the base material 1 (direction of arrow A) naturally coincides with the rolling direction of the metal substrate 1a that constitutes the base material 1.

3は検出光4を基材1の検出位置に対して照射する照射
手段である0本実施例では、この検出位置を、基材1の
圧延方向(矢印A方向)に対して直角な直線XX上とし
ている。この照射手段3は、インコヒーレントな光を照
射するハロゲンランプからなる光源5とその光源5から
の光を直線X−X上に細い帯状に集光させるレンズ6と
、光源5からの照射光のうち、レジストコーティング層
を感光させる部分をカントするための黄色いフィルター
7等を備えている。更にこの照射手段3は、基材1の検
出位置(直線X−X上)を。
Reference numeral 3 denotes an irradiation means for irradiating the detection position of the base material 1 with the detection light 4. In this embodiment, this detection position is connected to the straight line XX perpendicular to the rolling direction (direction of arrow A) of the base material 1. It is above. The irradiation means 3 includes a light source 5 made of a halogen lamp that irradiates incoherent light, a lens 6 that focuses the light from the light source 5 into a thin strip on a straight line Among them, a yellow filter 7 is provided for canting the portion where the resist coating layer is exposed to light. Furthermore, this irradiation means 3 detects the detection position of the base material 1 (on the straight line XX).

基材1に対して傾斜した方向から照射するように、かつ
、基材1をその上面から見た場合には基材1の圧延方向
に対して平行な方向から照射するように配置されている
。照射手段3からの検出光4の基材1に対する傾斜角θ
(第1図参照)は、異物の散乱光を多くするため極力小
さい方が好ましく1通常5〜25度に選定される。
The rays are arranged so as to irradiate the base material 1 from an inclined direction, and from a direction parallel to the rolling direction of the base material 1 when the base material 1 is viewed from above. . Inclination angle θ of detection light 4 from irradiation means 3 with respect to base material 1
(See FIG. 1) is preferably set to be as small as possible in order to increase the amount of light scattered by foreign objects.1 Usually, it is selected to be between 5 and 25 degrees.

8は、検出値IF(直線X−X上)からの散乱光9を検
出する検出手段であり、結像レンズIOAとリニアイメ
ージセンサIOB等を備えている。この検出手段8は、
第1図から良く分かるように、その光軸が基材lに対し
て、検出手段3を配置した側に傾斜するように設けられ
ている。この傾斜角αも小さい方が好ましく、60度以
下とすることが好ましい。
8 is a detection means for detecting the scattered light 9 from the detected value IF (on the straight line XX), and includes an imaging lens IOA, a linear image sensor IOB, and the like. This detection means 8 is
As can be clearly seen from FIG. 1, the optical axis is provided so as to be inclined toward the side on which the detection means 3 is disposed with respect to the base material 1. The angle of inclination α is also preferably smaller, and is preferably 60 degrees or less.

次に、上記構成の異物検査装置の動作を説明する。Next, the operation of the foreign matter inspection apparatus having the above configuration will be explained.

基材1が矢印A方向に走行しており、その際に照射手段
3が基材1上面の検出位置(直線X−X上)を照射し、
検出手段8がその検出位置からの散乱光を監視する。そ
して、異物があるとその異物による散乱光を検出手段8
が検出し、異物を検出する。かくして、基材lの全面の
異物を自動的に検出することができる。
The base material 1 is traveling in the direction of arrow A, and at this time, the irradiation means 3 irradiates the detection position (on the straight line XX) on the upper surface of the base material 1,
The detection means 8 monitors the scattered light from the detection position. If there is a foreign object, the detection means 8 detects the scattered light caused by the foreign object.
detects foreign objects. In this way, foreign matter on the entire surface of the base material 1 can be automatically detected.

ここで、前記したように基材1の金属基板1a(第3図
参照)表面には、圧延加工において圧延ロールのあらさ
が転写されており、小さい凹凸を有している。
Here, as described above, the surface of the metal substrate 1a (see FIG. 3) of the base material 1 has small irregularities due to the transfer of the roughness of the rolling roll during the rolling process.

この凹凸はレジストコーティング層1bによって覆われ
ているが、レジストコーティング層自体が透明であるた
め、検出光4で照射した時、金属基板表面の凹凸による
散乱光が発生し、異物による散乱光との区別が困難とな
る。しかしながら1本実施例では、上記した照射手段3
と検出手段8の配列を採用することにより。
These irregularities are covered by the resist coating layer 1b, but since the resist coating layer itself is transparent, when irradiated with the detection light 4, scattered light is generated due to the irregularities on the surface of the metal substrate, which is different from the scattered light due to foreign objects. Difficult to differentiate. However, in this embodiment, the above-mentioned irradiation means 3
and by employing an array of detection means 8.

異物による散乱光を確実に検出することができる。以下
、その理由を説明する。
It is possible to reliably detect light scattered by foreign objects. The reason for this will be explained below.

第4図に示すように、異物の無い基材11 (第1図の
実施例の基材1と同じもの)を用意し、その基材llに
対して、基材上の小さい検出位置Bを光源(ハロゲンラ
ンプ)12からの検出光13で照射し、検出値WBにお
ける散乱光14を位置Bの垂直線上に配置した検出手段
15で検出した。この時の光源12の位置を、基材11
に対する入射角θを30度に保ちながら。
As shown in FIG. 4, a base material 11 (same as the base material 1 in the embodiment shown in FIG. 1) free of foreign matter is prepared, and a small detection position B on the base material is set with respect to the base material ll. It was irradiated with detection light 13 from a light source (halogen lamp) 12, and scattered light 14 at the detection value WB was detected by detection means 15 arranged on a line perpendicular to position B. The position of the light source 12 at this time is
while keeping the incident angle θ to 30 degrees.

上面から見た場合における検出光の基板圧延方向Aに対
する角度θを種々な角度になるように変更した。このテ
ストを多数枚の基材11に対して行い、検出手段15に
よって検出した基材11表面の散乱光強度(反射強度)
と角度θの関係を第5図のグラフに示す。また、その時
の散乱光強度の標準偏差と角度θの関係を第6図のグラ
フに示す、これらのグラフより明らかなように、角度θ
をO又は180度とした場合に、即ち上面から見た場合
の検出光の照射方向を基材11の圧延方向と平行方向と
なるようにした場合に1反射強度が小さく且つバラツキ
も小さい、逆に、検出光の照射方向の圧延方向に対して
直角な方向とすると1反射強度が大きく、バラツキも大
きい。
The angle θ of the detection light with respect to the substrate rolling direction A when viewed from the top was changed to various angles. This test was performed on a large number of base materials 11, and the scattered light intensity (reflection intensity) on the surface of the base material 11 was detected by the detection means 15.
The relationship between the angle θ and the angle θ is shown in the graph of FIG. In addition, the relationship between the standard deviation of the scattered light intensity and the angle θ at that time is shown in the graph of Figure 6.As is clear from these graphs, the angle θ
When is set to O or 180 degrees, that is, when the irradiation direction of the detection light when viewed from the top is parallel to the rolling direction of the base material 11, the 1 reflection intensity is small and the variation is small, and vice versa. Furthermore, when the direction of irradiation of the detection light is perpendicular to the rolling direction, the single reflection intensity is large and the variation is also large.

以上のことにより、検査すべき基材に対してその圧延方
向に対して平行方向に検出光を照射すれば、基材の金属
基板自体の表面粗さに基づく散乱光の強さを下げること
ができる。この散乱光は異物検出時におけるノイズとな
るものであるので、極力小さく抑えることが望ましく、
前記した第1図、第2図の実施例では。
Based on the above, if the detection light is irradiated onto the base material to be inspected in a direction parallel to its rolling direction, it is possible to reduce the intensity of scattered light due to the surface roughness of the base metal substrate itself. can. This scattered light becomes noise when detecting foreign objects, so it is desirable to keep it as small as possible.
In the embodiments shown in FIGS. 1 and 2 described above.

照射手段3を基材1の圧延方向Aに対して平行方向に検
出光4を照射するように配置している。
The irradiation means 3 is arranged so as to irradiate the detection light 4 in a direction parallel to the rolling direction A of the base material 1.

次に、第7図において、上面から見た場合における検出
光13の照射方向を基材11の圧延方向Aに一致させた
状態で光s12の位置を、その検出光13の基材11に
対する傾斜角θが変化するように変え、各場合における
散乱光の強さ(N)を検出し、た。同様のテストを基材
11の検出位置Bに異物を置いた状態で行い、検出位置
Bからの散乱光の強さ(S)を検出した。
Next, in FIG. 7, the position of the light s12 is adjusted so that the irradiation direction of the detection light 13 when viewed from the top coincides with the rolling direction A of the base material 11, and the angle of the detection light 13 with respect to the base material 11 is adjusted. The angle θ was varied and the intensity (N) of scattered light in each case was detected. A similar test was conducted with a foreign object placed at detection position B of the base material 11, and the intensity (S) of scattered light from detection position B was detected.

これらの検出値がらその比(S/N)を計算し、角度θ
に対してプロア)したのが、第8図に示すグラフである
。このグラフより明らかなように、傾斜角θを小さくす
ると、特に25度以下とすると、S/Nを大きくするこ
とができる。換言すれば異物の検出が確実となる。かか
る観点より、上記実施例では、照射手段3による検出光
4の傾斜角θを5〜25度の範囲内としている。
The ratio (S/N) is calculated from these detected values, and the angle θ
The graph shown in FIG. 8 is the graph shown in FIG. As is clear from this graph, the S/N can be increased by reducing the inclination angle θ, especially by setting it to 25 degrees or less. In other words, foreign matter can be detected reliably. From this point of view, in the above embodiment, the inclination angle θ of the detection light 4 by the irradiation means 3 is set within the range of 5 to 25 degrees.

次に、第9図に示すように、光源12を、その光源12
からの検出光13が上面から見た場合には基材11の圧
延方向Aに平行になり、基材11に対する傾斜角θは2
0度となる位置に固定し、一方、検出手段15の位置を
、その先軸を上面から見た場合には圧延方向Aに平行に
保ちながら、基材11に対してなす角度αが変化するよ
うに変えて、基材11がらの散乱光の強さ(N)を検出
した。同様のテストを基材11の検出位置Bに異物を置
いた状態で行い1位置Bからの散乱光の強さ(S)を検
出した。これらの検出値からその比(S/N)を計算し
、角度θに対してプロットしたのが、第10図に示すグ
ラフである。なお、このグラフにおいて、角度α=0は
、検出手段15が位置Bを基準として光源12と同じ側
となり且つその光軸が基材11に平行となる位置である
。このグラフより明らかなように、角度αをできるだけ
小さくすると。
Next, as shown in FIG.
When the detection light 13 from the base material 11 is viewed from above, it is parallel to the rolling direction A of the base material 11, and the inclination angle θ with respect to the base material 11 is 2.
The angle α formed with respect to the base material 11 is changed while keeping the position of the detection means 15 parallel to the rolling direction A when the tip axis thereof is viewed from above. The intensity (N) of scattered light from the base material 11 was detected by changing the following. A similar test was conducted with a foreign object placed at detection position B of the base material 11, and the intensity (S) of scattered light from position B was detected. The ratio (S/N) was calculated from these detected values and plotted against the angle θ in the graph shown in FIG. In this graph, angle α=0 is a position where the detection means 15 is on the same side as the light source 12 with respect to position B and its optical axis is parallel to the base material 11. As is clear from this graph, if the angle α is made as small as possible.

従って、検出手段15を検出位置Bを基準として光源1
1と同じ側に配置し、且つその光軸を基材に対して小さ
い角度で傾斜させると、S/Nを大きくすることができ
る。かかる観点より、上記実施例では、検出手段8を照
射手段3と同じ側に配置し、且つ基材1に対して小さい
傾斜角αとなるように傾斜させている。
Therefore, the light source 1 is
If it is arranged on the same side as No. 1 and its optical axis is inclined at a small angle with respect to the base material, the S/N can be increased. From this point of view, in the above embodiment, the detection means 8 is arranged on the same side as the irradiation means 3, and is tilted at a small inclination angle α with respect to the base material 1.

次に、第9図に示すように、検出光13の傾斜角θを2
0度に保ち、検出手段15の角度αを変えて測定を行い
、S/Nを求めた。このテストを光源12として、ハロ
ゲンランプと、He−Neレーザをそれぞれ用いて行っ
た。その結果を第11図に示す、このグラフより明らか
なように、光源としてレーザ光よりもハロゲンランプに
よるインコヒーレント光を用いた方がS/Nは向上して
いる。これは基材を構成する金属基板表面の微細な凹凸
のためにレーザ光を用いるとスペックルのためにノイズ
が生じることによると思われる。かかる観点より、上記
実施例では、照射手段3の光源5として、インコヒーレ
ント光を照射するハロゲンランプを用いており、これに
より、S/Nを大きくして良好な異物検出を可能として
いる。
Next, as shown in FIG. 9, the inclination angle θ of the detection light 13 is set to 2.
The angle α of the detection means 15 was maintained at 0 degrees and measurements were performed to determine the S/N. This test was conducted using a halogen lamp and a He-Ne laser as the light source 12, respectively. The results are shown in FIG. 11. As is clear from this graph, the S/N is improved when incoherent light from a halogen lamp is used as the light source rather than laser light. This is thought to be because noise is generated due to speckles when laser light is used due to minute irregularities on the surface of the metal substrate constituting the base material. From this point of view, in the above embodiment, a halogen lamp that emits incoherent light is used as the light source 5 of the irradiation means 3, thereby increasing the S/N ratio and enabling good foreign object detection.

以上の理由により、第1図、第2図の実施例では。For the above reasons, the embodiments shown in FIGS. 1 and 2 are used.

異物による散乱光を確実に検出することができる。It is possible to reliably detect light scattered by foreign objects.

なお、上記実施例では、基材1を構成する金属基板1a
が圧延による凹凸を有しており、その凹凸に方向性があ
るため、検出光の照射方向を圧延方向に平行となるよう
に(即ち角度eが0度又は180度となるように)して
いる、しかしながら、基材によっては、この方向が異な
る場合もあり、従って検出光の照射方向は、その基材に
応じた方向を適宜選定すればよい。
In addition, in the above embodiment, the metal substrate 1a constituting the base material 1
has unevenness due to rolling, and since the unevenness has directionality, the irradiation direction of the detection light is set parallel to the rolling direction (that is, the angle e is 0 degrees or 180 degrees). However, depending on the base material, this direction may be different, so the direction of irradiation of the detection light may be appropriately selected depending on the base material.

また、上記実施例では、レジストコーティング層を備え
た基材に対する異物検出を行っているが1本発明はこの
場合に限らず、レジストコーティング前の金属基板表面
の異物検出にも適用可能であることはいうまでもない、
更に、上記実施例では巻取の状態でセットされる長尺の
基材に対して異物検査を連続して行う場合を示したが2
本発明はこの場合に限らず、適当な大きさに切断した平
板状の基材に対しても適用可能である。
Further, in the above embodiment, foreign matter detection is performed on a base material provided with a resist coating layer, but the present invention is not limited to this case, but can also be applied to foreign matter detection on the surface of a metal substrate before resist coating. Needless to say,
Furthermore, in the above embodiment, a case was shown in which foreign object inspection was performed continuously on a long base material set in a rolled state.
The present invention is not limited to this case, but can also be applied to a flat base material cut into an appropriate size.

(発明の効果〕 以上のように3本発明は、検出光を被検査材の検出位置
に、被検査材に対して傾斜した方向から照射する照射手
段と、検出位置からの散乱光を検出する検出手段とを設
け、この検出手段の光軸を被検査材表面に対して前記照
射手段を配置した側に傾斜させるという構成を備えてい
るので、被検査材自体が有する凹凸による散乱光(ノイ
ズ)を極力抑え、異物による散乱光を検出することがで
きるという効果を有している。
(Effects of the Invention) As described above, the present invention includes an irradiation means that irradiates detection light onto a detection position of a material to be inspected from a direction oblique to the material to be inspected, and detects scattered light from the detection position. Since the optical axis of the detection means is inclined toward the side where the irradiation means is arranged with respect to the surface of the material to be inspected, scattered light (noise) due to the unevenness of the material to be inspected itself is ) and can detect light scattered by foreign objects.

また、検出光としてインコヒーレントな光を用いると、
被検査材表面の凹凸によるノイズを更に抑制でき。
Also, if incoherent light is used as the detection light,
Noise caused by unevenness on the surface of the inspected material can be further suppressed.

−層異物の検出が確実となる。- Detection of layer foreign matter becomes reliable.

更に、被検査材が圧延された金属基板単体、或いはその
金属基板表面に透明なレジストコーティング層を形成し
てなる基材である場合には、検出光を被検査材に対して
その圧延方向と平行な方向がら且っ被検査材に対して5
〜25度に傾斜した方向から照射することにより、被検
査材表面の凹凸によるノイズを更に抑制でき、−層異物
の検出が確実となる。
Furthermore, if the material to be inspected is a single rolled metal substrate or a base material with a transparent resist coating layer formed on the surface of the metal substrate, the detection light is applied to the material to be inspected in the rolling direction. 5 in the parallel direction and against the inspected material
By irradiating from a direction inclined at ~25 degrees, noise caused by unevenness on the surface of the material to be inspected can be further suppressed, and the detection of -layer foreign matter can be ensured.

かくして1本発明によれば、長尺の被検査材に対しても
自動的にその表面の異物を検出することができ例えば・
 フォトフアプリケーション工程において レジストコ
ーテイング後の基材の外観検査を自動的に行うことが可
能となり、産業上極めて有益なものである。
Thus, according to one aspect of the present invention, it is possible to automatically detect foreign substances on the surface of a long object to be inspected.
In the photo application process, it becomes possible to automatically inspect the appearance of the base material after resist coating, which is extremely useful industrially.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明をレジストコーテイング後のシャドウマ
スク用基材の表面の異物検出に適用した実施例を示す概
略側面図、第2図はその概略平面図、第3図はその基材
の断面を拡大して示す断面図、第4図は基材の金属基板
の圧延方向に対する検出光の角度eの影響を調べるため
のテストを行う状態を概略的に示す斜視図、第5図はそ
の角度θと散乱光強度との関係を示すグラフ、第6図は
前記角度θと散乱光強度のバラツキ(標準偏差)との関
係を示すグラフ、第7図は検出光の基材に対する傾斜角
θの影響を調べるためのテストを行う状態を概略的に示
す斜視図、第8図はその角度θとS/Nの関係を示すグ
ラフ、第9図は検出手段の光軸の基材に対する角度αの
影響を調べるためのテストを行う状態を概略的に示す斜
視図、第10図はその角度αとS/Nの関係を示すグラ
フ、第11図は異なる光源を使用した際における角度α
とS/Nとの関係を示すグラフである。 1・・・基材、la−・−金属基板、1b−レジストコ
ーティング層、2−搬送ローラ、3−・・照射手段、4
−検出光、5−光源、6−レンズ、7−・フィルター、
  8−検出手段、9−散乱光、10A−レンズ、10
B−リニアイメージセンサ、11−基材、12・・・光
源、13−・−検出光、14−・散乱光、15−検出手
段。 代理人 弁理士 乗 松 恭 三 第4図 牙7 図 19図 5?2図 牙3図 ¥崎−\キ胃題で・ 1−基材 一−−合属#蔵 1b−Vシ′又トコ−短ブノ− 蛎恍雪薫 χ 〆 ×
Fig. 1 is a schematic side view showing an embodiment in which the present invention is applied to foreign matter detection on the surface of a shadow mask base material after resist coating, Fig. 2 is a schematic plan view thereof, and Fig. 3 is a cross section of the base material. FIG. 4 is a perspective view schematically showing the state in which a test is carried out to examine the influence of the angle e of the detection light on the rolling direction of the base metal substrate, and FIG. 5 is the angle. A graph showing the relationship between θ and the scattered light intensity, FIG. 6 is a graph showing the relationship between the angle θ and the variation (standard deviation) of the scattered light intensity, and FIG. 7 is a graph showing the relationship between the angle θ and the scattering light intensity variation (standard deviation). FIG. 8 is a graph showing the relationship between the angle θ and S/N, and FIG. 9 is a graph showing the angle α of the optical axis of the detection means with respect to the base material. A perspective view schematically showing the state in which a test is conducted to investigate the influence, Fig. 10 is a graph showing the relationship between the angle α and S/N, and Fig. 11 shows the angle α when using different light sources.
It is a graph which shows the relationship between and S/N. 1...Base material, la--metal substrate, 1b-resist coating layer, 2-transport roller, 3--irradiation means, 4
-detection light, 5-light source, 6-lens, 7-filter,
8-detection means, 9-scattered light, 10A-lens, 10
B-linear image sensor, 11-base material, 12--light source, 13--detection light, 14--scattered light, 15-detection means. Agent Patent Attorney Kyo Matsu 3rd figure 4 fig. 7 Fig. 19 fig. 5? 2 fig. 3 -Short Buno- Hajime Kyouyuki Kaoruchi〆〆×

Claims (3)

【特許請求の範囲】[Claims] (1)検出光を被検査材の検出位置に、該被検査材表面
に対して傾斜した方向から照射する照射手段と、前記検
出位置からの散乱光を検出する検出手段とを備え、この
検出手段の光軸が被検査材表面に対して前記照射手段を
配置した側に傾斜していることを特徴とする異物検査装
置。
(1) comprising an irradiation means for irradiating detection light onto a detection position of a material to be inspected from a direction oblique to the surface of the material to be inspected; and a detection means for detecting scattered light from the detection position; A foreign matter inspection device characterized in that the optical axis of the means is inclined toward the side where the irradiation means is arranged with respect to the surface of the material to be inspected.
(2)照射手段が、検出光としてインコヒーレントな光
を照射することを特徴とする請求項1記載の異物検査装
置。
(2) The foreign matter inspection device according to claim 1, wherein the irradiation means irradiates incoherent light as the detection light.
(3)被検査材が圧延された金属基板又はその上にレジ
ストコーティング層を有する基材であり、照射手段が検
出光を被検査材に対してその圧延方向と平行な方向から
且つ被検査材に対して5〜25度に傾斜した方向から照
射することを特徴とする請求項1又は2記載の異物検査
装置。
(3) The material to be inspected is a rolled metal substrate or a base material having a resist coating layer thereon, and the irradiation means applies detection light to the material to be inspected from a direction parallel to the rolling direction of the material. 3. The foreign matter inspection device according to claim 1, wherein the foreign matter inspection device emits light from a direction inclined at an angle of 5 to 25 degrees relative to the object.
JP13809590A 1990-05-28 1990-05-28 Foreign-matter inspecting apparatus Pending JPH0431753A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13809590A JPH0431753A (en) 1990-05-28 1990-05-28 Foreign-matter inspecting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13809590A JPH0431753A (en) 1990-05-28 1990-05-28 Foreign-matter inspecting apparatus

Publications (1)

Publication Number Publication Date
JPH0431753A true JPH0431753A (en) 1992-02-03

Family

ID=15213832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13809590A Pending JPH0431753A (en) 1990-05-28 1990-05-28 Foreign-matter inspecting apparatus

Country Status (1)

Country Link
JP (1) JPH0431753A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05346408A (en) * 1992-06-15 1993-12-27 Nippon Steel Corp Flaw inspection method
JP2008275424A (en) * 2007-04-27 2008-11-13 Jfe Steel Kk Surface inspection device
WO2021013547A1 (en) * 2019-07-19 2021-01-28 Thyssenkrupp Steel Europe Ag Method for determining a cleaning state of a surface of a flat product, and flat product
WO2023166898A1 (en) * 2022-03-03 2023-09-07 Jfeスチール株式会社 Surface inspection method for metal material, surface inspection apparatus for metal material, and metal material

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05346408A (en) * 1992-06-15 1993-12-27 Nippon Steel Corp Flaw inspection method
JP2008275424A (en) * 2007-04-27 2008-11-13 Jfe Steel Kk Surface inspection device
WO2021013547A1 (en) * 2019-07-19 2021-01-28 Thyssenkrupp Steel Europe Ag Method for determining a cleaning state of a surface of a flat product, and flat product
WO2023166898A1 (en) * 2022-03-03 2023-09-07 Jfeスチール株式会社 Surface inspection method for metal material, surface inspection apparatus for metal material, and metal material

Similar Documents

Publication Publication Date Title
JP4793266B2 (en) Defect inspection method and apparatus for transparent plate
KR100494146B1 (en) Multi- Utilizing Holder Of Particle Inspection Device And Inspection Method Thereof
JP2008275424A (en) Surface inspection device
JP2004309287A (en) Defect detection device and defect detection method
JPH0431753A (en) Foreign-matter inspecting apparatus
JP2000298102A (en) Surface inspecting device
JP4002429B2 (en) Exposure apparatus having foreign substance inspection function and foreign substance inspection method in the apparatus
WO2020105368A1 (en) Method for manufacturing glass plate and apparatus for manufacturing glass plate
JP3102850B2 (en) Crystal blank scratch inspection equipment
JPH0426844A (en) Foreign matter inspecting method
JPH1164232A (en) Stage for quartz crystal substrate and flaw inspecting device for quartz crystal substrate
JPH04355350A (en) Defect inspector
JPH0426845A (en) Foreign matter inspecting method
JPS6345541A (en) Method and instrument for inspection
JPH04248451A (en) Method for detecting flaw
JPH07209199A (en) Method and apparatus for detecting flaw of planar plate-shaped material to be inspected
JP2006258662A (en) Surface inspection method
JP7493163B2 (en) Defect inspection device
JPH10185829A (en) Method and device for inspecting defect on surface of transparent flat body
JP2005156416A (en) Method and apparatus for inspecting glass substrate
JPH04344447A (en) Detecting device for defect in transparent glass substrate
JP2001264262A (en) Surface foreign matter inspecting method and surface foreign matter inspecting device
JPH09218162A (en) Surface defect inspection device
JPH10185828A (en) Method and device for inspecting defect of transparent flat body surface
JPH1038753A (en) Method for inspecting transparent film