JPH04298388A - Optical recording medium - Google Patents

Optical recording medium

Info

Publication number
JPH04298388A
JPH04298388A JP3063581A JP6358191A JPH04298388A JP H04298388 A JPH04298388 A JP H04298388A JP 3063581 A JP3063581 A JP 3063581A JP 6358191 A JP6358191 A JP 6358191A JP H04298388 A JPH04298388 A JP H04298388A
Authority
JP
Japan
Prior art keywords
silicon oxide
film
oxide film
substrate
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3063581A
Other languages
Japanese (ja)
Inventor
Takashi Yamada
高士 山田
Atsushi Yoshizawa
淳志 吉澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Priority to JP3063581A priority Critical patent/JPH04298388A/en
Publication of JPH04298388A publication Critical patent/JPH04298388A/en
Pending legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PURPOSE:To obtain an optical recording medium, which has excellent light resistance and in which pit mismatching is difficult to be generated and a flow is difficult to be generated on the surface of the medium, by forming a silicon oxide film on the external surface and/or internal surface of a light-transmitting substrate. CONSTITUTION:An optical recording medium 1 is composed of a light- transmitting substrate 11, a silicon oxide film 51 formed on the external surface of the substrate 11, a silicon oxide film 55 shaped on the internal surface of the substrate 11 and a dyestuff recording film formed onto the silicon oxide film 55. The intrusion of oxygen and steam from the outside can be prevented by forming the silicon oxide film 51. Even the generation of the surface flaw of the substance 11 can be obviated. The silicon oxide film 51 is formed through a vacuum thin-film forming method such as a sputtering method, an ion plating method, etc. On the other hand, a recording film 21 is shaped onto the silicon oxide film 55 formed on the internal surface of the substance 11 in the same method.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は書込み可能な光記録媒体
、特に、光透過性基板の上に、有機色素を含有する記録
膜を備える光記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a writable optical recording medium, and more particularly to an optical recording medium comprising a recording film containing an organic dye on a light-transmitting substrate.

【0002】0002

【従来の技術】光記録媒体は、一般に記憶容量が大きく
、しかも書込みまたは読出しが非接触で行われる等、す
ぐれた特徴を備えており、その開発が従来から活発に行
われている。このような光記録媒体の一例として、例え
ば、追記型光ディスクがあり、このものは、基板の上に
、例えば有機色素を含有する記録膜を有する構成をなし
ており、記録膜の微小面積に基板側からレーザビームを
集光させ、それを熱エネルギーに変換し、記録膜の性状
を変えて(ピット形成)記録し、未記録部分との反射光
量の違いによって再生を行うようにしている。このよう
な媒体に用いられる基板は、コスト的なメリットから、
ポリカーボネート樹脂(PC)、ポリメタクリ酸メチル
樹脂(PMMA)材料が広く使われている。
2. Description of the Related Art Optical recording media generally have a large storage capacity and have excellent features such as non-contact writing and reading, and have been actively developed. An example of such an optical recording medium is a write-once optical disk, which has a recording film containing, for example, an organic dye on a substrate. A laser beam is focused from the side, converted into thermal energy, and recorded by changing the properties of the recording film (pit formation), and reproduction is performed based on the difference in the amount of reflected light from the unrecorded area. The substrates used for such media are cost-effective,
Polycarbonate resin (PC) and polymethyl methacrylate resin (PMMA) materials are widely used.

【0003】しかしながらこのような基板は、酸素バリ
ア性がなく酸素を透過させるとともに機械的強度が弱い
という物性を有する。一方、記録膜に関して言えば、有
機系色素に限れば、シアニン、フタロシアニン等が一般
的である。特に、シアニンを記録膜に用いた場合、シア
ニンは記録膜として優れた特性を有するものの、光に対
して著しく弱く劣化しやすいという欠点がある。すなわ
ち、シアニンは酸素存在化で光反応を起こし、主として
メチン連鎖部分の二重結合に酸素の橋掛けがおこり、こ
れがメチン連鎖を切断し分子崩壊につながる。
However, such a substrate has physical properties such that it does not have oxygen barrier properties, allows oxygen to pass through it, and has low mechanical strength. On the other hand, when it comes to recording films, cyanine, phthalocyanine, etc. are generally used as organic dyes. In particular, when cyanine is used in a recording film, although cyanine has excellent properties as a recording film, it has the drawback of being extremely weak against light and easily deteriorating. That is, cyanine causes a photoreaction in the presence of oxygen, and oxygen cross-linking occurs mainly at the double bond in the methine chain, which breaks the methine chain and leads to molecular collapse.

【0004】0004

【発明が解決しようとする課題】従って、上記基板にシ
アニン系の有機色素膜の記録膜を有する媒体では、必然
的に記録膜の劣化が生じ得る。また、上記の基板では機
械的強度が不十分であり、記録時にピット形成した場合
、基板に熱変形や流動が生じ、ピット不整合が生じ、再
生信号が十分にとれないという不都合もある。また、上
記樹脂性基板では基板表面にきずが発生しやすいという
不都合もある。
Therefore, in a medium having a recording film of a cyanine-based organic dye film on the substrate, deterioration of the recording film inevitably occurs. In addition, the above-mentioned substrate has insufficient mechanical strength, and when pits are formed during recording, thermal deformation and flow occur in the substrate, resulting in pit misalignment and an inconvenience in that a sufficient reproduced signal cannot be obtained. Furthermore, the resin substrate described above also has the disadvantage that scratches are likely to occur on the substrate surface.

【0005】このような実情のもと本発明は創案された
ものであり、その目的は、耐光性に優れ、ピット不整合
がおこりにくく、媒体表面にきずが発生しにくい光記録
媒体を提供することにある。
The present invention was created under these circumstances, and its purpose is to provide an optical recording medium that has excellent light resistance, is less likely to cause pit misalignment, and is less likely to have scratches on its surface. There is a particular thing.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するため
、本発明は、光透過性基板の上に、記録膜を有する光記
録媒体において、前記光透過性基板の外部表面および/
または内部表面に、酸化ケイ素膜を設けるように構成し
た。本発明の光記録媒体の部分縦断面図が図1に示され
る。本発明の光記録媒体1は光透過性基板11と、この
基板11の外部表面上に設層された酸化ケイ素膜51と
、基板の内部表面に設層された酸化ケイ素膜55と、こ
の酸化ケイ素膜55の上に設層された色素記録膜21を
有している。
Means for Solving the Problems In order to solve the above-mentioned problems, the present invention provides an optical recording medium having a recording film on a light-transmitting substrate.
Alternatively, a silicon oxide film is provided on the internal surface. A partial longitudinal cross-sectional view of the optical recording medium of the present invention is shown in FIG. The optical recording medium 1 of the present invention includes a light-transmissive substrate 11, a silicon oxide film 51 formed on the outer surface of the substrate 11, a silicon oxide film 55 formed on the inner surface of the substrate, and a silicon oxide film 55 formed on the inner surface of the substrate. A dye recording film 21 is provided on a silicon film 55.

【0007】光透過性基板11は、生産性向上等の観点
から、いわゆる射出成形樹脂基板を用いることが好まし
く、このものはポリカーボネート樹脂(PC)、ポリメ
タクリ酸メチル樹脂(PMMA)等の透明樹脂材料から
形成される。基板成形時に通常、グルーブ11aも同時
に形成されるが、樹脂基板とグルーブ形成層とが別体と
なったいわゆる2P基板であってもよい。。
From the viewpoint of improving productivity, it is preferable to use a so-called injection molded resin substrate as the light-transmitting substrate 11, and this substrate is made of a transparent resin material such as polycarbonate resin (PC) or polymethyl methacrylate resin (PMMA). formed from. Although the grooves 11a are usually formed at the same time as the substrate molding, it may also be a so-called 2P substrate in which the resin substrate and the groove forming layer are separate bodies. .

【0008】このような基板11の厚さは通常、1.1
〜1.5mm程度とされる。このような基板11の外部
表面(レーザ入射側)上には酸化ケイ素膜51が形成さ
れる。この酸化ケイ素膜51を設けることにより、外部
からの酸素や水蒸気の侵入を防止できる。また、基板の
表面きずの発生をも防止できる。酸化ケイ素膜51はス
パッタ法、イオンプレート法等の真空薄膜形成法で形成
される。
The thickness of such a substrate 11 is usually 1.1
~1.5mm. A silicon oxide film 51 is formed on the external surface (laser incident side) of the substrate 11 as described above. By providing this silicon oxide film 51, it is possible to prevent oxygen and water vapor from entering from the outside. Furthermore, it is possible to prevent surface scratches on the substrate. The silicon oxide film 51 is formed by a vacuum thin film forming method such as a sputtering method or an ion plate method.

【0009】一方、基板11の内部表面(グルーブ11
a形成面)には酸化ケイ素膜55が形成される。このも
のは前記酸化ケイ素膜51と同様な方法で形成される。 膜厚は100〜150nm程度である。このような酸化
ケイ素膜55の上には、記録膜21が形成される。記録
膜21には公知の種々の有機色素が含有される。本発明
では、特に、酸素の存在により劣化が惹起される有機色
素、すなわち酸素の存在化で光反応を示し、光劣化させ
られる色素が対象となる。具体的にはシアニン骨格を有
するシアニン色素が挙げられる。より具体的には、例え
ば下記一般式〔I〕や一般式〔II〕等で示されるシア
ニン色素が挙げられる。
On the other hand, the inner surface of the substrate 11 (groove 11
A silicon oxide film 55 is formed on the formation surface a). This material is formed in the same manner as the silicon oxide film 51 described above. The film thickness is approximately 100 to 150 nm. A recording film 21 is formed on the silicon oxide film 55. The recording film 21 contains various known organic dyes. The present invention particularly targets organic dyes whose deterioration is caused by the presence of oxygen, that is, dyes which exhibit a photoreaction and are photodegraded in the presence of oxygen. Specifically, cyanine dyes having a cyanine skeleton can be mentioned. More specifically, for example, cyanine dyes represented by the following general formula [I] or general formula [II] may be mentioned.

【0010】0010

【化1】[Chemical formula 1]

【0011】[0011]

【化2】[Case 2]

【0012】上記一般式〔I〕,〔II〕において、R
1 およびR2 は、それぞれ、H,ClまたはCH3
 を表し、R3 〜R6 は、それぞれ、炭素数1〜8
のアルキル基を表し、XはClO4 ,I,Br等のカ
ウンターイオンを表し、nは0〜3のいずれかの整数を
表す。このような色素を含有する記録膜12は、例えば
、スピンコート法等の常用手段によって塗設される。塗
設される記録膜12の厚さは、20〜2000nm程度
である。なお、塗布に用いられる溶媒としては、公知の
種々のものが用いられ、例えば、ジアセトンアルコール
、エチルセロソルブ、メチルセロソルブ、イソホロン、
メタノール、テトラフルオロプロパノール等が挙げられ
る。
In the above general formulas [I] and [II], R
1 and R2 are H, Cl or CH3, respectively
and R3 to R6 each have 1 to 8 carbon atoms.
represents an alkyl group, X represents a counter ion such as ClO4, I, Br, etc., and n represents an integer of 0 to 3. The recording film 12 containing such a dye is coated, for example, by a conventional method such as a spin coating method. The thickness of the coated recording film 12 is approximately 20 to 2000 nm. Note that various known solvents are used as the solvent for coating, such as diacetone alcohol, ethyl cellosolve, methyl cellosolve, isophorone,
Examples include methanol and tetrafluoropropanol.

【0013】このような記録膜の上には、媒体の構成形
式によっては、光反射膜31が設けられる。光反射膜3
1は、Au,Ag,Cu,Al等の金属から形成され、
このものは真空蒸着法、スパッタリング、イオンプレー
ティング等の各種真空成膜法で形成される。このような
光反射膜31の厚さは、0.02〜2.0μm程度とさ
れる。
A light reflecting film 31 is provided on such a recording film depending on the configuration of the medium. Light reflective film 3
1 is made of metal such as Au, Ag, Cu, Al, etc.
This material is formed by various vacuum film forming methods such as vacuum evaporation, sputtering, and ion plating. The thickness of such a light reflecting film 31 is approximately 0.02 to 2.0 μm.

【0014】このような光反射膜31の上には、通常、
保護膜41が設層される。保護膜41は、一般に、紫外
線硬化性樹脂をスピンコートして塗設した後、紫外線を
照射し、塗膜を硬化させて形成する。その他、シリコー
ン樹脂、ウレタン樹脂等が保護膜41の材質として用い
られる。このような保護膜41の厚さは、通常、0.1
〜100μm程度である。
[0014] On such a light reflection film 31, there is usually a
A protective film 41 is provided. The protective film 41 is generally formed by spin-coating an ultraviolet curable resin and then irradiating it with ultraviolet rays to cure the coating. In addition, silicone resin, urethane resin, etc. are used as the material for the protective film 41. The thickness of such a protective film 41 is usually 0.1
It is about 100 μm.

【0015】なお、前記記録膜21と、光反射膜31と
の間には光吸収や反射率を上げるために中間層を設けて
も良い。また、記録膜を設けた基板を2枚用意し、記録
膜を対向させた、いわゆるエアーサンドイッチ構造とし
てもよい。
Note that an intermediate layer may be provided between the recording film 21 and the light reflecting film 31 in order to increase light absorption and reflectance. Alternatively, a so-called air sandwich structure may be used in which two substrates provided with recording films are prepared and the recording films are opposed to each other.

【0016】[0016]

【作用】本発明の媒体には、一般に回転下において、記
録光がパルス状に照射される。このとき、記録膜の一部
が融解、除去されピットが形成される。このように形成
されたピットは、やはり媒体の回転下、読出し光の反射
光の差を検出することにより行われる。
[Operation] The medium of the present invention is generally irradiated with recording light in a pulsed manner while being rotated. At this time, part of the recording film is melted and removed to form pits. The pits formed in this manner are also formed by detecting the difference in the reflected light of the read light while the medium is rotating.

【0017】[0017]

【実施例】以下、本発明の具体的実施例を示して本発明
をさらに詳細に説明する。グルーブが一体成形された厚
さ1.2mm、直径120mmのポリカーボネート基板
のレーザ光入射面側およびグルーブ面上に、それぞれ、
酸化ケイ素膜を150nm厚さにスパッタで形成した。
EXAMPLES The present invention will be explained in more detail below by showing specific examples of the present invention. On the laser beam incident surface side and the groove surface of a polycarbonate substrate with a thickness of 1.2 mm and a diameter of 120 mm on which a groove was integrally molded,
A silicon oxide film was formed to a thickness of 150 nm by sputtering.

【0018】この基板のグルーブ面上に形成された酸化
ケイ素膜の上に記録膜を形成した。記録膜に含有される
色素としては上記一般式〔II〕において、R5 およ
びR6 をそれぞれメチル基とし、n=2、X=ClO
4 のものを用いた。この色素をエチルセロソルブの溶
媒に溶解させ(色素濃度:25mg/ml )、このも
のを基板上に100nmの厚さに塗設した。この記録膜
の上および側面を覆うように、さらにAuからなる反射
膜を真空蒸着法で1000オングストロームの厚さに設
層した。さらに、この上にフォトポリマーの保護膜を設
層し、本発明の光記録媒体サンプルを作製した(本発明
サンプル)。
A recording film was formed on the silicon oxide film formed on the groove surface of this substrate. In the above general formula [II], R5 and R6 are each a methyl group, n=2, and X=ClO as the dye contained in the recording film.
4 were used. This dye was dissolved in an ethyl cellosolve solvent (dye concentration: 25 mg/ml) and coated on a substrate to a thickness of 100 nm. A reflective film made of Au was further deposited to a thickness of 1000 angstroms by vacuum evaporation so as to cover the top and side surfaces of this recording film. Furthermore, a photopolymer protective film was formed on this to produce an optical recording medium sample of the present invention (sample of the present invention).

【0019】一方、上記本発明サンプルの中から基板の
両面に設層された酸化ケイ素膜を除いた以外は、上記本
発明サンプルと同様にして比較サンプルを作製した(比
較サンプル)。これら2つのサンプルについて光暴露試
験を行ったところ、本発明のサンプルは比較サンプルに
比べて光透過度の経時変化が極めて少なく耐光性に格段
と優れていることが確認された。また実際に書き込まれ
たピットの形状および基板を確認したところ、本発明の
サンプルのものは基板変形が極めて少なくピット不整合
が生じにくいことも確認された。
On the other hand, a comparative sample was prepared in the same manner as the inventive sample (comparative sample), except that the silicon oxide films formed on both sides of the substrate were removed from the inventive sample. When these two samples were subjected to a light exposure test, it was confirmed that the sample of the present invention shows extremely little change in light transmittance over time compared to the comparative sample, and is significantly superior in light resistance. Furthermore, when the shape of the actually written pits and the substrate were confirmed, it was confirmed that the sample of the present invention had very little substrate deformation and was less likely to cause pit misalignment.

【0020】[0020]

【発明の効果】本発明の光記録媒体は、光透過性基板の
外部表面および/または内部表面に、酸化ケイ素膜を設
けるように構成したので、耐光性に優れ、ピット不整合
がおこりにくく、媒体表面にきずが発生しにくいという
効果を奏する。
Effects of the Invention The optical recording medium of the present invention has a structure in which a silicon oxide film is provided on the outer surface and/or inner surface of the light-transmitting substrate, so it has excellent light resistance, is less likely to cause pit misalignment, This has the effect that scratches are less likely to occur on the surface of the medium.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明の光記録媒体の部分縦断面図である。FIG. 1 is a partial vertical cross-sectional view of an optical recording medium of the present invention.

【符号の説明】[Explanation of symbols]

11  光透過性基板 21  記録膜 51,55  酸化ケイ素膜 11 Light transparent substrate 21 Recording film 51,55 Silicon oxide film

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】  光透過性基板の上に、記録膜を有する
光記録媒体において、前記光透過性基板の外部表面には
酸化ケイ素膜が設けられていることを特徴とする光記録
媒体。
1. An optical recording medium having a recording film on a light-transmitting substrate, characterized in that a silicon oxide film is provided on the outer surface of the light-transmitting substrate.
【請求項2】  光透過性基板の上に、記録膜を有する
光記録媒体において、前記光透過性基板の内部表面には
酸化ケイ素膜が設けられていることを特徴とする光記録
媒体。
2. An optical recording medium having a recording film on a light-transmitting substrate, characterized in that a silicon oxide film is provided on the inner surface of the light-transmitting substrate.
【請求項3】  光透過性基板の上に、記録膜を有する
光記録媒体において、前記光透過性基板の外部表面およ
び内部表面には、それぞれ、酸化ケイ素膜が設けられて
いることを特徴とする光記録媒体。
3. An optical recording medium having a recording film on a light-transmitting substrate, characterized in that a silicon oxide film is provided on an outer surface and an inner surface of the light-transmitting substrate, respectively. optical recording medium.
JP3063581A 1991-03-27 1991-03-27 Optical recording medium Pending JPH04298388A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3063581A JPH04298388A (en) 1991-03-27 1991-03-27 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3063581A JPH04298388A (en) 1991-03-27 1991-03-27 Optical recording medium

Publications (1)

Publication Number Publication Date
JPH04298388A true JPH04298388A (en) 1992-10-22

Family

ID=13233377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3063581A Pending JPH04298388A (en) 1991-03-27 1991-03-27 Optical recording medium

Country Status (1)

Country Link
JP (1) JPH04298388A (en)

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