JPH04296103A - High frequency semiconductor hybrid integrated circuit device - Google Patents
High frequency semiconductor hybrid integrated circuit deviceInfo
- Publication number
- JPH04296103A JPH04296103A JP8772691A JP8772691A JPH04296103A JP H04296103 A JPH04296103 A JP H04296103A JP 8772691 A JP8772691 A JP 8772691A JP 8772691 A JP8772691 A JP 8772691A JP H04296103 A JPH04296103 A JP H04296103A
- Authority
- JP
- Japan
- Prior art keywords
- dielectric substrate
- high frequency
- integrated circuit
- circuit device
- conductor film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 21
- 238000005476 soldering Methods 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 60
- 239000003990 capacitor Substances 0.000 claims description 12
- 239000004020 conductor Substances 0.000 abstract description 50
- 230000003321 amplification Effects 0.000 abstract description 3
- 238000003199 nucleic acid amplification method Methods 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005336 cracking Methods 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003631 expected effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
Landscapes
- Microwave Amplifiers (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】この発明は高周波電力を増幅する
トランジスタとその整合回路等を備えた高周波半導体混
成集積回路装置に関し、特に、浮遊容量が減少し高周波
特性が向上した高周波半導体混成集積回路装置に関する
ものである。[Field of Industrial Application] This invention relates to a high-frequency semiconductor hybrid integrated circuit device equipped with a transistor for amplifying high-frequency power and its matching circuit, and more particularly to a high-frequency semiconductor hybrid integrated circuit device with reduced stray capacitance and improved high-frequency characteristics. It is related to.
【0002】0002
【従来の技術】図3は従来の高周波半導体混成集積回路
装置を示す斜視図である。図において、一部に図示しな
い回路が実装された誘電体基板2が放熱板1上に融着さ
れ、更に、MOS型コンデンサ4,トランジスタチップ
5,接地用導体ブリッジ10が搭載された低熱抵抗の絶
縁体で形成されたヒートシンク11が前記誘電体基板2
の空欠部2aに配設されている。そして、誘電体基板2
とヒートシンク11上には入力用導体膜6a,入力用導
体膜6b,出力用導体膜7a,トランジスタチップ5の
バイアス線も兼ねた出力用導体膜7b,接地用導体膜8
eがそれぞれ印刷されている。そして、入力用導体膜6
aと入力用導体膜6b、出力用導体膜7aと出力用導体
膜7bは入力用リード12と出力用リード13によって
それぞれハンダ付けして接続されている。また、入力用
導体膜6b,MOS型コンデンサ4,トランジスタチッ
プ5は金線等のボンディングワイヤ9aによって接続さ
れ、同様にMOS型コンデンサ4,トランジスタチップ
5,接地用導体ブリッジ10は金線等のボンディングワ
イヤ9aによって接続されている。2. Description of the Related Art FIG. 3 is a perspective view showing a conventional high frequency semiconductor hybrid integrated circuit device. In the figure, a dielectric substrate 2 on which a circuit (not shown) is partially mounted is fused onto a heat sink 1, and a low thermal resistance substrate 2 on which a MOS capacitor 4, a transistor chip 5, and a grounding conductor bridge 10 are mounted. A heat sink 11 made of an insulator is connected to the dielectric substrate 2.
It is arranged in the hollow part 2a of. And dielectric substrate 2
On the heat sink 11 are an input conductor film 6a, an input conductor film 6b, an output conductor film 7a, an output conductor film 7b which also serves as a bias line for the transistor chip 5, and a ground conductor film 8.
e is printed on each. Then, the input conductor film 6
a and the input conductor film 6b, and the output conductor film 7a and the output conductor film 7b are connected by soldering through the input lead 12 and the output lead 13, respectively. Further, the input conductor film 6b, the MOS type capacitor 4, and the transistor chip 5 are connected by a bonding wire 9a such as a gold wire, and similarly the MOS type capacitor 4, the transistor chip 5, and the grounding conductor bridge 10 are connected by a bonding wire 9a such as a gold wire. They are connected by wire 9a.
【0003】次に上記の高周波半導体混成集積回路装置
の動作について説明する。入力用導体膜6aを通じ入力
用リード12,入力用導体膜6b,ボンディングワイヤ
9a,MOS型コンデンサ4を経て、トランジスタチッ
プ5に高周波電力が入力される。そして、トランジスタ
チップ5に入力された高周波電力は増幅され、増幅され
た高周波電力は出力用導体膜7b,出力用リード13,
出力用導体膜7aを通じて出力される。そして、この増
幅作用の際に発生した熱はヒートシンク11と放熱板1
を通して放出される。Next, the operation of the above-mentioned high frequency semiconductor hybrid integrated circuit device will be explained. High frequency power is input to the transistor chip 5 via the input conductor film 6a, the input lead 12, the input conductor film 6b, the bonding wire 9a, and the MOS capacitor 4. Then, the high frequency power input to the transistor chip 5 is amplified, and the amplified high frequency power is transferred to the output conductor film 7b, the output lead 13,
It is output through the output conductor film 7a. The heat generated during this amplification action is transferred to the heat sink 11 and the heat sink 1.
released through.
【0004】0004
【発明が解決しようとする課題】上記の従来の高周波半
導体混成集積回路装置では図にしめすように誘電体基板
2とヒートシンク11にそれぞれに印刷された入力用導
体膜6aと入力用導体膜6b,出力用導体膜7bと出力
用導体膜7aにそれぞれ入力用リード12と出力用リー
ド13をハンダ付けすることにより各々の接続が取られ
ている。[Problems to be Solved by the Invention] In the conventional high frequency semiconductor hybrid integrated circuit device described above, as shown in the figure, an input conductor film 6a and an input conductor film 6b printed on the dielectric substrate 2 and the heat sink 11, respectively. Each connection is made by soldering the input lead 12 and the output lead 13 to the output conductor film 7b and the output conductor film 7a, respectively.
【0005】しかしながら、このリード12,13によ
る接続は浮遊容量が大きくなるため高周波特性に悪影響
を与えていた。また、製造工程において入出力リード1
2,13の取付けが必要なため、製造時の工程数がおの
ずと増えて省力化を図ることが困難であった。更に、ヒ
ートシンク11の形状が方形であるため、ヒートシンク
11が嵌め込まれる誘電体基板2の空欠部2aも方形状
にする必要があり、空欠部2aの角に応力が集中して基
板割れを発生することがあった。However, the connection using the leads 12 and 13 increases stray capacitance, which adversely affects high frequency characteristics. In addition, in the manufacturing process, input/output leads 1
Since 2 and 13 installations are required, the number of manufacturing steps naturally increases, making it difficult to save labor. Furthermore, since the shape of the heat sink 11 is rectangular, the cavity 2a of the dielectric substrate 2 into which the heat sink 11 is fitted must also be square-shaped, which may cause stress to concentrate at the corners of the cavity 2a and cause the board to crack. Occasionally this occurred.
【0006】この発明は上記の問題点を解消するために
なされたもので、入出力用のリードが不要で製造時の省
力化が図られるとともに、浮遊容量が小さく高周波特性
に優れた高周波半導体混成集積回路装置を得ることを目
的とする。[0006] This invention was made to solve the above-mentioned problems, and it is possible to save labor during manufacturing by eliminating the need for input/output leads, and to create a high-frequency semiconductor hybrid with small stray capacitance and excellent high-frequency characteristics. The purpose is to obtain an integrated circuit device.
【0007】更に、この発明の他の目的は、基板割れが
なく耐久性に優れた高周波半導体混成集積回路装置を得
ることにある。Another object of the present invention is to obtain a high frequency semiconductor hybrid integrated circuit device which is free from substrate cracks and has excellent durability.
【0008】[0008]
【課題を解決するための手段】この発明に係る高周波半
導体混成集積回路装置は、基板表面に回路が実装され一
部に空欠部を形成した第1の誘電体基板を放熱板上に融
着し、MOS型コンデンサとトランジスタチップを実装
した熱抵抗の低い第2の誘電体基板を前記第1の誘電体
基板の空欠部に嵌合するとともに、第1と第2の誘電体
基板の双方に印刷された入出力用導体膜を融着して接続
した構造からなる。[Means for Solving the Problems] A high-frequency semiconductor hybrid integrated circuit device according to the present invention includes a first dielectric substrate on which a circuit is mounted on the surface of the substrate and a hollow portion formed in a portion thereof, which is fused onto a heat sink. A second dielectric substrate with low thermal resistance, on which a MOS capacitor and a transistor chip are mounted, is fitted into the cavity of the first dielectric substrate, and both the first and second dielectric substrates are It consists of a structure in which input/output conductor films printed on the front panel are fused and connected.
【0009】また、この発明に係る高周波半導体混成集
積回路装置は第1の誘電体基板と第2の誘電体基板の嵌
合部を角を持たない構造としている。Further, in the high frequency semiconductor hybrid integrated circuit device according to the present invention, the fitting portion between the first dielectric substrate and the second dielectric substrate has a structure without corners.
【0010】0010
【作用】この発明によれば、熱抵抗の低い誘電体基板を
ヒートシンクとし、入出力用導体膜の接合をリードを用
いることなくマイクロストリップ線路を形成したため、
リードとグランドとの浮遊容量を低減して高周波特性を
向上することができる。[Operation] According to the present invention, a dielectric substrate with low thermal resistance is used as a heat sink, and a microstrip line is formed to connect input/output conductor films without using leads.
High frequency characteristics can be improved by reducing stray capacitance between leads and ground.
【0011】また、この発明によれば、第1の誘電体基
板と第2の誘電体基板(ヒートシンク)を嵌合する第1
の誘電体基板の空欠部を角を持たない構造としているの
で基板割れが防止できる。Further, according to the present invention, the first dielectric substrate and the second dielectric substrate (heat sink) are fitted into each other.
Since the hollow part of the dielectric substrate has a structure without corners, it is possible to prevent the substrate from cracking.
【0012】0012
【実施例】以下、この発明の一実施例を図について説明
する。図1はこの発明の高周波半導体混成集積回路装置
の斜視図である。図2は図1の高周波半導体混成集積回
路装置の第1の誘電体基板と第2の誘電体基板を分離し
た状態を表す斜視図である。なお、図1,2において図
3と同一符号は同一または相当部分である。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view of a high frequency semiconductor hybrid integrated circuit device of the present invention. FIG. 2 is a perspective view showing a state in which the first dielectric substrate and the second dielectric substrate of the high frequency semiconductor hybrid integrated circuit device of FIG. 1 are separated. Note that in FIGS. 1 and 2, the same reference numerals as those in FIG. 3 indicate the same or corresponding parts.
【0013】図2において放熱板1上には図示しない部
分に整合回路等の回路が実装され角のない半楕円形状の
空欠部2aが形成された第1の誘電体基板2が融着し、
次いで、上面にMOS型コンデンサ4,トランジスタチ
ップ5,接地用導体ブリッジ10を搭載し突部3aを有
する熱抵抗の低い誘電体(例えば窒化アルミ)からなる
第2の誘電体基板(ヒートシンク)3が前記空欠部2a
に嵌合し、前記第1の誘電体基板2上に該第2の誘電体
基板3を融着することで第1図に示す高周波半導体混成
集積回路装置が構成される。そして、この時第1の誘電
体基板2に印刷された入力用導体膜6aと第2の誘電体
基板3に印刷された入力用導体膜6b,第1の誘電体基
板2に印刷された出力用導体膜7aと第2の誘電体基板
3上に印刷された出力用導体膜7bとの重ね合う部分が
ハンダ付けによって融着され、マイクロストリップ線路
が形成されている。一方、第1の誘電体基板上には接地
用導体膜8a,8b,8cが印刷されており、また、第
2の誘電体基板上に搭載された入力用導体膜6b,MO
S型コンデンサ4,トランジスタチップ5はボンディグ
ワイヤ9aによって接続され、MOS型コンデンサ4,
トランジスタチップ5,接地用導体ブリッジ10はボン
ディグワイヤ9bにより接続されている。また、第2の
誘電体基板上には接地用導体膜8dが形成されている。
また、ボンディグワイヤ9bによってトランジスタチッ
プ5は接地用導体ブリッジ10接続されて接地されてい
る。In FIG. 2, a first dielectric substrate 2 on which a circuit such as a matching circuit is mounted in a not-shown portion and a semi-elliptical cavity 2a with no corners is formed is fused onto the heat sink 1. ,
Next, a second dielectric substrate (heat sink) 3 made of a dielectric material with low thermal resistance (for example, aluminum nitride) and having a protrusion 3a and mounting a MOS type capacitor 4, a transistor chip 5, and a grounding conductor bridge 10 on its upper surface is mounted. The hollow part 2a
The high frequency semiconductor hybrid integrated circuit device shown in FIG. 1 is constructed by fitting the second dielectric substrate 3 onto the first dielectric substrate 2 and fusing the second dielectric substrate 3 onto the first dielectric substrate 2. At this time, the input conductive film 6a printed on the first dielectric substrate 2, the input conductive film 6b printed on the second dielectric substrate 3, and the output printed on the first dielectric substrate 2 The overlapping portions of the output conductor film 7a and the output conductor film 7b printed on the second dielectric substrate 3 are fused by soldering to form a microstrip line. On the other hand, grounding conductor films 8a, 8b, 8c are printed on the first dielectric substrate, and input conductor films 6b, MO
The S type capacitor 4 and the transistor chip 5 are connected by a bonding wire 9a, and the MOS type capacitor 4,
The transistor chip 5 and the grounding conductor bridge 10 are connected by a bonding wire 9b. Furthermore, a grounding conductor film 8d is formed on the second dielectric substrate. Further, the transistor chip 5 is connected to a grounding conductor bridge 10 and grounded by a bonding wire 9b.
【0014】次に、動作について説明する。高周波電力
は入力用導体膜6aと入力用導体膜6bをハンダ付けし
て形成されたマイクロストリップ線路を通じ、ボンディ
ングワイヤ9a,MOS型コンデンサ4を通じてトラン
ジスタチップ5に入力される。次いで、トランジスタチ
ップ5で高周波電力は増幅され、出力用導体膜7aと出
力用導体膜7bをハンダ付けして形成されたマイクロス
トリップ線路を通じて出力される。また、この高周波電
力増幅の際にトランジスタチップ5において発生する熱
は、熱抵抗の低い誘電体で形成された誘電体基板2,3
と放熱板1を通じて効率よく放出される。Next, the operation will be explained. The high frequency power is input to the transistor chip 5 through the bonding wire 9a and the MOS capacitor 4 through a microstrip line formed by soldering the input conductor film 6a and the input conductor film 6b. Next, the high frequency power is amplified by the transistor chip 5 and output through a microstrip line formed by soldering the output conductor film 7a and the output conductor film 7b. Furthermore, the heat generated in the transistor chip 5 during this high-frequency power amplification is absorbed by the dielectric substrates 2 and 3 formed of a dielectric material with low thermal resistance.
and is efficiently released through the heat sink 1.
【0015】このように本実施例では、第1と第2の誘
電体基板に印刷された各々の入力用導体膜と出力用導体
膜の接続がマイクロストリップ線路を形成しているため
高周波特性が向上し、更に、第1と第2の誘電体基板の
嵌合部に角がないため、基板の割れや破損が防止できる
。As described above, in this embodiment, since the connections between the input conductor films and the output conductor films printed on the first and second dielectric substrates form microstrip lines, the high frequency characteristics are improved. Furthermore, since there are no corners in the fitting portion of the first and second dielectric substrates, cracking or damage to the substrates can be prevented.
【0016】なお、上記実施例では第2の誘電体基板(
ヒートシンク)3が嵌合される穴部を第1の誘電体基板
2の端に設けているが、第1の誘電体基板2の中央部に
設けてもよい。Note that in the above embodiment, the second dielectric substrate (
Although the hole portion into which the heat sink 3 is fitted is provided at the end of the first dielectric substrate 2, it may be provided at the center of the first dielectric substrate 2.
【0017】また、上記実施例では第2の誘電体基板(
ヒートシンク)3が嵌合される第1の誘電体基板の空欠
部2aの形状を半楕円型としたが、この空欠部の形状は
角のない形状であればよい。Further, in the above embodiment, the second dielectric substrate (
Although the shape of the cavity 2a of the first dielectric substrate into which the heat sink 3 is fitted is semi-elliptical, the shape of the cavity may be any shape without corners.
【0018】[0018]
【発明の効果】以上のように、この発明によれば、放熱
板上に基板表面に回路が実装され一部に空欠部を形成し
た第1の誘電体基板を融着し、該第1の誘電体基板の空
欠部にMOS型コンデンサとトランジスタチップを実装
した熱抵抗の低い第2の誘電体基板を嵌合するとともに
、第1と第2の誘電体基板の双方に印刷された入出力用
導体膜を融着してマイクロストリップ線路を形成したた
め、浮遊容量が少なく高周波特性に優れ、しかも部品点
数の削減された高周波半導体混成集積回路装置を実現で
きる効果がある。As described above, according to the present invention, a first dielectric substrate having a circuit mounted on the surface of the substrate and a hollow portion formed in a portion is fused onto a heat sink, and A second dielectric substrate with low thermal resistance on which a MOS capacitor and a transistor chip are mounted is fitted into the hollow part of the dielectric substrate, and an input printed on both the first and second dielectric substrates is fitted. Since the output conductor film is fused to form a microstrip line, it is possible to realize a high-frequency semiconductor hybrid integrated circuit device with less stray capacitance, excellent high-frequency characteristics, and a reduced number of parts.
【0019】また、この発明によれば、ヒートシンク搭
載用の誘電体基板の空欠部を角を持たない穴構造として
いるため、基板割れが防止でき耐久性に優れた高周波半
導体混成集積回路装置を実現できる効果がある。Further, according to the present invention, since the hollow part of the dielectric substrate for mounting the heat sink has a hole structure without corners, it is possible to prevent the substrate from cracking and to provide a high-frequency semiconductor hybrid integrated circuit device with excellent durability. There are effects that can be achieved.
【0020】また、この発明によれば、リードの取り付
けが不要となるので部品点数を少なくすることができ、
生産性や生産コストの改善が期待できる効果がある。Furthermore, according to the present invention, it is not necessary to attach leads, so the number of parts can be reduced.
This has the expected effect of improving productivity and production costs.
【図1】この発明の一実施例による高周波半導体混成集
積回路装置を示す斜視図である。FIG. 1 is a perspective view showing a high frequency semiconductor hybrid integrated circuit device according to an embodiment of the present invention.
【図2】図1の高周波半導体混成集積回路装置の第1の
誘電体基板と第2の誘電体基板を分離した状態を表す斜
視図である。FIG. 2 is a perspective view showing a state in which a first dielectric substrate and a second dielectric substrate of the high-frequency semiconductor hybrid integrated circuit device of FIG. 1 are separated;
【図3】従来の高周波半導体混成集積回路装置を示す斜
視図である。FIG. 3 is a perspective view showing a conventional high frequency semiconductor hybrid integrated circuit device.
1 放熱板
2 第1の誘電体基板
2a 第1の誘電体基板の空欠部
3 第2の誘電体基板(ヒートシンク)3a
第2の誘電体基板の突部
4 MOS型コンデンサ
5 トランジスタチップ
6a 入力用導体膜
6b 入力用導体膜
7a 出力用導体膜
7b 出力用導体膜
8a 接地用導体膜
8b 接地用導体膜
8c 接地用導体膜
8d 接地用導体膜
8e 接地用導体膜
9a ボンディングワイヤ
9b ボンディングワイヤ
10 導体ブリッジ
11 ヒートシンク
12 入力用リード
13 出力用リード1 Heat sink 2 First dielectric substrate 2a Hollow portion of first dielectric substrate 3 Second dielectric substrate (heat sink) 3a
Protrusion 4 of second dielectric substrate MOS capacitor 5 Transistor chip 6a Input conductor film 6b Input conductor film 7a Output conductor film 7b Output conductor film 8a Grounding conductor film 8b Grounding conductor film 8c Grounding conductor Film 8d Grounding conductor film 8e Grounding conductor film 9a Bonding wire 9b Bonding wire 10 Conductor bridge 11 Heat sink 12 Input lead 13 Output lead
Claims (2)
表面に回路を実装するとともに一部に空欠部を形成した
第1の誘電体基板と、前記第1の誘電体基板の空欠部に
嵌合し表面にMOS型コンデンサとトランジスタチップ
を実装した熱抵抗の低い第2の誘電体基板とを備え、前
記第1と第2の誘電体基板の双方に印刷した入出力用導
体膜の重接部をハンダ付けにより融着したことを特徴と
する高周波半導体混成集積回路装置。1. A heat sink, a first dielectric substrate disposed overlappingly on the heat sink, having a circuit mounted on its surface and having a hollow portion formed therein, and the first dielectric substrate. a second dielectric substrate with low thermal resistance that fits into the cavity and has a MOS capacitor and a transistor chip mounted on its surface; A high-frequency semiconductor hybrid integrated circuit device, characterized in that the overlapped portions of conductive films are fused by soldering.
積回路装置において、第1の誘電体基板と第2の誘電体
基板との嵌合部が角を持たない構造であることを特徴と
する高周波半導体混成集積回路装置。2. The high frequency semiconductor hybrid integrated circuit device according to claim 1, wherein the fitting portion between the first dielectric substrate and the second dielectric substrate has a structure without corners. High frequency semiconductor hybrid integrated circuit device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8772691A JPH04296103A (en) | 1991-03-25 | 1991-03-25 | High frequency semiconductor hybrid integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8772691A JPH04296103A (en) | 1991-03-25 | 1991-03-25 | High frequency semiconductor hybrid integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04296103A true JPH04296103A (en) | 1992-10-20 |
Family
ID=13922920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8772691A Pending JPH04296103A (en) | 1991-03-25 | 1991-03-25 | High frequency semiconductor hybrid integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04296103A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5508666A (en) * | 1993-11-15 | 1996-04-16 | Hughes Aircraft Company | Rf feedthrough |
KR20010055094A (en) * | 1999-12-09 | 2001-07-02 | 조덕수 | Hybrid amplifier module integrated circuit for used in a handset and method for fabricating the same |
JP2013531389A (en) * | 2010-07-16 | 2013-08-01 | エンブレーション リミテッド | Apparatus and method for taking a thermal interface |
JP2017093123A (en) * | 2015-11-09 | 2017-05-25 | 住友電気工業株式会社 | Wireless power reception device |
-
1991
- 1991-03-25 JP JP8772691A patent/JPH04296103A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5508666A (en) * | 1993-11-15 | 1996-04-16 | Hughes Aircraft Company | Rf feedthrough |
KR20010055094A (en) * | 1999-12-09 | 2001-07-02 | 조덕수 | Hybrid amplifier module integrated circuit for used in a handset and method for fabricating the same |
JP2013531389A (en) * | 2010-07-16 | 2013-08-01 | エンブレーション リミテッド | Apparatus and method for taking a thermal interface |
US9054659B2 (en) | 2010-07-16 | 2015-06-09 | Emblation Limited | Apparatus and method for thermal interfacing |
JP2017093123A (en) * | 2015-11-09 | 2017-05-25 | 住友電気工業株式会社 | Wireless power reception device |
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