JPH04288471A - Drying device - Google Patents
Drying deviceInfo
- Publication number
- JPH04288471A JPH04288471A JP5108891A JP5108891A JPH04288471A JP H04288471 A JPH04288471 A JP H04288471A JP 5108891 A JP5108891 A JP 5108891A JP 5108891 A JP5108891 A JP 5108891A JP H04288471 A JPH04288471 A JP H04288471A
- Authority
- JP
- Japan
- Prior art keywords
- aluminum substrate
- pure water
- drying
- heated
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001035 drying Methods 0.000 title claims abstract description 28
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 13
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract description 3
- 239000012530 fluid Substances 0.000 claims abstract 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 31
- 239000000758 substrate Substances 0.000 abstract description 24
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052782 aluminium Inorganic materials 0.000 abstract description 18
- 238000007664 blowing Methods 0.000 abstract description 6
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 5
- 238000001704 evaporation Methods 0.000 abstract description 3
- 230000008020 evaporation Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract description 3
- 238000007598 dipping method Methods 0.000 abstract 1
- 238000007599 discharging Methods 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Drying Of Solid Materials (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、洗浄後の乾燥に係わり
、特に液晶用ガラス基板,磁気ディスク用アルミ基板、
光ディスク用ガラス基板の乾燥に係わる。[Industrial Application Field] The present invention relates to drying after cleaning, and particularly relates to glass substrates for liquid crystals, aluminum substrates for magnetic disks,
Involved in drying glass substrates for optical discs.
【0002】0002
【従来の技術】従来技術では、特開平1−3742号
記載の様に、加熱された純水が供給される槽に被洗浄物
を浸漬した後、被洗浄物を引き上げ、さらにヒータで加
熱する事で乾燥を行っていた。[Prior art] In the prior art, Japanese Patent Application Laid-Open No. 1-3742
As described, the object to be cleaned was immersed in a tank to which heated pure water was supplied, then the object was pulled up and further heated with a heater to dry it.
【0003】0003
【発明が解決しようとする課題】図2に示す従来技術で
は、乾燥槽3から引き上げながらブローノズル4から加
熱された窒素を吹き付け、さらにヒータで加熱すること
で乾燥を行っていた。しかし、ガラス基板1の様な薄い
被洗浄物は表面積に比較して熱容量が少ないため、ブロ
ーにより表面から付着水が蒸発する時に蒸発潜熱が奪わ
れ基板温度が低下し、付着水の蒸発が不十分となり、残
った付着水をヒータで加熱して乾燥させる事が必要とな
る。そのため、乾燥時間が長くなるという問題や、乾燥
ジミが発生し易いという問題があった。In the prior art shown in FIG. 2, drying was carried out by blowing heated nitrogen from a blow nozzle 4 while lifting the material from the drying tank 3, and then heating it with a heater. However, since a thin object to be cleaned such as the glass substrate 1 has a small heat capacity compared to its surface area, when the adhering water evaporates from the surface by blowing, the latent heat of evaporation is taken away and the substrate temperature decreases, so that the adhering water does not evaporate. Once this is sufficient, it is necessary to heat the remaining adhering water with a heater and dry it. Therefore, there are problems in that the drying time becomes long and dry stains are likely to occur.
【0004】0004
【課題を解決するための手段】本発明は、ブローにより
乾燥を行う前に赤外線ヒータ9により基板1を加熱し、
十分な熱量を与えることである。[Means for Solving the Problems] The present invention heats the substrate 1 with an infrared heater 9 before drying it by blowing,
The goal is to provide sufficient heat.
【0005】[0005]
【作用】赤外線ヒータ9で基板1に付着水を蒸発させる
とき必要な熱量以上の熱量を与える事により、ブローノ
ズル4から窒素を吹き付ける事で、付着水を乾燥するこ
とが出来、基板1に乾燥ジミを発生させることを防止で
きる。[Function] By applying heat greater than the amount of heat required to evaporate the water adhering to the substrate 1 with the infrared heater 9, the adhering water can be dried by blowing nitrogen from the blow nozzle 4, and the adhering water can be dried on the substrate 1. It can prevent stains from forming.
【0006】[0006]
【実施例】以下、本発明の実施例を図1により説明する
。[Embodiment] An embodiment of the present invention will be explained below with reference to FIG.
【0007】乾燥槽3はアルミ基板1をつ蹴る浸漬する
に十分な容積を持ち、純水を溶出汚染させない材料で構
成されている。一例として石英で作られるが、鏡面仕上
げのステンレスも使用可能である。乾燥槽3には温純水
7を供給する供給口5が備えられている。純水8は純水
加熱器6で加熱され、温純水7となる。温純水7の温度
は少なくとも80度以上であり、一例として90度であ
る。The drying tank 3 has a volume sufficient to immerse the aluminum substrate 1, and is made of a material that does not elute and contaminate pure water. For example, it is made of quartz, but stainless steel with a mirror finish can also be used. The drying tank 3 is equipped with a supply port 5 for supplying warm pure water 7. The pure water 8 is heated by the pure water heater 6 and becomes warm pure water 7. The temperature of the warm pure water 7 is at least 80 degrees or higher, for example 90 degrees.
【0008】純水液面2の上部には赤外線ヒータ9とブ
ローノズル4が設けられている。赤外線ヒータ9の出力
密度は少なくとも50kW/m2 以上である。また、
ブローノズル4から吹き出される窒素ガスは少なくとも
100度以上、20リットル/分以上であり、5.25
インチのアルミ基板の場合、一例として150度、5
0リットル/分である。An infrared heater 9 and a blow nozzle 4 are provided above the pure water level 2. The output density of the infrared heater 9 is at least 50 kW/m2. Also,
The nitrogen gas blown out from the blow nozzle 4 is at least 100 degrees or higher and at a rate of 20 liters/min or higher, and has a temperature of 5.25
In the case of an inch aluminum board, for example, 150 degrees, 5
0 liter/min.
【0009】洗浄を終えたアルミ基板1は純水液面2か
ら乾燥槽3内の温純水7に静かに浸漬される。一例とし
て50mm/秒の速度で下ろされる。アルミ基板1は温
純水7で加熱され、少なくとも80度以上となる。加熱
後、アルミ基板1は静かに引き上げられる。一例として
10mm/秒の速度で引き上げられる。引き上げられ、
純水液面2を通過する時、温純水7はアルミ基板1上に
薄い膜として付着する。さらにアルミ基板1は赤外線ヒ
ータ9で加熱され、付着水の蒸発潜熱以上の熱を受ける
。その後、アルミ基板1はブローノズル4から加熱され
た窒素を吹き付けられ、付着水を蒸発させる。本実施例
ではこのブローノズル4を通過する事によりアルミ基板
1上の付着水を乾燥ジミを作ることなく乾燥させること
が出来る。After cleaning, the aluminum substrate 1 is gently immersed in warm pure water 7 in a drying tank 3 from the pure water level 2 . As an example, it is lowered at a speed of 50 mm/sec. The aluminum substrate 1 is heated with warm pure water 7 to a temperature of at least 80 degrees. After heating, the aluminum substrate 1 is gently pulled up. As an example, it is pulled up at a speed of 10 mm/sec. lifted up,
When passing through the pure water surface 2, the warm pure water 7 adheres to the aluminum substrate 1 as a thin film. Furthermore, the aluminum substrate 1 is heated by an infrared heater 9 and receives heat greater than the latent heat of vaporization of the attached water. Thereafter, the aluminum substrate 1 is blown with heated nitrogen from the blow nozzle 4 to evaporate the attached water. In this embodiment, by passing through the blow nozzle 4, the water adhering to the aluminum substrate 1 can be dried without creating dry stains.
【0010】0010
【発明の効果】本発明によれば、窒素ブロー後のヒータ
加熱が不必要となり、乾燥時間を短縮することが可能と
なる。又、乾燥ジミを作る事なく乾燥出来る為、洗浄,
乾燥後の成膜工程において薄膜の均一性や特性を変化さ
せることがなく、目的とする各種性能を達成することが
可能となる。According to the present invention, heating with a heater after nitrogen blowing becomes unnecessary, making it possible to shorten the drying time. In addition, since it can be dried without creating dry stains, cleaning,
It is possible to achieve various desired performances without changing the uniformity or characteristics of the thin film in the film forming process after drying.
【図1】本発明の一実施例の乾燥装置の断面図である。FIG. 1 is a sectional view of a drying device according to an embodiment of the present invention.
【図2】従来技術による乾燥装置の断面図である。FIG. 2 is a sectional view of a drying device according to the prior art;
1…アルミ基板、2…純水液面、3…乾燥槽、4…ブロ
ーノズル、5…供給口、6…純水加熱器、7…温純水、
8…純水、9…赤外線ヒータ、10…ヒータ。1... Aluminum substrate, 2... Pure water level, 3... Drying tank, 4... Blow nozzle, 5... Supply port, 6... Pure water heater, 7... Warm pure water,
8...Pure water, 9...Infrared heater, 10...Heater.
Claims (7)
浸漬した後に引き上げて乾燥する乾燥装置において、媒
体液面上に加熱源と流体吐出口を備えたことを特徴とす
る乾燥装置。1. A drying device for cleaning an object to be cleaned, immersing it in a heated medium, and then pulling it up and drying it, the drying device comprising a heating source and a fluid discharge port above the surface of the medium. .
とを特徴とする請求項1記載の乾燥装置。2. The drying apparatus according to claim 1, wherein the heating source is provided between the fluid discharge port and the liquid surface.
ータを用いたことを特徴とする請求項1又は2記載の乾
燥装置。3. The drying apparatus according to claim 1, wherein an infrared heater is used as a heating source provided above the surface of the medium.
とを特徴とする請求項1から3記載の乾燥装置。4. The drying apparatus according to claim 1, wherein nitrogen gas is used as a medium for the discharged fluid.
とも100度以上であることを特徴とする請求項1から
4記載の乾燥装置。5. The drying apparatus according to claim 1, wherein the temperature of the medium discharged from the discharge port is at least 100 degrees.
とも20リットル/分以上であることを特徴とする請求
項1から5記載の乾燥装置。6. The drying apparatus according to claim 1, wherein the flow rate of the medium discharged from the discharge port is at least 20 liters/minute or more.
kW/m2 以上であることを特徴とする請求項1から
6記載の乾燥装置。7. The infrared heater has a power density of at least 50
The drying apparatus according to any one of claims 1 to 6, characterized in that the drying capacity is kW/m2 or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5108891A JPH04288471A (en) | 1991-03-15 | 1991-03-15 | Drying device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5108891A JPH04288471A (en) | 1991-03-15 | 1991-03-15 | Drying device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04288471A true JPH04288471A (en) | 1992-10-13 |
Family
ID=12877066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5108891A Pending JPH04288471A (en) | 1991-03-15 | 1991-03-15 | Drying device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04288471A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008520773A (en) * | 2004-11-23 | 2008-06-19 | クラリアント・インターナシヨナル・リミテッド | Coatings and films based on polysilazanes, in particular their use for coating polymer films |
JP2016518579A (en) * | 2013-05-03 | 2016-06-23 | ヘレーウス ノーブルライト ゲゼルシャフト ミット ベシュレンクテル ハフツングHeraeus Noblelight GmbH | Apparatus for drying and sintering a metal-containing ink on a substrate |
-
1991
- 1991-03-15 JP JP5108891A patent/JPH04288471A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008520773A (en) * | 2004-11-23 | 2008-06-19 | クラリアント・インターナシヨナル・リミテッド | Coatings and films based on polysilazanes, in particular their use for coating polymer films |
JP2016518579A (en) * | 2013-05-03 | 2016-06-23 | ヘレーウス ノーブルライト ゲゼルシャフト ミット ベシュレンクテル ハフツングHeraeus Noblelight GmbH | Apparatus for drying and sintering a metal-containing ink on a substrate |
US10112237B2 (en) | 2013-05-03 | 2018-10-30 | Heraeus Noblelight Gmbh | Device for drying and sintering metal-containing ink on a substrate |
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