JPH04285200A - Method for controlling continuous supply of plating material - Google Patents

Method for controlling continuous supply of plating material

Info

Publication number
JPH04285200A
JPH04285200A JP4967791A JP4967791A JPH04285200A JP H04285200 A JPH04285200 A JP H04285200A JP 4967791 A JP4967791 A JP 4967791A JP 4967791 A JP4967791 A JP 4967791A JP H04285200 A JPH04285200 A JP H04285200A
Authority
JP
Japan
Prior art keywords
plating
plating material
supply
continuously
plated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4967791A
Other languages
Japanese (ja)
Inventor
Saburo Ikeda
池 田 三 郎
Toshihiko Chino
千 野 俊 彦
Takahiro Yamazaki
山 崎 孝 博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP4967791A priority Critical patent/JPH04285200A/en
Publication of JPH04285200A publication Critical patent/JPH04285200A/en
Withdrawn legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To stably and automatically supply a plating material and to control the continuous supply of the plating material in the equipment for continuously electroplating a metallic strip by automatically controlling the supply of the material in place of the manual control based on the visual judgement. CONSTITUTION:This electroplating equipment has a device for continuously treating a metallic strip 15 to be plated, the electric power source for plating the strip 15, a controller 5 and a means for supplying a plating material 1. The traveling speed and time of the strip 15, plating current value and plating voltage value are detected, the respective signals are computed to calculate the consumption of the plating material, the output signal is inputted to the supply means, and the supply of the plating material is continuously and stably controlled.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、めっき設備において連
続してめっき材を安定的に供給する制御方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a control method for continuously and stably supplying plating material in plating equipment.

【0002】0002

【従来の技術】従来、金属ストリップに連続的に電気め
っきするプロセスラインにおいては、めっき材はその消
耗量を目視検知し、バッチ的にめっき材容器の交換また
はめっき材の供給を行っていた。これは、めっき材の固
形形状そのものがある一定以上の大きさを持ったもので
あるため、連続的に供給するという装置を有していない
ことによるものである。
2. Description of the Related Art Conventionally, in a process line for continuously electroplating metal strips, the amount of plating material consumed was visually detected and the plating material container was replaced or the plating material was supplied in batches. This is because the solid shape of the plating material itself has a certain size or more, so there is no device to continuously supply it.

【0003】また、連続プロセスラインでなく、バッチ
的な小容量の電気めっき装置においては、小球状になっ
ためっき材を供給する装置を有しているところもあるが
、めっき材の供給はすべて不足量の目視点検による手動
供給運転である。
[0003] In addition, some small-capacity batch electroplating equipment, rather than a continuous process line, have a device that supplies plating material in the form of small spheres; Manual supply operation with visual inspection of insufficient amount.

【0004】0004

【発明が解決しようとする課題】前述の2つの装置の特
徴を生かし小球状になっためっき材を供給する装置を用
い連続的に電気めっきをするプロセスラインにおいては
、めっき材の連続的な安定供給は不可欠であるが、現状
では技術的に確立されていない。
[Problem to be Solved by the Invention] In a process line that continuously performs electroplating using a device that supplies plating material in the form of small spheres by taking advantage of the features of the two devices described above, it is necessary to continuously stabilize the plating material. Although supply is essential, it is not technically established at present.

【0005】本発明は、金属帯の連続電気めっき設備に
おいて、めっき原料となるめっき材の供給制御に人間の
目視による判断の手動制御ではなく、自動的に演算する
ことにより、めっき材の安定した自動供給を可能にする
めっき材の連続供給制御方法を提供することを目的とし
ている。
[0005] In continuous electroplating equipment for metal strips, the present invention uses automatic calculation to control the supply of plating material, which is a plating raw material, rather than manual control based on human visual judgment. The purpose of this invention is to provide a continuous supply control method for plating materials that enables automatic supply.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に本発明によれば、めっきされるべき金属帯を連続的に
通板する装置と、その被めっき金属帯をめっきするため
の電源設備および制御装置と、めっき原料となるめっき
材を連続的に供給する手段とを有する電気めっき設備に
おいて、前記被めっき金属帯の通板速度および時間、め
っき電流値ならびにめっき電圧値を検出し、それぞれの
信号を演算処理してめっき材の消耗量を計算し、その出
力信号を前記めっき材供給手段に入力することにより、
連続して安定的にめっき材を供給制御することを特徴と
するめっき材の連続供給制御方法が提供される。
[Means for Solving the Problems] In order to achieve the above object, the present invention provides an apparatus for continuously passing a metal strip to be plated, and power supply equipment for plating the metal strip to be plated. In an electroplating equipment having a control device and a means for continuously supplying plating material serving as a plating raw material, the passing speed and time of the metal strip to be plated, the plating current value and the plating voltage value are detected, respectively. By calculating the consumption amount of the plating material by processing the signal, and inputting the output signal to the plating material supply means,
A continuous supply control method for a plating material is provided, which is characterized by continuously and stably controlling the supply of a plating material.

【0007】以下に本発明をさらに詳細に説明する。The present invention will be explained in more detail below.

【0008】図1は、めっき槽20が1層の場合に本発
明方法を適用した一実施例である。以下の説明では、非
めっき金属帯15として鋼板を代表例として説明するが
これに限るものではない。
FIG. 1 shows an embodiment in which the method of the present invention is applied when the plating tank 20 has one layer. In the following description, a steel plate will be used as a representative example of the non-plated metal strip 15, but the present invention is not limited to this.

【0009】図1に示すように本発明を適用する電気め
っき設備は、めっきされるべき鋼板15を連続的に通板
する装置としてロール16、17および18ならびにロ
ール17を駆動するためのモーター6と、その被めっき
鋼板15をめっきするための電源設備としてめっき電極
8およびロール電極9と、制御装置としてめっき電流制
御装置と、めっき原料となるめっき材1を連続的に供給
する手段としてめっき材供給槽19、めっき材供給装置
駆動用モーター2および前記モーター2の駆動力制御装
置3とを有する。
As shown in FIG. 1, the electroplating equipment to which the present invention is applied includes rolls 16, 17 and 18 and a motor 6 for driving the roll 17 as a device for continuously passing the steel plate 15 to be plated. , a plating electrode 8 and a roll electrode 9 as power supply equipment for plating the steel sheet 15 to be plated, a plating current control device as a control device, and a plating material as a means for continuously supplying plating material 1 as a plating raw material. It has a supply tank 19, a motor 2 for driving a plating material supply device, and a driving force control device 3 for the motor 2.

【0010】前記連続通板装置を構成する各ロール16
、17、18およびモーター6は、特に制限はなく、通
常の電気めっきに用いられるものである。
[0010] Each roll 16 constituting the continuous sheet passing device
, 17, 18 and the motor 6 are not particularly limited, and are those used in normal electroplating.

【0011】また、前記電源設備および制御装置5も特
に制限はなく、公知のものである。
[0011] Furthermore, the power supply equipment and the control device 5 are not particularly limited and are known ones.

【0012】前記めっき材供給手段としては、図2に示
すように前記供給槽19へめっき原料となるめっき材1
を投入し、これを前記めっき電極8へ所定の供給速度に
なるようモーター2を制御装置3で調整するものであれ
ばいかなる形式のものでもよい。
As the plating material supply means, as shown in FIG.
Any type of system may be used as long as the motor 2 is adjusted by the control device 3 so that the plating electrode 8 is supplied with a predetermined supply speed.

【0013】前記供給槽19としては、供給により減少
しためっき材1を適宜補充する方法または2槽以上を配
設して切換えて使用する方法、さらには供給槽19に相
当する容器を交換して行うもの等があるが、そのいずれ
でもよい。
The supply tank 19 can be used by appropriately replenishing the plating material 1 that has decreased due to supply, by arranging two or more tanks and switching between them, or by replacing the container corresponding to the supply tank 19. There are many things you can do, but any of them is fine.

【0014】また、供給速度を制御する方法も制限はな
く、公知の方法を用いることができる。
[0014] Furthermore, there is no restriction on the method of controlling the supply rate, and any known method can be used.

【0015】つぎに、前記電気めっき設備において本発
明のめっき材の供給を制御する方法を説明する。
Next, a method for controlling the supply of the plating material of the present invention in the electroplating equipment will be explained.

【0016】図1に示す前記被めっき鋼板15の通板速
度、時間、めっき電流値およびめっき電圧値を検出し、
それぞれの信号10、11、12および13を演算器4
に入力して演算処理し、めっき材1の消耗量を計算し、
その出力信号14を前記めっき材供給制御装置に入力し
てめっき材供給装置駆動用モーター2の回転数を可変制
御することにより、連続して安定的にめっき材1をめっ
き電極8へ供給するものである。
Detecting the passing speed, time, plating current value and plating voltage value of the steel plate 15 to be plated shown in FIG.
The respective signals 10, 11, 12 and 13 are sent to the computing unit 4.
input and process it to calculate the amount of consumption of plating material 1,
The plating material 1 is continuously and stably supplied to the plating electrode 8 by inputting the output signal 14 to the plating material supply control device and variably controlling the rotation speed of the plating material supply device driving motor 2. It is.

【0017】なお、めっき電極8へのめっき材供給量[
Q]は下記式で表示することができる。 Q=k0 f(k1 ve ,k2 t,k3 Id 
,k4 E)
Note that the amount of plating material supplied to the plating electrode 8 [
Q] can be expressed by the following formula. Q=k0 f(k1 ve , k2 t, k3 Id
, k4 E)

【0018】ここで、ve ,t,Id 
,Eはそれぞれ通板速度、時間、めっき電流値、めっき
電圧値を示し、k0 〜k4についてはめっき液温等諸
種の条件を加味して設定するものである。
Here, ve, t, Id
, E indicate the plate passing speed, time, plating current value, and plating voltage value, respectively, and k0 to k4 are set by taking into consideration various conditions such as the plating solution temperature.

【0019】なお、上記説明ではめっき槽1槽の場合に
ついて説明したが、本発明はこれに限るものではなく、
2槽以上の多槽の電気めっき設備についても同様にして
めっき材の連続供給を制御することができる。
[0019] In the above explanation, the case of one plating tank was explained, but the present invention is not limited to this.
Continuous supply of plating materials can be controlled in the same manner for multi-tank electroplating equipment having two or more tanks.

【0020】前記各信号10〜14の検出手段は、特別
なものを必要とせず公知のものを用いることができる。
[0020] The detection means for each of the signals 10 to 14 do not require any special means, and any known means can be used.

【0021】[0021]

【作用】本発明によれば、めっき材の消耗量を自動的に
演算し、その信号により安定的、連続的にめっき材を供
給できるようになり、連続めっきプロセスラインの無人
化、設備の安定化および品質の向上が計られる。
[Operation] According to the present invention, the amount of consumption of plating material is automatically calculated, and the plating material can be supplied stably and continuously based on the signal, making continuous plating process lines unmanned and equipment stable. and improve quality.

【0022】[0022]

【実施例】以下に本発明を実施例に基づき具体的に説明
する。 (実施例1)被めっき鋼板(0.15〜0.4mm厚さ
、600〜1000mm幅)を図1に示す連続電気めっ
き設備に下記条件で通板してめっき厚0.02μmのニ
ッケルめっきを行った。   通板速度                   
         1200mpm  max  めっ
き槽の数                     
         2槽  めっき材供給槽供給能力 
                 20kg/Hr 
 めっき材供給速度(目標値)           
   15kg/Hr(平均値)
EXAMPLES The present invention will be specifically explained below based on examples. (Example 1) A steel plate to be plated (0.15 to 0.4 mm thick, 600 to 1000 mm wide) was passed through the continuous electroplating equipment shown in Figure 1 under the following conditions to obtain nickel plating with a plating thickness of 0.02 μm. went. Threading speed
1200mpm max Number of plating tanks
2 tanks Plating material supply tank supply capacity
20kg/Hr
Plating material supply speed (target value)
15kg/Hr (average value)

【0023】20時間
連続して操業した結果、めっき材を目視検知することな
く自動的に安定してめっき電極へ供給され、目付量に不
足のない品質のすぐれためっき製品を得ることができた
[0023] As a result of continuous operation for 20 hours, the plating material was automatically and stably supplied to the plating electrode without visual detection, and it was possible to obtain a plating product of excellent quality with no shortage of area weight. .

【0024】[0024]

【発明の効果】本発明は以上説明したように構成されて
いるので、本発明によればめっき材供給制御を連続的、
安定的に実施することができるため、めっき品質の向上
、省力自動化が可能になるという効果がある。
[Effects of the Invention] Since the present invention is constructed as described above, according to the present invention, plating material supply control can be performed continuously.
Since it can be carried out stably, it has the effect of improving plating quality and enabling labor-saving automation.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の制御方法を用いためっき槽とその制御
系統の一例を示す部分断面説明図である。
FIG. 1 is a partially sectional explanatory diagram showing an example of a plating tank and its control system using the control method of the present invention.

【符号の説明】[Explanation of symbols]

1  めっき材 2、6  モーター 3  モーター駆動力制御装置 4  演算器 5  めっき電流制御装置 7  ライン速度検知器 8  めっき電極 9  ロール電極 10、11、12、13、14  信号15  被めっ
き鋼板(金属帯) 16、17、18  ロール 19  めっき材供給槽 20  めっき槽
1 Plating materials 2, 6 Motor 3 Motor driving force control device 4 Arithmetic unit 5 Plating current control device 7 Line speed detector 8 Plating electrode 9 Roll electrodes 10, 11, 12, 13, 14 Signal 15 Steel plate to be plated (metal strip) 16, 17, 18 Roll 19 Plating material supply tank 20 Plating tank

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  めっきされるべき金属帯を連続的に通
板する装置と、その被めっき金属帯をめっきするための
電源設備および制御装置と、めっき原料となるめっき材
を連続的に供給する手段とを有する電気めっき設備にお
いて、前記被めっき金属帯の通板速度および時間、めっ
き電流値ならびにめっき電圧値を検出し、それぞれの信
号を演算処理してめっき材の消耗量を計算し、その出力
信号を前記めっき材供給手段に入力することにより、連
続して安定的にめっき材を供給制御することを特徴とす
るめっき材の連続供給制御方法。
[Claim 1] A device for continuously passing a metal strip to be plated, a power supply equipment and a control device for plating the metal strip to be plated, and a continuous supply of a plating material serving as a plating raw material. In the electroplating equipment having means, the passing speed and time of the metal strip to be plated, the plating current value and the plating voltage value are detected, the respective signals are processed to calculate the amount of consumption of the plating material, and the amount of consumption of the plating material is calculated. A continuous supply control method for plating material, characterized in that the plating material is continuously and stably supplied by inputting an output signal to the plating material supply means.
JP4967791A 1991-03-14 1991-03-14 Method for controlling continuous supply of plating material Withdrawn JPH04285200A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4967791A JPH04285200A (en) 1991-03-14 1991-03-14 Method for controlling continuous supply of plating material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4967791A JPH04285200A (en) 1991-03-14 1991-03-14 Method for controlling continuous supply of plating material

Publications (1)

Publication Number Publication Date
JPH04285200A true JPH04285200A (en) 1992-10-09

Family

ID=12837807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4967791A Withdrawn JPH04285200A (en) 1991-03-14 1991-03-14 Method for controlling continuous supply of plating material

Country Status (1)

Country Link
JP (1) JPH04285200A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102424990A (en) * 2011-12-07 2012-04-25 深圳市危险废物处理站有限公司 Continuous feeding circulating electrodeposition method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102424990A (en) * 2011-12-07 2012-04-25 深圳市危险废物处理站有限公司 Continuous feeding circulating electrodeposition method

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Effective date: 19980514