JP3262635B2 - Supply method of zinc ion to plating solution - Google Patents

Supply method of zinc ion to plating solution

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Publication number
JP3262635B2
JP3262635B2 JP12743493A JP12743493A JP3262635B2 JP 3262635 B2 JP3262635 B2 JP 3262635B2 JP 12743493 A JP12743493 A JP 12743493A JP 12743493 A JP12743493 A JP 12743493A JP 3262635 B2 JP3262635 B2 JP 3262635B2
Authority
JP
Japan
Prior art keywords
zinc
plating solution
tank
plating
flow rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP12743493A
Other languages
Japanese (ja)
Other versions
JPH06336699A (en
Inventor
浩 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
JFE Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JFE Steel Corp filed Critical JFE Steel Corp
Priority to JP12743493A priority Critical patent/JP3262635B2/en
Publication of JPH06336699A publication Critical patent/JPH06336699A/en
Application granted granted Critical
Publication of JP3262635B2 publication Critical patent/JP3262635B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、不溶性陽極を用いる鋼
帯等の金属帯の連続電気亜鉛めっき設備において、消費
される亜鉛イオンをめっき液中に補充するための亜鉛イ
オンの供給方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of supplying zinc ions for replenishing consumed zinc ions in a plating solution in a continuous electrogalvanizing equipment for metal strips such as steel strips using an insoluble anode.

【0002】[0002]

【従来の技術】近年、自動車、家電製品等において耐食
性向上の要求が高まり、亜鉛めっき鋼板の需要も著しい
増加を見せている。こうした需要増に対処するため、高
能率生産の可能な高電流密度による高速めっき法が採用
されているが、高速めっき法においては陽極交換を頻繁
に行わねばならない可溶性陽極方式よりも、陽極交換の
必要のないイリジウム系等の不溶性陽極を用い、消費さ
れる金属イオンを連続的に補給する方式の方が有利であ
ることはいうまでもない。
2. Description of the Related Art In recent years, there has been an increasing demand for improved corrosion resistance in automobiles, home electric appliances and the like, and the demand for galvanized steel sheets has also increased remarkably. To cope with such an increase in demand, a high-speed plating method with a high current density that enables high-efficiency production has been adopted.However, in the high-speed plating method, the anode replacement is more required than in the soluble anode method in which anode replacement must be performed frequently. It goes without saying that a system in which an unnecessary insoluble anode such as an iridium-based one is used and metal ions are continuously supplied is more advantageous.

【0003】めっき液としては通常、硫酸系の電解液が
使用される。また、めっき液中への亜鉛イオンの補給方
法には、金属亜鉛を直接めっき液に接触させることによ
り溶解させる方法と、酸化亜鉛等の金属化合物を溶解さ
せる方法とがある。粒状、あるいは塊状の金属亜鉛を直
接溶解させる方法は溶解速度が低く、粉末状の金属化合
物を溶解させる方が一見能率的なようであるが、このよ
うな金属化合物粉は一般に液中に投入された際、粉体表
面に生じる反応熱によって塊状化(ブロッキング)しや
すく、塊状化したものはほとんど溶解しないという欠点
があるため、粒状、あるいは粉末の金属亜鉛を直接溶解
させる方法が採用される場合も多い。
As a plating solution, a sulfuric acid-based electrolytic solution is usually used. In addition, as a method of replenishing zinc ions in the plating solution, there are a method of dissolving metal zinc by directly contacting the plating solution and a method of dissolving a metal compound such as zinc oxide. The method of directly dissolving granular or massive metallic zinc has a low dissolution rate, and it seems seemingly more efficient to dissolve the powdered metallic compound.However, such metallic compound powder is generally introduced into a liquid. When the method is adopted, it is easy to agglomerate (block) due to the reaction heat generated on the powder surface, and the agglomerated material hardly dissolves. There are many.

【0004】この場合のめっき液の濃度制御は、たとえ
ば特公昭53-24897号公報に記載されているように、めっ
き液循環タンクと金属亜鉛溶解槽との間にめっき液を循
環させ、めっき液循環タンクにおけるめっき液濃度の上
限ならびに下限によって液の循環ポンプをオン−オフし
たり、循環流量を調整したりすることにより行われてい
る。そして、この場合の循環タンクへの金属イオンの供
給量は、めっき電流と時間との積からめっきによる金属
イオンの消費量を算出し、まためっき液循環タンク内の
金属イオン濃度の実測値と目標濃度との差から金属スト
リップによる持ち出し量を算出し、これら金属イオンの
消費量を必要供給量と見なしていた。
In this case, the concentration of the plating solution is controlled by, for example, circulating the plating solution between a plating solution circulation tank and a metal zinc dissolving tank as described in Japanese Patent Publication No. 53-24897. It is performed by turning on / off the circulation pump of the solution or adjusting the circulation flow rate according to the upper and lower limits of the plating solution concentration in the circulation tank. In this case, the supply amount of metal ions to the circulation tank is calculated by calculating the consumption amount of metal ions by plating from the product of the plating current and time, and measuring the target value of the metal ion concentration in the plating solution circulation tank and the target value. The amount taken out by the metal strip was calculated from the difference from the concentration, and the consumption of these metal ions was regarded as the required supply.

【0005】しかしこの方法では、濃度測定と流量調整
等のアクションとのタイミングのずれや、めっき条件の
変更に伴う目標濃度の変更等に対する追随性が悪く、い
わゆるハンチング現象を生じて濃度の変動が大きいとい
う問題点があった。こうした点を改善するものとして、
特公昭62-46640号公報に記載されているめっき液濃度制
御方法を図3により簡単に説明する。図3はこの特公昭
62-46640号公報記載の発明の装置構成を示し、1は亜鉛
貯蔵ホッパ、2は原料切り出し装置、3は亜鉛溶解槽、
31はレベル計、4は循環タンク、6はライン内のめっき
槽、8は沈殿槽、9は速度計、10は設定器、11は演算
器、12は制御器、Sはストリップである。
[0005] However, this method is poor in follow-up with respect to the timing shift between the concentration measurement and the action such as flow rate adjustment, and the change of the target concentration accompanying the change of the plating condition. There was a problem of being large. In order to improve these points,
The plating solution concentration control method described in JP-B-62-46640 will be briefly described with reference to FIG. Fig. 3
1 shows a zinc storage hopper, 2 shows a raw material cutting device, 3 shows a zinc dissolving tank,
31 is a level meter, 4 is a circulation tank, 6 is a plating tank in the line, 8 is a sedimentation tank, 9 is a speedometer, 10 is a setter, 11 is a calculator, 12 is a controller, and S is a strip.

【0006】上記の構成において、一定の周期毎に、一
定時間経過後におけるめっき液循環タンク4内の亜鉛イ
オン濃度が目標値となるよう、亜鉛溶解槽3への亜鉛投
入速度を算出し、算出した亜鉛投入速度に対応した原料
切り出し装置2を制御することにより、めっき液濃度の
予測制御が効果的に行われるとしている。しかし、この
方法では、ライン内のめっき槽6の操業条件が大きく変
化するときなどに迅速な対応が困難である。その場合、
循環タンク4の容量を大きくすればある程度対応できる
が、不経済である。
[0006] In the above configuration, the zinc charging speed into the zinc dissolving tank 3 is calculated and calculated at predetermined intervals so that the zinc ion concentration in the plating solution circulation tank 4 after the predetermined time has reached the target value. By controlling the raw material cutting device 2 corresponding to the zinc feeding speed, the prediction control of the plating solution concentration is effectively performed. However, in this method, it is difficult to respond quickly when the operating conditions of the plating tank 6 in the line greatly change. In that case,
If the capacity of the circulation tank 4 is increased, it can be dealt with to some extent, but it is uneconomical.

【0007】[0007]

【発明が解決しようとする課題】本発明は、上記のよう
な問題点を解消し、きわめて容易でかつ確実な手段によ
って精度よく亜鉛イオンの濃度管理を行う方法を提供す
ることを目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned problems and to provide a method for precisely controlling the concentration of zinc ions by extremely easy and reliable means.

【0008】[0008]

【課題を解決するための手段】本発明は、めっき槽と、
このめっき槽との間でめっき液を循環する循環タンク
と、この循環タンクとの間でめっき液を循環する亜鉛溶
解槽とを備え、不溶性陽極を用いる金属帯の連続電気亜
鉛めっき設備において、めっき液中へ金属亜鉛を溶解し
て亜鉛イオンを補充するに際し、被めっき材の目付け
量、幅寸法、ライン速度から必要な亜鉛供給速度を算出
するとともに、別途めっき液のpH値から前記亜鉛供給
速度に対応する亜鉛溶解槽送りめっき液流量を決定し、
前記循環タンクから前記亜鉛溶解槽への送液ポンプ出側
のめっき液流量をこの決定値となるよう制御することを
特徴とするめっき液への亜鉛イオンの供給方法である。
The present invention comprises a plating tank,
Circulation tank that circulates plating solution with this plating tank
And the zinc solution that circulates the plating solution with this circulation tank.
In a continuous electrogalvanizing equipment for metal strips using a dissolving tank and using an insoluble anode, when replenishing zinc ions by dissolving metallic zinc in the plating solution, the basis weight of the material to be plated, width, line speed While calculating the required zinc supply rate, separately determining the zinc dissolution tank feed plating solution flow rate corresponding to the zinc supply rate from the pH value of the plating solution,
A method for supplying zinc ions to a plating solution, wherein the flow rate of the plating solution from the circulation tank to the zinc dissolving tank at the outlet of the liquid sending pump is controlled to be the determined value.

【0009】[0009]

【作 用】被めっき材の目付け量をG(g/m2) 、板幅を
W(m)、ライン速度をS(m/min) 、めっき液中の亜
鉛イオン濃度をα (g/l)、被めっき材によるめっき液の
持ち出し量をβ (l/m2) とすると、亜鉛イオンの消費速
度Z(g/min)は、 Z=G・W・S+α・β・W・S ・・・(1) によって求められる。なお、式中の各量のうちGとSは
ほぼ対応する関係にあり、αは目標値に維持するように
操業するから定数として扱ってよい。βも経験的に得ら
れる値で、定数として扱われる。
[Operation] The basis weight of the material to be plated is G (g / m 2 ), the plate width is W (m), the line speed is S (m / min), and the zinc ion concentration in the plating solution is α (g / l). ), Assuming that the amount of the plating solution carried out by the material to be plated is β (l / m 2 ), the consumption rate Z (g / min) of zinc ion is as follows: Z = G · W · S + α · β · WS・ It is determined by (1). It should be noted that among the quantities in the formula, G and S have a substantially corresponding relationship, and α may be treated as a constant since the operation is performed so as to maintain the target value. β is a value obtained empirically and is treated as a constant.

【0010】一方、めっき液のpH毎に、溶解装置の液
流量と亜鉛の溶解量との関係を求めると、図2のような
グラフが得られる。この横軸は、pH=2.0 で1.0g/l溶
解させる流量を1として無次元化した亜鉛溶解槽送りめ
っき液流量、縦軸は金属亜鉛溶解量である。(1)式に
よって、ラインの操業条件から亜鉛イオンの消費速度Z
が推定でき、さらにめっき液のpHによって、図2のグ
ラフから溶解装置の液流量を決定すれば、亜鉛イオンの
消費速度Zは亜鉛の溶解速度と一致し、亜鉛イオン濃度
は一定に保たれることになる。
On the other hand, when the relationship between the flow rate of the dissolving apparatus and the amount of zinc dissolved is determined for each pH of the plating solution, a graph as shown in FIG. 2 is obtained. The abscissa represents the flow rate of the plating solution fed to the zinc dissolving tank in which the flow rate for dissolving 1.0 g / l at pH = 2.0 is set to 1 and the ordinate represents the dissolution amount of zinc metal. According to the equation (1), the consumption rate Z of the zinc ion is calculated from the operating conditions of the line.
If the solution flow rate of the dissolving device is determined from the graph of FIG. 2 according to the pH of the plating solution, the consumption rate Z of zinc ions matches the dissolution rate of zinc, and the zinc ion concentration is kept constant. Will be.

【0011】[0011]

【実施例】本発明の一実施例である鋼帯の連続電気亜鉛
めっきラインの一部の構成図を図1に示す。さきの図3
と同一のものには同じ符号を使用した。5aは循環タンク
4から亜鉛溶解槽への送液ポンプ、5bは循環タンク4
からライン内めっき槽への送液ポンプ、7はめっき液
分析計である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a schematic diagram showing a part of a steel strip continuous electrogalvanizing line according to an embodiment of the present invention. Figure 3 above
The same reference numerals are used for the same components. 5a is a circulation tank
Pump for feeding liquid from 4 to zinc dissolving tank 3 , 5b for circulation tank 4
A pump for feeding a liquid to the in- line plating tank 6 and a plating solution analyzer 7.

【0012】板幅、目付け量等の操業条件から前記
(1)式により亜鉛イオンの消費速度Zを算出し、原料
切り出し装置2を制御して算出した亜鉛イオンの消費速
度Zに見合う投入速度で亜鉛を溶解させる。一方、目標
とするめっき液のpHから、亜鉛溶解槽に流すめっき液
の流量を決定し、循環タンク4から亜鉛溶解槽3への送
ポンプ5a出側の流量をこの値となるよう制御する。こ
の実施例ではポンプは可変流量で、ポンプの回転数を
VVVF制御等の電気的手段によって制御するが、たと
えばポンプは通常のポンプを使用して流量は一定とし、
ポンプ出側に流量制御弁を設けて流量を制御してもよ
い。
The zinc ion consumption rate Z is calculated from the operating conditions such as the sheet width and the basis weight according to the above equation (1), and the feed rate is adjusted to the zinc ion consumption rate Z calculated by controlling the raw material cutting device 2. Dissolve zinc. On the other hand, the flow rate of the plating solution flowing into the zinc dissolution tank is determined from the target pH of the plating solution, and the flow rate of the plating solution from the circulation tank 4 to the zinc dissolution tank 3 is determined.
The flow rate on the outlet side of the liquid pump 5a is controlled to be this value. In this embodiment, the pump is of a variable flow rate type , and the number of revolutions of the pump is controlled by electric means such as VVVF control.
A flow control valve may be provided on the pump outlet side to control the flow rate.

【0013】このように計算値によってスタートさせ、
めっき液分析計7でpHならびに亜鉛イオン濃度を監視
し、演算器11にフィードバックして行くが、当初の計算
値の精度が高いため濃度の変動がほとんど現れないで操
業を行うことができる。
Thus, starting with the calculated values,
The plating solution analyzer 7 monitors the pH and the zinc ion concentration, and feeds back the data to the calculator 11. However, since the accuracy of the initially calculated values is high, the operation can be performed with almost no fluctuation in the concentration.

【0014】[0014]

【発明の効果】本発明によれば、ストリップによる亜鉛
の消費量(持ち出し量)に見合うように亜鉛の溶解量を
制御するので、亜鉛濃度の変動が少なく、常に品質の安
定しためっきが行われるという、すぐれた効果を奏す
る。
According to the present invention, the amount of zinc dissolved is controlled so as to match the amount of zinc consumed (taken out) by the strip, so that the zinc concentration is small and plating of consistent quality is always performed. It has an excellent effect.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例の構成図である。FIG. 1 is a configuration diagram of an embodiment of the present invention.

【図2】亜鉛溶解量と溶解槽のめっき液流量との関係を
示すグラフである。
FIG. 2 is a graph showing the relationship between the amount of zinc dissolved and the flow rate of a plating solution in a melting tank.

【図3】従来の技術を示す構成図である。FIG. 3 is a configuration diagram showing a conventional technique.

【符号の説明】[Explanation of symbols]

1 亜鉛貯蔵ホッパ 2 原料切り出し装置 3 亜鉛溶解槽 4 循環タンク 5a、5b 送液ポンプ 6 めっき槽 7 めっき液分析計 8 沈殿槽 9 速度計 10 設定器 11 演算器 12 制御器 DESCRIPTION OF SYMBOLS 1 Zinc storage hopper 2 Raw material extraction device 3 Zinc dissolution tank 4 Circulation tank 5a, 5b Liquid feed pump 6 Plating tank 7 Plating solution analyzer 8 Sedimentation tank 9 Speedometer 10 Setting device 11 Computing device 12 Controller

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 めっき槽と、このめっき槽との間でめっ
き液を循環する循環タンクと、この循環タンクとの間で
めっき液を循環する亜鉛溶解槽とを備え、不溶性陽極を
用いる金属帯の連続電気亜鉛めっき設備において、めっ
き液中へ金属亜鉛を溶解して亜鉛イオンを補充するに際
し、被めっき材の目付け量、幅寸法、ライン速度から必
要な亜鉛供給速度を算出するとともに、別途めっき液の
pH値から前記亜鉛供給速度に対応する亜鉛溶解槽送り
めっき液流量を決定し、前記循環タンクから前記亜鉛溶
解槽への送液ポンプ出側のめっき液流量をこの決定値と
なるよう制御することを特徴とするめっき液への亜鉛イ
オンの供給方法。
A plating tank is provided between the plating tank and the plating tank.
Between the circulation tank that circulates the liquid
With a zinc dissolving tank that circulates the plating solution, in a continuous electrogalvanizing equipment of a metal strip using an insoluble anode, when replenishing zinc ions by dissolving metallic zinc in the plating solution, the basis weight of the material to be plated, Calculate the required zinc supply speed from the width dimension and the line speed, and separately determine the zinc dissolution tank feeding plating solution flow rate corresponding to the zinc supply speed from the pH value of the plating solution, and determine the plating solution flow rate from the circulation tank. Zinc solution
A method for supplying zinc ions to a plating solution, wherein the flow rate of the plating solution on the outlet side of the liquid sending pump to the decomposing tank is controlled to be the determined value.
JP12743493A 1993-05-28 1993-05-28 Supply method of zinc ion to plating solution Expired - Fee Related JP3262635B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12743493A JP3262635B2 (en) 1993-05-28 1993-05-28 Supply method of zinc ion to plating solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12743493A JP3262635B2 (en) 1993-05-28 1993-05-28 Supply method of zinc ion to plating solution

Publications (2)

Publication Number Publication Date
JPH06336699A JPH06336699A (en) 1994-12-06
JP3262635B2 true JP3262635B2 (en) 2002-03-04

Family

ID=14959865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12743493A Expired - Fee Related JP3262635B2 (en) 1993-05-28 1993-05-28 Supply method of zinc ion to plating solution

Country Status (1)

Country Link
JP (1) JP3262635B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108004586B (en) * 2018-01-24 2023-12-29 河南星光机械制造有限公司 Zinc dissolving device for electrogalvanizing or zinc-nickel production line
CN115305530A (en) * 2022-07-27 2022-11-08 中国航发南方工业有限公司 Zinc supplementing method for cyanide-free alkaline galvanizing process

Also Published As

Publication number Publication date
JPH06336699A (en) 1994-12-06

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