JPH04276646A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH04276646A
JPH04276646A JP3876291A JP3876291A JPH04276646A JP H04276646 A JPH04276646 A JP H04276646A JP 3876291 A JP3876291 A JP 3876291A JP 3876291 A JP3876291 A JP 3876291A JP H04276646 A JPH04276646 A JP H04276646A
Authority
JP
Japan
Prior art keywords
chip
copper plate
resin
semiconductor device
semiconductor element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3876291A
Other languages
Japanese (ja)
Inventor
Toshihiro Kimura
俊広 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Motor Co Ltd
Original Assignee
Nissan Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Motor Co Ltd filed Critical Nissan Motor Co Ltd
Priority to JP3876291A priority Critical patent/JPH04276646A/en
Publication of JPH04276646A publication Critical patent/JPH04276646A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PURPOSE:To make the title device small-sized and to make its heat-dissipating property good by a method wherein a metal is buried in a base body for a chip carrier and a chip is fixed and bonded to the surface of the metal. CONSTITUTION:A chip carrier is constituted of a base body in which an epoxy resin 9 has been fixed and bonded to the circumference of a copper plate 8 where a recessed part is formed on the surface. An interconnection pattern 2 is formed on the surface of the epoxy resin 9; an electrode 3 is formed at a peripheral end. A semiconductor chip 4 is mounted on the recessed part of the chip carrier; the semiconductor chip 4 and the interconnection pattern 2 are connected electrically by a wire 5. Heat generated at the semiconductor chip 4 is dissipated immediately to the copper plate 8. The coefficient of thermal expansion of the copper plate 8 coming into contact with the semiconductor chip 4 is much smaller than that of the epoxy resin, and a thermal stress exerted on the semiconductor element is extremely small.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は半導体装置に係り、特に
その実装構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to its mounting structure.

【0002】0002

【従来の技術】半導体素子の実装方法としては、封止用
のパッケージ材料として金属を用いる方法、セラミック
を用いる方法、樹脂を用いる方法等がある。
2. Description of the Related Art Methods for mounting semiconductor elements include methods using metal, ceramic, and resin as a sealing package material.

【0003】これらの方法のうち、樹脂を用いる方法の
代表的なものにチップキャリアと呼ばれるものがある。
Among these methods, a typical method using resin is called a chip carrier.

【0004】例えば、図8の(a) および(b) (
ここで(b)は(a) のA−A断面を示す図)に示す
ように、エポキシ樹脂等の樹脂で構成された基体1の表
面に配線パターン2が形成されると共に、周辺端に外部
との電気的接続を達成するための電極3が形成されてお
り、半導体素子4をこの基体表面に搭載し、この半導体
素子チップ4のボンディングパッドと配線パターン2と
を金線あるいはアルミ線のボンディングワイヤ5によっ
て結線し、更にこれらを樹脂6で被覆するように構成さ
れている。7は樹脂止めリングであり、封止樹脂6の位
置決め等に用いられる。
For example, (a) and (b) in FIG.
Here, (b) is a diagram showing the A-A cross section of (a)), a wiring pattern 2 is formed on the surface of a base 1 made of resin such as epoxy resin, and an external wiring pattern is formed on the peripheral edge. A semiconductor element 4 is mounted on the surface of the substrate, and the bonding pads of the semiconductor element chip 4 and the wiring pattern 2 are bonded with gold wire or aluminum wire. The wires are connected by wires 5, and these are further coated with resin 6. Reference numeral 7 denotes a resin retaining ring, which is used for positioning the sealing resin 6 and the like.

【0005】ところで、このようなチップキャリアには
、多端子のLSIが実装される事が多いが、近年これら
LSIの発熱量が増加し、さらに搭載されるチップのサ
イズも大型化し、端子数も100ピン程度から数百ピン
まで増加する傾向にある。
By the way, multi-terminal LSIs are often mounted on such chip carriers, but in recent years the heat generation of these LSIs has increased, the size of the mounted chips has also increased, and the number of terminals has also increased. There is a tendency for the number of pins to increase from about 100 pins to several hundred pins.

【0006】またスマートICの登場によりICのパワ
ー化が注目されており、素子の放熱については今後益々
重大な課題である。
[0006] Furthermore, with the advent of smart ICs, increasing the power of ICs is attracting attention, and heat dissipation from elements will become an increasingly important issue in the future.

【0007】このような傾向にあるため、チップキャリ
アへの要求として、放熱性を向上し、多端子化、チップ
サイズの大形化に伴う素子への熱ストレスを低減する必
要があった。
[0007] Because of this trend, there has been a need for chip carriers to improve heat dissipation and to reduce thermal stress on elements due to increased number of terminals and increased chip size.

【0008】[0008]

【発明が解決しようとする課題】このように従来のチッ
プキャリアでは、基体が樹脂で構成され樹脂の流れ防止
のために樹脂止めリングが必要である上、封止部の高さ
も高い構造であるため、放熱性が悪く、発熱量の大きい
素子の実装には用いることができないという問題があっ
た。また発熱量が少ない場合でも素子温度が上昇し信頼
性低下の原因となる。
[Problems to be Solved by the Invention] As described above, in conventional chip carriers, the base is made of resin, and a resin stopper ring is required to prevent the resin from flowing, and the height of the sealing part is also high. Therefore, there was a problem that the heat dissipation property was poor and it could not be used for mounting elements that generate a large amount of heat. Furthermore, even when the amount of heat generated is small, the element temperature increases, causing a decrease in reliability.

【0009】また、樹脂と半導体素子との熱膨張係数差
が大きいため素子に大きな熱応力が働き信頼性が低下す
るという問題があった。
[0009] Furthermore, since there is a large difference in coefficient of thermal expansion between the resin and the semiconductor element, there is a problem in that a large thermal stress is applied to the element, reducing reliability.

【0010】さらには実装構造の厚さが大きく薄形化が
困難であるという問題があった。
Furthermore, there is a problem in that the mounting structure has a large thickness and is difficult to reduce in thickness.

【0011】また基体が樹脂で出来ているため機械的強
度が十分でないという問題もあった。
[0011] Furthermore, since the base body is made of resin, there is a problem in that it does not have sufficient mechanical strength.

【0012】本発明は前記実情に鑑みてなされたもので
、小形で放熱性が良好であってかつ信頼性の高い半導体
装置を提供することを目的とする。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a semiconductor device that is small in size, has good heat dissipation properties, and is highly reliable.

【0013】[0013]

【課題を解決するための手段】そこで本発明では、チッ
プキャリアの基体に金属を埋め込み、この金属表面上に
チップを固着するようにしている。
[Means for Solving the Problems] Accordingly, in the present invention, metal is embedded in the base of the chip carrier, and the chip is fixed on the surface of the metal.

【0014】[0014]

【作用】上記構成によれば、チップキャリアの基体に金
属を埋め込むようにしているため、放熱性が良好となり
、発熱量の大きい素子の実装にも用いることができ、ま
た素子からの発熱により素子温度が上昇したりすること
もない。
[Function] According to the above structure, since metal is embedded in the base of the chip carrier, heat dissipation is good and it can be used for mounting elements that generate a large amount of heat. There is no rise in temperature.

【0015】また半導体素子との接触部は金属であるた
め熱膨張差を小さく抑えることができ、素子に大きな熱
応力が働くこともない。
Furthermore, since the contact portion with the semiconductor element is made of metal, the difference in thermal expansion can be kept small, and no large thermal stress is applied to the element.

【0016】さらには実装構造の厚さを薄くすることが
できる。
Furthermore, the thickness of the mounting structure can be reduced.

【0017】また基体を構成する樹脂中に金属が埋め込
まれているため、機械的強度が十分に大きい。
Furthermore, since the metal is embedded in the resin constituting the base, the mechanical strength is sufficiently high.

【0018】[0018]

【実施例】以下、本発明の実施例について図面を参照し
つつ詳細に説明する。
Embodiments Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

【0019】実施例1 図1は、本発明の第1の実施例の半導体装置を示す断面
図である。
Embodiment 1 FIG. 1 is a sectional view showing a semiconductor device according to a first embodiment of the present invention.

【0020】この半導体装置では、チップキャリアが、
表面に凹部を形成してなる銅板8の周囲にエポキシ樹脂
9が固着された基体から構成されており、このエポキシ
樹脂9の表面には配線パターン2が形成されると共に周
辺端には電極3が形成されていることを特徴とするもの
である。
[0020] In this semiconductor device, the chip carrier is
It is composed of a base body in which an epoxy resin 9 is fixed around a copper plate 8 having a recess formed on its surface.A wiring pattern 2 is formed on the surface of this epoxy resin 9, and an electrode 3 is formed on the peripheral edge. It is characterized by the fact that it is formed.

【0021】そしてこのチップキャリアの凹部に半導体
素子チップ4が搭載され、この半導体素子チップ4と配
線パターン2との電気的接続はワイヤ5によって達成さ
れ、そして樹脂6によって封止されている。
A semiconductor element chip 4 is mounted in the recess of this chip carrier, electrical connection between the semiconductor element chip 4 and the wiring pattern 2 is achieved by wires 5, and the semiconductor element chip 4 is sealed with a resin 6.

【0022】この半導体装置によれば、図2に作用説明
図を示すように、半導体素子チップ4で発生する熱は直
ちに銅板8に放熱される。そしてまた半導体素子チップ
4と接する銅板8との熱膨張係数は従来のエポキシ樹脂
のそれに比べ大幅に小さく半導体素子に加わる熱応力も
極めて小さい。
According to this semiconductor device, the heat generated in the semiconductor element chip 4 is immediately radiated to the copper plate 8, as shown in FIG. Furthermore, the coefficient of thermal expansion of the copper plate 8 in contact with the semiconductor element chip 4 is significantly smaller than that of conventional epoxy resin, and the thermal stress applied to the semiconductor element is also extremely small.

【0023】さらに半導体素子は銅板の凹部内に配置さ
れるため、封止樹脂による封止構造の高さを低くするこ
とができる。また、従来の樹脂止めリングを形成する工
程が不要となり、部品点数および作業工数を節減するこ
とができ、また樹脂量も少なくすることができる。
Furthermore, since the semiconductor element is disposed within the recess of the copper plate, the height of the sealing structure using the sealing resin can be reduced. Further, the conventional step of forming a resin retaining ring is not necessary, the number of parts and the number of work steps can be reduced, and the amount of resin can also be reduced.

【0024】また、従来のチップキャリアでは樹脂に設
けられた側面電極から、外部回路に対する電気的接続を
行わなければならなかったが、半導体素子チップの裏面
が銅板と接合されているため、銅板の裏面からの電気的
接続が可能である。
In addition, in conventional chip carriers, it was necessary to make electrical connections to external circuits from side electrodes provided on the resin, but since the back side of the semiconductor element chip is bonded to the copper plate, Electrical connection is possible from the back side.

【0025】また、基体が金属と樹脂との複合材となる
ため、振動、反りによる機械的ストレスにも強い。
Furthermore, since the base is made of a composite material of metal and resin, it is resistant to mechanical stress due to vibration and warping.

【0026】次に、このチップキャリアの製造工程につ
いて図3を参照しつつ説明する。
Next, the manufacturing process of this chip carrier will be explained with reference to FIG.

【0027】この図ではチップキャリアの電極部のみの
構造を示した。また比較の為に右には図8に示した従来
例のチップキャリアの製造工程図を示す。
This figure shows the structure of only the electrode portion of the chip carrier. For comparison, a manufacturing process diagram of the conventional chip carrier shown in FIG. 8 is shown on the right.

【0028】まず、銅板8の、後に電極となる領域に穴
をあけ、この穴内に樹脂を注入して基体を形成する(ス
テップ101)。
First, a hole is made in a region of the copper plate 8 that will later become an electrode, and a resin is injected into the hole to form a base (step 101).

【0029】次いで、絶縁性接着剤層を介してアルミニ
ウム層からなる配線層2を接着する(ステップ102)
Next, the wiring layer 2 made of an aluminum layer is bonded via an insulating adhesive layer (step 102).
.

【0030】そしてフォトリソグラフィにより、レジス
トパターンを形成しこれをマスクとしてこのアルミニウ
ム層2をパターニングする(ステップ103)。
A resist pattern is formed by photolithography, and the aluminum layer 2 is patterned using this as a mask (step 103).

【0031】さらに第2のレジストパターンを形成しこ
れをマスクとして基板をエッチングしスルーホールhを
形成する(ステップ104)。
Furthermore, a second resist pattern is formed, and using this as a mask, the substrate is etched to form through holes h (step 104).

【0032】この後、スルーホールhにめっきを行う(
ステップ105)。
After that, plating is performed on the through hole h (
Step 105).

【0033】そして最後に個々に分割し、チップキャリ
ア基体を得る(ステップ106)。
[0033]Finally, it is divided into individual parts to obtain chip carrier substrates (step 106).

【0034】比較のために、対応する従来例のチップキ
ャリア基体を得るための工程図を右に示す。
For comparison, a process diagram for obtaining a corresponding conventional chip carrier substrate is shown on the right.

【0035】さらにこの半導体装置を基板実装する際の
実装構成例を図4に示す。
Further, FIG. 4 shows an example of a mounting configuration when this semiconductor device is mounted on a board.

【0036】この半導体装置は図4に示すように主回路
基板10の表面に形成された回路配線11に半田14を
介して接合される。12はチップ抵抗等のチップ部品で
あり、13は表面実装部品である。
This semiconductor device is bonded to circuit wiring 11 formed on the surface of main circuit board 10 via solder 14, as shown in FIG. 12 is a chip component such as a chip resistor, and 13 is a surface mount component.

【0037】実施例2 図5は、本発明の第2の実施例の半導体装置を示す図で
ある。
Embodiment 2 FIG. 5 is a diagram showing a semiconductor device according to a second embodiment of the present invention.

【0038】前記実施例では、基体を構成する銅板8の
表面に凹部を形成したが、この例では表面を平板状にし
たものである。そして半導体チップ4は銅板8の表面に
絶縁層15を介して固着されており、さらに流れ防止用
の樹脂止めリング7が形成され、この内部に樹脂6が充
填されていることを特徴とするもので、他部については
、前記実施例と同様に形成されている。
In the above embodiment, a recess was formed on the surface of the copper plate 8 constituting the base, but in this example, the surface is made into a flat plate. The semiconductor chip 4 is fixed to the surface of a copper plate 8 via an insulating layer 15, and a resin stop ring 7 for preventing flow is formed, and the inside of this ring is filled with resin 6. The other parts are formed in the same manner as in the previous embodiment.

【0039】この半導体装置の作用を図6に示すように
、実施例1と同様放熱性および熱応力の低減をはかるこ
とができる。
As shown in FIG. 6, the effect of this semiconductor device is similar to that of the first embodiment, in that heat dissipation and thermal stress can be reduced.

【0040】さらに、銅板8と半導体チップ4との間に
絶縁層15が界在せしめられているため、半導体チップ
の裏面電極と銅板との間にキャパシタ(コンデンサ)を
形成することができる。また、配線パターン2と銅板と
の間にも形成可能である。
Furthermore, since the insulating layer 15 is interposed between the copper plate 8 and the semiconductor chip 4, a capacitor can be formed between the back electrode of the semiconductor chip and the copper plate. Further, it can also be formed between the wiring pattern 2 and the copper plate.

【0041】また、絶縁層15の材質および厚さ、半導
体素子チップの裏面電極、配線2の大きさなどを任意に
選択することによって自由に容量を選定する事が可能で
ある。
Further, by arbitrarily selecting the material and thickness of the insulating layer 15, the back electrode of the semiconductor element chip, the size of the wiring 2, etc., it is possible to freely select the capacitance.

【0042】また、絶縁層15の厚さについては、数十
μm 程度まで形成可能である。また、エポキシ樹脂に
高誘電体(Ta2  O5  ,BaTiO3  ,T
iO2  等)を混入させたものを用いることによって
用意に容量の大きさを調整することができる。
Furthermore, the thickness of the insulating layer 15 can be up to several tens of μm. In addition, high dielectric materials (Ta2O5, BaTiO3, T
By using a material mixed with iO2, etc., the capacity can be easily adjusted.

【0043】また、半導体素子チップ4の裏面電極下に
形成するコンデンサの用途としては電源−GND間に入
れるバイパスコンデンサなどとして用いることができる
Further, the capacitor formed under the back electrode of the semiconductor element chip 4 can be used as a bypass capacitor inserted between the power supply and GND.

【0044】さらには、銅板8を半導体素子チップ4の
下地からワイヤボンディングされた配線2の下まで形成
することができるため電波障害対策にも有効である。
Furthermore, since the copper plate 8 can be formed from the base of the semiconductor element chip 4 to below the wire-bonded wiring 2, it is effective as a countermeasure against radio wave interference.

【0045】さらに、この実施例のチップキャリアの全
体斜視図を図7に示す。
Further, FIG. 7 shows an overall perspective view of the chip carrier of this embodiment.

【0046】チップキャリアの端部周辺には樹脂9が形
成され、側面に電極3が設けられている。そして半導体
素子チップの直下および配線2の一部の下に銅板8が埋
設されており、前述したように、半導体素子直下には絶
縁層15によるコンデンサが形成されるようになってい
る(なおここで、封止樹脂および樹脂止めリングは省略
した)。
A resin 9 is formed around the end of the chip carrier, and electrodes 3 are provided on the side surfaces. A copper plate 8 is buried directly under the semiconductor element chip and a part of the wiring 2, and as described above, a capacitor is formed by the insulating layer 15 directly under the semiconductor element (note that here (The sealing resin and resin retaining ring were omitted.)

【0047】なお、前記実施例1および実施例2におい
て金属板として銅板を用いたが、これに限定されること
なく適宜選択可能であり、銅の他42アロイ、Moなど
の金属を用いても良い。また、熱伝導率が大きくかつ熱
膨張係数の小さい材料であれば、セラミック(AlN,
Al2  O3  )など、金属以外の材料を用いるこ
とも可能である。
Although a copper plate was used as the metal plate in Examples 1 and 2, it is not limited to this and can be selected as appropriate, and metals such as 42 alloy and Mo may also be used in addition to copper. good. In addition, ceramics (AlN,
It is also possible to use materials other than metals, such as Al2O3).

【0048】[0048]

【発明の効果】以上説明してきたように、本発明によれ
ば、チップキャリア基体に金属を埋め込み、この金属表
面上にチップを固着するようにしているため、放熱性が
良好で、素子に大きな熱応力を与えることがなく機械的
強度の高い半導体装置を提供することができる。
[Effects of the Invention] As explained above, according to the present invention, metal is embedded in the chip carrier base and the chip is fixed on the metal surface, so heat dissipation is good and the device has a large A semiconductor device with high mechanical strength can be provided without applying thermal stress.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の第1の実施例の半導体装置を示す図FIG. 1 is a diagram showing a semiconductor device according to a first embodiment of the present invention.


図2】同半導体装置の作用を示す説明図
[
Figure 2: Explanatory diagram showing the operation of the semiconductor device

【図3】同半導
体装置の製造工程図
[Figure 3] Manufacturing process diagram of the semiconductor device

【図4】同半導体装置の実装構成を示す図[Figure 4] Diagram showing the mounting configuration of the semiconductor device

【図5】本発
明の第2の実施例の半導体装置を示す図
FIG. 5 is a diagram showing a semiconductor device according to a second embodiment of the present invention.

【図6】同半導
体装置の作用を示す説明図
[Fig. 6] Explanatory diagram showing the operation of the semiconductor device

【図7】同半導体装置に用い
るチップキャリアを示す図
[Fig. 7] A diagram showing a chip carrier used in the semiconductor device.

【図8】従来例の半導体装置
を示す図
[Fig. 8] Diagram showing a conventional semiconductor device

【符号の説明】[Explanation of symbols]

1  チップキャリア基体 2  配線 3  電極 4  半導体素子チップ 5  ワイヤ 6  封止樹脂 7  樹脂止めリング 8  銅板 9  エポキシ樹脂 10  主回路基板 11  回路配線 12  チップ部品 13  面実装部品 14  半田 15  絶縁膜 1 Chip carrier base 2 Wiring 3 Electrode 4 Semiconductor element chip 5 Wire 6 Sealing resin 7 Resin retaining ring 8 Copper plate 9 Epoxy resin 10 Main circuit board 11 Circuit wiring 12 Chip parts 13 Surface mount parts 14 Solder 15 Insulating film

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  表面に配線パターンが形成されると共
に、金属が埋めこまれた絶縁性基体と、前記絶縁性基体
の金属表面に固着された半導体素子とを具備し、前記半
導体素子と前記配線パターンとの間をボンディングワイ
ヤを介して接続したことを特徴とする半導体装置。
1. An insulating substrate having a wiring pattern formed on its surface and embedded with metal, and a semiconductor element fixed to the metal surface of the insulating substrate, wherein the semiconductor element and the wiring A semiconductor device characterized in that it is connected to a pattern via a bonding wire.
JP3876291A 1991-03-05 1991-03-05 Semiconductor device Pending JPH04276646A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3876291A JPH04276646A (en) 1991-03-05 1991-03-05 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3876291A JPH04276646A (en) 1991-03-05 1991-03-05 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH04276646A true JPH04276646A (en) 1992-10-01

Family

ID=12534297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3876291A Pending JPH04276646A (en) 1991-03-05 1991-03-05 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH04276646A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011528852A (en) * 2008-07-18 2011-11-24 ジョンソン コントロールズ テクノロジー カンパニー Grounding system and equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011528852A (en) * 2008-07-18 2011-11-24 ジョンソン コントロールズ テクノロジー カンパニー Grounding system and equipment
KR101535318B1 (en) * 2008-07-18 2015-07-08 존슨 컨트롤스 테크놀러지 컴퍼니 Grounding system and apparatus

Similar Documents

Publication Publication Date Title
JP3150351B2 (en) Electronic device and method of manufacturing the same
JP4037589B2 (en) Resin-encapsulated power semiconductor device
US5616958A (en) Electronic package
JPH0590482A (en) Semiconductor device and manufacture thereof
JP2001257288A (en) Flip-chip semiconductor device and method of manufacturing the same
US6131278A (en) Metal substrate having an IC chip and carrier mounting
JP3728847B2 (en) Multi-chip module and manufacturing method thereof
US6184567B1 (en) Film capacitor and semiconductor package or device carrying same
JP3312611B2 (en) Film carrier type semiconductor device
JPH05211256A (en) Semiconductor device
JPH04276646A (en) Semiconductor device
JP2691352B2 (en) Electronic component mounting device
JP3344362B2 (en) Film carrier type semiconductor device
JP2903013B2 (en) Circuit package including metal substrate and mounting method
JPS61137349A (en) Semiconductor device
JP2748771B2 (en) Film carrier semiconductor device and method of manufacturing the same
KR20010057046A (en) Package substrate having cavity
JPH04144162A (en) Semiconductor device
JPH04299849A (en) Semiconductor device
JP3177934B2 (en) Multi-chip semiconductor device
JPH08172142A (en) Semiconductor package, its manufacturing method, and semiconductor device
JP3033541B2 (en) TAB tape, semiconductor device, and method of manufacturing semiconductor device
JP3506788B2 (en) Semiconductor package
KR20000039152A (en) Printed circuit board for semiconductor package and manufacturing method thereof
JP2592869Y2 (en) Hybrid IC device